abstract: Gallium Nitride (GaN) based microelectronics technology is a fast growing and most exciting semiconductor technology in the fields of high power and high frequency electronics. Excellent electrical properties of GaN such as high carrier concentration and high carrier motility makes GaN based high electron mobility transistors (HEMTs) a preferred choice for RF applications. However, a very high temperature in the active region of the GaN HEMT leads to a significant degradation of the device performance by effecting carrier mobility and concentration. Thus, thermal management in GaN HEMT in an effective manner is key to this technology to reach its full potential. In this thesis, an electro-thermal model of an AlGaN/GaN HEMT on a SiC substrate is simulated using Silvaco (Atlas) TCAD tools. Output characteristics, current density and heat flow at the GaN-SiC interface are key areas of analysis in this work. The electrical characteristics show a sharp drop in drain currents for higher drain voltages. Temperature profile across the device is observed. At the interface of GaN-SiC, there is a sharp drop in temperature indicating a thermal resistance at this interface. Adding to the existing heat in the device, this difference heat is reflected back into the device, further increasing the temperatures in the active region. Structural changes such as GaN micropits, were introduced at the GaN-SiC interface along the length of the device, to make the heat flow smooth rather than discontinuous. With changing dimensions of these micropits, various combinations were tried to reduce the temperature and enhance the device performance. These GaN micropits gave effective results by reducing heat in active region, by spreading out the heat on to the sides of the device rather than just concentrating right below the hot spot. It also helped by allowing a smooth flow of heat at the GaN-SiC interface. There was an increased peak current density in the active region of the device contributing to improved electrical characteristics. In the end, importance of thermal management in these high temperature devices is discussed along with future prospects and a conclusion of this thesis. / Dissertation/Thesis / Masters Thesis Electrical Engineering 2016

abstract: Nitride semiconductors have wide applications in electronics and optoelectronics technologies. Understanding the nature of the optical recombination process and its effects on luminescence efficiency is important for the development of novel devices. This dissertation deals with the optical properties of nitride semiconductors, including GaN epitaxial layers and more complex heterostructures. The emission characteristics are examined by cathodoluminescence spectroscopy and imaging, and are correlated with the structural and electrical properties studied by transmission electron microscopy and electron holography. Four major areas are covered in this dissertation, which are described next. The effect of strain on the emission characteristics in wurtzite GaN has been studied. The values of the residual strain in GaN epilayers with different dislocation densities are determined by x-ray diffraction, and the relationship between exciton emission energy and the in-plane residual strain is demonstrated. It shows that the emission energy increases withthe magnitude of the in-plane compressive strain. The temperature dependence of the emission characteristics in cubic GaN has been studied. It is observed that the exciton emission and donor-acceptor pair recombination behave differently with temperature. The donor-bound exciton binding energy has been measured to be 13 meV from the temperature dependence of the emission spectrum. It is also found that the ionization energies for both acceptors and donors are smaller in cubic compared with hexagonal structures, which should contribute to higher doping efficiencies. A comprehensive study on the structural and optical properties is presented for InGaN/GaN quantum wells emitting in the blue, green, and yellow regions of the electromagnetic spectrum. Transmission electron microscopy images indicate the presence of indium inhomogeneties which should be responsible for carrier localization. The temperature dependence of emission luminescence shows that the carrier localization effects become more significant with increasing emission wavelength. On the other hand, the effect of non-radiative recombination on luminescence efficiency also varies with the emission wavelength. The fast increase of the non-radiative recombination rate with temperature in the green emitting QWs contributes to the lower efficiency compared with the blue emitting QWs. The possible saturation of non-radiative recombination above 100 K may explain the unexpected high emission efficiency for the yellow emitting QWs Finally, the effects of InGaN underlayers on the electronic and optical properties of InGaN/GaN quantum wells emitting in visible spectral regions have been studied. A significant improvement of the emission efficiency is observed, which is associated with a blue shift in the emission energy, a reduced recombination lifetime, an increased spatial homogeneity in the luminescence, and a weaker internal field across the quantum wells. These are explained by a partial strain relaxation introduced by the InGaN underlayer, which is measured by reciprocal space mapping of the x-ray diffraction intensity. / Dissertation/Thesis / Ph.D. Physics 2012

