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O presente trabalho tem como objetivo desenvolver um processo de fabricação de elementos micro-ópticos utilizando-se litografia por feixe de elétrons, empregando o resiste SU-8, negativo e amplificado quimicamente, sobre substrato de Si. Para tanto, é realizado o estudo dos parâmetros do efeito de proximidade a, b e h para se modelar e controlar os efeitos do espalhamento dos elétrons no resiste e no substrato, e se altera o processamento convencional do SU-8 para se obter um processo com baixo contraste. A determinação dos parâmetros do efeito de proximidade para o sistema de escrita direta e amostra SU-8 / Si é feita experimentalmente e por simulação de Monte Carlo. Particularmente, verifica-se a dependência dos mesmos com a profundidade do resiste. Primeiramente utilizando o software PROXY, obtêm-se a, b e h da observação de padrões de teste revelados. Chega-se a 4m para o parâmetro () que mede o retroespalhamento dos elétrons pelo substrato e 0,7 para a relação (h) entre a intensidade destes com aquela dos elétrons diretamente espalhados pelo resiste (alcance dado por a). Ainda, com esses dados, estima-se o diâmetro do feixe do microscópio eletrônico de varredura a partir da equação de aproximação de espalhamento direto para pequenos ângulos (a = 128nm na superfície do resiste) e se determina a resolução lateral do processo (a = 800nm na interface resiste/ substrato, para um filme de 2,4m). Em seguida, usa-se o software CASINO para se calcular os parâmetros de proximidade a partir da curva de densidade de energia dissipada no resiste obtida pela simulação da trajetória de espalhamento dos elétrons. Confrontam-se, finalmente, os valores obtidos pelos dois métodos. Em relação ao processamento do resiste SU-8, são determinadas as condições experimentais para a fabricação de estruturas tridimensionais por litografia de feixe de elétrons. Especificamente, busca-se desenvolver um processo com características (espessura, contraste, sensibilidade e rugosidade) adequadas para a fabricação de micro-dispositivos ópticos. Inicia-se com o levantamento das curvas de contraste e da sensibilidade do SU-8 para determinadas temperaturas de aquecimento pós-exposição. Obtém-se contraste abaixo de 1 para aquecimento pós-exposição abaixo da temperatura de transição vítrea do resiste, mantendo-se sensibilidade elevada (2C/cm2). Em seguida, mede-se a rugosidade da superfície do filme revelado para diferentes doses de exposição. Para finalizar, submete-se a amostra a um processo de cura e escoamento térmico, para melhorar a dureza e a rugosidade do resiste a ser utilizado como dispositivo final Consegue-se um valor de rugosidade (40nm) inferior a 20 vezes o comprimento de onda de diodo laser de eletrônica de consumo. Por fim, é produzido um dispositivo com perfil discretizado em 16 níveis como prova de conceito. / This work aims at developing an electron-beam lithography process for the fabrication of microoptical elements using the negative tone chemically amplified resist SU-8 on Si substrate. A study of the proximity effect parameters a, b and h is carried out to model and control the electron scattering both in the resist and in the substrate, and the SU-8 standard processing conditions are changed to achieve a low contrast process. The determination of the SU-8 / Si proximity effect parameters and its dependence with resist depth is done employing an experimental method and through Monte Carlo simulations. First, a, b and h are obtained comparing exposed patterns calculated by the software PROXY. b, the parameter which measures the backscattering of the electrons by the substrate, is equal to 4m and the value of h, the ratio of the dose contribution of backscattered electrons to that of the forward scattered (related to a), is 0.7. The extrapolation of exposed patterns data is used to estimate the scanning electron microscope beam diameter through the equation for low angle scattering (a = 128nm at the resist surface) and the lateral resolution of the process is determined (a = 800nm at the resist/ substrate interface, for a 2.4m film). With aid of the software CASINO, Monte Carlo simulations of the scattering trajectories of electrons in substrate and resist materials are calculated, recording the energy that they dissipate through collisions along their path. The results obtained representing the profile of the energy dissipated in the resist are used to determine the proximity effect parameters. The experimental method results are compared to that obtained by simulation. Regarding the SU-8 processing, the process parameters for the fabrication of three-dimensional structures by electron-beam lithography are determined. The process is designed to have specifications (thickness, contrast, sensitivity and surface roughness) suitable for microoptical elements fabrication. It begins with the determination of the SU-8 contrast curve and its sensitivity for specific post-exposure bake temperatures. A below the unit contrast process with high sensitivity (2C/cm2) is achieved postannealing the sample below the resist glass transition temperature. The film surface roughness is measured after resist development for different exposure doses, and a controlled hardbake (cure) and reflow is carried to enhance both the mechanical properties and the surface roughness of the structures that will remain as part of the final device. A RMS roughness of 40nm, lower than 20 times the wavelength of consumer electronics laser diode, is obtained. The electron-beam process designed is applied to the fabrication of a microelement with a 16-level profile discretization.

