My dissertation research focuses on the investigation of the transport and magnetic properties of transition metal and rare earth doped oxides, particularly SnO2 and HfO2 thin films. Cr- and Fe-doped SnO2 films were deposited on Al2O3 substrates by pulsed-laser deposition. Xray- diffraction patterns (XRD) show that the films have rutile structure and grow epitaxially along the (101) plane. The diffraction peaks of Cr-doped samples exhibit a systematic shift toward higher angles with increasing Cr concentration. This indicates that Cr dissolves in SnO2. On the other hand, there is no obvious shift of the diffraction peaks of the Fe-doped samples. The magnetization curves indicate that the Cr-doped SnO2 films are paramagnetic at 300 and 5 K. The Fe-doped SnO2 samples exhibit ferromagnetic behaviour at 300 and 5 K. Zero-field-cooled and field-cooled curves indicate super paramagnetic behavior above the blocking temperature of 100 K, suggesting that it is possible that there are ferromagnetic particles in the Fe-doped films. It was found that a Sn0.98Cr0.02O2 film became ferromagnetic at room temperature after annealing in H2. We have calculated the activation energy and found it decreasing with the annealing, which is explained by the increased oxygen vacancies/defects due to the H2 treatment of the films. The ferromagnetism may be associated with the presence of oxygen vacancies although AMR was not observed in the samples. Pure HfO2 and Gd-doped HfO2 thin films have been grown on different single crystal substrates by pulsed laser deposition. XRD patterns show that the pure HfO2 thin films are of single monoclinic phase. Gd-doped HfO2 films have the same XRD patterns except that their diffraction peaks have a shift toward lower angles, which indicates that Gd dissolves in HfO2. Transmission electron microscopy images show a columnar growth of the films. Very weak ferromagnetism is observed in pure and Gd-doped HfO2 films on different substrates at 300 and 5 K, which is attributed to either impure target materials or signals from the substrates. The magnetic properties do not change significantly with post deposition annealing of the HfO2 films.

Hydrogen exposure of insulating d0-titanates, such as SrTiO3 (STO), has displayed the formation of intriguing conducting states. These conducting states form through the use of forming gas (N2/H2) annealing or hydrogen plasma exposure, where hydrogen gas is exposed to high energy microwaves. The exposure of STO to hydrogen causes metallic conductivity due to the introduction of hydrogen cations on some of the oxygen sites. However, the optical properties of this hydrogen-exposed STO have not been well-studied. Further, Ba0.5Sr0.5TiO3 (BST), an insulating dielectric, also shows changes in its conductivity upon hydrogen exposure. Unlike STO where the conductivity of the hydrogen-exposed material has been characterized, the optical, electronic, and transport properties of hydrogen exposed BST have not been studied. Thus, by studying hydrogen-exposed BST and STO, our understanding of the effects of hydrogen on insulators can be enhanced. In the first study, the effects of the exposure of insulating dielectric BST thin films to a hydrogen plasma is presented. These BST thin films are deposited on GdScO3 (GSO) substrates via Pulsed Laser Deposition (PLD). After deposition, the thin films are exposed to a hydrogen plasma. Just five minutes of hydrogen plasma exposure is enough to induce conductivity in the BST thin film. This conducting state is dominated by the interplay of disorder and strong electron correlations introduced during hydrogen exposure. Further, the optical properties indicate the formation of a transparent conductor, as the introduction of disorder and strong correlations has not changed the optical properties of the BST thin film in the visible spectrum. BST demonstrates an example of a new type of transparent conductor that utilizes large effective mass carriers to generate conductivity. In the second study, the effects of hydrogen doping on the surface of STO is explored. The conducting heterointerface that forms between PLD-deposited thin films of LaAlO3 (LAO) on STO is used as the standard to explore this hydrogen surface doping. The optical, electronic, and transport properties of water-leached and buffered hydrofluoric acid (BHF) etched heterointerfaces are characterized and compared. The recently developed water-leaching method is compared with the well-known BHF etching method, which has been shown to unintentionally dope the STO surface with fluorine and hydrogen. Both methods generate single-terminated atomically flat STO substrate surfaces that are ideal for heterointerface formation. After deposition, the optical, electronic, and transport properties of both the water-leached and BHF-etched heterointerfaces show no meaningful difference, demonstrating that water-leaching may also unintentionally dope the STO substrate surface with hydrogen. However, these results confirm that water-leaching generates a high-quality conducting heterointerface without the safety concerns of BHF.

