The goal of this work was to evaluate the electrochemical properties of TiZrNbTa thin films deposited by magnetron sputtering using an industrial physical vapor deposition system. Samples were deposited on both Si(001) and 316L stainless steel. The samples deposited on Si(001) were either crystalline (bcc reflections) or amorphous, depending on the sputtering parameters. The crystalline films were composed of thin films with two different layers. The upper layer was nanocolumnar composed of elongated nanocolumns, while the lower was dense. The amorphous films had only one nanocolumnar layer and higher porosity. Polarization curves revealed that all samples had low corrosion current densities, in the order of 10-8 A/cm2. The samples showed an extended passive region up to 3.0 V vs Ag/AgCl due to the growth of a passivating oxide. The surface of the samples consisted of Nb2O5, ZrO2, TiO2 and Ta2O5. The chronoamperometry tests showed current oscillations, related to a break-down and reformation of the passive film. Electrochemical impedance spectroscopy revealed that all samples behaved similarly in all three electrolytes, and the simulated electrical circuits were indicating no corrosion reactions. A decrease in capacitance values after polarization was observed and was related to the formed surface oxide. Samples deposited on 316L stainless steel showed a passive regime for a shorter potential window, probably related to surface defects of the films. Heat treatments at 400 and 800 Celsius for 20 hours could not trigger the phase transformation from single bcc to hcp or dual bcc, as predicted by the Thermo-Calc software.

In this thesis, growth of ZrB2 thin films by direct current magnetron sputtering is investigatedusing a high vacuum industrial scale deposition system and an ultra-high vacuum laboratory scalesystem. The films were grown from ZrB2 compound targets at temperatures ranging from ambient (without external heating) to 900 °C and with substrate biases from -20 to -120 V. Short deposition times of typically 100 or 300 s and high growth rates of 80-180 nm/min were emphasized to yield films with thicknesses of 300-400 nm. The films were characterized by thinfilm X-ray diffraction with the techniques θ/2θ and ω scans, pole figure measurements andreciprocal space mapping, scanning and transmission electron microscopy, elastic recoil detection analysis and four point probe measurements. The substrates applied were Si(100), Si(111),4H-SiC(0001) and GaN(0001) epilayers grown on 4H-SiC. The Si(111), 4H-SiC(0001) substrates and GaN(0001) epilayers were chosen given their small lattice mismatches to ZrB2 making them suitable for epitaxial growth.The films deposited in the industrial system were found to be close to stoichiometric with a low degree of contaminants, with O being the most abundant at a level of < 1 at.%. Furthermore, the structure of the films is temperature dependent as films deposited in this system without external heating are fiber textured with a 0001-orientation while the films deposited at 550 °C exhibitrandom orientation. In contrast, epitaxial growth was demonstrated in the laboratory scale system on etched 4H-SiC(0001) and Si(111) deposited at 900 °C following outgassing of the substrates at 300 °C and in-situ heat treatment at the applied growth temperature to remove the native oxides. However, films grown on GaN(0001) were found to be 0001 textured at the applied deposition conditions, which make further studies necessary to enable epitaxial growth on this substrate material. Four point probe measurements on the films deposited in the industrial system show typical resistivity values ranging from ˜95 to 200 μΩcm with a trend to lower values for the films deposited at higher temperatures and at higher substrate bias voltages.

Ferroelectrics are a group of advanced electronic materialswith a wide variety of properties useful in applications suchas memory devices, resonators and filters, infrared sensors,microelectromechanical systems, and optical waveguides andmodulators. Among the oxide perovskite-structured ferroelectricthin film materials sodium potassium niobate or Na0.5K0.5NbO3(NKN) has recently emerged as one of the most promisingmaterials in microwave applications due to high dielectrictunability and low dielectric loss. This licentiate thesispresents results on growth and structural, optical, andelectrical characterization of Na0.5K0.5NbO3 thin films. Thefilms were deposited by rf-magnetron sputtering of astoichiometric, high density, ceramic Na0.5K0.5NbO3 target ontosingle crystal LaAlO3 and Al2O3, and polycrystalline Pt80Ir20substrates. By x-ray diffractometry, NKN films on c-axisoriented LaAlO3 substrates were found to grow epitaxially,whereas films on hexagonal sapphire and polycrystallinePt80Ir20 substrates were found to be preferentially (00l)oriented. Optical and waveguiding properties of theNa0.5K0.5NbO3/Al2O3 heterostructure were characterized using aprism-coupling technique. Sharp and distinguishable transversemagnetic (TM) and electric (TE) propagation modes wereobserved. The extraordinary and ordinary refractive indiceswere calculated to ne = 2.216±0.003 and no =2.247±0.002 for a 2.0 μm thick film at λ = 632.8nm. This implies a birefringence Δn = ne - no =-0.031±0.003 in the film. The ferroelectric state inNKN/Pt80Ir20 films at room temperature was indicated by apolarization loop with polarization as high as 33.4 μC/cm2at 700 kV/cm, remnant polarization of 9.9 μC/cm2 andcoercive field of 91 kV/cm. Current-voltage characteristics ofvertical Au/NKN/Pt80Ir20 capacitive cells and planar Au/NKN/LaAlO3 interdigital capacitors (IDCs) showed very goodinsulating properties, with the leakage current density for anNKN IDC on the order of 30 nA/cm2 at 400 kV/cm. Rf dielectricspectroscopy demonstrated low loss, low frequency dispersion,and high voltage tunability. At 1 MHz NKN/LaAlO3 showed adissipation factor tan δ of 0.010 and a tunability of 16.5% at 200 kV/cm. For the same structure the frequencydispersion, Δεr, between 1 kHz and 1 MHz was 8.5%. <b>Key words:</b>ferroelectrics, sodium potassium niobates,thin films, rf-magnetron sputtering, waveguiding, refractiveindex, prism coupling, dielectric tunability / NR 20140805