abstract: In this dissertation, the interface chemistry and electronic structure of plasma-enhanced atomic layer deposited (PEALD) dielectrics on GaN are investigated with x-ray and ultraviolet photoemission spectroscopy (XPS and UPS). Three interrelated issues are discussed in this study: (1) PEALD dielectric growth process optimization, (2) interface electronic structure of comparative PEALD dielectrics on GaN, and (3) interface electronic structure of PEALD dielectrics on Ga- and N-face GaN. The first study involved an in-depth case study of PEALD Al2O3 growth using dimethylaluminum isopropoxide, with a special focus on oxygen plasma effects. Saturated and self-limiting growth of Al2O3 films were obtained with an enhanced growth rate within the PEALD temperature window (25-220 ºC). The properties of Al2O3 deposited at various temperatures were characterized to better understand the relation between the growth parameters and film properties. In the second study, the interface electronic structures of PEALD dielectrics on Ga-face GaN films were measured. Five promising dielectrics (Al2O3, HfO2, SiO2, La2O3, and ZnO) with a range of band gap energies were chosen. Prior to dielectric growth, a combined wet chemical and in-situ H2/N2 plasma clean process was employed to remove the carbon contamination and prepare the surface for dielectric deposition. The surface band bending and band offsets were measured by XPS and UPS for dielectrics on GaN. The trends of the experimental band offsets on GaN were related to the dielectric band gap energies. In addition, the experimental band offsets were near the calculated values based on the charge neutrality level model. The third study focused on the effect of the polarization bound charge of the Ga- and N-face GaN on interface electronic structures. A surface pretreatment process consisting of a NH4OH wet chemical and an in-situ NH3 plasma treatment was applied to remove carbon contamination, retain monolayer oxygen coverage, and potentially passivate N-vacancy related defects. The surface band bending and polarization charge compensation of Ga- and N-face GaN were investigated. The surface band bending and band offsets were determined for Al2O3, HfO2, and SiO2 on Ga- and N-face GaN. Different dielectric thicknesses and post deposition processing were investigated to understand process related defect formation and/or reduction. / Dissertation/Thesis / Ph.D. Physics 2014

Kyoto University (京都大学) / 0048 / 新制・論文博士 / 博士(工学) / 乙第12695号 / 論工博第4084号 / 新制||工||1555(附属図書館) / 29947 / (主査）教授 平尾 一之, 教授 田中 勝久, 教授 三浦 清貴 / 学位規則第4条第2項該当

Since the development of deep level transient spectroscopy (DLTS) in the 1970’s by Lang and others, the technique has become a powerful analytical tool to characterise the electrical properties of defects in semiconductors. With the development of more powerful computers and improved data acquisition systems, it has become possible to replace the original analogue boxcar analysers and lock-in amplifiers that were commonly used in early DLTS systems with digitisers and digital signal processing equipment. The use of a computer for signal processing allows for much more flexibility in the DLTS system. For instance, a digital DLTS system is capable of measuring a much wider range of emission rates than an analogue system. Furthermore, since the digital DLTS system does not rely on a repetitive signal, such a system can observe phenomena such as defect metastability that cannot be observed in an analogue system. In this thesis, the design and characterisation of a digital DLTS system is described. The results of a number of experiments that illustrated the capabilities of the system are reported. The extended range of emission rates that could be measured by the system were illustrated by the measuring of the EL2 defect in GaAs over the temperature range 270 – 380 K (corresponding to emission rates ranging from less than 10–3 s–1 to more than 103 s–1). The results compared well with previous results obtained by means of an analogue DLTS system. Further low temperature measurements on the E2 defect in GaAs showed that in the low temperature region, thermal radiation from the cryostat shroud influenced carrier emission. The field dependence of the emission rate of a number of defects, including defects in as-grown n-GaN, He-ion irradiated n-GaN and Si, was investigated as well. The ability of the digital DLTS system to measure single transients was used to investigate configurationally bistable defects in He-ion irradiated p-Si and a sputter-induced defect with negative-U properties in n-GaN. In both of these cases, the results proved far superior to those obtained by means of an analogue system. / Thesis (PhD (Physics))--University of Pretoria, 2007. / Physics / unrestricted

