No presente trabalho foram preparados eletrodos formados por filmes finos de níquel e óxido de níquel sobre um substrato de Ti. Estes eletrodos foram preparados pelas metodologias de decomposição térmica de precursores poliméricos; método sol-gel e eletrodeposição com a finalidade de investigar a influência da metodologia de preparação sobre sua atividade catalítica. Foram avaliadas as variáveis relacionadas ao processo de preparação dos eletrodos como, por exemplo, a temperatura e a atmosfera de calcinação, além de diferentes métodos de eletrodeposição. A caracterização dos eletrodos foi realizada por técnicas de difração de raios-x; microscopia eletrônica de varredura e voltametria cíclica. Os resultados obtidos indicaram que as metodologias utilizadas proporcionaram a preparação de eletrodos com alta área superficial devido à formação de morfologias contendo trincas, fissuras e microrrachaduras. Por meio destas análises foi possível obter um quadro amplo do comportamento destes eletrodos. Os eletrodos preparados pelas três metodologias foram utilizados no estudo da eletrooxidação do furfural, que foi realizado através de cronopotenciometria. Os produtos foram analisados por CLAE (Cromatografia Líquida de Alta Eficiência) com intuito de analisar a eficiência dos eletrodos na eletrooxidação. Os resultados obtidos foram satisfatórios sendo que os eletrodos preparados pela metodologia de sol-gel apresentaram um maior rendimento na formação de ácido furóico. / In the present work we prepared electrodes formed by thin nickel and nickel oxide films on a Titanium substrate. These electrodes were prepared by thermal decomposition of polymeric precursors, sol-gel method and electroplating arming at investigate the influence of the preparation methodology on their catalytic activity. The parameters related to the electrodes preparation process had been investigated. These parameters included temperature and atmosphere calcinations, beyond different methods of electroplating. The electrodes characterization were carried out by x-ray diffraction, scanning electronic microscopy and cyclic voltammetry. The results indicate that the used methodologies provided the preparation of electrodes with high superficial area due to the formation of cracked and porous morphologies. he electrodes prepared by the different methodologies were used in the furfural eletrooxidation study, which was carried out by chronopotentiometry. The products were analyzed by HPLC (High Performance Liquid Chromatography) to verify the electrodes efficiency in the eletrooxidation. The obtained results had been satisfactory and the electrodes prepared by sol-gel method present a higher efficiency for furoic acid formation.

An uniform titanium oxide film was grown on indium tin oxide/glass substrate with the aqueous solutions of ammonium hexafluoro-titanate and boric acid. The as-deposition titanium oxide film shows good electrochromic property because of fluorine passivation on defects and dangling bonds. The transmittance of as-grown titanium oxide on indium tin oxide/glass with a thickness of 270 nm is about 85% at the wavelength of 550 nm. By 50 times electrochromic cycling test, the transparency ratio of TiO2 film is kept at 45% between fully colored state and fully bleached state at the wavelength of 550 nm. Under ultraviolet illumination, the growth of titanium oxide film grown is enhanced. The root mean squared value of surface roughness is improved from 3.723 to 0.523 nm. Higher fluorine concentration from (NH4)2TiF6 passivate defects and dangling bonds of titanium oxide during the growth. After 50 times electrochromic cycling test, the transparency ratio UV-TiO2 is improved from 37.5% to 42.4% at the wavelength of 550 nm. The electrical characteristics of nickel-doped titanium oxide films on p-type (100) silicon substrate by liquid phase deposition were investigated. For nickel doping, the nickel chloride was used as the doping solution and the electrical characteristics were improved. After thermal annealing in nitrous oxide at 700 oC, the dielectric constant of polycrystalline titanium oxide film is 29 and can be improved to 94 with nickel doping. Uniform nickel oxide film was grown on a conducting glass substrate with the aqueous solution of saturated NiF2¡E4H2O solution and H3BO3. The quality of NiO is improved after thermal annealing at 300 oC in air from the decrease of oxygen vacancy and better F ion passivation on defects and dangling bonds. The transmittance of as-deposited NiO/ITO/glass with a thickness of 100 nm is about 78% and improved to 88% after annealing at the wavelength of 550 nm. By the electrochromic cycling test 50 times on annealed NiO film, the transparency ratio is kept at 48% between fully colored state and fully bleached state at the wavelength of 550 nm. By the memory time test, the annealed LPD-NiO film has shorter memory time. The growth of nickel oxide film grown on indium-tin oxide/glass substrate by liquid phase deposition is enhanced under ultraviolet photo-irradiation was studied. a-Ni(OH)2 dominates the composition of as-grown NiO film. After thermal treatment at 300 oC,a-Ni(OH)2 is transformed into NiO. For thermally treated NiO under ultraviolet photo-irradiation, the recrystallization and the colored and bleached transmittance after 50 times electrochromic test were improved. Both improvements come from fluorine passivation. Transparent and conductive thin films consisting of p-type nickel oxide (NiO) semiconductors were prepared by liquid phase deposition. A resistivity of 8 x 10-1 -cm was obtained for NiO films prepared at liquid phase deposition. The transmittance of NiO is almost 70 % in the 550 nm wavelength was obtained for a 384.3 nm thick NiO film.

