abstract: As crystalline silicon solar cells continue to get thinner, the recombination of carriers at the surfaces of the cell plays an ever-important role in controlling the cell efficiency. One tool to minimize surface recombination is field effect passivation from the charges present in the thin films applied on the cell surfaces. The focus of this work is to understand the properties of charges present in the SiNx films and then to develop a mechanism to manipulate the polarity of charges to either negative or positive based on the end-application. Specific silicon-nitrogen dangling bonds (·Si-N), known as K center defects, are the primary charge trapping defects present in the SiNx films. A custom built corona charging tool was used to externally inject positive or negative charges in the SiNx film. Detailed Capacitance-Voltage (C-V) measurements taken on corona charged SiNx samples confirmed the presence of a net positive or negative charge density, as high as +/- 8 x 1012 cm-2, present in the SiNx film. High-energy (~ 4.9 eV) UV radiation was used to control and neutralize the charges in the SiNx films. Electron-Spin-Resonance (ESR) technique was used to detect and quantify the density of neutral K0 defects that are paramagnetically active. The density of the neutral K0 defects increased after UV treatment and decreased after high temperature annealing and charging treatments. Etch-back C-V measurements on SiNx films showed that the K centers are spread throughout the bulk of the SiNx film and not just near the SiNx-Si interface. It was also shown that the negative injected charges in the SiNx film were stable and present even after 1 year under indoor room-temperature conditions. Lastly, a stack of SiO2/SiNx dielectric layers applicable to standard commercial solar cells was developed using a low temperature (< 400 °C) PECVD process. Excellent surface passivation on FZ and CZ Si substrates for both n- and p-type samples was achieved by manipulating and controlling the charge in SiNx films. / Dissertation/Thesis / Ph.D. Electrical Engineering 2013

This master’s thesis deals with light induced degradation problems. In theoretical section it describes essentials of PN junction function and next light induced degradation mechanisms of solar cells and its symptoms at solar cell operation. In practical section it deals with set of measurements of solar cells since production of the silicon wafer to the complete solar cell. Selected cells are submitted to light induced degradation, measured dependencies are then evaluated. Degraded samples are subsequently recovered by two ways at high temperature treatment. The issues are evaluated.

Au cours de cette thèse, j’ai étudié la possibilité et les avantages d’utiliser des contacts nanométriques au-dessous de 1 µm. Des simulations analytiques et numériques ont montré que ces contacts nanométriques sont avantageux pour les cellules en silicium cristallin comme ils peuvent entrainer une résistance ohmique négligeable. Mon travail expérimental était focalisé sur le développement de ces contacts en utilisant des nanoparticules de polystyrène comme un masque. En utilisant la technique de floating transfert pour déposer les nanosphères, une monocouche dense de nanoparticules s’est formée. Cela nécessite une gravure par plasma de O2 afin de réduire la zone de couverture des NPs. Cette gravure était faite et étudiée en utilisant la technique de plasmas matriciels distribués à résonance cyclotronique électronique (MD-ECR). Une variété de techniques de créations de trous nanométriques était développée et testée dans des structures de couches minces et silicium cristallin. Des trous nanométriques étaient formés dans la couche de passivation, de SiO2 thermique, du silicium cristallin pour former des contacts nanométriques dopés. Un dopage local de bore était fait, à travers ces trous nanométriques par diffusion thermique et implantation ionique. En faisant la diffusion, le dopage local était observé par CP-AFM en mesurant des courbes de courant-tension à l’intérieur et à l’extérieur des zones dopées et en détectant des cellules solaires nanométriques. Par contre le processus de dopage local par implantation ionique a besoin d’être améliorer afin d’obtenir un résultat similaire à celui de diffusion. / The use of point contacts has made the Passivated Emitter and Rear Cell design one of the most efficient monocrystalline-silicon photovoltaic cell designs in production. The main feature of such solar cell is that the rear surface is partially contacted by periodic openings in a dielectric film that provides surface passivation. However, a trade-off between ohmic losses and surface recombination is found. Due to the technology used to locally open the contacts in the passivation layer, the distance between neighboring contacts is on the order of hundreds of microns, introducing a significant series resistance.In this work, I explore the possibility and potential advantages of using nanoscale contact openings with a pitch between 300 nm to 10 µm. Analytic and numerical simulations done during the course of this thesis have shown that such nanoscale contacts would result in negligible ohmic losses while still keeping the surface recombination velocity Seff,rear at an acceptable level, as long as the recombination velocity at the contact (Scont) is in the range from 103-105 cm/s. To achieve such contacts in a