Transition metal oxides have attracted widespread attention due to their broad range of fascinating exotic phenomena such as multiferroicity, superconductivity, colossal magnetoresistance and metal-to-insulator transition. Due to the interplay between spin, charge, lattice and orbital degrees of freedom of strongly correlated d electrons, these physical properties are extremely sensitive to the external perturbations such as magnetic field, charge carrier doping and pressure, which provide a unique chance in search for novel exotic quantum states. Ruthenate systems are a typical strongly correlated system, with rich ordered states and their properties are extremely sensitive to external stimuli. Recently, the experimental observation of spin-orbit coupling induced Mott insulator in Sr2IrO4 as well as the theoretical prediction of topological insulating state in other iridates, have attracted tremendous interest in the physics of strong correlation and spin-orbit coupling in 4d/5d compounds. We observe an itinerant ferromagnetic ground state of Ca2RuO4 film in stark contrast to the Mott-insulating state in bulk Ca2RuO4. We have also established the epitaxial strain effect on the transport and magnetic properties for the (Ca,Sr)2RuO4 thin films. For Sr2IrO4 thin films, we will show that the Jeff = 1/2 moment orientation can be modulated by epitaxial strain. In addition, we discovered novel Ba7Ir3O13+x thin films which exhibit colossal permittivity. / acase@tulane.edu

