Solar cells convert sunlight into electrical energy using the photo effect. With a mar-ket share of 60%, multicrystalline silicon (mc-Si) is the most frequently used absorber material. Standard mc-Si ingots are directionally solidified in a fused silica (SiO2) crucible, which exhibits a silicon nitride (Si3N4) inner coating. After the entire raw material has been melted, the nucleation takes place on the Si3N4 inner coating at the bottom of the crucible. This results in an inhomogeneous initial grain structure and an increased fraction of dislocation clusters in the upper part of the ingot, which decrease the quality of standard mc-Si. Therefore, the global goal is the development of a cost-effective technology that reduces the formation of clusters and enhances the quality of mc-Si ingots. One way of achieving that goal is to produce the so-called \"high performance multi crystalline silicon\" (HPM-Si). During the directional solidification silicon raw material remains unmelted at the bottom of the SiO2 crucible, whereby crystallization does start on the silicon feedstock a few millimeters above the crucible bottom. Compared to standard mc-Si, a finer grained structure with many small grains is formed, which are separated by so-called random grain boundaries. Since the movement of dislocations across this grain boundary type has rarely been observed, the risk of formation of dislocation clusters, which have a negative impact on the efficiency of solar cells, is greatly reduced for HPM-Si. However, the disadvantage of the HPM-Si compared to the mc-Si is the yield loss resulting from the unmelted raw material at the crucible bottom. Hence, the aim of the present work is to produce mc-Si with a fine-grained structure in combination with a high fraction of random grain boundaries without the disad-vantage of yield loss. In order to investigate the grain structure in dependence of the nucleation conditions G1 ingots having a mass of 14.5 kg and dimensions of 220x220x130 mm³ were directional solidified in a furnace. The analysis of the grain structure with respect to the grain size, grain orientation and the random grain boundary length fraction and the comparison with the HPM-Si reference crystal took place on horizontal wafers with a thickness of 3mm. One possibility to influence the grain structure of mc-Si could be the variation of the cooling conditions before the start of crystallization at the crucible bottom. In a first series of experiments, a gas-flowed cooling plate, positioned below the crucible, was used. An increased gas flow increases the axial heat flow downwards and the cooling rate below the crucible bottom in the same direction. The detected cooling rate, measured by a thermocouple in the silicon melt 5 mm above the crucible bottom, varied in a range between 0.06-1.5 K/min. An increased cooling rate increases the supercooling, with a maximum of 2K. The analysis of the grain structure shows that a reduction in the cooling rate in combination with the lowest supercooling minimizes the average grain size and increases the fraction of random grain boundaries. However, an HPM-Si like grain structure (grain size and fraction of random grain boundaries comparable to HPM-Si) could not completely produced. Furthermore, due to the extended process time, the wafer yield is reduced, whereby the reduction of the cooling rate is not a preferable method for the industrial process. In a second experimental series, which took place under constant cooling rates, the influence of an additional nucleation layer on the initial grain structure was investigated. For this purpose, the additional nucleation layer was applied on the already existing Si3N4 inner coating on the crucible bottom. In order to adjust a HPM-Si like grain structure, the contact angle of the silicon melt on the additional nucleation layer should be lower than on the Si3N4 inner coating. The theoretical basis for this hypothesis is the relationship between the contact angle and the nucleation energy, which states that a reduced contact angle lowers the nucleation energy and can ultimately lead to more nuclei. Furthermore, in order to avoid melting, the additional nucleation layer must have a higher melting point than silicon. Suitable materials for the application as a foreign seed sample are SiC, SiO2 and Al2O3, which are used in the form of particles with different sizes. The production of the additional nucleation layer was carried out by a spraying