Scanning-electron-beam lithography (SEBL) is the primary technology to generate arbitrary features at the nano-scale. However, pattern placement accuracy still remains poor compared to its resolution due to the open-loop nature of SEBL systems. Vibration, stray electromagnetic fields, deflection distortion and hysteresis, substrate charging, and other factors prevent the electron-beam from reaching its target position and one has no way to determine the actual beam position during patterning with conventional systems. To improve the pattern placement accuracy, spatial-phase-locked electron-beam lithography (SPLEBL) provides feedback control of electron-beam position by monitoring the secondary electron signal from electron-transparent fiducial grids on the substrate. While scanning the electron beam over the fiducial grids, the phase of the grid signal is analyzed to estimate the electron-beam position error; then the estimates are sent back to beam deflection system to correct the position error. In this way, closed-loop control is provided to ensure pattern placement accuracy. The implementation of spatial-phase-locking on high speed field-programmable gate array (FPGA) provides a low-cost method to create a nano-manufacturing platform with 1 nm precision and significantly improved throughput. Shot-to-shot, or pixel-to-pixel, dose variation during EBL is a significant practical and fundamental problem. Dose variations associated with charging, electron source instability, optical system drift, and ultimately shot noise in the beam itself conspire to increase critical dimension variability and line width roughness and to limit the throughput. It would be an important improvement to e-beam patterning technology if real-time feedback control of electron-dose were provided to improve pattern quality and throughput even beyond the shot noise limit. A novel approach is proposed in this document to achieve the real-time dose control based on the measurement of electron arrival at the sample to be patterned, rather than from the source or another point in the electron-optical system. A dose control algorithm, implementation on FPGA, and initial experiment results for the real-time feedback dose control on the e-beam patterning tool is also presented.

Approved for public release, distribution is unlimited / Present-day high power microwave devices suffer from a lack of reliable, reproducible cathodes for generating the requisite GW-level electron beam in a vacuum. Standard explosive emission cathode pulse durations have been limited to 10's or 100's of ns due to the expansion of cathode-generated plasma and the ensuing impedance collapse that debilitates microwave output. Traditional thermionic cathodes do not suffer from this drawback of plasma generation, but have not yet been able to provide the required emission current densities explosive emission cathodes are capable of. It is expected that if the plasma could be made cooler and less dense, explosive emission would be more stable. Cesium iodide (CsI) has been found to slow the impedance collapse in many explosive emission cathodes. Herein we will experimentally examine diode impedance collapse, gas production, and cathode conditioning in an effort to perform an evaluation of explosive cathode performance in a typical thermionic electron gun environment. These results will then be used to help demarcate the parameter space over which these CsI-coated carbon fiber cathodes are viable candidates for the electron beam source in next-generation high power microwave devices. / Lieutenant, United States Navy

Dans le domaine aéronautique la réduction du ratio buy to fly pour les pièces de structure est devenue un enjeu majeur. Il s'agit de développer, à coût matière réduit, des appareils consommant moins de carburant tout en proposant une autonomie et une capacité de transport plus importantes. Ce travail de recherche s'inscrit dans cette problématique industrielle, et accompagne Airbus dans le développement du procédé de soudage par faisceau d'électrons de tôles en alliage TA6V dans le but de concurrencer (en proposant une diminution du ratio buy to fly) les procédés classiques de forgeage/matriçage des pièces de structure. Toutefois, le soudage du TA6V, malgré un traitement thermique de détensionnement, conduit à une hétérogénéité de microstructure caractérisée par l'apparition de très fines lamelles de phase α associées à une diminution de la résistance à la propagation de fissures dans la zone soudée par rapport à celle du matériau de base. Ce gradient de propriétés mécaniques est acceptable pour l'application souhaitée, néanmoins, pour étendre ce procédé d'assemblage à d'autres pièces de structure un Traitement Thermique Post-Soudage (TTPS) est envisagé. On vise ainsi à atteindre, dans l'intégralité de la tôle soudée, un meilleur compromis entre la résistance à la propagation de fissure et les propriétés en statique. Dans ce travail de thèse, des lignes de fusion ont été réalisées par la société Airbus sur des tôles laminées d'épaisseurs 12mm présentant une microstructure biphasée α+β soit équiaxe (dite recuit α-β), soit lamellaire (dite recuit β). La caractérisation de chacune des microstructures