The efficiency of an organic photovoltaic cell depends mainly on its morphology where an exciton has to migrate to a p-n junction to create a photocurrent. Therefore the distance from the bulk of the cell to a junction interface should not exceed the diffusion length of the exciton. In this thesis, two novel lithographical methods, to produce specific polymer morphologies, were developed and evaluated. In the first method, called embedded annealing, self-assembled polystyrene colloids were embedded in a polydimethylsiloxane (PDMS) film and annealed under an electric field to produce a bi-polymer structure consisting of polymer columns in a thin film of PDMS. Polymer colloids were successfully assembled into two dimensional hexagonally close packed arrays. However, the annealing process was unsuccessful. The second method, imprint annealing, aimed to increase the aspect ratio (height/width) of thermally imprinted micrometer sized polystyrene features by annealing them in uniform electric fields. The results showed that the aspect ratio of imprinted features can be significantly increased, 21-fold, while maintaining the periodicity of the original imprint. This is in contrast to previous results where smooth polymer films annealed in uniform fields where the periodicity of the resulting structures cannot be independently controlled, and are highly sensitive to the electrode spacing. Feature sizes down to 1 µm and aspect ratios up to 4.5 were achieved using imprint annealing. / Verkningsgraden hos en hos en solcell beror, för givna material, framförallt på dess uppbyggnad. För att bidra till fotoströmmen måste en genererad exciton vandra till en pn-övergång. På grund av detta bör det längsta avståndet till närmaste pn-övergång i solcellen inte vara längre än excitonens diffusionslängd. I detta examensarbete testas två olika litografiska metoder för att åstadkomma en specifik filmgeometri lämpad för organiska solceller. Den första metoden, kallad embedded annealing, går ut på att bädda in spontant ordnade sfäriska polystyrenkolloider i en polydimetylsiloxan (PDMS) -film för att sedan vid förhöjd temperatur applicera ett elektiskt fält över filmen. Förhoppningen var att på detta sätt töja ut kolloiderna till pelare genom PDMS-filmen. I det första steget ordnades kolloiderna sponant i tätpackade hexagonala tvådimensionella gitter på kiselsubstrat. Experimenten lyckades inte med hjälp av elektriska fält töja ut kolloiderna. Den andra metoden, imprint annealing, syftar till att öka höjd/bredd -förhållandet och minska diametern hos präglade polystyrenstrukturer. Dessa ursprungliga topografiska stukturer skapas med hjälp av en tryckpressmetod kallad nanoimprinting. Dessa strukturer värmdes upp, och ett uniformt elekrisk fält applicerades över dem. Mina resultat visar att man med elektriska fält avsevärt kan öka höjd-breddförhållandet hos polymerstrukturer och samtidigt bevara periodiciteten hos de ursprungliga strukturerna. Detta står i kontrast mot tidigare resultat på släta filmer, där periodiciteten inte kan kontrolleras oberonde av andra parametrar. Med imprint annealing ökades höjd-breddförhållandet hos enskilda strukturer upp till 21 gånger. Diametrar ner till 1 µm och höjd/breddförhållanden upp till 4,5 uppnåddes.

Cette thèse présente des résultats théoriques et expérimentaux portant sur des écoulements à l'échelle nanoscopique de polymères fondus. L'étude analytique et numérique de l'écoulement d'un film de polymère, préalablement nanostructuré par nanoimpression puis recuit au dessus de sa température de transition vitreuse, a permis de dégager différentes dynamiques de nivellement selon la topographie initiale du film. Certaines ont été appliquées à l'élaboration d'éléments optiques par recuit de nanostructures complexes. Une méthode de mesure de la viscosité Newtonienne et du temps terminal de relaxation d'un polymère déposé en film mince a également pu être développée. Enfin, un travail exploratoire portant sur un procédé de nanoimpression sans épaisseur résiduelle par démouillage est présenté. L'accent a porté sur le calcul précis de la pression de disjonction dans un milieu stratifié en utilisant la théorie moderne de Lifshitz basée sur les propriétés optiques des matériaux en interaction. / This thesis presents a theoretical and experimental work on nanoscale flows of polymer melts. Different leveling dynamics emerge from the analytical and numerical study of the reflow of a polymer film that is first nanoimprinted and then annealed above its glass transition temperature, depending on the initial topography of the film. These concepts were applied to the manufacturing of optical devices from the reflow of complex nanostructures. A method to measure the Newtonian viscosity and the terminal relaxation time of a thin polymer film was also developed. Finally, an exploratory work on a residual-layer-free nanoimprint process based on dewetting is presented. Emphasis was put on the accurate computation of the disjoining pressure in stratified media with the modern Lifshitz theory based on the optical properties of the interacting materials.

