GaAs(1-x)Bi(x) (x = 0 to 17%) optical properties were investigated by spectroscopic ellipsometry (in energy ranges of 0.37–9.0 eV). Optical features in the dielectric function, known as the critical points, were distinguished and modeled using standard analytic line shapes. The energy dependence of the critical points energies was thoroughly investigated as a function of Bi content and thin film strain. Critical points analysis in the Brillion zone showed that the top of the valence band is most strongly dependent on Bi content compared to other parts of the band structure. In addition, an interesting new critical point was observed that is attributed to alternative allowed optical transitions made possible by changes to the top of the valence band caused by resonant interactions with Bi orbitals. Several of the critical points were extrapolated to 100% Bi and showed reasonable agreement with the calculated band structure of GaBi. GaAs(1-x)Bi(x) (x= 03, 0.7 and 1.1%) based p+/n and n+/p heterostructure photovoltaic performance was characterized through IV and CV measurement. By introduction of Bi into GaAs, a non-zero EQE below the GaAs band edge energy was observed while the highest efficiency was obtained by ~ 0.7% Bi incorporation. EQE spectrum was modeled to find the minority carrier diffusion lengths of ~ Ln = 1600 and Lp = 140 nm for p-doped and n-doped GaAs92Bi08 in the doping profile of 10^15 - 10^16 cm^-3. Analysis of the CV measurement confirmed the background n-doping effect of Bi atom and the essential role of the cap layer to reduce multi-level recombination mechanisms at the cell edge to improve ideality factor. Low temperature grown GaAs was optimized to be used as photoconductive antenna in THz time-domain spectroscopy setup. The As content was investigated to optimize photo-carrier generation using 1550 nm laser excitation while maintaining high mobility and resistivity required for optical switching. A barrier layer of AlAs was added below the LT-GaAs to limit carrier diffusion into the GaAs substrate. Moreover, LT-GaAs layer thickness and post-growth annealing condition was optimized. The optimized structure (2-µm LT-GaAs on 60-nm AlAs, under As2:Ga BEP of ~7, annealed at 550°C for 1 minute) outperformed a commercial InGaAs antenna by a factor of 15 with 4.5 THz bandwidth and 75 dB signal-to-noise ratio at 1550 nm wavelength. / Graduate

The present thesis investigates the electronic and structural properties of adenine, cytosine, and guanine layers on hydrogen passivated silicon (111)(7x7). The (7x7) reconstruction of the silicon surface was achieved by direct current heating of the samples in UHV conditions. After in situ hydrogen passivation layers of the DNA bases were prepared in different thicknesses by means of organic molecular beam deposition, all samples were characterized employing valence band and core level photoemission spectroscopy. Additionally the near edge x-ray absorption fine structure of the DNA base layers was investigated. A detailed and consistent picture of structural and electronic properties of the nucleotide bases in the solid state could be developed by comparison of measurements and DFT/B3LYP calculations.

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No description available.

The present thesis investigates the electronic and structural properties of adenine, cytosine, and guanine layers on hydrogen passivated silicon (111)(7x7). The (7x7) reconstruction of the silicon surface was achieved by direct current heating of the samples in UHV conditions. After in situ hydrogen passivation layers of the DNA bases were prepared in different thicknesses by means of organic molecular beam deposition, all samples were characterized employing valence band and core level photoemission spectroscopy. Additionally the near edge x-ray absorption fine structure of the DNA base layers was investigated. A detailed and consistent picture of structural and electronic properties of the nucleotide bases in the solid state could be developed by comparison of measurements and DFT/B3LYP calculations.