This past decade, 2D materials beyond graphene, and most specifically transition metal dichalcogenides (TMDCs) have gained remarkable attention due to their novel applications in electronics and optoelectronics applications. This work reports large-area growth and structural, optical, and electronic transport properties of few-layer MoS2 thin films fabricated using a hybrid approach based on the magnetron sputtering method. In the first part of this dissertation, properties of optimally annealed MoS2 on different substrates such as amorphous BN, SiO2, Si, Al2O3 are discussed using diffraction, spectroscopic, and transport techniques. Later, we show that the physical properties of large-area sputtered MoS2 thin films can be dramatically improved by an ex-situ high-temperature sulfurization process as it leads to the formation of defect-free MoS2 by removing sulfur vacancies. Sharp film-substrate interface along with high bulk structural order is demonstrated as inferred from diffraction and spectroscopic methods. We show that sulfur vacancies can obscure the MoS2 A-B exciton peaks along with a sharp increase in dc conductivity of MoS2. In the last part of my dissertation, we outline the growth of a novel thermoelectric material (SnSe) and new magnetic inverse-Heuslers (of nominal composition MnxFeSi) using the co-sputtering method. These are some of the first attempts, to our knowledge, to grow such materials in thin-film form. Detailed structure-property relations are thoroughly discussed.

High Power Impulse Magnetron Sputtering (HiPIMS) comes as a new and promising PVD method for the development of high-performance coatings for cutting applications. This technique utilizes high energy and ionization which can produce a denser and stronger ceramic in comparison to traditional deposition techniques. Important coating characteristics that arise from this method such as enhanced hardness, adhesion, and less defects, can be applied when machining hard-to-cut materials. In this study, investigation of tool life and wear mechanisms, mechanical and physical properties of AlTiN coatings deposited on carbide tools by HiPIMS and Cathodic Arc Evaporation (CAE) were analyzed when machining Inconel 718 and Stainless Steel 304. Experimental turning tests were performed to evaluate tool life, and the wear mechanisms were analyzed by optical and scanning electron microscopy. Nanohardness, scratch test, fracture toughness and other methods were carried out to evaluate the coating properties. Impedance experiments were performed to determine the coating porosity and resistance to corrosion. The results showed that HiPIMS coating presented higher hardness, toughness to fracture and adhesion to the substrate in comparison to CAE coatings. The HiPIMS coated tool substantially improved tool life when machining Inconel. The dominant wear mechanism found was abrasion, which is induced by the presence of hard carbides. The main wear patterns observed were flank, notch, and crater wear. The tool performance of HiPIMS was found to have enhanced mechanical properties, lower porosity, and form a larger amount of tribo-oxides when machining, in comparison to CAE. / Thesis / Master of Applied Science (MASc)

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Neste trabalho é apresentado um estudo sobre a produção e caracterização do nitreto de alumínio (AlN) obtido pela técnica de r.f. Magnetron Sputtering reativo. Aqui reportamos o efeito dos parâmetros de deposição, como densidade de potência de r.f., temperatura e pressão de processo nas propriedades estruturais, morfológicas e elétricas dos filmes de AlN obtidos. Foram realizados estudos sobre os modos vibracionais, pela técnica de espectroscopia de infravermelho por transformada de Fourier (FTIR), das orientações cristalográficas por difração de raios X e da morfologia da superfície pela técnica de microscopia de força atômica (AFM). Estes estudos nos permitiram produzir filmes finos de AlN com uma alta orientação na direção cristalográfica [002] com uma potência de r.f. de 1,23 W/cm2 , uma temperatura de deposição de 200°C e uma pressão de processo de 2 mTorr. Este estudo nos permitiu fabricar filmes de AlN com alta orientação [002] à temperatura ambiente a partir de um alvo de Al. O coeficiente piezoelétrico d33 variou de aproximadamente 4 a 6 pm/V e o d31 2 a 3 pm/V para filmes cristalinos e d33 3 pm/V e d31 1,5 pm/V para filmes amorfos. Os coeficientes piezoelétricos d33 and d31 foram estimados pelo método capacitivo proposto por Mahmoud Al Ahmad and Robert Plana, através da variação das dimensões geométricas induzidas pelo campo elétrico aplicado. / In this work we present a study about the production and characterization of aluminum nitride (AlN) obtained by r.f. Reactive Magnetron Sputtering. Here we report the effect of the deposition parameters, such as r.f. power density, and deposition temperature and pressure, on the morphological, structural and electrical properties of the obtained AlN thin films. In this work we have performed studies concerning the vibrational modes by Fourier Transform Infrared Absorption technique (FTIR), the crystallographic orientations by X-ray diffraction and the surface morphology by Atomic Force Microscopy (AFM). This study allowed us to produce high oriented [002] AlN thin films with a r.f. power density of 1.23 W/cm2, a deposition temperature of 200ºC and a process pressure of 2 mTorr. This study allowed us to produce high oriented [002] AlN thin films at room temperature from a pure Al target. The piezoelectric coefficient d33 was around 4 to 6 pm/V and d31 2 to 3 pm/V to crystalline films and d33 3 pm/V and d31 1.5 pm/V amorphous ones. d33 and d31 piezoelectric coefficients were estimated by the capacitive method proposed by Mahmoud Al Ahmad and Robert Plana, through its geometrical dimensions variation.