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Digitalization of cinemas brings the biggest change in the distribution of films in the last decades and its impact affects all cinemas worldwide. The new programming options, extended range of alternative content and deeper dramaturgy are among other news which have been brought by digitalization. Are these new opportunities sufficient to make the classic and art-house cinemas competitive with multiplex? The content of this work is analyse of the art-house cinemas in the Czech Republic. It explores the impact of digital distribution of films on these cinemas. Financing and technological changes which cinemas had to go through during the process of digitalization is the main focus of the work. The overall evaluation of the impact of digitization on the art-house cinemas is based on a comparison of art-house cinemas and their data relating to the digitalization and results of the questionnaire which has been sent to selected cinemas. The last part contains a brief comparison of the process of digitization of cinemas in the Czech Republic, The UK and Slovakia.

The film industry has been recently undergoing a significant technological change, which has made the traditional film strip an obsolete medium. The thesis called "Eschatology of the Film Strip" tries to define the basic differences between the photochemical and the electronical tradition of the moving image, and critically asses the transformation of the market. The thesis draws attention to many paradoxes caused by the pressured implementation of digital technologies, and argues for the classical photochemical film as a creative tool in it's own terms, able to find it's habitat in the context of fine arts. The author reflects upon the possibilities of new uses for the film strip and introduces the research project Kinoaparat.cz, focused on enlightenment in the field of traditional film art and technology.

Dans la réalisation de circuits intégrés hybrides électroniques - photoniques pour les réseaux télécom, les modulateurs intégrés plasmoniques pourront jouer un role essentiel de codage de l'information en signaux optiques. Cette thése montre la réalisation d'une approche modulateur plasmonique a effet de champ, intégrée en silicium en utilisant les technologies CMOS standards. Ce modulateur MOS plasmonique présente diverses propriétés intéressantes, a savoir un confinement optique fort, permettant une augmentation de l'interaction lumiére matiére. Ces modulateurs plasmoniques permettent aussi de réduire l'inadéquation entre la taille des dispositifs en photonique Si et celle de l' électronique, ce qui permet d'envisager une convergence de leur fabrication en technologie VLSI sur une meme puce. Le modulateur étudié dans ce mémoire repose sur l'accumulation de porteurs dans un condensateur MOS a grille cuivre integer dans un guide d'onde en silicium, nécessitant aux technologies front end et back end Cu d etre combinés de quelques nanométres l'une de l'autre. Nous présentons aussi de nouveaux designs pour injecter de la lumiére a partir de guide d'onde SOI dans un guide a nanostructure plasmonique et les mesures d'une modulation électro-optique dans les structures MOS plasmoniques / Compact and low energy consumption integrated optical modulator is urgently required for encoding information into optical signals. To that respect, the use of plasmon modes to modulate light is of particular interest when compared to the numerous references describing silicon based optical modulators. Indeed, the high field confinement properties of those modes and the increased sensitivity to small refractive index changes of the dielectric close to the metal can help decrease the characteristic length scales of the devices, towards to that of microelectronics.This thesis investigates the realization of Si field-effect plasmonic modulator integrated with a silicon-on insulator waveguide (SOI-WG) using the standard CMOS technology. The material aspects and also the technological steps required in order to realize an integrated plasmonic modulator compatible with requirements of CMOS technology were investigated. First, we demonstrate a Metal-Nitride-Oxide-Semiconductor (MNOS) stack for applications in electro-optical plasmonic devices, so that a very low optical losses and reliable operation is achieved. This objective is met thanks to a careful choice of materials: (i) copper as a metal for supporting the plasmonic mode and (ii) stoechiometric silicon nitride as an ultrathin low optical loss diffusion barrier to the copper. Final electrical reliability is above 95% for a 3 nm thick Si3N4 layer, leakage current density below 10-8 A.cm-2 and optical losses as low as 0.4 dB.μm-1 for a 13 nm thick insulator barrier, in agreement with the losses of the fundamental plasmonic mode estimated by 3D FDTD calculations, using the optical constant of Cu measured from ellipsometry. After demonstrating the MNOS as an appropriate structure for electro-optical CMOS plasmonics, we fabricate a vertical Metal-Insulator-Si-Metal (MISM) waveguide integrated with an SOI-WG, where the back metal was fabricated by flipping and molecular bonding of the original SOI wafer on a Si carrier wafer. The active device area varies from 0.5 to 3 μm2, 0.5 μm width and length varying from 1 to 6 μm.An efficient and simple way to couple light from Si-WG to vertical MISM PWG was experimentally realized by inserting a Metal-Insulator-Si-Insulator (MISI) coupling section between the two waveguides. We demonstrate that such couplers operates at 1.55 μm with the highest efficiency geometry corresponds to a compact length of 0.5 μm with coupling loss of just 2.5 dB (50 %) per facets. This value is 3 times smaller compared to the case of direct coupling (without any MISI section). High-k dielectrics are demonstrated as promising solution to reduce both the MISM absorption loss and the operation voltage. Given that interest, we experimental demonstrate an electrical reliable high-k stack for future applications to the MOS plasmonic modulators.A few μm long plasmonic modulator is experimentally investigated. Devices show leakage current below 10 fA through the copper electrodes based MOS capacitance. The accumulation capacitance (few fF) was found to scale with the surface of the device, in consistent with the expected equivalent oxide thickness of the MOS stack of our modulator. A low electro-absorption (EA) modulation showing capacitive behaviour was experimentally demonstrated in agreement with simulations. Finally, low energy consumption devices 6 fJ per bit was demonstrated.