This article describes that we grew InGaN ternary films by Plasma- Assisted Molecular Beam Epitaxy (PAMBE) on the ZnO substrate O-polar (0001) surface. Before we grew the films, we grew the InN films on the ZnO substrate to find out the interface reaction conditions. We used Double Crystal X-ray Diffraction (XRD) to analyze the diffraction peak of InGaN films after we grew them. We found it was very hard to grow the single content InGaN films by generally methods. We tried period shutter control method to grow films, and we succeeded to grow the single phase films. We analyzed the morphologies by AFM and SEM, the microstructures by TEM, the electric properties by Hall measurement, and the fluorescent characteristics by PL.

The purpose of our research is growing the coupled InGaAs quantum dots on the n-type substrate by molecular beam epitaxy in laboratory, and we choose 5,10 and 15 nanometers to be the thicknesses of GaAs spacer between the quantum dots layer. Due to the couple effect, we hope to realize the theorem of intermediate band proved by Luque and Marti. We measure the characteristic of samples by electroluminescence spectra, photoelectric current spectra, electrical absorption spectra and electro reflectance spectra in laboratory; moreover, we acquire the basic parameters of solar cell by AM1.5G for analyzing. From the basic parameters of solar cell, we know that the quantum dots can enhance the photocurrent by absorbing additional photons , however, the strain caused by quantum dots would decay the open voltage seriously, so that the efficiency always under the baseline. Each efficiency of 9-stack QDs are 4.3%(c494),5.1%(c519),5.3% (c520),and each efficiency of 9-stack Dwells are 3.9%(c524),4.2%(c525),4.7%(c526), and 10-stack QDs(5nm) is 2.9%(c514),and 12-stack QDs(10nm) is 4.48%(c538),and 12-stack QDs(15nm) is 5.89%. The break through of this paper is that the efficiency of c529¡]VOC=0.64V,JSC=11.97mA/cm2,FF=67%,£b=5.89%¡^is higher than GaAs¡]VOC =0.87 V, JSC =7.4 mA/cm2,FF=72.3%,£b=5.6%¡^,and we attribute this performance to its good quality of miniband, because the current can be enhanced a lot, and it will make up for the lose of open voltage and filling factor, so that the efficiency can be higher than GaAs baseline.

In this thesis, we have reported the MBE growth, design, and fabrication of the InGaAs quantum dots (QDs) laser/semiconductor optical amplifier, broadband QDs structure, coupled double cavity structure for terahertz emission on GaAs substrate. The emission wavelengths of the strain-induced S-K growth mode QDs structures are adjusted through the composition of QDs and strain-compensated capping layer. Also, the technique of growing high quality InGaAs QDs with solid source molecular beam epitaxy has been established and characterized by double crystal X-ray diffraction, transmission electron microscopy, photoluminescence, electroluminescence measurements. For 1.3£gm QDs laser samples, ridge waveguide lasers of the Fabry-Perot (FP) type are fabricated by wet-etching process. From the QDs laser L-I curve, the e2-hh2 transition at £f =1160nm have larger optical gain than e1-hh1 transition at £f =1220nm. The FP laser with 0.6£gm cavity length shows a lasing peak of 1160nm at threshold. As the cavity length increase to 2£gm, the lasing peak red shift to 1220nm (closed to ground state emission wavelength). This energy band gap transition phenomenon is obvious especially in the QDs laser with quantum well (QW) structure. When the injection current increase, two lasing peaks at £f= 1160 and 1175nm are observed sequentially. This unique lasing behavior is shown to be consistent with carriers localized in noninteracting dots. For the application of 1.3£gm light source, we optimum the growth condition for different needs in optical coherent tomography (OCT) light source, tandem solar cell, terahertz emission light source, etc. For the super luminescence diode (SLED) in OCT, we design multi-stacked asymmetric QDs structure (AMQD), QDs in the well structure (DWell), Dwell with p-doping in well structure to investigate the carrier recombination condition and bandwidth. Comparing with 5 structures in this study, the Dwell with p-doping in well structure has a maximum EL bandwidth exceed 198nm. The large bandwidth is attributed to the QW which increases the carrier capture rate and the p-doping which provide the efficient holes in valance band. This structure provides an excellent SLED light source solution to replace the existing program. For the tandem solar cell, we use the multi-stack QDs to compose broadband absorption in 1eV range. In order to avoid the degradation in the open circuit voltage, we use InGaAs QW to reduce the QDs strain. We observed the doping effect on the built in field through the photo-reflectance measurements. For the better photocurrent collection, we use p-doping in the QW to increase the built-in field intensity to obtain higher efficiency. For the terahertz emission, the QDs embedded in coupled double-cavity structures with an AlAs/GaAs intermediate distributed Bragg reflector (DBR) are grown on GaAs substrates. Two emission peaks at 1180, 1206 nm from the QDs corresponding to the coupled double-cavity resonant modes are observed in the high reflection band. The frequency differences for the two resonant coupled modes are of 5.5 terahertz, and have been successfully controlled by changing the pair numbers for the intermediate DBR. In addition, we have grown the InGa(Al)As nanostructures on InP substrate. The lattice constant difference between InGaAs and InP is relatively smaller compare with GaAs substrate, and it will be more challenge in epitaxial growth. After we investigate the strain, surface morphologies, optical properties for the nanostructures, we find the group III elements play an important role in the morphologies. Wire formation is attributed by the enhanced adatom diffusion length in the stepped surface front along [0-11] direction for the presence of Ga both in the nanostructure and buffer layer. Finally, we established QDs, Qwires database for the valuable new possibilities for designing new and original structures.

