Defects in the functional oxides play an important role in electronic devices like metal oxide semiconductor field effect transistors (MOSFETs) and resistive random-access memories (ReRAMs). The continuous scaling of CMOS has brought the Si MOSFET to its physical technology limit and the replacement of Si channel with Ge channel is required. However, the performance of Ge MOSFETs suffers from Ge/oxide interface quality and reliability problems, which originates from the charge traps and defect states in the oxide or at the Ge/oxide interface. The sub-oxide layers composed of GeII states at the Ge/GeO2 interface seems unavoidable with normal passivation methods like hydrogen treatment, which has poor electrical properties and is related to the reliability problem. On the other hand, ReRAM works by formation and rupture of O vacancy conducting filaments, while how this process happens in atomic scale remains unclear. In this thesis, density functional theory is applied to investigate the defect behaviours in oxides to address existing issues in these electronic devices. In chapter 3, the amorphous atomic structure of doped GeO2 and Ge/GeO2 interface networks are investigated to explain the improved MOSFET reliability observed in experiments. The reliability improvement has been attributed to the passivation of valence alternation pair (VAP) type O deficiency defects by doped rare earth metals. In chapter 4, the oxidation mechanism of GeO2 is investigated by transition state simulation of the intrinsic defect diffusion in the network. It is proposed that GeO2 is oxidized from the Ge substrate through lattice O interstitial diffusion, which is different from SiO2 which is oxidized by O2 molecule diffusion. This new mechanism fully explains the strange isotope tracer experimental results in the literature. In chapter 5, the Fermi level pinning effect is explored for metal semiconductor electrical contacts in Ge MOSFETs. It is found that germanides show much weaker Fermi level pinning than normal metal on top of Ge, which is well explained by the interfacial dangling bond states. These results are important to tune Schottky barrier heights (SBHs) for n-type contacts on Ge for use on Ge high mobility substrates in future CMOS devices. In chapter 6, we investigate the surface and subsurface O vacancy defects in three kinds of stable TiO2 surfaces. The low formation energy under O poor conditions and the +2 charge state being the most stable O vacancy are beneficial to the formation and rupture of conducting filament in ReRAM, which makes TiO2 a good candidate for ReRAM materials. In chapter 7, we investigate hydrogen behaviour in amorphous ZnO. It is found that hydrogen exists as hydrogen pairs trapped at oxygen vacancies and forms Zn-H bonds. This is different from that in c-ZnO, where H acts as shallow donors. The O vacancy/2H complex defect has got defect states in the lower gap region, which is proposed to be the origin of the negative bias light induced stress instability.

Made available in DSpace on 2017-07-24T19:37:53Z (GMT). No. of bitstreams: 1 Luis Lacerda.pdf: 6157407 bytes, checksum: 67f47ee9ce5d908521ba3d0455add580 (MD5) Previous issue date: 2015-03-09 / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior / Semiconductors materials are largely employed on development of innumerous optical and electronic due to their electronic, optical, ferroelectric and structural properties. Among the semiconductors materials stand out the zinc oxide (ZnO) and the barium titanate (BaTiO3) once shows excellent properties allied to low cost to obtaining. The ZnO is a simple oxide used in technology and largely investigated as an alternative to replace high cost material on development of electronic devices. Similarly, the BaTiO3 has perovskite crystalline structure whose properties present great technological