The aim of this master thesis is a study of nitrogen post-discharge by mercury vapours titration. The nitrogen post-discharge is investigated for many years theoretically as well as for a practical use. The object of this master thesis is a study of kinetic processes ongoing at titrations of mercury vapours during the nitrogen post-discharge at different pressures and applied powers. All experimental data were obtained from an optical emission spectroscopy of nitrogen post-discharge. DC discharge in flowing regime was chosen for measurements. The first part of experiments was carried out at the constant discharge current (100 mA), voltage (1300 V) and wall temperature (300 K). The total gas pressure was varied in range of 500-3000 Pa at nitrogen flow in range of 0.12-0.68 l/min. Nitrogen flow values were arranged to obtain constant nitrogen flow velocity for all gas pressures. The second set of experiments studied power dependencies. The current was varied in the range of 50-200 mA for constant voltage 1300 V. The total gas pressure in this case was 1000 Pa. Mercury vapours were introduced into the system by titration tube at different post-discharge time. The nitrogen pink afterglow effect was well visible at all experimental conditions. This effect corresponds to the maximum intensity of light emission, which expresses as considerable growth of characteristic pink radiation in the post-discharge time. Optical emission spectra of post-discharge were taken in the range of 320-780 nm. Besides three nitrogen spectral systems (first and second positive and first negative), the mercury line at 254 nm was recorded in the second order spectrum at 508 nm under these conditions if mercury was added. This spectral line is excited under post-discharge conditions by collisionally induced resonance energy transfer from nitrogen highly vibrationally excited ground state metastables and it opens an unique technique for their monitoring. The dependence of relative intensities on decay time for mercury spectral line and selected nitrogen spectral systems at different titration positions were measured. The relative intensities of nitrogen bands decrease with increasing of mercury line relative intensity for all total gas pressures. The pink afterglow phenomenon shifts to the later decay times with the increasing of total gas pressure. In the case of experiments at different power, it can be seen that with decreasing power mercury spectral line intensity decreases in post-discharge time. The first detailed tests of the unique detection for highly excited of nitrogen metastables were completed. However this master thesis is concentrated on the basic research which supports better indication of kinetic processes and reactions leading to transformation of excitation energy, this new knowledge should be applied in future also in technologies based on the long-lived metastable induced reactions.

The main subject of this diploma thesis is the study of the effect of humidity on the total sterilization effect of the dielectric barrier discharge. Sterilization is a process which can eliminate all forms of life. The plasma sterilization is one of the methods that are suitable for sterilization of temperature and chemical sensitive materials. This sterilization method was proved to be effective on the wide spectrum of procaryotic and eucaryotic microorganisms. Basically, the main inactivation factors for cells exposed to plasma are heat, UV radiation and various reactive species. Dielectric barrier discharge (DBD) operating at atmospheric pressure was used for the sterilization of the samples. The discharge was generated in dry air and in humid air. The plasma power densities were 2 160 mW.cm-3, 2 279 mW.cm-3 and 2 760 mW.cm-3 (dry air) or 2 326 mW.cm-3 and 2 850 mW.cm-3 (humid air). Humidity of air was achieved using a wash bottle filled with water through which air flowed into the DBD reactor. Fungi spores of Aspergillus niger were used as model microorganisms. Whatman paper No. 1 was used as the carrying medium. When comparing sterilization efficiency of humid and dry air operating at the same conditions, the higher sterilization effect was observed in humid air. The sterilization effect of the DBD generated in air was compared with results obtained during plasma generation in argon and nitrogen. At the same conditions, the highest sterilization effect was observed in argon, followed by humid air, nitrogen and dry air. It was found out that in our experimental setup the active species are probably the main inactivation mechanism. The influence of temperature on the inactivation of microorganisms was completely negligible. The discharge parameters were studied by means of the optical emission spectroscopy (OES). Plasma treated samples were analyzed employing scanning electron microscopy (SEM). Damage of the microorganisms due to the effect of plasma as well as plasma effect on the structure of the carrying medium was evaluated.

No description available.

