The preparation of palladium methoxide complexes was attempted by reacting LiOCH3 with precursors such as Me2- bpyPdCl2 , [(Me2-bpy)Pd(CH3CN)2 J (BF4 )2 and (Me2-bipy)Pd(OAC)2 which have been synthesized for this purpose. Typically the reactions were done on small scale in an NMR tube and monitored spectroscopically. The precursors do not react with methanol, however a broadening peaks is observed at the aromatic region. In deuterated methylene chloride, the precursors and lithium methoxide show similar results. The reaction with LiOCH3 proceeds smoothly in methanol, however it appears to be in equilibrium. In a mixed solvent system, such as methanol/chloroform or methylene chloride,the product appears to decompose. / Master of Science

Gelöster Wasserstoff in Metallen führt in vielen Fällen zu einer Reduzierung der Güte von mechanischen Eigenschaften. Dies äußert sich auf vielfältige Weise und wird unter dem Begriff Wasserstoffversprödung zusammengefasst. Für ein grundlegendes Verständnis dieses Phänomens müssen die Vorgänge im Metall auf mikroskopischer Skala ergründet werden. Im Rahmen dieser Arbeit wurde daher ein Aspekt der Wasserstoffversprödung, die Interaktion von Wasserstoff mit Versetzungen, näher untersucht. Zur Untersuchung des Einflusses von Wasserstoff auf die Versetzungsbildung wurden verschiedene Verformungsexperimente an Palladium und Vanadium durchgeführt. Prinzipielle Vorgänge der Defektbildung wurden durch Versuche an einzelnen Versetzungen unter Verwendung von Nanoindentation und Zugexperimenten im ETEM durchgeführt, um einen breiten Überblick zu erlangen. Zusätzlich wurden zum besseren Verständnis der Vorgänge Molekulardynamiksimulationen von derartigen Versuchen ausgeführt. Zur Untersuchung der Interaktion von Versetzungen miteinander wurden Säulen im Mikrometerbereich verformt und Blech durch Kaltwalzen verformt. Des Weiteren wurde durch Hochdruck-Torsion maximale Verformungen realisiert. Die verwendeten Modellmaterialien erlauben es verschiedene prinzipielle Vorgänge der Defektbildung zu untersuchen und so einen breiten Überblick über prinzipielle Vorgänge im kfz Gitter (Palladium) bzw. krz Gitter (Vanadium) zu erhalten.

Thèse numérisée par la Division de la gestion de documents et des archives de l'Université de Montréal.

L'utilisation des Oxydes de Phosphine Secondaire OPSs en catalyse comme préligand des métaux de transition a connu un regain d'intérêt depuis le début des années 2000. Les complexes organométalliques [M]/OPS ont été utilisés comme catalyseur principalement dans des réactions de couplage ou d'hydrolyse des nitriles. Afin d'étendre le champ d'action des catalyseurs comportant des préligands OPS, nous nous sommes intéressés à ces complexes et avons développé de nouvelles réactions de cycloadditions entre des alcynes terminaux et des dérivés bicycliques [2.2.1]. En utilisant un système catalytique formé in situ à partir d'une source de palladium (II) et d'un oxyde de phosphine secondaire, la réaction de cycloaddition formelle [2+1] entre des esters propargyliques tertiaires et des 8-oxabicyclo[2.2.1]hept-5-ènes conduit à la formation de vinylidènecyclopropanes. Ces produits peuvent subir ultérieurement une réaction d'ouverture/réarrangement du fragment cyclopropyle pour donner des 8-oxabicyclo[3.2.1]oct-6-ènes. Une nouvelle réaction de cycloaddition domino [2+1]/[3+2], catalysée par un complexe [Pt(k2-OAc){(R1R2PO)2H}], entre le norbornadiène et différents éthers ou esters propargyliques a également été développée pour la synthèse de composés tricycliques originaux avec une totale régio- et diastéréosélectivité. / During the past decade, secondary phosphine oxides SPOs have gained increasing interest as preligands of transition metals. Organometallic complexes [M]/SPO have been developed as catalysts in mainly cross-coupling reactions and nitriles hydrolysis. In order to extend the scope of the SPO-based complexes, we have investigated these catalysts and developed new cycloaddition reactions between terminal alkynes and bicyclic[2.2.1] derivatives. A catalytic system prepared in situ from a palladium precursor and a secondary phosphine oxide was found competent to achieve a formal [2+1] cycloaddition between tertiary propargylic carboxylates and 8-oxabicyclo[2.2.1]hept-5-ene derivatives to form vinylidenecyclopropane compounds. Subsequently, these products have been used in a fragmentation sequence in order to prepare 8-oxabicyclo[3.2.1]oct-6-enes.A new domino [2+1]/[3+2] cycloaddition sequence, catalyzed by a [Pt(k2-OAc){(R1R2PO)2H}] complex, between norbornadiene and propargylic esters or ethers have been developed to give original tricyclic compounds with complete regio- and diastereoselectivity.

