Two groups of magnetic oxides were investigated in this thesis. Thin films of La2/3Sr1/3MnO3 (LSMO) deposited by pulsed laser deposition (PLD) on SrTiO3 (STO) substrates were characterized by polar and longitudinal magneto-optical (MO) Kerr spectroscopy. Experimental results were compared to theoretical calculations based on the transfer matrix formalism. A very good agreement between experimental and theoretical data revealed high magnetic ordering down to 5 nm of film thickness as well as a mechanism of suppression of double exchange interaction near the LSMO/STO interface. Magnetically doped Ce1-xCoxO2-δ films deposited by PLD on MgO (x = 0.05 and 0.10) and oxidized Si (x = 0.20) substrates were studied by combination of spectroscopic ellipsometry and MO Faraday and Kerr spectroscopy. Both diagonal and off-diagonal permittivity tensor components were obtained and verified by theoretical calculations confronted with experimental data. Diagonal spectra revealed two optical transitions from oxygen to cerium states. Off-diagonal spectra revealed two paramagnetic transitions involving cobalt ions. An essential influence of cobalt doping on the resulting ferromagnetic properties of CeO2 was observed.

Two important mechanisms in preparation of ultrathin films of magnetic oxides were systematically investigated in this work. First, influence of epitaxial strain on resulting magneto-optical properties of La2/3Sr1/3MnO3 (LSMO) ultrathin films was studied. The investigated films were grown by pulsed laser deposition on four different substrates, providing a broad range of induced epitaxial strains. Magnetic properties were found to deteriorate with increasing value of the epitaxial strain, as expected due to the unit cell distortion increasingly deviating from the bulk and effect of the magnetically inert layer. A combination of spectroscopic ellipsometry and magneto-optical Kerr effect spectroscopy was used to determine spectra of the diagonal and off-diagonal elements of permittivity tensor. The off-diagonal elements confirmed presence of two previously reported electronic transitions in spectra of all films. Moreover, they revealed another electronic transition around 4.3 eV only in spectra of films grown under compressive strain. We proposed classification of this transition as crystal field paramagnetic Mn t2g → eg transition, which was further supported by ab initio calculations. A key role of strain in controlling electronic structure of ultrathin perovskite films was demonstrated. Dynamic application of...

Title: Optical and magneto-optical studies of ferrimagnetic garnets for photonic and spintronic applications Author: RNDr. Lukáš Beran Department: Intitute of Physics of Charles University Supervisor: RNDr. Martin Veis, PhD., Institute of Physics of Charles University Abstract: This doctoral thesis is devoted to fabrication and systematic char- acterization of physical properties of thin films of iron garnets with potential applications in photonic and spintronic devices. Investigated samples were pre- pared by metallo-organic decomposition and pulsed laser deposition. The study was focused on structural and magnetic characterizaiton along with optical and magneto-optical properties. Obtained experimental results were further con- fronted with theoretical calculations. The application potencial of garnets for photonic devices was discussed based on determined Figure of Merit (Faraday rotation to optical loss ratio). High values were achieved for single crystal thin film of Ce doped yttrium iron garnet on galium gadolinium garnet substrate as well as for pollycrystalline Bi doped yttrium iron garned on silicon substrate. Furthermore, new rare-earth garnets were prepared with attempt to achieve per- pendicular magnetic anisotropy of these film. This was achieved for three di erent materials, which were not...