potentially cost-reducing way, my experimental work has focused on the use of polystyrene nanospheres as a sacrificial mask.The thesis is therefore divided into three sections. The first section develops and explores processes to enable the formation of such contacts using various nanosphere dispersion, thin-film deposition, and layer etching processes. The second section describes a test device using a thin-film amorphous silicon NIP diode to explore the electrical properties of the point contacts. Finally, the third section considers the application of such point contacts on crystalline silicon by exploring localized doping through the nanoholes formed.In the first section, I have explored using polystyrene nanoparticles (NPs) as a patterning mask. The first two tested NPs deposition techniques (spray-coating, spin-coating) give poorly controlled distributions of nanospheres on the surface, but with very low values of coverage. The third tested NPs deposition technique (floating transfer technique) provided a closely-packed monolayer of NPs on the surface; this process was more repeatable but necessitated an additional O2 plasma step to reduce the coverage area of the sphere. This was performed using matrix distributed electron cyclotron resonance (MD-ECR) in order to etch the NPs by performing a detailed study.The NPs have been used in two ways; by using them as a direct deposition mask or by depositing a secondary etching mask layer on top of them.In the second section of this thesis, I have tested the nanoholes as electrical point-contacts in thin-film a-Si:H devices. For low-diffusion length technologies such as thin-film silicon, the distance between contacts must be in the order of few hundred nanometers. Using spin coated 100 nm NPs of polystyrene as a sacrificial deposition mask, I could form randomly spaced contacts with an average spacing of a few hundred nanometers. A set of NIP a-Si:H solar cells, using RF-PECVD, have been deposited on the back reflector substrates formed with metallic layers covered with dielectrics having nanoholes. Their electrical characteristics were compared to the same cells done with and without a complete dielectric layer. These structures allowed me to verify that good electrical contact through the nanoholes was possible, but no enhanced performance was observed.In the third section of this thesis, I investigate the use of such nanoholes in crystalline silicon technology by the formation of passivated contacts through the nanoholes. Boron doping by both thermal diffusion and ion implantation techniques were investigated. A thermally grown oxide layer with holes was used as the doping barrier. These samples were characterized, after removing the oxide layer, by secondary electron microscopy (SEM) and conductive probe atomic force microscopy (CP-AFM).

The global energy market is continuously changing due to changes in demand and fuel availability. Amongst the technologies considered as capable of fulfilling these future energy requirements, Photovoltaics (PV) are one of the most promising. Currently the majority of the PV market is fulfilled by crystalline Silicon (c-Si) solar cell technology, the so called 1st generation PV. Although c-Si technology is well established there is still a lot to be done to fully exploit its potential. The cost of the devices, and their efficiencies, must be improved to allow PV to become the energy source of the future. The surface of the c-Si device is one of the most important parts of the solar cell as the surface defines the electrical and the optical properties of the device. The surface is responsible for light reflection and charge carrier recombination. The standard surface finish is a thin film layer of silicon nitride deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD). In this thesis an alternative technique of coating preparation is presented. The HiTUS sputtering tool, utilising a remote plasma source, was used to deposit the surface coating. The remote plasma source is unique for solar cells application. Sputtering is a versatile process allowing growth of different films by simply changing the target and/or the deposition atmosphere. Apart from silicon nitride, alternative materials to it were also investigated including: aluminium nitride (this was the first use of the material in solar cells) silicon carbide, and silicon carbonitride. All the materials were successfully used to prepare solar cells apart from the silicon carbide, which was not used due to too high a refractive index. Screen printed solar cells with a silicon nitride coating deposited in HiTUS were prepared with an efficiency of 15.14%. The coating was deposited without the use of silane, a hazardous precursor used in the PECVD process, and without substrate heating. The elimination of both offers potential processing advantages. By applying substrate heating it was found possible to improve the surface passivation and thus improve the spectral response of the solar cell for short wavelengths. These results show that HiTUS can deposit good quality ARC for silicon solar cells. It offers optical improvement of the ARC s properties, compared to an industrial standard, by using the DL-ARC high/low refractive index coating. This coating, unlike the silicon nitride silica stack, is applicable to encapsulated cells. The surface passivation levels obtained allowed a good blue current response.

