Wide bandgap (WBG) semiconductor devices are becoming increasing popular in power electronics applications. However, WBG semiconductor devices generate a substantial amount of conducted electromagnetic interference (EMI) compared to silicon (Si) devices due to their ability to operate at higher switching frequencies, higher operating voltages and faster slew rates. This thesis explores and analyzes EMI mitigation techniques that can be applied to a power module architecture at the packaging level. In this thesis, the EMI footprint of four different module architectures is measured experimentally. A time domain LTspice simulation model of the experimental test setup is then built. The common mode (CM) EMI emissions that escape the baseplate of the module into the converter is then examined through the simulation. The simulation is used to explore the CM noise footprint of eight additional module architectures that were found in literature. The EMI trends and the underlying mitigation principle for the twelve modules is explained by highlighting key differences in the architectures using common mode equivalent modelling and substitution and superposition theorem. The work aims to help future module designers by not only comparing the EMI performance of the majority of module architectures available in literature but by also providing an analysis methodology that can be used to understand the EMI behavior of any new module architecture that has not been discussed. Although silicon carbide (SiC) modules are used for this study, the results are applicable for any WBG device. / M.S. / As society moves towards the electric grid of the future, there have been increasing calls for high efficiency, high power density, and low electromagnetic interference (EMI) power electronic converters. EMI is a big problem when using wide-bandgap (WBG) devices as these devices can switch very quickly and handle higher voltages when compared to silicon devices. In this study, ways to reduce EMI in a WBG power module through twelve different types of packaging are explored. Four WBG power modules are designed and fabricated in the lab, whereas a simulation model was created to study the EMI behavior of the remaining eight power module. The EMI behavior of these modules is explained using common mode (CM) equivalent modeling and substitution and superposition theorem. This study is important because WBG devices are becoming more and more popular in power electronic applications. The author hopes the findings and analysis presented in this paper can help future module designers reduce the EMI footprint of modules they design.

A study of three novel solar cells is presented, all of which incorporate a low-dimensional quantum confined component in a bid to enhance device performance. Firstly, intermediate band solar cells (IBSCs) based on InAs quantum dots (QDs) in a GaAs p-i-n structure are studied. The aim is to isolate the InAs QDs from the GaAs conduction band by surrounding them with wider band gap aluminium arsenide. An increase in open circuit voltage (V_OC) and decrease in short circuit current (J_sc) is observed, causing no overall change in power conversion efficiency. Dark current - voltage measurements show that the increase in V_OC is due to reduced recombination. Electroreflectance and external quantum efficiency measurements attribute the decrease in J_sc primarily to a reduction in InGaAs states between the InAs QD and GaAs which act as an extraction pathway for charges in the control device. A colloidal quantum dot (CQD) bulk heterojunction (BHJ) solar cell composed of a blend of PbS CQDs and ZnO nanoparticles is examined next. The aim of the BHJ is to increase charge separation by increasing the heterojunction interface. Different concentration ratios of each phase are tested and show no change in J_sc, due primarily to poor overall charge transport in the blend. V_OC increases for a 30 wt% ZnO blend, and this is attributed largely to a reduction in shunt resistance in the BHJ devices. Finally, graphene is compared to indium tin oxide (ITO) as an alternative transparent electrode in squaraine/ C₇₀ solar cells. Due to graphene’s high transparency, graphene devices have enhanced J_sc, however, its poor sheet resistance increases the series resistance through the device, leading to a poorer fill factor. V_OC is raised by using MoO₃ as a hole blocking layer. Absorption in the squaraine layer is found to be more conducive to current extraction than in the C₇₀ layer. This is due to better matching of exciton diffusion length and layer thickness in the squaraine and to the minority carrier blocking layer adjacent to the squaraine being more effective than the one adjacent to the C₇₀.

