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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
11

Collage direct sur surfaces structurées / Direct bonding of patterned surfaces

Radisson, Damien 17 December 2014 (has links)
Le collage direct est un procédé par lequel deux surfaces suffisamment planes et propres peuvent se coller sans ajout d'un adhésif. Le collage direct de surfaces structurées est souvent utilisé pour la fabrication de système mécanique microélectronique (MEMS), où une plaque de silicium avec des cavités est collée à une autre plaque de silicium. La fabrication de ces dispositifs est chère et il serait utile d'avoir une ligne directrice lors du dessin de structures afin de savoir à l'avance si le collage direct sera possible.Un modèle de simulation 2D pour le collage direct de deux substrats est développéet utilisé pour étudier l'influence des cavités sur la vitesse de propagation de l'ondede collage. Les prédications données par des simulations avec Comsol® sont en bonnecohérence avec les mesures expérimentales et une loi en 2 dimensions de la vitesse de collage est obtenue. Le collage de plaques parfaitement planes avec des cavités serait toujours possible. Les limitations lors du collage de vraies plaques sont dues au coût de l'énergie élastique pour déformer les plaques non parfaitement planes. Cette limite est atteinte facilement quand l'onde de collage doit traverser une tranchée, dans ce cas un dessin avec un petit guide de collage pour aider à traverser la cavité fonctionnera mieux. La taille de ce guide d'onde doit être choisis en considèrent la flèche de la plaque. En effet la seconde règle importante du dessin est de garder une surface de collage suffisante pour avoir plus d'énergie d'adhésion que le coût en énergie élastique dû à la déformation des plaques non parfaitement planes.L'énergie d'adhésion est un important paramètre du collage direct, car c'est l'énergie qui permet l'adhésion. Cette énergie d'adhésion est différente de l'énergie de collage la plus répandues qui est l'énergie requise pour séparer deux plaques précédemment collées. Dans cet ouvrage une méthode simple de mesure d'adhésion est proposée. Une mesure de l'évolution de l'énergie d'adhésion sur un temps long nous mène à proposer un mécanisme d'évolution lié à la formation de ponts capillaires entre des surfaces rugueuses. / Direct bonding is a process by which two sufficiently flat and clean surfaces can bond to each other without any added adhesive layer. Direct bonding of patterned surfaces is often used for the fabrication of Micro-Electro-Mechanical Systems (MEMS), where a silicon wafer with cavities is bonded to a plain wafer. The fabrication of these devices is expensive and it would be useful to have guidelines when designing knew devices to know in advance if direct bonding will be possible.A 2D simulation model of the direct bonding of two substrates is developed and usedto study the influence of the cavities on the bonding wave velocity. The prediction of the simulation run with Comsol® are in good coherence with the experimental measures and a 2D law of the bonding velocity is obtained. The bonding of perfectly flat wafers with cavities should always be possible. Limitations to the bonding of real wafers are due to the elastic energy cost of deforming the non perfectly flat wafers. This limit is reached easily when the bonding wave must cross a trench, so a design with a small bonding guide to help cross the cavity will work best. The width of this wave guide should be chosen by considering the bow of the wafer. Indeed the second important design rule is to keep a bonding area big enough to have more adhesion energy than the elastic energy cost due to non flat wafers deformation.The adhesion energy is an important parameter of the direct bonding, as it is theenergy that drives the adhesion. This adhesion energy is different from the more widely known bonding energy which is the energy needed to separate two previously bonded wafers. In this work a simple method to measure the adhesion is proposed. Long time measurement of the evolution of the adhesion energy lead us to propose a mechanism for its evolution linked to the formation of capillary bridges between rough surfaces.
12

Identification and neutralization of lifetime-limiting defects in Czochralski silicon for high efficiency photovoltaic applications / Identification et neutralisation des défauts limitant les propriétés électriques du silicium Czochralski pour applications photovoltaïques

