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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
221

Phase change memory : array development and sensing circuits using delta-sigma modulation /

Balasubramanian, Mahesh. January 2009 (has links)
Thesis (M.S.)--Boise State University, 2009. / Includes abstract. Includes bibliographical references (leaves 93-95).
222

Phase change memory array development and sensing circuits using delta-sigma modulation /

Balasubramanian, Mahesh. January 2009 (has links)
Thesis (M.S.)--Boise State University, 2009. / Title from t.p. of PDF file (viewed Mar. 12, 2010). Includes abstract. Includes bibliographical references (leaves 93-95).
223

A nano-scale double-gate flash memory /

Yuen, Kam Hung. January 2003 (has links)
Thesis (M.Phil.)--Hong Kong University of Science and Technology, 2003. / Includes bibliographical references. Also available in electronic version. Access restricted to campus users.
224

A Configurable Terasample-per-second Imaging System for Optical SETI

Mead, Curtis Charles 08 October 2013 (has links)
A new instrument for conducting astronomical searches for nanosecond-scale optical pulses has been designed, built, and is now operating at Oak Ridge Observatory in Harvard, MA. The Advanced All-sky Camera, based on the previous generation ASIC-based design, is implemented using Xilinx Virtex-5 LX110 FPGAs to create a flexible and configurable system. Each FPGA has 32 1.5 Gsps analog-to-digital converters, implemented as 8-level flash ADCs using 256 of the Virtex-5's LVDS input pairs. Thirty-two FPGAs in the system total 1024 ADC channels, each with 8kB of sample memory, for triggering on and recording coincident pulse waveforms from an array of 1024 photomultiplier tube anodes. / Engineering and Applied Sciences
225

Materials and processes for advanced lithography applications

Jen, Wei-Lun Kane 25 January 2011 (has links)
Step and Flash Imprint Lithography (S-FIL) is a high resolution, next-generation lithography technique that uses an ambient temperature and low pressure process to replicate high resolution images in a UV-curable liquid material. Application of the S-FIL process in conjunction with multi-level imprint templates and new imprint materials enables one S-FIL step to reproduce the same structures that require two photolithography steps, thereby greatly reducing the number of patterning steps required for the copper, dual damascene process used to fabricate interconnect wirings in modern integrated circuits. Two approaches were explored for the implementation of S-FIL in the dual damascene process: sacrificial imprint materials and imprintable dielectric materials. Sacrificial imprint materials function as a pattern recording medium during S-FIL and a three-dimensional etch mask during the dielectric substrate etch, enabling the simultaneous patterning of both the via and metal structures in the dielectric substrate. Development of sacrificial imprint materials and the associated imprint and etch processes are described. Application of S-FIL and the sacrificial imprint material in a commercial copper dual damascene process successfully produced functional copper interconnect structures, demonstrating the feasibility of integrating multi-level S-FIL in the copper dual damascene process. Imprintable dielectric materials are designed to combine the multi-level patterning capability of S-FIL with novel dielectric precursor materials, enabling the simultaneous deposition and patterning of the interlayer dielectric material. Several candidate imprintable dielectric materials were evaluated: sol-gel, polyhedral oligomeric silsesquioxane (POSS) epoxide, POSS acrylate, POSS azide, and POSS thiol. POSS thiol shows the most promise as functional imprintable dielectric material, although additional work in the POSS thiol formulation and viscous dispense process are needed to produce functional interconnect structures. Integration of S-FIL with imprintable dielectric materials would enable further streamlining of the dual damascene fabrication process. The fabrication of electronic devices on flexible substrates represents an opportunity for the development of macroelectronics such as flexible displays and large area devices. Traditional optical lithography encounters alignment and overlay limitations when applied on flexible substrates. A thermally activated, dual-tone photoresist system and its associated etch process were developed to enable the simultaneous patterning of two device layers on a flexible substrate. / text
226

Thermal Conductivity of Uranium Mononitride / Värmeledningsförmåga hos uranmononitrid