This thesis is concerned with the influence of nanoscale boundaries and interfaces upon the electronic processes that occur within the inorganic semiconductors. Inorganic semiconductor nanowires and their blends with semiconducting polymers have been investigated using state-of-the-art ultrafast optical techniques to provide information on the sub-picosecond to nanosecond photoexcitation dynamics in these systems. Chapters 1 and 2 introduce the theory and background behind the work and present a literature review of previous work utilising nanowires in hybrid organic photovoltaic devices, revealing the performances to date. The experimental methods used during the thesis are detailed in Chapter 3. Chapter 4 describes the crucial roles of surface passivation on the ultrafast dynamics of exciton formation in gallium arsenide (GaAs) nanowires. By passivating the surface states of nanowires, exciton formation via the bimolecular conversion of electron-hole plasma can observed over few hundred picoseconds, in-contrast to the fast carrier trapping in 10 ps observed in the uncoated nanowires. Chapter 5 presents a novel method to passivate the surface-states of GaAs nanowires using semiconducting polymer. The carrier lifetime in the nanowires can be strongly enhanced when the ionization potential of the overcoated semiconducting polymer is smaller than the work function of the nanowires and the surface native oxide layers of nanowires are removed. Finally, Chapter 6 shows that the carrier cooling in the type-II wurtzite-zincblend InP nanowires is reduced by order-of magnitude during the spatial charge-transfer across the type-II heterojunction. The works decribed in this thesis reveals the crucial role of surface-states and bulk defects on the carrier dynamics of semiconductor nanowires. In-addition, a novel approach to passivate the surface defect states of nanowires using semiconducting polymers was developed.

Semi conductors are of technological importance and attracted many of the re-searchers. ZnO belongs to the family of II-VI semiconductors and has material properties well suitable to UV light emitters, varistors, Schottky diodes, gas sensors, spintronics, ferroelectric devices and thin film transistors. It has been considered as a competitor to GaN, which belongs to the family of III-V semiconductors. This is due to the fact that ZnO of high quality can be deposited at lower growth temperatures than GaN, leading to the possibility of transparent junctions on less expensive substrates such as glass. This will lead to low-cost UV lasers with important applications in high-density data storage systems etc. One of the most popular growth techniques of ZnO is physical sputtering. As compared to sol-gel and chemical-vapor deposition, the magnetron sputtering is a preferred method because of its simplicity and low operating temperatures. Hence, detailed investigations were carried out on undoped and doped ZnO thin films primarily deposited by magnetron sputtering. The obtained results in the present work are presented in the form of a thesis. Chapter 1: A brief discussion on the crystal structure of ZnO material and its possible applications in the different areas such as Schottky diodes, spintronics, ferroelectric devices and thin film transistors are presented. Chapter 2: This chapter deals with various deposition techniques used in the present study. It includes the magnetron sputtering, thermal oxidation, pulsed-laser ablation and sol-gel technique. The experimental set up details and the deposition procedures are described in detail i.e., the deposition principle and the parameters that will affect the film properties. A brief note on the structural characterization equipments namely, X-ray diffraction, scanning electron microscopy, atomic force microscopy, transmission electron microscopy and the optical characterization equipments namely, transmission spectroscopy is presented. The transport properties of the films were studied which include Dielectric studies, impedance studies, device characterization and are discussed. Chapter 3: The optimization of ZnO thin films for Schottky diode formation and The characterization of various Schottky diodes is presented in this chapter. P-type conductivity in ZnO was implemented by the variation of partial pressure of oxygen during the sputtering and are discussed. A method to achieve low series resistance hetero-junction was achieved using thermal oxidation method and the detailed transport properties were studied. The optical investigation carried out on the ZnO thin films under various growth conditions are also presented. Chapter 4: This chapter deals with the processing, structural, electrical, optical and magnetic properties of Mn doped ZnO thin films grown by pulsed laser ablation. Structural investigations have shown that the Mn incorporation increases the c-axis length due to the relatively larger ionic size of the Mn ions. Studies conducted both at low and high concentration region of Zn1¡xMnxO thin films showed that the films are anti-ferromagnetic in nature. The transport measurements revealed that the electrical conductivity is dominated by the presence of shallow traps. Optical investigations suggested the absence of midgap absorption and confirm the uniform distribution of Mn in wurtzite structure. Chapter 5: Carrier induced ferromagnetism in Co doped ZnO thin films were studied and the results are presented in this chapter. High density targets were prepared by solid state reaction process and the thin films were deposited by pulsed laser ablation technique. Two compositions were studied and it was found that with increase in substrate temperature, c-axis length decreases. Optical studies suggested a strong mid gap absorption around 2eV and could be attributed to the d-d transitions of tetrahedral coordinated Co2+. The presence of ferromagnetism in these films makes them potential candidates for spintronics applications. Chapter 6: It has been reported in literature that o®-centered polarization will drive ferroelectric phase transition. Motivated by such results, substitution of Lithium in ZnO was studied in detail. The structural and electrical properties were investigated over a wide range of composition (0-25%). The ferroelectric studies were carried out both in metal-insulator-metal (MIM) and metal-insulator-semiconductor (MIS) configuration and are presented in this chapter. The appearance of Ferro electricity in these films makes them potential candidates for ferroelectric memory devices. Chapter 7: This chapter describes the studies conducted on Mg doped ZnO Thin films grown by multi-magnetron sputtering. The hexagonal phases of the films were evaluated. All the films exhibited c-axis preferred orientation towards (002) orientation. Micro structural evolutions of the films were carried out through scanning electron microscopy and atomic force microscopy. Ferroelectric properties were investigated in both metal-insulator-metal (MIM) and metal-insulator-semiconductor (MIS) configurations. It was observed that the Mg concentration increases the band gap and the details on optical investigations are also presented in this chapter. Chapter 8: ZnO based thin film transistors have been fabricated and characterized using ZnO as active channel layer and Mg doped ZnO as dielectric layer. Excellent leakage properties of the gate dielectric were studied and presented in this chapter. These studies demonstrated that Mg doped ZnO thin films are suitable candidates for gate dielectric applications. Conclusions: This section presents the conclusions derived out of the present work. It also includes a few suggestions on future work on this material.

