State-of-the-art SiGe BiCMOS technologies leverage the maturity of deep-submicron silicon CMOS processing with bandgap-engineered SiGe HBTs in a single platform that is suitable for a wide variety of high performance and highly-integrated applications (e.g., system-on-chip (SOC), system-in-package (SiP)). Due to their bandgap-engineered base, SiGe HBTs are also naturally suited for cryogenic electronics and have the potential to replace the costly de facto technologies of choice (e.g., Gallium-Arsenide (GaAs) and Indium-Phosphide (InP)) in many cryogenic applications such as radio astronomy. This work investigates the response of mixed-signal circuits (both RF and analog circuits) when operating in extreme environments, in particular, at cryogenic temperatures and in radiation-rich environments. The ultimate goal of this work is to attempt to fill the existing gap in knowledge on the cryogenic and radiation response (both single event transients (SETs) and total ionization dose (TID)) of specific RF and analog circuit blocks (i.e., RF switches and voltage references). The design approach for different RF switch topologies and voltage references circuits are presented. Standalone Field Effect Transistors (FET) and SiGe HBTs test structures were also characterized and the results are provided to aid in the analysis and understanding of the underlying mechanisms that impact the circuits' response. Radiation mitigation strategies to counterbalance the damaging effects are investigated. A comprehensive study on the impact of cryogenic temperatures on the RF linearity of SiGe HBTs fabricated in a new 4th-generation, 90 nm SiGe BiCMOS technology is also presented.

Dans le contexte des transports plus électriques, les parties mécaniques tendent à être remplacées par leurs équivalents électriques plus petits. Ainsi, le composant lui-même doit supporter un environnement plus sévère et de lourdes contraintes (haute tension, haute température). Les composants silicium deviennent alors inappropriés. Depuis la commercialisation des premières diodes Schottky en 2001, le carbure de silicium est le matériau reconnu mondialement pour la fabrication de dispositifs haute tension avec une forte intégration. Sa large bande d'énergie interdite et son fort champ électrique critique permettent la conception de transistors à effet de champ avec jonction (JFET) pour les hautes tensions ainsi que les diodes associées. Les structures étudiées dépendent de nombreux paramètres, et doivent ainsi être optimisées. L'influence d'un paramètre ne pouvant être isolée, des méthodes mathématiques ont été appelées pour trouver la valeur optimale. Ceci a conduit à la mise en place d'un critère d'optimisation. Ainsi, les deux grands types de structures de JFET verticaux ont pu être analysés finement. D'une part, la recherche d'une structure atteignant les tensions les plus élevées possible a conduit à l'élaboration d'un procédé de fabrication complexe. D'autre part, un souci de simplification et de stabilisation des procédés de fabrication a permis le développement d'un composant plus simple, mais avec une limite en tension un peu plus modeste. / In the context of more electrical transports, mechanical devices tend to be replaced by their smaller electrical counterparts. However the device itself must support harsher environment and electrical constraints (high voltage, high temperature) thus making existing silicon devices inappropriate. Since the first Schottky diode commercialization in 2001, Silicon Carbide (SiC) is the favorite candidate for the fabrication of devices able to sustain high voltage with a high integration level. Thanks to its wide band gap energy and its high critical field, 4H-SiC allows the design of high voltage Junction Field Effect Transistor (JFET) with its antiparallel diode. Studied structures depends of many parameters, that need to be optimized. Since the influence of the variation of each parameter could not be isolated, we tried to find mathematical methods to emphase optimal values leading to set an optimization criterion. Thus, two main kinds of JFET structure were finely analyzed. In one hand, the aim of the structure that can sustain a voltage as high as possible leads to a complex fabrication process. In the other hand, the care of a simplification and a stabilization of manufacturing process leads to the design of simpler device, but with a bit less sustain capabilities.