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This dissertation describes advances in the microfabrication of thin layer chromatography (TLC) plates. These plates are prepared by the patterning of carbon nanotube (CNT) forests on substrates, followed by their infiltration with an inorganic material. This document is divided into ten sections or chapters. Chapter 1 reviews the basics of conventional TLC technology. This technology has not changed substantially in decades. This chapter also mentions some of the downsides of the conventional approach, which include unwanted interactions of the binder in the plates with the analytes, relatively slow development times, and only moderately high efficiencies. Chapter 2 focuses primarily on the tuning of the iron catalyst used to grow the CNTs, which directly influences the diameters of the CNTs grown that are produced. Chapter 3 focuses on the atomic layer deposition (ALD) of SiO2 from a silicon precursor and ozone onto carbon-nanotubes to obtain an aluminum free stationary phase. This approach allowed us to overcome the tailing issues associated with the earlier plates prepared in our laboratory. Chapter 4 is a study of the hydroxylation state of the silica in our TLC plates. A linear correlation was obtained between the SiOH+/Si+ time-of-flight secondary ion mass spectrometry (ToF-SIMS) peak ratio and the isolated silanol peak position at ca. 3740 cm-1 in the diffuse reflectance infrared spectroscopy (DRIFT) spectra. We also compared the hydroxylation efficiencies on our plates of ammonium hydroxide and HF. Chapter 5 reports a series of improvements in TLC plate preparation. The first is the low-pressure chemical vapor deposition (LPCVD) of silicon nitride onto CNTs, which can be used to make very robust TLC plates that have the necessary SiO2 surfaces. These TLC plates are the best we have prepared to date. We also describe here the ALD deposition of ZnO into these devices, which can make them fluorescent. Chapters 6 – 10 consist of contributions to Surface Science Spectra (SSS) of ToF-SIMS spectra of the materials used in our microfabrication process. SSS is a peer-reviewed database that has been useful to many in the surface community. The ToF-SIMS spectra archived include those of (i) Si/SiO2, (ii) Si/SiO2/Al2O3, (iii) Si/SiO2/Al2O3/Fe, (iv) Si/SiO2/Fe (annealed at 750 °C in H2), and (v) Si/SiO2/Al2O3/Fe(annealed)/CNTs. Both positive and negative ion spectra have been submitted. In summary, the present work is a description of advances in the development, thorough characterization, optimization, and application development of microfabricated thin layer chromatography plates that are superior to their commercial counterparts.

Aerodynamics studies in a booster such as analysis of the flow through the whole component or study of local turbulent phenomenon constitute a crucial part of its development in order to get better overall performances, like efficiency of the compressor and compression ratio. In order to put in perspective the computational predictions, it is critical to obtain sets of data from tests to caliber numerical analyses and to assure the booster respects design specifications. Aerodynamics testing is then an important part of the development of a compressor. However, it is complicated to obtain such values for many reasons: time constraints, problems regarding support, important costs etc. Thus, it is important to get as much information as possible from these tests data in a limited period in order to spend more time in results interpretation and less in treating raw data. Thus, an optimized tool of treatment to first deduce results from test data; and then to compare different engines or different sets of tests data, to get a wider state of the art and to avoid time-consuming analyses was needed. In order to do so, the first part of the development consists in investigating the existing methods to extract and analyze data from tests already used, and then deducing a general methodology to obtain from raw measures the performances of the studied booster compared to other available data. Once the methods have been set up and validated, the tool in itself was implemented in a practical way. Then, it was important to validate it on real tests values and to observe if it was adjustable for all kind of aerodynamics tests. / Aerodynamikstudier i en booster som analys av flödet genom hela komponenten eller studie av lokal turbulens fenomen utgör en avgörande del av dess utveckling för att få bättre generella prestanda, som kompressorns verkningsgrad och kompressionsförhållandet. För att sätta beräkningsresultat i perspektiv är det kritisk att få datauppsättningar från tester för att kalibrera de numeriska analyser och för att säkerställa att booster uppfyller konstruktionsspecifikationer. Aerodynamisk provning är då en viktig del av utvecklingen av en kompressor. Det är dock komplicerat att få sådana värden av många skäl: tidsbegränsningar, problem angående support, viktiga kostnader osv. Därför är det viktigt att få så mycket information som möjligt från provdata under en begränsad period för att tillbringa mer tid i resultat tolkning och mindre tid på att behandla rådata. Således ett optimerat behandlingsverktyg för att först dra resultat från provdata; och sedan att jämföra olika motorer eller olika uppsättningar av provdata, för att få en bredare databank och att undvika tidskrävande analyser behövdes. För att göra det består den första delen av utvecklingen i att undersöka de befintliga metoderna för att extrahera och analysera data från tester som redan använts, och sedan dra ut en allmän metod för att från råa mått erhålla prestandan hos den studerade boosteren jämfört med andra tillgängliga data. När metoderna har installerats och validerats implementerades verktyget i sig på ett praktiskt sätt. Då var det viktigt att validera det på verkliga testvärden och att se om det var justerbart för alla typer av aerodynamiska test.