Letty, Elénore 19 October 2017 (has links)
Les cellules photovoltaïques à base de silicium cristallin représentent plus de 90% du marché photovoltaïque mondial. Des architectures de cellules à haut rendement de conversion sont actuellement développées. Pour atteindre leurs performances maximales, ces architectures nécessitent néanmoins une amélioration des propriétés électriques des substrats de silicium cristallin. Les objectifs de cette thèse sont d’identifier les défauts limitant les propriétés électriques de ces substrats, de comprendre les mécanismes menant à leur formation et de proposer des moyens permettant leur neutralisation. Les matériaux étudiés sont des plaquettes de silicium Czochralski de type n, généralement utilisé pour les applications à haut rendement. Le four de tirage Czochralski a d’abord été modélisé afin de comprendre comment le passé thermique subi par le lingot de silicium lors de la cristallisation affecte la génération des défauts. Ces travaux ont été confirmés via des confrontations avec des données expérimentales, en utilisant une méthode originale développée dans le cadre de ce travail. Nous avons ensuite étudié l’influence du budget thermique lié aux procédés de fabrication des cellules sur la population de défauts. Nous avons ainsi pu montrer que la nature des défauts limitant les propriétés électriques du silicium était grandement modifiée selon le procédé de fabrication de cellules utilisé. Nous avons en outre mis en évidence une dégradation inattendue des propriétés électriques du silicium Czochralski de type n sous illumination, liée à la formation d’un défaut volumique inconnu. Les conditions de formation et de suppression de ce défaut ont été étudiées en profondeur. Enfin, les principaux défauts limitant les propriétés électriques du silicium ayant été identifiés et les mécanismes menant à leur formation compris, nous proposons dans un dernier chapitre des nouvelles techniques de caractérisation permettant de détecter les plaquettes défectueuses en début de ligne de production de cellules photovoltaïques, et ce à une cadence industrielle. / Photovoltaic solar cells based on crystalline silicon represent more than 90% of the worldwide photovoltaic market. High efficiency solar cell architectures are currently being developed. In order to allow their maximal performances to be reached, the electronic properties of their crystalline silicon substrate must however be enhanced. The goals of the present work are to identify the defects limiting the electronic properties of the substrate, to understand the mechanisms leading to their formation and to propose routes for their neutralization. The studied materials are n-type Czochralski silicon wafers, usually used as substrates for high efficiency photovoltaic applications. The Czochralski puller was first modeled in order to understand how the thermal history experienced by the silicon ingot during crystallization affects the defects generation. This study were validated through the comparison with experimental data using an original method developed in the frame of this work. We then studied the influence of the thermal budget associated to solar cell fabrication processes on the defects population. We thus showed that the nature of lifetime-limiting defects was completely changed depending on the solar cell fabrication process. Besides, we evidenced an unexpected degradation of the electronic properties of n-type Czochralski silicon under illumination, related to the formation of an unknown bulk defect. The formation and deactivation features of this defect were extensively studied. Finally, the main limiting defects being identified and the mechanisms resulting in their formation understood, we propose in a last chapter new characterization techniques for the detection of defective wafers at the beginning of production lines at an industrial throughput.
13

Cell-protein-material Interactions on Bioceramics and Model Surfaces / Interaktioner mellan celler, proteiner och keramiska material

Rosengren, Åsa January 2004 (has links)
<p>The objective of this thesis was to investigate and characterize the interaction between blood proteins and different surfaces with emphasis on protein adsorption to bioceramics and model surfaces. Special effort was made to monitor the spontaneous and selective adsorption of proteins from human plasma and to examine the orientation, conformation and functional behavior of single proteins after adsorption. </p><p>Five different ceramic biomaterials: alumina (Al<sub>2</sub>O<sub>3</sub>), zirconia (ZrO<sub>2</sub>), hydroxyapatite (Ca<sub>10</sub>(PO<sub>4</sub>)<sub>6</sub>(OH)<sub>2</sub>) and two glass-ceramics, AP40 (SiO<sub>2</sub>-CaO-Na<sub>2</sub>O-P<sub>2</sub>O<sub>5</sub>-MgO-K<sub>2</sub>O-CaF<sub>2</sub>) and RKKP (AP40 with Ta<sub>2</sub>O<sub>3</sub>-La<sub>2</sub>O<sub>3</sub>), were exposed to human plasma and their protein binding capacities and affinities for specific proteins were studied by chromatography, protein assays, two-dimensional gel electrophoresis and Western blotting. The studies showed that all materials adsorbed approximately the same high amount of plasma proteins and that they therefore should be fully covered by proteins in an <i>in vivo</i> setting. The adsorbed proteins were different for most materials which could explain their previously observed different levels of tissue integration <i>in vivo</i>. </p><p>Four of the proteins that behaved differently, ceruloplasmin, prothrombin, α<sub>2</sub>-HS-glycoprotein and α<sub>1</sub>-antichymotrypsin, were selected for characterization with atomic force microscopy and ellipsometry. The studies, which were performed on ultraflat silicon wafers (silica), showed that the proteins oriented themselves with their long axis parallel to the surface or as in case of ceruloplasmin with one of its larger sides towards the surface. All of them had globular shapes but other conformational details were not resolved. Furthermore, prothrombin (none of the others) formed multilayers at high proteins concentrations. </p><p>The functional behaviour of the adsorbed proteins, referring to their cell binding and cell spreading capacity on silica and a positive cell adhesion reference surface (Thermanox®), was affected by the underlying substrate. Ceruloplasmin, α<sub>2</sub>-HS-glycoprotein and α<sub>1</sub>-antichymotrypsin stimulated cell attachment to silica, but suppressed attachment to Thermanox®. Prothrombin stimulated cell attachment to both surfaces. The attachment was in most cases mediated both by cell membrane-receptors (integrins) and by non-specific interactions between the cell and the material. </p><p>This thesis showed that the compositional mixture, orientation, conformation and functional behavior of the adsorbed proteins are determined by the properties of the underlying surface and if these parameters are controlled very different cellular responses can be induced.</p>
14