Polarization entangled photon pairs on demand are considered to be an important building block of quantum communication technology. It has been demonstrated that semiconductor quantum dots (QDs), which exhibit a certain spatial symmetry, can be used as a triggered, on-chip source of polarization entangled photon pairs. Due to limitations of the growth, the as-grown QDs usually do not exhibit the required symmetry, making the availability of post-growth tuning techniques essential. In this work first the QD-morphology of hundreds of QDs is correlated with the optical emission of neutral excitons confined in GaAs/AlGaAs QDs. It is presented how elastic anisotropic stress can be used to partially restore the symmetry of self-assembled GaAs/AlGaAs and InGaAs/GaAs QDs, making them as candidate sources of entangled photon pairs. As a consequence of the tuning of the QD-anisotropy we observe a rotation of the polarization of the emitted light. The joint modification of polarization orientation and QD anisotropy can be described by an anticrossing of the so-called bright excitonic states. Furthermore, it is demonstrated that anisotropic stress can be used to tune the purity of the hole states of the QDs by modifying the degree of heavy and light hole mixing. This ability might be interesting for applications using the hole spin as a so-called quantum bit.

Bimetallic Rh-V system was studied by means of surface science experimental methods. Properties of ultra-thin Rh-V layers supported by γ-Al2O3 were compared with model systems prepared by vacuum V deposition on Rh(111), Rh(110) and polycrystalline rhodium. Formation of ordered V- Rh(111)-(2×2), V-Rh(110)-(2×1) and V-Rh(110)-(1×2) subsurface alloys and their electronic and atomic structure were investigated and models of the surface reconstructions were proposed. Influence of the subsurface alloy formation on interaction with CO and O2 molecules as well as the influence of the molecule adsorption on this alloy was investigated. The bond between CO molecules and Rh-V alloy surface was weakened due to pronounced changes in surface valence band structure. Oxygen which adsorbed on the alloy surface reacted with the subsurface vanadium at elevated temperature and blocked the interaction of the metal substrate with CO molecules.

Ce mémoire de thèse traite de l'étude de jonctions pn silicium planaires, réalisées par épitaxie localisée, avec un nouveau type de microscopie à émission de photoélectrons (XPEEM) filtré en énergie. L'objectif est d'améliorer notre compréhension des facteurs influençant l'imagerie XPEEM de jonctions modèles avec une perspective à plus long terme d'application de cette technique aux cas réels.Sur les trois types de jonction réalisées présentant des champs électriques variables (P+/P, N+/P, P+/N), nous avons d'abord mis en œuvre un procédé de passivation en trois étapes afin de se rapprocher de conditions en bandes plates en surface. Ce procédé nous a permis d'étudier la position des niveaux électroniques de part et d'autre des jonctions grâce à une imagerie en XPEEM spectroscopique avec électrons secondaires (travail de sortie local), électrons de cœur Si 2p et bande de valence, avec à la fois avec des sources X de laboratoire et le rayonnement synchrotron. Un mécanisme de contraste des images en électrons de cœur dû à la toute première couche atomique de surface a été montré. Ensuite, nous avons mis en évidence le rôle du champ électrique au niveau de la zone de déplétion des jonctions qui décale la position apparente de cette dernière dans l'image XPEEM. Nous avons comparé les résultats expérimentaux avec des simulations (logiciel SIMION) afin d'estimer son influence sur les conditions d'imagerie. Enfin, nous avons étudié l'impact de la technique d'imagerie en champ sombre sur la localisation de la jonction réelle au niveau de la surface de l'échantillon. / This thesis addresses the problem of imaging of model systems planar silicon pn junctions, fabricated by localized epitaxy, using the novel energy-filtered X-ray PhotoElectron Emission Microscope (XPEEM). The objective is to improve the understanding of the phenomena influencing the XPEEM images of the junctions, with as long-term perspective, a possible application of this method in a complementary way to existing techniques of 2D dopant mapping.The studies were carried out over three types of junction realized to this purpose and presenting variable electrical field (P+/P, N+/P, P+/N). We firstly developed and optimized a passivation protocol in three-steps which yielded a surface close to flat band conditions. This process allowed us to deduce band alignments as a function of doping level and type on both side of the junction thanks to spectroscopic XPEEM imaging of secondary electrons (to determine local work function), Si 2p core-level and valence band with both laboratory photon sources and synchrotron radiation. Contrast in core-level imaging due to the first atomic layer of the surface was also shown.Then, we highlighted the role of the lateral electric field across the depletion zone of a pn junction which shifts the apparent position of the latter in PEEM imaging. We compared experimental results and simulations performed with SIMION software to estimate the influence of pn junctions on PEEM imaging. Dark field imaging of the junction was also simulated. Comparison with the experimental results showed that it can be used to localize the real junction.