The purpose of the thesis is enhancing efficiency of asymmetric quantum dots (AMQD) solar cells. The AMQD structures are grown on the n-type GaAs substrate by (MBE). In order to enhance the photovoltaic characteristics, we introduce InGaAs quantum well (QW) and modulation doping in the well to investigate effect of the strain relief and built-in electric field in the active layer. In our experiment, we analyze the optical property of AMQD structures by photoluminescence measurement system, and then decompose emission wavelength by Gaussian fitting to find optical characteristics of each single layer quantum dots. Besides, we also measure photocurrent spectra, external quantum efficiency, electrical absorption, and electro reflectance spectra to discuss carrier transition inside AMQD structure . Finally, we acquire the photovoltaic basic parameter under one sun. The results show that QDs provide additional photocurrent via absorbing extra photons, but the open circuit voltage decrease seriously due to the accumulated strains. So as to relieve the strains and enhance carriers extraction, we introduce QW layers with different growth temperatures and change the modulation doping concentrations . From the results, the higher growth temperature for QW diminishes accumulated strains, and the higher p-type modulation doping concentration indicates an extraction enhancement due to the stronger built-in electric field. By optimizing QW growth conditions, the efficiency has overtaken GaAs baseline cells. In addition, we improve the photon-excited current collection by using matrix pattern and wet etching on the device surface, the best photovoltaic characteristic shows V OC = 0.74 V, J SC = 18.82 mA/cm2, FF = 0.78, £b= 10.86%.

The group III nitride semiconductor grown on c-plane sapphire by radio frequency plasma assisted molecular beam epitaxy has been studied. To archive good quality GaN film, nitridation and low temperature buffer layer were applied to overcome the issue of lattice mismatch. Low temperature and long period nitridation process shows better improved of optical properties and crystal quality of GaN film. Buffer layer grown with slightly Ga-rich, substrate temperature at 522¢J, for 2 minutes leads to better GaN film. High substrate temperature and sufficient nitrogen to gallium ratio are two important factors to control the growth of the good quality GaN epilayer. Chemical etching and observation of surface reconstructions were used to characterize the polarity of group III nitrides. The Ga-polarity GaN film shows 2x surface reconstruction with high chemical resistance while the N-polarity is sensitive to chemical and displays the 3x reconstruction pattern. The process of indium incorporated with GaN is very sensitive to growth temperature. The indium content decreased with increasing the substrate temperature and also decreased along the growth direction. The N-polar GaN with an indium-facilitated growth technique was also studied. Upon the incorporation of indium during growth, the photoluminescence intensity and electron mobility of GaN has been enhanced by a factor of 15 and 6 respectively. The electron concentration drastically increases by several orders of magnitude. The biaxial strain of GaN film estimated with Micro-Raman technique reduces from 0.6729 to 0.5044GPa. The full-widths at half maximum of asymmetric (10-12) x-ray reflection which related to the density of overall threading dislocations increases from 593 to744 arcsec. In contrast, the symmetric (0002) reflection related only to threading dislocations having a non-zero c-component Burgers vectors reduces from 528 to 276 arcsec. The enhancement of GaN optical property is generally attributed to the reduction of non-zero c-component dislocations. The reduction in density is confirmed by cross-sectional transmission electron microscopy.

