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The study on Photoreflectance spectra of Zn1-xMnxSe/GaAsLin, Huang-Nan 25 June 2001 (has links)
In this work¡Awe studied the strain effects on heavy hole (hh) and light hole (lh) bands of Zn1-xMnxSe/GaAs by photoreflectance (PR) spectroscopy . The Zn1-xMnxSe epilayers were grown on GaAs substrates by the MBE technique . There is a biaxial compressive strain exist in the epilayer, due to the different lattice constants between epilayers and substrates .The biaxial strain will shift hh and lh bands and lift the hh-lh degeneracy.
In our experiment ,we found that the splitting of the hh and lh transition energies is almost lineally proportional to the Mn ion concentrations. It can be ascribed to the strain in the epilayer . We have also measured the PR of Zn0.96Mn0.04Se/GaAs at various temperatures , and analyzed the transition energy of different temperatures in terms of Varshni relation.
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Development of Materials and Structures for p-type Contacts in CdTe Solar CellsFerizovic, Dino 01 January 2012 (has links)
Solar cells based on CdTe absorbers are attractive due to the optimal direct band gap energy and large absorption coefficient of CdTe, however, their performance and commercialization is hindered by the lack of reliable p-type contacts. CdTe has a low carrier concentration and a large electron affinity, which results in a requirement of non-realistic work functions for metals to be used as back contacts in the solar cell. Even noble metals such as Ag present a significantly large potential barrier for holes, thereby reducing the hole current through the semiconductor/metal interface. Several attempts to resolve this challenge have been tried, however, many drawbacks have been encountered.
Two particular systems, namely Cu2Te thin films and CdTe/ZnTe strained-layer superlattices, are investigated for their potential use as ohmic contacts in CdTe solar cells. A detailed analysis of the optical, electrical, and structural properties of Cu2Te thin films deposited by magnetron sputtering is presented. It is shown that these films have an indirect band gap and highly degenerate semiconductor behavior. The large p-type carrier concentration of Cu2Te films is highly desirable for the application of Cu2Te as a p-type contact to CdTe.
In-depth studies of optical transitions and miniband transport in strained-layer CdTe/ZnTe superlattices are presented as well. The band offsets between CdTe and ZnTe were determined by comparison of measured and calculated optical transitions. Superlattice structures that offer best contact performance have been identified by use of tunneling probability simulations.
Characterization of CdTe solar cells with above mentioned contacts indicated that contacts based on CdTe/ZnTe superlattices are a viable Cu free option for stable and reliable p-type contacts in CdTe solar cell. The contact performance of Cu2Te thin films was comparable to that of CdTe/ZnTe superlattices and both demonstrated an advantage over contacts based on ZnTe:N thin films which were used a standard.
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A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement / Siデバイス製造過程におけるプラズマプロセス誘起ダメージとその光学的測定方法論の研究Matsuda, Asahiko 23 May 2013 (has links)
京都大学 / 0048 / 新制・課程博士 / 博士(工学) / 甲第17788号 / 工博第3767号 / 新制||工||1576(附属図書館) / 30595 / 京都大学大学院工学研究科航空宇宙工学専攻 / (主査)教授 斧 髙一, 教授 木村 健二, 教授 立花 明知 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DFAM
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A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques / プラズマ暴露によるシリコン単結晶基板中の欠陥生成メカニズム及びその評価技術の研究Nakakubo, Yoshinori 25 May 2015 (has links)
京都大学 / 0048 / 新制・課程博士 / 博士(工学) / 甲第19185号 / 工博第4062号 / 新制||工||1627(附属図書館) / 32177 / 京都大学大学院工学研究科航空宇宙工学専攻 / (主査)教授 斧 髙一, 教授 木村 健二, 教授 立花 明知 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DFAM
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Development and Testing of the Experimental Setup for Characterization of Semiconductors Using Reflectance SpectroscopyRamani, Jayanth 26 July 2011 (has links)
No description available.