Cell-protein-material Interactions on Bioceramics and Model Surfaces / Interaktioner mellan celler, proteiner och keramiska material

Rosengren, Åsa January 2004 (has links)
The objective of this thesis was to investigate and characterize the interaction between blood proteins and different surfaces with emphasis on protein adsorption to bioceramics and model surfaces. Special effort was made to monitor the spontaneous and selective adsorption of proteins from human plasma and to examine the orientation, conformation and functional behavior of single proteins after adsorption. Five different ceramic biomaterials: alumina (Al2O3), zirconia (ZrO2), hydroxyapatite (Ca10(PO4)6(OH)2) and two glass-ceramics, AP40 (SiO2-CaO-Na2O-P2O5-MgO-K2O-CaF2) and RKKP (AP40 with Ta2O3-La2O3), were exposed to human plasma and their protein binding capacities and affinities for specific proteins were studied by chromatography, protein assays, two-dimensional gel electrophoresis and Western blotting. The studies showed that all materials adsorbed approximately the same high amount of plasma proteins and that they therefore should be fully covered by proteins in an in vivo setting. The adsorbed proteins were different for most materials which could explain their previously observed different levels of tissue integration in vivo. Four of the proteins that behaved differently, ceruloplasmin, prothrombin, α2-HS-glycoprotein and α1-antichymotrypsin, were selected for characterization with atomic force microscopy and ellipsometry. The studies, which were performed on ultraflat silicon wafers (silica), showed that the proteins oriented themselves with their long axis parallel to the surface or as in case of ceruloplasmin with one of its larger sides towards the surface. All of them had globular shapes but other conformational details were not resolved. Furthermore, prothrombin (none of the others) formed multilayers at high proteins concentrations. The functional behaviour of the adsorbed proteins, referring to their cell binding and cell spreading capacity on silica and a positive cell adhesion reference surface (Thermanox®), was affected by the underlying substrate. Ceruloplasmin, α2-HS-glycoprotein and α1-antichymotrypsin stimulated cell attachment to silica, but suppressed attachment to Thermanox®. Prothrombin stimulated cell attachment to both surfaces. The attachment was in most cases mediated both by cell membrane-receptors (integrins) and by non-specific interactions between the cell and the material. This thesis showed that the compositional mixture, orientation, conformation and functional behavior of the adsorbed proteins are determined by the properties of the underlying surface and if these parameters are controlled very different cellular responses can be induced.
15

Validation, improvement and implementation of sorption mathematical models using a quartz crystal microbalance (QCM) / Validation, amélioration et implémentation de modèles mathématiques de sorption en utilisant une microbalance à quartz (QCM)