as well as by an embedding procedure. These layers exhibit different thermal conductivity as well as surface roughness. Embedded nucleation layers generate higher roughness values than sprayed nucleation layers. The analysis of the grain structure identified the surface roughness as the main influencing factor on the initial grain size. While an increased surface roughness (Rq>100μm) results in a fine-grained structure (average grain size: <2mm²) comparable to HPM-Si, the average grain size increases (>2 mm²) with a reduced surface roughness (Rq<100μm). However, the analysis of the grain boundary relationship shows that the fraction of random grain boundaries does not correlate with the average grain size. Only a ma-terial dependency was detected. All SiO2 nucleation layers generate an increased fraction of random grain boundaries, comparable to the HPM-Si material. In contrast, the fraction of random grain boundaries was reduced for all SiC nucleation layers. This result is probably established with the different thermal conductivities of the used materials. The increased thermal conductivity of the sample with the SiC nucleation layers increases the cooling rate, promoting dendritic growth. In contrast the lower thermal conductivity of the SiO2 nucleation layers reduces the cooling rate and dendritic growth is suppressed. Since dendrites exhibit a Σ3 grain boundary relationship in the center, the fraction of this grain boundary type increases for SiC nucleation layers and the fraction of random grain boundaries decreases. In this thesis, various possibilities for influencing the grain structure have been pre-sented. A SiO2 nucleation layer with a roughness value Rq> 200μm represents an industrially relevant solution for the production of mc-Si with comparable properties to the HPM-Si without the disadvantages of yield loss. Hence, it was possible to in-crease the yield with comparable material quality, whereby the production costs could be reduced. Some first crucible manufacturers have already transferred the use of the SiO2 nucleation layers on top of the already existing Si3N4 inner coating at the crucible bottom to production.

Thin-film silicon tandem solar cells based on a hydrogenated amorphous silicon (a-Si:H) top-cell and a hydrogenated microcrystalline silicon (μc-Si:H) bottom-cell are a promising photovoltaic technology as they use a combination of absorber materials that is ideally suited for the solar spectrum. Additionally, the involved materials are abundant and non-toxic which is important for the manufacturing and application on a large scale. One of the most important factors for the application of photovoltaic technologies is the cost per watt. There are several ways to reduce this figure: increasing the efficiency of the solar cells, reducing the material consumption and increasing the throughput of the manufacturing equipment. The use of very-high frequencies has been proven to be beneficial for the material quality at high deposition rates thus enabling a high throughput and high solar cell efficiencies. In the present work a scalable very-high frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) technique for state-of-the-art solar cells is developed. Linear plasma sources are applied which facilitate the use of very-high frequencies on large areas without compromising on the homogeneity of the deposition process. The linear plasma sources require a dynamic deposition process with the substrate passing by the electrodes in order to achieve a homogeneous deposition on large areas. State-of-the-art static radio-frequency (RF) PECVD processes are used as a reference in order to assess the potential of a dynamic VHF-PECVD technique for the growth of high-quality a-Si:H and μc-Si:H absorber layers at high rates. In chapter 4 the influence of the deposition process of the μc-Si:H i-layer on the solar cell performance is studied for static deposition processes. It is shown that the correlation between the i-layer growth rate, its crystallinity and the solar cell performance is similar for VHF- and RF-PECVD processes despite the different electrode configurations, excitation frequencies and process regimes. It is found that solar cells incorporating i-layers grown statically using VHF-PECVD processes obtain a state-of-the-art efficiency close to 8 % for growth rates up to 1.4 nm/s compared to 0.53 nm/s for RF-PECVD processes. The influence of dynamic deposition processes on the performance