UHV transmission lines have several advantages when it comes to transferring of bulk amount ofpower in long distances. Although the technology is available from 1980’s, the number of UHVtransmission lines around the world has been increased in the beginning of this century in orderto supply the high demand of electricity. The number is going to increase even more in the nextfew years. Thus, it is important to study the UHV line characteristics and update the powersystem equipment as well as the operation procedure accordingly.UHV transmission lines exhibits some distinct phenomena which are not present in thetransmission lines with lower voltage levels e.g. high amount of charging current, non-linearincrease of apparent fault impedance with the increase in fault distance, longer time constant forthe DC component in fault current etc. Some of these are very important for different protectionschemes of the transmission line. The aim of this thesis work is to study the impact of UHV linecharacteristics on line differential protection and propose solutions to overcome them.Line differential protection is popular for its good selectivity and simplicity as long as there is adependable reliable communication system between the two ends of the line. High amount ofcapacitive charging current and large phase shift between sending and receiving end currents aretwo important characteristics of UHV lines which have severe impact on the line differentialprotection. It becomes very critical for the protection scheme to maintain good sensitivity andsecurity at the same time. As a result, compensation of the charging current becomes essential.The fixed compensation method is used to compensate the charging current of long lines withlower voltage levels. However, it cannot satisfy the sensitivity requirements for line differentialprotection scheme on UHV lines. Hence, it is necessary to search for other compensationmethods.In this thesis, a solution related with charging current compensation method is proposed with theuse of adaptive phase shift compensation. Several simulations have been done to examine thecharacteristics of the developed method in the worst case scenarios. It is found that the methodexhibits very good sensitivity as well as security for line differential protection on UHV lines. / UHV-transmissionsledningar har ett antal fördelar när det gäller överföringskapacitet av effektöver långa avstånd. Även om tekniken har varit tillgänglig sedan 1980-talet är det inte förränunder det senaste årtiondet som utbyggnaden har tagit fart ordentligt. Detta har skett för att mötaden höga efterfrågan på elektricitet. De närmaste åren väntas utbyggnaden öka ytterligare. Motdenna bakgrund är det relevant att studera karaktäristiken av UHV samt att uppdaterakraftsystemutrustning såväl som driften.UHV-tramsmissionslinor är förenade med vissa fenomen som inte förekommer förtransmissionsledningar med lägre spänning. Vissa av dessa fenomen är har stor inverkan påskyddsutrustning för transmissionslinorna. Syftet med denna uppsats är att studera inverkan frånUHV-transmissionsledningar på differentialskydd samt att föreslå lösningar för att överkommainverkan.Differentialskydd är populärt tack vare goda selektiva egenskaper och enkelhet så länge det finnsett pålitligt kommunikationssystem. Hög kapacitans och stor fasskiftning mellan strömmen påavsändar- och mottagarsidan är två viktiga egenskaper hos UHV-transmissionsledningar vilkahar stor inverkan på differentialskyddet. Det är väldigt viktigt att skyddsutrustningen kanupprätthålla god sensitivitet samt säkerhet. Av denna anledning är kompensation för den högakapacitansen viktig. Konstant kompensation används för att kompensera för hör kapacitans hoslånga transmissionslinor med lägre spänning. Denna metod är däremot inte fungerande för UHV.Det är därför nödvändigt att söka efter en annan lösning.I denna uppsats föreslås en lösning på behovet att kompensera för hög kapacitans genom attanvända adaptiv fasskiftkompensation. Flertalet simuleringar har genomförts för att utvärderakaraktäristiken av den utvecklade metoden. Det konstateras att metoden väldigt god känslighetoch säkerhet för differentialskydd av UHV-transmissionsledningar.

