The UV-Visible spectra of a-C composites and nano composites have provided a very useful information about the electronic states and band structure. The UV-Visible spectra of a-C as well as nanoparticle are qualitatively similar. They do not show any absorption cutoff in wavelength (_max). In fact they are good absorbers of UV-Visible light in whole range. Composites show some absorptions which could be the combined effect of filler as we as host matrix. Since there is no _max, hence it is very unlikely to define any optical band gap. The nanoparticle is a good absorber in midinfrared compared to a-C. That may be due to presence of complicated kind of vibrational modes of carbon cased nanoparticle.Besides Fe3C also produces some additional modes. With kind of spectrum we have it is difficult to identify the different modes unambiguously for nanoparticle. The combined effects of filler as well as host polymer are reflected in both sets of composites. A new absorption is observed in a-C as well as in nanoparticle composites at 2370 cm−1 and 3462 cm−1 respectively. This peak may arise in composites due to interaction between filler and host matrix. The thermo gravimetric analysis is a useful characterization techniques for polymer and composites. It gives the information about the stability, phase change, degradation, chemical reaction and many more. The a-C composites as well as nano composites are stable up to 200_ C. These composites can be safely used for any practical purpose below this temperature. During the synthesis of composites the filler does not take part in any reaction. This fact is reflected in the DTG curve. The composites degrade in the way host polymer degrades.

Following the first report on electronic transport measurements of graphene, an atom-thick carbon material, many scientists have devoted effort to understand its fundamental properties. In this work, the mechanical properties of graphene-based materials, including monolayer graphene oxide and chemical vapor deposition (CVD) grown graphene, were determined using membrane structures. Furthermore, a membrane structure was used to demonstrate thermoacoustic sound generation from monolayer graphene. In order to realize the mechanical characterization, reproducible methods to fabricate graphene membranes were developed using dry and wet transfer techniques. A novel dry transfer technique produced graphene-sealed microchambers without trapping liquid inside. An improved wet transfer technique enabled the transfer of graphene onto perforated substrates. Monolayer graphene oxide was mechanically tested using scanning atomic force microscopy (AFM) combined with finite element analysis of the data. The mechanical deformation was measured by scanning AFM tips over the suspended graphene oxide membranes. The Young’s modulus of the membranes was obtained by analyzing the deformation using finite element analysis together with a mapping technique. In addition, membranes with 2 and 3 layers of graphene oxide were identified using transmission electron microscopy and mechanically characterized. Moreover, these same methods were used for measuring mechanical properties of ultra-thin amorphous carbon membranes. Bulge tests, which apply uniform pressure on the suspended membrane, revealed the mechanical behavior of polycrystalline graphene grown on copper foils by chemical vapor deposition. In particular, the effect of grain boundaries on the elastic properties of polycrystalline graphene was studied by correlating its Young’s modulus with the density of grain boundaries within the membranes. It was observed that a large number of grain boundaries softened the graphene membranes. Graphene, along with monolayer hexagonal boron nitride, is the ultimate limit of thin materials. Thus, it is an ideal candidate as a thermoacoustic sound source because of its low heat capacity per unit area. The work presented here provides the first demonstration of thermoacoustic sound generation from large-area monolayer graphene. A fundamental understanding of the influence of the underlying substrates was achieved by comparing the acoustic performance of graphene membranes on various patterned substrates with different porosities. / text

Per paskutinį dešimtmetį anglies nanostuktūros – amorfinės anglies plėvelės, fulerenai, o ypač nanovamzdeliai patraukė daugelio tyrėjų dėmesį. Šios struktūros yra daug žadančios puslaidininkių pramonėje, dėl galimybių prietaisų miniatiūrizavimui. Šiuo metu nanotechnologija patraukia vis didesnį dėmesį. Neabejojama anglies ir kitų nanostruktūrų išskirtinėmis savybėmis ir bandoma jas pritaikyti įvairiose srityse, tačiau šių struktūrų įdiegimą riboja tai, kad sunku pagaminti norimų struktūrų ir išmatavimų anglies nanodarinius, nes būtent anglies nanodarinių struktūra nulemia šių darinių fizikines savybes, taipogi ir laidumą. / Carbon nanodivices have attracted the attention of many researchers since their discovery last decade. These carbon molecules are tiny tubes with diameters down to 0.4 nm, while their lengths can grow up to a million times their diameter. Using their remarkable electrical properties, simple electronic logic circuits have been built. These structures are promising for the semiconductor industry which is leading the search of miniaturization. They are not only very good conductors, but they also appear to be the yet found material with the biggest specific stiffness, having half the density of aluminium. They also have great active surface. The aim of this work is to analyse the variable range hopping ( VRH ) conduction, which can describe conduction mechanism in carbon films. Also, to find conduction parameters, whish describe the conduction mechanism in carbon films and carbon nanotubes networks. In that work was analysed impacts of photon – assisted tunneling on electrical conductivity in carbon nanotubes networks mechanism.

