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Photoluminescence spectroscopy is one of the most efficient and sensitive non-contact techniques used to investigate defects in SiC. In this work, room temperature photoluminescence mapping is employed to identify different defects that influence material properties. The correlation of the distribution of these defects in n-type 4H-SiC substrates with electronic properties of SiC revealed connection between the deep levels acting as efficient recombination centers and doping in the substrate. Since deep levels are known to act as minority carrier lifetime killers, the obtained knowledge may contribute to our ability to control important characteristics such as minority carrier lifetime in SiC. In semi-insulating (SI) 6H-SiC, the correlation between room temperature infrared photoluminescence maps and the resistivity maps is used to identify deep defects responsible for semi-insulating behavior of the material. Different defects were found to be important in different families of SI SiC substrates, with often more than one type of defect playing a significant role. The obtained knowledge is expected to enhance the yield of SI SiC fabrication and the homogeneity of the resistivity distribution across the area of large SiC substrates.

Carrier dynamics in GaAs-based photoconductive terahertz (THz) sources is investigated using Monte Carlo techniques to optimize the emitted THz transients. A self-consistent Monte Carlo-Poisson solver is developed for the spatio-temporal carrier transport properties. The screening contributions to the THz radiation associated with the Coulomb and radiation fields are obtained self-consistently by incorporating the three-dimensional Maxwell equations into the solver. In addition, the enhancement of THz emission by a large trap-enhance field (TEF) near the anode in semi-insulating (SI) photoconductors is investigated. The transport properties of the photoexcited carriers in photoconductive THz sources depend markedly on the initial spatial distribution of those carriers. Thus, considerable control of the emitted THz spectrum can be attained by judiciously choosing the optical excitation spot shape on the photoconductor, since the carrier dynamics that provide the source of the THz radiation are strongly affected by the ensuing screenings. The screening contributions due to the Coulomb and radiation parts of the electromagnetic field acting back on the carrier dynamics are distinguished. The dominant component of the screening field crosses over at an excitation aperture size with full width at half maximum (FWHM) of ~100 um for a range of reasonable excitation levels. In addition, the key mechanisms responsible for the TEF near the anode of SI photoconductors are elucidated in detail. For a given optical excitation power, an enhancement of THz radiation power can be obtained using a maximally broadened excitation aperture in the TEF area elongated along the anode due to the reduction in the Coulomb and radiation screening of the TEF.

Semiconductor lasers based on gallium arsenide and relatedmaterials are widely used in applications such as opticalcommunication systems, sensing, compact disc players, distancemeasurement, etc. The performance of these lasers can beimproved using a buried heterostructure offering lateralcarrier and optical confinement. In particular, if theconfinement (burying) layer is implemented by epitaxialregrowth of an appropriate aluminium-free semi-insulating (SI)material, passivation of etched surfaces, reduced tendency tooxidation, low capacitance and integration feasibility areadditional advantages. The major impediment in the fabrication of GaAs/AlGaAsburied-heterostructure lasers is the spontaneous oxidation ofaluminium on the etched walls of the structure. Al-oxide actsas a mask and makes the regrowth process extremely challenging.In this work, a HCl gas-basedin-situcleaning technique is employed successfully toremove Al-oxide prior to regrowth of SI-GaInP:Fe and SI-GaAs:Fearound Al-containing laser mesas by Hydride Vapour PhaseEpitaxy. Excellent regrowth interfaces, without voids, areobtained, even around AlAs layers. Consequences of usinginadequate cleaning treatments are also presented. Regrowthmorphology aspects are discussed in terms of different growthmechanisms. Time-resolved photoluminescence characterisation indicates auniform Fe trap distribution throughout the regrown GaInP:Fe.Scanning capacitance microscopy measurements demonstrate thesemi-insulating nature of the regrown GaInP:Fe layer. Thepresence of EL2 defects in regrown GaAs:Fe makes more difficultthe interpretation of the characterisation results in the nearvicinity of the laser mesa. GaAs/AlGaAs buried-heterostructure lasers, both in-planelasers and vertical-cavity surface-emitting lasers, withGaInP:Fe as burying layer are demonstrated for the first time.The lasers exhibit good performance demonstrating thatSI-GaInP:Fe is an appropriate material to be used for thispurpose and the suitability of our cleaning and regrowth methodfor the fabrication of this type of semiconductor lasers.Device characterisation indicates negligible leakage currentalong the etched mesa sidewalls confirming a smooth regrowthinterface. Nevertheless, experimental and simulation resultsreveal that a significant part of the injected current is lostas leakage through the burying material. This is attributed todouble carrier injection into the SI-GaInP:Fe layer.Simulations also predict that the function of GaInP:Fe ascurrent blocking layer should be markedly improved in the caseof GaAs-based longer wavelength lasers. <b>Keywords:</b>semiconductor lasers, in-plane lasers, VCSELs,GaAs, GaInP, semi-insulating materials, hydride vapour phaseepitaxy, regrowth, buried heterostructure, leakage current,simulation.