The aim of the present work was to design and fabricate all purpose, positioning-tolerant and efficient interconnects between single-mode fibers and integrated waveguides out of polymers. The developed structures are part of the optical packaging of integrated optical chips. Integrated optics have gathered tremendous interest throughout recent years from research as well as from the industry, and most likely the demand will further grow in the future. Today’s trend is to establish optical data communication not only in far-distance transmission but also in end-user or so called fiber-to-home configurations, or, in the near future, also on board or even chip level. In addition, integrated optical sensors are gaining more and more importance. In the future, lab-on-a-chip systems may be able to simplify and accelerate analysis methods within health care or allow for a continuous monitoring of almost any environmental variable. All these applications call for robust optical packaging solutions. Many integrated optical chips are using a silicon-on-insulator design. Technologies which were originally intended for the manufacturing of integrated circuits can be utilized for the fabrication of such silicon-on-insulator chips. Point-of-care testing, which is a considerable part of bio-sensing, in some cases only allows the use of disposable transducer elements. The fabrication of these transducers, also including almost all other system parts, may be possible using polymers. Alternative fabrication methods like nanoimprint lithography can be applied for the patterning of polymers. With these, the extension of already known working principles or even entirely new device architectures become feasible for mass production. The direct patterning of polymers by means of nanoimprint was used to fabricate interconnects for integrated waveguides. In contrast to conventional lithography approaches, where a patterned resist layer is used as a masking layer for subsequent process steps, direct patterning allows the immediate use of the structures as functional elements. Firstly, nanoimprint allows diffraction-unlimited patterning with nanometer resolutions as well as the replication of complex three-dimensional patterns. These unique properties were used within this work to pattern shallow gratings atop an integrated waveguide within only one single manufacturing step. The gratings are used as coupling elements and can be utilized either to couple light from external elements to the chip or vice versa. Considerations regarding the optical effects on single-mode polymer waveguides as well as grating couplers were obtained from simulation. They are specific to the chosen design and the used polymer and cannot be found elsewhere so far. Compared to similar designs and fabrication strategies proposed in literature, the ones followed here allow for a higher efficiency. The dimensions and process windows obtained from simulation did serve as a basis for the subsequent fabrication of the grating couplers. All steps which are necessary to turn the calculated design into reality, ranging from master fabrication, to working mold cast and imprint, are shown in detail. The use of a working mold strategy is of crucial importance for the fabrication process and is discussed in detail. The use of a working mold preserves a costly master and further allows for a cost-efficient production. Parameters which are relevant for the production as well as for the final polymer patterns were analyzed and discussed. On the basis of the obtained data, a process optimization was performed. The optical characterization was also part of the presented work. A comparison with the results obtained from simulation is included and additional effects were revealed. Most of them may be subject to further improvement in future designs. In summary, the present work contributes to the field of optical packaging. It shows a viable route for the design and fabrication of interconnects of single-mode polymer waveguides. The presented design can be used as a building block which can be placed at almost any positions within an integrated optical chip. The fabrication method includes a minimum number of process steps and is still able to increase performance compared to similar approaches. Moreover, all process steps allow for scaling and are potential candidates for mass production.

Les filtres spectraux à réseaux résonants, ou GMRF (Guided-Mode Resonance Filters), sont une nouvelle génération de filtres à bande étroite et constituent une alternative très prometteuse aux filtres conventionnels multicouches Fabry-Pérot. Le pic de résonance d'un GMRF peut être très fin spectralement et de longueur d'onde de centrage accordable en fonction de l'angle d'incidence. Ces propriétés sont particulièrement importantes pour la spectroscopie. Les travaux antérieurs ont permis de mettre en œuvre une structure originale comportant deux réseaux 1D croisés. Les performances de ce filtre surpassent celles des filtres conventionnels par leur réponse spectrale subnanométrique, leur accordabilité, et leur capacité à s'affranchir de l'influence de la polarisation de l'onde incidente sous incidence oblique. Le but de ce travail est d'explorer les performances ultimes de ce type de dispositif en termes de résolution et taux de réjection, par une approche mêlant théorie, technologie et caractérisation. Nous présentons des résultats expérimentaux d'un filtre en réflexion indépendant de la polarisation, accordable sur 40 nm avec 8.3nm/° d'accordabilité, ayant une réflexion de 10-3 sur une plage de 90nm en dehors de la résonance et un facteur de qualité supérieur à 5000. / Guided Mode Resonance Filters ( GMRF ) are a new generation of narrowband optical filters and are a very promising alternative to conventional multilayer Fabry-Perot filters. The resonance peak of GMRF can be spectrally extremely thin and with a centering wavelength tunable according to the angle of incidence of the light. These properties are particularly important for spectroscopy. Previous works have helped to implement an original structure with two 1D crossed gratings. The performance of this filter overpasses those of conventional filters in their spectral subnanometric response, tunability and their ability to overcome the influence of the polarization of the incident wave under oblique incidence. The aim of this work is to explore the final performances of such devices in terms of resolution and rejection rate, thanks to an approach combining theory, fabrication technology and characterization. We present experimental results of a polarization independent reflective filter, tunable over 40nm with a tunability of 8.3nm / °, having a reflection of 10-3 on a 90nm range outside the resonance and a quality factor over 5000.