La récupération et le recyclage des catalyseurs représentent un véritable challenge économique, sanitaire et environnemental. Depuis quelques années, l’utilisation des nanoparticules magnétiques comme support de catalyseurs a émergé comme une voie alternative pour leur recyclage. En effet, les catalyseurs supportés sur des nanoparticules magnétiques peuvent être facilement isolés et recyclés par décantation magnétique avec un simple aimant. Dans ce travail, nous décrivons la synthèse de métallodendrons porteurs de site catalytiques diphosphinopalladium et leur greffage sur des nanoparticules magnétiques cœur-écorce. L’intérêt majeur de ce travail a été de montrer la grande efficacité du recyclage des catalyseurs notamment en milieu aqueux. L’utilisation judicieuse des structures dendritiques a permis d’augmenter la fonctionnalisation de la surface des MNPs. Ceci nous a permis de préparer des catalyseurs supportés très performants dans des réactions de couplage de Suzuki et de Sonogashira / The recovery and recycling of catalysts represent a real challenge for economic, health and environmental reasons. Since few years, the use of magnetic nanoparticles as catalysts supports has emerged as an alternative for their recovery. Indeed, magnetic nanoparticles-supported catalysts could be easily isolated and recycled from the reaction medium by magnetization with a simple magnet. In this work, we report the synthesis of metallodendrons bearing pallado phosphine catalysts and their grafting onto core-shell magnetic nanoparticles. The main interest of this work was to demonstrate the efficiency of the recycling especially in aqueous media. Judicious use of dendritic structures has increased the surface functionalization of nanoparticles. Therefore, it was possible to prepare highly performant catalysts for Suzuki and Sonogashira cross-coupling reactions.

Neste trabalho investigamos a deposição química de filmes finos de cobalto sobre superfícies de lâminas de silício, tipo P (100), previamente ativadas com paládio e estudamos alguns mecanismos químicos envolvidos no processo de deposição química de filmes finos de cobalto. Os filmes de cobalto foram caracterizados quanto sua morfologia utilizando técnicas de Microscopia de Força Atômica (AFM) e Espectrometria de Retroespalhamento de Rutherford (RBS).Estudamos dois tipos de banho para deposição química: Receita 1 (2,0M NH4Cl, 0,005M CoCl2.6H2O, 0,15M NaH2PO2 H2O) e Receita 2 (0,14M Na3C6H5O7, 0,65M (NH4)2SO4, 0,19M CoSO4.7 H2O, 0,28M NaH2PO2 H2O) onde o pH dos banhos foi variado na faixa de 3,7 a 10 através da adição de hidróxido de amônio e a temperatura, na faixa de 65°C a 90°C. Nesta investigação sobre a deposição de cobalto sobre silício tipo P inicialmente foi observado que os sítios de paládio ficam esparsamente distribuídos sobre toda a superfície da lâmina de silício. A receita 1 não permitiu realizar deposição química sobre silício (100) tipo P em amplas faixas