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Systematic Analysis and Optimization of Broadband Noise and Linearity in SiGe HBTsLiang, Qingqing 06 January 2005 (has links)
Noise and linearity are the two key concerns in RF transceiver systems. However, the impact of circuit topology and device technology on systems noise and linearity behaviors is poorly understood because of the complexity and diversity involved. There are two general questions that are addressed by the RF device and circuit designers: for a given device technology, how best to optimize the circuit topology; and for a given circuit topology, how best to optimize the device technology to improve the noise and linearity performance.
In this dissertation, a systematic noise and linearity calculation method is proposed. This approach offers simple and analytical solutions to optimize the noise and linearity characteristics of integrated circuits. Supported by this approach, the physics of state-of-the-art SiGe HBT technology devices can be decoupled and studied. The corresponding impact on noise and linearity is investigated. New optimization methodologies for noise and linearity at both the device and circuit level are presented.
In addition, this thesis demonstrates a technique that accurately extracts ac and noise parameters of devices/circuits in the millimeter-wave range. The extraction technique supports and verifies the device/circuit noise analysis from a measurement standpoint.
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A Comprehensive Study of Safe-Operating-Area, Biasing Constraints, and Breakdown in Advanced SiGe HBTsGrens, Curtis M. 19 May 2005 (has links)
This thesis presents a comprehensive assessment of breakdown and operational voltage constraints in state-of-the-art silicon-germanium (SiGe)
heterojunction bipolar transistor (HBT) BiCMOS technology. Technology scaling of SiGe HBTs for high frequency performance
results on lower breakdown voltages, making operating voltage constraints an increasingly vital reliability consideration in SiGe HBTs from both a device and circuits perspective.
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Single event effects and radiation hardening methodologies in SiGe HBTs for extreme environment applicationsPhillips, Stanley David 10 October 2012 (has links)
Field-effect transistor technologies have been critical building blocks for
satellite systems since their introduction into the microelectronics industry. The
extremely high cost of launching payloads into orbit necessitates systems to have
small form factor, ultra low-power consumption, and reliable lifetime operation,
while satisfying the performance requirements of a given application. Silicon-based
complementary metal-oxide-semiconductors (Si CMOS) have traditionally been able to
adequately meet these demands when coupled with radiation hardening techniques that
have been developed over years of invested research. However, as customer demands
increase, pushing the limits of system throughput, noise, and speed, alternative
technologies must be employed. Silicon-germanium BiCMOS platforms have been
identfied as a technology candidate for meeting the performance criteria of these
pioneering satellite systems and deep space applications, contingent on their ability to
be hardened to radiation-induced damage. Given that SiGe technology is a relative new-
comer to terrestrial and extra-terrestrial applications in radiation-rich environments,
the same wealth of knowledge of time-tested radiation hardening methodologies has
not been established as it has for Si CMOS. Although SiGe BiCMOS technology has
been experimentally proven to be inherently tolerant to total-ionizing dose damage
mechanism, the single event susceptibility of this technology remains a primary concern.
The objective of this research is to characterize the physical mechanisms that drive the
origination of ion-induced transient terminal currents in SiGe HBTs that subsequently
lead to a wide range of possible single event phenomena. Building upon this learning,
a variety of device-level hardening methodologies are explored and tested for efficacy.
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Displacement Damage and Ionization Effects in Advanced Silicon-Germanium Heterojunction Bipolar TransistorsSutton, Akil K. 19 July 2005 (has links)
A summary of total dose effects observe in advanced Silicon Germanium (SiGe) Heterojunction Bipolar Transistors (HBTs) is presented in this work. The principal driving froces behin the increased use of SiGe BiCMOS technology in space based electronics systems are outlined in the motivation Section of Chapter I. This is followed by a discussion of the strained layer Si/SiGe material structure and relevant fabrication techniques used in the development of the first generation of this technology. A comprehensive description of the device performance is presented.
Chapter II presents an overview of radiation physics as it applies to microelectronic devices. Several sources of radiation are discussed including the environments encountered by satellites in different orbital paths around the earth. The particle types, interaction mechanisms and damage nomenclature are described.
Proton irradiation experiments to analyze worst case displacement and ionization damage are examined in chapter III. A description of the test conditions is first presented, followed by the experimental results on the observed dc and ac transistor performance metrics with incident radiation. The impact of the collector doping level on the degradation is discussed.
In a similar fashion, gamma irradiation experiments to focus on ionization only effects are presented in chapter IV. The experimental design and dc results are first presented, followed by a comparison of degradation under proton irradiation. Additional proton dose rate experiments conducted to further investigate observed differences between proton and gamma results are presented.
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Low-Frequency Noise in SiGe HBTs and Lateral BJTsZhao, Enhai 17 August 2006 (has links)
The object of this thesis is to explore the low-frequency noise (LFN) in silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) and lateral bipolar junction transistors (BJTs). The LFN of SiGe HBTs and lateral BJTs not only determines the lowest detectable signal limit but also induces phase noise in high-frequency applications. Characterizing the LFN behavior and understanding the physical noise mechanism, therefore, are very important to improve the device and circuit performance. The dissertation achieves the object by investigating the LFN of SiGe HBTs and lateral BJTs with different structures for performance optimization and radiation tolerance, as well as by building models that explain the physical mechanism of LFN in these advance bipolar technologies. The scope of this research is separated into two main parts: the LFN of SiGe HBTs; and the LFN of lateral BJTs. The research in the LFN of SiGe HBTs includes investigating the effects of interfacial oxide (IFO), temperature, geometrical dimensions, and proton radiation. It also includes utilizing physical models to probe noise mechanisms. The research in the LFN of lateral BJTs includes exploring the effects of doping and geometrical dimensions. The research work is envisioned to enhance the understanding of LFN in SiGe HBTs and lateral BJTs.