In this thesis, we study a series of Si doped InN films. These samples are grown on sapphire (0001) by molecular beam epitaxy (MBE). We have doped Si in InN films successfully. In this experiment, we control Si cell temperature to change carrier concentration of samples during InN film growth. The carrier concentration and mobility are explored by van der Pauw Hall measurement. As carrier concentration increases, mobility decreases. Carrier concentration changes with Si cell temperature from 6.16x1018 cm-3 to 1.19x1020 cm-3. Photoluminescence (PL) emission peak energy shows blue shift when carrier concentration increases, but the intensity decreases and full width at half maximum (FWHM) broadens. The PL peak of InN film with 1.19x1020 cm-3 split into two peaks 0.74 eV and 0.89 eV. In Raman spectra, Raman modes position and FWHM do not change with carrier concentration. In temperature dependence PL, the dependence of PL spectra shows decrease when carrier concentration increases. In power dependence PL, the PL emission peak energy of InN films with 6.16x1018 cm-3 and 8.50x1018 cm-3 show blue shift, while the PL peaks of InN films with 1.43x1019 cm-3 and 2.27x1019 cm-3 show no significant move. The fitting of power density vs. intensity is linear for all samples, but all slope of them are less than 1 expect for InN film with 1.43x1019 cm-3.

Wurtzite (W)-type ZnO condensates showed preferred orientation {10 1} when deposited on glass substrate by pulsed laser ablation on Zn target in the presence of oxygen. Such an artificial epitaxy depends on the well developed {10 1} surfaces of the condensates, which enabled {10 1}-specific coalescence to form twin and single crystal regardless of the co-deposited Zn. The W-ZnO condensates have decreasing particle size with increasing oxygen flow rate and a considerable residual stress due to the combined effects of rapid heating/cooling and thermal/lattice mismatch with Zn following parallel epitaxy or (01 )W-ZnO//(01 0)Zn; [ 2 3]W-ZnO//[0001]Zn involving {10 1} slip (Part I). In addition, wurtzite (W)-type ZnO/Zn composite deposit with preferred orientation {10 1}W-ZnO and (0001)Zn respectively on glass substrate in chapter I under Isothermal (600oC) atmospheric annealing caused self-catalyzed vapor-liquid-solid growth of rod-like W-ZnO whiskers with unusual habit. Analytical electron microscopic observations indicated that the W-ZnO whiskers extend along the zone axis of the well-developed polar surfaces {10 1} for a beneficial lower electrostatic energy and surface energy. Alternatively, the whiskers extend via {11 1}-specific growth twinning and/or coalescence twinning for a beneficial fair coincidence-site lattice at the twin boundary (Part II). Furthermore, Zn particulates overlain with wurtzite (W)-type ZnO condensates having nearly orthogonal {10 1} and {11 1} facets were found to self-catalyze unusual tapered W-ZnO whiskers upon isothermal atmospheric annealing, i.e. thermal oxidation, at 600oC. Analytical electron microscopic observations indicated that such whiskers formed tapered slabs having mosaic {10 1} and {2 1} twinned domains. The tapered whiskers can be rationalized by unconventional vapor-liquid-solid growth, i.e. {hkil}-specific coalescence twinning growth from the ZnO condensates taking advantage of a partially molten bottom source of Zn and the adsorption of atoms at the whisker tips and steps under the influence of capillarity effect (Part III). Finally, Electron irradiation of nano-size wurtzite (W)-type ZnO condensates with intimate mixture of parallel epitaxial Zn caused {10 1}W slip to form a single domain of rock salt (R)-type core and W-type shell. The two polymorphs follow (1 1)R//(0 11)W; [011]R//[ 2 3]W, i.e. chair type Peierls distortion with additional 38 degree tilting (001)R along the ( 2 0)W plane for a fair match of (10 1)W/(1 1)R, the same as one of the two paths for the back-transformation of R-ZnO into a lower crystal symmetry. The martensitic nucleation of R-type ZnO can be attributed to dynamic migration of interstitials/vacancies, lattice mismatch stress, and capillarity effect.

