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Photon Quantum Noise Limited Pixel and Array architectures in a-Si Technology for Large Area Digital Imaging ApplicationsYeke Yazdandoost, Mohammad January 2011 (has links)
A Voltage Controlled Oscillator (VCO) based pixel and array architecture is reported using amorphous silicon (a-Si) technology for large area digital imaging applications. The objectives of this research are to (a) demonstrate photon quantum noise limited pixel operation of less than 30 input referred noise electrons, (b) theoretically explore the use of the proposed VCO pixel architecture for photon quantum noise limited large area imaging applications, more specifically protein crystallography using a-Si, (c) to implement and demonstrate experimentally a quantum noise limited (VCO) pixel, a small prototype of quantum noise limited (VCO) pixelated array and a quantum noise limited (VCO) pixel integrated with direct detection selenium for energies compatible with a protein crystallography application.
Electronic noise (phase noise) and metastability performance of VCO pixels in low cost, widely available a-Si technology will be theoretically calculated and measured for the first time in this research. The application of a VCO pixel architecture in thin film technologies to large area imaging modalities will be examined and a small prototype a-Si array integrated with an overlying selenium X-ray converter will be demonstrated for the first time.
A-Si and poly-Si transistor technologies are traditionally considered inferior in performance to crystalline silicon, the dominant semiconductor technology today. This work
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aims to extend the reach of low cost, thin film transistor a-Si technology to high performance analog applications (i.e. very low input referred noise) previously considered only the domain of crystalline silicon type semiconductor. The proposed VCO pixel architecture can enable large area arrays with quantum noise limited pixels using low cost thin film transistor technologies.
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Photon Quantum Noise Limited Pixel and Array architectures in a-Si Technology for Large Area Digital Imaging ApplicationsYeke Yazdandoost, Mohammad January 2011 (has links)
A Voltage Controlled Oscillator (VCO) based pixel and array architecture is reported using amorphous silicon (a-Si) technology for large area digital imaging applications. The objectives of this research are to (a) demonstrate photon quantum noise limited pixel operation of less than 30 input referred noise electrons, (b) theoretically explore the use of the proposed VCO pixel architecture for photon quantum noise limited large area imaging applications, more specifically protein crystallography using a-Si, (c) to implement and demonstrate experimentally a quantum noise limited (VCO) pixel, a small prototype of quantum noise limited (VCO) pixelated array and a quantum noise limited (VCO) pixel integrated with direct detection selenium for energies compatible with a protein crystallography application.
Electronic noise (phase noise) and metastability performance of VCO pixels in low cost, widely available a-Si technology will be theoretically calculated and measured for the first time in this research. The application of a VCO pixel architecture in thin film technologies to large area imaging modalities will be examined and a small prototype a-Si array integrated with an overlying selenium X-ray converter will be demonstrated for the first time.
A-Si and poly-Si transistor technologies are traditionally considered inferior in performance to crystalline silicon, the dominant semiconductor technology today. This work
v
aims to extend the reach of low cost, thin film transistor a-Si technology to high performance analog applications (i.e. very low input referred noise) previously considered only the domain of crystalline silicon type semiconductor. The proposed VCO pixel architecture can enable large area arrays with quantum noise limited pixels using low cost thin film transistor technologies.
