Yeung Chun Fai = 厚度和眞空熱處理對單晶 La0.67Ca0.33MnO3 薄膜特性之影響 / 楊進輝. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2000. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / by Yeung Chun Fai = Hou du he zhen kong re chu li dui dan jing La0.67Ca0.33MnO3 bo mo te xing zhi ying xiang / Yang Jinhui. / Acknowledgements --- p.i / Abstract --- p.ii / 論文摘要 --- p.iv / Table of contents --- p.v / List of Figures --- p.viii / List of Tables --- p.xiii / Chapter Chapter I --- Introduction / Chapter 1.1 --- Development of magnetoresistance materials --- p.1-1 / Chapter 1.1.1 --- Magnetoresistance (MR) --- p.1-1 / Chapter 1.1.2 --- Anisotropy magnetoresistance (AMR) --- p.1-1 / Chapter 1.1.3 --- Giant magnetoresistance (GMR) --- p.1-2 / Chapter 1.1.4 --- Colossal magnetoresistance (CMR) in rare-earth manganites --- p.1-3 / Chapter 1.1.5 --- Possible origin of CMR in rare-earth manganites --- p.1-4 / Chapter 1.1.5.1 --- Double exchange mechanism --- p.1-4 / Chapter 1.1.5.2 --- Jahn-teller effect --- p.1-6 / Chapter 1.1.5.3 --- Other mechanisms --- p.1-7 / Chapter 1.1.6 --- Possible origins of CMR in Thallium manganite pyrochlores (TI2Mn207) --- p.1-7 / Chapter 1.2 --- New developments in manganite materials --- p.1-8 / Chapter 1.3 --- Our approach --- p.1-8 / Chapter 1.3.1 --- Why choose La0 .67Ca0.33Mn03 material? --- p.1-8 / Chapter 1.3.2 --- The role of oxygen content in manganite materials --- p.1-9 / Chapter 1.4 --- The scope of this thesis work --- p.1-11 / References --- p.1-12 / Chapter Chapter II --- Instrumentation / Chapter 2.1 --- Thin film deposition --- p.2-1 / Chapter 2.1.1 --- Introduction --- p.2-1 / Chapter 2.1.2 --- Facing-target sputtering (FTS) --- p.2-3 / Chapter 2.1.3 --- Deposition profile calculation for sputtering with FTS --- p.2-4 / Chapter 2.1.4 --- Vacuum system --- p.2-7 / Chapter 2.2 --- Characterization --- p.2-8 / Chapter 2.2.1 --- Profilometer --- p.2-8 / Chapter 2.2.2 --- Atomic force microscopy (AFM) --- p.2-8 / Chapter 2.2.3 --- X-ray diffraction (XRD) --- p.2-8 / Chapter 2.2.4 --- Resistance and magnetoresistance measurement --- p.2-10 / Chapter 2.2.5 --- Hall effect measurement --- p.2-11 / References --- p.2-13 / Chapter Chapter III --- Epitaxial growth of La0.67Ca0.33 Mn03 thin films / Chapter 3.1 --- Introduction --- p.3-1 / Chapter 3.2 --- Fabrication and characteristics of LCMO target --- p.3-1 / Chapter 3.3 --- Substrate materials --- p.3-5 / Chapter 3.4 --- Deposition --- p.3-10 / Chapter 3.4.1 --- Sample preparation --- p.3-10 / Chapter 3.4.2 --- Substrate temperature --- p.3-10 / Chapter 3.4.3 --- Deposition process --- p.3-17 / Chapter 3.5 --- Post-annealing effect --- p.3-18 / Chapter 3.6 --- Film composition analysis --- p.3-22 / Chapter 3.7 --- Epitaxial growth examination --- p.3-22 / References --- p.3-27 / Chapter Chapter IV --- Thickness effect in single-crystal LCMO thin films grown on NGO and STO / Chapter 4.1 --- Motivation --- p.4-1 / Chapter 4.2 --- Resistance measurement --- p.4-2 / Chapter 4.3 --- Magnetoresistance (MR) --- p.4-8 / Chapter 4.4 --- Crystal structure --- p.4-12 / Chapter 4.5 --- Surface morphology --- p.4-16 / Chapter 4.6 --- Hall effect measurement --- p.4-19 / Chapter 4.6.1 --- Basic principle --- p.4-19 / Chapter 4.6.2 --- Experiment --- p.4-20 / Chapter 4.6.3 --- Carrier concentration & mobility --- p.4-20 / Chapter 4.7 --- Discussions --- p.4-25 / References --- p.4-27 / Chapter Chapter V --- Strain dependent vacuum annealing effectin single-crystal La0.67Ga0.33MnO3 thin films / Chapter 5.1 --- Motivation --- p.5-1 / Chapter 5.2 --- Sample description --- p.5-1 / Chapter 5.3 --- Vacuum annealing process --- p.5-2 / Chapter 5.4 --- Crystal structure --- p.5-2 / Chapter 5.5 --- Resistance measurement --- p.5-6 / Chapter 5.6 --- Discussions --- p.5-8 / Chapter 5.6.1 --- Lattice expansion --- p.5-8 / Chapter 5.6.2 --- Determination of oxygen content --- p.5-9 / References --- p.5-11 / Chapter Chapter VI --- Activation energy of small polaron in La0.67Ca0.33MnO3 thin films / Chapter 6.1 --- Motivation --- p.6-1 / Chapter 6.2 --- Basic theory --- p.6-1 / Chapter 6.2.1 --- Variable range hopping --- p.6-1 / Chapter 6.2.2 --- Semiconduction --- p.6-2 / Chapter 6.2.3 --- Nearest-neighbor hoping of small polarons --- p.6-2 / Chapter 6.3 --- Sample description --- p.6-3 / Chapter 6.4 --- Resistance measurement --- p.6-4 / Chapter 6.5 --- Activation energy --- p.6-4 / Chapter 6.6 --- Discussions --- p.6-5 / References --- p.6-12 / Chapter Chapter VII --- Conclusions --- p.7-1