Polarization entangled photon pairs on demand are considered to be an important building block of quantum communication technology. It has been demonstrated that semiconductor quantum dots (QDs), which exhibit a certain spatial symmetry, can be used as a triggered, on-chip source of polarization entangled photon pairs. Due to limitations of the growth, the as-grown QDs usually do not exhibit the required symmetry, making the availability of post-growth tuning techniques essential. In this work first the QD-morphology of hundreds of QDs is correlated with the optical emission of neutral excitons confined in GaAs/AlGaAs QDs. It is presented how elastic anisotropic stress can be used to partially restore the symmetry of self-assembled GaAs/AlGaAs and InGaAs/GaAs QDs, making them as candidate sources of entangled photon pairs. As a consequence of the tuning of the QD-anisotropy we observe a rotation of the polarization of the emitted light. The joint modification of polarization orientation and QD anisotropy can be described by an anticrossing of the so-called bright excitonic states. Furthermore, it is demonstrated that anisotropic stress can be used to tune the purity of the hole states of the QDs by modifying the degree of heavy and light hole mixing. This ability might be interesting for applications using the hole spin as a so-called quantum bit.

Depuis que les dimensions des nano-dispositifs ont atteint l’échelle nanométrique, la simulation quantique est devenue incontournable dans le domaine de la nanoélectronique. Parmi les différents phénomènes physiques, l’interaction électron-phonon représente un processus majeur limitant la mobilité des porteurs de charge à température ambiante. En combinant la théorie multibandes k.p avec le formalisme quantique des fonctions de Green hors-équilibre, nous avons étudié et comparé deux types de dispositifs double-grille dopés p: le transistor MOS «conventionnel» et celui dit «sans jonction». L’influence de l’orientation cristalline, du matériau semi-conducteur, de la longueur de grille et de l’épaisseur du substrat a été étudiée afin d’optimiser les performances de ces dispositifs aux dimensions ultimes. D’un point de vue plus fondamental, l’interaction avec les phonons est habituellement implémentée à partir de l’approche auto-cohérente de Born (SCBA). Nous avons exploré la validité des approches non auto-cohérentes numériquement moins coûteuse qui conservent le courant : Lowest Order Approximation (LOA). Une comparaison entre SCBA, LOA et son prolongement analytique (LOA+AC) en modèle multi-bande a été menée. / Device simulation has attracted large interest since the dimensions of electronic devices reached the nanoscale. Among the new physical phenomena observed we focus on interaction-induced effects. Particular emphasis is placed on electron-phonon interactions as it is one of the most important carrier mobility-limiting mechanisms in nanodevices. Using the k.p multiband theory combined with the Non-Equilibrium Green's Function formalism, we model 2 types of double-gate devices: p-type MOSFETs and junctionless p-type MOSFETs. The 2D architecture of the double-gate device enables us to investigate the influence of confinement in one direction, infinite propagation in the other direction and connection to semi-infinite reservoirs in the last one. Different crystallographic orientation, channel materials, gate lengths and channel widths are investigated. From a fundamental point of view, phonon scattering is usually implement via the so-called Self-Consistent Born Approximation (SCBA°. We explore the validity of a one shot current conserving method based on the Lowest Order Approximation (LOA). A comparison between SCBA, LOA and its analytic continuation (LOA+AC) in multiband models is discussed.