Parmi les différentes cellules photovoltaïques existantes, les technologies à base de CIGS représentent aujourd'hui une alternative sérieuse à celles basées sur le silicium. De même, les technologies organiques émergent en vue d'applications sur le marché de la faible puissance. Afin d'être parfaitement concurrentielle, ces cellules doivent s'affranchir au maximum de la présence d'indium (surcoût) au sein de leurs structures (TCO, couche absorbante), ou de matériaux toxiques comme le CdS utilisé en tant que couche tampon. Les chalcogénures de zinc tels que le Zn1-xMgxO ou le ZnOzS1-z peuvent être employées à la place du CdS grâce à leurs propriétés semi-conductrices. En dopant le Zn1-xMgxO par un ou plusieurs atomes métalliques trivalents, on peut également créer des électrodes transparentes (TCO) pouvant substituer les électrodes traditionnelles à base d'indium (ITO). Les couches minces synthétisées au cours de ce travail ont été réalisées par spray-CVD, une technique de dépôt hybride et innovante utilisant un mode de chauffage radiatif. Les améliorations apportées au réacteur expérimental et les avantages qu'elles dégagent en font une alternative crédible aux techniques traditionnelles. Les couches de Zn1-xMgxO ainsi synthétisées exhibent de très bonnes propriétés, dont une énergie de gap facilement ajustable, une forte mobilité électronique et une très bonne transparence. De même, des couches de ZnS ont été réalisées par l'usage d'un précurseur original, permettant de s'affranchir du ZnCl2 (corrosif) couramment utilisé en spray pyrolyse. Les différents TCO étudiés ont montré de faibles résistivités (10-3 Ω.cm) et ont pu être testés dans des cellules solaires organiques en structures inverses. / In the field of photovoltaic devices, organic and CIGS-based solar cells are both promising way to compete with silicon-based technologies for low and high power generation. In order to provide safe and cost-effective thin films for these devices, zinc chalcogenides layers represent interesting opportunities to replace indium (expensive) and cadmium-based (toxic) layers. Semiconductors like Zn1-xMgxO and ZnS had been synthesized using an infrared assisted spray-CVD apparatus. The interaction between an aerosol and the infrared radiation is the main innovation in this process and sparked off many advantages. With this simple, vacuum-free and chemical soft technique, Zn1-xMgxO thin films exhibit excellent optical transparency, high electrical conductivity and an easily band gap adjustment. The obtained properties, compared with those reported by other traditional techniques, classed infrared assisted spray-CVD as an interesting and promising alternative technique in order to deposit thin films for such applications. ZnS thin films had been prepared with an original chemical precursor which enable to work without ZnCl2, the traditional corrosive chemical precursor in spray pyrolysis. In addition to that, some transparent conductive oxides (TCO) had been investigated by doping ZnO and Zn1-xMgxO layers with aluminum and/or gallium. With a very high optical transparency and a resistivity as low as 10-3 Ω.cm, ZnO:Al exhibit workable properties as transparent electrodes. Indeed, inverted organic solar cells had been realized with those TCO and proved their well-functioning into such devices.