The purpose of this dissertation is to — on occasion very literally — shine a light on processes that occur in non-thermal plasmas containing CO2, mostly for CO2 conversion. In particular, the focus lies on the transient behaviour of these discharges: how do these systems evolve over time before they settle in a (non-thermal) equilibrium. In addition to that, it analyses trends in the field of plasma-catalytic CO2 conversion as a whole to evaluate the current state-of-the-art, but also presents a new platform for the community to contribute and collaborate on, to facilitate cross-comparison between disparate experiments. The first part consists of experiments performed on: (a) an atmospheric pressure nanosecond repetitively pulsed (NRP) discharge for CO2 conversion, and (b) a test bed system for a remote CCP plasma source for plasma-enhanced atomic layer deposition (PE-ALD) of trimethylaluminium (TMA). The common theme in these experiments is a focus on the application of time-resolved, in situ diagnostics to study transient behaviour in the systems under investigation. The main diagnostics employed for such measurements are optical emission spectroscopy (OES) and laser induced fluorescence (LIF), which can provide complementary results when used in conjunction. In particular, this work presents the following results: A study of the evolution of emission from an NRP discharge (using OES), establishing both electron densities (by Stark broadening of atomic oxygen and carbon lines) and gas temperatures (by the N2 second positive system) as the discharge evolves from a breakdown phase to a spark phase. It furthermore explores the changes to these properties when operating in burst mode, where a subsequent pulse experiences a memory effect from the preceding one, which has been shown to be conducive to efficient conversion in literature. A study into the effect on energy efficiency of CO2 conversion by alternating the power modulation in an NRP discharge. Crucially, using CET-LIF (collisional energy transfer LIF) and OES it is shown that while power deposition to the discharge occurs in the order of 100 ns in the discharge, CO2 dissociation occurs on a timescale beyond a microsecond. This indicates that instead of direct electron impact, molecular-excitation kinetics play an important role under these conditions for CO2 dissociation. By shortening the time between pulses in a burst (down to 33 us in the work), these mechanisms can be further enhanced, by prolonging the quasi-‘metastable’ state of the system. The application of LIF in a PE-ALD process plasma along with OES, where diffusion profiles were measured close to the substrate surface with local time-resolved measurements of the OH ground state density. These indicate that the investigated surface reactions finish on a timescale of 100 ms, faster than would be indicated by OES which effectively measures emission from the bulk plasma after diffusion of reaction products away from the surface. The second part of this work is an open access database on plasma(-catalytic) CO2 conversion that is instrumental in identifying and verifying trends in experimental data, but also stresses the importance of rigorous reporting of essential parameters in literature. The approach in literature is diverse: some studies focus more on a mechanistic understanding of the fundamental processes, whilst others already focus on process tailoring and optimization for industrial applications. Trends observed in earlier review papers are observed as well and can now be trivially reproduced. The database platform (https://db.co2pioneer.eu) is put forward as a new tool for the community to easily cross-compare and contextualize experimental outcomes and strongly encourages new contributions. Based on the 196 papers included at the time of publication, a number of observations and recommendations can already be made. Chief among those is a clear and present need in the field for a more fundamental understanding of plasma-catalysis interaction, to develop techniques and criteria that are properly suited to test the synergy of both, rather than relying on methods from e.g. traditional thermal-catalysis. Also in this instance, local, time-resolved diagnostics may play a key role, but their implementation will be challenging.