et des propriétés mécaniques (via des essais de traction, de résilience et de propagation de fissure en fatigue) de la zone de fusion et du matériau de base a permis d'appréhender les mécanismes d'endommagement de l'alliage soudé. Les résultats macroscopiques des essais mécaniques associés à l'étude des faciès de rupture et des chemins de propagation de fissure ont par ailleurs révélé, pour chacune des microstructures impliquées (recuit α-β et recuit β), une importante anisotropie des propriétés mécaniques et de fortes hétérogénéités de comportement mécanique dans l'épaisseur de la tôle. La caractérisation de la microtexture par analyses EBSD de ces matériaux a mis en exergue la présence de nombreuses macrozones contribuant aux hétérogénéités observées. Le développement d'un Traitement Thermique Post-Soudage (TTPS) à partir de l'état recuit β soudé ne permet pas d'aboutir à des propriétés mécaniques statiques satisfaisantes dans la tôle à cause d'un grossissement excessif des ex-grains β. C'est pourquoi, un TTPS à partir de l'état recuit α-β soudé a été envisagé afin d'homogénéiser la microstructure et d'améliorer la résistance à la propagation de fissure de l'ensemble de la tôle soudée. Finalement, une optimisation du TTPS est proposée en considérant le passage de l'échelle du laboratoire à l'échelle industrielle. Les caractérisations microstructurales et mécaniques après TTPS ont par la suite été confrontées aux résultats obtenus sur le matériau recuit β, ce qui a permis de comprendre les avantages et les limites du TTPS choisi. / In the aeronautic industry, the reduction of the « buy-to-fly » ration for structural parts has become a major issue. The goal is to develop planes, at a reduced material cost, requiring less fuel with an extended range and higher load capacity. This research study has been designed with the Airbus Company in order to contribute to solve this industrial problem. In particular, the development of the electron beam welding process of the β annealed titanium alloy Ti-6Al-4V should concurrence the usual forging/pressing processes of structural parts. However, welding of Ti-6Al-4V, despite a stress relieving heat treatment, lead to a microstructural heterogeneity between the welded zone and the base metal and, as a consequence, to an heterogeneity of the mechanical properties. In comparison to the crack propagation resistance of the base metal, the one measured fusion zone is weaker and is associated to the presence of very thin α platelets. This mechanical properties gradient remains acceptable for the industrial purpose, nevertheless, in order to extend the use of the electron beam welding process to other structural parts, a Post-Welding Heat Treatment (PWHT) is considered. The aim is to achieve, in the entire welded plate, a better compromise between the crack propagation resistance and the static properties. In this PhD work, fusion lines were performed by the Airbus company on two rolled plates of biphasic α+β Ti-6Al-4V presenting either a lamellar microstructure (also called β annealed) or an equiaxe microstructure (also called α-β annealed). Characterizations of the microstructures involved as well as the mechanical properties helped to understand the failure mechanisms of the welded alloy. The analysis of the different test revealed, thanks to the observation of the crack propagation path on the Charpy specimens, that the very thin α platelets in the fusion zone do not act as a strong barrier against the crack propagation. On the contrary, in the case of the β annealed base metal, the α platelets are thick enough (1µm) to be an obstacle and to slow down the crack. In this case, the crack undergoes many deviations at the α/β interfaces, generating a very long and tortuous crack path. In order to improve the mechanical properties of the fusion zone, it seems appropriate to apply a PWHT, which will transform the microstructure and increase the thickness of the α platelets in the fusion zone. This PWHT consists mainly in a treatment in the β field followed by a controlled cooling rate. However, even if the PWHT applied on the β annealed and welded material lead to a thickening of the α platelets and improve the crack propagation resistance in the fusion zone, a strong enlargement of the prior β grain in the base metal is responsible of low tensile properties. That is why, a PWHT applied on the α-β annealed material is considered in order to homogenize simultaneously the microstructure in both fusion zone and base metal and improve the mechanical in the entire welded plate. Results obtained from the Charpy tests underline that the PWHT applied on the α-β annealed and welded material lead to homogeneous fracture energies in the plate, and to an higher fracture energy after PWHT than the one in the fusion zone of the β annealed material, which fulfill the initial industrial goal. An important anisotropy of the mechanical properties as well as important fluctuations of these properties in t he thickness of the plates has also been observed. The EBSD analyses of the crystallographic microtexture revealed the presence of numerous macrozones responsible of the heterogeneities observed for both microstructures.