Abstract The uniformity of conductive materials is an important property in thin film electronic applications such as solar cells and light emitting diodes (LED). Such uniformity variations are often very small, invisible or below the surface of the film and thus are difficult to detect even when using high-resolution characterization devices. Thus, surface measurement instruments such as profilometer, atomic force microscope, or scanning electron microscope can all encounter remarkable challenges. The uniformity of films can also be analyzed by conductivity measurements. However, they do not provide the precise spatial uniformity information of a large area sample. To be able to investigate systematically the defects of conductive thin films an appropriate sample preparation method was constructed. In addition, a synchronized heating and IR-imaging based system (called synchronized thermography = ST) was developed to overcome the limitations of existing characterization methods. ST performance was tested and analyzed by measuring the single and multi-layer structures. In this work, Indium Tin Oxide (ITO) and poly(3,4-ethylenedioxy-thiopene):poly(styrene-sulfonate) (PEDOT: PSS) were used as examples of conductive thin films. Obtained results show that ST is capable of localizing even small defects from thin film structures based on a single IR-image. In order to make automatic identification of the defect locations and the sizes of the defects, a data processing algorithm was implemented. The performed experiments have proven ST capable of determining the conductivity of the films and the critical bending curvature of ITO. Based on thin film multi-layer PEDOT:PSS measurements, the results suggest use of the ST-method is also suitable for thickness measurements. ST with automatic data processing is a simple method to localize small defects in large-area thin film structures. This approach opens up new possibilities in measuring industrial scale manufacturing processes. / Tiivistelmä Johtavien materiaalien tasalaatuisuus on tärkeä ominaisuus ohutkalvoelektroniikan sovelluksissa kuten aurinkokennoissa ja valoa emittoivissa diodeissa (LED). Tasalaatuisuuserot ovat usein erittäin pieniä, näkymättömiä tai ne sijaitsevat pinnan alla, joten niiden havaitseminen on vaikeaa jopa korkean resoluution karakterisointivälineillä. Niinpä pintaa mittaavat laitteet kuten profilometri, atomivoimamikroskooppi ja skannaava elektronimikroskooppi kohtaavat merkittäviä haasteita. Pinnan tasalaatuisuutta voidaan analysoida myös johtavuusmittauksilla. Ne eivät kuitenkaan anna täsmällistä spatiaalista informaatiota suurista näytteistä. Johtavien ohutkalvojen rikkoutumien systemaattista tutkimista varten kehitettiin oma näytteiden käsittelymenetelmä. Lisäksi kehitettiin synkronoituun lämmitykseen ja infrapunakuvantamiseen perustuva mittaussysteemi (menetelmän nimi: synkronoitu termografia = ST), jolla pyritään ratkaisemaan nykyisten menetelmien rajoitukset. ST-menetelmää testattiin ja analysoitiin mittaamalla yksi- ja monikerroksisten kalvojen rakenteita. Indiumtinaoksidia (ITO) ja poly(3,4-etyleenidioksi-tiofeeni):poly(styreeni-sulfonaatti):a (PEDOT: PSS) käytettiin esimerkkeinä johtavista kalvoista. Tulokset osoittavat, että ST kykenee paikallistamaan pienetkin virheet ohutkalvorakenteista jopa yhden infrapunakuvan perusteella. Automaattisen tiedonkäsittelyn algoritmi implementoitiin identifioimaan virheiden paikkariippuvuuksia ja kokoja. Tehdyt kokeet osoittavat, että ST-menetelmä soveltuu kalvojen johtavuuden ja ITO:n kriittisen taivutussäteen määrittämiseen. Monikerroksisiin PEDOT:PSS rakennemittauksiin perustuen ST-menetelmä näyttäisi soveltuvan myös ohutkalvojen paksuuksien määrittämiseen. ST-menetelmä yhdistettynä automaattiseen mittaustiedon prosessointiin on yksinkertainen menetelmä paikallistamaan pieniä virheitä suuripinta-alaisilla näytteillä. Tämä lähestymistapa avaa uusia mittausmahdollisuuksia teollisuuden tuotantoprosesseihin.