In this study, the characteristics of LPD-NiO, and lithium-doped LPD-NiO filmson glass substrate were investigated. In our experiment, we do some measurement about physical, chemical, electrical and optical properties for LPD-NiO and lithium-doped LPD-NiO films and discussed with them. The NiO film thickness was characterized by field emission scanning electron microscopy (FE-SEM), structure was characterized by X-ray diffraction (XRD), chemical properties were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). Electrical properties were characterized by four-point probe, and optical properties were characterized by a reflecting spectrograph. The thermal annealing was used to improve the characteristics of LPD-NiO and lithium-doped LPD-NiO films in nitrogen, air and nitrous oxide ambient. For lithium doping, the lithium chloride was used as the doping solution and the electrical characteristics were enhanced. After thermal annealing in air at 400 oC, the resistivity of NiO films is 7.5 ¡Ñ 10-1 ohm-cm and can be lowed to 7.2 ¡Ñ 10-3 ohm-cm with lithium doping.

This thesis investigates the electrochromic NixW1-x oxide thin film system, where 0 < x < 1. The thin films were deposited by reactive DC magnetron co-sputtering from one Ni and one W metal target. In addition, Ni oxide was deposited with water vapor added to the sputtering gas. The different compositions were structurally characterized by X-ray diffraction, X-ray photoelectron-, Rutherford backscattering- and Raman spectroscopy. Possible nanostructures were studied by ellipsometry together with effective medium theory. Optical and electrochemical properties were investigated by spectrophotometry and cyclic voltammetry in 1 M lithium perchlorate in propylene carbonate (Li-PC). Li-PC electrolyte was used as it is being compatible with both W and Ni oxides. Few studies have previously been made on Ni oxides in Li-PC. Films with high Ni content, 0.85 < x < 1, were polycrystalline and all other films were amorphous. W-rich films, x < 0.5, consisted of a mixture of W oxide and NiWO4 -phases, and the Ni-rich samples, x > 0.5, probably consisted of hydrated Ni oxide and NiWO4 -phases. Films with 0 < x < 0.3 showed electrochromic properties similar to W oxide, and films with 0.7 < x < 1 behaved as Ni oxide. For 0.4 < x < 0.7 no optical change was seen. At the border of cathodic electrochromic and non-electrochromic behavior, i.e. x ~ 0.4, the sample behaved as an optically passive intercalation material. The transmittance change was 0.45 and 0.15 for the W-rich and Ni-rich films, respectively. Ni addition to W oxide improved the coloration efficiency. For the Ni-rich films the charge insertion/extraction and optical modulation was low and an aging effect resulted in strong bleaching of the samples. The advantage of W addition to Ni oxide was that the transparency at the bleached state was enhanced. Moreover, it was found that the hydrous character of the Ni oxide had a large impact on the electrochromic performance, both when electrochemically cycled in KOH and in the non-aqueous Li-PC.