Perovskite oxides are a very versatile material class with a large variety of outstanding physical properties. A subgroup of these compounds particularly tempting to investigate are oxides involving high-\(Z\) elements, where spin-orbit coupling is expected to give rise to new intriguing phases and potential application-relevant functionalities. This thesis deals with the preparation and characterization of two representatives of high-\(Z\) oxide sample systems based on KTaO\(_3\) and BaBiO\(_3\). KTaO\(_3\) is a band insulator with an electronic valence configuration of Ta 5\(d\)\(^0\) . It is shown that by pulsed laser deposition of a disordered LaAlO\(_3\) film on the KTaO\(_3\)(001) surface, through the creation of oxygen vacancies, a Ta 5\(d\)\(^{0+\(\delta\)}\) state is obtained in the upmost crystal layers of the substrate. In consequence a quasi two dimensional electron system (q2DES) with large spin-orbit coupling emerges at the heterointerface. Measurements of the Hall effect establish sheet carrier densities in the range of 0.1-1.2 10\(^{14}\) cm\(^2\), which can be controlled by the applied oxygen background pressure during deposition and the LaAlO\(_3\) film thickness. When compared to the prototypical oxide q2DESs based on SrTiO\(_3\) crystals, the investigated system exhibits exceptionally large carrier mobilities of up to 30 cm\(^2\)/Vs (7000 cm\(^2\)/Vs) at room temperature (below 10 K). Through a depth profiling by photoemission spectra of the Ta 4\(f\) core level it is shown that the majority of the Ta 5\(d\)\(^0\) charge carriers, consisting of mobile and localized electrons, is situated within 4 nm from the interface at low temperatures. Furthermore, the momentum-resolved electronic structure of the q2DES \(buried\) underneath the LaAlO\(_3\) film is probed by means of hard X-ray angle-resolved photoelectron spectroscopy. It is inferred that, due to a strong confinement potential of the electrons, the band structure of the system is altered compared to \(n\)-doped bulk KTO. Despite the constraint of the electron movement along one direction, the Fermi surface exhibits a clear three dimensional momentum dependence, which is related to a depth extension of the conduction channels of at least 1 nm. The second material, BaBiO\(_3\), is a charge-ordered insulator, which has recently been predicted to emerge as a large-gap topological insulator upon \(n\)-doping. This study reports on the thin film growth of pristine BaBiO\(_3\) on Nb:SrTiO\(_3\)(001) substrates by means of pulsed laser deposition. The mechanism is identified that facilitates the development of epitaxial order in the heterostructure despite the presence of an extraordinary large lattice mismatch of 12 %. At the heterointerface, a structurally modified layer of about 1.7 nm thickness is formed that gradually relieves the in-plane strain and serves as the foundation of a relaxed BBO film. The thereupon formed lattice orders laterally in registry with the substrate with the orientation BaBiO\(_3\)(001)||SrTiO\(_3\)(001) by so-called domain matching, where 8 to 9 BaBiO\(_3\) unit cells align with 9 to 10 unit cells of the substrate. Through the optimization of the deposition conditions in regard to the cation stoichiometry and the structural lattice quality, BaBiO\(_3\) thin films with bulk-like electronic properties are obtained, as is inferred from a comparison of valence band spectra with density functional theory calculations. Finally, a spectroscopic survey of BaBiO\(_3\) samples of various thicknesses resolves that a recently discovered film thickness-controlled phase transition in BaBiO\(_3\) thin films can be traced back to the structural and concurrent stoichiometric modifications occuring in the initially formed lattice on top of the SrTiO\(_3\) substrate rather than being purely driven by the smaller spatial extent of the BBO lattice. / Komplexe Metalloxide mit Perowskitstruktur sind bekannt für ihre große Vielfalt einzigartiger physikalischer Eigenschaften. Eine interessante Untergruppe dieser Materialien sind Verbindungen von Elementen mit hoher Ordnungszahl \(Z\), in denen neue, durch Spin-Bahn Kopplung getriebene Phasen und anwendungsrelevante Funktionalitäten erwartet werden. Diese Arbeit handelt von der Präparation und Charakterisierung zweier Probensysteme, die auf eben solchen Materialien mit hoher \(Z\) basieren. KTaO\(_3\) ist ein Bandisolator, der im Grundzustand eine Ta 5\(d\)\(^0\) Valenz besitzt. Durch gepulste Laserdeposition von ungeordnetem LaAlO\(_3\) auf der KTaO\(_3\)(001) Oberfläche, werden die obersten Schichten des Substratkristalls durch die Erzeugung von Sauerstofffehlstellen dotiert. Es bildet sich ein quasi zweidimensionales metallisches Elektronensystem (q2DES) an der Grenzfläche der Heterostruktur aus. Messungen des Hall-Effekts ergeben Schichtladungsträgerdichten im Bereich von 0.1-1.2 10\(^{14}\) cm\(^2\), welche durch Anpassung des Sauerstoffhintergrunddrucks während der Deposition bzw. durch die Dicke der abgeschiedenen LaAlO\(_3\) Schicht beeinflusst werden können. Mit Werten von 30 cm\(^2\)/Vs (7000 cm\(^2\)/Vs) bei Raumtemperatur (unter 10 K), besitzt das q2DES in LaAlO\(_3\)/KTaO\(_3\) im Vergleich zu ähnlichen Elektronensystemen in SrTiO\(_3\) bemerkenswert große Ladungsträgerbeweglichkeiten. Aus dem Tiefenprofil des Photoemissionspektrums des Ta 4\(f\) Rumpfniveaus ergibt sich, dass sich der Großteil der Ta 5\(d\) Ladungsträger, bestehend aus mobilen und lokalisierten Elektronen, innerhalb einer Schicht von 4 nm Dicke befindet. Die Vermessung der elektronischen Bandstruktur des vergrabenen q2DES mit Hilfe winkelaufgelöster Photoelektronenspektroskopie mit harter Röntgenstrahlung zeigt, dass das Elektronensystem, vermutlich wegen des starken Potentialgradients an der Grenzfläche, eine modifizierte elektronische Struktur gegenüber n-dotiertem Bulk-KTaO\(_3\) aufweist. Trotz der Einschränkung der Bewegung der Elektronen entlang einer Richtung, besitzt die Fermifläche des Systems eine dreidimensionale Struktur, woarus auf eine Tiefenausdehnung der metallischen Zustände von mindestens 1 nm geschlossen werden kann. Undotiertes BaBiO\(_3\) ist durch die Ausbildung einer Ladungsordnung isolierend. Unter Elektronendotierung gilt das Material als Kandidat für einen oxidischen topologischen Isolator. In dieser Studie wird die Deposition von BaBiO\(_3\) auf Nb:SrTiO\(_3\)(001) Substraten untersucht. Dabei wird der Mechanismus identifiziert, der epitaktisches Wachstum von BaBiO\(_3\), trotz einer Gitterfehlanpassung von 12 %, ermöglicht: Eine 1.7 nm dicke Lage mit abweichender Kristallstruktur an der Grenzfläche entkoppelt das Filmgitter vom Substrat, sodass darüber vollständig relaxiertes BaBiO\(_3\) aufwachsen kann. Dieses weist eine epitaktische Orientierung von BaBiO\(_3\)(001)||SrTiO\(_3\)(001) auf, die durch die Ausbildung von lateralen Gitterdomänen, bei denen 8 bzw. 9 BaBiO\(_3\) auf 9 bzw. 10 SrTiO\(_3\) Einheitszellen ausgerichtet sind, gewährleistet wird. Die Stoichiometrie und die strukturelle Qualität der BaBiO\(_3\) Filme werden durch eine systematische Anpassung der Depositionsbedingungen optimiert. Die Valenzbandstruktur der Proben stimmt gut mit Rechnungen der Dichtefunktionaltheorie überein, was darauf hindeutet, dass die Filme hinsichtlich der elektronischen Eigenschaften mit BaBiO\(_3\) Einkristallen vergleichbar sind. Eine abschließende Untersuchung eines schichtdickenabhängigen Phasenübergangs in BaBiO\(_3\) Dünnfilmen, von dem kürzlich in der Literatur berichtet wurde, belegt, dass dieser nicht allein auf die Ausdehnung des Kristallgitters, sondern auch auf strukturelle und stoichiometrische Modifikationen der untersten Filmlagen zurückzuführen ist.