In this thesis, the structural, optical, and electrical properties of wurtzite MgxZn1-xO:Al and MgxZn1-xO:Ga thin films have been investigated in dependence on Mg and dopant concentration. Among the transparent conductive oxides (TCOs), ZnO based compounds have gained renewed interest as a transparent electrode for large scale applications such as defroster windows, at panel displays, touch screens, and thin film solar cells due to low material and processing cost, non-toxicity, and suitable physical properties. In general, these applications require transparent electrodes with lowest possible resistivity of rho < 10^-3 Ohmcm and lower [1]. Recently, it has been reported that Ga and Al doped ZnO thin films can be deposited with respective resistivity of 5x10^-5 Ohmcm [2] and 3 x10^-5 Ohmcm [3] which are similar to the data obtained for other practical TCOs, i.e. the resistivity of about 4x 10^-5 Ohmcm for Sn doped In2O3 (ITO) thin films [4]. Moreover, the bandgap of ZnO can be increased by alloying with Mg offering band alignment between transparent electrode and active (or buffer) layer of the device, e.g. Cu(In,Ga)Se2 solar cells [5]. The tunable bandgap of these transparent electrodes can further increase the efficiency of the devices by avoiding energy losses in the interface region of the layers. From this point of view, this work has been aimed to investigate the doping efficiency and limits in transparent conductive (Mg,Zn)O alloys. For this purpose, the samples investigated in this work have been grown by pulsed-laser deposition (PLD) using a novel, continuous composition spread method (CCS). In general, this method allows to grow thin films with lateral composition gradient(s) [6, 7]. All MgxZn1-xO:Al and MgxZn1-xO:Ga thin films have been deposited on 2-inch in diameter glass, c- or r-plane sapphire substrates using threefold segmented PLD targets in order to grow thin films with two perpendicular, lateral composition gradients, i.e. the Mg composition is varied in one direction whereas the Al/Ga concentration is varied in a perpendicular direction [7, 8]. In order to investigate the influence of the temperature, samples grown at different substrate temperatures in the range of 25 to 600 C were investigated. The optical and electrical measurements have been carried out on (5x 5)mm^2 samples that were cut from the CCS wafers along the respective composition gradients, i.e. Mg and Al/Ga contents. Subsequently, physical properties of thin films have been analyzed for a large range of Al/Ga content between 0.5 and 7 at.%, which corresponds to doping concentrations between 2x 10^20 and 3x 10^21 cm^-3, for different Mg contents x(Mg) ranging from 0.01 to 0.1. It has been found that practically the limiting the dopant concentrations is about 2 x10^21 cm^-3. Further, the electrical data suggests, that the compensating intrinsic defect is doubly chargeable hinting to the zinc vacancy (V_Zn) as microscopic origin. Increasing the dopant concentration above 2 x10^21 cm^-3 leads to a degradation of electrical and structural properties [8]. Further, the influence of growth and annealing temperatures on structural, electrical and optical properties of the films has been studied. For that purpose, Al and Ga doped (2.5 at.% = 1x10^21 cm^-3) Mg0.05Zn0.95O thin films have been chosen from CCS samples grown at T_g = (25 - 600) C . For both doping series, the samples grown at higher temperatures exhibit better crystalline quality compared to the samples grown at lower growth temperatures. As a result, samples grown at higher temperatures reveal higher Hall mobility. For the Al-doping series, the highest free charge carrier density of n = 8.2x 10^20 cm^-3 was obtained for an Mg0.05Zn0.95O:Al thin film grown at 200 C, with corresponding Hall mobility of mu = 13.3 cm^2/Vs, a resistivity of rho = 5.7x10^-4 Ohmcm, and optical bandgap of E_g = 3.8 eV. Interestingly, the free charge carrier density of n = (5 - 8) x 10^20 cm^-3 for samples grown with T_g > 300 C is clearly higher than the value of n = 1.25 x 10^20 cm^-3 that was obtained for the high temperature grown sample, i.e. at T_g = 600 C. Furthermore, for all T_g, Al-doped films have a higher doping efficiency than the Ga-doped counterparts. In order to look deeper into the microscopic origin of this behavior, the samples were post-annealed in vacuum at 400 C. Experimental results showed that the free charge carrier density of Al-doped samples first decreased and saturated afterward with increasing annealing time. On the other hand, the free charge carrier density of the Ga-doped samples first slightly increased and saturated with increasing annealing time. For both doping series, the saturation value of n ~ 1 x 10^20 cm^-3 was very close to the data that has been observed for (i) high temperature grown samples and (ii) the solubility limit of Al in ZnO of 0.3 at.% = 1.2x 10^20 cm^-3, that has been determined by Shirouzu et al. for high temperature grown (T_g > 600 C) Al-doped ZnO [9]. Correspondingly, the optical bandgap also changed, i.e. increased (decreased) for Al- (Ga-) doping series, and approached a constant value of 3.5 0 +- 0.1 eV which is explained by generation of acceptor-like compensating defects, and the solubility limit of the dopants. From XRD data, no secondary phases were found for as-grown and post-annealed films. However, the slight improvement of crystalline quality has been observed on post-annealed samples. Further, it has been shown that the growth and annealing temperatures are important as they strongly affect the metastable state of the solid solution that samples grown at low temperature represent. The low solubility limit of the dopants, i.e. 0.3 at.% for Al in ZnO under equilibrium condition, can be increased by preparing samples by non-equilibrium growth techniques [10]. This is also consistent with experimental results of this work that Al- as well as Ga-doped metastable ZnO and (Mg,Zn)O thin films can be prepared with highest possible doping efficiency for the dopant concentration up to 2.5 at.% when growth or annealing temperatures below 400 C are used.