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Bien qu’il ait prouvé son efficacité dans différentes espèces (lapin, porc, souris,…) ainsi que dans différents organes (rein, foie coeur, poumon,…), le Postconditionnement (PostC) peut être limité par plusieurs facteurs. Parmi les limites du Post C, on note la nécessité de son application à l’initiation de la reperfusion. L’objectif de notre travail était d’évaluer la protection induite par la Basse pression de reperfusion (BP) après un décalage temporel de son application et d’étudier les principales fonctions mitochondriales connues pour être impliquées dans la cardioprotection. Nos résultats nous ont permis de démontrer que, contrairement au PostC, la BP pouvait s’appliquer avec succès même après un décalage temporel de 10 minutes après le début de la reperfusion. Cette protection décalée est en lien avec les fonctions mitochondriales, en particulier, l’inhibition du pore de transition de perméabilité mitochondriale (PTPm). L’utilisation de la cyclosporine A (CsA), puissant inhibiteur de l’ouverture du PTPm, permet également de décaler de 10 minutes la manœuvre de protection à la reperfusion dans le modèle de coeur isolé perfusé de rat. Le PostC, comme la BP, utilise deux sources de production de NO (NOS et Xanthine oxydase reductase) pour induire la cardioprotection. Ces résultats nous semblent importants dans le sens où ils proposent une nouvelle fenêtre thérapeutique pour combattre les dégâts liés à l’ischémie/reperfusion, la BP / Although its efficacy in various species (rabbit, pig, mouse,…) and various organs (kidney, liver heart, lung), Postconditioning (PostC) can be limited by many factors such as the necessity of its application in the initiation of the reperfusion. The objective of our work was to evaluate the protection by low pressure reperfusion (LPR) with delayed intervention at reperfusion and to study the mitochondrial functions which are known to be involved in the cardioprotection. Our results showed that, contrary to PostC, LPR can protect until 10 minutes of its delayed intervention at reperfusion. This delayed protection is in correlation with mitochondrial functions, particularly, inhibition of mitochondrial transition pore (PTPm). Cyclosporine, inhibitor of PTPm, has also shown protection until 10 minutes of delayed intervention, on isolated heart rat model. PostC, like LPR, use tow sources of prodution of NO (NOS and Xanthine oxydase reductase). These results seem, to us, very important because they propose LPR as a new therapeutic window to reduce ischemia/reperfusion injury

Cette thèse porte sur l’étude de la production de surface des ions négatifs (IN) pour des applications dans la fusion thermonucléaire. Ce travail a été réalisé à l'aide d'une source plasma PHISIS. Les IN formés en surface de l'échantillon sont collectés et analysés avec un spectromètre de masse (SM). La fonction de la distribution en énergie des ions négatifs FDEIN est mesurée. Dans cette thèse, une technique de polarisation DC pulsée est introduite pour permettre l'étude de la production d'IN en surface sur des échantillons isolants comme le diamant. Un modèle qui calcule le taux de changement de la variation de la tension sur une surface isolante polarisée en mode pulsé est développé. De façon surprenante, la production d’IN en surface sur un diamant dopé au bore ou non dopé est beaucoup plus élevée en mode pulsé qu'en mode continu. Il est traité également la production d’IN en surface dans les conditions de faible tension de polarisation. Le meilleur rendement d’IN mesuré à faible polarisation est obtenu avec du diamant dopé au bore (BDD) et il est 2 fois plus élevé que celui mesuré sur HOPG (high oriented pyrolitic graphite). L'analyse de la production d’IN en surface à différents polarisations pour différents matériaux a été effectuée afin de corréler l'évolution du rendement d’IN aux changements d'état de surface. Une étude approfondie de la production en surface d'IN a été réalisée sur la surface de Nanoporous 12 CaO. 7Al2O3 electride surface. L'influence des conditions expérimentalles sur le rendement en IN a été étudiée. Dans cette contribution, nous montrons que ce matériau pourrait potentiellement être utilisé dans les sources d'ions négatifs sans césium / This thesis deals with negative ions (NI) surface production for applications in thermonuclear fusion. This work was conducted using a plasma source PHISIS. NI