interest. This work evaluated the effect of Ba presence on wurtzite structure and the influence of Zn atoms on tetragonal BaTiO3 properties. The obtained results indicates that the Ba atoms changes drastically the band structure of ZnO, resulting in the decrease of band gap for low quantities and the semiconductor type modification for doping above 25 %. The insertion of such atoms in wurtzite also causes the improvement of ferroelectric properties and the increase of unit cell lattice parameters. In case of Zn-doped BaTiO3, the doping process reduces radically de band gap and the ferroelectric properties regarding to pure material. Likewise, the semiconductor type is also modified by the Zn atoms presence. Based on obtained results for both crystalline systems, was proposed their employed in formation of p-n heterojunction. The heterostructure was evaluated through of four models. The obtained results for each one of these models were used to describe the interface region of ZnO/BaTiO3 heterojunction, proving that the atoms intercalation occurs and is responsible for heterostructure properties. Such properties present this heterostructure as a potential alternative for development of electronic devices, mainly the development of memory devices. The obtained heterostructure requires a low amount energy to electronic conduction process and shows high compatibility between the structure of heterojunction and the SiO2 substrate which is used in development of such devices. / Materiais semicondutores são amplamente empregados no desenvolvimento de vários dispositivos ópticos e eletrônicos variados devido às suas propriedades eletrônicas, ópticas, ferroelétricas e estruturais. Dentre os materiais semicondutores, destacam-se o óxido de zinco (ZnO) e o Titanato de Bário (BaTiO3) uma vez que apresentam excelentes propriedades aliadas ao baixo custo de síntese. O ZnO é um óxido simples amplamente empregado na tecnologia e largamente investigado como uma alternativa para substituição de materiais de custo elevado no desenvolvimento de dispositivos eletrônicos. Por sua vez, o BaTiO3 é um material de estrutura cristalina perovskita cujas propriedades são de grande interesse tecnológico. No presente trabalho avaliou-se o efeito da presença de átomos de Ba na estrutura wurtzita do ZnO e a influência dos átomos de Zn sobre as propriedades do BaTiO3 tetragonal. Os resultados indicaram que os átomos de bário alteram drasticamente a estrutura de bandas do ZnO, resultando na diminuição do band gap para pequenas quantidades e a modificação do tipo de semicondutor para dopagens superiores a 25%. A inserção de tais átomos na estrutura wurtzita também é responsável pelo aprimoramento das propriedades ferroelétricas do material, bem como pelo aumento dos parâmetros de rede da célula unitária. No caso da estrutura do BaTiO3 dopada com Zn observou-se a redução drástica do band gap para o material e a modificação do caráter semicondutor do material; entretanto, ocorreu a redução das propriedades ferroelétricas em relação ao BaTiO3 puro. Com base nos resultados obtidos para ambos os sistemas cristalinos, propôs-se a sua utilização para formação de uma heterojunção do tipo p-n. A heteroestrutura foi avaliada por meio de quatro modelos diferentes. Os resultados obtidos para cada um destes modelos foram utilizados para descrição da estrutura eletrônica da região de interface da heterojunção, comprovando que a intercalação de átomos na interface é observada e mostra-se responsável pelas propriedades observadas para a heteroestrutura. Tais propriedades apontam a heterojunção ZnO/BaTiO3 como uma alternativa em potencial para aplicação no desenvolvimento de dispositivos eletrônicos e, principalmente, no desenvolvimento de dispositivos de armazenamento de dados, devido a diminuição de energia necessária para condução eletrônica.

