Thesis (Ph. D.)--Auburn University, 2008. / Abstract. Vita. Includes bibliographical references (p. 177-194).

Thesis (Ph. D.)--Rutgers University, 2008. / "Graduate Program in Electrical and Computer Engineering." Includes bibliographical references (p. 118-122).

Thesis (Ph.D.) - Carleton University, 2007. / Includes bibliographical references (p. 194-201). Also available in electronic format on the Internet.

Thesis (Ph.D.) - Carleton University, 2007. / Includes bibliographical references (p. 128-137). Also available in electronic format on the Internet.

Thesis (M. Eng.)--Carleton University, 2001. / Includes bibliographical references (p. 72-74). Also available in electronic format on the Internet.

Thesis (Ph. D.)--Electrical and Computer Engineering, Georgia Institute of Technology, 2005. / David E. Schimmel, Committee Member ; C.P. Wong, Committee Member ; John A. Buck, Committee Member ; Abhijit Chatterjee, Committee Chair ; Madhavan Swaminathan, Committee Member. Vita. Includes bibliographical references.

Thesis (Ph. D.)--Electrical and Computer Engineering, Georgia Institute of Technology, 2006. / Buck, John, Committee Co-Chair ; Ferguson, Ian, Committee Chair ; Krishnamurthy,Vikram, Committee Member ; Chang, Gee-Kung, Committee Member ; Callen, W. Russell Jr., Committee Member ; Summers, Christopher, Committee Member.

Made available in DSpace on 2014-06-11T19:35:45Z (GMT). No. of bitstreams: 0 Previous issue date: 2012-08-30Bitstream added on 2014-06-13T19:06:02Z : No. of bitstreams: 1 floriano_ea_dr_bauru.pdf: 1682344 bytes, checksum: a9dc55dd1f9da48c4cd793193ef74aea (MD5) / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) / Este trabalho apresenta uma abordagem teórico-experimental na investigação de filmes finos de dióxido de estanho (SnO2) não dopado, de SnO2 dopado com antimônio (Sb), de dióxido de titânio (TiO2) e também de heteroestrutura Tio2/SnO2, produzidos pelo processo sol-gel-dip-coating. O conhecimento dos mecanismos de transporte elétrico de SnO2:Sb é fundamental para o desenvolvimento de dispositivos opto-eletrônicos. Neste sentido, a contribuição deste trabalho está principalmente no estudo das propriedades elétricas de SnO2:Sb, no qual foi analisado a captura de elétrons fotoexcitados por centros de Sb e/ou vacâncias de oxigênios termicamente ativados. Os resultados, surpreendentemente, mostraram que a taxa de variação da condutividade diminui com o aumento temperatura, independente da energia da fonte de excitação (acima ou abaixo da energia do bandgap). Este comportamento está provavelmente relacionado à mobilidade eletrônica, que é dominado pelo espalhamento de portadores de carga na região do contorno de grão. Quanto à heterojunção TiO2/SnO2, o conhecimento do tipo de estrutura cristalina dos semicondutores óxidos é fundamental para sua utilização em determinadas aplicações tecnológicas. A avaliação das propriedades estruturais de filmes finos de TiO2 apresentada nesta tese mostrou que o substrato de quartzo, utilizado para deposição dos filmes, exerce influência na temperatura de transição de fase anatásio-rutilo. De modo geral, apresentamos aqui uma avaliação das propriedades ópticas, estruturais, elétricas e eletrônicas de filmes finos de SnO2 e de SnO2:SB e também das propriedades ópticas, estruturais e eletrônicas de TiO2 e heterojunção TiO2/SnO2. As propriedades eletrônicas foram obtidas a partir de simulações computacionais de SnO2 SnO2:Sb e TiO2 desenvolvidas com o programa CRYSTAL06, baseadas na Teoria do Funcional da Densidade / This work presents a theoretical-experimental approach in the investigation of undoped and Sb-doped SnO2 thin flims, TiO2 thin films and also the heterostructure TiO2/SnO2 deposited through the sol-gel-dip-coating technique. The knowledge of the electrical transport mechanisms in SnO2:Sb is fundamental towards the devolping of optoelectronic devices. Then, our contribution concerns the analysis of the electronic structure and, mainly, the investigation of the electrical properties of SnO2:Sb, where the electron capture by thermally activated Sb centers and/or oxygen vacancies was proposed. Results, surpisingly, show that the conductivity variation rate increases with temperature, independent on excitation source energy (above or below the gandgap energy). This behavior is probaly related to the electronic mobility, which is dominated by the charge carrier scattering at boundary layer. Concerning the heterojunction TiO2/SnO2, the determination of the crystalline structure type of oxide semiconductors if fundamental for application in specific technologies. The evalution of structural properties of TiO2 films show that the quartz substrate, used for film deposition, influences the transition temperature of the anatase-rutile phases. In summary, we present an evalution of optical, structural, electrical and electronic properties of SnO2 and SnO2:Sb as well as optical, structured, and electronic properties of TiO2/SnO2. Electronic properties were obtained from computacional simulations of SnO2, SnO2:Sb, TiO2 and TiO2/SnO2, developed with the program CRYSTAL06, through the Density Functional Theory