Orientador: Francisco das Chagas Marques / Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-14T14:37:10Z (GMT). No. of bitstreams: 1 OliveiraJunior_MyrianoHenriquesde_D.pdf: 13534676 bytes, checksum: 4da81eaf9a2b22721528c9804801a446 (MD5) Previous issue date: 2009 / Resumo: Neste trabalho desenvolvemos um sistema de deposição de filmes finos pela técnica de arco catódico filtrado (FCVA- Filtered Cathodic Vacuum Arc), que possibilita o desenvolvimento de ligas metálicas e, sobretudo, a deposição de filmes de carbono amorfo altamente tetraédrico. Utilizando este sistema desenvolvemos filmes de carbono amorfo (a-C) com elevada dureza (estimado em cerca de 50 a 60GPa) e alta concentração de ligações sp3 C-C em função da polarização do substrato. Estudamos as propriedades ópticas, mecânicas (stress e dureza), estruturais (Raman e RBS) e a estabilidade térmica (efusão de gases) destes filmes em função da energia de deposição. Também desenvolvemos e caracterizamos filmes de carbono crescidos por FCVA assistido por um feixe de íons secundário de Ar e Kr com diferentes energias, onde analisamos os efeitos da energia deste feixe sobre as propriedades físicas do material resultante. Além das estruturas de carbono intrínseco realizamos um estudo sobre filmes de carbono amorfo hidrogenado depositados por PECVD (plasma enhanced chemical vapor deposition) com diferentes tensões de bias (de 60 à 550V) e atmosferas mistas de CH4/Kr, onde variamos a pressão parcial deste gás nobre entre 0 e 50%. Estudamos a influência deste gás nobre sobre as propriedades estruturais do material assim como a forma como os átomos deste elemento se distribuem dentro da rede amorfa. Esta última análise foi baseada em estudos conduzidos a partir da absorção de raios-x na borda K do átomo de criptônio, onde verificamos a aglomeração destes átomos na forma de estruturas solidas. Também investigamos os processos de transformações estruturais ocorridas em estruturas a-C:H e ta-C com a temperatura baseadas na efusão de gases. Para este estudo construímos um sistema que funciona em ultra-alto vácuo, com temperatura controlada variando de ambiente até cerca de 1000 graus. Os estudos sobre as propriedades estruturais foram baseados, sobretudo, em medidas de espectroscopia de espalhamento Raman com radiação de excitação na região do visível e do ultravioleta, o que possibilita a obtenção de informações mais detalhadas sobre a forma como os átomos sp2 e sp3 distribuem-se no material. Por fim, exploramos o potencial de aplicação de três tipos de carbono amorfo; tipo polimérico (PLC), tipo diamante (DLC) e tetraédrico (ta-C) como monocamadas antirefletoras para células solares de silício cristalino e comparamos com o desempenho obtido com camadas fabricadas com materiais usualmente empregados na indústria para tal aplicação. Os resultados mostraram que filmes de carbono amorfo podem ser utilizados como camada anti-refletora. Os filmes de carbono tipo polimérico apresentaram resultados muito semelhantes aos obtidos com camadas convencionais de dióxido de estanho / Abstract: In this work we designed, manufactured and characterized a Filtered Cathodic Vacuum Arc (FCVA) deposition system. This technique is usually applied in the preparation of metallic alloys and highly sp3 - hybridized amorphous carbon thin films. By using this system we prepared a series of amorphous carbon films (a-C) with high hardness (up to ~60GPa) and high concentration of sp3 C-C bonds varying the deposition energy of the C+ ions. Mechanical (hardness and intrinsic stress) and structural (Raman, RBS and gas effusion) were investigated. Another series of a-C was developed by FCVA, but using an assisted beam of Ar or Kr as a function of the ion energy. The main purpose of this work is to understand of the effects of the bombardment of an energetic ion beam on the physical