of μc-Si:H solar cells is studied. It is found that μc-Si:H solar cells incorporating dynamically grown i-layers obtain an efficiency of 7.3 % at a deposition rate of 0.95 nm/s. There is a small negative influence of the dynamic deposition process on the solar cell efficiency compared to static deposition processes which is related to the changing growth conditions the substrate encounters during a dynamic i-layer deposition process. The changes in gas composition during a dynamic i-layer deposition process using the linear plasma sources are studied systematically using a static RF-PECVD regime and applying a time-dependent gas composition. The results show that the changes in the gas composition affect the solar cell performance if they exceed a critical level. In chapter 5 dynamic VHF-PECVD processes for a-Si:H are developed in order to investigate the influence of the i-layer growth rate, process parameters and deposition technique on the solar performance and light-induced degradation. The results in this work indicate that a-Si:H solar cells incorporating i-layers grown dynamically by VHF-PECVD using linear plasma sources perform as good and better as solar cells with i-layers grown statically by RF-PECVD at the same deposition rate. State-of-the-art stabilized a-Si:H solar cell efficiencies of 7.6 % are obtained at a growth rate of 0.35 nm/s using dynamic VHF-PECVD processes. It is found that the stabilized efficiency of the a-Si:H solar cells strongly decreases with the i-layer deposition rate. A simplified model is presented that is used to obtain an estimate for the deposition rate dependent efficiency of an a-Si:H/μc-Si:H tandem solar cell based on the photovoltaic parameters of the single-junction solar cells. The aim is to investigate the individual influences of the a-Si:H and μc-Si:H absorber layer deposition rates on the performance of the tandem solar cell. The results show that a high deposition rate of the μc-Si:H absorber layer has a much higher potential for reducing the total deposition time of the absorber layers compared to high deposition rates for the a-Si:H absorber layer. Additionally, it is found that high deposition rates for a-Si:H have a strong negative impact on the tandem solar cell performance while the tandem solar cell efficiency remains almost constant for higher μc-Si:H deposition rates. It is concluded that the deposition rate of the μc-Si:H absorber layer is key to reduce the total deposition time without compromising on the tandem solar cell performance. The developed VHF-PECVD technique using linear plasma sources is capable of meeting this criterion while promoting a path to scale the processes to large substrate areas.

Heteroübergänge, die aus (in)organischen/(in)organischen Materialien bestehen, spielen eine entscheidende Rolle für die Leistung optoelektronischer Bauteile. Der Schwerpunkt dieser Arbeit liegt hauptsächlich auf der elektronischen Struktur dieser Heteroübergänge, insbesondere der Ausrichtung der Energieniveaus (ELA) an verschiedenen Heteroübergangsschnittstellen, die mit Photoelektronenspektroskopie gemessen wird. Zusätzlich wird die Geräteleistungen mit den PES-Ergebnissen verglichen, um weitere Verbesserung zu ermöglichen. MoOx/n-Si und PEDOT:PSS/n-Si Heteroverbindungen sind aktive Schichten von Solarzellen und mit PES kann direkt, die Groessen der Bandverbiegung auf der n-Si-Seite gemessen werden. Obwohl die Bandverbiegung für einen MoOx/n-Si-Heteroübergang (0,80 eV) größer ist als die von PEDOT:PSS/n-Si (0,71 eV), weisen die entsprechenden Solarzellen (MoOx/n-Si) aufgrund der mangelhaften Passivierung von n-Si und der geringeren Dünnschichtleitfähigkeit von MoOx einen schlechteren Wirkungsgrad (auf. Die Untersuchung der elektronischen Struktur Duenner Schichten aus Perowskit (CH3NH3PbI3) oder Vanadiumdioxid zeigt, dass die Austrittsarbeit durch die Oberflächenkomponenten dramatisch beeinflusst werden kann, wodurch die ELA mit dem prototypischen organischen Lochtransportmaterial N,N′-di(1-naphthyl)-N,N′-diphenylbenzidin (NPB) variiert wird. Bei den CH3NH3PbI3-Dünnschichten, die mit verschiedenen Methoden hergestellt werden, korreliert das Verhältnis der beiden Kohlenstoffarten auf der Oberfläche mit der Variation der Austrittsarbeit. Wie bei der VO2-Oberfläche kann die Austrittsarbeit durch Ändern des Verhältnisses von Sauerstoff und Vanadium auf der Oberfläche von 4,4 eV auf 6,7 eV abgestimmt werden. Belege für eine starke Ferminiveau-Pinning und