Doping allows us to modify semiconductor materials for desired properties such as conductivity, bandgap, and / or lattice parameter. A small portion replacement of the highly mismatched isoelectronic dopants with the host atoms of a semiconductor can result in drastic variation of its structural, optical, and / or electronic properties. Here, the term "mismatch" describes the properties of atom size, ionicity, and / or electronegativity. This thesis presents the fabrication of two kinds of highly mismatched semiconductor alloys, i.e., Ge(1-x)Sn(x) and GaAs(1-x)N(x). The structural and optical properties of the prepared Ge(1-x)Sn(x) and GaAs(1-x)N(x) have been investigated. The results suggest an efficient above-solubility doping induced by non-equilibrium methods of ion implantation and ultrashort annealing. Pulsed laser melting promotes the regrowth of monocrystalline Ge(1-x)Sn(x), whereas flash lamp annealing brings about the formation of high quality GaAs(1-x)N(x) with room temperature photoluminescence. The bandgap modification of Ge(1-x)Sn(x) and GaAs(1-x)N(x) has been verified by optical measurements of spectroscopic ellipsometry and photoluminescence, respectively. In addition, effective defect engineering in GaAs has been achieved by flash lamp annealing, by which a quasi-temperature-stable photoluminescence at 1.3 µm has been obtained. / Dotierung ermöglicht es, die Eigenschaften von Halbleitermaterialien, wie Leitfähigkeit, aber auch Bandabstand und / oder Gitterkonstanten gezielt zu verändern. Wenn ein Halbleiter mit einer kleinen Menge unterschiedliche Fremdatome dotiert wird, kann dies in einer drastischen Modifikation der strukturellen, optischen und / oder elektronischen Eigenschaften resultieren. Der Begriff "unterschiedlich" bedeutet hier die Eigenschaften von Atomgröße, Ioniztät und / oder Elektronegativität. Diese Doktorarbeit beschreibt die Herstellung von zwei Arten von stark fehlangepassten Halbleiterlegierungen: Ge(1-x)Sn(x) und GaAs(1-x)N(x). Die strukturellen und optischen Eigenschaften von Ge(1-x)Sn(x) und GaAs(1-x)N(x) wurden untersucht. Die Ergebnisse deuten auf eine effiziente Dotierung oberhalb der Löslichkeit, induziert durch die Nicht-Gleichgewichtsverfahren Ionenimplantation und Ultrakurzzeit-Ausheilung. Gepulstes Laserschmelzen ermöglicht das Nachwachsen von monokristallinem Ge(1-x)Sn(x), während die Blitzlampenausheilung in der Bildung von GaAs(1-x)N(x) hoher Qualität mit Photolumineszenz bei Raumtemperatur resultiert. Die Änderung der Bandlücke von Ge(1-x)Sn(x) und GaAs(1-x)N(x) wurde durch die optischen Methoden der spektroskopischen Ellipsometrie und Photolumineszenz verifiziert. Darüber hinaus konnte in ausgeheiltem GaAs eine quasi-temperaturstabile Photolumineszenz bei 1,3 µm beobachtet werden.

NiTi alloys with nearly equiatomic chemical composition are the most studied and the most practically utilized materials from the group of the shape memory alloys (SMA). The NiTi alloy has a thermoelastic martensitic transfor- mation (MT), which its two most important properties are based on: the shape memory and the superelasticity. Thin films of NiTi alloys with thicknesses from hundreds of nm to units of µm have a wide use mainly in microelectromechanical systems (MEMS). The doctoral thesis deals with a fabrication of thin NiTi films using a deposition on silicon substrates with two techniques - the magnetron sputtering and the pulsed-laser deposition (PLD), an investigation of their mi- crostructure using x-ray diffraction, a heat treatment of amorphous NiTi films and with a verification of MT using resistometry. Furthermore, thermomechan- ical properties of a system NiTi-polyimide (NiTi-PI), namely a dependence of a curvature radius of a NiTi-PI bilayer on temperature, are studied. 1

<p> Optical metamaterials have triggered extensive studies driven by their fascinating electromagnetic properties that are not observed in natural materials. Aside from the extraordinary progress, challenges remain in scalable processing and material performance which limit the adoption of metamaterial towards practical applications. The goal of this dissertation is to design and fabricate nanocomposite thin films by combining nitrides with a tunable secondary phase to realize controllable multi-functionalities towards potential device applications. Transition metal nitrides are selected for this study due to the inherit material durability and low-loss plasmonic properties that offer stable two-phase hybridization for potential high temperature optical applications. Using a pulsed laser deposition technique, the nitride-metal nanocomposites are self-assembled into various geometries including pillar-in-matrix, embedded nanoinclusions or complex multilayers, that possess large surface coverage, high epitaxial quality, and sharp phase boundary. The nanostructures can be further engineered upon precise control of growth parameters. </p><p> This dissertation is composed of a general review of related background and experimental approaches, followed by four chapters of detailed research chapters. The first two research chapters involve hybrid metal (Au, Ag) - titanium nitride (TiN) nanocomposite thin films where the metal phase is self-assembled into sub-20 nm nanopillars and further tailored in terms of packing density and tilting angles. The tuning of plasmonic resonance and dielectric constant have been achieved by changing the concentration of Au nanopillars, or the tuning of optical anisotropy and angular selectivity by changing the tilting angle of Ag nanopillars. Towards applications, the protruded Au nanopillars are demonstrated to be highly functional for chemical bonding detection or surface enhanced sensing, whereas the embedded Ag nanopillars exhibit enhanced thermal and mechanical stabilities that are promising for high temperature plasmonic applications. In the last two chapters, dissimilar materials candidates beyond plasmonics have been incorporated to extend the electromagnetic properties, include coupling metal nanoinclusions into a wide bandgap semiconducting aluminum nitride matrix, as well as inserting a dielectric spacer between the hybrid plasmonic claddings for geometrical tuning and electric field enhancement. As a summary, these studies present approaches in addressing material and fabrication challenges in the field of plasmonic metamaterials from fundamental materials perspective. As demonstrated in the following chapters, these hybrid plasmonic nanocomposites provide multiple advantages towards tunable optical or biomedical sensing, high temperature plasmonics, controllable metadevices or nanophotonic chips.</p><div><br></div>