Neste trabalho estudou-se as propriedades obtidas em juntas soldadas pelo processo de soldagem a laser do tipo estado sólido de onda contínua guiado por fibra, e os resultados foram comparados com juntas soldadas pelo processo feixe de elétrons. O material utilizado foi o aço maraging 350 - ASTM A 538 Grade C. As soldas realizadas com o processo feixe de elétrons possuem um procedimento de soldagem aprovado. A junta selecionada para a elaboração do trabalho foi do tipo sobreposta com material de base de espessuras diferentes, respectivamente iguais a 1,00 e 0,78 mm. As juntas soldadas foram avaliadas por: ensaio de cisalhamento, dureza Vickers e caracterização microestrutural das diversas regiões das juntas soldadas. Foram realizadas análises por microscopia óptica e microscopia eletrônica de varredura usando espectrometria de energia dispersiva (MEV/EDS). Foi realizado o teste de hipótese como técnica para a análise dos dados provenientes dos ensaios experimentais. Nas juntas soldadas com ambos processos não foi verificada a presença de descontinuidades, poros e depressões na superfície do cordão. Os resultados indicam que as condições usadas em ambos os processos de soldagem foram satisfatórias e possibilitaram a soldagem do aço maraging 350 atendendo aos requisitos necessários. / In this work, the welds made by a continuous wave diode pumped solid state laser guided by fiber were studied and the results were compared with welded joints of electron beam welding. The material used was maraging 350 steel ASTM A 538 Grade C. The welding process performed with electron beam welding has a approved welding procedure. The joint chosen for the preparation of the work was the lap joint type with different thicknesses base material respectively equal to 1,00 and 0,78 mm. The welded joints were evaluated by mechanical tests like shear test, Vickers hardness and microstructural characterization of the various regions of the welded joints. Analyzes were performed by optical microscopy and scanning electron microscopy using energy dispersive spectrometry (SEM/EDS). The hypothesis test technique was done for the analysis of data from experimental tests. For both welding process was not detected in the welded joints the presence of discontinuities, pores and depressions on the weld fillet surface. The results indicate that the conditions used for both welding process were satisfactory and allowed the welding of maraging 350 steel meeting necessary requirements.

Os aceleradores de feixes de elétrons são utiizados em muitas aplicações, tais como pesquisa em física básica, química, medicina, biologia molecular, microeletrônica, agricultura e indústria, dentre outras. Na maioria dos aceleradores, por meio de aquecimento do filamento de tungstênio e da alta tensão via gerador Cockcroft-Walton, os elétrons passam por um campo elétrico na câmara em vácuo e são acelerados de acordo com a alta tensão aplicada, transferindo energia aos elétrons. Para fins industriais, um dos equipamentos mais utilizados é o Acelerador Industrial de Elétrons Dynamitron®. No IPEN-CNEN/ SP, instalou-se um acelerador de feixe de elétrons Dynamitron®, fabricado pela RDI Radiation Dynamics Inc., modelo DC1500/25/4, em 1978. A tecnologia analógica aplicada nesse acelerador industrial de elétrons data de 1960 e 1970. Assim, além da tecnologia de controle operacional obsoleta, não há mais peças e componentes sobressalentes originais, fornecidos pelo fabricante (RDI) ao equipamento. O objetivo deste trabalho foi desenvolvido um sistema automatizado para controle operacional do acelerador industrial de elétrons Cockcroft-Walton de 37,5 kW (1,5 MeV e 25 mA) no Instituto. / Electron beam accelerators are used in many applications, such as basic research in physics, chemistry, medicine, molecular biology, microelectronics, agriculture and industry, among others. In most accelerators, by means of heating a tungsten filament and high-voltage from a CockcroftWalton generators, the electrons go through an electrical field in the vacuum chamber and are accelerated according to the high-voltage applied to transferring energy to the electrons. For industrial purposes, one of the most used of equipment is the Dynamitron® Industrial Electron Beam Accelerator. In IPEN-CNEN/SP, this Dynamitron® Accelerator, manufactured by RDI - Radiation Dynamics Inc, model DC1500/25/4, was installed, in 1978. The analogical technology applied in this industrial accelerator dates from 1960 and 1970. Therefore, besides the obsolete operational control technology, there are not spare parts or components supplied by the manufacturer (RDI).The goal of this work was to develop an automated system for the operational control of the Cockroft-Walton industrial electrons accelerator of 37.5 kW (1.5 MeV and 25 mA), at IPEN-CNEN/SP.