die damit verbundene Energieniveaubiegung in NPB finden sich für stöchiometrisches VO2 (WF=6,7 eV), wodurch ein ohmscher Kontakt für Löcher entsteht, der als Lochinjektionskontakt in Bauteilen verwendet werden kann. / Heterojunctions, comprised by (in)organic/(in)organic materials, play a crucial role in determining the performance of optoelectronic devices. The focus of this work is mainly on the electronic structure of heterojunctions present in the optoelectronic devices, in particular the energy level alignment (ELA) at different heterojunction interfaces, by employing photoelectron spectroscopy (PES). Furthermore, interface energetics are correlated with the device performances in order to guide the future improvement. MoOx/n-Si and PEDOT:PSS/n-Si heterojunctions are active layers in solar cells and PES measurements give direct band bending magnitudes generated at the n-Si. Even though the band bending magnitude of the MoOx/n-Si heterojunction (0.80 eV) is larger than that of the PEDOT:PSS/n-Si (0.71 eV), the corresponding solar cells (MoOx/n-Si) show inferior power conversion efficiency (PCE), due to the deficient passivation of n-Si and lower thin film conductivity of MoOx. The investigations of electronic structure of perovskite (CH3NH3PbI3) and vanadium dioxide (VO2) thin films show that the work function can be dramatically affected by the surface components, which subsequently varies the ELA with the deposited prototypical organic hole transport material N,N′-di(1-naphthyl)-N,N′-diphenylbenzidine (NPB). As for the CH3NH3PbI3 thin films fabricated by different methods, the ratio of the two C 1s species (CH3NH3+ and CH3+) on the surface correlates with variation of the work function. As for the VO2 thin film, the work function can be tuned from 4.4 eV to 6.7 eV by changing the ratio of oxygen and vanadium on the surface. Evidence for strong Fermi-level pinning and the associated energy-level bending in NPB is found for the clean and stoichiometric VO2 (WF=6.7 eV), rendering an Ohmic contact for holes, which can be utilized as a hole injection contact into the devices.

Photovoltaic energy is the most promising future energy source. Therefore, strong efforts are made to improve their price-to-efficiency ratio. New technologies and materials are being involved in the production, such as poly-crystalline materials rather than mono-crystalline silicon. Some of these materials are based on copperchalcopyrite with advantageous properties like directly tunable band gap, high absorption coefficients, low deposition temperatures, low-cost materials and capability of deposition on suitable materials. However, correlation between the thin film materials characteristics and device performance are not well understood, and increasing the efficiency needs an exhaustive comprehension of the different phenomena involved in their performance, such as role of defects, doping concentrations and potentials, which requires the development of innovative techniques for the characterization. Electron holography in the TEM would be very helpful, because it allows the quantitative reconstruction of the complex object wave. The measurement of phase and amplitude of the wave makes it possible to determine the potential in the object studied. In this manner, electron holography is a powerful tool for materials characterization at nanometre scale because it relates potential distributions with structure. However, artefacts can be introduced in the measurement. Therefore, the procedure of acquisition, reconstruction and correction of artefacts of the electron holograms, fundamental for the interpretation of the results in terms of potential, are in detail presented. Moreover, the object of study exhibits challenges to the technique because of their polycrystalline structure, which introduces dynamic interaction with the electron beam sometimes stronger than the desired one. Consequently it is necessary to have an adequate measurement procedure. To overcome this limitation, a characterization method including in-situ stimuli is proposed and applied to crystalline silicon and CIGS solar cells. For this, a suitable sample preparation procedure with Focused Ion Beam (FIB) milling, and a specially designed sample holder allowing illumination with light and biasing a TEM sample are developed and applied to solar cells. As result of the work, it is shown that expectedly the electron illumination has an important influence. It produces larger