Le dopage du silicium par implantation ionique pour le photovoltaïque est une application relativement récente dont l'essor se heurte encore aujourd'hui aux coûts élevés d'intégration au sein des lignes de fabrication des cellules solaires. L'implantation ionique par immersion plasma promet de répondre aux futures exigences du secteur en termes de coûts et de productivité.Ces travaux de thèse ont permis le développement de procédés d'implantation ionique par immersion plasma de l'équipement PULSION®, conçu par IBS, dédiés à la fabrication de cellules solaires en silicium monocristallin. Dans un premier temps, nous montrons qu'il permet la réalisation de profils de dopage d'émetteur de type n variés, répondant aux exigences des cellules solaires à haut rendement. Les émetteurs fabriqués sont caractérisés de manière chimique, physique et électrique afin de démontrer leur excellente qualité. L'intégration de l'implantation ionique des émetteurs au sein d'un processus de fabrication industriel et peu coûteux, développé par l'INES sur silicium monocristallin de type p, permet d'atteindre des rendements de conversion supérieurs à 19,3%, soit un gain de plus de 0,5% par rapport aux rendements obtenus avec des cellules usuelles à émetteurs dopés par diffusion POCl3.La réalisation d'émetteurs de type p est également étudiée dans ce mémoire afin de préparer la transition technologique vers les cellules solaires sur silicium monocristallin de type n. Confirmant les atouts et le potentiel de la technologie d'implantation ionique par immersion plasma, les travaux menés au cours de cette thèse débouchent sur la conception d'un prototype industriel PULSION® dédié au photovoltaïque. / Ion implantation is a major process technology for manufacturing integrated circuits. However, silicon doping by ion implantation for photovoltaics is a relatively recent application, and its growth still faces high costs of integration into solar cell production lines. Plasma-immersion ion implantation (PIII) promises to meet the future industry requirements in terms of costs and productivity.This thesis work has led to the development of processes dedicated to silicon-based solar cell manufacturing using the plasma-immersion ion implanter – PULSION® – designed by IBS. First, we show that PIII enables the realization of various doping profiles for phosphorus-doped emitters which fit the requirements of high-efficiency solar cells. Emitters thus fabricated are chemically, physically and electrically characterized to demonstrate their excellent quality. Those emitters, implanted through plasma immersion and integrated into a low cost solar cell manufacturing line from INES on monocrystalline silicon, enable to raise the conversion efficiency, obtained with conventional POCl3-diffused solar cells, by more than 0.5% absolute to reach efficiencies above 19.3%.Fabrication of p-type boron implanted emitters is also studied in order to improve conversion efficiencies of p-type silicon based solar cells, but also in order to anticipate the technological shift from p-type to n-type silicon material. Thanks to this thesis work, the strength and potential of PIII for photovoltaic applications have been proven and this has convinced IBS to design a PULSION® equipment dedicated to solar cell manufacturing.