Made available in DSpace on 2017-07-24T19:38:09Z (GMT). No. of bitstreams: 1 DaniellaIngles.pdf: 4512280 bytes, checksum: c8619d3eba91fdbec4d26eeb30e24eb9 (MD5) Previous issue date: 2013-03-08 / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior / Titanates have perovskite crystalline structure very known for electrical and optical properties used in the electronic devices such as sensors, capacitors, nonvolatile and dynamic random access memories. In particular, titanates structures are characterized for the ABO3 formula being A crystallographic site formed by 12 atoms neighbors and B crystallographic site formed by 6 atoms neighbors. However, researches about strontium titanate-stannate system are found minimally in the literature. Articles discussing synthesis, characterization and compositions are insufficiently presented. This project shows a theoretical study of the structure and optical properties of the strontium titanate-stannate system for different substitutions [Sr(Ti1-xSnx)O3 x = 0; 0,25; 0,50; 0,75; 1]. It was used theoretical-computational methodology based on, Density Functional Theory (DFT) with B3LYP functional to calculate the structure of the models SrTiO3 (STO), Sr(Ti1-xSnx)O3 (STS) and SrSnO3 (SSO). Theoretical data of parameter lattice, cell unit angles, volume, band gap, overlap population, charges and free energy are presented as well as analysis and discussion of the results for band structure (EB), density of states (DOS), electron density maps. Thus, one may present the data obtained and investigate the properties of the materials. / Titanatos possuem estrutura cristalina perovskita muito conhecida pelas propriedades elétricas e ópticas utilizadas em dispositivos eletrônicos como sensores, capacitores, memória de acesso randômico dinâmica e não volátil. Em particular, as estruturas de titanatos são caracterizadas pela fórmula ABO3 sendo A sítio cristalográfico formado por 12 átomos vizinhos e B o sítio cristalográfico formado por 6 átomos vizinhos. No entanto, pesquisas sobre o sistema titanato-estanato de estrôncio são encontradas minimamente na literatura. Artigos que discutem a síntese, caracterização e composições são insuficientemente apresentados. Este trabalho apresenta o estudo teórico da estrutura e propriedades ópticas do sistema titanato-estanato de estrôncio para diferentes substituições [Sr(Ti1-xSnx)O3 x = 0; 0,25; 0,50; 0,75; 1]. Utilizou-se metodologia teórico-computacional baseada em, Teoria do Funcional de Densidade (DFT) com funcional B3LYP, para cálculo da estrutura dos modelos SrTiO3 (STO), Sr(Ti1-xSnx)O3 (STS) e SrSnO3 (SSO). Dados teóricos de parâmetro de rede, ângulos da célula unitária, band gap, recobrimento populacional, cargas e energia livre são apresentados como também a análise e discussão dos resultados por meio de estrutura de bandas (EB), densidade de estados (DOS), mapas de densidade eletrônica. Desta forma, podem-se apresentar os dados obtidos e investigar as propriedades dos materiais.

Diese Arbeit beschäftigt sich mit der „First-Principles“ atomskaligen Modellierung der HfO2-basierten high-k-Gate-Isolatorschichten der Metalloxid-Halbleiter-Feldeffekttransistoren. Die theoretischen Untersuchungen basieren auf Dichtefunktionaltheorie und Nichtgleichgewicht-Greensche-Funktion-Formalismen. Eine der wichtigsten Eigenschaften eines Gate-Isolators ist der Wert seiner Bandlücke. Die Bandlücke eines gemischten Festkörpers aus SiO2 und ZrO2 oder HfO2 wird auf der Grundlage der „Generalized Quasi-Chemical“ Approximation in Kombination mit dem „Cluster Expansion“ Ansatz berechnet. Zu diesem Zweck wurde Dichtefunktionaltheorie für die Berechnung der Eigenschaften verschiedener Konfigurationen möglicher Elementarzellen durchgeführt. Es wurde ein fast linearer Verlauf für die Bandlücke eines aus SiO2 und HfO2 gemischten Festkörpers berechnet. Im Vergleich