Deux mécanismes importants reliant la préparation des couches ultraminces d’oxydes magnétiques à leurs propriétés physiques ont été étudiés dans ce travail. En premier lieu, l’influence de la contrainte épitaxiale sur les propriétés magnéto-optiques de la manganite La₂/₃Sr₁/₃MnO₃ (LSMO) a été étudiée. Les couches ultraminces ont été déposées par ablation laser pulsé sur quatre substrats différents, ce qui a fourni différentes valeurs statiques de la contrainte épitaxiale. Les propriétés magnétiques ont été révélées comme se détériorant avec l’augmentation de la contrainte, ce qui était prévisible à cause de la distorsion grandissante de la maille unitaire ainsi qu’à cause de l’effet de la couche magnétiquement inerte. La combinaison de l’ellipsométrie spectroscopique et de la spectroscopie Kerr magnéto-optique a été utilisée afin de déterminer les spectres des éléments diagonaux et non diagonaux du tenseur de permittivité. L’étude des éléments non-diagonaux a confirmé la présence déjà rapportée de deux transitions électroniques dans les spectres de toutes les couches. De plus, elle a révélé une autre transition électronique autour de l’énergie de 4.3 eV, mais seulement dans les spectres des couches déposées avec une contrainte compressive. Nous avons proposé la classification de cette transition comme une transition paramagnétique du champ cristallin Mn t2g → eg. Cette classification a été confortée par des calculs ab initio. Nous avons ainsi montré le rôle clé de la contrainte dans le contrôle des propriétés magnéto-optiques des couches pérovskites ultraminces. En revanche, l’application dynamique de la contrainte par l’utilisation d’une sous-couche piézoélectrique est restée peu concluante. Le transfert de la contrainte entre la sous-couche piézoélectrique et la couche LSMO nécessite des améliorations ultérieures. En second lieu, l’influence de la désorientation du substrat a été étudiée par rapport à la dynamique de l’aimantation dans l’oxyde SrRuO₃ (SRO). Comme attendu, nous avons trouvé qu’un grand angle de désorientation mène à la suppression de la croissance de plusieurs variants cristallographiques du SRO. Au moyen de la microscopie à force magnétique, nous avons montré que la présence de plusieurs variants de SRO mène à l’augmentation de la densité de défauts agissant comme points d’ancrage ou de nucléation pour les domaines magnétiques. Nous avons donc montré que l’emploi d’un substrat vicinal est important pour la fabrication des couches ultraminces de SRO de haute qualité, avec une faible densité de défauts cristallographiques et d’excellentes propriétés magnétiques. / Two important mechanisms in preparation of ultrathin films of magnetic oxides were systematically investigated in this work. First, influence of epitaxial strain on resulting magneto-optical properties of La₂/₃Sr₁/₃MnO₃ (LSMO) ultrathin films was studied. The investigated films were grown by pulsed laser deposition on four different substrates, providing a broad range of induced epitaxial strains. Magnetic properties were found to deteriorate with increasing value of the epitaxial strain, as expected due to the unit cell distortion increasingly deviating from the bulk and effect of the magnetically inert layer. A combination of spectroscopic ellipsometry and magneto-optical Kerr effect spectroscopy was used to determine spectra of the diagonal and off-diagonal elements of permittivity tensor. The off-diagonal elements confirmed presence of two previously reported electronic transitions in spectra of all films. Moreover, they revealed another electronic transition around 4.3 eV only in spectra of films grown under compressive strain. We proposed classification of this transition as crystal field paramagnetic Mn t2g → eg transition, which was further supported by ab initio calculations. A key role of strain in controlling electronic structure of ultrathin perovskite films was demonstrated. Dynamic application of strain via use of piezoelectric underlayer remained inconclusive, requiring further improvement of the strain transfer from the piezoelectric layer into the LSMO. Second, influence of substrate miscut on magnetization dynamics in SrRuO₃ (SRO) was studied. As expected we found that high miscut angle leads to suppression of multi-variant growth. By means of magnetic force microscopy we showed that presence of multiple SRO variants leads to higher density of defects acting as pinning or nucleation sites for the magnetic domains, which consequently results in deterioration of magnetic properties. We demonstrated that use of vicinal substrate with high miscut angle is important for fabrication of high quality SRO ultrathin films with low density of crystallographic defects and excellent magnetic properties.