Valter, Mikael January 2015 (has links)
Thermal conductivity is a crucial parameter for nuclear fuel, as it sets an upper limit on reactor operating temperature to have safety margins. Uranium mononitride (UN) is a prospective fuel for fast reactors, for which limited experimental studies have been conducted, compared to the currently dominating light-water reactor fuel, uranium dioxide. The aim of this thesis is to determine the thermal conductivity in UN and to determine its porosity dependence. This was done by manufacturing dense and porous high-purity samples of UN and examining them with laser flash analysis, which with data on specific heat and thermal expansion gives the thermal conductivity. To analyse the result, a theoretical study of the phenomenology of thermal conductivity as well as a review and comparison with previous investigations were carried out. The porosity range was 0.1–31% of theoretical density. Thermal diffusivity data from laser flash analysis, thermal expansion data and specific heat data was collected for 25–1400 C. The laser flash data had high discrepancy at higher temperatures due to thermal instability in the device and deviations due to graphite deposition on the samples, but the low temperature data should be reliable. As the specific heat data was also of poor quality, literature data was used instead. As for the thermal diffusivity data, the calculated thermal conductivity for lower temperatures are more accurate. A modified version of the porosity model by Ondracek and Schulz was used to analyse the porosity dependence of the thermal conductivity, taking into account the different impacts of open and closed porosity. / Värmeledningsförmåga är en avgörande egenskap för kärnbränslen, eftersom det begränsar den maximala drifttemperaturen i reaktorn för att ha säkerhetsmarginaler. Uranmononitrid (UN) är ett framtida bränsle för snabba reaktorer. Jämfört med det dominerande bränslet i lättvattenreaktorer, urandioxid, har endast begränsade experimentella studier gjorts av UN. Målet med detta arbete är att bestämma värmeledningsförmågan i UN och bestämma dess porositetsberoende. Detta gjordes genom att tillverka kompakta och porösa prover av UN och undersöka dem med laserblixtmetoden, vilket tillsammans med värmekapacitet och värmeutvidgning ger värmeledningsförmågan. För att analysera resultatet gjordes en teoretisk studie av värmeledning såväl som en genomgång av och jämförelse med tidigare undersökningar. Provernas porositet sträckte sig från 0.1% till 31% av teoretisk densitet. Värmediffusivitetsdata från laserblixtmetoden, värmeutvidgningsdata och värmekapacitetsdata samlades in för 25–1400 C. Värdena från laserblixtmätningen hade hög diskrepans vid höga temperaturer p.g.a. termisk instabilitet i anordningen och avvikelser p.g.a. grafitavlagring på proverna, men data för låga temperaturer borde vara tillförlitliga. Eftersom resultaten från värmekapacitetsmätningen var av dålig kvalité, användes litteraturdata istället. Som en konsekvens av bristerna i mätningen av värmediffusivitet är presenterade data för värmeledningsförmåga mest exakta för låga temperaturer. En modifierad version av Ondracek-Schulz porositetsmodell användes för att analysera värmeledningsförmågans porositetsberoende genom att ta hänsyn till olika inverkan av öppen och sluten porositet.
227

Extraction of orbitides from flaxseed

2014 February 1900 (has links)
The goal of this project is to establish an efficient and economical industrial process for extraction of a Kaufmann and Tobschirbel orbitide (KT) mixture from flaxseed oil. KTs occur at a low level in flaxseed oil and must be concentrated at least 600 fold to produce a useful commercial concentrate. KT peptides are more polar than most lipids may be separated using solid- or liquid- phase extractants. Extraction protocols were investigated to determine a better approach for KT peptide extraction. Commercial solid-phase extraction methods would require the adaptation of bench-scale silica flash column chromatography. The first approach was to develop methods for separation of peptides using only silica, ethyl acetate and ethanol. Ethyl acetate is known to remove both oil and peptides from silica. Therefore, the ability of low temperature to decrease the peptide elution from silica was studied. The other method utilized liquid-liquid extraction. In order to measure the success of an extraction an analytical method was required to evaluate the separation of peptides from oil. An analytical procedure was developed that readily determined the relative concentration of peptide and lipid. Aqueous and anhydrous ethanol partitioning was used to extract the KT mixture from flaxseed oil. Ethanol solutions between 50 and 100% in water (v/v) were mixed with flaxseed oil. The oil and peptide content of the extracts were determined using 1H-NMR. Liquid-liquid extraction using 70% aqueous ethanol at volume ratio (solvent to oil) of 0.25:1 produced a mole ratio of 2:1 (KTs to oil) making it the optimal solvent for KT extraction. In the second part of this project, the scale of liquid-liquid extraction was increased through several 10 to 30-fold steps to establish a potential industrial extraction process for recovery of the KT mixture. The feasibility of processing the solvent containing mixed peptides was investigated. Multiple evaporation and adsorption methods were also tested, including falling film evaporation, rotary evaporation, a combination of rotary evaporation and freeze drying, and a combination of rotary evaporation and spray drying. Various experimental methods to enrich and isolate KTs from water-rich fraction were performed. At the end of this project, 3328.89 g of KT mixture was produced that was suitable for commercial purposes. The increase of extraction scale was 140,000 fold.
228