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O Brasil é um país de dimensões continentais, onde existe uma considerável distância entre a geração e os principais centros de consumo. Dessa forma, o estudo e desenvolvimento de novas tecnologias de transmissão a longas distâncias é de fundamental importância para o desenvolvimento do país. A solução mais utilizada atualmente é a transmissão em corrente alternada. Entretanto a transmissão em corrente continua também é uma solução viável para longas distâncias. O sistema brasileiro é composto principalmente por linhas 500 kV em corrente alternada (também há 230; 345; 440 e 750 kV), bem como em corrente continua (em ±600 e ±800 kV). O presente estudo apresenta uma solução de transmissão em corrente alternada por linhas de 1000 kV, que se mostrou mais econômico na transmissão de potências superiores a 3.500 MW e distâncias de 1400km. Nos próximos anos, a geração de energia elétrica no Brasil será expandida de forma significativa, ocorrerá um aumento principalmente na geração de energia eólica e solar, localizadas em sua maioria na região Nordeste do país. Esse aumento na geração exigirá a transmissão de grandes blocos de energia elétrica por distâncias significativas, devido à falta de proximidade entre a geração e os principais centros consumidores, que estão localizados no Sudeste. Neste estudo, serão mostradas as etapas de definição de condutor economicamente mais adequado e projeto da geometria da torre. Com base nos dados obtidos, será feita a avaliação do desempenho da linha 1000 kV, durante a operação normal de fluxo de carga, curtos-circuitos e estabilidade. / Brazil, a country of continental proportions, have significant distance between the power generation centers and the main consumer centers. In such way, the study and development of new transmission technologies over long distances is of fundamental importance for the development of the country. Nowadays, the most commonly used solution is alternating current transmission. However, direct current transmission is also a viable solution for long distances. The Brazilian system mainly consists of 500 kV alternating current lines (along with 230, 345, 440 and 750 kV) and direct current lines (± 600 and ± 800 kV). This study provides a solution for transmission in alternating current by lines of 1000 kV, which proved to be more economical in power transmission over 3,500 MW and distances beyond 1400km. In the coming years, the electric power generation in Brazil will expand significantly; a boost will take place mainly in wind and solar power generation, located mostly in the Northeast of the country. This generation expansion will require transmission of large blocks of electric power over considerable distances, due to the lack of proximity between generation sites and main consumer centers located in the Southeast. This study will show the setting stages of the most economically applicable conductor and tower geometry design. Based on the data obtained, the performance of the 1000 kV line will be evaluated during the regular load flow operation, short circuits and stability.

O Brasil é um país de dimensões continentais, onde existe uma considerável distância entre a geração e os principais centros de consumo. Dessa forma, o estudo e desenvolvimento de novas tecnologias de transmissão a longas distâncias é de fundamental importância para o desenvolvimento do país. A solução mais utilizada atualmente é a transmissão em corrente alternada. Entretanto a transmissão em corrente continua também é uma solução viável para longas distâncias. O sistema brasileiro é composto principalmente por linhas 500 kV em corrente alternada (também há 230; 345; 440 e 750 kV), bem como em corrente continua (em ±600 e ±800 kV). O presente estudo apresenta uma solução de transmissão em corrente alternada por linhas de 1000 kV, que se mostrou mais econômico na transmissão de potências superiores a 3.500 MW e distâncias de 1400km. Nos próximos anos, a geração de energia elétrica no Brasil será expandida de forma significativa, ocorrerá um aumento principalmente na geração de energia eólica e solar, localizadas em sua maioria na região Nordeste do país. Esse aumento na geração exigirá a transmissão de grandes blocos de energia elétrica por distâncias significativas, devido à falta de proximidade entre a geração e os principais centros consumidores, que estão localizados no Sudeste. Neste estudo, serão mostradas as etapas de definição de condutor economicamente mais adequado e projeto da geometria da torre. Com base nos dados obtidos, será feita a avaliação do desempenho da linha 1000 kV, durante a operação normal de fluxo de carga, curtos-circuitos e estabilidade. / Brazil, a country of continental proportions, have significant distance between the power generation centers and the main consumer centers. In such way, the study and development of new transmission technologies over long distances is of fundamental importance for the development of the country. Nowadays, the most commonly used solution is alternating current transmission. However, direct current transmission is also a viable solution for long distances. The Brazilian system mainly consists of 500 kV alternating current lines (along with 230, 345, 440 and 750 kV) and direct current lines (± 600 and ± 800 kV). This study provides a solution for transmission in alternating current by lines of 1000 kV, which proved to be more economical in power transmission over 3,500 MW and distances beyond 1400km. In the coming years, the electric power generation in Brazil will expand significantly; a boost will take place mainly in wind and solar power generation, located mostly in the Northeast of the country. This generation expansion will require transmission of large blocks of electric power over considerable distances, due to the lack of proximity between generation sites and main consumer centers located in the Southeast. This study will show the setting stages of the most economically applicable conductor and tower geometry design. Based on the data obtained, the performance of the 1000 kV line will be evaluated during the regular load flow operation, short circuits and stability.

This work is divided in two thematic parts. The first part shows a refurbishment of a Omicron low temperature STM set-up and its utilization for preparation of superconducting-magnetic interfaces. First, a cleaning procedure of suitable metallic substrates, specifically W(110) and Ir(111), is shown. It is followed by results of iron monolayer deposition on Ir(111) (Fe-Ir(111) interface). The last section deals with study of vanadium growth on pure Ir(111) substrate as well as on mentioned Fe-Ir(111) interface. The second thematic part deals with magnetism of cobalt atoms on a monolayer metal dichalcogenide WS2. It focuses primarily on studying their magnetic moment and magnetic anisotropy using X-ray magnetic circular dichroism (XMCD).