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Propriedades eletrônicas de super-redes com dopagem planar e de heteroestruturas epitaxiais semicondutoras / Electronic properties of super-networks with planar doped and epitaxial semiconductor heterostructureBeliaev, Dmitri 12 December 1994 (has links)
Os resultados apresentados neste trabalho estão sistematizados em três partes. Em uma primeira etapa, efetuamos um estudo sistemático do comportamento da estrutura eletrônica em super-redes de deltas em função do período da super-rede e em função da concentração planar de dopantes. Uma nova abordagem, que se baseia no método celular e na solução autoconsistente das equações de Schroedinger e de Poisson, foi desenvolvida e aplicada para super-redes com dopagem planar tipo n em GaAs e em silício. Em ambos os casos, foi observada a transição de um comportamento eletrônico de caráter bi- para tridimensional conforme o período da super- rede diminui. No caso de super-redes de deltas de Si em GaAs foi empreendido o cálculo da energia de corte nos espectros de fotoluminescência de excitação. Uma boa concordância com as medidas experimentais foi obtida. O estudo da estrutura eletrônica para o caso de super-rede de deltas de Sb em Si foi pioneiro. Isto tornou os resultados de nossa investigação teórica de importância fundamental para experimentais e teóricos atuando na 6rea. A concordância entre nossas previsões teóricas e dados experimentais da literatura demonstram a consistência e o poder da abordagem desenvolvida. Em uma segunda etapa, foi efetuado o estudo da distribuição espacial do campo elétrico interno em heteroestruturas contendo camadas tipo \"bulk\", compostas por GaAs e (A1Ga)As. Uma nova abordagem foi desenvolvida para a execuqi3o de cálculos dos perfis de potencial eletrostático e de campo elétrico, sem assumir a ionização total dos dopantes e a não-degenerescência do material. Nosso método transforma a equação de Poisson em uma equação integral que deve ser resolvida autoconsistentemente. Os exemplos numéricos demonstram a aplicabilidade de nossa abordagem a sistemas reais. Perfis do campo elétrico calculados são usados para interpretar os espectros de fotorefletância. Em uma terceira etapa, a teoria geral da fotorefletância de heteroestruturas semicondutoras foi desenvolvida neste trabalho para tornar a interpretação de espectros de fotorefletância precisa e de aplicação eficiente. Um novo metodo de cdculo do coeficiente de reflexgo na presenga de inomogeneidade espacial da funggo dieletrica no interior de cada camada fmeceu um novo patamar de cornpreens20 dos espectros de fotorefletiincia. Este metodo e baseado na construgiio de uma matriz de transferhcia que iraclui as inomogeneidades no interior da camada de um mod0 integral. Portanto, para descrever uma camada de heteroestrutura e preciso ter apenas uma ma& de transferencia. 0s resultados de simulag6es numericas de espectros da fotoreflethcia estilo em uma concordhcia bastante boa com aqueles obtidos atravb de medidas opticas. A eficiencia de nosso metodo o torna aplicavel a simulag6es tip0 \"on-line\". 0s resultados dos metodos anteriores sgo reproduzidos como casos limites de nossa abordagem geral. / The results presented in this work can be displayed along the following three lines. In the first we performed a systematical study of the electronic structure behavior in delta superlattices as a function of superlattice period and sheet doping concentration. A new approach, based on the cellular method and on the selfconsistent solution of Schroedinger and Poisson equations, was developed and applied to superlattices with n-type delta doping in GaAs and silicon. In both cases, a transition from bi- to three- dimensional electronic behavior with the decrease of superlattice period was observed. For Si delta-doping superlattices in GaAs we performed calculations of the energy threshold in the photoluminescence excitation spectra. A good agreement with experimentally measured values was observed. Our investigation of the electronic structure of Sb delta-doping superlattices in Si was a pioneer theoretical study. Due to thls fact, the results of our work are of great importance for experimentalists and theoreticians acting in this area. The agreement between our theoretical predictions and the available experimental data demonstrates the consistency and the power of the developed approach. Along the second line we studied electric field spatial distribution inside of heterosinctures containing bulk layers of GaAs and (A1Ga)As. A new approach was developed to calculate the electrostatic potential and electric field profiles, providing the possibility to take .into account the incomplete ionization of impurities and the degeneracy of the materials. Our method transforms the Poisson equation into an integral equation, which must be solved selfconsistently. Numerical examples show the way to apply our approach to real systems. Internal electric field proiiles, calculated by means of our method are used to interpret photoreflectance spectra. In the third line, a general theory of photoreflectance for semiconductor heterostructures was developed in this work to make the interpretation of fotoreflectance spectra more precise and straightfornard. A new method to calculate the reflection coefficient in the presence of weak spatial inhomogenities of the dielectrical function inside each layer, provided us with a new degree of comprehension of the photoreflectance spectra. This method is based on the construction of a transfer matrix which includes the inhomogenities inside the layer in an integral way. This explains why we need only one matrix to describe one layer of the heterostructure. Results of our numerical simulations are in very good agreement with data of optical measurements. The efficiency of our method makes it suitable for on-line simulations. The results of previous methods emerge from our general approach as limit cases.