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Reliability of SiGe HBTs for extreme environment and RF applicationsCheng, Peng 17 November 2010 (has links)
The objective of the proposed research is to characterize the safe-operating-area of silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) under radiofrequency (RF) operation and extreme environments. The degradation of SiGe HBTs due to mixed-mode DC and RF stress has been modeled for the first time. State-of-the-art 200 GHz SiGe HBTs were first characterized, and then DC and RF stressed. Excess base leakage current was modeled as a function of the stress current and voltage. This physics-based stress model was then designed as a
sub-circuit in Cadence, and incorporated into SiGe power amplifier design to predict the
DC and RF stress-induced excess base current. Based on these studies, characterization of
RF safe-operating-area for SiGe HBTs using devices and circuits is proposed.
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The mixed-mode reliability stress of Silicon-Germanium heterojunction bipolar transistorsZhu, Chendong 10 January 2007 (has links)
The objective of the dissertation is to combine the recent Mixed-Mode reliability stress studies into a single text. The thesis starts with a review of silicon-germanium heterojunction bipolar transistor fundamentals, development trends, and the conventional reliability stress paths used in industry, after which the new stress path, Mixed-Mode stress, is introduced. Chapter 2 is devoted to an in-depth discussion of damage mechanisms that includes the impact ionization effct and the selfheating effect. Chapter 3 goes onto the impact ionization effect using two-dimensional calibrated MEDICI simulations. Chapter 4 assesses the reliability of SiGe HBTs in extreme temperature environments
by way of comprehensive experiments and MEDICI simulations. A comparison of the device
lifetimes for reverse-EB stress and mixed-mode stress indicates different damage mechanisms
govern these phenomena. The thesis concludes with a summary of the project and suggestions for
future research in chapter 5.
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SiGe HBTs Operating at Deep Cryogenic temperaturesYuan, Jiahui 09 April 2007 (has links)
As Si-manufacturing compatible SiGe HBTs are making rapid in-roads into RF through mm-wave circuit applications, with performance levels steadily marching upward, the use of these devices under extreme environment conditions are being studied extensively. In this work, test structures of SiGe HBTs were designed and put into extremely low temperatures, and a new negative differential resistance effect and a novel collector current kink effect are investigated in the cryogenically-operated SiGe HBTs.
Theory based on an enhanced positive feedback mechanism associated with heterojunction barrier effect at deep cryogenic temperatures is proposed. The accumulated charge induced by the barrier effect acts at low temperatures to enhance the total collector current, indirectly producing both phenomena. This theory is confirmed using calibrated 2-D DESSIS simulations over temperature. These unique cryogenic effects also have significant impact on the ac performance of SiGe HBTs operating at high-injection. Technology evolution plays an important role in determining the magnitude of the observed phenomena, and the scaling implications are addressed. Circuit implication is discussed.
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Developing radiation hardening by design methodologies for single event mitigation in silicon-germanium bicmos technologiesPhillips, Stanley D. 08 July 2009 (has links)
Extreme environment applications impose stringent demands on technology platforms that are incorporated in electronic systems. Space is a classic extreme environment, encompassing both large temperature fluctuations as well as intense radiation fields. Silicon-germanium technology has emerged as a competitive platform for space-based applications, owing to its excellent low-temperature performance and total ionizing dose tolerance. This technology has however been repeatedly shown to be vulnerable to single event phenomena induced by galactic cosmic rays as well as trapped particles within the earth's geomagnetic field. To improve the radiation tolerance of systems incorporating SiGe components, modifications to fabrications steps (Radiation Hardening by Process, RHBP) and/or device/circuit topologies (Radiation Hardening by Design, RHBD) may be employed. For this thesis, two methodologies are analyzed, both RHBD techniques which come at no additional power/area penalty for implementation.
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High-Efficiency Linear RF Power Amplifiers DevelopmentSrirattana, Nuttapong 14 April 2005 (has links)
Next generation mobile communication systems require the use of linear RF power amplifier for higher data transmission rates. However, linear RF power amplifiers are inherently inefficient and usually require additional circuits or further system adjustments for better efficiency. This dissertation focuses on the development of new efficiency enhancement schemes for linear RF power amplifiers.
The multistage Doherty amplifier technique is proposed to improve the performance of linear RF power amplifiers operated in a low power level. This technique advances the original Doherty amplifier scheme by improving the efficiency at much lower power level. The proposed technique is supported by a new approach in device periphery calculation to reduce AM/AM distortion and a further improvement of linearity by the bias adaptation concept.
The device periphery adjustment technique for efficiency enhancement of power amplifier integrated circuits is also proposed in this work. The concept is clearly explained together with its implementation on CMOS and SiGe RF power amplifier designs. Furthermore, linearity improvement technique using the cancellation of nonlinear terms is proposed for the CMOS power amplifier in combination with the efficiency enhancement technique.
In addition to the efficiency enhancement of power amplifiers, a scalable large-signal MOSFET model using the modified BSIM3v3 approach is proposed. A new scalable substrate network model is developed to enhance the accuracy of the BSIM3v3 model in RF and microwave applications. The proposed model simplifies the modeling of substrate coupling effects in MOS transistor and provides great accuracy in both small-signal and large-signal performances.
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