generation rates than 1 sun standard illumination. As counterpart, the recombination processes occurring at the surface of the small and thin sample tend to reduce the potential generated by the illumination. As consequence, only the p-n junction potential is usually measured. To produce an appreciable effect by illumination with light, the TEM lamella must be thicker, and the illumination intensity of the light must be strongly increased. This thesis realises the first extensive study of the application of electron holography to the measurement of potentials in solar cells applying in-situ illumination and biasing. The experimental findings were corroborated by simulation calculations. They show that the processes in the objects are essentially correctly understood, however, quantitative interpretation is not yet sufficiently accurate. / Photovoltaik bietet eine vielversprechende Energiequelle der Zukunft. Deshalb werden große Anstrengungen unternommen, um ihr Preis-Nutzen-Verhältnis zu verbessern. Neue Technologien und Materialien, wie poly-kristalline Materialien werden interessanter als mono-kristallines Silizium. Einige dieser Materialien beruhen auf der Basis von Kupfer-Chalkopyrit mit vorteilhaften Eigenschaften, wie direkt einstellbarer Bandlücke, hohen Absorptionskoeffizienten, niedrigen Abscheidetemperaturen und Verwendung von Low-Cost-Materialien. Allerdings ist die Korrelation zwischen den Eigenschaften der Dünnschicht-Materialien und der Leistung der Solarzellen noch nicht ausreichend verstanden, um die Effizienz weiter zu steigern. Hierfür muss ein umfassendes Verständnis der verschiedenen Phänomene wie der Rolle von Defekten, Dotierungskonzentrationen und Potenzialen erreicht werden, die die Entwicklung von innovativen Techniken für die Charakterisierung erfordert. Elektronen-Holographie kann zur Beantwortung dieser Fragen beitragen, weil sie die quantitative Rekonstruktion der komplexen Objektwelle im TEM erlaubt. Die Messung der Phase und der Amplitude der Welle macht es möglich, die Objektpotentiale zu bestimmen. Auf diese Weise wird Elektronen-Holographie ein leistungsfähiges Werkzeug für die Materialcharakterisierung im Nanometerbereich, weil sie Struktur und Potentialverteilung an derselben Stelle bestimmen kann. Doch können Artefakte und Missinterpretationen entstehen. Daher sind Aufzeichnung von Elektronenhologrammen sowie Rekonstruktion und Korrektur der Objektwelle von grundlegender Bedeutung für die Interpretation der Ergebnisse und werden im Detail vorgestellt. Ein spezielles Problem von polykristallinen Materialien ist die Tatsache, dass durch unterschiedlich orientierte Kristallite unterschiedliche Innere Potentiale gemessen werden können. Darüber hinaus besteht die Gefahr, dass die Elektronen mit unterschiedlichen Körnern in unterschiedlicher Weise dynamisch wechselwirken; dies führt zu Phasendifferezen, die erheblich stärker sein können als die eigentlich interessanten Halbleiterpotentiale. Deshalb werden die holographischen Untersuchungen so modifiziert, dass die Objekte in-situ, beispielsweise unter Anlegen elektrischer Spannungen (“biasing”) oder Beleuchtung mit Licht, untersucht werden. Die hierzu nötigen neuen Präparationsverfahren für die Objekte werden entwickelt. Ebenso werden neue in-situ Objekthalter entwickelt, die diese Parameter gezielt zu verändern gestatten. Als Ergebnis der Arbeit wird auch gezeigt, dass die Elektronenbeleuchtung einen wichtigen Einfluss auf die gemessenen Potentialverteilungen hat. Sie produziert größere Generationsraten von Elektronen-Loch-Paaren als 1 sun (Standard-Beleuchtung). Tatsächlich werden durch Rekombinationsprozesse an der Oberfläche der Probe die induzierten Potentiale in der Solarzelle verringert. Als Folge wird in der Regel nur das Potenzial des pn-Übergang gemessen. Um eine spürbare Wirkung durch Bestrahlung mit Licht zu erzeugen, muss die TEM-Lamelle dicker gewählt werden, und die Beleuchtung muss wesentlich intensiver sein als unter normalbedingungen. Diese Dissertation realisiert die erste umfassende Studie über die Anwendung von Elektronen-Holographie für die Messung von Potenzialen in Solarzellen unter Anwendung von Biasing und in-situ-Beleuchtung. Die experimentellen Befunde wurden mit umfangreichen Simulationsrechnungen verglichen. Diese zeigen, dass die Vorgänge im wesentlichen qualitativ verstanden sind, auch wenn sie die gemessenen Potentialverteilungen quantitativ oft noch nicht mit der erwünschten Genauigkeit wiedergeben.