Intermediate band (IB) materials have attracted considerable research interest since they can dramatically enhance the near infrared light absorption and lead to applications in the fields of so-called intermediate band solar cells or infrared photodetectors. Hyperdoping Si with deep level impurities is one of the most effective approaches to form an IB inside Si. In this thesis, titanium (Ti) or chalcogen doped Si with concentrations far exceeding the Mott transition limits (~ 5×10^19 cm-3 for Ti) are fabricated by ion implantation followed by pulsed laser annealing (PLA) or flash lamp annealing (FLA). The structural and electrical properties of the implanted layer are investigated by channeling Rutherford backscattering spectrometry (cRBS) and Hall measurements. For Si supersaturated with Ti, it is shown that Ti-implanted Si after liquid phase epitaxy shows cellular breakdown at high doping concentrations during the rapid solidification, preventing Ti incorporation into Si matrix. However, the out-diffusion and the cellular breakdown can be effectively suppressed by solid phase epitaxy during FLA, leading to a much higher Ti incorporation. In addition, the formed microstructure of cellular breakdown also complicates the interpretation of the electrical properties. After FLA, the samples remain insulating even with the highest Ti implantation fluence, whereas the sheet resistance decreases with increasing Ti concentration after PLA. According to the results from conductive atomic force microscopy (C-AFM), the decrease of the sheet resistance after PLA is attributed to the percolation of Ti-rich cellular walls, but not to the insulator-to-metal transition due to Ti-doping. Se-hyperdoped Si samples with different Se concentrations are fabricated by ion implantation followed by FLA. The study of the structural properties of the implanted layer reveals that most Se atoms are located at substitutional lattice sites. Temperature-dependent sheet resistance shows that the insulator-to-metal transition occurs at a Se peak concentration of around 6.3 × 10^20 cm-3, proving the formation of an IB in host semiconductors. The correlation between the structural and electrical properties under different annealing processes is also investigated. The results indicate that the degrees of crystalline lattice recovery of the implanted layers and the Se substitutional fraction depend on pulse duration and energy density of the flash. The sample annealed at short pulse durations (1.3 ms) shows better conductivity than long pulse durations (20 ms). The electrical properties of the hyperdoped layers can be well-correlated to the structural properties resulting from different annealing processes.:Chapter 1 Introduction 1 1.1 Shallow and Deep level impurities in semiconductors 1 1.2 Challenges for hyperdoping semiconductors with deep level Impurities 2 1.3 Solid vs. liquid phase epitaxy 5 1.4 Previous work 7 1.4.1 Transition metal in Si 7 1.4.2 Chalcogens in Si 10 1.5 The organization of this thesis 15 Chapter 2 Experimental methods 18 2.1 Ion implantation 18 2.1.1 Basic principle of ion implantation 18 2.1.2 Ion implantation equipment 19 2.1.3 Energy loss 20 2.2 Pulsed laser annealing (PLA) 23 2.3 Flash lamp annealing (FLA) 24 2.4 Rutherford backscattering and channeling spectrometry (RBS/C) 27 2.4.1 Basic principles 27 2.4.2 Analysis of the elements in the target 28 2.4.3 Channeling and RBS/C 29 2.4.4 Analysis of the impurity lattice location 31 2.5 Hall measurements 31 2.5.1 Sample preparation 32 2.5.2 Resistivity 32 2.5.3 Hall measurements 33 Chapter 3 Suppressing the cellular breakdown in silicon supersaturated with titanium 34 3.1 Introduction 34 3.2 Experimental 35 3.3 Results 36 3.4 Conclusions 42 Chapter 4 Titanium-implanted silicon: does the insulator-to-metal transition really happen? 44 4.1 Introduction 44 4.2 Experimental section 45 4.3 Results 47 4.3.1 Recrystallization of Ti-implanted Si 47 4.3.2 Lattice location of Ti impurities 48 4.3.3 Electrical conduction 50 4.3.4 Surface morphology 52 4.3.5 Spatially resolved conduction 53 4.4 Discussion 55 4.5 Conclusion 56 Chapter 5 Realizing the insulator-to-metal transition in Se hyperdoped Si via non-equilibrium material processing 57 5.1 Introduction 57 5.2 Experimental 59 5.3 Results 60 5.4 Conclusions 65 Chapter 6 Structural and electrical properties of Se-hyperdoped Si via ion implantation and flash lamp annealing 67 6.1 Introduction 67 6.2 Experimental 68 6.3 Results 69 6.4 Conclusions 76 Chapter 7 Summary and outlook 78 7.1 Summary 78 7.2 Outlook 81 References 83 Publications 89