Graduation date: 1995

Thesis (M. Phil.)--University of Hong Kong, 2006. / Title proper from title frame. Also available in printed format.

Typical power outputs of commercially available diode lasers are on the order of 5 milliwatts. This thesis discusses the growth, processing and fabrication of high power (lOO's of milliwatts) diode lasers. Devices were grown by Molecular Beam Epitaxy (MBE) and by Metal Organic Chemical Vapor Deposition (MOCVD). The MOCVD diode lasers demonstrated room temperature laser operation with peak output powers of 450 mW/facet pulsed mode. The MBE diode lasers demonstrated room temperature pulsed laser operation of 110 mW/facet. The dynamics of the quantum well structure were studied. The carrier concentration, threshold current density and coatings were modeled. It was demonstrated through transmission line analogies that, depending on the thickness of the high reflective coating, the result would be a high output power diode laser or a superluminescent device. The MBE device was coated with a high power coating resulting in a peak power of 450 mW. The MOCVD device was used to study the superluminescence resulting from specific coatings. / Graduation date: 1992

The thesis focuses on the study of asymmetric multiple quantum wells(AMQWs) grown by molecular beam epitaxy (MBE) in the Riber Compact 21T MBE system. We investigate AMQW structures in which the well width is varied but the material compositions of the wells and the barriers are kept constant. Also, we have investigated AMQWs with p-type modulation doping at the barrier region and the AMQWs of different well widths without changing the well compositions. The AMQW samples are obtained the emission spectra by using photoluminescence (PL), electroluminescence (EL), photo-current and photoreflectance (PR) in the experiments. Also, The AMQW samples (AMQ100-70-40 and AMQ-100-MD70-40) are fabricated into laser diodes to obtain the characteristics of device in this study. The threshold current density Jth of laser diode is measured about 2 kA/cm2.The internal quantum efficiency £bi and the absorption £\ of AMQ-100-70-40 are 34.7% and 9.47 cm-1 respectively. The internal quantum efficiency £bi and the absorption £\ of AMQ-100-MD70-40 are 22.2% and 10.56 cm-1 respectively. Moreover, we present the InGaAsP AMQW samples grown by MOCVD to compare with the InGaAs/InAlGaAs AMQW samples. The broad-band property is valuable for application of optical communication. It is highly desirable to have broadly tunable lasers and broad-band semiconductor optical amplifiers (SOAs) in the 1.3 or 1.55£gm to handle more number of channels increasing the volume of information traffic for future optical communication networks. The band-band light source is also desirable in medical science for the optical coherence tomography (OCT).