Photovoltaic energy is the most promising future energy source. Therefore, strong efforts are made to improve their price-to-efficiency ratio. New technologies and materials are being involved in the production, such as poly-crystalline materials rather than mono-crystalline silicon. Some of these materials are based on copperchalcopyrite with advantageous properties like directly tunable band gap, high absorption coefficients, low deposition temperatures, low-cost materials and capability of deposition on suitable materials. However, correlation between the thin film materials characteristics and device performance are not well understood, and increasing the efficiency needs an exhaustive comprehension of the different phenomena involved in their performance, such as role of defects, doping concentrations and potentials, which requires the development of innovative techniques for the characterization. Electron holography in the TEM would be very helpful, because it allows the quantitative reconstruction of the complex object wave. The measurement of phase and amplitude of the wave makes it possible to determine the potential in the object studied. In this manner, electron holography is a powerful tool for materials characterization at nanometre scale because it relates potential distributions with structure. However, artefacts can be introduced in the measurement. Therefore, the procedure of acquisition, reconstruction and correction of artefacts of the electron holograms, fundamental for the interpretation of the results in terms of potential, are in detail presented. Moreover, the object of study exhibits challenges to the technique because of their polycrystalline structure, which introduces dynamic interaction with the electron beam sometimes stronger than the desired one. Consequently it is necessary to have an adequate measurement procedure. To overcome this limitation, a characterization method including in-situ stimuli is proposed and applied to crystalline silicon and CIGS solar cells. For this, a suitable sample preparation procedure with Focused Ion Beam (FIB) milling, and a specially designed sample holder allowing illumination with light and biasing a TEM sample are developed and applied to solar cells. As result of the work, it is shown that expectedly the electron illumination has an important influence. It produces larger generation rates than 1 sun standard illumination. As counterpart, the recombination processes occurring at the surface of the small and thin sample tend to reduce the potential generated by the illumination. As consequence, only the p-n junction potential is usually measured. To produce an appreciable effect by illumination with light, the TEM lamella must be thicker, and the illumination intensity of the light must be strongly increased. This thesis realises the first extensive study of the application of electron holography to the measurement of potentials in solar cells applying in-situ illumination and biasing. The experimental findings were corroborated by simulation calculations. They show that the processes in the objects are essentially correctly understood, however, quantitative interpretation is not yet sufficiently accurate.:1. Introduction 2 Basics of Solar Cells 3 Potential measurement by electron holography 4 Application of electron holography on solar cells 5 Design, construction, characterisation and application of a TEM holder for in-situ biasing and illumination 6 TEM sample preparation for in-situ biasing and illumination 7 Measurement of built-in potential under in-situ illumination and bias of solar cells / Photovoltaik bietet eine vielversprechende Energiequelle der Zukunft. Deshalb werden große Anstrengungen unternommen, um ihr Preis-Nutzen-Verhältnis zu verbessern. Neue Technologien und Materialien, wie