Μοντελοποίηση και εξομοίωση των χαρακτηριστικών γήρανσης NV μνημών

Προδρομάκης, Αντώνιος 12 June 2015 (has links)
Τις τελευταίες δεκαετίες, η ανάπτυξη των non-volatile μνημών (NVMs) κατέστησε ικανή την αντικατάσταση volatile μνημών, όπως των DRAMs και των μαγνητικών σκληρών δίσκων (HDDs), σε caching και storage εφαρμογές, αντίστοιχα. Οι δίσκοι στερεάς κατάστασης (SSDs) που βασίζονται σε NAND Flash μνήμες έχουν ήδη αναδειχθεί ως ένα χαμηλού κόστους, υψηλής απόδοσης και αξιόπιστο μέσο στα σύγχρονα συστήματα αποθήκευσης. Επιπλέον, οι ιδιότητες των υλικών αλλαγής φάσης και η πρόσφατη κλιμάκωση της Phase-Change μνήμης (PCM), την καθιστά ένα τέλειο υποψήφιο για την ανάπτυξη μνημών τυχαίας προσπέλασης αλλαγής φάσης (PCRAMs). Η ραγδαία κλιμάκωση των NVMs, με διαδικασίες ολοκλήρωσης κάτω από 19nm, και η χρήση της multi-level cell (MLC) τεχνολογίας συνέβαλλαν στην αύξηση της πυκνότητας αποθήκευσης πληροφορίας και συνεπώς μείωσαν το κόστος αποθήκευσης δραματικά. Ωστόσο, η διάρκεια ζωής των NV μνημών δεν παρέμεινε ανεπηρέαστη. Διαφορετικές παρεμβολές και πηγές θορύβου σε συνδυασμό με την επίδραση της γήρανσης έχουν ένα μεγάλο αντίκτυπο στην αξιοπιστία και την αντοχή αυτών των τεχνολογιών μνήμης, και ως εκ τούτου, των συστημάτων αποθήκευσης στα οποία χρησιμοποιούνται (SSDs, PCRAMs). Πολλές μέθοδοι και τεχνικές, όπως η μέθοδος wear-leveling, εξειδικευμένοι κώδικες ανίχνευσης και διόρθωσης λαθών (ECC) και τεχνικές pre-coding έχουν χρησιμοποιηθεί για να αντισταθμίσουν αυτές τις επιπτώσεις, ενώ άλλες, πιο περίπλοκες μεν, αλλά και πιο αποτελεσματικές, όπως η δυναμική προσαρμογή των κατωφλίων ανάγνωσης, βρίσκονται σε πειραματικό στάδιο. Η ανάπτυξη αυτών των τεχνικών βασίζεται στον πειραματικό χαρακτηρισμό των NV μνημών, τόσο σε επίπεδο κελιού όσο και σε επίπεδο ολοκληρωμένου κυκλώματος. Ο χαρακτηρισμός αυτός σχετίζεται με την μέτρηση του λόγου του αριθμού των bit σφαλμάτων προς τον αριθμό των συνολικών bits (BER) και το χρόνο απόκρισης (ανάγνωσης και εγγραφής) καθ' όλη τη διάρκεια ζωής της μνήμης, για διάφορες μορφές δεδομένων και σενάρια χρονισμών. Η διαδικασία αυτή, μέχρι τώρα, γίνεται με τη χρήση της πραγματικής NV μνήμης, συνήθως με ολοκληρωμένα κυκλώματα που βρίσκονται στο στάδιο της προ-παραγωγής, ενώ πιο ενδελεχής έλεγχος γίνεται στο τελικό στάδιο της παραγωγής. Αυτή η προσέγγιση έχει δύο σημαντικά μειονεκτήματα. Από τη μία πλευρά, είναι μια πολύ χρονοβόρα διαδικασία, δεδομένου ότι η γήρανση μίας NVM μπορεί να απαιτεί ένα μεγάλο αριθμό από program / erase (P/E) κύκλους που πρέπει να εκτελεστούν για κάθε πείραμα. Ο αριθμός αυτός κυμαίνεται από κάποιες δεκάδες χιλιάδες (NAND Flash) έως και κάποια εκατομμύρια κύκλους (PCM). Από την άλλη πλευρά, τα χαρακτηριστικά γήρανσης μίας NVM είναι αναλόγως εξαρτώμενα από τον αριθμό των Ρ/Ε κύκλων που εκτελούνται, καθιστώντας έτσι αδύνατη την διεξαγωγή διαφορετικών ή διαδοχικών πειραμάτων στην ίδια κατάσταση γήρανσης της μνήμης. Σε αυτή την εργασία παρουσιάζουμε ένα μοντέλο που αντιπροσωπεύει με ακρίβεια τη διαδικασία γήρανσης NV μνημών, αντιμετωπίζοντας τες ως ένα χρονικά μεταβαλλόμενο κανάλι επικοινωνίας βασισμένο σε ένα μη συμμετρικό n-PAM μοντέλο. Με βάση τη μοντελοποίηση των χαρακτηριστικών γήρανσης, υλοποιούμε ένα σύστημα εξομοίωσης σε πραγματικό χρόνο και με μεγάλη ακρίβεια της συμπεριφοράς NV-μνημών, κάτω από ορισμένες από το χρήστη συνθήκες γήρανσης, σε τεχνολογία FPGA. Η πλατφόρμα που παρουσιάζεται στην παρούσα εργασία βασίζεται σε μια αναπροσαρμόσιμη αρχιτεκτονική υλικού και λογισμικού που επιτρέπει