zu dem üblichen SiO2 Gate-Isolator, haben die high-k-Gate-Isolatoren eine höhere Defektdichte, die hauptsächlich aus Sauerstoffleerstellen bestehen. Dies führt zu mehreren Problemen, wie zum Beispiel höherer Leckstrom, Schwellenspannungsverschiebung und Degradation des Gateoxids. Daher wurde eine umfassende Untersuchung der verschiedenen Eigenschaften von Sauerstofffehlstellen in HfO2 durchgeführt, indem wichtige Parameter wie zum Beispiel die Formationsenergien und die Lage der Defektniveaus in der Bandlücke berechnet wurden. Es wurde durch die theoretischen Berechnungen gezeigt, dass die schädlichen Auswirkungen von Sauerstofffehlstellen durch die Einführung von Lanthan-Atomen in dem HfO2 Kristallgitter teilweise zu verringern sind. Energetisch gesehen bevorzugen die Lanthan-Atome die Hf-Gitterplätze in der Nachbarschaft einer Sauerstofffehlstelle und führen dadurch zu der Passivierung durch Sauerstoffleerstelle induzierten Defektniveaus. Die high-k-Isolatorschicht in den heutigen Transistoren besteht aus drei Schichten: einem Metallgate, einer HfO2-Schicht als Haupt-Gate-Isolator und einer sehr dünnen SiO2 Übergangsschicht zwischen Gateoxid und Si. Die Einführung eines Metallgates führt zu einigen Problemen bei der Einstellung einer geeigneten Schwellenspannung in den Transistoren. Theoretische Berechnungen in einer komplexen Modellstruktur von der Si/SiO2/HfO2-Grenzfläche zeigen, dass die dotierten Lanthan-Atome energetisch die SiO2/HfO2-Grenzfläche bevorzugen, was wiederum ein Dipolmoment an der Grenzfläche erzeugt. Dieses Dipolmoment kann verwendet werden, um die richtige Schwellenspannung wieder einzustellen. Schließlich wird in den experimentellen Messungen festgestelltes progressives Degradationsverhalten von high-k-Gate-Isolatoren mit einem theoretischen Modell erklärt. Dieses Modell basiert auf ab-initio-Berechnungen und zeigt, wie die Erzeugung geladener Sauerstoffleerstellen und deren Migration unter der angelegten Gatespannung zu einer progressiven Erhöhung des Leckstroms und folglich zu einer Degradation der Isolatorschicht führt.:List of Figures 7 List of Tables 9 List of Symbols 10 List of Abbreviations 11 Chapter 1: Introduction 12 Chapter 2: Theory of Atomic-Scale First-Principles Calculations 15 2.1 Theoretical methods 15 2.2 Density functional theory 17 2.3 Non-equilibrium Green’s function formalism 23 Chapter 3: Calculations for Bulk High-k Materials 27 3.1 Bulk high-k materials 27 3.2 Crystalline insulators 27 3.3 Solid solutions 29 3.3.1 Cluster expansion approach 30 3.3.2 Band gap and bowing parameter 33 3.3.3 Calculation of internal stress 40 3.4 Leakage current 41 Chapter 4: Defects in Bulk High-k Materials 43 4.1 Defects in high-k gate dielectrics 43 4.2 Oxygen vacancies in monoclinic HfO2 44 4.2.1 Neutral oxygen vacancies 44 4.2.2 Charged oxygen vacancies 46 4.3 Hybrid functional 50 4.4 Double oxygen vacancies 56 4.5 Interaction of oxygen vacancies with La-doping 61 4.5.1 La doping in m-HfO2 61 4.5.2 Complex LaHfVO defects 64 Chapter 5: Interface Properties of High-k Gate Stack 72 5.1 high-k gate-stack 72 5.1.1 Atomic-scale model structure for a high-k gate-stack 72 5.1.2 Electronic structure 74 5.1.3 Leakage current 76 5.2 Band offset 80 5.3 Threshold voltage engineering with La doping 84 Chapter 6: Degradation of the High-k Gate Stack 90 6.1 Reliability issues in high-k gate-stack 90 6.2 Calculations and experimental methods 91 6.3 Leakage current 92 6.4 Defect generation 100 6.5 Explaining progressive SILC in high-k dielectrics 102 Chapter 7: Conclusions 104 Bibliography 106 Selbständigkeitserklärung 119 Danksagung 120 Lebenslauf 121 Veröffentlichungen 122 / This thesis deals with the first-principles atomic-scale modeling of the HfO2-based high-k gate-insulator layer of the metal-oxide-semiconductor field-effect transistors. The theoretical investigations are based on density