Die vorliegende Arbeit befasst sich mit der Simulation und Modellierung organischer Feldeffekt-Transistoren (OFETs). Mittels numerischer Simulationen wurden detaillierte Untersuchungen zu mehreren Problemstellungen durchgeführt. So wurde der Einfluss einer exponentiellen Verteilung von Trapzuständen, entsprechend dem sogenannten a-Si- oder TFT-Modell, auf die Transistorkennlinien untersucht. Dieses Modell dient der Beschreibung von Dünnschicht-Transistoren mit amorphen Silizium als aktiver Schicht und wird teils auch für organische Transistoren als zutreffend angesehen. Dieser Sachverhalt wird jedoch erstmals in dieser Arbeit detailliert untersucht und simulierte Kennlinien mit gemessenen Kennlinien von OFETs verglichen. Insbesondere aufgrund der Dominanz von Hysterese-Effekten in experimentellen Kennlinien ist jedoch eine endgültige Aussage über die Gültigkeit des a-Si-Modells schwierig. Neben dem a-Si-Modell werden auch noch andere Modelle diskutiert, z.B. Hopping-Transport zwischen exponentiell verteilten lokalisierten Zuständen (Vissenberg, Matters). Diese Modelle liefern, abhängig von den zu wählenden Modellparametern, zum Teil ähnliche Abhängigkeiten. Möglicherweise müssen die zu wählenden Modellparameter selbst separat gemessen werden, um eindeutige Schlussfolgerungen über den zugrundeliegenden Transportmechanismus ziehen zu können. Unerwünschte Hysterese-Effekte treten dabei sowohl in Transistorkennlinien als auch in Kapazitäts-Spannungs- (CV-) Kennlinien organischer MOS-Kondensatoren auf. Diese Effekte sind bisher weder hinreichend experimentell charakterisiert noch von ihren Ursachen her verstanden. In der Literatur findet man Annahmen, dass die Umladung von Trapzuständen oder bewegliche Ionen ursächlich sein könnten. In einer umfangreichen Studie wurde daher der Einfluß von Trapzuständen auf quasistatische CV-Kennlinien organischer MOS-Kondensatoren untersucht und daraus resultierende Hysterese-Formen vorgestellt. Aus den Ergebnissen läßt sich schlussfolgern, dass allein die Umladung von Trapzuständen nicht Ursache für die experimentell beobachteten Hysteresen in organischen Bauelementen sein kann. Eine mögliche Erklärung für diese Hysterese-Effekte wird vorgeschlagen und diskutiert. In einem weiteren Teil der Arbeit wird im Detail die Arbeitsweise des source-gated Dünnschicht-Transistors (SGT) aufgezeigt, ein Transistortyp, welcher erst kürzlich in der Literatur eingeführt wurde. Dies geschieht am Beispiel eines Transistors auf der Basis von a-Si als aktiver Schicht, die Ergebnisse lassen sich jedoch analog auch auf organische Transistoren übertragen. Es wird geschlussfolgert, dass der SGT ein gewöhnlich betriebener Dünnschicht-Transistor ist, limitiert durch das Sourcegebiet mit großem Widerstand. Die detaillierte Untersuchung des SGT führt somit auf eine Beschreibung, die im Gegensatz zur ursprünglich verbal diskutierten Arbeitsweise steht. Ambipolare organische Feldeffekt-Transistoren sind ein weiterer Gegenstand der Arbeit. Bei der Beschreibung ambipolarer Transistoren vernachlässigen bisherige Modelle sowohl die Kontakteigenschaften als auch die Rekombination von Ladungsträgern. Beides wird hingegen in den vorgestellten numerischen Simulationen erstmalig berücksichtigt. Anhand eines Einschicht-Modellsystems wurde die grundlegende Arbeitsweise von ambipolaren (double-injection) OFETs untersucht. Es wird der entscheidende Einfluß der Kontakte sowie die Abhängigkeit gegenüber Variationen von Materialparametern geklärt. Sowohl der Kontakteinfluß als auch Rekombination sind entscheidend für die Arbeitsweise. Zusätzlich werden Möglichkeiten und Einschränkungen für die Datenanalyse mittels einfacher analytischer Ausdrücke aufgezeigt. Es zeigte sich, dass diese nicht immer zur Auswertung von Kennlinien herangezogen werden dürfen. Weiterhin werden erste Simulationsergebnisse eines ambipolaren organischen Heterostruktur-TFTs mit experimentellen Daten verglichen.