O presente trabalho tem como objetivo desenvolver um processo de fabricação de elementos micro-ópticos utilizando-se litografia por feixe de elétrons, empregando o resiste SU-8, negativo e amplificado quimicamente, sobre substrato de Si. Para tanto, é realizado o estudo dos parâmetros do efeito de proximidade a, b e h para se modelar e controlar os efeitos do espalhamento dos elétrons no resiste e no substrato, e se altera o processamento convencional do SU-8 para se obter um processo com baixo contraste. A determinação dos parâmetros do efeito de proximidade para o sistema de escrita direta e amostra SU-8 / Si é feita experimentalmente e por simulação de Monte Carlo. Particularmente, verifica-se a dependência dos mesmos com a profundidade do resiste. Primeiramente utilizando o software PROXY, obtêm-se a, b e h da observação de padrões de teste revelados. Chega-se a 4m para o parâmetro () que mede o retroespalhamento dos elétrons pelo substrato e 0,7 para a relação (h) entre a intensidade destes com aquela dos elétrons diretamente espalhados pelo resiste (alcance dado por a). Ainda, com esses dados, estima-se o diâmetro do feixe do microscópio eletrônico de varredura a partir da equação de aproximação de espalhamento direto para pequenos ângulos (a = 128nm na superfície do resiste) e se determina a resolução lateral do processo (a = 800nm na interface resiste/ substrato, para um filme de 2,4m). Em seguida, usa-se o software CASINO para se calcular os parâmetros de proximidade a partir da curva de densidade de energia dissipada no resiste obtida pela simulação da trajetória de espalhamento dos elétrons. Confrontam-se, finalmente, os valores obtidos pelos dois métodos. Em relação ao processamento do resiste SU-8, são determinadas as condições experimentais para a fabricação de estruturas tridimensionais por litografia de feixe de elétrons. Especificamente, busca-se desenvolver um processo com características (espessura, contraste, sensibilidade e rugosidade) adequadas para a fabricação de micro-dispositivos ópticos. Inicia-se com o levantamento das curvas de contraste e da sensibilidade do SU-8 para determinadas temperaturas de aquecimento pós-exposição. Obtém-se contraste abaixo de 1 para aquecimento pós-exposição abaixo da temperatura de transição vítrea do resiste, mantendo-se sensibilidade elevada (2C/cm2). Em seguida, mede-se a rugosidade da superfície do filme revelado para diferentes doses de exposição. Para finalizar, submete-se a amostra a um processo de cura e escoamento térmico, para melhorar a dureza e a rugosidade do resiste a ser utilizado como dispositivo final Consegue-se um valor de rugosidade (40nm) inferior a 20 vezes o comprimento de onda de diodo laser de eletrônica de consumo. Por fim, é produzido um dispositivo com perfil discretizado em 16 níveis como prova de conceito. / This work aims at developing an electron-beam lithography process for the fabrication of microoptical elements using the negative tone chemically amplified resist SU-8 on Si substrate. A study of the proximity effect parameters a, b and h is carried out to model and control the electron scattering both in the resist and in the substrate, and the SU-8 standard processing conditions are changed to achieve a low contrast process. The determination of the SU-8 / Si proximity effect parameters and its dependence with resist depth is done employing an experimental method and through Monte Carlo simulations. First, a, b and h are obtained comparing exposed patterns calculated by the software PROXY. b, the parameter which measures the backscattering of the electrons by the substrate, is equal to 4m and the value of h, the ratio of the dose contribution of backscattered electrons to that of the forward scattered (related to a), is 0.7. The extrapolation of exposed patterns data is used to estimate the scanning electron microscope beam diameter through the equation for low angle scattering (a = 128nm at the resist surface) and the lateral resolution of the process is determined (a = 800nm at the resist/ substrate interface, for a 2.4m film). With aid of the software CASINO, Monte Carlo simulations of the scattering trajectories of electrons in substrate and resist materials are calculated, recording the energy that they dissipate through collisions along their path. The results obtained representing the profile of the energy dissipated in the resist are used to determine the proximity effect parameters. The experimental method results are compared to that obtained by simulation. Regarding the SU-8 processing, the process parameters for the fabrication of three-dimensional structures by electron-beam lithography are determined. The process is designed to have specifications (thickness, contrast, sensitivity and surface roughness) suitable for microoptical elements fabrication. It begins with the determination of the SU-8 contrast curve and its sensitivity for specific post-exposure bake temperatures. A below the unit contrast process with high sensitivity (2C/cm2) is achieved postannealing the sample below the resist glass transition temperature. The film surface roughness is measured after resist development for different exposure doses, and a controlled hardbake (cure) and reflow is carried to enhance both the mechanical properties and the surface roughness of the structures that will remain as part of the final device. A RMS roughness of 40nm, lower than 20 times the wavelength of consumer electronics laser diode, is obtained. The electron-beam process designed is applied to the fabrication of a microelement with a 16-level profile discretization.

