Self-assembled microsphere monolayers (SMMs) hold significant promise for micro- and nanopatterning. Here we exploit, for the first time, SMMs as stamps for microcontact printing (μCP) and demonstrate this to fabricate patterned initiator templates that can subsequently be amplified into polymer brushes by surface initiated atom transfer radical polymerization (SI-ATRP). SMM stamps avoid the need for expensive and sophisticated instrumentation in pattern generation, and provide a broad range of accessible surface chemistries and pitch size control.

The aim of the present work was to design and fabricate all purpose, positioning-tolerant and efficient interconnects between single-mode fibers and integrated waveguides out of polymers. The developed structures are part of the optical packaging of integrated optical chips. Integrated optics have gathered tremendous interest throughout recent years from research as well as from the industry, and most likely the demand will further grow in the future. Today’s trend is to establish optical data communication not only in far-distance transmission but also in end-user or so called fiber-to-home configurations, or, in the near future, also on board or even chip level. In addition, integrated optical sensors are gaining more and more importance. In the future, lab-on-a-chip systems may be able to simplify and accelerate analysis methods within health care or allow for a continuous monitoring of almost any environmental variable. All these applications call for robust optical packaging solutions. Many integrated optical chips are using a silicon-on-insulator design. Technologies which were originally intended for the manufacturing of integrated circuits can be utilized for the fabrication of such silicon-on-insulator chips. Point-of-care testing, which is a considerable part of bio-sensing, in some cases only allows the use of disposable transducer elements. The fabrication of these transducers, also including almost all other system parts, may be possible using polymers. Alternative fabrication methods like nanoimprint lithography can be applied for the patterning of polymers. With these, the extension of already known working principles or even entirely new device architectures become feasible for mass production. The direct patterning of polymers by means of nanoimprint was used to fabricate interconnects for integrated waveguides. In contrast to conventional lithography approaches, where a patterned resist layer is used as a masking layer for subsequent process steps, direct patterning allows the immediate use of the structures as functional elements. Firstly, nanoimprint allows diffraction-unlimited patterning with nanometer resolutions as well as the replication of complex three-dimensional patterns. These unique properties were used within this work to pattern shallow gratings atop an integrated waveguide within only one single manufacturing step. The gratings are used as coupling elements and can be utilized either to couple light from external elements to the chip or vice versa. Considerations regarding the optical effects on single-mode polymer waveguides as well as grating couplers were obtained from simulation. They are specific to the chosen design and the used polymer and cannot be found elsewhere so far. Compared to similar designs and fabrication strategies proposed in literature, the ones followed here allow for a higher efficiency. The dimensions and process windows obtained from simulation did serve as a basis for the subsequent fabrication of the grating couplers. All steps which are necessary to turn the calculated design into reality, ranging from master fabrication, to working mold cast and imprint, are shown in detail. The use of a working mold strategy is of crucial importance for the fabrication process and is discussed in detail. The use of a working mold preserves a costly master and further allows for a cost-efficient production. Parameters which are relevant for the production as well as for the final polymer patterns were analyzed and discussed. On the basis of the obtained data, a process optimization was performed. The optical characterization was also part of the presented work. A comparison with the results obtained from simulation is included and additional effects were revealed. Most of them may be subject to further improvement in future designs. In summary, the present work contributes to the field of optical packaging. It shows a viable route for the design and fabrication of interconnects of single-mode polymer waveguides. The presented design can be used as a building block which can be placed at almost any positions within an integrated optical chip. The fabrication method includes a minimum number of process steps and is still able to increase performance compared to similar approaches. Moreover, all process steps allow for scaling and are potential candidates for mass production.