<p>Semiconductor lasers based on gallium arsenide and relatedmaterials are widely used in applications such as opticalcommunication systems, sensing, compact disc players, distancemeasurement, etc. The performance of these lasers can beimproved using a buried heterostructure offering lateralcarrier and optical confinement. In particular, if theconfinement (burying) layer is implemented by epitaxialregrowth of an appropriate aluminium-free semi-insulating (SI)material, passivation of etched surfaces, reduced tendency tooxidation, low capacitance and integration feasibility areadditional advantages.</p><p>The major impediment in the fabrication of GaAs/AlGaAsburied-heterostructure lasers is the spontaneous oxidation ofaluminium on the etched walls of the structure. Al-oxide actsas a mask and makes the regrowth process extremely challenging.In this work, a HCl gas-based<i>in-situ</i>cleaning technique is employed successfully toremove Al-oxide prior to regrowth of SI-GaInP:Fe and SI-GaAs:Fearound Al-containing laser mesas by Hydride Vapour PhaseEpitaxy. Excellent regrowth interfaces, without voids, areobtained, even around AlAs layers. Consequences of usinginadequate cleaning treatments are also presented. Regrowthmorphology aspects are discussed in terms of different growthmechanisms.</p><p>Time-resolved photoluminescence characterisation indicates auniform Fe trap distribution throughout the regrown GaInP:Fe.Scanning capacitance microscopy measurements demonstrate thesemi-insulating nature of the regrown GaInP:Fe layer. Thepresence of EL2 defects in regrown GaAs:Fe makes more difficultthe interpretation of the characterisation results in the nearvicinity of the laser mesa.</p><p>GaAs/AlGaAs buried-heterostructure lasers, both in-planelasers and vertical-cavity surface-emitting lasers, withGaInP:Fe as burying layer are demonstrated for the first time.The lasers exhibit good performance demonstrating thatSI-GaInP:Fe is an appropriate material to be used for thispurpose and the suitability of our cleaning and regrowth methodfor the fabrication of this type of semiconductor lasers.Device characterisation indicates negligible leakage currentalong the etched mesa sidewalls confirming a smooth regrowthinterface. Nevertheless, experimental and simulation resultsreveal that a significant part of the injected current is lostas leakage through the burying material. This is attributed todouble carrier injection into the SI-GaInP:Fe layer.Simulations also predict that the function of GaInP:Fe ascurrent blocking layer should be markedly improved in the caseof GaAs-based longer wavelength lasers.</p><p><b>Keywords:</b>semiconductor lasers, in-plane lasers, VCSELs,GaAs, GaInP, semi-insulating materials, hydride vapour phaseepitaxy, regrowth, buried heterostructure, leakage current,simulation.</p>

The photoconductive method is one of the oldest methods for the generation of THz room temperature operated THz electromagnetic waves. The THz photoconductive source has operated at a lower power level in the order of hundreds of nW. In addition, the energy conversion of optical to THz efficiency has remained extremely low. One of the most efficient THz photoconductive sources is a trap-enhanced field (TEF) effect source. The field is measured to contain more than 90% of the total DC bias within the first 5 µm of an 80 µm gap between the electrodes reaching kV/cm with only a modest bias. The overall THz power, however, has remained low, due to its rapid saturation. To date, there has been a limited understanding of the TEF effect. In this thesis, a more detailed experimental investigation of TEF effect current transport and field distribution based on annealing is presented to explain some of the underlining physics of TEF effect. A spatially extended line excitation is introduced to effectively reduce the screening effect while still exploiting the TEF region to maintain high efficiency and reach the µW regime. The record efficiency reached by this method is demonstrated. An experimental demonstration with a numerical analysis of the line excitation is presented. The spectral analysis of both a point and a line excitation demonstrate that the line excitation spectrum is not only comparable to that of the point excitation, but also extends the range of useful lower frequency content. To further improve the THz efficiency, the line excitation THz array is investigated.