The Pulsed Laser Deposition is an established method for the preparation of thin films and nm layer systems. In this work a cross beam PLD system is used as a special development for reduction of macro particle contamination in the growing layer. Two plasma plumes which overlap under a defined angle are produced on separated targets by two synchronized lasers. In the overlapping zone the direction of plasma expansion is changed by interaction of plasma particles. A diaphragm is used to guaranty that only the part of the plasma is deposited on the substrate that has changed the direction of expansion in the interaction zone. Detailed characterizations of plasma properties, deposition and growth conditions were carried out to demonstrate that cross beam PLD is an effective method to reduce macro particle contamination and allows layer growth under reduced energetic loading of the substrate. In the second part of this work cross beam PLD is used to produce Ni/C multilayers and artificial mixtures. The interest is focused on the mechanisms of layer disintegration and structure formation under thermal loading. Possible processes for layer disintegration are discussed on a theoretical background and verified in TEM examinations. / Die Pulsed Laser Deposition ist ein etabliertes Verfahren zur Herstellung dünner Schichten im nm-Bereich. Das in dieser Arbeit verwandte PLD-Zweistrahlverfahren ist eine besondere Entwicklung zur Verringerung der Makropartikelkontamination der Schichten. Zwei synchronisierte Laser erzeugen auf zwei benachbarten Targets zwei Plasmafackeln, die unter einem bestimmten Winkel überlappen, was zu einer Änderung der Ausbreitungsrichtung des Palmas führt. Ein spezielle Blendenanordnung garantiert, dass nur der abgelenkte Teil des Plasmas auf dem Substrat abgeschieden wird, welches für die anfänglichen Plasmafackeln im Schatten liegt. Anhand einer umfangreichen Charakterisierung der Plasma-, Abscheide- und Schichtwachstumseigenschaften wird gezeigt, dass das PLD-Zweistrahlverfahren eine effektive Verminderung der Makropartikelkontamination der Schichten ermöglicht und dass das Schichtwachstum unter deutlich verringertem Energieeintrag im Vergleich zur konventionellen PLD erfolgt. Das Verfahren wird im zweiten Teil der Arbeit angewandt um Ni/C-Multischichten und künstliche Mischungen herzustellen. Das Interesse liegt hierbei auf den Mechanismen des Schichtzerfalls und auf den entstehenden Strukturen bei thermischer Behandlung metastabiler Schichtsysteme. Anhand theoretischer Betrachtungen werden die möglichen Prozess des Schichtzerfalls eingegrenzt und mittels TEM-Untersuchungen verifiziert.

Supersaturated substitutional alloys formed by ion implantation and rapid liquid-phase epitaxial regrowth induced by pulsed-laser annealing have been studied using Rutherford-backscattering and ion-channeling analysis. A series of impurities (As, Sb, Bi, Ga, In, Fe, Sn, Cu) have been implanted into single-crystal (001) orientation silicon at doses ranging from 1 x 10^15/cm2 to 1 x 10^17/cm2. The samples were subsequently annealed with a Ω-switched ruby laser (energy density ~1.5 J/cm2, pulse duration 15 x 10-9 sec). Ion-channeling analysis shows that laser annealing incorporates the Group III (Ga, In) and Group V (As, Sb, Bi) impurities into substitutional lattice sites at concentrations far in excess of the equilibrium solid solubility. Channeling measurements indicate the silicon crystal is essentially defect free after laser annealing. The maximum Group III and Group V dopant concentrations that can be incorporated into substitutional lattice sites are determined for the present laser-annealing conditions. Dopant profiles have been measured before and after annealing using Rutherford backscattering. These experimental profiles are compared to theoretical model calculations which incorporate both dopant diffusion in liquid silicon and a distribution coefficient (k') from the liquid. It is seen that a distribution coefficient (k') far greater than the equilibrium value (k0) is required for the calculation to fit the experimental data. In the cases of Fe, Zn, and Cu, laser annealing causes the impurities to segregate toward the surface. After annealing, none of these impurities are observed to be substitutional in detectable concentrations. The systematics of these alloys systems are discussed.