The concept of plasma flow control is a relatively new idea based on using atmospheric plasma placed near the edge of an air foil to reduce boundary layer losses. As with any new concept, it is important to be able to quantify theoretical assumptions with known experimental results for validation. Currently there are a variety of experiments being done to better understand plasma flow control, but one particular experiment is through the use of multi-physics modeling of dielectric barrier discharge actuators. The research in this thesis uses optical measurement techniques to validate computational models of flow control actuators being done concurrently at Virginia Tech. The primary focus of this work is to design, build and test plasma actuators in order to determine the plasma characteristics relating to electron temperatures and densities. Using optical measurement techniques such as plasma spectroscopy, measured electron temperatures and densities to compare with theoretical calculations of plasma flow control under a variety of flow conditions. This thesis covers a background of plasma physics, optical measurement techniques, and the designing of the plasma actuator setups used in measuring atmospheric plasmas. / Master of Science

L'objectif de cette thèse est de fournir une meilleure compréhension des différents phénomènes physiques liés aux microplasmas/microdécharges. Pour cela, des matrices de microréacteurs sur silicium ont été étudiées. De nombreuses configurations ont été construites de manière à analyser l’influence de chaque paramètre physique sur le fonctionnement de ces dispositifs. Le présent travail porte sur l'élaboration et la caractérisation de dispositifs micro-décharge à base de silicium. Dans ce travail de thèse, les régimes de courant continu (DC) et de courant alternatif (AC) sont étudiés en utilisant des configurations de décharges différentes. Pour la fabrication de ces réacteurs, nous sommes partis de wafers de Silicium que nous avons structurés et traités en salle blanche. La technologie de fabrication utilisée est compatible avec les méthodes de fabrication de dispositifs CMOS. Les microréacteurs sont constitués d’électrodes de nickel et de silicium séparés par une couche diélectrique de SiO2 de 6 μm d’épaisseur. L’épaisseur du diélectrique est ici beaucoup plus faible que celle des microréacteurs étudiés jusqu’à présent. Les dispositifs sont constitués de cavités de 25 à 150 microns de diamètre. Les essais de microdécharge ont été effectués dans des gaz inertes à une pression comprise entre 100 et 1000 Torrs. Nous avons d’abord étudié les phénomènes d’allumage et d’extinction à partir de microdispositifs monocavité en alumine. Puis, nous avons étudié le fonctionnement en DC/AC de microréacteurs en silicium comportant un nombre de cavité compris entre 1 et1024. Les caractéristiques des microdécharges ont été étudiées grâce à des mesures électriques, des mesures de spectroscopie d'émission optique (OES), de spectroscopie d’absorption à diode laser (DLAS) et de spectroscopie d'émission optique résolue en temps (PROES). Ces différents diagnostics nous ont permis de mettre en évidence les phénomènes d’allumage, d’extinction, d’instabilité et les mécanismes de défaillance de nos microdispositifs. Ce travail de thèse a permis de tester les performances et les limites technologiques des matrices de microdécharges sur silicium. Une attention particulière a été portée sur leur durée de vie. / The objective of this thesis is to provide a better understanding of various physical phenomena related to microplasmas/microdischarges. For this purpose, arrays of microreactors on silicon were studied. Different array configurations were fabricated to analyse the influence of each parameter on the physical operation of these devices. The present work focuses on the development and characterisation of micro-discharge devices based on silicon. In this thesis, direct current (DC) and alternating current (AC) regimes are studied using different discharge configurations. For the fabrication of these reactors, Silicon wafers are structured and processed in a cleanroom. Fabrication technology used is compatible with the CMOS technology. The microreactors are fabricated with nickel and silicon electrodes, separated by a dielectric layer of SiO2 with a thickness of 6 μm. The thickness of the dielectric is much lower here than the microreactors studied so far. The devices consist of cavities with 25 to 150 μm in diameter. Experiments of the microdischarges are performed in inert gases at a pressure between 100 and 1000 Torr. We first studied the phenomena of ignition and extinction for the microdevices based on alumina. Then, we studied the microreactors based on silicon containing 1 to 1024 cavities under DC and AC regimes. Characteristics of microdischarges were studied by electrical measurements, measurements of optical emission spectroscopy (OES), laser diode absorption spectroscopy (DLAS) and phase resolved optical emission spectroscopy (PROES). These diagnostics allowed us to investigate the phenomena of ignition, extinction, instability and failure mechanisms of the microplasma devices. This thesis work allowed testing the performance and technological limitations of the silicon based microdischarge arrays. Particular attention was paid to their life time.