Both non-polar (10-10) (m-plane) and polar (0001) (c-plane) zinc oxide (ZnO) have a good lattice match with lithium aluminum (LiAlO2, LAO) (200) substrate, so it is difficult to control the epitaxial orientation. Therefore, this research is to explore how the growth parameters influence on the crystal orientation of ZnO film grown by plasma assisted molecular beam epitaxy. The experimental results show that m-plane ZnO can be grown with low zinc flux and low oxygen pressure. Increasing zinc flux and oxygen pressure will lead to increase in growth rate, and consequently, c-plane ZnO will nucleate on the substrate besides m-plane zinc oxide. The substrate temperature is one of the main factors that influence the choice of zinc oxide epitaxial orientation. High temperature will promote the m-plane zinc oxide nucleation, while low temperature will conduct to the c-plane zinc oxide nucleation. Under low zinc flux and low oxygen pressure, epitaxy of ZnO with different crystalline orientations can be achieved through changing the substrate temperature. The surface morphology and roughness of the substrate will affect the particle size and surface morphology of ZnO epilayers. When the substrate is smooth, the crystal size of the epitaxial film is large and the surface is flat with many rectangular stripes, taking on the platform-like morphology. If the substrate is rough with many scratches, the particle size becomes small and the surface is granular-like and rather rough. Furthermore, when the substrate is rough, it is difficult to control the different orientations of ZnO epitaxial films through changing the substrate temperature.

The main work of this thesis is to design the TE-polarized SOA structures for booster amplifier, and the polarization-independent SOA structures for preamplifier at receiver end. In the SOA structure, we add a lattice-matched ternary compound InGaAs as an extra quantum well in separate-confinement heterostructure (SCH) layer. The purpose is to result in the band-filling/shrinkage and lead to change the absorption coefficient. Therefore, the refractive index change will be increased, and the structure can work as a Mach-Zehnder interferometer under reverse bias. We also added an electron barrier InAlAs layer to reduce the carriers accumulation in the extra InGaAs QW. After the epitaxy of MOCVD, this designed structure was processed to be a ridge laser. From the measurements of ridge laser, the barrier InAlAs could not efficiently stop the carrier injection into the extra InGaAs QW. The other part of this thesis is to set up a digital signal apparatus to analyze the RHEED pattern on the screen of the chamber. We make a connection between CCD camera and PC utilizing the framegrabber in RHEED system, and develop the programs from LabVIEW and IMAQ to obtain the functions we need. Further, from the tests of grabing and analysis for RHEED pattern, the digital signal system on RHEED pattern has been successfully demonstrated.

The thesis consists of two aspects: (1) Research on regrowth by molecular beam epitaxy, and (2) Silicon monoxide coating. In part one, we used (NH4)2Sx to passivate the InAlGaAs/InP surface. From the X-ray photoelectron spectroscopy (XPS), the passivated surface shows a dramatic reduce of oxidation. A preparation chamber for the regrowth has been setup to proceed the sulfur passivation method. We can obtain a clean surface for regrowth after heating and putting samples in the high vacuum chamber. In the design of regrowth layers, we have found the best waveguide structure by regrowth. When the ridge width is 2.5 mm with etching depth 1.4 mm, a circular mode profile can be obtained by Fimmwave simulation. In the integration between devices, we have designed the best waveguide structure after regrowth by BeamProp 3D. The best design will make the propagation loss smaller than 0.21%. The second part is anti-reflection (AR) coating by silicon monoxide (SiO) deposition. The SiO refractive index of 1.8837 was obtained by transmission, and ellipsometer measurements. The corresponding AR coating thickness for InP substrate is 2057 &#x00C5;. In order to make AR coating on lasers of different effective index, we design the double-layer coating. For Beam Expander Semiconductor Optical Amplifier (BESOA), SiO2 / SiO and Si3NX / SiO double-layer coatings were compared with SiO single layer. The reflectance (R) was reduced 16.86 % and 25.12 %, respectively, and the R < 1% bandwidth extends 200 &#x00C5;.