properties of the films. Another study performed on hydrogenated amorphous carbon films (a-C:H) were carried out on samples deposited by plasma enhanced chemical vapor deposition (PECVD). The films were prepared with different self-bias, varying from 60 up to 550V, and different mixed atmospheres of methane and krypton gases, varying the partial pressure of krypton from 0 to 50%. Films prepared at low bias are polymeric-like (PLC), while films prepared at high bias are diamond-like (DLC). We had performed investigations on the influence of this noble gas on the structural properties of the a-C:H films and how the Kr atoms are arranged within the amorphous matrix. The distribution of Kr atoms was studied mainly by x-ray absorption on the krypton absorption K-edge. Due to the absence of EXAFS oscillations the spectra were interpreted using the XANES region, which gave us evidences of clustering of Kr atoms. The processes involved in the a-C:H nd ta-C structural transformations during the thermal annealing were analyzed by means of thermal gas effusion measurements (using a quadrupole spectrometer) in a system developed in our laboratory. Raman scattering spectroscopy measurements were carried out with excitation radiation in the visible and ultraviolet ranges. This choice is justified due to the more detailed information obtained by multiwavelength Raman spectroscopy on the distribution of sp2and sp3sites within the amorphous carbon matrix. Finally, we had evaluated the possibility of the application of three types of amorphous carbon structures, the diamond-like and polymeric-like carbon, and the ta-C as antireflective coating on crystalline silicon solar cells. We observed that all amorphous carbon structures (DLC, PLC and ta-C) increase the short-circuit current of the solar cells. In the case of PLC films, the result is comparable to that obtained with conventional antireflective coating such as tin dioxide (SnO2) / Doutorado / Física da Matéria Condensada / Doutor em Ciências

[pt] Este trabalho teve como objetivos o estudo das modificações nas propriedades de filmes de carbono amorfo hidrogenado (a-C:H) através do tratamento da sua superfície com plasma de tetrafluoreto de carbono (CF4) e Argônio e a deposição e estudo das propriedades tribológicas de filmes de carbono amorfo fluorado e hidrogenado (a-C:F:H) sobre substrato de aço inoxidável 316L. A primeira parte da tese descreve a funcionalização por plasma da superfície com flúor de filmes previamente depositados de a-C:H sobre silício cristalino 100 pela técnica da deposição química na fase vapor assistido por plasma PECVD. Esta funcionalização foi feita pelo emprego de plasma de uma mistura dos gases CF4 e Argônio em diferentes proporções. Estes filmes tiveram a sua superfície analisada por espectroscopia de fotoelétrons, microscopia de força atômica e tiveram a sua energia superficial avaliadas por medidas de ângulo de contato de três diferentes líquidos (água deionizada, glicerol e bromonaftaleno). A funcionalização com Flúor tornou a superfície superhidrofóbica, atingindo valores em torno de 140 graus. Na segunda parte da tese descrevemos com sucesso a deposição por PECVD de filmes de carbono amorfo fluorados sobre substratos de aço inoxidável 316L. Para melhorar a adesão, os substratos foram submetidos a tratamento com nitretação e carbonitretação por plasma e a posterior deposição de um filme de titânio e de a-C:H. Nestes filmes foram realizadas medidas de microscopia de força atômica, dureza, espectroscopia de fotoelétrons e tribometria para determinar o coeficiente de atrito e resistência ao desgaste mecânico. Os resultados obtidos mostraram que a incorporação de CF4, produz filmes com propriedades semelhantes às propriedades do Teflon. Obtivemos filmes com dureza em torno de 11Gpa, mais duro que o aço inoxidável 316L, cuja