Nous avons développé de nouveaux concepts de fabrication de matériaux nanostructurés en couche mince basés sur le dépôt par ablation laser alterné d'un métal (Ag) et d'un diélectrique (Al2O3). Cette technique permet d'atteindre un contrôle optimal sur les paramètres morphologiques des nanostructures qui déterminent la réponse optique des couches minces. Nous avons produit des nanosphères, des nanolentilles et des nanocolonnes, auto-organisées et orientées, encapsulées dans une matrice d'alumine amorphe. Leur réponse optique a été étudiée en fonction de leur morphologie et comparée à des simulations théoriques. En parallèle à cette étude, la réponse vibrationnelle des nanostructures a été analysée par spectrométrie Raman basse fréquence. Finalement, des nanostructures contenant des couches alternées de nanoparticules de Co et d'Ag séparées par une distance de quelques nanomètres ont aussi été fabriquées. Il a été montré que l'interaction entre le plasmon de surface et les modes sphéroïdaux de vibration des nanoparticules active le signal Raman.

Pulsed laser deposition has been used to grow Pb(Zr₀.₅₂Ti₀.₄₈)O₃ (PZT)/LaNiO₃ (LNO) heterostructures with restricted crystallographic orientations on bare Si(001) and SiO₂-coated Si(001) substrates, using TiN buffer layers. The effect of background gas pressure on orientation of the thin films was investigated in detail. XRD analyses showed that under optimized conditions, (001)-oriented PZT/LNO/TiN heterostructures could be grown on either Si(001) or SiO₂/Si substrates. The (001)-textured PZT films had remnant polarizations as high as 23µC/cm², and also had a low coercive field. Up to 10¹⁰ switching cycles have been achieved in these PZT films. / Singapore-MIT Alliance (SMA)

Ph.D. / Electrical Engineering / Nanometer-scale devices have attracted great attention as the ultimate evolution of silicon integrated circuit technology. However, fabrication of nanometer-scale silicon based devices has met great difficulty because it places severe constraints on process technology. This is especially true for SiGe/Si heterostructures because they are particularly sensitive to strain relaxation and/or process induced defects. Recently developed Pulsed Laser Induced Epitaxy (PLIE) offers a promising approach for the fabrication of nanometer- scale SiGe/Si devices. It possesses the advantage of ultra-short time, low thermal budget and full compatibility with current silicon technology. The selective nature of the process allows epitaxial growth of high quality, localized SiGe layers in silicon. In this thesis, a process to fabricate SiGe nanowires in silicon using PLIE is described. In particular, Ge nanowires with a cross-section of ~6 x 60 nm² are first formed using a lift-off process on the silicon substrate with e-beam lithography, followed by a thin low-temperature oxide deposition. Defect-free SiGe nanowires with a cross-section of ~25 x 95 nm² are then produced by impinging the laser beam on the sample. We thus demonstrate PLIE is a suitable fabrication technique for SiGe/Si nanostructures. Fabrication of Ge nanowires is also studied using Focused Ion Beam (FIB) micromachining techniques. Based on the SiGe nanowire process, we propose two advanced device structures, a quantum wire MOSFET and a lateral SiGe Heterojunction Bipolar Transistor (HBT). MEDICI simulation of the lateral SiGe HBT demonstrates high performance of the device. In order to characterize the SiGe nanowires using cross-sectional transmission electron microscopy, an advanced versatile focused ion beam assisted sample preparation technique using a multi-layer stack scheme for localized surface structures is developed and described in this thesis.