Ausgehend von einem thermodynamisch konsistenten Modell von Dreyer und Duderstadt für Tropfenbildung in Galliumarsenid-Kristallen, das Oberflächenspannung und Spannungen im Kristall berücksichtigt, stellen wir zwei mathematische Modelle zur Evolution der Größe flüssiger Tropfen in Kristallen auf. Das erste Modell behandelt das Regime diffusionskontrollierter Interface-Bewegung, während das zweite Modell das Regime Interface-kontrollierter Bewegung des Interface behandelt. Unsere Modellierung berücksichtigt die Erhaltung von Masse und Substanz. Diese Modelle verallgemeinern das wohlbekannte Mullins-Sekerka-Modell für die Ostwald-Reifung. Wir konzentrieren uns auf arsenreiche kugelförmige Tropfen in einem Galliumarsenid-Kristall. Tropfen können mit der Zeit schrumpfen bzw. wachsen, die Tropfenmittelpunkte sind jedoch fixiert. Die Flüssigkeit wird als homogen im Raum angenommen. Aufgrund verschiedener Skalen für typische Distanzen zwischen Tropfen und typischen Radien der flüssigen Tropfen können wir formal so genannte Mean-Field-Modelle herleiten. Für ein Modell im diffusionskontrollierten Regime beweisen wir den Grenzübergang mit Homogenisierungstechniken unter plausiblen Annahmen. Diese Mean-Field-Modelle verallgemeinern das Lifshitz-Slyozov-Wagner-Modell, welches rigoros aus dem Mullins-Sekerka-Modell hergeleitet werden kann, siehe Niethammer et al., und gut verstanden ist. Mean-Field-Modelle beschreiben die wichtigsten Eigenschaften unseres Systems und sind gut für Numerik und für weitere Analysis geeignet. Wir bestimmen mögliche Gleichgewichte und diskutieren deren Stabilität. Numerische Resultate legen nahe, wann welches der beiden Regimes gut zur experimentellen Situation passen könnte. / Based on a thermodynamically consistent model for precipitation in gallium arsenide crystals including surface tension and bulk stresses by Dreyer and Duderstadt, we propose two different mathematical models to describe the size evolution of liquid droplets in a crystalline solid. The first model treats the diffusion-controlled regime of interface motion, while the second model is concerned with the interface-controlled regime of interface motion. Our models take care of conservation of mass and substance. These models generalise the well-known Mullins-Sekerka model for Ostwald ripening. We concentrate on arsenic-rich liquid spherical droplets in a gallium arsenide crystal. Droplets can shrink or grow with time but the centres of droplets remain fixed. The liquid is assumed to be homogeneous in space. Due to different scales for typical distances between droplets and typical radii of liquid droplets we can derive formally so-called mean field models. For a model in the diffusion-controlled regime we prove this limit by homogenisation techniques under plausible assumptions. These mean field models generalise the Lifshitz-Slyozov-Wagner model, which can be derived from the Mullins-Sekerka model rigorously, see Niethammer et al., and is well-understood. Mean field models capture the main properties of our system and are well adapted for numerics and further analysis. We determine possible equilibria and discuss their stability. Numerical evidence suggests in which case which one of the two regimes might be appropriate to the experimental situation.