L’électrochromisme se définit par la capacité d’un système à modifier ses propriétés optiques en réponse à une tension électrique. Aujourd’hui, les vitrages intelligents sont une des applications phare. Ce manuscrit contribue à une meilleure compréhension du mécanisme responsable de la commutation optique du matériau à coloration anodique NiO. Des films de stoechiométrie contrôlée, de formule Ni1-xO, ont été déposés par pulvérisation cathodique à température ambiante sous différentes pressions partielles d’oxygène. De nature faiblement cristallisés, la caractérisation des films par diverses techniques telles que la spectroscopie de photoélectrons X, ou la spectroscopie de pertes d’énergie des électrons a permis d’estimer que la stoechiométrie variait de Ni0,96O à Ni0,81O lorsque la P(O2) augmentait de 2% à 10%. L’étude électrochimique couplée aux mesures optiques, du film Ni0,96O dans divers électrolytes lithié et non-lithié, a montré que la différence de couleur entre l’état décoloré et coloré (marron) était comparable (42%<ΔT=Tdec-Tcol<55%) quel que soit le milieu. Ces résultats ont conduit à la mise en évidence d’un mécanisme régi simultanément par un comportement faradique et capacitif. L’intégration des films dans des dispositifs Ni1-xO/WO3 est associée à une coloration neutre quelles que soient les épaisseurs des couches unitaires ou la température de cyclage. Toutefois, des températures de cyclage supérieures à 45°C ont conduit à des dégradations irréversibles des propriétés électrochromes tandis que des températures de cyclage négatives ont entrainé une diminution voire une disparition des propriétés électrochromes. La conception de dispositifs plus originaux, double face, conclut ce manuscrit. / Electrochromism is defined by the ability of a system to modify its optical properties in response to an electrical voltage and today, its flagship application is the smart windows. This manuscript contributes to a better understanding of the mechanism responsible of the coloration of the anodically colored oxide NiO. Non-stoichiometric films, Ni1-xO, were deposited by sputtering at room temperature under different partial pressures of oxygen. The characterization of the films by various techniques, including X-ray photoelectron spectroscopy or energy loss spectroscopy, has led to the conclusion that the stoichiometry varied from Ni0.96O to Ni0,81O when P(O2) increased from 2% to 10%. The electrochemical study coupled with the optical measurements of Ni0,96O film in various lithiated and non-lithiated electrolytes showed that the color difference between the bleached and colored (brownish) state was comparable (42%<ΔT=Tbl-Tcol<55%) regardless of the electrolyte nature. These results led to the identification of a mechanism simultaneously governed by a faradaic and capacitive behavior. The integration of the films in Ni1-xO/WO3 devices is associated to neutral colored ECDs regardless of the thickness of the individual layers or the cycling temperature. However, cycling temperatures above 45°C has led to irreversible degradations of the electrochromic properties while negative cycling temperatures has shown a decrease or even disappearance of the electrochromic properties. The design of original devices concludes this manuscript.

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior - CAPES / In this work, nickel oxide films were prepared from the Spray Pyrolysis Technique, due to its wide application in the manufacture of various electronic devices and intense study of its semiconducting properties. The films were obtained from a precursor solution containing 0.2 mol / L NiCl2 dissolved in distilled water containing sucrose as a chelating agent, deposited on a glass substrate temperature of 450 ° C. The sucrose concentration in the solution ranged from 0 to 10 × 10-3 mol/L and its effects on structural, morphological and optical properties were studied using the techniques of X-ray diffraction, scanning electron microscopy and UV-vis spectroscopy. It was observed that, before the concentration of sucrose, the films have different optical characteristics (transparent or opaque) for amorphous or crystalline films. / Neste trabalho, foram preparados filmes de óxido de níquel, a partir da Técnica Spray Pirólise, devido à sua grande aplicação na fabricação de diversos dispositivos eletrônicos e intenso estudo de suas propriedades semicondutoras. Os filmes foram obtidos a partir de uma solução precursora contendo 0,2 mol/L de NiCl2 dissolvido em água destilada, contendo a sacarose como agente quelante, depositados sobre um substrato de vidro a temperatura de 450°C. A concentração de sacarose na solução variou de 0 a 10×10-3 mol/L e seus efeitos nas propriedades estruturais, morfológicas e ópticas foram estudadas através das técnicas de Difração de Raios X, Microscopia Eletrônica de Varredura e Espectroscopia UV-vis. Observou-se que, diante da concentração de sacarose, os filmes apresentam diferentes características ópticas (transparentes ou opacos) para filmes amorfos ou cristalinos.