Neste trabalho realizamos uma série de medidas de correntes elétricas através de amostras de polímeros isolantes submetidos a radiação por feixe eletrônico, amostras essas inserida em um circuito em modo de corrente. A energia do feixe incidente foi sempre tal que não atravessava totalmente a amostra, depositando em seu interior excesso de carga negativa. A polaridade dessa carga foi determinada pela curva de emissão secundária. Como a energia do feixe foi sempre muito superior à energia EII (abaixo dessa energia o número de elétrons injetados pelo feixe é menor que os arrancados para fora da amostra, e acima desse valor o contrário ocorre), as amostras usadas (polifluoretileno-propileno, polietileno de alta densidade e polietileno de baixa densidade) foram carregadas negativamente. Devido à radiação parcialmente penetrante, cada amostra foi dividida em duas regiões distintas: irradiada e não-irradiada. Na região não-irradiada permanece a condutividade intrínseca do material, enquanto na irradiada a condutividade foi muito aumentada devido à geração de portadores secundários pela radiação. As curvas de corrente foram medidas durante e após a irradiação sob diferentes campos elétricos aplicados externamente. Vários modelos teóricos foram aplicados para explicar os resultados de correntes medidas. O mais simples foi o Modelo Caixa, onde a penetração dos primários era um valor fixo r, dividindo a amostra em condutividade induzida g1 de 0 a r, e condutividade intrínseca gi, de r a L, sendo g1 gi (L é a espessura da amostra). O modelo mais sofisticado levou em conta uma região &#916r em torno de r pois considera que o freamento dos elétrons não ocorre todos no mesmo ponto, mas tem uma dispersão em tomo de um ponto r. Por esse motivo a condutividade induzida é dependente da posição, e num caso mais geral depende também do tempo. Durante a irradiação da amostra inserida no circuito de medida, pode ocorrer injeção pelos eletrodos alterando, em determinadas circunstâncias, a polaridade do excesso de carga. Como resultado dos ajustes teórico-experimentais vários parâmetros elétricos dos materiais foram obtidos. / This work presents several electric current measurements in dieletric polymers under irradiation by electron beam. The samples were irradiated in a current mode circuit. The energy of the beam provided a negative charge profile charge in the bulk o the sample. The polarity of the deposited charge was determined by a secundary emission curve. Since the energy of the beam was always bigger tham EII (which defines the balance between the injected electrons and the emitted ones; below EII the sample became positively charged, while above it is negatively charged) the samples (polyethylene propylene, high density polyethylene and low density polyethylene) were always negatively charged. Each irradiated sample was divided in two regions: the irradiated region and the non-irradiated one. Due to the secondary generated carries, the condutivity of the irradiated region gi was orders of magnitude higher than the intrinsic condutivity g1. The eletric currents were measured during and after the irradiation, under different external electric fields. Several theoretical models were used to explain the experimental results. The simplest one, the box models, considers the induced condutivity gb from 0 to r, and the intrinsic condutivity gi from r to L (L being the sample thickeness). The more sophisticated model, on the other hand, considers a range value &#916r around the point r. It means that the stopping power is not abruptly but rather is distributed in a region &#916r around the point r. For this reason the induced conductivity depends on the position, and in a more general framework, also in time. During the irradiation, carriers are injected to the sample by the electrodes, and in certain conditions the excess of charge has its polarity inverted. From the theoretical-experimental fittings important electrical parametes of the materials were obtained.