Pour pallier la limitation des interconnexions métalliques dans les circuits intégrés CMOS, une des solutions envisagées est d'introduire des interconnexions optiques. L'objet de cette thèse était la réalisation de photodétecteurs Ge intégrés en bout de guides d'onde sur substrats silicium sur isolant (SOI). Le travail a porté principalement sur la mise au point d'un protocole expérimental pour l'épitaxie sélective par UHV-CVD de couches minces de Ge relaxé, présentant un minimum de défauts cristallins sur toute leur épaisseur, une faible rugosité de surface et une absorption optique à 1300 nm proche de celle du Ge massif. Pour satisfaire ces conditions, il est nécessaire de favoriser la relaxation plastique de la couche de Ge sur une très faible épaisseur. A basse température de croissance (330°C), l'observation en temps réél par diffraction électronique montre que la relaxation peut être achevée après dépôt de 16 nm. Cette couche s'avère stable dès environ 30 nm et permet la reprise d'épitaxie de Ge à haute température (600°C). Cette augmentation de température améliore la qualité cristalline, élève la vitesse de croissance et mène à un matériau totalement relaxé. Le retour à température ambiante provoque le développement d'une contrainte en tension. L'abaissement de la bande interdite qui en résulte élève le seuil d'absorption en longueur d'onde. Enfin, ce procédé a été réalisé dans des cuvettes de SiO2/Si et des plots de Si gravés dans du SOI. Une parfaite sélectivité de la croissance est alors obtenue, démontrant ainsi la possibilité d'intégration de photodétecteurs à l'extrémité de microguides d'ondes SOI.

Based on a previously completed design for a soft X-ray (50-1100 eV) emission spectrometer, an endstation was constructed for the Resonant Elastic and Inelastic X-ray Scattering (REIXS) beamline at the CLS. The optical design employed techniques and software tools developed in-house using ray-tracing and diffraction grating efficiency calculations to analyze and compare existing designs and to propose a new design with superior performance. This design employs Rowland circle geometry to achieve a theoretical resolving power in excess of 2,500 in our range of interest. In addition, a novel optical design for a larger extremely high resolution spectrometer has been completed to provide theoretical resolving powers exceeding 10,000 throughout the higher end of the spectrum. To accommodate this optical design a completely new mechanical design was required, involving significant mechanical, electrical, vacuum and software engineering. Countless custom fabricated parts were required along with numerous o -the-shelf secondary instruments and systems. All told, this entirely student-managed project has cost over $1.5M and taken over 5 years. Construction is finally complete and the endstation is currently being commissioned. Necessary design changes made during the mechanical design process resulting in the selection of a more suitable, but lower resolution, detector. This reduced the theoretical maximum resolving power to 1,800 for the first order gratings and roughly 5,000 for the third order gratings. Commissioning is still underway, but first order resolutions in the range of 1,000 - 2,000 have been recorded as have third order resolutions exceeding 4,000. Publication quality data has been collecting by members of this research group and invited external users have successfully grown and measured samples here. Two of the optical elements required rework and upon their delivery the system commissioning will be completed and peer-reviewed access will begin.

Aluminum was deposited onto both Teflon AF and Parylene AF surfaces by chemical vapor deposition of trimethylaluminum. This work shows that similar thin film (100 Angstroms) aluminum oxide adlayers form on both polymers at the low temperature dosing conditions used in the studies. Upon anneal to room temperature and above, defluorination of the polymer surfaces increased and resulted in fluorinated aluminum oxide adlayers; the adlayers were thermally stable to the highest temperatures tested (600 K). Angle-resolved spectra showed higher levels of fluorination toward the polymer/adlayer interface region. Copper films were also deposited at low temperature onto Teflon AF using a copper hexafluoroacetylacetonate-cyclooctadiene precursor. Annealing up to 600 K resulted in the loss of precursor ligands and a shift to metallic copper. As with aluminum adlayers, some polymer defluorination and resulting metal (copper) fluoride was detected. Parylene AF and polystyrene films surfaces were modified by directly dosing with water vapor passed across a hot tungsten filament. Oxygen incorporation into polystyrene occurred exclusively at aromatic carbon sites, whereas oxygen incorporation into parylene occurred in both aromatic and aliphatic sites. Oxygen x-ray photoelectron spectra of the modified polymers were comparable, indicating that similar reactions occurred. The surface oxygenation of parylene allowed enhanced reactivity toward aluminum chemical vapor deposition. Silicon-carbon (Si-Cx) films were formed by electron beam bombardment of trimethylvinylsilane films which were adsorbed onto metal substrates at low temperatures in ultra-high vacuum. Oxygen was also added to the films by coadsorbing water before electron beam bombardment; the films were stable to more than 700 K, with increasing silicon-oxygen bond formation at elevated temperatures. Copper metal was sputter deposited in small increments onto non-oxygenated films. X-ray photoelectric spectra show three-dimensional copper growth (rather than layer-by-layer growth), indicating only weak interaction between the copper and underlying films. Annealing at elevated temperatures caused coalescence or growth of the copper islands, with spectra indicating metallic copper rather than copper oxide.