Les composants passifs hyperfréquences deviennent de plus en plus commercialisés et employés dans les systèmes de télécommunications. La croissance technologique et l'augmentation de la demande des nouvelles applications requièrent de meilleures performances et de moindres coûts. Dans les applications sans fil et notamment dans les modules " émission/réception ", les circulateurs sont utilisés pour l'émission et la réception des signaux simultanément à l'aide d'une seule antenne. Les couches magnétiques traditionnellement déposées et intégrées exigent une cristallisation à haute température ainsi que l'application d'un champ magnétique externe pour garder l'orientation des moments magnétiques. Cette orientation est cependant obtenue par des aimants lourds et volumineux. Devant ces limitations technologiques ainsi que la demande de miniaturisation, l'emploi de l'hexaferrite de baryum sous sa forme particulaire devrait permettre le développement de circulateurs auto-polarisés et miniaturisés à matériaux magnétiques composites. Les travaux présentés dans ce manuscrit ont pour objectif d'étudier et de réaliser un circulateur hyperfréquence à nano particules magnétiques orientées dans la bande 40-60 GHz. L'état de l'art expose les différentes topologies de circulateurs dont la topologie coplanaire est choisie pour notre application. L'étude analytique est basée sur les travaux de Bosma permettant de modéliser le circulateur triplaque. Les principales dimensions géométriques obtenues sont ensuite transposées vers la structure coplanaire en 3D à l'aide de l'outil de simulation HFSS. Devant les limitations de cet outil, différentes structures ont été étudiées et simulées numériquement pour présenter au mieux le matériau composite. Plusieurs séries de prototypes sont ensuite fabriquées à partir des structures optimisées en simulation numérique. Le matériau magnétique composite déposé a des épaisseurs de 40 et 100 μm. Les caractérisations hyperfréquences montrent la performance des dispositifs réalisés. Des pistes de recherche sont proposées pour l'amélioration des performances de nos prototypes.

The maximum sensitivity of a thermal IR sensor can be available either by means of the sensor material, having its own absorbing properties, or by the deposition of an additional absorber structure on the detector surface. In this thesis, the theory of two absorption structures is discussed. The first is called the interferometric absorber structure. The second structure under investigation uses a lead selenide layer for the IR absorption. In the interferometric structure, a new epoxy material SU8-2002 was used as a dielectric medium. This material has a very low thermal conductivity of 0.3 W/mK, which makes it suitable for thermal detectors. The interferometric structure is based on three layers, a 40–60 Å thick Ti layer, a SU8–2002 layer with a thickness of 2000 Å thick and a 2000Å Al layer. Using standard cleanroom processing an interferometric structure was fabricated. Transfer matrix theory was used in order to simulate the interferometric structure and the lead selenide was fabricated by means of an argon-plasma sputtering process. Both fabricated samples were characterized through Fourier transfer infrared (FTIR) spectroscopy together with a specular reflectance accessory. The thicknesses of the added layers were measured using Atomic force microscopy (AFM) for both the interferometric and lead selenide structure.  It was determined  that by changing the reflective index value of the SU8-2002 from the reported value of 1.575 to about 2.40 that this provided a better agreement with the experimental results. The absorption results for the interferometric structure were determined to be approximately 82–98% for the wavelength region of 2-20µm at 30 degree. The PbSe absorption spectra showed 30%–50% absorption for the wavelength region 2.5 – 6.67μm.