O caldo de cana-de-açúcar é um líquido opaco, viscoso, de cor amarelada esverdeada, de composição química complexa e variável, é utilizado para produção de cachaça, rapadura, álcool e principalmente açúcar. Em sua composição possui além de açúcares uma série de compostos que conferem cor e que pode interferir na cor do produto final gerado, sendo que dentre estes compostos podemos citar a clorofila, compostos fenólicos e flavonoides. Para produção de um açúcar de boa qualidade e aceitação comercial, o caldo passa pelo processo de sulfitação, que promove a redução da cor do caldo através do contato deste com o anidrido sulfuroso (SO2), gerando um açúcar mais branco. No entanto, este açúcar por obter resíduos de enxofre, sofre restrições do mercado externo, o que vem incentivando o desenvolvimento de diversas técnicas alternativas de clarificação a fim de se produzir um açúcar mais branco e que atenda as exigências do mercado externo. Contudo, o presente trabalho avaliou o efeito da radiação por elétrons acelerados em caldo de cana-de-açúcar, comparando-os a testes preliminares realizados com caldo de cana-de-açúcar tratados com irradiação gama. As amostras foram irradiadas nas doses de 5, 10 e 20 kGy em ambos os tipos de radiação e foram comparadas com uma amostra controle in natura. Os resultados mostraram que houve um aumento significativo (p<0,05) dos compostos fenólicos em ambos os tratamentos, provavelmente por que ao sofrer irradiação os ácidos fenólicos se tornam mais disponíveis na matriz. Observou-se ainda aumento dos níveis de açúcares redutores (glicose e frutose) tanto para as amostras irradiadas com radiação gama como para feixe de elétrons, fato verificado por análises cromatográficas quantitativas realizadas no caldo de cana-de-açúcar tratado com feixe de elétrons. Foi ainda observado que embora tenha ocorrido algumas alterações significativas (p<0,05) quanto aos parâmetros, que caracterizam o perfil do caldo, avaliados com Brix, pH, acidez total titulável, o trabalho manteve seu propósito de redução da cor ICUMSA do caldo de cana-de-açúcar em ambos os tratamentos sendo que essa redução representou aproximadamente 49% da amostra controle em relação a dose irradiada a 20 kGy, para feixe de elétrons e cerca de 30% para amostras irradiadas em fonte de cobalto-60. Mostrando que ambas as técnicas são eficazes na redução da cor do caldo de cana-de-açúcar, sendo que o método de irradiação por acelerador de elétrons apresenta vantagens em relação à irradiação gama além de obter maior índice de redução da cor, é o método de maior produção (m3/h) e mais seguro, segundo as regras de proteção radiológica. / The sugar cane juice is a liquid opaque, viscous, yellowish green, its chemical composition is complex and variable, is used for the production of spirit, molasses, alcohol, and mainly sugar. In its composition the sugar cane juice has a series of compounds as sugars and many others compounds which produces color and can interfere in the color of the final product produced, and among these we can mention the chlorophyll, phenolic compounds and flavanoids. To produce a sugar of good commercial quality and acceptability the sugar cane juice pass to the process of sulfitation, which promotes the reduction of color of the juice by its contact with the SO2, making a sugar whiter. However, these sugars that have residue of sulfur suffer some restrictions on the foreign market. In this sense many techniques has been discussed, to looking for to produce a white sugar and that respect the requirements of the foreign markets. Although, this work evaluated the effect of radiation of electron beam in a sugar cane juice and compared this results with a preliminary tests with sugar cane juice treated with gamma irradiation. The samples were radiated at 5, 10 and 20 kGy doses in both of irradiation and compared a sample (control) without treatment. The results showed a significant increase (p<0.05) of phenolic compounds, in both treatments, probably because the radiation of sugar cane juice become phenolic acids more available in the juice. We also observed increased levels of reducing sugars (glucose and fructose) for the samples irradiated with gamma irradiation and for electron beam, a fact verified by quantitative chromatographic analyzes performed in the sugar cane juice treated with electron beam. Even that we observe that these treatments although has shown some significant changes to the parameters that characterizing the profile of the juice like Brix, pH, titratable acidity, was able to reduce de color ICUMSA of the sugar cane juice in both of treatments with irradiation. By electron beam irradiation, the sugarcane juice reduce about 49% its color, compared the control and the sample that receive dose of 20 kGy, and the gamma irradiation the juice reduced about 30% color the control compared with samples irradiated in 20 kGy. These results show us that both techniques are effective in reducing the color ICUMSA of the sugar cane juice, and the method of irradiation by electron accelerator has advantages in addition to gamma irradiation because also cause greater reduction color, is the method of higher production (m3 / h) and safer, according to the rules of radiological protection.