The objective of this thesis is to provide a better understanding of various physical phenomena related to microplasmas/microdischarges. For this purpose, arrays of microreactors on silicon were studied. Different array configurations were fabricated to analyse the influence of each parameter on the physical operation of these devices. The present work focuses on the development and characterisation of micro-discharge devices based on silicon. In this thesis, direct current (DC) and alternating current (AC) regimes are studied using different discharge configurations. For the fabrication of these reactors, Silicon wafers are structured and processed in a cleanroom. Fabrication technology used is compatible with the CMOS technology. The microreactors are fabricated with nickel and silicon electrodes, separated by a dielectric layer of SiO2 with a thickness of 6 μm. The thickness of the dielectric is much lower here than the microreactors studied so far. The devices consist of cavities with 25 to 150 μm in diameter. Experiments of the microdischarges are performed in inert gases at a pressure between 100 and 1000 Torr. We first studied the phenomena of ignition and extinction for the microdevices based on alumina. Then, we studied the microreactors based on silicon containing 1 to 1024 cavities under DC and AC regimes. Characteristics of microdischarges were studied by electrical measurements, measurements of optical emission spectroscopy (OES), laser diode absorption spectroscopy (DLAS) and phase resolved optical emission spectroscopy (PROES). These diagnostics allowed us to investigate the phenomena of ignition, extinction, instability and failure mechanisms of the microplasma devices. This thesis work allowed testing the performance and technological limitations of the silicon based microdischarge arrays. Particular attention was paid to their life time.

Au cours de la dernière décennie, la technologie de projection à la torche à plasmasous très faible pression (VLPPS) (inférieure à 10 mbar) a attiré l’attention denombreux chercheurs car ce procédé permet d’envisager la possibilité de réaliser desdépôts de structure voisine de celle des dépôts en phase vapeur avec une cinétiqueproche de celle de la projection thermique classique. Cette technologie vise donc àévaporer totalement ou partiellement des poudres afin de déposer des revêtementsdenses avec une structure colonnaire ou mixte.Le travail effectué dans cette étude à consisté à étudier et à développer des moyenspour assurer la fusion et l’évaporation de matériaux céramiques en vue d’élaborer desrevêtements de haute qualité et à caractériser les propriétés de ces revêtements.Dans une première approche des dépôts denses et homogènes de zircone stabilisée àl’yttrine (YSZ) ont été obtenus sur un substrat « inox » en utilisant des torches àplasma « classiques » de type F100 et F4 sous très faible pression (1 mbar) en utilisantde façon originale un principe d’injection axiale via l’alimentation en gazplasmagènes. Un spectromètre d’émission optique a été utilisé pour analyser lespropriétés du jet de plasma et notamment apprécier le taux d’évaporation du matériau.La composition et la microstructure des dépôts ont été caractérisées par diffraction desrayons X et microscopie électronique à balayage. Les résultats ont montré que lapoudre YSZ a été partiellement évaporée et que les dépôts obtenus disposent d’unemicrostructure hybride composée de « splats » formés par des particules fondues etune « matrice » (en faible quantité) résultant de la condensation de vapeurs provenantde l’évaporation des particules surchauffées.Afin de tenter d’augmenter le taux de vaporisation, l’anode de la torche F100 a étéallongée et un dispositif d’arc transféré complémentaire a été réalisé afin d’éleverl’énergie du jet de plasma et de favoriser l’échange thermique. Les effets de cedispositif sur les propriétés du jet de plasma ont été évalués par spectrométried’émission optique et calcul de la température électronique. Des dépôts de YSZ etd’alumine (Al2O3) ont été élaborés à la pression de 1 mbar. Les dépôts de YSZ ontaffiché une microstructure hybride similaire à celle obtenue précédemment alors quepour les dépôts d’alumine, seul un dépôt lamellaire « classique » a été observé. Lacapacité d’évaporation est donc restée limitée. La microstructure, les propriétésmécaniques et les propriétés de résistance aux chocs thermiques des dépôts de YSZont été étudiées plus en détail et comparées avec celle de dépôts réalisés dans desconditions plus classiques. Une tenue améliorée en termes de résistance aux cyclagesthermiques a notamment été observée.Afin de répondre aux attentes en matière de niveau de densité de puissance du jet lelaboratoire s’est équipé d’une une nouvelle torche à plasma tri-cathode expérimentaleélaborée par la société AMT. Cette torche a été modélisée et testée dans un premiertemps en conditions atmosphériques, révélant une limitation importante du rendementde projection. A partir de ces premiers résultats expérimentaux une nouvellegéométrie de buse a été proposée afin d’améliorer le rendement de