Microfluidics refers to manipulation, precise control, and behavior of fluids at the micro and nanoliter scales. It has entered the realm of science as a way to precisely measure or mix small amounts of fluid to perform highly controlled reactions. Glass and polydimethylsiloxane (PDMS) are common materials used to create microfluidic devices; however, glass is difficult to process and PDMS is relatively hydrophobic. In this study, SU-8, an epoxy based (negative) photoresist was used to create various electrokinetic microfluidic chips. SU-8 is commonly used in microelectromechanical design. Spin coating of various SU-8 formulations allows for 1 μm to 100 μm thick layers with aspect ratios reportedly as high as 50:1. Case studies were performed to understand the curing/crosslinking process of SU-8 by differential scanning calorimetry. Supplier (MicroChem) recommended parameters were then altered to allow for adequate development of microfluidic channels, while maintaining enough molecular mobility to subsequently bond the SU-8 to a secondary substrate. Three SU-8 layers were used to create fully (SU-8) enclosed microfluidic channels. An (1) SU-8 2050 fully cured base layer was used as a platform on silicon to build from, (2) an SU-8 2050 partially cured layer for developing microfluidic channels , and (3) an SU-8 2007 uncured layer for bonding a secondary substrate to enclose the microfluidic channels. Bond quality was verified by optical and scanning electron microscopy, which resulted in a nearly 100% bond with little to no reflow of SU-8 into channels. Working pressures (ΔP across the capillary) of 15.57 lb/in2 (max detection) were obtained with no fluid leaks. Electroosmotic flow and steaming potential measurements failed. Electrophoretic behavior of glass particles was observed and particle velocities were compared by the application of 200 volts and 300 volts, across a channel length of 2 cm. Particle velocities obtained ranged from 100 μm/s to 1500 μm/s.

In this thesis, microelectrode arrays of micropumps have been designed, fabricated and characterized for transporting microfluid by AC electro-osmosis (ACEO). In particular, the 3D stepped electrode design which shows superior performance to others in literature is adopted for making micropumps, and the performance of such devices has been studied and explored. A novel fabrication process has also been developed in the work, realizing 3D stepped electrodes on a flexible substrate, which is suitable for biomedical use, for example glaucoma implant. There are three major contributions to ACEO pumping in the work. First, a novel design of 3D “T-shaped” discrete electrode arrays was made using PolyMUMPs® process. The breakthrough of this work was discretizing the continuous 3D stepped electrodes which were commonly seen in the past research. The “T-shaped” electrodes did not only create ACEO flows on the top surfaces of electrodes but also along the side walls between separated electrodes. Secondly, four 3D stepped electrode arrays were designed, fabricated and tested. It was found from the experiment that PolyMUMPs® ACEO electrodes usually required a higher driving voltage than gold electrodes for operation. It was also noticed that a simulation based on the modified model taking into account the surface oxide of electrodes showed a better agreement with the experimental results. It thus demonstrated the possibility that the surface oxide of electrodes had impact on fluidic pumping. This methodology could also be applied to metal electrodes with a native oxide layer such as titanium and aluminum. Thirdly, a prototype of the ACEO pump with 3D stepped electrode arrays was first time realized on a flexible substrate using Kapton polyimide sheets and packaged with PDMS encapsulants. Comprehensive experimental testing was also conducted to evaluate the mechanical properties as well as the pumping performance. The experimental findings indicated that this fabrication process was a promising method to create flexible ACEO pumps that can be used as medical implants and wearable devices. / Thesis (Ph.D, Mechanical and Materials Engineering) -- Queen's University, 2013-05-06 10:57:48.077

L'interface homme / machine a entraîné de nombreuses recherches en biotechnologie. Une partie de ces recherches portent sur les interconnexions cerveau / machine. En effet, le cerveau dispose de nombreuses connexions cérébrales par le biais de neurones. Ces neurones communiquent entre eux et propagent l'information grâce à un signal bio-électrique appelé potentiel d'action. L'objectif de ma thèse de doctorat est de mesurer ce signal à l'aide de transistors ionosensibles à effet de champ (Ion Sensitive Field Effect Transistor ISFET). Le procédé ISFET a été modifié pour obtenir un nouveau type de capteur baptisé NeuroFET. Les puces contenant les NeuroFETs ont entièrement été fabriquées au sein de la salle blanche du LAAS. La croissance des neurites doit être ensuite orientée pour que celles-ci passent sur les grilles des NeuroFETs. Pour se faire, nous avons choisi de les contraindre mécaniquement à l'aide de canaux microfabriqués en résine SU-8. Après avoir testé différentes méthodes non concluantes, nous avons développé notre propre technique basée sur la photolithographie par projection. En modifiant les paramètres de focalisation et d'exposition, il a été possible d'obtenir des canaux en forme d'arcs brisés en une seule insolation. Grâce à cette méthode nommée " SU-8 3D", nous avons finalement réalisé des réseaux de microcanaux biocompatibles en SU-8 en vue d'analyses neuronales. Notre partenariat avec l'Institut de la Vision à Paris, nous a permis d'utiliser ce réseau de canaux afin d'orienter la croissance des neurites. La puce NeuroFET a été mise en boitier sur un circuit imprimé, isolée électriquement et recouverte d'un cône de culture permettant la culture neuronale à l'échelle de la puce individuelle. Les potentiels d'actions des neurones de rétine de rat n'étant pas assez important pour être mesuré à partir de l'électronique développée, nous avons utilisé des neurones d'escargots d'eau Lymnaea Stagnalis. Après trois jours de culture, nous avons appliqué aux cellules un cycle de différentes toxines permettant d'alterner le déclanchement de potentiels d'actions spontanés et l'état de repos. Ce cycle nous a permis d'observer une activité neuronale et ainsi de valider le bon fonctionnement du système.