Esta Dissertação abrange a caracterização microestrutural do aço API 5L X65 soldado por feixe de elétrons (EBW) com cinco diferentes aportes térmicos e sem o uso de metal de adição. O aço API 5L X65 pertence à classe de aços ARBL e é empregado na fabricação de oleodutos e gasodutos. As três regiões da solda metal-base (MB), zona termicamente afetada (ZTA) e zona fundida (ZF) foram caracterizadas por microscopia ótica (MO), microscopia eletrônica de varredura (MEV), difração de raios X e medidas de microdureza Vickers. As microestruturas encontradas nestas três regiões são bastante distintas. O MB apresenta grãos ferríticos com bandas perlíticas orientadas paralelamente à direção de laminação. Devido à elevada densidade de potência do processo EBW e às elevadas velocidades de soldagem utilizadas, a ZTA é bastante estreita sendo formada por grãos ferríticos finos e bandas perlíticas degeneradas que a diferem do MB. Na interface ZTA/ZF foi possível observar a presença de grãos com morfologia acicular com a presença dos constituintes M-A (martensita-austenita). A ZF apresentou morfologia similar à encontrada em aços microligados soldados: ferrita alotriomórfica, ferrita acicular, ferrita de Widmanstätten, constituintes M-A, além de regiões bainíticas. Na parte central da chapa foi observada a segregação de manganês. A técnica EBW permite a soldagem de tubos com paredes espessas com apenas um passe. Os resultados desta Dissertação são úteis para avaliar a viabilidade técnica do uso de EBW na fabricação de tubos para o transporte de óleo e gás, especialmente em aços mais resistentes (bainíticos). / This Dissertation aims at the microstructural characterization of electron-beam welded (EBW) API 5L X65 steel using five different processing conditions (heat input) and without filler metal addition. The API 5L X65 steel is a high-strength low-alloy (HSLA) steel employed mainly in the manufacture of pipelines for oil and gas. The three regions of the welds, namely the base metal (BM), heat affected zone (HAZ) and fusion zone (FZ) were characterized by light optical microscopy using different chemical etching agents, scanning electron microscopy, X-ray diffraction and Vickers microhardness testing. The microstructures found in the three regions were quite distinct. The BM consists of elongated ferritic grains with pearlite bands oriented along the rolling direction. Due to the high power density provided by EBW, the HAZ is very narrow and consists of ferritic grains and bands of degenerated pearlite. At the HAZ/FZ interface it is possible to observe the presence of grains with acicular morphology and the presence of M-A (martensite- retained austenite) constituents. The FZ showed a morphology similar to that one found in molten microalloyed steels consisting of allotriomorphic ferrite, acicular ferrite, Widmanstätten-like ferrite, M-A constituents, as well as bainite. In the central part of the plate it was observed the presence of Mn-segregation lines along the BM. The electron beam welding was chosen because it produces a relatively small HAZ and it allows the welding of thick-wall tubes in one single pass. The results of this work are useful to evaluate the possibility of using EBW in the manufacture of pipelines for transport of oil and gas, especially in higher grade steels.

Nanoscale lithography is the key component of the semiconductor device fabrication process. For the sub-10 nm node device, the conventional deep ultraviolet (DUV) photolithography approach is limited by the diffraction nature of light even with the help of double or multiple patterning. The upcoming extreme ultraviolet (EUV) photolithography can overcome this resolution limit by using very short wavelength (13.5nm) light. Because of the prohibitive cost of the tool and the photomask, the EUV lithography is only suitable for high volume manufacturing of high value. Several alternative lithography technologies are proposed to address the cost issue of EUV such as directed self-assembly (DSA), nanoimprint lithography (NIL), scanning probe lithography, maskless plasmonic photolithography, optical maskless lithography, multiple electron-beam lithography, etc.<div><br></div><div>Electron-beam lithography (EBL) utilizes a focused electron beam to write patterns dot by dot on the silicon wafer. The beam size can be sub-nanometers and the resolution is limited by the resist not the beam size. However, the major drawback of EBL is its low throughput. The throughput can be increased by using large current but at the cost of large beam size. This is because the interaction between electrons in the pathway of the electron beam. To address the trade-off between resolution and throughput of EBL, the multiple electron-beam lithography was proposed to use an array of electron-beams. Each beam has a not very large beam current to maintain good resolution but the total current can be very high to improve the throughput. One of the major challenges is how to create a uniform array of electron beamlets with large brightness.