projection. Il aalors été constaté que le rendement de la projection avait été considérablementaugmenté par cette modification et que la microstructure du dépôt était également plusfavorable. Ce travail devra maintenant se poursuivre par l’intégration de cette torche dans l’enceinte sous pression réduite. / During the last decade, very low pressure plasma spraying (VLPPS) technology(below 10 mbar) attracted attention because it could allow to produce coatings with astructure similar to that of vapor deposited materials (PVD) with kinetics close to thatof thermal spray. This technology aims to fully or partially evaporate the feedstockmaterials in order to build rapidly dense, thin, and columnar coatings.The work during this thesis preparation was thus devoted to the study anddevelopment of tools and techniques allowing fusion and evaporation of ceramicmaterials in order to obtain high quality deposits with new performance and then tocharacterize the properties of those deposits. In a first approach dense and homogeneous yttria-stabilized zirconia (YSZ) coatingswere deposited successfully on a stainless steel substrate using “classical” plasmaspray torches such as F100 and F4 under very low pressure (1 mbar) by means ofusing an original way of introducing the feedstock material in the core of the plasmajet via the plasma gas port. Optical emission spectroscopy was used to analyze theproperties of the plasma jet and especially to observe the feedstock materialevaporation rate. The phase composition and the microstructure of the coatings werecharacterized by X-ray diffraction and scanning electron microscopy. Results showedthat the YSZ powder was partially evaporated and that the coatings possessed aduplex microstructure which was composed of splats formed by the impingement ofmelted particles and a little amount of a matrix formed by the condensation of thevapor emitted by overheated particles.In order to try and increase the evaporation rate, a home-made transferred arc nozzlewas made and mounted on a F100 plasma torch in order to enhance the energy levelof the plasma jet and then to increase thermal exchanges. The effects of thetransferred arc nozzle on the plasma jet properties were evaluated by optical emissionspectroscopy and electron temperature calculation. YSZ and alumina (Al2O3) coatingsWere elaborated using such a nozzle below 1 mbar. It was found that the YSZ coatingsdisplayed a duplex microstructure similar to that obtained in the previous experiments.However, no vapor condensation could be observed in the case of the Al2O3 coatingsindicating that the evaporation capacity of the system remained limited.The microstructure, the mechanical properties and the thermal shock resistance of theYSZ coatings were studied in more details and compared to that of deposits madeusing classical thermal spray routes. An enhanced resistance to thermal shock couldthus be observed for the coatings with a duplex structure.In order to find a solution for a substantial increase in the energy density of theplasma jet, the laboratory commissioned a novel experimental tri-cathode plasmatorch made to the AMT Company. This new torch was modeled and first testedunder atmospheric conditions, which revealed a poor spray yield. Following thosefirst experimental results, a modified nozzle was designed. As a result, the sprayefficiency was considerably increased and the coating fabricated by the tri-cathodetorch displayed a better microstructure. Now this work has to be pursued with theintegration of this torch in the low pressure spray tank.

La technologie de projection plasma sous basse pression a attiré l’attention de nombreux chercheurs comme une nouvelle technique qui permet d’établir un pont entre la projection thermique conventionnelle et le dépôt physique en phase vapeur. Ainsi, cette technologie étend les limites de projection thermique classique et augmente également la vitesse de croissance des dépôts par rapport aux procédés PVD ou CVD classiques. Cette technique peut évaporer totalement ou partiellement les poudres injectées et mener à la réalisation de revêtements à microstructure colonnaire et/ou plus denses, difficiles à réaliser avec des procédés de projection thermique conventionnels. La projection plasma de suspension a été effectuée pour la première fois sous basse pression. L’injection axiale de suspension avec une torche tri-cathodes permet d’augmenter l’échange enthalpique entre le jet de plasma et les poudres après l’évaporation du solvant. La spectroscopie à l’émission optique (OES) a été utilisée pour estimer la température électronique et vérifier l’existence de phase vapeur d’YSZ dans le jet de plasma. Finalement, des revêtements plus denses furent réalisés (comparés à ceux préparés par projection plasma de suspension à pression atmosphérique présentant des particules fondues, agglomérées et de la condensation de vapeur. Des tests de nano-indentation instrumentée ont été effectués sur la surface polie des dépôts réalisés. Les résultats montrent des valeurs de 5,8 GPa pour la dureté et 114,5 GPa pour le module d’élasticité, augmentant