Metal alkoxides have been known for many years. Recently, a renewed interest in these compounds has arisen as they have been found to be viable precursors for metal oxide film synthesis. Lead zirconium titanate(PZT) films have shown promise for many applications in the electronics industry. Chemical vapor deposition(CVD) of PZT thin films has been hampered by the lack of a suitable zirconium precursor for low temperature chemical vapor deposition. Currently, both zircbnium alkoxides and zirconium β-diketonate complexes are employed in the CVD process of PZT films. The alkoxides, although volatile are moisture sensitive and are not easily handled under normal atmospheric conditions. Tetrakis β-diketonate complexes of zirconium are more stable than the alkoxides, but they have a deposition temperature that is too high for commercial use. A mixed (β-diketonate)zirconium alkoxide compound could provide the necessary stability while maintaining the volatility necessary for low temperature CVD. From the above reasoning, it was decided to prepare a zirconium di-(2,2,6,6 tetramethyl-3,5 heptadione) di-tert-butoxide compound. The compound was characterized and subjected to a variety of volatility studies. Thermogravimetric analysis provided evidence that the compound was volatile enough to be used in thin film synthesis. Initial attempts at film deposition, however, resulted in no film growth. Changing deposition parameters also resulted in no film growth. Visual inspection of the residue left after the deposition trials gave the first indication that the compound had undergone some change. Analysis of the material left in the reactor suggested the formation of a zirconium cluster compound. Further decomposition studies also resulted in the formation of the same zirconium cluster compound. Attempts to make the compound more stable at deposition temperatures centered on changing the alkoxide. Tri-tert-butyl alcohol(tritox) was prepared, however, the synthesis of the tritox - β-diketonate zirconium complex was unsuccessful. Other changes involved using pivalic acid to replace the alkoxide. Reactions with pivalic acid and zirconium di-(2,2,6,6 tetramethyl-3,5 heptadione) di-tert-butoxide resulted in the decomposition of the starting material. Other β-diketonate complexes were also investigated. Compounds synthesized from 2.4 pentadione(Acac), 1-benzoyl acetone(Bzac) and dibenzoyl methane(Dbzm) could not be purified in order to subject them to chemical vapor deposition. A zirconium complex with two different β-diketonate ligands was also synthesized. The complex was not investigated as a precursor for chemical vapor deposition because the isomers of the complex could not be separated. / Master of Science

Yes / Herein, we report 31 new β-diketonate titanium compounds of the type [Ti(O,O)2X2], whereby O,O = asymmetric or symmetric β-diketonate ligand and X = Cl, Br, OEt or OiPr. Thirteen new crystal structures are discussed and show that these octahedral species all adopt cis geometries in the solid state. These compounds have been tested for their cytotoxicity using SRB and MTT assays, showing several of the compounds are as potent as cisplatin against a range of tumour cell lines. Results also show the [Ti(O,O)2Br2] complexes are more potent than [Ti(O,O)2Cl2], [Ti(O,O)2(OEt)2] and [Ti(O,O)2(OiPr)2]. Using a simple symmetrical heptane-3,5-dione (O,O) ligand bound to titanium, we observed more than a 50-fold increase in potency with the [Ti(O,O)2Br2] (28) when compared to [Ti(O,O)2Cl2] (27). One of the more potent compounds (6) has been added to three different sixmers of DNA, in order to analyse the potential DNA binding of the compound. NMR studies have been carried out on the compounds, in order to understand the structural properties and the species formed in solution during the in vitro cell assays.