Gallium nitride and its alloys are direct band gap semiconductors with a wide variety of applications. Of particular importance are light emitting diodes and laser diodes. Due to the lack of suitable lattice-matched substrates, epitaxial layers contain a high density of defects such as dislocations. To reduce their number and to design a device with desired specifications, multilayered systems with varying composition (and thus material properties) are grown. Theoretical modelling is a useful tool for gaining understanding of various phenomena and materials properties. The scope of the present work is wide. It ranges from a continuum theory of dislocations treated within the linear elasticity theory, connects the continuum and atomistic level modelling for the case of the critical thickness of thin epitaxial layers, and covers some issues of simulating the electronic structure of III-nitride alloys by means of the first principle methods. The first part of this work discusses several topics involving dislocation theory. The objectives were: (i) to apply general elasticity approaches known from the literature to the specific case of wurtzite materials, (ii) to extend and summarise theoretical studies of the critical thickness in heteroepitaxy. Subsequently, (iii) to develop an improved geometrical model for threading dislocation density reduction during the growth of thick GaN films. The second part of this thesis employs first principles techniques (iv) to investigate the electronic structure of binary compounds (GaN, AlN, InN) and correlate these with experimentally available N K-edge electron energy loss near edge structure (ELNES) data, (v) to apply the special quasi-random structures method to ternary III-nitride wurtzite alloys aiming to develop a methodology for modelling wurtzite alloys and to get quantitative agreement with experimental N K-edge ELNES structures, and (vi) to theoretically study strain effects on ELNES spectra.

La nano-structuration de matériaux semiconducteurs à grand gap à base de GaN fait l'objet d'un très grand intérêt de par son potentiel pour l'élaboration de composants optoélectroniques innovants émettant dans la gamme spectrale de l’ultraviolet. Le contrôle de la croissance à l'échelle nanométrique doit être ainsi démontré. L'épitaxie sélective ou SAG (Selective Area Growth) étendue au domaine nanométrique (NSAG pour NanoSAG) est un excellent choix pour l'élaboration de nanostructures de semiconducteur. Cette technique consiste en la croissance localisée du matériau sur un substrat partiellement recouvert d'un masque en diélectrique. La NSAG permet l'élaboration d'hétéro-structures en fort désaccord de maille grâce aux mécanismes singuliers de relaxation des contraintes à l'intérieur des nanostructures qui réduisent considérablement la densité de dislocations créées. La première partie de la thèse porte sur la mise en œuvre de l'épitaxie sélective du GaN sur pseudo-substrat de GaN à l'échelle micrométrique puis nanométrique par la technique d'épitaxie en phase vapeur aux organométalliques. Dans un deuxième temps, la NSAG est utilisée pour l'épitaxie de nanostructures de GaN sur substrats de SiC-6H et pseudo-substrat d'AlN. L'influence des conditions de croissance et des motifs définis dans le masque sur la forme des nanostructures est étudiée par la microscopie électronique à balayage et la microscopie à force atomique. Finallement la microscopie électronique en transmission et la nano-diffraction des rayons X par rayonnement synchrotron sont utilisées pour l'analyse structurale approfondie des nanostructures / GaN based wide bandgap semiconductor materials nanostructures have a tremendous potential of applications for innovative optoelectronic devices emitting in the UV region (190-340nm). Thus, the feasibility of the nanoscale growth must be demonstrated. Selective Area Growth (SAG) extended to the nanoscale (NSAG for NanoSAG) is an excellent approach for growing semiconductor nanostructures. This technique is based on localized growth of the material on substrates partially covered by dielectric masks. NSAG technique allows the growth of highly mismatched materials because the density of dislocation is reduced thanks to singular stress relief mechanisms that occur at nanoscale. The first part of the work consists in the implementation of the GaN selective epitaxy on GaN template substrate at the micrometer and nanometer scales by Metal Organic Vapor Phase Epitaxy. In a second time, the NSAG technique is used for the growth of GaN nanostructures on SiC-6H substrate and AlN template substrate. The influence of the growth conditions and the mask pattern on the nanostructures shape is demonstrated using Scattering Electronic Microscopy and Atomic Force Microscopy. Fine structural analysis of the nanostructures is finally investigated using advanced characterization tools such as Transmission Electron Microscopy and X-rays nano-diffraction by synchrotron radiation