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Modelo para escolha de topologias de sensores de pixeis ativos logarítmicos adequadas para implementação de sensores de imagem com largo alcance dinâmicoOliveira, Ewerton Gomes 18 April 2016 (has links)
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Previous issue date: 2016-04-18 / This work presents a study on the behavior and effectiveness of different Fixed-Pattern Noise
(FPN) reduction techniques applied to different pixel topologies operating in logarithmic
mode. The purpose of such study is the establishment of a consistent way to perform
fair cross comparison of the effectiveness of different FPN attenuation techniques applied
to pixels with different topologies and designed in the same technological node, and
thus establish judgment criteria for determining which topology will be most suitable
for implementation of an image sensor operating in logarithimic mode. Investigations of
the effectiveness of two similar FPN reduction techniques applied to four different pixel
topologies were performed through Monte Carlo simulations. The analyses of results of
output signal swing, total and residual FPN, signal-to-distortion ratio, power consumption
and fill factor are able to demonstrate which pixel topologies yield better results in each
of these criteria. Such results provide valuable data that allows a more concise decision on
which pixel topology and FPN reduction technique to choose in the design of an imager
array with wide dynamic range. / Este trabalho apresenta um estudo sobre o comportamento e eficácia de diferentes técnicas
de redução de ruído de padrão fixo, do inglês fixed-pattern noise (FPN), aplicadas a
diferentes topologias de pixel operando em modo logarítmico. A finalidade deste estudo
é o estabelecimento de um meio consistente para realizar comparação cruzada imparcial
da eficácia de diferentes técnicas de redução de FPN aplicadas a pixeis com diferentes
topologias e projetados sob o mesmo rótulo tecnológico, e assim estabelecer critérios
de julgamento que permitam determinar qual topologia será a mais adequada para
implementação de um sensor de imagem operando em modo logarítmico. Investigações
da eficácia de duas técnicas de redução de FPN similares aplicadas a quatro diferentes
topologias de pixel foram realizadas através de simulações Monte Carlo. As análises dos
resultados de excursão do sinal de saída, FPN total e residual, razão de distorção do sinal,
consumo de energia e fator de preenchimento são capazes de demonstrar que topologias
de pixel produzem melhores resultados em cada um destes critérios. Tais resultados
proporcionam dados valiosos que permitem uma mais concisa decisão sobre qual topologia
de pixel e técnica de redução de FPN escolher no projeto de um sensor de imagem com
largo alcance dinâmico.
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Study of macroscopic and microscopic homogeneity of DEPFET X-ray detectors / Untersuchung der makroskopischen und mikroskopischen Homogenität von DEPFET-RöntgendetektorenBergbauer, Bettina 15 January 2016 (has links) (PDF)
For the X-ray astronomy project Advanced Telescope for High ENergy Astrophysics (Athena) wafer-scale DEpleted P-channel Field Effect Transistor (DEPFET) detectors are proposed as Focal Plane Array (FPA) for the Wide Field Imager (WFI). Prototype structures with different pixel layouts, each consisting of 64 x 64 pixels, were fabricated to study four different DEPFET designs. This thesis reports on the results of the electrical and spectroscopic characterization of the different DEPFET designs. With the electrical qualification measurements the transistor properties of the DEPFET structures are investigated in order to determine whether the design intentions are reflected in the transistor characteristics. In addition, yield and homogeneity of the prototypes can be studied on die, wafer and batch level for further improvement of the production technology with regard to wafer-scale devices. These electrical characterization measurements prove to be a reliable tool to preselect the best detector dies for further integration into full detector systems. The spectroscopic measurements test the dynamic behavior of the designs as well as their spectroscopic performance. In addition, it is revealed how the transistor behavior translates into the detector performance. This thesis, as the first systematic study of different DEPFET designs on die and detector level, shows the limitations of the current DEPFET assessment methods. Thus, it suggests a new concise characterization procedure for DEPFET detectors as well as guidelines for expanded testing in order to increase the general knowledge of the DEPFET. With this study of four different DEPFET variants not only designs suitable for Athena mission have been found but also improvement impulses for the starting wafer-scale device production are provided.
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Study of macroscopic and microscopic homogeneity of DEPFET X-ray detectorsBergbauer, Bettina 17 December 2015 (has links)
For the X-ray astronomy project Advanced Telescope for High ENergy Astrophysics (Athena) wafer-scale DEpleted P-channel Field Effect Transistor (DEPFET) detectors are proposed as Focal Plane Array (FPA) for the Wide Field Imager (WFI). Prototype structures with different pixel layouts, each consisting of 64 x 64 pixels, were fabricated to study four different DEPFET designs. This thesis reports on the results of the electrical and spectroscopic characterization of the different DEPFET designs. With the electrical qualification measurements the transistor properties of the DEPFET structures are investigated in order to determine whether the design intentions are reflected in the transistor characteristics. In addition, yield and homogeneity of the prototypes can be studied on die, wafer and batch level for further improvement of the production technology with regard to wafer-scale devices. These electrical characterization measurements prove to be a reliable tool to preselect the best detector dies for further integration into full detector systems. The spectroscopic measurements test the dynamic behavior of the designs as well as their spectroscopic performance. In addition, it is revealed how the transistor behavior translates into the detector performance. This thesis, as the first systematic study of different DEPFET designs on die and detector level, shows the limitations of the current DEPFET assessment methods. Thus, it suggests a new concise characterization procedure for DEPFET detectors as well as guidelines for expanded testing in order to increase the general knowledge of the DEPFET. With this study of four different DEPFET variants not only designs suitable for Athena mission have been found but also improvement impulses for the starting wafer-scale device production are provided.
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