de pH e temperatura, com ou sem ativação das superfícies por paládio. Tal fato foi atribuído ao NH4Cl que teve o duplo papel de agente complexante e agente tamponante , fato que inviabilizou a realização da deposição química de cobalto. Por outro lado, a mudança do agente complexante para sulfato de amônio e do agente tamponante, para citrato de sódio, permitiu a realização da deposição química de cobalto em faixas de pH básico (6-10) e temperatura (65°C a 90°C). Surpreendentemente, as maiores taxas de deposição foram obtidas em temperaturas próximas à 80°C e pH próximo a 9,0. Além disso, o aumento da concentração de paládio na superfície, apesar de aumentar a taxa de deposição de cobalto nos instantes iniciais acabou por promover processos de redistribuição de paládio ao longo dos filmes de cobalto depositado. Tal fato foi atribuído a um mecanismo químico concorrente de oxidação tanto do paládio como do cobalto. / We have investigated in this work the electroless deposition processes of cobalt thin films on silicon wafer surfaces, (100) P type, previously activated with palladium and we have studied some chemical mechanisms by which the electroless deposition of cobalt may occur. The morphology of the cobalt thin films were characterized with the aid of atomic force microscope (AFM) and Rutherford Backscattering spectrometry (RBS). We have studied two types of baths for electroless deposition: Recipe 1 (2.0M NH4Cl, 0.005M CoCl2.6H2O, 0.15M NaH2PO2 H2O) and Recipe 2 (0.14M Na3C6H5O7, 0.65M (NH4)2SO4, 0.19M CoSO4.7 H2O, 0.28M NaH2PO2 H2O) where the pH of the baths was varied in the range of 3.7 to 10.0 by adding ammonia hydroxide and temperature, in range of 65°C to 90°C. In this investigation about cobalt electroless deposition on (100) P type silicon, at first, it was observed that the palladium sites were sparsely distributed over the silicon wafer surfaces after pre-activation. Unfortunately, recipe 1 was not adequated because cobalt electroless did not occurr for all ranges of tested pH and temperature and with or without palladium pre-activated. This fact was attributed to the choice of NH4Cl which acts as too efficient complexing and tamponant chemical. On the other hand, the change of the complexing agent to (NH4)2SO4 and the change of the tamponant agent to Na3C6H5O7 allowed one the cobalt electroless deposition for large ranges of alkaline pH (6-10) and temperature (65°C - 90°C). Surprisingly, the higher deposition rates were obtained for temperatures around 80°C and pH next to 9.0. Moreover, the increase of surface palladium concentration has allowed to increase the deposition rate at the early stages of the electroless deposition but, in the following, it promoted redistributions of palladium from the Co/Si interface to the Co body and oxygen incorporation in the Co film together progressive decrease of the Co-film thickness. This observation was attributed to a palladium and cobalt-oxidation mechanism.