Herrán, Fernando 25 April 2014 (has links)
Ce travail de thèse a été réalisé, dans le cadre de la convention CIFRE 1538/2010, au sein d'adixen Vacuum Products (aVP) à Annecy (France). Il a été en partie financé par le projet S.P.A.M. (Surface Physics for Advanced Manufacturing). Il s'agit d'un projet ITN financé par le programme Pierre et Marie Curie de la Communauté Européenne rassemblant des partenaires universitaires et industriels dont aVP. L'objectif de ce programme était de contribuer à l'étude et au développement de la lithographie et en particulier la lithographie à ultraviolet extrême (EUVL). Ce travail porte sur la problématique de la contamination moléculaire dans l'industrie des semi-conducteurs ainsi que les besoins de maitrise de contamination pour la photolithographie EUVL. Pour ce faire, des modèles mathématiques de sorption ont été recherchés, testés et validés à l'aide d'une microbalance à quartz (QCM). Cette technique, possédant une très haute sensibilité (au niveau du ng), permet d'étudier les phénomènes de sorption relatifs à tout matériau déposable sur un cristal de quartz mis au contact de différents gaz dont la pression partielle est maitrisée. Par conséquent, le protocole détaillé dans cette thèse peut être utilisé pour d'autres types d'expériences dans toute discipline nécessitant une telle précision. Le déroulement de notre plan d'expérience comprend deux types de matériaux naturellement différents : un polymère (PCBA) d'une part et deux substrats métalliques (SS AISI 304 et CuC1) d'autre part pour lesquels le transfert de masse n'intervient pas de la même manière. Les gaz d'étude ont été sélectionnés pour leur intérêt dans l'industrie des semi-conducteurs (vapeur d'eau, HF). Le résultat de l'interaction des gaz d'étude avec les substrats ciblés est suivi en direct par la QCM, ce qui permet non seulement de valider et/ou améliorer les modèles mathématiques déjà disponibles dans la bibliographie mais aussi de les ajuster aux données obtenues expérimentalement. Nous pouvons ainsi non seulement prévoir le comportement des contaminants à l'équilibre (isothermes) et à l'état transitoire mais aussi réaliser des estimations de sorption à des températures autres que celles retenues pour notre plan d'expérience / This thesis was carried out within the framework of the CIFRE 1538/2010 convention at adixen Vacuum Products (aVP) in Annecy (France). It is has been partly funded by the ITN project SPAM (Surface Physics for Advanced Manufacturing). SPAM is an ITN project funded by the Pierre and Marie Curie program of the European Community bringing together academic institutions and industrial partners including aVP. The objective of this program was to contribute to the study and development of lithography and extreme ultraviolet lithography (EUVL). This work deals with the issues caused by the airborne molecular contamination (AMC) in the semiconductor industry and their control needs in EUVL and the current photolithography. In order to tackle the problem, sorption mathematical models have been investigated and validated using a quartz crystal microbalance (QCM). This technique, which confers a high sensitivity (ng level), allows the study of the sorption phenomena related to any deposable material onto a quartz crystal in contact with different gases whose concentrations are accurately controlled. Consequently, the protocol detailed in this thesis may be used for other types of experiments in any discipline requiring such precision. The conduct of our experimental plan includes two types of naturally different materials: a polymer (PCBA) on the one hand and two metallic substrates (stainless steel AISI 304 and CuC1) on the other hand, for which the matter transfer does not occur in the same manner. Studied gases were selected for their interest in the semiconductor industry (water vapor, HF). The resulting interaction between the studied gases and the targeted substrates is continuously followed by the QCM, which allows not only to validate the mathematical models already proposed by the literature but also to fit the experimentally obtained data. This enables us not only to predict the behavior of the AMC at equilibrium (isotherms) and the transient state but also to provide sorption estimations at temperatures other than those specified in our experimental plan
16

Preparation of Copper-based catalysts for the synthesis of Silicon nanowires / Préparation de catalyseurs à base de cuivre pour la synthèse de nanofils de silicium