την ακριβή εξομοίωση των νέων και αναδυόμενων τεχνολογιών και μοντέλων των NVMs. Η πλατφόρμα που αναπτύχθηκε μπορεί να αποτελέσει ένα πολύτιμο εργαλείο για την ανάπτυξη και αξιολόγηση αλγορίθμων και τεχνικών κωδικοποίησης. / Over the last few years, non-volatle memory (NVM) has shown a great potential in replacing volatile memory, like DRAM in caching applications, and magnetic HDDs in storage applications. NAND Flash-based solid state drives (SSDs) have already emerged as a low-cost, high-performance and reliable storage medium for both commercial and enterprise storage systems. Additionally, the properties of phase-change materials and the recent scaling of Phase-Change Memory (PCM) has made it a perfect candidate for developing phase-change random access memories (PCRAMs). The rapid scaling of NVMs, with process nodes below 19nm, and the use of multi-level cell (MLC) technologies has increased their storage density and reduced the storage cost per bit. However, their lifetime capacity has not remained unaffected. Different interferences and noise sources along with aging effects have now a great impact on the reliability and endurance of these memory technologies, and hence, on the storage systems where these memories are used (SSDs, PCRAMs). Numerous techniques, such as wear-leveling, specialized error correcting codes (ECC) and precoding techniques have been employed to compensate these effects, while others, more complex but also more efficient, like dynamic adaptation of read reference thresholds, are at an experimental level. The development of these techniques is based on experimental characterization of NVM cells and chips. Characterization is related with measuring bit error ratio (BER) and response time (read and write time) during the whole lifetime of a device, for various loading data patterns and timing scenarios. This process is performed using real NVM integrated chips, usually the engineering, pre-production parts, while more thorough testing at the system level is performed when production parts are available. This approach has two major drawbacks. On one hand it is a very time-consuming process, since the aging of an NVM may require a large number of program/erase (P/E) cycles to be performed for each experiment, ranging from tens of thousands (NAND Flash) to millions (PCM) program cycles. On the other hand, the aging characteristics of an NVM are proportionally dependent on the number of the performed P/E cycles, thus making it impossible to conduct different or successive experiments at the same aging state of a memory chip. In this work, we present a model that accurately represents the aging process of an NVM cell, by treating it as a time-variant communications channel, based on an asymmetric n-PAM model. We present the architecture of a flexible FPGA-based platform, designed for accurate emulations of NVM technologies, focusing mainly on MLC NAND Flash technologies. Accuracy is measured in reference to experimentally specified bit error probabilities for various aging conditions (ie. the number of P/E cycles applied to a NAND Flash chip), usually for random data patterns. The hardware platform presented in this work is based on a reconfigurable hardware-software architecture, which enables the accurate emulation of new and emerging models and technologies of NVMs. The developed platform can be a valuable tool for the evaluation of memory-related algorithms, signal processing and coding techniques.
229