Vývoj UHV kompatibilního kombinovaného systému AFM/SEM. Modifikace předchozího AFM mikroskopu pro podmínky spojené s tímto systémem. Výzkum transportu elektrického náboje v organických solárních článcích pomocí měření jejich volt-ampérových charakteristik a povrchového potenciálu. Příprava zlatých hrotů pro STM netoxickou cestou.

Nanomaterials have attracted great interest due to the unique physical properties and great potential in the applications of nanoscale devices. Two dimensional atomic crystals, which are atomic thickness, especially graphene, have triggered the gold rush recently due to the fascinating high mobility at room temperature for future electronics. The crystal structure of nanomaterials will have great influence on their physical properties. Thus, this thesis is focused on developing the methods to control the crystal structure of nanomaterials, namely quantum dots as semiconductor, boron nitride (BN) as insulator, graphene as semimetal, with low cost for their applications in photonics, structural support and electronics. In this thesis, firstly, Mn doped ZnSe quantum dots have been synthesized using colloidal synthesis. The shape control of Mn doped ZnSe quantum dots has been achieved from branched to spherical by switching the injection temperature from kinetics to thermodynamics region. Injection rates have been found to have effect on controlling the crystal phase from zinc blende to wurtzite. The structural-property relationship has been investigated. It is found that the spherical wurtzite Mn doped ZnSe quantum dots have the highest quantum yield comparing with other shape or crystal phase of the dots. Then, the Mn doped ZnSe quantum dots were deposited onto the BN sheets, which were micron-sized and fabricated by chemical exfoliation, for high resolution imaging. It is the first demonstration of utilizing ultrathin carbon free 2D atomic crystal as support for high resolution imaging. Phase contrast images reveal moiré interference patterns between nanocrystals and BN substrate that are used to determine the relative orientation of the nanocrystals with respect to the BN sheets and interference lattice planes using a newly developed equation method. Double diffraction is observed and has been analyzed using a vector method. As only a few microns sized 2D atomic crystal, like BN, can be fabricated by the chemical exfoliation. Chemical vapour deposition (CVD) is as used as an alternative to fabricate large area graphene. The mechanism and growth dynamics of graphene domains have been investigated using Cu catalyzed atmospheric pressure CVD. Rectangular few layer graphene domains were synthesized for the first time. It only grows on the Cu grains with (111) orientation due to the interplay between atomic structure of Cu lattice and graphene domains. Hexagonal graphene domains can form on nearly all non-(111) Cu surfaces. The few layer hexagonal single crystal graphene domains were aligned in their crystallographic orientation over millimetre scale. In order to improve the alignment and reduce the layer of graphene domains, a novel method is invented to perform the CVD reaction above the melting point of copper (1090 ºC) and using molybdenum or tungsten to prevent the balling of the copper from dewetting. By controlling the amount of hydrogen during the growth, individual single crystal domains of monolayer over 200 µm are produced determined by electron diffraction mapping. Raman mapping shows the monolayer nature of graphene grown by this method. This graphene exhibits a linear dispersion relationship and no sign of doping. The large scale alignment of monolayer hexagonal graphene domains with epitaxial relationship on Cu is the key to get wafer-sized single crystal monolayer graphene films. This paves the way for industry scale production of 2D single crystal graphene.