Gamma-phase lithium aluminate (LiAlO2) single crystal is grown by Czochralski pulling method and a-plane LiAlO2(LAO) is chosen as the substrate for subsequent gallium nitride (GaN) epitaxial growth by plasma-assisted molecular beam epitaxy (PAMBE). The lattice mismatch between the nitride and the substrate is greatly reduced due to small lattice mismatch of~0.3% between [0001]GaN and [010]LAO and of~1.7% between [11-20]GaN and [001]LAO in the plane of the substrate LAO(100). Pure hexagonal [10-10]GaN is successfully grown directly on the LAO substrate without buffer layer. Crystal quality and properties are analyzed through a series of measurements, including reflection high-energy electron diffraction (RHEED), field-emission electron microscopy (FESEM), electron backscatter diffraction (EBSD), x-ray diffraction and cathodo luminescence (CL).

Abstract High quality epitaxial growth of undoped ZnSe, ZnSxSe1-x and ZnSe-ZnS strained quantum well structures were successfully grown on n-type (100)-oriented silicon substrates at 150 &#x00BA;C in a horizontal cold-wall quartz reactor by low-pressure metalorganic atomic layer epitaxy (MOALE) at a pressure of 30 Torr for the first time. Dimethylzinc [Zn(CH3)2, DMZn], hydrogen selenide (H2Se) and hydrogen sulfur (H2S) were used as the reactants. ALE is a suitable technique for the growth of ultra thin semiconductors because it provides accuracy monolayer control of the deposited film thickness, low growth temperature and uniform growth over a large area by its¡§ self-limiting mechanism ¡¨via supplying source materials in a flow pulse sequences alternatively over the substrate. Idea one monolayer per cycle was obtained in wide range of parameters such as substrate temperatures, mole flow rate and pulse duration of reactants. From X-ray diffraction pattern, (400)-oriental single crystal epilayers of ZnSe are evidenced. The surface morphologies of ZnSe in the ALE temperature region 150 - 200 ¢J, extensively smooth and mirror-like surface were obtained. PL spectra of ZnSe epilayer is dominated by the strong near-band-edge at 2.8 eV with FWHM of 36 meV. Schottky diodes were fabricated from the undoped ZnSe layer and the electrical properties were measured at room temperature. From the current-voltage (I-V) characteristics, a high reverse breakdown voltage (>40 V) and an excellent low cut-in voltage of 0.6 - 0.8 V were obtained. On the basis of the observed ZnSe/Si epitaxial film properties, the material is suitable for fabrication of ZnSe-based blue light emitting diodes and for application in direct-current thin-film electroluminescence. The lattice of the ZnSxSe1-x layer with a sulfur content around 93% was found to have the best match to the Si substrate, as confirmed by the good layer thickness, uniformity, surface morphology and narrow linewidth of the X-ray diffraction rocking curve with a minimal FWHM of about 0.16 degree. In addition, strong near-band-edge and weak deep-level emissions in the longer wavelength region dominate PL spectra of the ZnS0.93Se0.07 epilayer at 300K. With respect to Schottky diodes, Au/n-ZnS0.93Se0.07/Al, has a high breakdown voltage, over 40 V at 400 nA and a low cut-in voltage of 0.68 V. The highest Hall mobility of the ZnS0.93Se0.07 is 347 cm2/v-sec. These results indicate a good lattice-match of ZnS0.93Se0.07/Si as a result of low numbers of interface and epitaxial layer defects. The lower temperature of ZnSe-ZnS strained quantum well structures, 150 &#x00BA;C would be lowed enough to eliminate 3-D growth related to the lattice mismatch between ZnSe and ZnS. A good epitaxy and crystallinity was carried out by X-ray diffraction. The formation of the strained quantum well structure is evident from the periodic behavior of each fluctuation profile by SIMS. At least 25 periodic thickness of the ALE growth samples shows a strong blue emissions and nearly neglects the deep-level emission at room temperature. The phenomenon of quantum size effects and the ¡§ blue-shift ¡¨ was evidenced as the well width increases. The results of the PL measurements were found to correlate well with the theoretical one, parabolic well-strain mode. Schottky diodes were fabricated from the Au/ZnSe-ZnS SMQW/n-Si/Al, a high reverse breakdown voltage over 40 (at 20 &#x00B5;A) and an extremely low cut-in voltage of 80 - 120 mV were obtained. The I-V characteristics of the heterojunction are more suitable for the fabrication of the direct-current thin film electroluminescent (EL) device.