Springtails (Collembola) are wingless arthropods that are impressively adapted to cutaneous respiration in temporarily rain-flooded habitats by non-wetting skin morphology. Recapitulating the robust and effectively liquid-repellent surface characteristics of springtail skin in engineered materials may offer exciting opportunities for demanding applications. Herein, we present a strategy for mimicking morphological surface features of springtail skin in polymer membranes produced by reverse imprint lithography. We report the fabrication of multi-level silicon masters that, in turn, serve as templates for the replication of flexible polymer membranes. We examined the robust wetting characteristics of polymer membranes by in situ plastron collapse tests and condensation tests. The mechanical stability of the polymer membranes was tested using a tribometer set-up and compared with needle-shaped pillar structures made from similar material. The fabricated membranes are flexible, free-standing, and adaptable to various substrate materials and shapes that allow for emerging applications.

Metallische Nanostäbe mit einer Länge im Mikrometer-Bereich wirken als Antennen für infrarotes Licht: Indem unter Lichteinfall eine kollektive Schwingung der Leitungselektronen angeregt wird (ein sogenanntes Plasmon), wird das elektrische Feld an den Stabenden stark konzentriert. Besonders starke Feldkonzentrationen treten auf, wenn zwei Antennenarme durch eine schmale Lücke getrennt sind (Dimerantenne). Somit können die Antennen Licht-Materie-Wechselwirkungen -- wie beispielsweise die Absorption infraroten Lichtes von Molekülen -- verstärken. Dieses als oberflächenverstärkte Infrarotabsorption (SEIRA) bezeichnete Phänomen ist sehr nützlich, um Signale in der Infrarotspektroskopie zu verstärken. Diese Arbeit widmet sich der effizienten Herstellung von metallischen Nanostäben für SEIRA. Im ersten Schwerpunktthema werden Dimerantennen, die per Elektronenstrahllithographie (EBL) hergestellt wurden und eine auflösungsbegrenzte Lücke aufweisen, durch eine photochemische Reduktion von Metallsalzkomplexen nachträglich vergrößert. Dadurch verringert sich die Lückengröße und erreicht Werte deutlich unter der Auflösungsgrenze der EBL. Es wird gezeigt, dass diese photochemische Abscheidung die IR-optischen Eigenschaften der Dimerantennen durch plasmonische Kopplung entscheidend verändert. Zudem steigt die Infrarotabsorption von in der Lücke befindlichen Molekülen mit sinkender Lückengröße. Im zweiten Schwerpunktthema liegt der Fokus auf der günstigen Fabrikation einer Vielzahl von IR-Antennen in einem parallelen Prozess. Dabei werden poröse Template aus anodisiertem Aluminiumoxid (AAO) als Negativ für die herzustellenden Metallstäbe benutzt. Es wird zuerst gezeigt, dass die Poren des Templates durch die photochemische Reduktion von Goldsalzkomplexen befüllt werden können. Für eine gezielte Einstellung der Stäbchenlänge und die Generierung einer nanoskaligen Lücke wird weiterhin die elektrochemische Befüllung der Template untersucht. Die hiermit hergestellten IR-Antennen werden vereinzelt, auf ein Substrat aufgetragen und hinsichtlich ihrer Struktur und ihrer IR-optischen Eigenschaften charakterisiert. Die Vor- und Nachteile der untersuchten Herstellungsmethoden und ihre Eignung für die Fabrikation von IR-Antennen für SEIRA werden diskutiert. / Metallic nanorods with lengths in the micrometer regime act as antennas for infrared light: As incident light excites a collective oscillation of the conduction electrons (a so-called plasmon), the electric field is concentrated at the rod ends. In case two antenna arms are separated by a small gap (dimer antenna), a particularly high field concentration occurs. Thereby the antennas are capable of enhancing light-matter-interaction -- for example the absorption of infrared light by molecules. This phenomenon, termed as surface enhanced infrared absorption (SEIRA), is very useful to enhance absorption signals in infrared spectroscopy. This thesis attends to the efficient fabrication of metallic nanorods for SEIRA. The first topic in focus is the manipulation of dimer antennas fabricated by electron beam lithography (EBL), featuring a gap of resolution-limited size. By applying a photochemical reduction of metal salt complexes in solution, the dimer arms are subsequently enlarged. Thereby the gap size is reduced and reaches values clearly below the resolution limit of EBL. It is shown that the IR optical properties of dimer antennas dramatically change during photochemical metal deposition. This is due to plasmonic coupling. Additionally, the absorption of infrared light by molecules located in the gap increases with decreasing gap size. The second topic in focus is the cheap fabrication of a large number of IR antennas in a parallel process. Here, porous templates of anodized aluminum oxide (AAO) are used as a negative for the metal rods to be fabricated. Firstly, it is shown that the pores of the template can be filled by photochemical reduction of gold salt complexes. For a targeted adjustment of the rod lengths and the generation of a nanoscale gap, secondly, the electrochemical filling of acsu AAO is investigated. The IR antennas prepared by this method are extracted from the template, transferred to a substrate, and individually characterized in terms of their structure and IR optical properties. Advantages and drawbacks of the fabrication methods investigated in this work as well as their applicability to the fabrication of IR antennas for SEIRA are being discussed.