Transparent conductive oxides (TCOs) are key functional materials in existing and future electro-optical devices in the fields of energy efficiency, energy generation and information technology. The main application of TCOs is as thin films transparent electrodes where a combination of maximum electrical conductivity and transmittance in the visible to nearinfrared spectral range is required. However, due to the interdependence of the optical properties and the free electron density and mobility, respectively, these requirements cannot be achieved simultaneously in degenerately doped wide band-gap oxide semiconductors. Therefore, a detailed understanding of the mechanisms governing the generation of free charge carriers by extrinsic doping and the charge transport in these materials is essential for further development of high performance TCOs and corresponding deposition methods. The present work is aimed at a comprehensive investigation of the electrical, optical and structural properties as well as the elemental composition of (Al,Ga) doped ZnO and Nb doped TiO2 thin films prepared by pulsed DC reactive magnetron sputtering. The evolution of the film properties is studied in dependence of various deposition parameters through a combination of characterization techniques including Hall-effect, spectroscopic ellipsometry, spectral photometry, X-ray diffraction, X-ray near edge absorption, Rutherford backscattering spectrometry and particle induced X-ray emission. This approach resulted in the development of an alternative process control method based on the material specific current-voltage pressure characteristics of the reactive magnetron discharge which allows to precisely control the oxygen deficiency of the sputter deposited films. Based on the experimental data, models have been established that describe the room temperature charge transport properties and the dielectric function of the obtained ZnO and TiO2 based transparent conductors. On the one hand, these findings allow the prediction of material specific electron mobility limits by identifying the dominating charge carrier scattering mechanisms. On the other hand, new insight is gained into the origin of the observed transition from highly conductive to electrically insulating ZnO layers upon the incorporation of increasing concentrations of Al at elevated growth temperatures. Moreover, the Al and Ga dopant activation in ZnO have been quantified systematically for a wide range of Al concentrations and deposition conditions. A direct comparison of the Ga and Al doping efficiency demonstrates that Ga is a more efficient electron donor in ZnO. Further, it has been shown that high free electron mobilities in polycrystalline and epitaxial Nb:TiO2 layers can be achieved by reactive magnetron sputtering of TiNb alloy targets. The suppression of rutile phase formation and the control of the Nb dopant activation by fine tuning the oxygen deficiency have been identified as crucial for the growth of high quality TiO2 based TCO layers.

No description available.

The increasing energy demand, combined with the use of harmful non-renewable energy sources calls for the search of alternative methods to cover our energy need.Renewable energy can be harvested in different ways, through the movement of wind and water, biomass, or directly from the rays of the sun, as in the case of photovoltaic (PV) devices. Whilst crystalline silicon (c-Si) is the most common absorber used for solar cells, other technologies are emerging. Solar cells with copper indium gallium diselenide (CIGS) as an absorber have the possibility of being flexible, which is an advantage due to the many more application possibilities that appear compared to the rigid and heavy c-Si solar cells. CIGS solar cells have some long-term stability issues, especially regarding ingression of atmospheric species through the front contact layer. This calls for further research in the front contact of the CIGS solar cell, exploring alternative materials to prevent degradation. The front contact of a solar cell must be both optically transparent and conduct electricity. Transparent conductive oxides (TCO) are materials characterized by the ability to conduct electricity, while also possessing a certain degree of optical transparency. The combination of conductivity and transparency makes TCOs ideal as front contacts in solar cells. A very common TCO for front contacts in CIGS solar cells is aluminum-doped zinc oxide (AZO) due to its low cost, good electrical conductivity and optical transparency. Because of its low resistance to degradation in humid environments more robust TCO alternatives, such as indium-doped tin oxide (ITO), are being investigated. Indium-doped tin oxide possesses similar electrical and optical properties as AZO, but better stability in humid environments.The ITO was deposited through RF magnetron sputtering, on a glass substrate to be able to measure optical properties. Initially, experiments focusing on oxygen content in the deposition atmosphere were done, together with a reproducibility experiment. This gave useful information about sputtering parameters and stability of the deposition. Thereon, an experiment was done varying three parameters: oxygen content in deposition atmosphere, sputtering power and temperature of substrate. A statistical software was used to analyze the data, identifying the effects of the changing parameters. The best performing samples were made with an oxygen content of 0,4-0,6 vol%. A high sensibility for oxygen in the system was also observed, as a result of the initial reproducibility experiments. This led to the introduction of a sacrificial deposition step after the machine had been shut down. Optimal substrate temperature was around 150°Cand it was not possible to go higher due to sensibility of the underlying solar cell layers.A lower threshold for the film thickness, located somewhere between 125 and 175 nm, was observed. Films with thickness below this threshold experienced a large resistivityincrease. Further depositions with higher oxygen content are advised to see if the properties of the films further improve.