No presente trabalho foram preparados eletrodos formados por filmes finos de níquel e óxido de níquel sobre um substrato de Ti. Estes eletrodos foram preparados pelas metodologias de decomposição térmica de precursores poliméricos; método sol-gel e eletrodeposição com a finalidade de investigar a influência da metodologia de preparação sobre sua atividade catalítica. Foram avaliadas as variáveis relacionadas ao processo de preparação dos eletrodos como, por exemplo, a temperatura e a atmosfera de calcinação, além de diferentes métodos de eletrodeposição. A caracterização dos eletrodos foi realizada por técnicas de difração de raios-x; microscopia eletrônica de varredura e voltametria cíclica. Os resultados obtidos indicaram que as metodologias utilizadas proporcionaram a preparação de eletrodos com alta área superficial devido à formação de morfologias contendo trincas, fissuras e microrrachaduras. Por meio destas análises foi possível obter um quadro amplo do comportamento destes eletrodos. Os eletrodos preparados pelas três metodologias foram utilizados no estudo da eletrooxidação do furfural, que foi realizado através de cronopotenciometria. Os produtos foram analisados por CLAE (Cromatografia Líquida de Alta Eficiência) com intuito de analisar a eficiência dos eletrodos na eletrooxidação. Os resultados obtidos foram satisfatórios sendo que os eletrodos preparados pela metodologia de sol-gel apresentaram um maior rendimento na formação de ácido furóico. / In the present work we prepared electrodes formed by thin nickel and nickel oxide films on a Titanium substrate. These electrodes were prepared by thermal decomposition of polymeric precursors, sol-gel method and electroplating arming at investigate the influence of the preparation methodology on their catalytic activity. The parameters related to the electrodes preparation process had been investigated. These parameters included temperature and atmosphere calcinations, beyond different methods of electroplating. The electrodes characterization were carried out by x-ray diffraction, scanning electronic microscopy and cyclic voltammetry. The results indicate that the used methodologies provided the preparation of electrodes with high superficial area due to the formation of cracked and porous morphologies. he electrodes prepared by the different methodologies were used in the furfural eletrooxidation study, which was carried out by chronopotentiometry. The products were analyzed by HPLC (High Performance Liquid Chromatography) to verify the electrodes efficiency in the eletrooxidation. The obtained results had been satisfactory and the electrodes prepared by sol-gel method present a higher efficiency for furoic acid formation.