Cette thèse est axée sur la fabrication et l’optimisation d’une nouvelle structure permettant théoriquement d’améliorer les performances des cellules à base de silicium cristallin. Cette nouvelle architecture de cellule utilise la technologie des hétérojonctions de silicium a-Si:H/ c-Si (Si-HJ) appliquée sur des structures à contacts interdigités en face arrière (IBC). Le potentiel de rendement des cellules IBC Si-HJ est supérieur à 25%, mais leur fabrication nécessite une localisation des couches de a-Si:H de dopage différent et de leurs métallisations. L’intégration de ces étapes dans un procédé simplifié utilisant des techniques industrielles (PECVD, pulvérisation, sérigraphie et laser) a été étudiée. De plus, une structure obtenue sans séparation entre le BSF et l’émetteur est présentée, permettant de réduire le nombre d’étapes de fabrication. Les avantages ainsi que les limites liés à cette architecture simplifiée ont été illustrés du point de vue expérimental et par simulation. Dans le cadre de ces travaux, le rendement maximum atteint sur les dispositifs IBC Si-HJ simplifiés de 25cm² est de 19% (substrats de type n), ce qui constitue le 3e meilleur résultat au niveau mondial. Les performances des cellules restent encore limitées par l’absorption des couches de a-Si:H utilisées pour la passivation de la face avant, et par la conductivité des couches dopées en face arrière. De nombreuses pistes d’amélioration sont explorées dans cette étude. Un procédé de métallisation innovant a également été élaboré pour le passage sur des substrats de grande taille (150cm²). Il permet de limiter les pertes résistives tout en offrant de la flexibilité au niveau de la géométrie des contacts. La mise en module de cellules ayant ce design de métallisation a ensuite été étudiée, et un module de 4 cellules IBC Si-HJ a pu être fabriqué. / This thesis studies the fabrication and the optimization of a new structure to enhance the efficiency of crystalline silicon based solar cells. This new cell design uses a-Si:H/c-Si heterojunction (Si-HJ) technology applied on interdigitated back contact structures (IBC). With IBC Si-HJ solar cells, the efficiency potential is theoretically higher than 25%. Their fabrication requires to pattern doped a-Si:H and the associated metallization on the same side. The implementation of those process steps has been carefully studied. All processes used in this study are potentially industrial (PECVD, sputtering, screen-printing, and laser) and the obtained structure without buffer layer between the BSF and the emitter allows to reduce fabrication steps. Issues linked to this design have been investigated. Within the frame of this work, the maximum efficiency reached on reduced size devices (25cm²) with n-type substrate and is 19% which is the 3rd best result worldwide. The cell performances are still limited by the absorption of front surface passivating layer (a-Si:H) and by the low doped layer conductivity. Several optimization ways are explored in this study. An innovative metallization process is then elaborated to allow large area solar cell fabrication while limiting resistive losses and offering more flexibility on metallized pattern. The interconnection and the encapsulation of cells with this metallization design have been illustrated and a module with 4 cells has been fabricated.

[Some symbols cannot be rendered in the following metadata – please see the PDF file for an accurate version of the Abstract] ¶ Recombination within the bulk and at the surfaces of crystalline silicon has been investigated in this thesis. Special attention has been paid to the surface passivation achievable with plasma enhanced chemical vapour deposited (PECVD) silicon nitride (SiN) films due to their potential for widespread use in silicon solar cells. The passivation obtained with thermally grown silicon oxide (SiO2) layers has also been extensively investigated for comparison. ¶ Injection-level dependent lifetime measurements have been used throughout this thesis to quantify the different recombination rates in silicon. New techniques for interpreting the effective lifetime in terms of device characteristics have been introduced, based on the physical concept of a net photogeneration rate. The converse relationships for determining the effective lifetime from measurements of the open-circuit voltage (Voc) under arbitrary illumination have also been introduced, thus establishing the equivalency of the photoconductance and voltage techniques, both quasi-static and transient, by allowing similar possibilities for all of them. ¶ The rate of intrinsic recombination in silicon is of fundamental importance. It has been investigated as a function of injection level for both n-type and p-type silicon, for dopant densities up to ~5x1016cm-3. Record high effective lifetimes, up to 32ms for high resistivity silicon, have been measured. Importantly, the wafers where commercially sourced and had undergone