Die vorliegende Arbeit befasst sich mit der Simulation und Modellierung organischer Feldeffekt-Transistoren (OFETs). Mittels numerischer Simulationen wurden detaillierte Untersuchungen zu mehreren Problemstellungen durchgeführt. So wurde der Einfluss einer exponentiellen Verteilung von Trapzuständen, entsprechend dem sogenannten a-Si- oder TFT-Modell, auf die Transistorkennlinien untersucht. Dieses Modell dient der Beschreibung von Dünnschicht-Transistoren mit amorphen Silizium als aktiver Schicht und wird teils auch für organische Transistoren als zutreffend angesehen. Dieser Sachverhalt wird jedoch erstmals in dieser Arbeit detailliert untersucht und simulierte Kennlinien mit gemessenen Kennlinien von OFETs verglichen. Insbesondere aufgrund der Dominanz von Hysterese-Effekten in experimentellen Kennlinien ist jedoch eine endgültige Aussage über die Gültigkeit des a-Si-Modells schwierig. Neben dem a-Si-Modell werden auch noch andere Modelle diskutiert, z.B. Hopping-Transport zwischen exponentiell verteilten lokalisierten Zuständen (Vissenberg, Matters). Diese Modelle liefern, abhängig von den zu wählenden Modellparametern, zum Teil ähnliche Abhängigkeiten. Möglicherweise müssen die zu wählenden Modellparameter selbst separat gemessen werden, um eindeutige Schlussfolgerungen über den zugrundeliegenden Transportmechanismus ziehen zu können. Unerwünschte Hysterese-Effekte treten dabei sowohl in Transistorkennlinien als auch in Kapazitäts-Spannungs- (CV-) Kennlinien organischer MOS-Kondensatoren auf. Diese Effekte sind bisher weder hinreichend experimentell charakterisiert noch von ihren Ursachen her verstanden. In der Literatur findet man Annahmen, dass die Umladung von Trapzuständen oder bewegliche Ionen ursächlich sein könnten. In einer umfangreichen Studie wurde daher der Einfluß von Trapzuständen auf quasistatische CV-Kennlinien organischer MOS-Kondensatoren untersucht und daraus resultierende Hysterese-Formen vorgestellt. Aus den Ergebnissen läßt sich schlussfolgern, dass allein die Umladung von Trapzuständen nicht Ursache für die experimentell beobachteten Hysteresen in organischen Bauelementen sein kann. Eine mögliche Erklärung für diese Hysterese-Effekte wird vorgeschlagen und diskutiert. In einem weiteren Teil der Arbeit wird im Detail die Arbeitsweise des source-gated Dünnschicht-Transistors (SGT) aufgezeigt, ein Transistortyp, welcher erst kürzlich in der Literatur eingeführt wurde. Dies geschieht am Beispiel eines Transistors auf der Basis von a-Si als aktiver Schicht, die Ergebnisse lassen sich jedoch analog auch auf organische Transistoren übertragen. Es wird geschlussfolgert, dass der SGT ein gewöhnlich betriebener Dünnschicht-Transistor ist, limitiert durch das Sourcegebiet mit großem Widerstand. Die detaillierte Untersuchung des SGT führt somit auf eine Beschreibung, die im Gegensatz zur ursprünglich verbal diskutierten Arbeitsweise steht. Ambipolare organische Feldeffekt-Transistoren sind ein weiterer Gegenstand der Arbeit. Bei der Beschreibung ambipolarer Transistoren vernachlässigen bisherige Modelle sowohl die Kontakteigenschaften als auch die Rekombination von Ladungsträgern. Beides wird hingegen in den vorgestellten numerischen Simulationen erstmalig berücksichtigt. Anhand eines Einschicht-Modellsystems wurde die grundlegende Arbeitsweise von ambipolaren (double-injection) OFETs untersucht. Es wird der entscheidende Einfluß der Kontakte sowie die Abhängigkeit gegenüber Variationen von Materialparametern geklärt. Sowohl der Kontakteinfluß als auch Rekombination sind entscheidend für die Arbeitsweise. Zusätzlich werden Möglichkeiten und Einschränkungen für die Datenanalyse mittels einfacher analytischer Ausdrücke aufgezeigt. Es zeigte sich, dass diese nicht immer zur Auswertung von Kennlinien herangezogen werden dürfen. Weiterhin werden erste Simulationsergebnisse eines ambipolaren organischen Heterostruktur-TFTs mit experimentellen Daten verglichen.