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Propriedades eletrônicas de super-redes com dopagem planar e de heteroestruturas epitaxiais semicondutoras / Electronic properties of super-networks with planar doped and epitaxial semiconductor heterostructureDmitri Beliaev 12 December 1994 (has links)
Os resultados apresentados neste trabalho estão sistematizados em três partes. Em uma primeira etapa, efetuamos um estudo sistemático do comportamento da estrutura eletrônica em super-redes de deltas em função do período da super-rede e em função da concentração planar de dopantes. Uma nova abordagem, que se baseia no método celular e na solução autoconsistente das equações de Schroedinger e de Poisson, foi desenvolvida e aplicada para super-redes com dopagem planar tipo n em GaAs e em silício. Em ambos os casos, foi observada a transição de um comportamento eletrônico de caráter bi- para tridimensional conforme o período da super- rede diminui. No caso de super-redes de deltas de Si em GaAs foi empreendido o cálculo da energia de corte nos espectros de fotoluminescência de excitação. Uma boa concordância com as medidas experimentais foi obtida. O estudo da estrutura eletrônica para o caso de super-rede de deltas de Sb em Si foi pioneiro. Isto tornou os resultados de nossa investigação teórica de importância fundamental para experimentais e teóricos atuando na 6rea. A concordância entre nossas previsões teóricas e dados experimentais da literatura demonstram a consistência e o poder da abordagem desenvolvida. Em uma segunda etapa, foi efetuado o estudo da distribuição espacial do campo elétrico interno em heteroestruturas contendo camadas tipo \"bulk\", compostas por GaAs e (A1Ga)As. Uma nova abordagem foi desenvolvida para a execuqi3o de cálculos dos perfis de potencial eletrostático e de campo elétrico, sem assumir a ionização total dos dopantes e a não-degenerescência do material. Nosso método transforma a equação de Poisson em uma equação integral que deve ser resolvida autoconsistentemente. Os exemplos numéricos demonstram a aplicabilidade de nossa abordagem a sistemas reais. Perfis do campo elétrico calculados são usados para interpretar os espectros de fotorefletância. Em uma terceira etapa, a teoria geral da fotorefletância de heteroestruturas semicondutoras foi desenvolvida neste trabalho para tornar a interpretação de espectros de fotorefletância precisa e de aplicação eficiente. Um novo metodo de cdculo do coeficiente de reflexgo na presenga de inomogeneidade espacial da funggo dieletrica no interior de cada camada fmeceu um novo patamar de cornpreens20 dos espectros de fotorefletiincia. Este metodo e baseado na construgiio de uma matriz de transferhcia que iraclui as inomogeneidades no interior da camada de um mod0 integral. Portanto, para descrever uma camada de heteroestrutura e preciso ter apenas uma ma& de transferencia. 0s resultados de simulag6es numericas de espectros da fotoreflethcia estilo em uma concordhcia bastante boa com aqueles obtidos atravb de medidas opticas. A eficiencia de nosso metodo o torna aplicavel a simulag6es tip0 \"on-line\". 0s resultados dos metodos anteriores sgo reproduzidos como casos limites de nossa abordagem geral. / The results presented in this work can be displayed along the following three lines. In the first we performed a systematical study of the electronic structure behavior in delta superlattices as a function of superlattice period and sheet doping concentration. A new approach, based on the cellular method and on the selfconsistent solution of Schroedinger and Poisson equations, was developed and applied to superlattices with n-type delta doping in GaAs and silicon. In both cases, a transition from bi- to three- dimensional electronic behavior with the decrease of superlattice period was observed. For Si delta-doping superlattices in GaAs we performed calculations of the energy threshold in the photoluminescence excitation spectra. A good agreement with experimentally measured values was observed. Our investigation of the electronic structure of Sb delta-doping superlattices in Si was a pioneer theoretical study. Due to thls fact, the results of our work are of great importance for experimentalists and theoreticians acting in this area. The agreement between our theoretical predictions and the available experimental data demonstrates the consistency and the power of the developed approach. Along the second line we studied electric field spatial distribution inside of heterosinctures containing bulk layers of GaAs and (A1Ga)As. A new approach was developed to calculate the electrostatic potential and electric field profiles, providing the possibility to take .into account the incomplete ionization of impurities and the degeneracy of the materials. Our method transforms the Poisson equation into an integral equation, which must be solved selfconsistently. Numerical examples show the way to apply our approach to real systems. Internal electric field proiiles, calculated by means of our method are used to interpret photoreflectance spectra. In the third line, a general theory of photoreflectance for semiconductor heterostructures was developed in this work to make the interpretation of fotoreflectance spectra more precise and straightfornard. A new method to calculate the reflection coefficient in the presence of weak spatial inhomogenities of the dielectrical function inside each layer, provided us with a new degree of comprehension of the photoreflectance spectra. This method is based on the construction of a transfer matrix which includes the inhomogenities inside the layer in an integral way. This explains why we need only one matrix to describe one layer of the heterostructure. Results of our numerical simulations are in very good agreement with data of optical measurements. The efficiency of our method makes it suitable for on-line simulations. The results of previous methods emerge from our general approach as limit cases.