de 61% et 31%, respectivement, en comparaison avec les valeurs obtenues par SPS sous atmosphère ambiante. Les essais de projection de poudre YSZ agglomérée ont été réalisés avec une torche F4-VB dans le but de synthétiser une phase vapeur d’YSZ. On observe que les dépôts peuvent se former derrière les échantillons en céramique, sans vis-à-vis du plasma, par condensation de vapeur. En face de cette torche, des revêtements composites ont été obtenus par un mélange de poudres fondues et condensation de vapeur, simultanément. Cependant la quantité de phase vapeur est très faible dans le jet de plasma. Pour comprimer ce jet sous basse pression et afin d’améliorer l’échange d’enthalpie entre le jet de plasma et les poudres injectées, une buse rallongée a été mise en place sur la torche F4-VB. Les revêtements présentent ainsi une microstructure plus dense. Ceci est attribué à la haute vitesse des particules fondues vers le substrat suite à l’utilisation de la buse modifiée. Ce type de revêtement montre une valeur maximale de microdureté Vickers de 1273 Hv100 g. Par ailleurs, la réalisation de dépôts de carbures a été effectuée. Les résultats montrent la possibilité de former des carbures par projection plasma sous basse pression. Les revêtements composites (TiC/Ti) sont déposés par projection plasma réactif sous basse pression en utilisant le méthane comme gaz porteur. La température électronique Te calculée est d’environ 6200 K selon les résultats d’OES, ce qui est supérieur à la température d’ébullition du Ti et de TiC. Le revêtement de Ti pur présente une microstructure dense alors que TiC/Ti présente une microstructure lamellaire. Cependant, la quantité de TiC dans les revêtements est d’environ 20 vol.%. La microdureté Vickers, effectuée sur surface polie, a tendance à diminuer de 846±152 à 773±86 Hv100 g avec l’augmentation de la distance de projection. / As a new technology, the very low pressure plasma spraying has attracted attentions of many researchers, making it possible to establish a bridge between the conventional atmospheric plasma spraying (APS) and the vapor deposition (PVD or CVD). As a result, this new technology enlarges the limitation of APS and increases the deposition rate in comparison with the PVD or CVD. It is possible to evaporate partially the injected material and even evaporate completely and finally realize the columnar or dense coatings from the vapor or the mixture of vapor and liquid. The suspension plasma spraying is performed for the first time at low pressure. Taking consideration of the configuration of the three-cathode torch, the axial injection of the suspension is conducted which can increase the enthalpy change between the plasma jet and the sprayed material. The data of optical emission spectroscopy (OES) could be used to calculate the electron temperature and verify the existence of vapor of YSZ in the plasma jet. Finally, the dense coating was prepared by suspension plasma spraying at low pressure, which is composed of the melted particles, the agglomerated particles and the vapor deposition. The test of nano-indentation is conducted on the polished surface. It shows a value of 5.8 GPa for the microhardness and 114.5 GPa for the elastic modulus, increasing 61% and 31%, respectively, compared with the values obtained by SPS in the ambient atmosphere. In this study, another torch F4-VB is also conducted even of it has a low power in compared with that of O3CP torch. The powder feed rate is reduced to about 1.5 g·min-1 to achieve the vapor of YSZ taking the low power input of the torch into consideration. The columnar structure coating is realized from vapor deposition out of line of sight of projection upon the ceramic tubes. The composite structure coating is deposited by the mixture of melted particles and the vapor deposition simultaneously in front of this torch. But the quantity of vapor of YSZ is low in plasma jet. In order to compress the larger plasma jet and then improve the enthalpy change between the plasma jet and sprayed particles, an extended nozzle is prepared. It shows that the coating has a dense structure, which can be attributed to higher velocity of the melted powders. The coating shows a maximum value of microhardness Vickers up to 1273 Hv100 g. The composite coating of TiC/ Ti is realized by reactive plasma spraying using the methane as the carrier gas. The electron temperature Te is calculated to be 6200 K, which is over the boiling point of TiC and Ti. The coating Ti shows a dense structure and the composite coating TiC/Ti shows a lamellar structure. But the quantity of TiC in the composite coating is very low, about 20 vol.%. The Vickers microhardness is performed on the polished surface. It shows a decreasing tendency from 846 ± 152 to 773 ± 86 Hv100g with the increase of spraying distance. The tribological test is also implemented showing a high value of the coefficient of friction of 0.78 to 0.85, which can lead to a high abrasion. In order to synthesize a larger quantity of TiC in the composite coating, a higher power input torch should be put into action in the future.