formed on a negatively biased sample surfaceare collected and analyzed with energy mass spectrometer (MS). Negative ion distribution function NIEDF is measured. A SIMION calculation was done to have a complete idea about MS transmission effect on the NIEDF. In the course of this thesis, a DC pulsed bias technique is introduced to enable the study of negative ion surface production on insulating samples as non-doped diamond layers. A model that calculate the rate of change of bias on insulator surface biased in pulsed mode is developed. Surprisingly, negative-ion surface production on boron-doped or non-doped diamond is much higher in pulsed mode than in continuous mode. This thesis deals also with negative ion surface production in low bias condition. The best NI yield measured at low bias is obtained with Boron doped diamond (BDD) ant it is 2 times higher than the one measured on HOPG (highly oriented pyrolytic graphite) surface. Analysis of NI surface production at different surface bias for different material were performed in order to correlate the NI yield evolution to the surface state changes.An extensive study of NI surface production was performed on Nanoporous 12CaO.7Al2O3 electride surface. The influence of surface temperature, bias and plasma exposure time on negative-ion yield was investigated. In this contribution, we show that the electride material has potentials to be used as a production surface in negative ion sources devoted to nuclear fusion application

This thesis discusses the growth of thin-film silicon layers suitable for solar cells using liquid phase epitaxy and the behaviour of oxide LPCVD silicon nitride stacks on silicon in a high temperature ambient.¶ The work on thin film cells is focussed on the characteristics of layers grown using liquid phase epitaxy. The morphology resulting from different seeding patterns, the transfer of dislocations to the epitaxial layer and the lifetime of layers grown using oxide compared with carbonised photoresist barrier layers are discussed. The second half of this work discusses boron doping of epitaxial layers. Simultaneous layer growth and boron doping is demonstrated, and shown to produce a 35um thick layer with a back surface field approximately 3.5um thick.¶ If an oxide/nitride stack is formed in the early stages of cell processing, then characteristics of the nitride may enable increased processing flexibility and hence the realisation of novel cell structures. An oxide/nitride stack on silicon also behaves as a good anti- reflection coating. The effects of a nitride deposited using low pressure chemical vapour deposition on the underlying wafer are discussed. With a thin oxide layer between the silicon and the silicon nitride, deposition is shown not to significantly alter effective life-times.¶ Heating an oxide/nitride stack on silicon is shown to result in a large drop in effective Lifetimes. As long as at least a thin oxide is present, it is shown that a high temperature nitrogen anneal results in a reduction in surface passivation, but does not significantly affect bulk lifetime. The reduction in surface passivation is shown to be due to a loss of hydrogen from the silicon/silicon oxide interface and is characterised by an increase in Joe. Higher temperatures, thinner oxides, thinner nitrides and longer anneal times are all shown to result in high Joe values. A hydrogen loss model is introduced to explain the observations.¶ Various methods of hydrogen re-introduction and hence Joe recovery are then discussed with an emphasis on high temperature forming gas anneals. The time necessary for successful Joe recovery is shown to be primarily dependent on the nitride thickness and on the temperature of the nitrogen anneal. With a high temperature forming gas anneal, Joe recovery after nitrogen anneals at both 900 and 1000oC and with an optimised anti-reflection coating is demonstrated for chemically polished wafers.¶ Finally the effects of oxide/nitride stacks and high temperature anneals in both nitrogen and forming gas are discussed for a variety of wafers. The optimal emitter sheet resistance is shown to be independent of nitrogen anneal temperature. With textured wafers, recovery of Joe values after a high temperature nitrogen anneal is demonstrated for wafers with a thick oxide, but not for wafers with a thin oxide. This is shown to be due to a lack of surface passivation at the silicon/oxide interface.