Neste trabalho investigamos a deposição química de filmes finos de cobalto sobre superfícies de lâminas de silício, tipo P (100), previamente ativadas com paládio e estudamos alguns mecanismos químicos envolvidos no processo de deposição química de filmes finos de cobalto. Os filmes de cobalto foram caracterizados quanto sua morfologia utilizando técnicas de Microscopia de Força Atômica (AFM) e Espectrometria de Retroespalhamento de Rutherford (RBS).Estudamos dois tipos de banho para deposição química: Receita 1 (2,0M NH4Cl, 0,005M CoCl2.6H2O, 0,15M NaH2PO2 H2O) e Receita 2 (0,14M Na3C6H5O7, 0,65M (NH4)2SO4, 0,19M CoSO4.7 H2O, 0,28M NaH2PO2 H2O) onde o pH dos banhos foi variado na faixa de 3,7 a 10 através da adição de hidróxido de amônio e a temperatura, na faixa de 65°C a 90°C. Nesta investigação sobre a deposição de cobalto sobre silício tipo P inicialmente foi observado que os sítios de paládio ficam esparsamente distribuídos sobre toda a superfície da lâmina de silício. A receita 1 não permitiu realizar deposição química sobre silício (100) tipo P em amplas faixas de pH e temperatura, com ou sem ativação das superfícies por paládio. Tal fato foi atribuído ao NH4Cl que teve o duplo papel de agente complexante e agente tamponante , fato que inviabilizou a realização da deposição química de cobalto. Por outro lado, a mudança do agente complexante para sulfato de amônio e do agente tamponante, para citrato de sódio, permitiu a realização da deposição química de cobalto em faixas de pH básico (6-10) e temperatura (65°C a 90°C). Surpreendentemente, as maiores taxas de deposição foram obtidas em temperaturas próximas à 80°C e pH próximo a 9,0. Além disso, o aumento da concentração de paládio na superfície, apesar de aumentar a taxa de deposição de cobalto nos instantes iniciais acabou por promover processos de redistribuição de paládio ao longo dos filmes de cobalto depositado. Tal fato foi atribuído a um mecanismo químico concorrente de oxidação tanto do paládio como do cobalto. / We have investigated in this work the electroless deposition processes of cobalt thin films on silicon wafer surfaces, (100) P type, previously activated with palladium and we have studied some chemical mechanisms by which the electroless deposition of cobalt may occur. The morphology of the cobalt thin films were characterized with the aid of atomic force microscope (AFM) and Rutherford Backscattering spectrometry (RBS). We have studied two types of baths for electroless deposition: Recipe 1 (2.0M NH4Cl, 0.005M CoCl2.6H2O, 0.15M NaH2PO2 H2O) and Recipe 2 (0.14M Na3C6H5O7, 0.65M (NH4)2SO4, 0.19M CoSO4.7 H2O, 0.28M NaH2PO2 H2O) where the pH of the baths was varied in the range of 3.7 to 10.0 by adding ammonia hydroxide and temperature, in range of 65°C to 90°C. In this investigation about cobalt electroless deposition on (100) P type silicon, at first, it was observed that the palladium sites were sparsely distributed over the silicon wafer surfaces after pre-activation. Unfortunately, recipe 1 was not adequated because cobalt electroless did not occurr for all ranges of tested pH and temperature and with or without palladium pre-activated. This fact was attributed to the choice of NH4Cl which acts as too efficient complexing and tamponant chemical. On the other hand, the change of the complexing agent to (NH4)2SO4 and the change of the tamponant agent to Na3C6H5O7 allowed one the cobalt electroless deposition for large ranges of alkaline pH (6-10) and temperature (65°C - 90°C). Surprisingly, the higher deposition rates were obtained for temperatures around 80°C and pH next to 9.0. Moreover, the increase of surface palladium concentration has allowed to increase the deposition rate at the early stages of the electroless deposition but, in the following, it promoted redistributions of palladium from the Co/Si interface to the Co body and oxygen incorporation in the Co film together progressive decrease of the Co-film thickness. This observation was attributed to a palladium and cobalt-oxidation mechanism.