functional theory and non-equilibrium Green's function formalisms. One of the important properties of the gate insulator is the value of its band gap. The band gap of amorphous solid mixtures of SiO2 and ZrO2 or HfO2 is calculated based on generalized quasi-chemical approximation combined with a cluster expansion approach, by performing density functional calculations on different configurations of possible unit cells. An almost linear variation of the band gap is obtained for solid mixtures of SiO2 and HfO2. One drawback of the high-k gate-insulator, comparing to the standard SiO2, is high density of defects, particularly oxygen vacancies, which leads to several problems such as enhancement of the leakage current, threshold voltage instability, and degradation of the gate-oxide. A comprehensive investigation of different properties of oxygen vacancies in HfO2 is conducted by the calculation of formation energies and induced trap levels. It is shown based on theoretical calculations that the harmful effects of oxygen vacancies can be partially healed by introducing lanthanum atoms into the defected HfO2 crystal. Lanthanum atoms energetically prefer to occupy Hf lattice sites close to the oxygen vacancies and passivate the induced defect levels. The state-of-the-art high-k gate-stacks consist of a metal-gate on a HfO2 layer, as the main part of the gate insulator, and a very thin SiO2 intermediate layer between high-k material and Si. The introduction of a metal-gate raises some problem in the adjustment of an appropriate threshold voltage. Theoretical calculations in a complex model structure of the Si/SiO2/HfO2 interface reveals that the lanthanum atoms energetically prefer to stay at the SiO2/HfO2 interface, which in turn results in a dipole moment. This dipole moment can be employed to adjust the threshold voltage in high-k/metal-gate stacks. Finally, a theoretical model, which can quiet well explain the experimental measurements, is introduced for the progressive degradation of the high-k gate-insulators. This model is based on ab-initio calculations and shows how the generation of charged vacancies and their migration under the applied gate voltage leads to the progressive enhancement of the leakage current and consequently to the degradation of the insulator layer.:List of Figures 7 List of Tables 9 List of Symbols 10 List of Abbreviations 11 Chapter 1: Introduction 12 Chapter 2: Theory of Atomic-Scale First-Principles Calculations 15 2.1 Theoretical methods 15 2.2 Density functional theory 17 2.3 Non-equilibrium Green’s function formalism 23 Chapter 3: Calculations for Bulk High-k Materials 27 3.1 Bulk high-k materials 27 3.2 Crystalline insulators 27 3.3 Solid solutions 29 3.3.1 Cluster expansion approach 30 3.3.2 Band gap and bowing parameter 33 3.3.3 Calculation of internal stress 40 3.4 Leakage current 41 Chapter 4: Defects in Bulk High-k Materials 43 4.1 Defects in high-k gate dielectrics 43 4.2 Oxygen vacancies in monoclinic HfO2 44 4.2.1 Neutral oxygen vacancies 44 4.2.2 Charged oxygen vacancies 46 4.3 Hybrid functional 50 4.4 Double oxygen vacancies 56 4.5 Interaction of oxygen vacancies with La-doping 61 4.5.1 La doping in m-HfO2 61 4.5.2 Complex LaHfVO defects 64 Chapter 5: Interface Properties of High-k Gate Stack 72 5.1 high-k gate-stack 72 5.1.1 Atomic-scale model structure for a high-k gate-stack 72 5.1.2 Electronic structure 74 5.1.3 Leakage current 76 5.2 Band offset 80 5.3 Threshold voltage engineering with La doping 84 Chapter 6: Degradation of the High-k Gate Stack 90 6.1 Reliability issues in high-k gate-stack 90 6.2 Calculations and experimental methods 91 6.3 Leakage current 92 6.4 Defect generation 100 6.5 Explaining progressive SILC in high-k dielectrics 102 Chapter 7: Conclusions 104 Bibliography 106 Selbständigkeitserklärung 119 Danksagung 120 Lebenslauf 121 Veröffentlichungen 122