The electrical properties of nanowire-based n-InSb-n-InAs heterojunctions grown by chemical beam epitaxy were investigated both theoretically and experimentally. This heterostructure presented a type-III band alignment with the band bendings at 0.12 eV for InAs side and 0.16 − 0.21 eV in InSb. Analysis of the temperature dependent current voltage characteristics showed that the current through the heterojunction is caused mostly by generation-recombination processes in the InSb and at the heterointerface. Due to the partially overlapping valence band of InSb and the conduction band of InAs, the second process was fast and activationless. Theoretical analysis showed that, depending on the heterojunction parameters, the flux of non-equilibrium minority carriers may have a different direction, explaining the experimentally observed non-monotonic coordinate dependence of the electron beam induced current at the vicinity of heterointerface.

The electrical properties of nanowire-based n-InSb-n-InAs heterojunctions grown by chemical beam epitaxy were investigated both theoretically and experimentally. This heterostructure presented a type-III band alignment with the band bendings at 0.12 eV for InAs side and 0.16 − 0.21 eV in InSb. Analysis of the temperature dependent current voltage characteristics showed that the current through the heterojunction is caused mostly by generation-recombination processes in the InSb and at the heterointerface. Due to the partially overlapping valence band of InSb and the conduction band of InAs, the second process was fast and activationless. Theoretical analysis showed that, depending on the heterojunction parameters, the flux of non-equilibrium minority carriers may have a different direction, explaining the experimentally observed non-monotonic coordinate dependence of the electron beam induced current at the vicinity of heterointerface.

Thin films of Teflon AF have been directly patterned by electron-beam lithography without the need for post exposure chemical development. The relationship between pattern depth and exposure dose was found to be linear over a wide range of doses. Pattern depth was also observed to be dependent on initial film thickness. Teflon AF can be directly patterned at doses similar to typical e-beam resists. High resolution features as small as ~200 nm have been resolved. FTIR measurements revealed that CF3 and fluorinated dioxole groups play a significant role in the patterning mechanism. Teflon AF films also exhibited an increase in refractive index upon exposure to the electron-beam. This property has been exploited in waveguiding applications. Waveguides in Teflon AF were patterned using direct electron beam lithography technique. Waveguides were clearly visible to the naked eye. Characterization in the visible region showed evidences of light guiding through the waveguides. However light could not cross the entire chip. Characterization in the infrared region revealed the slab mode even though individual waveguides were not detected.

ABSTRACT PRODUCTION OF CARBON NANOTUBES BY CHEMICAL VAPOR DEPOSITION Ayhan, Umut BariS M.S., Department of Chemical Engineering Supervisor: Prof. Dr. G&uuml / ng&ouml / r G&uuml / nd&uuml / z Co-Supervisor: Assoc. Prof. Dr. Burhanettin &Ccedil / i&ccedil / ek July 2004, 75 pages Carbon nanotubes, which is one of the most attractive research subject for scientists, was synthesized by two different methods: Chemical vapor deposition (CVD), a known method for nanotube growth, and electron beam (e-beam), a new method which was used for the first time for the catalytic growth of carbon nanotubes. In both of the methods, iron catalyst coated silica substrates were used for the carbon nanotube growth, that were prepared by the Sol-Gel technique using aqueous solution of Iron (III) nitrate and tetraethoxysilane. The catalytic substrates were then calcined at 450 &deg / C under vacuum and iron was reduced at 500&deg / C under a flow of nitrogen and hydrogen. In CVD method the decomposition of acetylene gas was achieved at 600 &deg / C and 750 &deg / C and the carbon was deposited on the iron catalysts for nanotube growth. However, in e-beam method the decomposition of acetylene was achieved by applying pulsed high voltage on the gas and the carbon deposition on the silica substrate were done. The samples from both of the methods were characterized using transmission electron microscopy (TEM) and Raman spectroscopy techniques. TEM images and Raman spectra of the samples show that carbon nanotube growth has been achieved in both of the method. In TEM characterization, all nanotubes were found to be multi-walled carbon nanotubes (MWNT) and no single-walled carbon nanotubes (SWNT) were pictured. However, the Raman spectra show that there are also SWNTs in some of the samples.

No description available.