Les sources secondaires de métaux précieux, tels que les déchets électroniques, ont récemment attiré l’attention générale suite à la sensibilisation sur l’épuissement des ressources naturelles et sur l’industrie du recyclage sur l’emploi et la croissance économique. Developper des technologies de recyclage qui permettent l’extraction de palladium (Pd) et d’or (Au) en très faibles concentrations (10-100 ppm) dans les effluents électroniques s’avère aujourd’hui économiqueemnt viable.Dans ce contexte, notre étude aborde l’utilisation de nanoparticules de ZrO2 modifiées avec des ligands complexants en surface pour capturer efficacement et sélectivement des ions Pd(II) et Au(III) dan les effluents électroniques. Les avantages de l’utilisation de acide thioctique commercial (TOA) par rapport aux acides dialkyldiglycoamide ou (N, N)-dialkylcarbamoylméthylphosphoniques en termes de capacité d’adsorption et de sélectivité ont été démontrés. Des expériences d’adsorption en mode batch combinées à la méthode ICP-OES ont été réalisées et nos résultats ont montré des capacités d’adsorption envers le Pd et l’Au de 6.3 mg/g et de 43 mg/g, respectivement. Les processus d’adsorption suivaient le modèle de Langmuir et les cinétiques chimiques d’adsorption étaient mieux adaptés à l’équation du pseudo-second ordre. Les conditions d’optimisation pour la mise en place du stripping sélectif à l’aide de solutions acidifiées de thiourée ont également été étudiées. En particulier, afin d’améliorer la réutilisation de ce matériau hybride, des processus de modification des surface en deux étapes ont été développés par fonctionnalisation de la surface de nano-ZrO2 avec de l’acide alendronique et par une réaction de couplage peptidique avec du TOA.De plus, les procédés de greffage de nano-ZrO2 sur un textile en polypropylène modifié avec les groupements carboxylique ont été étudiés via des méthodes traditionnelles de revêtement par immersion (dip-coating) et de revêtement couche par couche (LbL). Cette dernière s’est avérée être une méthode prometteuse en termes de flexibilité, de facilité de manipulation et de respect de l’environnment. Les nanocomposites obtenus ont démontré d’excellentes propriétés d’adsorption de Pd et d’Au / Secondary sources of precious metals, such as e-waste, have been recently gaining more attention thanks to raising awareness of natural resources depletion and sound impact of recycling industry on employment and economic growth. Recycling technologies have now to be developed, enabling extraction of very small concentration (10-100 ppm) of precious metals, such as palladium (Pd) and gold (Au), from effluents of recycling factories economically viable.In this context, our study addresses the use of thioctic surface-modified zirconia nanoparticles to capture efficiently and selectively Pd(II) and Au(III) ions from industrial electronic wastewater. The advantages of using the commercial thioctic acid (TOA) over dialkyldiglycoamide or (N,N)-dialkylcarbamoylmethylphosphonic acids ones in terms of adsorption capacity and selectivity were demonstrated. Batch-mode adsorption experiments combined with ICP-OES method were conducted and our findings have displayed adsorption capacities toward Pd and Au of 6.3 mg/g and 43.3 mg/g, respectively. The adsorption processes were found to follow the Langmuir model and adsorption rates were best-fitted to pseudo-second order equation. The optimization conditions for selective stripping set-up using acidified solutions of thiourea were also investigated. Particularly, in order to improve the reusability of this hybrid nanomaterial, two-step surface modification processes were developed through alendronic acid-surface functionalization of nano-ZrO2 and amide coupling reaction with TOA.Furthermore, the grafting processes of nano-ZrO2 onto carboxylic-modified polypropylene textile were studied via traditional dip-coating and layer-by-layer coating methods. It has been realized that layer-by-layer coating method is a promising method in terms of its flexibility, ease of handling, and environmental friendliness