This thesis is about the design of a biosensor system for detection of multiple cancer biomarkers. Accurate diagnosis and prognosis of cancer requires early detection. Equally important, though, is the measurement of biomarker-velocity and detection of multiple biomarkers. Early detection requires highly sensitive biosensors capable of detection at very low concentrations of target molecules. Biomarker-velocity can be measured by monitoring concentration of target molecule over a period of time. This requires a system which is very easy to use, fast, flexible, inexpensive and portable, thus enabling its ubiquitous presence at the point of care. For detection of multiplexed biomarkers, biosensors which easily lend to array configuration are required. Conventional techniques do not fulfill either all or some aspects of the requirements listed above. In this work, we present the design of a biosensor system, keeping in view the desired features described above, to achieve the ultimate goal of enabling ubiquitous presence of biosensor at the point of care. We focus on acoustic transducer based biosensors. The two fundamental components of design in an acoustic biosensor are the design of an acoustic transducer and the design of a novel electrical interface for the transducer. For transducer design, we introduce and present the design of a single structure, GHz range, multi-mode acoustic resonator. We present this as a suitable transducer for liquid phase biosensors, which is the preferred medium for sensing of cancer biomarkers. We explore the underlying physics and do experimental and theoretical characterization of this device. The transducer needs to be functionalized with a chemically sensitive layer which performs the molecular recognition of cancer biomarkers. We present the experimental exploration of a reversible and oriented immobilization based Histidine-Ni(2+) interaction which used NTA as the chelator for anchoring onto the device. Then we discuss the microfluidic design to enable liquid phase operation. We used SU-8 polymer barriers for liquid containment and addressed the challenges of making it compatible with ZnO based devices. An electrical interface is needed to excite and extract the sensor response. We have presented here a novel method to measure and track a resonator's response and extract its characteristic parameters. This method measures the wideband frequency response of the resonator with a much simpler setup as compared to conventional methods. We have proposed and demonstrated the use of a white noise signal as a viable signal for broadband excitation of resonator-based sensing platforms. We have also established, shown through simulation and prototype measurements, the feasibility of the proposed method. The accuracy and speed of the system can be further greatly improved by FFT-based digital implementation of the spectral analysis system. We have presented an example hardware implementation of FFT-based signal analyzer, and have discussed the hardware resources required for actual implementation in a chip form. Lastly we discuss the measurement protocol and sensor results for head and neck cancer and prostate cancer biomarkers. These results demonstrate the usability of the proposed sensor system for detection of cancer biomarkers.

An Active Microscaffold System with Fluid Delivery and Stimulation/Recording Functionalities for Culturing 3-D Neuronal Networks Laura Elizabeth Rowe 215 Pages Directed by Dr. A. Bruno Frazier An active microscaffold system with fluid delivery and electrical stimulation/recording functionalities for 3-D neuronal culture studies is presented. The microscaffolds presented in this dissertation consist of an array of microfabricated towers with integrated microfluidic channels, fluid ports, and electrodes. The microfluidic channels and ports allow for perfusion of nutrients, gas exchange, and biochemical control of the extracellular environment throughout the 3-D culture, while the electrodes allow for active stimulation/recording of the 3-D neuronal network. In essence, the microscaffold serves as an artificial circulatory system to enable 3-D in vitro growth and proliferation of re-aggregate neuronal cell cultures. Increased cell survival on microscaffolds with nutrient perfusion at 14 and 21 days in vitro (DIV) is presented. Additionally, the microtower scaffold is built upon a substrate that is compatible with the Multi Channel Systems preamplifier setup to enable electrical stimulation/recording of the cultured network in a 3-D mutilelectrode array (MEA) environment. Impedance measurements on the functioning microtower electrodes were obtained. The overall goal of this research was to develop a BioMEMS technology to provide neuroscientists with a better investigative tool for studying 3-D in vitro neuronal networks than is currently available.