Tribological, Kinetic and Thermal Characteristics of Copper Chemical Mechanical Planarization

Li, Zhonglin January 2005 (has links)
Copper polishing performance depends significantly on the properties of pads, slurries, conditioning, pressure, sliding velocity, slurry flow rate and temperature. A slight variance in each of these parameters will cause significant change in polising results. Various investigations are performed during this study to understand the effect of consumables and other main operating parameters on copper polishing in terms of removal rate, lubrication mechanism, and temperature transients. A modified two-step Langmuir-Hinshelwood removal rate model and a flash heating thermal model are developed to describe the removal mechanism.Results indicate that grain size plays an important role during copper polishing. Smaller grain size may enhance the chemical rate by providing a higher density of favorable reaction sites. However, denser grain boundaries due to smaller grain size may reduce the mechanical rate by increasing the probability of disruption of three body sliding contact. It is found that removal rate increases as slurry flow increases from 60 to 80 cc/min because higher slurry flow rate can provide more reactants to the system. Then removal rate decreases as slurry flow rate is further increased to 140 cc/min, which is due to synergic effects of the wafer temperature, slurry flow and slurry residence time under the wafer. The observed removal rate drop is thought to be due to the change of the wafer temperature at high sliding velocity.Experimental results from eight slurry formulations with various abrasize size and content show that in the case of 13-nm abrasives, the dominant tribological mechanism is that of partial lubrication, while in the case of 35-nm abrasives, the dominant tribological mechanism is that of boundary lubrication. COF values of the slurry with surfactant are generally lower that those of the slurry without surfactant.Logarithmic spiral positive pad, whose spiral groove is at a slight angle to the pad rotation direction, shows the highest average COF. The radial pad results in the smallest average COF. For all types of the grooved pads investigated, CMP is mechanically limited at low pV, and chemically limited at high pV. Non-Prestonian behavior is thought to be due to variations of COF and substrate temperatures.Dual Emission UV Light Enhanced Fluorescence results indicate that during polishing the wafer is tilted towards the center of the pad and that the extent of wafer tilt is a strong function of diamond disc pressure. Increasing the oscillation frequency of the diamond disc or the rotation rate decreases slurry film thickness. Slurry film thickness increases with the slurry flow rate. Also slurry film thickness strongly depends on diamond disc design.
230

Bi-Sr-Ca-Cu-O thin films grown by flash evaporation and pulsed laser deposition

Ganapathy Subramanian, Santhana 30 September 2004 (has links)
Bismuth-Strontium-Calcium-Copper-Oxide (BSCCO) compounds are an important family of compounds that have one of the highest transition temperatures among all high-temperature superconductors. The compound is known to exist in three distinct phases, commonly referred to as the 2201, 2212 and 2223 phases. Of these three phases, the 2212 and 2223 phases are the most important, as their transition temperature is higher than the boiling point of liquid nitrogen. It is desirable to produce the compound in thin film form, as the bulk samples are normally polycrystalline. This thesis compares thin films produced by two techniques for depositing BSCCO in order to understand the effect of various processing parameters on the final quality of the thin films. Thin films were grown by flash evaporation at Texas A&M University, and by pulsed laser deposition (PLD) at the University of Wollongong, Australia. The latter of these techniques is widely used for growing thin films of various compounds. Single-phase 2212 films were grown on a MgO substrate using the pulsed laser deposition technique from commercially available 2212 powder. The effect of annealing on the thin films was also studied.

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