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Elaboration d'hétérostructures d'InN/InP et de semi-conducteurs III-V poreux : caractérisations physico-chimique, optique et électriqueBen Khalifa, Sana 20 October 2008 (has links) (PDF)
Nous avons élaboré des structures de quatre couches d'InN/InP (100) en enrichissant en In la surface nitrurée à l'aide d'une cellule d'évaporation calibrée. Les propriétés physiques de ces structures ont été étudiées in-situ à l'aide de spectroscopie, des électrons Auger (AES), des photoélectrons X (XPS) et UV (UPS) avant d'être analysées ex-situ par photoluminescence (PL) et mesures électriques (I(V) et C(V)). Nous avons mené une étude de PL en fonction de la température et l'évolution de l'énergie du pic de PL obtenue en fonction de la température suivait la forme en S-inversé caractéristique des effets de localisation. Les caractéristiques électriques courant-tension des structures Hg/InN/InP montrent qu'elles forment un contact Schottky. Les caractéristiques capacité-tension montrent qu'elles se comportent comme une structure lorsqu'on polarise négativement et comme une structure MIS quand on polarise positivement. Dans la dernière partie de cette thèse, des résultats sont présentés sur l'étude des propriétés physico-chimiques et optiques de semi-conducteurs poreux : le GaAs et l'InP poreux. L'effet de confinement quantique dans les cristallites de GaAs poreux a été confirmé après avoir caractérisé optiquement par Photoréflectivité (PR) et photoluminescence (PL) des échantillons de GaAs poreux
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Propriétés optiques et caractérisation par photoréflectance de cellules solaires à base de couches minces CIGS électrodéposéesMoreau, Antonin 25 March 2013 (has links)
Dans le domaine des cellules photovoltaïques à base de couches minces, l'alliage de Cu(In1-x,Gax)Se2 (CIGSe) constitue l'une des filières les plus avancées. Le passage à l'échelle industrielle soulève cependant de nouvelles problématiques. En effet, si le procédé standard de co-évaporation permet d'atteindre des rendements records supérieurs à 20 %, il reste relativement couteux à mettre en place. C'est ainsi que dans un contexte toujours plus compétitif, l'électrodépôt apparait comme une alternative de choix pour diminuer les coûts de production tout en garantissant des rendements compétitifs sur de grandes surfaces. Néamoins, de nombreuses propriétés spécifiques à ce mode de dépôt restent méconnues. En particulier les propriétés optiques à l'origine du photo-courant. Le premier objectif de cette thèse est donc de déterminer les constantes optiques de chaque couche du dispositif par ellipsométrie. Une attention particulière est donnée à la couche absorbante de CIGSe électrodéposée pour laquelle un protocole spécifique est employé. Une seconde partie de la thèse est dédiée à la réalisation d'un outil de caractérisation sans contact : la photoréflectance (PR). La PR va permettre de mesurer avec précision les énergies de transition interbandes d'un semi-conducteur, dont l'énergie de gap. Nous décrivons dans le détail le dispositif expérimental. Une implémentation originale utilisant une double modulation des sources a été développée et permet de réduire le bruit de mesure induit par la rugosité et la diffusion. L'étude de 14 échantillons de CIGS permet finalement de corréler des paramètres opto-électriques issus des caractéristiques courant-tension aux spectres PR. / Regarding, thin film photovoltaic market, Cu(In1-x,Gax)Se2 (CIGSe) based material is one of the most advanced technologies. Its high absorption coefficient allows it to absorb an important part of the solar spectrum with only two micron thickness. But while moving from fundamental research to the development of batch flow production, issues still remain. If the standard co-evaporation process lead to the best efficiency up to 20 %, high energy consumption is needed. In an increasingly competitive market, electroplating allows to reduce operating cost related to vacuum processes while guaranteeing competitive efficiencies on large scale modules. Nevertheless, due to the specificities of electroplating, new issues occur and some properties may differ from vacuum routes. In particular, optical properties which are responsible for photo-current generation. The first part of this thesis is thus devoted to obtain the optical constants for each layer of the device by spectroscopic ellipsometry. We pay special attention to the electrodeposited CIGSe absorber layer for which a specific method have been used in order to perform measurements on the back side. The second part of this thesis is dedicated to the development of an caracterisation tool : the photoreflectance (PR). The experimental setup is precisely described. An special implementation, using dual modulation technique, increases accuracy by removing luminescence and scattering perturbations. The study of 14 CIGS samples allows finally to correlate opto-electrical parameters from I(V) curves with PR spectra.
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