Les dispositifs à base de GaN et ses alliages sont de plus en plus présents dans notre quotidien avec le développement exponentiel des diodes électroluminescentes (LED). Bien que la majorité des productions commerciales soient pour le moment effectuées sur substrat saphir, le silicium, disponible en de plus grands diamètres et pour un coût moindre, est de plus en plus pressenti comme le substrat d’avenir pour le développement des technologies GaN. L’utilisation de ce substrat devrait aussi permettre le développement du marché de l’électronique de puissance du GaN basée sur les transistors à haute mobilité électronique (HEMT) dont les performances dépassent les limites des technologies silicium. Néanmoins, afin de permettre ou faciliter le développement de dispositifs avancés, certaines briques technologiques sont nécessaires comme le dopage par implantation ionique. L’utilisation du GaN soulève des problématiques nouvelles pour ces briques technologiques.Au cours de cette thèse nous avons donc cherché à implémenter le procédé de dopage par implantation ionique du GaN et son étude au sein du CEA-LETI en nous focalisant principalement sur le dopage p par implantation de Mg. Nous avons identifié les principales problématiques liées aux propriétés intrinsèques du matériau (difficulté du dopage p, instabilité à haute température…) et les solutions les plus prometteuses de la littérature. Nous avons ensuite cherché à mettre en place notre propre procédé en développant des couches de protection déposées in-situ pour permettre les traitements thermiques à haute température des couches implantées. Cela a rendu possible l’étude des cinétiques d’évolution des couches implantées pendant des recuits « conventionnels » (rampes < 10 °C/min, durée de plusieurs dizaines de minutes, T < 1100 °C) en utilisant notamment des caractérisations de photoluminescence (µ-PL) et de diffraction des rayons X (XRD). Nous avons aussi mis en évidence un effet de diffusion et d’agrégation à haute température du Mg implanté. Nous avons ensuite cherché à modifier le procédé d’implantation (implantation canalisée, co-implantation) pour favoriser l’intégration du dopant et limiter la formation de défauts. En parallèle nous avons évalué l’intérêt de recuits secondaires (recuits rapides (RTA), recuit laser, micro-ondes) afin de finaliser l’activation du dopant. Finalement nous avons aussi mis en place un procédé de caractérisation électrique de couche de GaN dopées au sein du laboratoire. / GaN-based devices and their alloys are increasingly present in our daily lives with the exponential development of light-emitting diodes (LEDs). Although the majority of commercial production is currently carried out on sapphire substrates, silicon, available in larger diameters and at a lower cost, is increasingly seen as the substrate of the future for the development of GaN technologies. The use of this substrate should also allow the development of the GaN power electronics market based on high electron mobility transistors (HEMTs) whose performances exceed the limits of silicon technologies. Nevertheless, in order to allow or facilitate the development of advanced devices, specific processes are necessary such as doping by ion implantation. The use of GaN raises new problems for these technological bricks.During this thesis we therefore sought to implement the ion implantation doping process of GaN and its study within the CEA-LETI while focusing mainly on p doping by Mg implantation. We have identified the main issues related to the intrinsic properties of the material (difficulty of p-doping, instability at high temperatures...) and the most promising solutions in the literature. We then sought to implement our own process by developing in-situ protective layers to allow high temperature annealing of the implanted layers. This enabled the study of the evolution kinetics of the implanted layers during "conventional" annealing (ramps < 10 °C/min, duration of several tens of minutes, T < 1100 °C) using photoluminescence (µ-PL) and X-ray diffraction (XRD) characterizations. We also evidenced a diffusion and aggregation effect at high temperature of the implanted Mg. We then sought to modify the implantation process (channeled implantation, co-implantation) to promote the integration of the dopant and limit the formation of defects. In parallel we evaluated the interest of secondary annealing (Rapid thermal annealing (RTA), laser annealing, microwave) in order to finalize the activation of the dopant. Finally we also set up an electrical characterization process for doped GaN layers in the laboratory.

abstract: InAsBi is a narrow direct gap III-V semiconductor that has recently attracted considerable attention because its bandgap is tunable over a wide range of mid- and long-wave infrared wavelengths for optoelectronic applications. Furthermore, InAsBi can be integrated with other III-V materials and is potentially an alternative to commercial II-VI photodetector materials such as HgCdTe. Several 1 μm thick, nearly lattice-matched InAsBi layers grown on GaSb are examined using Rutherford backscattering spectrometry and X-ray diffraction. Random Rutherford backscattering measurements indicate that the average Bi mole fraction ranges from 0.0503 to 0.0645 for the sample set, and ion channeling measurements indicate that the Bi atoms are substitutional. The X-ray diffraction measurements show a diffraction sideband near the main (004) diffraction peak, indicating that the Bi mole fraction is not laterally uniform in the layer. The average out of plane tetragonal distortion is determined by modeling the main and sideband diffraction peaks, from which the average unstrained lattice constant of each sample is determined. By comparing the Bi mole fraction measured by random Rutherford backscattering with the InAsBi lattice constant for the sample set, the lattice constant of zinc blende InBi is determined to be 6.6107 Å. Several InAsBi quantum wells tensilely strained to the GaSb lattice constant with dilute quantities of Bi are characterized using photoluminescence spectroscopy. Investigation of the integrated intensity as a function of carrier excitation density spanning 5×1025 to 5×1026 cm-3 s-1 indicates radiative dominated recombination and high quantum efficiency over the 12 to 250 K temperature range. The bandgap of InAsBi is ascertained from the photoluminescence spectra and parameterized as a function of temperature using the Einstein single oscillator model. The dilute Bi mole fraction of the InAsBi quantum wells is determined by comparing the measured bandgap energy to that predicted by the valence band anticrossing model. The Bi mole fraction determined by photoluminescence agrees reasonably well with that estimated using secondary ion mass spectrometry. / Dissertation/Thesis / Masters Thesis Materials Science and Engineering 2016