significant high temperature processing. A new, general parameterisation has been proposed for the rate of band-to-band Auger recombination in crystalline silicon, which accurately fits the experimental lifetime data for arbitrary injection level and arbitrary dopant density. The limiting efficiency of crystalline silicon solar cells has been re-evaluated using this new parameterisation, with the effects of photon recycling included. ¶ Surface recombination processes in silicon solar cells are becoming progressively more important as industry drives towards thinner substrates and higher cell efficiencies. The surface recombination properties of well-passivating SiN films on p-type and n-type silicon have been comprehensively studied, with Seff values as low as 1cm/s being unambiguously determined. The well-passivating SiN films optimised in this thesis are unique in that they are stoichiometric in composition, rather than being silicon rich, a property which is attributed to the use of dilute silane as a process gas. A simple physical model, based on recombination at the Si/SiN interface being determined by a high fixed charge density within the SiN film (even under illumination), has been proposed to explain the injection-level dependent Seff for a variety of differently doped wafers. The passivation obtained with the optimised SiN films has been compared to that obtained with high temperature thermal oxides (FGA and alnealed) and the limits imposed by surface recombination on the efficiency of SiN passivated solar cells investigated. It is shown that the optimised SiN films show little absorption of UV photons from the solar spectrum and can be easily patterned by photolithography and wet chemical etching. ¶ The recombination properties of n+ and p+ emitters passivated with optimised SiN films and thermal SiO2 have been extensively studied over a large range of emitter sheet resistances. Both planar and random pyramid textured surfaces were studied for n+ emitters, where the optimised SiN films were again found to be stoichiometric in composition. The optimised SiN films provided good passivation of the heavily doped n+-Si/SiN interface, with the surface recombination velocity increasing from 1400cm/s to 25000cm/s as the surface concentration of electrically active phosphorus atoms increased from 7.5x1018cm-3 to 1.8x1020cm-3. The optimised SiN films also provided reasonable passivation of industrial n+ emitters formed in a belt-line furnace. It was found that the surface recombination properties of SiN passivated p+ emitters was poor and was worst for sheet resistances of ~150./ . The hypothesis that recombination at the Si/SiN interface is determined by a high fixed charge density within the SiN films was extended to explain this dependence on sheet resistance. The efficiency potential of SiN passivated n+p cells has been investigated, with a sheet resistance of 80-100./ and a base resistivity of 1-2.cm found to be optimal. Open-circuit voltages of 670-680mV and efficiencies up to ~20% and ~23% appear possible for SiN passivated planar and textured cells respectively. The recombination properties measured for emitters passivated with SiO2, both n+ and p+, were consistent with other studies and found to be superior to those obtained with SiN passivation. ¶ Stoichiometric SiN films were used to passivate the front and rear surfaces of various solar cell structures. Simplified PERC cells fabricated on 0.3.cm p-type silicon, with either a planar or random pyramid textured front surface, produced high Voc’s of 665-670mV and conversion efficiencies up to 19.7%, which are amongst the highest obtained for SiN passivated solar cells. Bifacial solar cells fabricated on planar, high resistivity n-type substrates (20.cm) demonstrated Voc’s up to 675mV, the highest ever reported for an all-SiN passivated cell, and excellent bifaciality factors. Planar PERC cells fabricated on gettered 0.2.cm multicrystalline silicon have also demonstrated very high Voc’s of 655-659mV and conversion efficiencies up to 17.3% using a single layer anti-reflection coating. Short-wavelength internal quantum efficiency measurements confirmed the excellent passivation achieved with the optimised stoichiometric SiN films on n+ emitters, while long-wavelength measurements show that there is a loss of short-circuit current at the rear surface of SiN passivated p-type cells. The latter loss is attributed to parasitic shunting, which arises from an inversion layer at the rear surface due to the high fixed charge (positive) density in the SiN layers. It has been demonstrated that that a simple way to reduce the impact of the parasitic shunt is to etch away some of the silicon from the rear contact dots. An alternative is to have locally diffused p+ regions under the rear contacts, and a novel method to form a rear structure consisting of a local Al-BSF with SiN passivation elsewhere, without using photolithography, has been demonstrated.