No description available.

Advancements in the semiconductor industry require new materials with improved performance. With the introduction of copper as the interconnect material for integrated circuits, efficient diffusion barriers are required to prevent the diffusion of copper into silicon, which is primarily through grain boundaries. This dissertation reports the processing of high quality stoichiometric thin films of TiN, TaN and HfN, and studies their Cu diffusion barrier properties. Epitaxial metastable cubic TaN (B1-NaCl) thin films were grown on Si(001) using an ultra-thin TiN (B1-NaCl) seed layer which was as thin as 1 nm. The TiN/TaN stacks were deposited by Pulsed Laser Deposition (PLD), with the TiN thickness systematically reduced from 15 to 1 nm. Microstructural studies included X-ray diffraction (XRD), transmission electron microscopy (TEM) and high resolution TEM (HRTEM). Preliminary Cu diffusion experiments showed that the TiN seed layer thickness had little or no obvious effect on the overall microstructure and the diffusion barrier properties of the TaN/TiN stacks. Epitaxial and highly textured cubic HfN (B1-NaCl) thin films (~100 nm) were deposited on MgO(001) and Si(001) using PLD. Low resistivities (~40 mu omega-cm) were measured with a four point probe (FPP). Microstructural characterizations included XRD, TEM, and HRTEM. Preliminary Cu diffusion tests demonstrated good diffusion barrier properties, suggesting that HfN is a promising candidate for Cu diffusion barriers. Cubic HfN (B1-NaCl) thin films were grown epitaxially on Si(001) substrates by using a TiN (B1-NaCl) buffer layer as thin as ~10 nm. The HfN/TiN stacks were deposited by PLD with an overall thickness less than 60 nm. Detailed microstructural characterizations included XRD, TEM, and HRTEM. The electrical resistivity measured by FPP was as low as 70 mu omega-cm. Preliminary copper diffusion tests showed good diffusion barrier properties with a diffusion depth of 2~3 nm after vacuum annealing at 500 degrees C for 30 minutes. Additional samples with Cu deposited on top of the cubic HfN/TiN/Si(001) were vacuum annealed at 500 degrees C, 600 degrees C and 650 degrees C for 30 minutes. The diffusivity of copper in the epitaxial stack was investigated using HRTEM. The measured diffusion depths, 2 Dt , were 3, 4 and 5 nm at 500 degrees C, 600 degrees C and 650 degrees C respectively. Finally, the diffusivity of Cu into epitaxial HfN was determined to be D=D0 exp(-Q/kT)cm2s-1 with D0=2.3x10-14cm2s-1 and Q=0.52eV.

Diamond and diamond-like carbon films, with their exceptionally good mechanical, chemical, and optical properties, are the best materials as protective hard coatings for electronic devices and cutting tools. The biocompatibility of these materials makes it suitable for bone implants. The wide range applications of these films are hindered because of the high compressive stresses developed during the deposition. Use of carbide and nitride interfacial layers has emerged as one of the methods to reduce the compressive stresses.The present research focuses on the study of different materials as the interfacial layers for diamond and tetrahedral amorphous carbon films. For tetrahedral amorphous carbon AlN, Ta, TiN, TiC, TaN and W were investigated as the interlayer materials. The interlayer was deposited at different substrate temperatures to study the temperature induced changes in the residual stress. The tetrahedral amorphous carbon with TiN interlayer deposited at 300°C and 600°C exhibited a maximum reduction in the stress.TiN and TiC were deposited as interlayer for the diamond films on Ti-6Al-4V alloy. TiC has improved the adhesion of diamond with the substrate and exhibited less compressive stresses compared to TiN.