Electron beam therapy planning and custom electron bolus design were identified as areas in which improvements in equipment and techniques could lead to significant improvements in treatment delivery and patient outcomes. The electron pencil beam algorithms used in conventional Treatment Planning Systems do not accurately model the dose distribution in irregularly shaped objects, near oblique surfaces or in inhomogeneous media. For this reason, at Christchurch Oncology Centre the TPS is not relied on for planning electron beam treatments. This project is an initial study of ways to improve the design of custom electron bolus, the planning of electron beam therapy, and other radiation therapy simulation tasks, by developing a system for the accurate assessment of dose distributions under irregular contours in clinically relevant situations. A shaped water phantom system and a diode array have been developed and tested. The design and construction of this water phantom dosimetry system are described, and its capabilities and limitations discussed. An EGS/BEAM Monte Carlo simulation system has been installed, and models of the Christchurch Oncology Centre linacs in 6MeV and 9MeV electron beam modes have been built and commissioned. A test was run comparing the EGS/BEAM Monte Carlo system and the CMS Xio conventional treatment planning system with the experimental measurement technique using the water phantom and the diode array. This test was successful as a proof of the concept of the experimental technique. At the conclusion of this project, the main limitation of the diode array system was the lack of data processing software. The array produces a large volume of raw data, but not enough processed data was produced during this project to match the spatial resolution of the computer models. An automated data processing system will be needed for clinical use of the array. It has been confirmed that Monte Carlo and pencil-beam algorithms predict significantly different dose distributions for an irregularly shaped object irradiated with megavoltage electron beams. The results from the diode array were consistent with the theoretical models. This project was an initial investigation. At the time of writing, the diode array and the water phantom systems were still at an early stage of development. The work reported here was performed to build, test and commission the equipment. Additional work will be needed to produce an instrument for clinical use. Research into electron beam therapy could be continued, or the equipment used to expand research into new areas.

This thesis reports on the findings of an investigation into the dosimetry resulting from the abutment of en face 6 MeV electron and 6 MV photon beams as applied to the clinical challenge of radiation therapy treatments to head and neck cancer sites. Particular concern is given to the use of multi-leaf collimator (MLC) technology for photon beam definition when abutted to extended source-to-surface (SSD) electron beams. We made dosimetric comparison between MLC and Cerrobend® shielding for use in an abutment situation. The effects of extending the SSD of the electron beam were also assessed. We checked the ability of a Pinnacle3 v7.6 treatment planning system (TPS) to correctly model the dosimetry resulting from this extended electron beam SSD. Volumetric simulations of composite dosimetry resulting in water were conducted in MATLAB® for variations of surface abutment gap, and photon beam shielding type and angle. Visualization Toolkit (VTK) script was developed to visualise the resulting dosimetry. The effect of extending the SSD of the electron beam increases the beam penumbra significantly, exacerbating the challenge of matching this field to a photon beam edge. Furthermore, the TPS was shown to inaccurately model the electron beam penumbra for the extended SSD conditions. The employment of MLC shielding provides for some advantages over Cerrobend® in terms of overall composite hotspot volumes and coldspot magnitudes, though introduces detrimental dosimetric inhomogeneities in the underlying volume. Distinctly, no combination of abutment gap and shielding variables resulted in dosimetry in the range of 90% to 110% at the depth of dmax for the beam energies considered here. We provided tabulated data across these variables to outline the trade-offs present, and aid clinical decisions regarding this challenging dosimetric

Thesis (Ph. D.)--University of California, San Diego, 2000. / Vita. Includes bibliographical references.

Thesis (Ph. D.)--Duke University, 2008. / Includes bibliographical references.

Tillverkning av slutprodukter med additiv tillverkning   blir allt vanligare. Slutprodukter har högre krav på detaljens mekaniska   egenskaper än prototyper gör. Forskning har visat att porositeten är av stor   betydelse för en detaljs hållfasthet. Med additiv tillverkning finns goda   möjligheter för direkt processövervakning och kontrollsystem. Inom electron   beam melting finns sådana system men de saknas en validering av resultatet   från dom systemen. I de här arbetet har prover med designade defekter   tillverkats. LayerQam bilder från tillverkningen har analyserats med Defect   Detector. Data från analysen har visualiserats. Resultatet har studerats samt   att det har tagits fram en Defect Detector-analys med högre precision.   Utvalda prover har undersökts i ett tvärsnitt med optisk mikroskopi samt i 3D   med mikrotomografi. Undersökningarna har jämförts med varandra, de tyder på   att Defect Detector har brister i sin bedömning av densiteten. De designade   defekterna har en överskattad storlek samt brister i kompensation av   förvrängningen i synfältet i bilderna. / <p>Betyg: 180827</p>