poly-kristalline Materialien werden interessanter als mono-kristallines Silizium. Einige dieser Materialien beruhen auf der Basis von Kupfer-Chalkopyrit mit vorteilhaften Eigenschaften, wie direkt einstellbarer Bandlücke, hohen Absorptionskoeffizienten, niedrigen Abscheidetemperaturen und Verwendung von Low-Cost-Materialien. Allerdings ist die Korrelation zwischen den Eigenschaften der Dünnschicht-Materialien und der Leistung der Solarzellen noch nicht ausreichend verstanden, um die Effizienz weiter zu steigern. Hierfür muss ein umfassendes Verständnis der verschiedenen Phänomene wie der Rolle von Defekten, Dotierungskonzentrationen und Potenzialen erreicht werden, die die Entwicklung von innovativen Techniken für die Charakterisierung erfordert. Elektronen-Holographie kann zur Beantwortung dieser Fragen beitragen, weil sie die quantitative Rekonstruktion der komplexen Objektwelle im TEM erlaubt. Die Messung der Phase und der Amplitude der Welle macht es möglich, die Objektpotentiale zu bestimmen. Auf diese Weise wird Elektronen-Holographie ein leistungsfähiges Werkzeug für die Materialcharakterisierung im Nanometerbereich, weil sie Struktur und Potentialverteilung an derselben Stelle bestimmen kann. Doch können Artefakte und Missinterpretationen entstehen. Daher sind Aufzeichnung von Elektronenhologrammen sowie Rekonstruktion und Korrektur der Objektwelle von grundlegender Bedeutung für die Interpretation der Ergebnisse und werden im Detail vorgestellt. Ein spezielles Problem von polykristallinen Materialien ist die Tatsache, dass durch unterschiedlich orientierte Kristallite unterschiedliche Innere Potentiale gemessen werden können. Darüber hinaus besteht die Gefahr, dass die Elektronen mit unterschiedlichen Körnern in unterschiedlicher Weise dynamisch wechselwirken; dies führt zu Phasendifferezen, die erheblich stärker sein können als die eigentlich interessanten Halbleiterpotentiale. Deshalb werden die holographischen Untersuchungen so modifiziert, dass die Objekte in-situ, beispielsweise unter Anlegen elektrischer Spannungen (“biasing”) oder Beleuchtung mit Licht, untersucht werden. Die hierzu nötigen neuen Präparationsverfahren für die Objekte werden entwickelt. Ebenso werden neue in-situ Objekthalter entwickelt, die diese Parameter gezielt zu verändern gestatten. Als Ergebnis der Arbeit wird auch gezeigt, dass die Elektronenbeleuchtung einen wichtigen Einfluss auf die gemessenen Potentialverteilungen hat. Sie produziert größere Generationsraten von Elektronen-Loch-Paaren als 1 sun (Standard-Beleuchtung). Tatsächlich werden durch Rekombinationsprozesse an der Oberfläche der Probe die induzierten Potentiale in der Solarzelle verringert. Als Folge wird in der Regel nur das Potenzial des pn-Übergang gemessen. Um eine spürbare Wirkung durch Bestrahlung mit Licht zu erzeugen, muss die TEM-Lamelle dicker gewählt werden, und die Beleuchtung muss wesentlich intensiver sein als unter normalbedingungen. Diese Dissertation realisiert die erste umfassende Studie über die Anwendung von Elektronen-Holographie für die Messung von Potenzialen in Solarzellen unter Anwendung von Biasing und in-situ-Beleuchtung. Die experimentellen Befunde wurden mit umfangreichen Simulationsrechnungen verglichen. Diese zeigen, dass die Vorgänge im wesentlichen qualitativ verstanden sind, auch wenn sie die gemessenen Potentialverteilungen quantitativ oft noch nicht mit der erwünschten Genauigkeit wiedergeben.:1. Introduction 2 Basics of Solar Cells 3 Potential measurement by electron holography 4 Application of electron holography on solar cells 5 Design, construction, characterisation and application of a TEM holder for in-situ biasing and illumination 6 TEM sample preparation for in-situ biasing and illumination 7 Measurement of built-in potential under in-situ illumination and bias of solar cells