It is generally believed that the Si technology is going to hit a road block soon. Amongst all the potential candidates, graphene shows the most promise as replacement material for the aging Si technology. This has caused a tremendous stir in the scientific community. This excitement stems from the fact that graphene exhibits unique electronic properties. Physically, it is a two-dimensional network of sp₂bonded carbon atoms. The unique symmetry of two equivalent sublattices gives rise to a linear energy dispersion for the charge carriers. As a consequence, the charge carriers behave like massless Dirac particles with a constant speed of c/300, where c is the speed of light. The sublattice symmetry gives rise to unique half-integer quantum hall effect, Klein's paradox, and weak antilocalization. In this research work, I was able to successfully study the growth and electronic structure of EG on SiC(0001), in ultra-high vacuum and low-vacuum furnace environment. I used STM to study the growth at an atomic scale and macroscopic scale. With STM imaging, I studied the distinct properties of commonly observed interface region (layer 0), first graphene layer, and the second graphene layer. I was able to clearly resolve graphene lattice in both layer 1 and 2. High resolution imaging of the defects showed a unique scattering pattern. Raman spectroscopy measurements were done to resolve the layer dependent signatures of EG. The characteristic Raman 2D peak was found to be suppressed in layer 1, and a single Lorentzian was seen in layer 2. Ni metal islands were grown on EG by e-beam deposition. STM/ STS measurements were done to study the changes in doping and the electronic structure of EG with distance from the metal islands.

Graphene grown epitaxially on silicon carbide provides a potential avenue toward industrial-scale graphene electronics. A predominant aspect of the multilayer graphene produced on the carbon-terminated (000 -1) face of SiC is the rotational stacking faults between graphene layers and their associated moire-pattern superlattice. We use scanning tunneling microscopy (STM) and spectroscopy (STS) in high magnetic fields to obtain detailed information about the "massless Dirac fermions" that carry charge in graphene. In agreement with prior investigations, we find that for small magnetic fields, the rotational stacking effectively decouples the electronic properties of the top graphene layer from those below. However, in maps of the wavefunction density at magnetic fields above 5 Tesla, we discover atomic-scale features that were not previously known or predicted. A phenomenological theory shows that this high-field symmetry-breaking is a consequence of small cyclotron-orbit wavefunctions, which are sensitive to the local layer stacking structures internal to the moire superlattice cell. The broken symmetry is sublattice degeneracy, predicated by atomic scale variations that derive from the sublattice polarization of graphene wavefunctions.

Graphene, a sheet of carbon atoms organized in a honeycomb lattice, is a two dimensional crystal. Even though the material has been known for a long time, only recently has it stimulated considerable interest across different research areas. Graphene is interesting not only as a platform to study fundamental physics in two dimensions, but it also has great potential for post-silicon microelectronics owing to its exceptional electronic properties. Of the several methods known to produce graphene, epitaxial growth of graphene by sublimation of silicon carbide is probably the most promising for practical applications. This thesis is a theoretical study of the growth kinetics of epitaxial graphene on SiC(0001). We propose a step-flow growth model using coarse-grained kinetic Monte Carlo (KMC) simulations and mean-field rate equations to study graphene growth on both vicinal and nano-faceted SiC surfaces. Our models are consistent with experimental observations and provide quantitative results which will allow experimenters to interpret the growth morphology and extract energy barriers from experiments. Recently, it has been shown that graphene grown epitaxially on metal surfaces may lead to potential applications such as large area transparent electrodes. To study deposition-type epitaxial growth, we investigate a new theoretical approach to this problem called the phase field method. Compared to other methods this method could be less computationally intensive, and easier to implement at large spatial scales for complicated epitaxial growth situations.