Image to Image translation has been triggered a huge interests among the different topics in deep learning recent years. It provides a mapping function to encode the noisy input images into a high dimensional signal and translate it to the desired output images. The mapping can be one to one, many to one or one to many. Due to the uncertainty from the mapping functions, when extend the methods in video field, the flickering problems emerges. Even a slight change among the frames may bring a obvious change in the output images. In this thesis, we provide a two-stream solution as CFNet for the flickering problems in video colorizations. Compared with the frame-by-frame methods by the previous work, CFNet has a great improvement in allevaiting the flickering problems in video colorizations, especially for the video clips with large objects and still background. Compared with the baseline with frame by frame methods, CFNet improved the PSNR from 27 to 30, which is a great progress.

Il y a actuellement un intérêt croissant pour la construction des dispositifs électroniques à semiconducteur pour les applications domotiques. La technologie des semiconducteurs de puissance a été essentiellement limitée au silicium. Récemment, de nouveaux matériaux ayant des propriétés supérieures sont étudiés en tant que remplaçants potentiels, en particulier : le nitrure de gallium et le carbure de silicium. L'état actuel de développement de la technologie 4H-SiC est beaucoup plus mature que pour le GaN. Cependant, l'utilisation de 4H-SiC n’est pas une solution économiquement rentable pour la réalisation des redresseurs Schottky 600 V. Les progrès récents dans le développement des couches épitaxiées de GaN de type n sur substrat Si offrent de nouvelles perspectives pour le développement des dispositifs de puissance à faible coût. C’est dans ce cadre que ma thèse s’inscrit pour réaliser avec ce type de substrat, un redresseur Schottky de puissance avec un calibre en tension de l’ordre de 600V. Deux architectures de redresseurs sont exposées. La première est une architecture pseudo-verticale proposée dans le cadre du projet G2ReC et la deuxième est une architecture latérale à base d’hétérojonction AlGaN/GaN obtenue à partir d'une structure de transistor HEMT. L’optimisation de ces deux dispositifs en GaN est issue de simulation par la méthode des éléments finis. Dans ce cadre, une adaptation des modèles de simulation à partir des paramètres physiques du GaN extraits depuis la littérature a été effectuée. Ensuite, une étude d’influence des paramètres géométriques et technologiques sur les propriétés statiques en direct et en inverse des redresseurs a été réalisée. Enfin, des structures de tests ont été fabriquées et caractérisées afin d’évaluer et d’optimiser le caractère prédictif des simulations par éléments finis. Ces études nous ont conduit à identifier l'origine des limites des structures de première génération et de définir de nouvelles structures plus performantes. / There is increasing interest in the fabrication of power semiconductor devices in home automation applications. Power semiconductor technology has been essentially confined to Si. Recently, new materials with superior properties are being investigated as potential replacements, in particular silicon carbide (SiC) and gallium nitride (GaN). The current state of development of SiC technology is much more mature than for GaN. However, the use of 4H-SiC is not a cost effective solution for realizing a medium and high voltage Schottky diode. Recent advances on the development of thick n-type GaN epilayers on Si substrate offer new prospects for the development of a low-cost Schottky rectifiers for at least medium voltage range 600 V. In the context of our thesis, two types of GaN based rectifier architectures have been studied. The first one is a pseudo-vertical architecture proposed during previous G2ReC project. The second one has a lateral structure with AlGaN/GaN heterojunction, derived from a HEMT structure. The optimization of the Schottky rectifiers has been achieved by finite element simulations. As a first step, the models are implemented in the software and adjusted with the parameters described in the literature. The influence of the geometrical and physical parameters on the specific on-resistance and on the breakdown voltage has been analysed. Finally, the test devices have been realized and characterized to optimize and to validate the parameters of these models. These studies lead to identify the limits of the structures and create a new generation of powerful structures.

This thesis aims to overcome the drawbacks of traditional portfolio optimization by employing Generative Deep Neural Networks on real stock data. The proposed framework is capable of generating return data that have similar statistical characteristics as the original stock data. The result is acquired using Monte Carlo simulation method and presented in terms of individual risk. This method is tested on real Swedish stock market data. A practical example demonstrates how to optimize a portfolio based on the output of the proposed Generative Adversarial Networks.