The syntheses and characterization of the palladium complexes [Pd(accp)2] (7), [Pd(acch)2] (8), [Pd(η3-CH2CMeCH2)(accp)] (11), [Pd(η3-CH2CMeCH2)(acch)] (12), [Pd(η3-CH2CtBuCH2)(accp)] (13) and [Pd(η3-CH2CtBuCH2)(acch)] (14) (accp = 2-acetylcyclopentanoate; acch = 2-acetylcyclohexanoate) are reported. These complexes are available by the reaction of Haccp (2-acetylcyclopentanone) and Hacch (2-acetylcyclohexanone) with Na2[Pd2Cl6] forming 7 and 8 or with [(Pd(η3-CH2CRCH2)(μ-Cl))2] (9, R = Me; 10, R = tBu) forming 11–14. The molecular structures of 7, 8 and 14 are discussed. Complexes 7 and 8 consist of a square-planar coordinated Pd atom with two trans-positioned bidentate β-diketonate ligands. The asymmetric unit of 14 exhibits one molecule of the palladium complex and a half molecule of water. The thermal behavior of 7, 8 and 11–14 and their vapor pressure data were investigated to show, if the appropriate complexes are suited as CVD precursors for palladium layer formation. Thermogravimetric studies showed the evaporation of the complexes at atmospheric pressure upon heating. The vapor pressure of 7, 8 and 11–14 was measured by using thermogravimetric analysis, giving vapor pressure values ranging from 0.62 to 2.22 mbar at 80 °C. Chemical vapor deposition studies were carried out applying a vertical cold wall CVD reactor. Either oxygen or forming gas (N2/H2, ratio 90/10, v/v) was used as reactive gas. Substrate temperatures of 350 and 380 °C were utilized. With 11–14 dense and conformal as well as particulate palladium films were obtained, as directed by SEM studies, whereas 7 and 8 failed to give thin films, which is probably attributed to their high thermal stability in the gas phase. For all deposited layers, XPS measurements confirmed the partial oxidation of palladium to palladium(II) oxide at 380 °C, when oxygen was used as reactive gas. In contrast, thin layers of solely metallic palladium were obtained utilizing forming gas during the deposition experiments. / Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.

The syntheses and characterization of the palladium complexes [Pd(accp)2] (7), [Pd(acch)2] (8), [Pd(η3-CH2CMeCH2)(accp)] (11), [Pd(η3-CH2CMeCH2)(acch)] (12), [Pd(η3-CH2CtBuCH2)(accp)] (13) and [Pd(η3-CH2CtBuCH2)(acch)] (14) (accp = 2-acetylcyclopentanoate; acch = 2-acetylcyclohexanoate) are reported. These complexes are available by the reaction of Haccp (2-acetylcyclopentanone) and Hacch (2-acetylcyclohexanone) with Na2[Pd2Cl6] forming 7 and 8 or with [(Pd(η3-CH2CRCH2)(μ-Cl))2] (9, R = Me; 10, R = tBu) forming 11–14. The molecular structures of 7, 8 and 14 are discussed. Complexes 7 and 8 consist of a square-planar coordinated Pd atom with two trans-positioned bidentate β-diketonate ligands. The asymmetric unit of 14 exhibits one molecule of the palladium complex and a half molecule of water. The thermal behavior of 7, 8 and 11–14 and their vapor pressure data were investigated to show, if the appropriate complexes are suited as CVD precursors for palladium layer formation. Thermogravimetric studies showed the evaporation of the complexes at atmospheric pressure upon heating. The vapor pressure of 7, 8 and 11–14 was measured by using thermogravimetric analysis, giving vapor pressure values ranging from 0.62 to 2.22 mbar at 80 °C. Chemical vapor deposition studies were carried out applying a vertical cold wall CVD reactor. Either oxygen or forming gas (N2/H2, ratio 90/10, v/v) was used as reactive gas. Substrate temperatures of 350 and 380 °C were utilized. With 11–14 dense and conformal as well as particulate palladium films were obtained, as directed by SEM studies, whereas 7 and 8 failed to give thin films, which is probably attributed to their high thermal stability in the gas phase. For all deposited layers, XPS measurements confirmed the partial oxidation of palladium to palladium(II) oxide at 380 °C, when oxygen was used as reactive gas. In contrast, thin layers of solely metallic palladium were obtained utilizing forming gas during the deposition experiments. / Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.

The present thesis describes the synthesis and characterization of magnesium, copper, and iron complexes and their application in the MOCVD (Metal-Organic Chemical Vapor Deposition) process, as well as the synthesis and characterization of yttrium and gadolinium complexes and their use as spin-coating precursors for metal oxide thin layer formation. The objective of this scientific work is the development of the family of bis(β-ketoiminato) magnesium(II) complexes and a series of heteroleptic β-ketoiminato copper(II) precursors for the formation of magnesium oxide and copper/copper oxide layers by using the MOCVD process. Modifications of the ketoiminato ligands affect the physical and chemical properties of the respective complexes. Another central theme of this work is the development of β-diketonato iron(III) complexes for the deposition of carbon-free gamma- and alpha-Fe2O3 layers via MOCVD. The thermal behavior and vapor pressure of the precursors could be influenced by the variation of the β-diketonate ligands. In addition, the synthesis and characterization of yttrium and gadolinium β-diketonates and their use as spin-coating precursors are described. Field-effect transistors were successfully fabricated by the deposition of carbon nanotubes on top of the Y2O3 films.