Le coût de fabrication des modules photovoltaïques est un point critique pour implanter l’énergie solaire dans le mix énergétique. L’un des moyens d’abaisser ce coût est la réduction de l’épaisseur de silicium utilisé pour la fabrication des cellules photovoltaïques. Il est techniquement possible de produire des cellules photovoltaïques en silicium cristallin d’une épaisseur de quelques dizaines de micromètres d’épaisseur seulement, bien que cela représente un défi à la fois pour le procédé de fabrication de telles cellules et pour leur optimisation. Celle-ci est différente des cellules d’épaisseur conventionnelle notamment par le besoin d’un piégeage optique et d’une passivation de surface de haut niveau. Cet aspect sera étudié au travers de deux structures : un réflecteur en face arrière de la cellule, et un procédé de texturisation innovant pour limiter la gravure du silicium de la cellule, déjà mince. Enfin, l’implantation du réflecteur dans des cellules photovoltaïques sera traitée. L’optimisation du réflecteur considéré pour des cellules minces en silicium cristallin a montré de très bonnes propriétés réfléchissantes et de passivation de surface, ainsi qu’une compatibilité avec l’ensemble des étapes du procédé de fabrication. Ensuite, la texturisation avancée développée dans ce travail a montré un gain potentiel important en photogénération pour des cellules de faible épaisseur. La caractérisation de ces structures a montré des performances optiques et électriques comparables à l’état-de-l’art. Enfin, la fabrication de cellules photovoltaïques d’épaisseur standard utilisant le procédé développé pour les cellules minces a montré le gain du réflecteur développé pour la face arrière par rapport à une structure classique de cellule. De plus, la réalisation de ces cellules avec le procédé destiné aux cellules minces a permis d’établir que les étapes non-standard du procédé sont compatibles avec l’obtention de cellules photovoltaïques performantes. / The cost of fabrication of photovoltaic modules is a critical figure for settling solar power into the energy mix. One way to lower this cost is to decrease silicon use in photovoltaic cells. It is technically possible to produce crystalline silicon solar cells only a few dozens of microns thick, although this represents a challenge both for their fabrication process and their optimization. This last one is different from cells of standard thickness, especially by the need of high level light trapping and surface passivation. Two structures will be studied in order to fulfill these aspects : a reflector on the rear side of the cell, and an innovative texturing process used to limit the etching of the already thin silicon absorber. Eventually, the implementation of the rear side reflector into photovoltaic cells will be discussed. The rear side reflector optimized for thin-film crystalline silicon solar cells has shown very good passivating and reflecting properties, as well as compatibility with the overall fabrication process. Moreover, the advanced texturation process developped in this work has shown a large potential gain in photogeneration for thin solar cells. These structures have been characterized and have shown a reflectivity and a passivation level coherent with the state-of-the-art. Finally, solar cells of standard thickness have been fabricated with the thin solar cells process, and have shown an improvement from the rear side reflector in comparison with a standard cell structure. Moreover, making these cells with the thin cells process has shown that the non-standard steps of this process are compatible with high-performance solar cells fabrication.