In this thesis study, fabrication and doping of silicon thin films prepared by electron beam evaporation equipped with effusion cells for solar cell applications have been investigated. Thin film amorphous Si (a-Si) layers have been fabricated by the electron beam evaporator and simultaneously doped with boron (B) and phosphorous (P) using effusion cells. Samples were prepared on glass substrates for the future solar cell operations. Following the deposition of a-Si thin film, crystallization of the films has been carried out. Solid Phase Crystallization (SPC) and Metal Induced Crystallization (MIC) have been employed to obtain thin film crystalline Si. Crystallization was performed in a conventional tube furnaces and Rapid Thermal annealing systems (RTA) as a function of process parameters such as annealing temperature and duration. Produced films have been characterized using chemical and structural characterization techniques such as Raman Spectroscopy, X-Ray Diffractometer and Secondary Ion Mass Spectrometer (SIMS). The electrical properties of the films have been studied using Hall Effect and I-V measurements as a function of doping. We have demonstrated successful crystallization of a-Si by SPC at temperatures above 600 &deg / C. The crystallization occurred at lower temperatures in the case of MIC. For doping, P was evaporated from the effusion cell at a temperature between 600 &deg / C and 800 &deg / C. For B, the evaporation temperature was 1700 &deg / C and 1900 &deg / C. The thickness and the band gap of the Si films were determined by ellipsometry method and the results were compared for different evaporation temperatures. The effect of doping was monitored by the I-V and Hall Effect measurements. We have seen that the doping was accomplished in most of the cases. For the samples annealed at relatively high temperatures, the measured doping type was inconsistent with the expected results. This was attributed to the contamination from the glass substrate. To understand the origin of this contamination, we analyzed the chemical structure of the film and glass by X-ray Fluorescence (XRF) and seen that the glass is the main source of contamination. In order to prevent this contamination we have suggested covering the glass substrate with Si3N4 (Silicon Nitride) which act as a good diffusion barrier for impurities.

Submitted by Evaldo Chagas Gouvêa null (gouvea.evaldo@gmail.com) on 2017-06-24T18:23:39Z No. of bitstreams: 1 Dissertação (versão FINAL 24-06-17).pdf: 2860581 bytes, checksum: 291ca83eac21bea9374f8dc5c9b080ed (MD5) / Approved for entry into archive by Luiz Galeffi (luizgaleffi@gmail.com) on 2017-06-28T16:53:32Z (GMT) No. of bitstreams: 1 gouvea_ec_me_guara.pdf: 2860581 bytes, checksum: 291ca83eac21bea9374f8dc5c9b080ed (MD5) / Made available in DSpace on 2017-06-28T16:53:32Z (GMT). No. of bitstreams: 1 gouvea_ec_me_guara.pdf: 2860581 bytes, checksum: 291ca83eac21bea9374f8dc5c9b080ed (MD5) Previous issue date: 2017-04-22 / Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) / Uma das alternativas à utilização de combustíveis fósseis é a energia solar, obtida pelo uso de painéis fotovoltaicos. A existência de diferenças diárias, sazonais e regionais na distribuição espectral da luz do sol pode produzir variações na capacidade de produção de energia dos painéis. O objetivo deste trabalho é verificar como a geração de energia de células fotovoltaicas varia em função dos diferentes comprimentos de onda do espectro da luz solar, quando as células estão submetidas a condições reais de operação. Este trabalho possui caráter experimental. Dois painéis fotovoltaicos policristalinos idênticos foram montados lado a lado. Oito diferentes filtros de cor, com curvas conhecidas de distribuição espectral, foram instalados sobre um dos painéis e foi registrada a quantidade de energia gerada por cada painel ao longo do dia. Cada filtro permite apenas a passagem de uma determinada faixa de comprimentos de onda da luz solar. Foi calculada a eficiência relativa de cada filtro, dada pela relação entre a quantidade de energia gerada pelo painel com filtro e a gerada pelo painel sem filtro, de referência. Os resultados indicam que os painéis produzem mais energia na faixa do vermelho, com eficiência relativa de 23,83%, sendo, portanto, mais sensíveis à radiação nesta faixa de comprimentos de onda. Por outro lado, ocorre uma redução da resposta do painel na faixa do verde e azul, apresentando eficiências de 19,15% e 21,58% respectivamente. Isso mostra que painéis fotovoltaicos não respondem de maneira uniforme à luz solar. A radiação infravermelha, além de produzir um aumento de temperatura, exerce um importante papel na produção total de energia, com eficiência de 13,56%. Conclui-se que painéis de silício cristalino não respondem de maneira uniforme à luz solar. Os painéis