Conselho Nacional de Pesquisa e Desenvolvimento Científico e Tecnológico - CNPq / In this work a theoretical study was carried out to investigate the spectroscopic properties of trivalent europium complexes. The study was divided into two parts. The first one was the study of the luminescent efficiency of five complexes which had as ligands β-diketones and pyrazole. Pyrazole modifications were made promoting a gradual increase in the amount of fluorine atoms in the search for systems with greater luminescence. The second part was the study of structural elucidation and luminescent efficiency of two Eu3+ complexes, which showed as ligand the molecule of ibuprofen and methylbipyridine. The difference between the two systems was that in one complex the methyl group of bipyridine was in the meta position and in the other in the para position. Semiempirical methodologies such as the Sparkle models, the INDO/S-CIS method, the Judd-Ofelt theory and the energy transfer models proposed by Malta et al were used to certify this. The theories and models used to treat the spectroscopic properties of these systems are implemented in the LUMPAC - Luminescence Package, which was used in this study. In the first part, an evaluation of calculation models of the ground state geometry more suitable for the study and from comparisons with crystallographic structures the model that presented smaller error was the Sparkle/PM3. From the results obtained, it has been seen that the luminescence intensity of the Eu3+ complexes increases when the C-H bonds are replaced by C-F bonds, and more strongly when CF2 groups are added. Further extension in the length of the fluorinated chain greatly decreases the rate of nonradiative decay and increases the rate of radiative decay, thereby increasing the quantum efficiency of the complex. The results obtained were theoretically compared with the experimental results and showed good agreement. In the second part of the work, no evaluation of the geometry calculation model was performed, since it is a system that does not have certain crystallographic structures. Thus, the RM1 model was used to optimize the geometry, since it is a recent model that satisfactorily treats lanthanide systems. The results obtained did not show much difference, that is, the position of the methyl group in the meta or para position in the bipyridine linker does not cause considerable effect on the coordination polyhedron. However, they presented higher radiative decay rates than the rates of non-radiative decay and high quantum efficiency. Finally, the good agreement between the theoretical results and the experimental results is a strong indicatio / Neste trabalho foi realizado um estudo teórico para a investigação das propriedades espectroscópicas de complexos de európio trivalente. O estudo foi dividido em duas partes. Na primeira foi feito o estudo da eficiência luminescente de cinco complexos os quais tinham como ligantes β-dicetonas e pirazol, sendo que no pirazol foram realizadas modificações promovendo um aumento gradativo na quantidade de átomos de flúor na busca por sistemas com maior luminescência. Na segunda parte foi feito o estudo de elucidação estrutural e da eficiência luminescente de dois complexos de Eu3+, os quais apresentavam como ligante a molécula de ibuprofeno e a metilbipiridina. A diferença entre os dois sistemas era que em um complexo o grupo metil da bipiridina estava na posição meta e no outro na posição para. Para isto, foram utilizadas metodologias semiempíricas, tais como os modelos Sparkle, o método INDO/S-CIS, a teoria de Judd-Ofelt e os modelos transferência de energia propostos por Malta e colaboradores. As teorias e modelos utilizados para tratar das propriedades espectroscópicas destes sistemas, estão implementados no pacote computacional LUMPAC – Luminescence Package, o qual foi utilizado neste estudo. Na primeira parte, fez-se uma avaliação dos modelos de cálculo da geometria do estado fundamental mais adequada para o estudo e a partir de comparações com estruturas cristalográficas o modelo que apresentou menor erro foi o Sparkle/PM3. A partir dos resultados obtidos, foi visto que a intensidade de luminescência dos complexos de Eu3+ aumenta quando as ligações C-H são substituídas por ligações C-F, e mais fortemente quando grupos CF2 são adicionados. A extensão adicional no comprimento da cadeia fluorada diminui fortemente a taxa de decaimento não radiativo e aumenta a taxa de decaimento radiativo, aumentando dessa maneira a eficiência quântica do complexo. Os resultados obtidos teoricamente foram comparados com os resultados experimentais e apresentaram boa concordância. Na segunda parte do trabalho, não foi realizado avaliação de modelo de cálculo de geometria, por se tratar de sistemas que não apresentam estruturas cristalográficas determinadas. Assim, foi utilizado o modelo RM1 para otimização da geometria, por se tratar de um modelo recente que trata de maneira satisfatória sistemas lantanídicos. Os resultados obtidos não apresentaram muita diferença, ou seja, a posição do grupo metil na posição meta ou para no ligante bipiridina não causa efeito considerável sobre o poliedro de coordenação. No entanto, apresentaram taxas de decaimento radiativo maiores do que as taxas de decaimento não radiativo e elevada eficiência quântica. Por fim, a boa concordância entre os resultados teóricos e os resultados experimentais é um forte indício que as estruturas propostas correspondem aos sistemas sintetizados. / São Cristóvão, SE