Made available in DSpace on 2014-12-17T14:07:01Z (GMT). No. of bitstreams: 1 NataliaFD_DISSERT.pdf: 4136751 bytes, checksum: 47b384d6442f251d58542735c23ae300 (MD5) Previous issue date: 2012-02-27 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission Spectroscopy (OES) to investigate the influence of the active species in plasma. It was observed that increasing the H2 gas flow into the plasma the luminescent intensities associated to the species changed. In this case, the luminescence of N2 (391,4nm) species was not proportional to the increasing of the H2 gas into the reactor. Other parameters investigated were diameter and number of holes in the cage. The analysis by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are composed by TiN and they may have variations in the nitrogen amount into the crystal and in the crystallite size. The optical microscopy images provided information about the homogeneity of the films. The atomic force microscopy (AFM) results revealed some microstructural characteristics and surface roughness. The thickness was measured by ellipsometry. The optical properties such as transmittance and reflectance (they were measured by spectrophotometry) are very sensitive to changes in the crystal lattice of the material, chemical composition and film thicknesses. Therefore, such properties are appropriate tools for verification of this process control. In general, films obtained at 0 sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the films more stoichiometric and becomes it more crystalline. It was observed that with higher number of holes in the lid of the cage, close to the region between the lid and the sample and the smaller diameter of the hole, the deposited film is thicker, which is justified by the most probability of plasma species reach effectively the sample and it promotes the growth of the film / Filmes finos de nitreto de tit?nio foram crescidos sobre vidro utilizando a t?cnica de deposi??o por descarga em gaiola cat?dica a fim de averiguar a influ?ncia das vari?veis de processo nas propriedades ?pticas e estruturais do filme. Como atmosfera do plasma foi utilizada a mistura de gases Ar, N2 e H2, fixando o fluxo de Ar e N2 em 4 e 3 sccm, respectivamente, e usando fluxos de 0, 1 e 2 sccm de H2. O processo de deposi??o foi monitorado por Espectroscopia de Emiss?o ?ptica (OES) para investiga??o das esp?cies ativas no plasma. Observou-se que com o aumento fluxo de H2 as intensidades das esp?cies luminescentes no plasma sofrem altera??es e que a esp?cie N2 (391,4 nm) n?o teve um crescimento proporcional ao fluxo de H2. Outros par?metros investigados foram o di?metro e o n?mero de furos da gaiola. As an?lises de difra??o de raios X com ?ngulo de incid?ncia rasante (GIXRD) comprovaram que os filmes obtidos s?o compostos por TiN, podendo ter varia??es quanto a quantidade de nitrog?nio na rede e o tamanho de cristalito; a microscopia ?ptica forneceu dados sobre a homogeneidade, a partir da microscopia de for?a at?mica (AFM) observou-se algumas caracter?sticas microestruturais do filme e a rugosidade. A espessura foi quantificada atrav?s das an?lises de elipsometria. As propriedades ?pticas como reflet?ncia e transmit?ncia (medidas por espectrofotometria) s?o bastante sens?veis a altera??es na rede cristalina do material, composi??o qu?mica e espessura, sendo, portanto, uma boa ferramenta para verifica??o do controle do processo. De maneira geral, os filmes obtidos com fluxo de 0 sccm de H2 possuem uma maior transmit?ncia atribu?da ao menor cristalinidade decorrente da maior quantidade de nitrog?nio na rede cristalina do TiN. Os filmes obtidos nos fluxos de 1 e 2 sccm de H2 obtiveram um aspecto dourado e o difratograma apresentou picos caracter?sticos do TiN com maior intensidade e menor largura a meia altura, sugerindo que com a presen?a de hidrog?nio na atmosfera do plasma os filmes s?o mais estequiom?tricos e com maior cristalinidade. Quanto ? configura??o da gaiola observou-se que com maior quantidade de furos na tampa, maior a proximidade da tampa com a amostra e menor o di?metro do furo, maior ? a espessura do filme, o que ? justificado pela maior probabilidade das esp?cies do plasma atingirem efetivamente o substrato e promoverem o crescimento do filme