Molding is a simple manufacturing process whereby fluid fills a master tool and then solidifies in the shape of the tool cavity. The precise nature of material flow during molding has long allowed fabrication of plastic components with sizes 1 mm 1 m. Polymer molding with precise critical dimension control could enable scalable, inexpensive production of micro- and nanostructures for functional or lithographic use. This dissertation reports experiments and simulations on molding of polymer micro- and nanostructures at length scales 1 nm 1 mm. The research investigates two main areas: 1) mass transport during micromolding and 2) polymer mechanical properties during nanomolding at length scales 100 nm. Measurements and simulations of molding features of size 100 nm 1 mm show local mold geometry modulates location and rate of polymer shear and determines fill time. Dimensionless ratios of mold geometry, polymer thickness, and bulk material and process properties can predict flow by viscous or capillary forces, shape of polymer deformation, and mold fill time. Measurements and simulations of molding at length scales 100 nm show the importance of nanoscale physical processes distinct from bulk during mechanical processing. Continuum simulations of atomic force microscope nanoindentation accurately model sub-continuum polymer mechanical response but highlight the need for nanoscale material property measurements to accurately model deformation shape. The development of temperature-controlled nanoindentation enables characterization of nanoscale material properties. Nanoscale uniaxial compression and squeeze flow measurements of glassy and viscoelastic polymer show film thickness determines polymer entanglement with cooperative polymer motions distinct from those observed in bulk. This research allows predictive design of molding processes and highlights the importance of nanoscale mechanical properties that could aid understanding of polymer physics.

Thermal nanoimprint lithography (T-NIL) is a cheap and fast technique to produce nanopatterns in polymeric materials. It creates these patterns by pressing a stamp down into a polymer film that has been heated above its glass transition temperature. These nanopatterned polymer films can be used in a wide variety of scientific fields, not the least the organic semiconductor industry. There the nanopatterned films have, among else, been used to improve the efficiency of organic light-emitting diodes (OLEDs). The light-emitting electrochemical cell (LEC), which is similar in structure to an OLED, also uses polymer films in their device structure but the light emitting layer also contains an electrolyte. However, it has not been shown if nanopatterns can improve LECs as well or if it is even possible to make an imprint in their polymer films that are mixed with an electrolyte. This thesis shows that T-NIL can be used to imprint nanopatterns in films made of poly(ethylene oxide) and the conjugated polymer Super Yellow. The best nanopatterns were produced by setting the imprint parameters to  85 °C, 10 bar, 1800 s for poly(ethylene oxide) and 115 °C, 20 bar, 1800 s for Super Yellow. Imprints were also performed on polystyrene but no nanopatterns could be produced. This was most likely because the stamp could not handle the high temperature that is required to make a nanopattern in polystyrene. The best imprint parameters of Super Yellow were then used to produce a pattern in a film made of Super Yellow mixed with the salt tetrahexylammonium tetrafluoroborate (THABF4) in order to be able to produce one imprinted and one reference LEC. The imprinted LEC had a luminosity of 139 cd/m2, an improvement of 20% compared to the reference’s 115 cd/m2 when operated under identical conditions.  The forward direction and the angular dependent electroluminescence spectrum of the imprinted LEC clearly showed an effect not observed in the reference. These findings show that the polymer films used in a LEC can be imprinted with a nanopattern by using T-NIL. The imprinted films can be used to create functional LECs that show different behavior and a higher luminosity compared to a non-imprinted reference. If these results can be repeated it might be the starting point of a brighter future.

Current trends in electronic industry, such as Internet of Things (IoT) and Cloud Computing call for high interconnect bandwidth, increased number of active devices and high IO count. Hence the integration of on silicon optical waveguides becomes an alternative approach to cope with the performance demands. The application and fabrication of horizontal (planar) and vertical (Through Silicon Vias - TSVs) optical waveguides are discussed here. Coupling elements are used to connect both waveguide structures. Two micro-structuring technologies for integration of coupling elements are investigated: μ-mirror fabrication by nanoimprint (i) and dicing technique (ii). Nanoimprint technology creates highly precise horizontal waveguides with polymer (refractive index nC = 1.56 at 650 nm) as core. The waveguide ends in reflecting facets aligned to the optical TSVs. To achieve Total Internal Reflection (TIR), SiO2 (nCl = 1.46) is used as cladding. TSVs (diameter 20-40μm in 200-380μm interposer) are realized by BOSCH process1, oxidation and SU-8 filling techniques. To carry out the imprint, first a silicon structure is etched using a special plasma etching process. A polymer stamp is then created from the silicon template. Using this polymer stamp, SU-8 is imprinted aligned to vertical TSVs over Si surface.Waveguide dicing is presented as a second technology to create coupling elements on polymer waveguides. The reflecting mirror is created by 45° V-shaped dicing blade. The goal of this work is to develop coupling elements to aid 3D optical interconnect network on silicon interposer, to facilitate the realization of the emerging technologies for the upcoming years.