A low-cost plasmonic nanopillar array was synthesized using soft thermal nanoimprint lithography, and its sensitivity was determined through far-field spectroscopic measurements. Its transmission spectrum was highly dependent on the refractive index of the surrounding medium, with its sensitivity being 375 nm per refractive index unit according to the spectral shift. Moreover, a simple sensor whose reflected color changed with a change in the plasma frequency on varying the surrounding medium was fabricated.

1.1 ABSTRACT This dissertation focuses on the role that the mass produced image (e.g. lithographs, photographs, and cinema) played in the creation and solidification of Slovak national and ethnic identity not only among Slovaks living in Slovakia, but also Slovaks living abroad in America from the 19th to the mid-20th centuries. Given the problems inherent in using the written Slovak language to form a sense of national and ethnic unity, Slovak culture drew widely on visual sources that could be rapidly reproduced, easily transmitted in Slovakia and abroad, and were affordable to a wide variety of social and economic classes. This dissertation also focuses on some of the problems of this approach which will require further study and examination. Keywords: Slovakia, Slovak nationalism, ethnic identity, photography, lithography, cinema, ethnography, mass media,

We characterize the impact of high-energy, 172 nm vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by postprocessing without influencing the overall geometry that is required for the optical functionality.

The thesis deals with preparation of graphene nanostructures and their applications in the measurement of transport properties of graphene. The contacts for measurement of resistance are fabricated by electron beam lithography on graphene exfoliated flakes, CVD graphene layers and grains. Graphene is also shaped using the same method. Resistivity of the layer, concentration and mobility of charge carriers are determined by different approaches. Hysteresis appearing in dependence of resistivity on the gate voltage is discussed as well. A significant part of the work is dedicated to monitoring the response of graphene resistance to relative humidity changes and potential use of graphene as a sensor of relative humidity.

No description available.

Developing effective methods of generating thin metal oxide films are important for sensing and separations applications. An obstacle to device fabrication is controlling the size and spatial orientation of domain level pores while retaining the ability to generate arbitrary device level patterns. Well-ordered hexagonally packed cylindrical pores were created by taking advantage of block copolymer self-assembly followed by selective condensation of silica precursors using supercritical carbon dioxide as the solvent. It was possible to control the pore size by choosing PEO-PPO-PEO (Pluronic® series) triblock copolymers of differing molecular weights. These processes were then incorporated with conventional lithographic techniques to generate patterns on the device scale. The first route involves replacement of the organic acid catalyst with a photoacid generator that restricts acid formation by masking pre-determined regions then exposing to UV light. The second route is similar except that addition of a cross-linking agent limits acid diffusion while reversing the tone of the final pattern. The third route avoids acid diffusion altogether and generates the pattern through reactive ion etching through a sacrificial photoresist. A completely different fourth route was taken and nanoimprint lithography was used to generate sub-micron patterns with alternate block copolymers. The feasibility of the preliminary devices generated in this thesis has been examined through particle diffusion experiments. Samples were soaked in a fluorescent dye then exposed to multiple sizes of gold nanoparticles. Fluorescence quenching was then monitored to determine pore accessibility.