L'objectif de cette thèse est l'obtention de nouvelles données expérimentales en milieu acide borique dans le cadre du développement de modèles décrivant le comportement des produits de corrosion dans le circuit primaire, et notamment sur le relâchement du nickel par des phénomènes de dissolution/précipitation. Le travail présenté dans ce mémoire s'est focalisé sur une des phases solides du nickel, l'oxyde de nickel (NiO), ainsi que sur le comportement en solution de sa forme ionique, Ni2+. La solubilité de l'oxyde de nickel a été mesurée à haute température à l'aide d'un réacteur à circulation ouverte spécialement conçu pour fonctionner à haute température et haute pression. Compte tenu des concentrations très faibles en Ni dans les conditions de nos essais (300°C, pH>7, matrice bore-lithium), une méthode d'analyse du nickel dissous à l'échelle de l'ultra-trace (ng.kg-1) en milieu bore-lithium a été développée par ICP-MS et a été validée statistiquement par la méthode du profil d'exactitude. La complexation du nickel par les (poly)borates a ensuite été étudiée. Une expérience a été conduite où les ions nickel sont progressivement formés par oxydation d'une électrode de nickel métallique dans une solution d'acide borique. Basé sur les résultats expérimentaux et sur la modélisation de la spéciation aqueuse du bore, l'évolution du pH a montré l'existence significative d'un complexe nickel-bore. Le complexe neutre NiB3O4(OH)3 a été mis en évidence pour de fortes concentrations en acide borique, lorsque les polyborates sont présents. Les constantes d'équilibres ont été calculées à 25, 50 et 70°C, ainsi que les données thermodynamiques associées. Enfin, les cinétiques de dissolution de l'oxyde de nickel ont été mesurées en milieu acide chlorhydrique et en milieu acide borique de 25 à 100°C et un pH de 6. Les résultats ont mis en évidence un effet inhibiteur de l'acide borique sur les vitesses de dissolution de NiO dont le phénomène est exacerbé par l'augmentation de la température et de la concentration en bore. La formation d'un complexe surfacique a été mise en avant pour expliquer cet effet. / This work focuses on the nickel oxide phase (NiO) and the behavior in solution of its ionic form Ni2+. The solubility of nickel oxide has been determined at high temperature and pressure by the use of a flow through cell reactor specially designed to perform measurements in the conditions of the primary circuit. Because the solubility of nickel is very low at 300°C and pH>7, a new method for the determination of ultra-traces nickel concentrations in lithium/boron medium by ICP-MS coupled with a desolvator system nebulizer has been developed and validated by the statistical approach of accuracy profiles. The complexation of nickel by the (poly)borates has been also studied. Based on the experimental results and aqueous speciation modeling, the evolution of pH showed the existence of significant nickel-boron complexation. A neutral complex NiB3O4(OH)3 was postulated at high boric acid concentrations when polyborates are present, and the equilibrium constants were determined at 25, 50 and 70°C. The associated thermodynamics data have also been determined. Dissolution rates of nickel oxide have been measured in hydrochloric acid and in boric acid media up to 100°C and pH 6. Results showed that boric acid inhibits the dissolution rates of NiO and this phenomenon is enhanced by the temperature and the concentration of boron. The formation of a surface complex was postulated to explain this effect.

P-type transparent conductors are needed for a wide range of applicationssuch as solar cells and electrochromic smart windows. Solar power is animportant form of energy in today’s society as the threat of global warmingpushes the world towards fossil free energy. Hence a lot of solar cell typeshave been developed, among them tandem cells which are to different typesof solar cells stacked on top of each other. If one of the cells is based ona perovskite, a transparent p-type thin film electrode is needed as a holeconductor and electron blocking layer between the two cells. Nickel oxide(NiO) is a good candidate for this application as it has desired propertiessuch as good hole conduction, a high band gap and a matching work functionto the perovskite. The transmittance of as deposited NiO films by reactivemagnetron sputtered is limited so post deposition annealing is used to increasethe transmittance. This is not possible in this solar cell application as parts ofthe solar cell stack is temperature sensitive.Electrochromic smart windows contain a layer that can change its opticalproperties with the application of a voltage. Such windows are used inbuildings to increase energy efficiency and they contain an electrochromicdevice where NiO is used as an electrode as it has electrochromic properties,but just like with the solar cells, the transmittance of NiO is limited. Thisstudy investigates whether it is possible to make as deposited NiO by reactivemagnetron sputtering transparent, eliminating the need for post depositionannealing. Such a deposition process was found using different sputtermachines with the process point on the edge between metal and oxide modein terms of oxygen flow. This resulted in highly transparent and highlyresistive NiO films with a much higher deposition rate than in oxide mode.

京都大学 / 0048 / 新制・課程博士 / 博士(工学) / 甲第18285号 / 工博第3877号 / 新制||工||1595(附属図書館) / 31143 / 京都大学大学院工学研究科電子工学専攻 / (主査)教授 木本 恒暢, 教授 藤田 静雄, 准教授 掛谷 一弘 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DFAM