" Hydrodechlorination is the reaction of a chlorinated organic compound (R-Cl) with hydrogen to form a carbon-hydrogen bond and HCl: R-Cl + H2 = R-H + HCl. This reaction is used in refrigerant manufacturing, industrial by-product reclamation and waste management. These practical applications require in-depth understanding of hydrodechlorination reaction. In this research work, we studied four families of chlorinated compounds; CF3CF3-xClx(x=1-3), CH4-xClx (x=1-4), CF4-xClx (x=1-4) and dichloropropanes (1,1-, 1,2-, 1,3-, 2,2-), on supported palladium catalysts to create a theory capable of predicting the hydrodechlorination rate on chlorinated compounds and to explore the reaction mechanism. A possible set of elementary reaction steps of hydrodechlorination reaction was proposed from our kinetics study of all these compounds. In this set of reaction steps, the irreversible scission of the first C-Cl bond in a chlorinated compound was proposed to be the rate-determining step; gas phase H2 and HCl were suggested to be in equilibrium with surface H and Cl species; adsorbed Cl was assumed to be the most abundant surface intermediate. The overall rate of hydrodechlorination reaction could be derived from these reaction steps as r=k'[R-Cl]/(1+K'[HCl]/[H2]0.5). In this rate equation, k'is the product of the adsorption equilibrium constant of the chlorinated compound on catalyst surface times the rate constant for the scission of the first C-Cl bond scission step, and K'is the square root of the equilibrium constant for the equilibrium between H2, HCl and their corresponding surface species: 2HCl + 2* = H2 + 2Cl*. The hydrodechlorination reaction of CF3CFCl2 was performed in the presence of H37Cl to study the reversibility of C-Cl bond scission, and the removal of the first Cl atom from CF3CFCl2 was found to be an irreversible step. Hydrodechlorination experiments of CF3CFCl2 with D2 and HCl mixture revealed that D2 and HCl were in equilibrium with surface adsorbed hydrogen and chlorine during reaction. The forward rate and reverse rate of this equilibrium were at least 400 times higher than the overall hydrodechlorination rate. This result supported the assumption of equilibrium for 2HCl + 2* = H2 + 2Cl*. Additionally, the activation energy for the rate determining step was extracted from hydrodechlorination reaction kinetics results of CH4-xClx (x=1-4), CF4-xClx (x=1-4) and dichloropropanes (1,1-, 1,2-, 1,3-, 2,2-) compounds. It was found that for each of the series compounds, a linear relationship existed between C-Cl bond scission activation energy and gas phase C-Cl bond strength. This observation corroborates our assumption that the removal of the first Cl atom from a chlorinated compound is the rate-determining step in the hydrodechlorination reaction. Thus, all kinetic and isotope experimental results obtained from this study are consistent with the proposed reaction steps for the chlorinated compounds tested. This set of reaction steps can also be used to predict the hydrodechlorination reaction rate of a chlorinated compound, once its gas phase C-Cl bond energy is calculated and the turnover rate of a reference chlorinated compound with similar structure is known. Some work has been done to study hydrodechlorination reaction steps and reaction intermediates beyond the rate-limiting step. Isotope tracing experiments with D2 indicated that CH3-, CH2- groups adjacent to a C-Cl bond could undergo deuterium exchange. The study of reactions steps using ab initio methods, including calculation of rate constants, is also under way. Calculations for the CH4-xClx (x=1-4) family showed that the heat of adsorption and C-Cl bond dissociation energy on a Pd surface were linearly related to their gas phase C-Cl bond strength."

La synthèse totale de la N1999-A2 représente un défi synthétique qui a intéressé plusieurs grandes équipes spécialisées dans ce domaine. L’approche synthétique envisagée repose sur le savoir-faire du laboratoire. Elle permet de former le cœur diènediyne dans les dernières étapes de la synthèse. Nous avons réussi à réaliser le premier couplage des deux synthons clefs, une avancée majeure dans le cadre de notre approche synthétique. Ce travail a aussi permis le développement de nouvelles méthodologies. Notamment les couplages croisés au palladium avec un nouveau type de partenaire électrophile stable : les nosylates d’aryle ou vinyle. Cette découverte permettra de compenser l’instabilité de plusieurs intermédiaires synthétiques clefs (triflates d’énol). / The total synthesis of N1999-A2 is a synthetic challenge which mobilized several renown groups specialized in this field. Our group is also interested in the construction of this complex molecule. Our strategy is based on the know-how of our laboratory. The considered synthetic approach permits the formation of the dienediyne core at the lasts steps of the synthesis. We managed to achieve the first coupling of the two key building blocks. This is a major advance in our synthetic approach. This project also allowed the development of new synthetic methodologies. In particular the palladium catalyzed cross-coupling reactions with aryl and vinyl nosylates, novel stable and reactive electrophilic partners. This discovery will allow us to bypass the extreme instability of several key intermediates (enol triflates).