produzem energia nas faixas não-visíveis do espectro; sendo o infravermelho um importante componente do espectro. As respostas espectrais em condições reais de operação apresentam diferenças significativas em relação àquelas obtidas nas condições padrão de ensaio. / Solar energy is an alternative to fossil fuels. It can be obtained through the use of photovoltaic panels. There are daily, seasonal and regional differences in the spectral energy distribution of sunlight that can result in variations in the energy production capacity of the panels. The objective of this study is the verification of the photovoltaic cell’s response to different wavelengths of the sunlight’s spectrum, under real operating conditions. This is an experimental study. Two identical polycrystalline photovoltaic modules were mounted side-by-side. Eight different color filters, each one with a specific spectral distribution curve, were installed above one of the panels and the daily generated energy of each panel was registered. Each color filter allows just a specific wavelength range of solar spectrum to pass through it. The relative efficiency of each filter was calculated; it is given by the relation between the energy generated by the solar panel with filter and the solar panel without filter. The results indicate that the panels produce more power in the red range (with a relative efficiency of 23.83%) and therefore they are more sensitive to radiation at this wavelength range. Also, the panel’s response is reduced in the color ranges of green and blue, with efficiency of 19.15% and 21.58%, respectively. This shows that photovoltaic panels do not respond uniformly to sunlight. Infrared radiation, which leads to an increased temperature, plays an important role in the total energy production. The relative efficiency of infrared filter is 13.56%. It can be concluded that crystalline silicon photovoltaic modules do not respond uniformly to sunlight. Photovoltaic panels are able to produce energy not only with visible light but also with non-visible wavelengths, being infrared an important component of solar spectrum. The spectral responses under real operating conditions are significantly different from the responses obtained at the standard test conditions. / CNPq: 134367/2015-4

abstract: Achieving high efficiency in solar cells requires optimal photovoltaics materials for light absorption and as with any electrical device—high-quality contacts. Essentially, the contacts separate the charge carriers—holes at one terminal and electrons at the other—extracting them to an external circuit. For this purpose, the development of passivating and carrier-selective contacts that enable low interface defect density and efficient carrier transport is critical for making high-efficiency solar cells. The recent record-efficiency n-type silicon cells with hydrogenated amorphous silicon (a-Si:H) contacts have demonstrated the usefulness of passivating and carrier-selective contacts. However, the use of a-Si:H contacts should not be limited in just n-type silicon cells. In the present work, a-Si:H contacts for crystalline silicon and cadmium telluride (CdTe) solar cells are developed. First, hydrogen-plasma-processsed a-Si:H contacts are used in n-type Czochralski silicon cell fabrication. Hydrogen plasma treatment is used to increase the Si-H bond density of a-Si:H films and decrease the dangling bond density at the interface, which leads to better interface passivation and device performance, and wider temperature-processing window of n-type silicon cells under full spectrum (300–1200 nm) illumination. In addition, thickness-varied a-Si:H contacts are studied for n-type silicon cells under the infrared spectrum (700–1200 nm) illumination, which are prepared for silicon-based tandem applications. Second, the a-Si:H contacts are applied to commercial-grade p-type silicon cells, which have much lower bulk carrier lifetimes than the n-type silicon cells. The approach is using gettering and bulk hydrogenation to improve the p-type silicon bulk quality, and then applying a-Si:H contacts to enable excellent surface passivation and carrier transport. This leads to an open-circuit voltage of 707 mV in p-type Czochralski silicon cells, and of 702 mV, the world-record open-circuit voltage in p-type multi-crystalline silicon cells. Finally, CdTe cells with p-type a-Si:H hole-selective contacts are studied. As a proof of concept, p-type a-Si:H contacts enable achieving the highest reported open-circuit voltages (1.1 V) in mono-crystalline CdTe devices. A comparative study of applying p-type a-Si:H contacts in poly-crystalline CdTe solar cells is performed, resulting in absolute voltage gain of 53 mV over using the standard tellurium contacts. / Dissertation/Thesis / Doctoral Dissertation Electrical Engineering 2018