<br></div><div><br></div><div>This dissertation shows a novel low-cost high-throughput multiple electron-beam lithography approach that uses plasmonic enhanced photoemission beamlets as the electron beam source. This technology uses a novel device to excite and focus surface electromagnetic and electron waves to generate millions of parallel electron beamlets from photoemission. The device consists of an array of plasmonic lenses which generate electrons and electrostatic micro-lenses which guide the electrons and focus them into beams. Each of the electron beamlets can be independently controlled. During lithography, a fast spatial optical modulator will dynamically project light onto the plasmonic lenses individually to control the switching and brightness of electron beamlets without the need of a complicated beamlet-blanking array and addressable circuits. The incident photons are first converted into surface electromagnetic and electron waves by plasmonic lens and then concentrated into a diffraction-unlimited spot to excite the local electrons above their vacuum levels. Meanwhile, the electrostatic micro-lens will extract the excited electrons to form a finely focused beamlet, which can be rastered across a wafer to perform lithography. The scalable plasmonic enhanced photoemission electron-beam sources are designed and fabricated. An array of micro-scale electrostatic electron lenses are designed and fabricated using typical micro-electro-mechanical system (MEMS) fabrication method. The working distance (WD) defined as the gap from the electron lens to the underneath silicon wafer is regulated using a gap control system. A vacuum system is designed and constructed to host the multiple electron-beam system. Using this demo system, the resolution of the electron beams is confirmed to be better than 30 nm from the lithography results done on poly methyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ) resists. According to simulation results, the electron beam spot size can be further optimized to be better than 10 nm.<br></div><div><br></div><div>This scheme of high-throughput electron-beam lithography with multiple plasmonic enhanced photoemission beamlets has the potential to be an alternative approach for the sub-10 nm node lithography. Because of its maskless nature, it is cost effective and especially suitable for low volume manufacturing and prototype demonstration.<br></div><div><br></div><div><br></div>

O trabalho aqui apresentado descreve algumas pesquisas em teste de circuitos integrados. Estas pesquisas consistem, por um lado, na análise de falhas e por outro, na validação de protótipos, ambas fazendo uso de técnicas de teste com feixe de elétrons. A primeira parte deste trabalho apresenta uma revisão dos princípios do teste com feixe de elétrons, bem como descreve as pesquisas correntemente em desenvolvimento no laboratório TIM3-INPG. Também são abordados temas como o tratamento de imagem em contraste de potencial e projeto visando a testabilidade de circuitos no teste com feixe de elétrons. Quanto a este último assunto, sua inclusão neste trabalho visou apresentar, aqueles que trabalham na área de projetos de circuitos, desconhecedores dos problemas do MEV, idéias de como realizar seu projeto a fim de tornar a tarefa de depuração do protótipo pelo feixe de elétrons o mais fácil possível. A segunda parte descreve experimentos práticos na área de validação de protótipos, onde duas técnicas pertinentes foram utilizadas e o estudo de um caso real foi apresentado. A primeira técnica é baseada na adaptação de uma ferramenta de comparação de múltiplas imagens adjacentes, que foi originalmente desenvolvida para o processo de análise de falhas. A segunda técnica utilizada faz uso de um sistema especialista que, baseado no conhecimento adquirido do circuito, gera o diagnóstico automático de falha. Os desempenhos destas duas ferramentas são apresentados e discutidos, bem como é fornecido o diagnóstico de falha para o circuito protótipo utilizado. Como conclusão, são propostos futuros desenvolvimentos no processo de validação de protótipo. Estes melhoramentos objetivam tanto a completa automação do processo quanto o enriquecimento da informação provida no final do processo de diagnóstico de falha, de forma a obter-se um ambiente de teste para validação de protótipos apresentando um alto grau de integração e automação. / The work reported herein describes some IC testing research. This research concerns on one hand, failure analysis and on the other hand IC prototype validation, both making use of e-beam testing techniques. The first part of this work presents a review of e-beam testing as well as describes the researches currently in progress at the TIM3-INPG Laboratory. Subjects like voltage contrast image treatment and design for testability in e-beam testing are also discussed. Considering the last theme, it was included in this work in order to provide to the IC designers, whose knowledge about the SEM problems is not enough, some ideas on the way of how to accomplish their design to make the prototype validation process as easy as possible. The second part describes practical experiments in the prototype validation domain, where two approaches were used and a real case study was presented. The first approach is based on the multiple adjacent images comparison process adaptation, firstly developed to be used in the failure analysis process. The second technique makes use of an expert system, based on the acquired knowledge of the device under test in order to provide the fault diagnosis. The performances of these two approaches are presented and discussed, as well as, the fault diagnosis to the prototype circuit is presented. As conclusion, it is proposed further developments in the prototype validation approach. These improvements deal with the automation of the entire process as well as the enhancement of the information provided at the end of the fault diagnosis process, in order to obtain a testing environment for prototype validation with high integration and automation degrees.