L’émergence d’interrupteurs de puissance en SiC permet d’envisager des convertisseurs de puissance capables de fonctionner au sein des environnements sévères tels que la haute tension (> 10 kV ) et la haute température (> 300 °C). Aucune solution de commande spécifique à ces environnements n’existe pour le moment. Le développement de fonctions élémentaires en SiC (comparateur, oscillateur) est une étape préliminaire à la réalisation d’un premier démonstrateur. Plusieurs laboratoires ont développé des fonctions basées sur des transistors bipolaires, MOSFETs ou JFETs. Cependant les recherches ont principalement portées sur la conception de fonctions logiques et non sur l’intégration de drivers de puissance. Le laboratoire AMPERE (INSA de Lyon) et le Centre National de Microélectronique de Barcelone (Espagne) ont conçu un MESFET latéral double grille en SiC. Ce composant élémentaire sera à la base des différentes fonctions intégrées envisagées. L’objectif de ces recherches est la réalisation d’un convertisseur élévateur de tension "boost" monolithique et de sa commande en SiC. La démarche scientifique a consisté à définir dans un premier temps un modèle de simulation SPICE du MESFET SiC à partir de caractérisations électriques statique et dynamique. En se basant sur ce modèle, des circuits analogiques tels que des amplificateurs, oscillateurs, paires différentielles, trigger de Schmitt ont été conçus pour élaborer le circuit de commande (driver). La conception de ces fonctions s’avère complexe puisqu’il n’existe pas de MESFETs de type P et une polarisation négative de -15 V est nécessaire au blocage des MESFETs SiC. Une structure constituée d’un pont redresseur, d’un boost régulé avec sa commande basée sur ces différentes fonctions a été réalisée et simulée sous SPICE. L’ensemble de cette structure a été fabriqué au CNM de Barcelone sur un même substrat SiC semi-isolant. L’intégration des éléments passifs n’a pas été envisagée de façon monolithique (mais pourrait être considérée pour les inductances et capacités dans la mesure où les valeurs des composants intégrés sont compatibles avec les processus de réalisation). Le convertisseur a été dimensionné pour délivrer une de puissance de 2.2 W pour une surface de 0.27 cm2, soit 8.14 W/cm2. Les caractérisations électriques des différents composants latéraux (résistances, diodes, transistors) valident la conception, le dimensionnement et le procédé de fabrication de ces structures élémentaires, mais aussi de la majorité des fonctions analogiques. Les résultats obtenus permettent d’envisager la réalisation d’un driver monolithique de composants Grand Gap. La perspective des travaux porte désormais sur la réalisation complète du démonstrateur et sur l’étude de son comportement en environnement sévère notamment en haute température (> 300 °C). Des analyses des mécanismes de dégradation et de fiabilité des convertisseurs intégrés devront alors être envisagées. / The new SiC power switches is able to consider power converters, which could operate in harsh environments as in High Voltage (> 10kV) and High Temperature (> 300 °C). Currently, they are no specific solutions for controlling these devices in harsh environments. The development of elementary functions in SiC is a preliminary step toward the realization of a first demonstrator for these fields of applications. AMPERE laboratory (France) and the National Center of Microelectronic of Barcelona (Spain) have elaborated an elementary electrical compound, which is a lateral dual gate MESFET in Silicon Carbide (SiC). The purpose of this research is to conceive a monolithic power converter and its driver in SiC. The scientific approach has consisted of defining in a first time a SPICE model of the elementary MESFET from electric characterizations (fitting). Analog functions as : comparator, ring oscillator, Schmitt’s trigger . . . have been designed thanks to this SPICE’s model. A device based on a bridge rectifier, a regulated "boost" and its driver has been established and simulated with the SPICE Simulator. The converter has been sized for supplying 2.2 W for an area of 0.27 cm2. This device has been fabricated at CNM of Barcelona on semi-insulating SiC substrate. The electrical characterizations of the lateral compounds (resistors, diodes, MESFETs) checked the design, the "sizing" and the manufacturing process of these elementary devices and analog functions. The experimental results is able to considerer a monolithic driver in Wide Band Gap. The prospects of this research is now to realize a fully integrated power converter in SiC and study its behavior in harsh environments (especially in high temperature > 300 °C). Analysis of degradation mechanisms and reliability of the power converters would be so considerer in the future.