This article has been published online on 21st May 2014, in Journal of Vacuum Science & Technology A: Vac (Vol.32, Issue 4): http://scitation.aip.org/content/avs/journal/jvsta/32/4/10.1116/1.4878815?aemail=author DOI: 10.1116/1.4878815 This article may be accessed via the issue's table of contents at this link: http://scitation.aip.org/content/avs/journal/jvsta/32/4?aemail=author The surface chemistry of the bis(tri-n-butylphosphane) copper(I) acetylacetonate, [(nBu3P)2Cu(acac)], and the thermal atomic layer deposition (ALD) of Cu2O using this Cu precursor as reactant and wet oxygen as co-reactant on SiO2 substrates are studied by in-situ X-ray photoelectron spectroscopy (XPS). The Cu precursor was evaporated and exposed to the substrates kept at temperatures between 22 °C and 300 °C. The measured phosphorus and carbon concentration on the substrates indicated that most of the [nBu3P] ligands were released either in the gas phase or during adsorption. No disproportionation was observed for the Cu precursor in the temperature range between 22 °C and 145 °C. However, disproportionation of the Cu precursor was observed at 200 °C, since C/Cu concentration ratio decreased and substantial amounts of metallic Cu were present on the substrate. The amount of metallic Cu increased, when the substrate was kept at 300 °C, indicating stronger disproportionation of the Cu precursor. Hence, the upper limit for the ALD of Cu2O from this precursor lies in the temperature range between 145 °C and 200 °C, as the precursor must not alter its chemical and physical state after chemisorption on the substrate. 500 ALD cycles with the probed Cu precursor and wet O2 as co reactant were carried out on SiO2 at 145 °C. After ALD, in situ XPS analysis confirmed the presence of Cu2O on the substrate. Ex-situ spectroscopic ellipsometry indicated an average film thickness of 2.5 nm of Cu2O deposited with a growth per cycle of 0.05 Å/cycle. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) investigations depicted a homogeneous, fine, and granular morphology of the Cu2O ALD film on SiO2. AFM investigations suggest that the deposited Cu2O film is continuous on the SiO2 substrate.

This article has been published online on 21st May 2014, in Journal of Vacuum Science & Technology A: Vac (Vol.32, Issue 4): http://scitation.aip.org/content/avs/journal/jvsta/32/4/10.1116/1.4878815?aemail=author DOI: 10.1116/1.4878815 This article may be accessed via the issue's table of contents at this link: http://scitation.aip.org/content/avs/journal/jvsta/32/4?aemail=author The surface chemistry of the bis(tri-n-butylphosphane) copper(I) acetylacetonate, [(nBu3P)2Cu(acac)], and the thermal atomic layer deposition (ALD) of Cu2O using this Cu precursor as reactant and wet oxygen as co-reactant on SiO2 substrates are studied by in-situ X-ray photoelectron spectroscopy (XPS). The Cu precursor was evaporated and exposed to the substrates kept at temperatures between 22 °C and 300 °C. The measured phosphorus and carbon concentration on the substrates indicated that most of the [nBu3P] ligands were released either in the gas phase or during adsorption. No disproportionation was observed for the Cu precursor in the temperature range between 22 °C and 145 °C. However, disproportionation of the Cu precursor was observed at 200 °C, since C/Cu concentration ratio decreased and substantial amounts of metallic Cu were present on the substrate. The amount of metallic Cu increased, when the substrate was kept at 300 °C, indicating stronger disproportionation of the Cu precursor. Hence, the upper limit for the ALD of Cu2O from this precursor lies in the temperature range between 145 °C and 200 °C, as the precursor must not alter its chemical and physical state after chemisorption on the substrate. 500 ALD cycles with the probed Cu precursor and wet O2 as co reactant were carried out on SiO2 at 145 °C. After ALD, in situ XPS analysis confirmed the presence of Cu2O on the substrate. Ex-situ spectroscopic ellipsometry indicated an average film thickness of 2.5 nm of Cu2O deposited with a growth per cycle of 0.05 Å/cycle. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) investigations depicted a homogeneous, fine, and granular morphology of the Cu2O ALD film on SiO2. AFM investigations suggest that the deposited Cu2O film is continuous on the SiO2 substrate.