Perovskit solceller (PSCs) är kända som 'ljusomvandling' enheter med ökad omvandlingseffektivitiet (PCE). PSCs är kända för detta flexibilitet och hög tolerans mot defekter och består av fem lager med olika material och egenskaper. De fem lagren är följande; transparant elektrod, elektron ledande lager (ETL), perovskit lager, hål ledande lager (HTL) och metallelektroden.  Detta forskningsarbete fokuserar på metallelektroden (Cu-tunn film), HTL (CuI-tunn film) och det aktiva lagret (CuI-komplex).  Syftet med denna studie är att undersöka effekten av olika tjocklekar på ytans morfologi och grovhet för att se mängden jod som tränger sig genom filmen genom att beräkna volymen.  Resultatet av denna studie visar att ökad tjocklek leder till ökad grovhet. Man ser även att en ökad tjocklek leder till ett mer homogent och jämn yta, och dessutom ökar kornstorleken, vilket tyder på att kvaliten av kristallisationen förbättras.  Slutligen, genom att känna till tjockleken och storleken (arean) på ytan av proverna kunde man beräkna volymen för att indikera mängden jod som trängt sig genom filmen. Resultatet av denna del indikerade att ju tjockare provet är, desto mer kommer jod att tränga sig genom filmen. / Perovskite solar cells (PSCs) are known as light-harvesting devices with increased power conversion efficiencies (PCE). PSCs are known for their flexibility and high tolerance towards defects. It consists of five different layers with different materials and functions. Transparent electrode, electron transport layer (ETL) , perovskite or active layer , hole transport layer (HTL) and metallic electrode. In this research project, the focus is directed towards the metallic electrode (Cu-thin film), hole transport layer (CuI-thin film) and the active layer (CuI-complex). The purpose of this study is to investigate the effect of different thicknesses on the surface morphology and roughness and to see how much iodine is diffusing through the film by calculating the volume.  The results of this project present that the increase in thickness leads to an increase in roughness. It also shows that an increase in thickness leads to a more homogeneous and uniform surface and in addition the grain size increases which indicates that the quality of crystallization improves. Finally, by knowing the thickness and surface area of the samples the volume was calculated to indicate how much iodine is diffusing through the film and the results for this part indicated that the thicker the sample, more iodine will diffuse through the film.

No description available.

No description available.

Im Fokus der vorliegenden Arbeit lag die Untersuchung polykristalliner TiO2:Ta-Schichten, hergestellt mittels Gleichstrom-Magnetron-Sputtern durch Verwendung reduzierter keramischer Targets und anschließender thermischer Nachbehandlung im Vakuum der zunächst nichtleitfähigen amorphen Precursorschichten. Es wurden die physikalischen Zusammenhänge, welche die strukturellen, elektrischen und optischen Eigenschaften der kristallinen TiO2:Ta-Schichten beeinflussen analysiert und dabei eine empfindliche Abhängigkeit vom Sauerstofffluss während der Abscheidung festgestellt. Es zeigte sich, dass die Verringerung der kinetischen Energie der Plasmateilchen beim Magnetron-Sputtern durch die Erhöhung des Gesamtdruckes vorteilhaft ist, um das Wachstum des gegenüber Rutil besser leitfähigen Anatas in Verbindung mit dem für niedrige Widerstände notwendigen Sauerstoffdefizit zu realisieren. Bei einem Gesamtdruck von 2 Pa abgeschiedene polykristalline TiO2:Ta-Schichten haben einen spezifischen Widerstand von 1,5·10-3 Ωcm, eine hohe Ladungsträgermobilität (≈8 cm2V-1s-1) und einen geringen Extinktionskoeffizienten von 0,006. Die Abhängigkeit des elektrischen Widerstandes vom Sauerstoffdefizit in der TiO2:Ta-Schicht wurde unter dem Gesichtspunkt der Ladungsträgeraktivierung sowie der Bildung von Ti-Fehlstellen diskutiert, welche vermutlich zur Kompensation und Lokalisierung von freien Elektronen beitragen. Darüber hinaus wurde zur effizienteren Gestaltung der thermischen Nachbehandlung die konventionelle Vakuumtemperung erstmalig erfolgreich durch die Blitzlampentemperung ersetzt. / The work is focused on understanding the physical processes responsible for the modification of the structural, electrical and optical properties of polycrystalline TiO2:Ta films formed by vacuum annealing of initially not conductive amorphous films deposited by direct current magnetron sputtering. It is shown that the oxygen deficiency of amorphous and annealed TiO2:Ta films, respectively, is critical to achieve low resistivity and high optical transmittance of the crystalline films. Increasing the total pressure during magnetron sputter deposition is shown to be beneficial to achieve the desired oxygen deficient anatase growth, which is discussed in terms of energetic particle bombardment. Polycrystalline anatase TiO2:Ta films of low electrical resistivity (1,5·10-3 Ωcm), high free electron mobility (≈8 cm2V-1s-1), and low extinction (0,006) are obtained in this way at a total pressure of 2 Pa. The dependence of the polycrystalline film electrical properties on the oxygen content is discussed in terms of Ta dopant electrical activation as well as transport limiting processes taking into account the formation of Ti-vacancies. In addition, the conventional vacuum annealing has been successfully substituted by the flash lamp annealing in the millisecond range.