Roussey, Arthur 25 September 2012 (has links)
Les travaux dans cette thèse ont pour objectif la synthèse de catalyseurs (nanoparticules de cuivre) de taille contrôlée pour la synthèse de nanofils de silicium dans des conditions compatibles CMOS, c'est-à-dire en évitant l'utilisation de l'or comme catalyseur et pour des croissances basse température (<450°C). Les résultats obtenus ont permis de montrer que les techniques de chimie de surface classiquement utilisées pour la préparation de catalyseurs sur des supports 3D (silice, nitrure de titane…) sont directement applicables et transférables sur des supports 2D (wafer de silicium recouvert de films fins de SiO2, SiOx et TiN). Nous avons par exemple pu préparer des nanoparticules de cuivre de taille contrôlée (de 3 nm à 40 nm de diamètre moyen suivant les conditions expérimentales et supports). De plus, les mécanismes de formation des nanoparticules en fonction des propriétés de surface des matériaux étudiés ont été démontrés en combinant diverses techniques d'analyses de surface. La croissance de nanofils de silicium à partir de ces catalyseurs sur substrats 2D a également été réalisée avec succès dans des procédés à basse température. Il a notamment été montré l'existence d'un diamètre minimum critique à partir de laquelle la croissance basse température était possible / The work presented in this PhD thesis aimed at the preparation of copper nanoparticles of controllable size and their utilization as catalysts for the growth of silicon nanowires in a process compatible with standard CMOS technology and at low temperature (< 450°C). The growth of silicon nanowires by Chemical Vapor Deposition (CVD) via the catalytic decomposition of a silicon precursor on metallic nanoparticles at low temperature (Vapor Solid-Solid process) was demonstrated to be possible from an oxidized Cu thin film. However, this process does not allow the control over nanowires diameter, which is controlled by the diameter of the nanoparticle of catalyst. In this PhD is presented a fully bottom-up approach to prepare copper nanoparticles of controllable size directly on a surface without the help of external stabilizer by mean of surface organometallic chemistry. First, the preparation of copper nanoparticles is demonstrated on 3D substrates (silica and titanium nitride nanoparticles), along with the fine comprehension of the formation mechanism of the nanoparticles as a function of the surface properties. Then, this methodology is transferred to planar (2D) substrates typically used in microelectronics (silicon wafers). Surface structure is demonstrated to direct the Cu nanoparticles diameter between 3 to 40 nm. The similarities between the 2D and 3D substrates are discussed. Finally, the activity of the Copper nanoparticles in the growth of Silicon nanowire is presented and it is demonstrated that in our conditions a critical diameter may exist above which the growth occurs
17

Sestavení a testování zařízení pro výrobu ozonované vody a její aplikace na čištění křemíkových desek / Assemblage and testing of the device for water ozonizing and its application for silicon wafer cleaning

Ředina, Dalibor January 2017 (has links)
Deionised-ozonated water, so-called DIO3 appears to be an ideal alternative for usage in semiconductor industry. The utilisation of DIO3 for removal of photoresist from silicon wafers is faster, cheaper, and more environmental-friendly compared to classical technology based on mixture of sulphuric acid with hydrogen peroxide, so-called SPM. The diploma thesis deals firstly with research into ozone and ozonated water and their possible applications. Next sections describe two prototypes of generators for DIO3, that were assembled in CSVG a.s. Testing of parameters for generators on dissolved-ozone concentration is also a part of this thesis. Moreover, thesis involves tests, that were carrier out in ON Semiconductor in Rožnov pod Radhoštěm. These tests compare efficiency of cleaning by classical technology based on SPM and DIO3 approach.
18

Chain Conformation and Nano-Patterning of Polymer Brushes Prepared By Surface-Initiated Atom Transfer Radical Polymerization

Gao, Xiang 09 1900 (has links)
<p> Over the past decade, the development of surface-initiated living polymerization methods has brought a breakthrough to surface modification owing to their control ability. Surface-initiated atom transfer radical polymerization (si-ATRP), as the most popular one, has been widely employed to give novel polymer structures and functionalities to various surfaces for the purposes of tailoring surface properties, introducing new functions, or preparing so-called "smart surfaces", which can respond to external stimuli such as solvent type, pH, temperature, electric and magnetic fields etc. In this thesis, the mechanistic study of the si-ATRP was first carried out through modeling to gain good understanding of si-ATRP. Si-ATRP was then employed to prepare different types of polymer brushes to produce "smart surfaces". </p> <p> The kinetic model was developed using the method of moment. Combined with experimental data, a quantitative analysis was carried out for the si-ATRP mechanism. All information of grafted polymer chains, including active chain concentration, radical concentration, chain length, polydispersity, was illustrated. A new radical termination mechanism, termed as migration-termination, was proposed for si-ATRP. </p> <p> Si-ATRP was then employed to graft poly(oligo(ethylene glycol) methacrylate) (POEGMA) block poly(methyl methacrylate) (PMMA) brushes on silicon wafer surfaces. Simple solvent treatment gave nanoscale patterns via the phase segregation of POEGMA and PMMA segments. Various patterns including spherical aggregates, wormlike aggregates, stripe patterns, perforated layers and complete overlayers, were obtained by adjusting the upper block layer thickness. Furthermore, these nanopatterns had a unique stimuli-responsive property, i.e., switching between different morphologies reversibly after being treated with selective solvents. </p> <p> POEGMA-block-poly(2-(methacryloyloxy)ethyl trimethylammonium chloride) (PMETAC) brushes, having two hydrophilic segments, were synthesized by si-ATRP method. A variety of nanopatterns and their stimuli-responsive ability were observed. The adsorption behaviors of fibrinogen on these patterns were thoroughly studied by ellipsometry, water contact angel measurement, AFM and radio labelling method. </p> <p> A novel thermo-responsive copolymer, poly(2-(2-methoxyethoxy)ethyl methacrylate -co-oligo(ethylene glycol) methacrylate) (P(ME02MA-co-OEGMA)), was also grafted onto silicon wafers. Its thermo-responsive behavior and chain conformation in aqueous solution were studied by neutron reflectometry (NR). Both extended and collapsed brushes exhibited good protein adsorption resistance. </p> / Thesis / Doctor of Philosophy (PhD)
19