To increase the survival rate from infectious- and noncommunicable diseases, reliable diagnostic during the preliminary stages of a disease onset is of vital importance. This is not trivial to achieve, a highly sensitive and selective detection system is needed for measuring the low concentrations of biomarkers available. One possible route to achieve this is through biosensing based on plasmonic nanostructures, which during the last decade have demonstrated impressive diagnostic capabilities. These nanoplasmonic surfaces have the ability to significantly enhance fluorescence- and Raman signals through localized hotspots, where a stronger then normal electric field is present. By further utilizing a periodic sub-wavelength nanohole array the extraordinary optical transmission phenomena is supported, which open up new ways for miniaturization. In this study a nanoplasmonic chip (NPC) composed of a nanohole array —with lateral size on the order of hundreds of nanometer— covered in a thin layer of gold is created. The nanohole array is fabricated using soft nanoimprint lithography on two resists, hydroxypropyl cellulose (HPC) and polymethyl methacrylate (PMMA). An in depth analysis of the effect of thickness is done, where the transmittance and Raman scattering (using rhodamine 6G) are measured for varying gold layers from 5 to 21 nm. The thickness was proved to be of great importance for optimizing the Raman enhancement, where a maximum was found at 13 nm. The nanohole array were also in general found beneficial for additionally enhancing the Raman signal. A transmittance minima and maxima were found in the region 200-1000 nm for the NPCs, where the minima redshifted as the thickness increased. The extraordinary transmission phenomena was however not observed at these thin gold layers. Oxygen plasma treatment further proved an effective treatment method to reduce the hydrophobic properties of the NPCs. Care needs be taken when using thin layers of gold with a PMMA base, as the PMMA structure could get severely damaged by the plasma. HPC also proved inadequate for this projects purpose, as water-based fluids easily damaged the surface despite a deposited gold layer on top.

Ce mémoire traite de l’ étude et de la réalisation de composants à ondes élastiques de surface (SAW) pour des applications de filtrage dans les gammes VHF et UHF. Nous y étudions différentes structures de ces filtres, à commencer par des filtres à couplage acoustique longitudinal centrés aux alentoursdu gigahertz, de bande passante relative inférieure à 0,1 % réalisés sur quartz. Leur fabrication et leur caractérisation ont révélé des pertes d’insertion inférieures à 5 dB et des niveaux de rejet supérieurs à 20 dB, conformément aux prévisions de notre modèle de matrice mixte. Un tel filtre a été inséré dans un oscillateur pour valider la fonction réalisée. Pour une maîtrise accrue de la conception de ces filtres, nous avons développé un modèle tenant compte de la contribution des modes transverses sur leur fonction de transfert. Des comparaisons entre théorie et expérience ont permis de démontrer la précision de ce modèle. Nous nous sommes également intéressés à des structures de filtres à éléments d’impédance et à transducteurs en éventails (fan-shaped) pour la réalisation de bandes passantes relatives comprises entre 1 et 15 % dans la bande 100 − 300 MHz. Pour chacune de ces structures, nous avons développé un modèle permettant d’en étudier le comportement. Une configuration de filtre en treillis de bande passante relative proche de 2 %a été fabriquée et caractérisée, ainsi que plusieurs filtres à transducteurs en éventails de bandes passantes relatives supérieures à 10 %. Enfin, nous avons étudié deux approches qui nous ont permis de réaliser des dispositifs fonctionnant à des fréquences voisines de 3 GHz. La première, consiste à exploiter les vitesses de phase supérieures à 5 km.s−1 d’un guide d’ondes à base de carbone-diamant. La seconde exploite la résolution d’un procédé de lithographie par nano-impression pour réduire la période des réseaux d’ électrodes. / This thesis deals with the development of surface acoustic wave devices (SAW) for filtering applications in the VHF and UHF bands. Several filter structures are studied. The first ones are longitudinally coupled resonator filters (LCRF) manufactured on Quartz with a relative pass-band narrower than 0,1 % centered at about 1 GHz. These filters have been fabricated and characterized, yielding less than 5 dB insertion loss with rejection levels in excess of 20 dB as predicted by our P-matrix model. One of these filters has been mounted in an oscillator to validate its characteristics.To improve the design of such filters, we have developed a model accounting for transverse mode contributions on their spectral function. Comparisons between theory and experiment emphasizes the accuracy of the developed model. We also have investigated impedance element and slanted transducers (fan-shaped) filter structures to produce filters with relative pass-band ranging from 1 to 15 % in the 100 − 300 MHz frequency range. For each type of filters, we have developed a model to predict their electrical response. A balanced-bridge filter configuration with a 2 % relative pass-band and four fan-shaped filters with pass-band larger than 10 % have been fabricated and characterized. Finally, we have studied two approaches for the development of SAW devices operating at frequencies in the vicinity of 3 GHz. The first approach exploits Diamond-based substrates, providing phase velocity higher than 5 km.s−1. The second one uses a nano-imprint lithography process to reduce the pitch of electrode gratings.