Modification électrochimique de l'interface liquide - liquide avec de la silice mésoporeuse / Electrochemical modification of the liquid - liquid interface with mesoporous silica

Poltorak, Lukasz 25 September 2015 (has links)
Ce travail combine l'électrochimie à l'interface liquide - liquide avec le procédé sol - gel pour la modification interfaciale avec de la silice mésoporeuse. Dans la première partie de ce travail, l’interface liquide – liquide macroscopique a été utilisée pour séparer la solution aqueuse de l'espèce de précurseur de silice hydrolysées (tétraéthoxysilane (TEOS)) de l'agent tensioactif cationique (cethyltrimethylammonium (CTA+) qui a agi comme un template et a été dissous dans le dichloroéthane. Le dépôt de matériau de silice a été déclenchée par le transfert du CTA+ à partir de la phase organique vers la phase aqueuse. CTA+ qui a transféré à la phase aqueuse a catalysé la réaction de condensation de la silice sur l’interface liquide – liquide. Le dépôt de silice à des interfaces liquide – liquide miniaturisées était la deuxième partie de ce travail. Les dépôts stables sur le côté de l'interface ont été synthétisés in situ par voie électrochimique. La stabilité mécanique des dépôts de silice permis un traitement thermique de la silice. Basé sur les techniques d’imagerie (par exemple SEM) il a été constaté que les dépôts forment des hémisphères pour des temps plus long. La réaction interfaciale a également été suivie in situ par spectroscopie Raman confocale. Caractéristiques moléculaires de l'interface ont été modifiées de manière spectaculaire une fois les espèces CTA+ ont été transférés à la phase aqueuse. Les interfaces liquide – liquide miniaturisés et modifiés ont également été évaluée avec le transfert voltampérométrique / This work combines the electrochemistry at the interface between two immiscible electrolyte solutions (ITIES) with the Sol – Gel process of silica leading to an interfacial modification with mesoporous silica using soft template. In the first part of this work the macroscopic liquid – liquid interface was employed to separate the aqueous solution of the hydrolyzed silica precursor species (tetraethoxysilane (TEOS)) from the cationic surfactant (cethyltrimethylammonium (CTA+)) dissolved in the dichloroethane. The silica material deposition was controlled by the electrochemical CTA+ transfer from the organic to the aqueous phase. Template transferred to the aqueous phase catalyzed the condensation reaction and self-assembly resulting in silica deposition at the interface. Silica deposition at the miniaturized ITIES (membranes supporting array of micrometer in diameter pores were used in this regard) was the second part of this work. Silica interfacial synthesis performed in situ resulted in stable deposits growing on the aqueous side of the interface. Mechanical stability of the supported silica deposits allowed further processing – silica material was cured. Based on imaginary techniques (e.g. SEM) it was found that deposits forms hemispheres for longer experimental time scales. Interfacial reaction was also followed with in situ confocal Raman spectroscopy. Molecular characteristics of the interface were changed dramatically once CTA+ species were transferred to the aqueous phase. Array of microITIES modified with silica was also assessed by ion transfer voltammetry

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