dureza é de aproximadamente 4,5 GPa, porém menor que a medida em aço nitretado. Com relação ao coeficiente de atrito, o filme de a-C:F:H apresentou uma redução significativa em relação ao aço e ao aço nitretado. As medidas de tribometria também mostraram que o filme ficou bem aderido e apresenta boa resistência ao desgaste mecânico, resistindo a centenas de ciclos com a ponta do tribometro arrastando sobre a superfície com forças aplicadas de 10N. Como resultado conseguimos depositar filmes sobre aço inoxidável 316L com baixo coeficiente de atrito, dureza elevada e boa resistência ao desgaste mecânico. / [en] This work aimed to the study of the modifications of the properties of carbon amorphous hydrogenated films (a-C:H) trough the treatment of the surface film with plasma of carbon tetra fluoride (CF4) and Argon. Another object has been the study of the tribological properties of carbon amorphous fluorinated and hydrogenated (a-C:F:H) deposited on substrates of stainless steel 316L. The first part of the these describes the functionalization by plasma of the surfaces with fluorine of films previously deposited of a-C:H on crystalline silicon 100 by the technique of plasma enhanced chemical vapor deposition PECVD. This functionalization was made by the use of plasma of a mixture of CF4 and Argon gases in different proportions. The films had their surfaces analyzed by photoelectron spectroscopy, atomic force microscopy and their surface energies calculates by measurement of the angle contact of three different liquids (water, glycerol and bromonaphthalene). The functionalization with Fluorine made the surface super hydrophobic, reaching values for the contact angle around 140 degrees. In the second part of the these we describe the successful deposition by PECVD of films of carbon amorphous fluorinated on stainless steel 316L. In order to improve the adhesion, the substrates were submitted to treatment with nitriding and carbonitriding by plasma and the subsequent deposition of a film of titanium and a-C:H. In these films were realized measurements of atomic force microscopy, hardness, photoelectron spectroscopy and tribometry to determine the friction coefficient and the resistance to mechanical wastage. The results obtained showed that an incorporation of CF4, produces films with properties similar to teflon properties. We obtained films with hardness around 11 Gpa, harder than stainless steel 316L, whose hardness is approximately 4,5 Gpa, but smaller than the measure in nitrated steel. In relation to the friction coefficient, the film of a-C:F:H presented a significant reduction in relation to the steel and nitrated steel. The tribometry measurements also showed that the film was well adhered and present good resistance to mechanical wear, resisting to hundreds of cycles with the point of the tribometry dragging on the surface with applied force of 10N. As result we get to deposit films on stainless steel 316L with low friction coefficient, elevated hardness and good resistance to mechanical wear.

Die Bestrahlung von tetraedrisch amorphen Kohlenstoff (ta-C) mit schnellen schweren Ionen führt zur Bildung von mikroskopischen elektrisch leitfähigen Ionenspuren mit Durchmessern um 10 nm. Dieses Phänomen ist auf das sp² zu sp³ Hybridisierungsverhältnis des amorphen Kohlenstoffes zurückzuführen. Das einschlagende Ion deponiert eine große Menge Energie innerhalb des Spurvolumens, so dass eine Materialtransformation hin zu höheren sp² Hybridisierung stattfindet. Hierdurch wird die elektrische Leitfähigkeit der Ionenspur stark erhöht. Dieser Effekt kann durch die Zugabe von Verunreinigungen wie Kupfer verstärkt werden. Das Ziel dieser Arbeit ist die umfassende Analyse des elektrischen Verhaltens von ta-C mit besonderen Augenmerk auf die Auswirkungen von Kupferverunreinigungen und Ionenspuren. Der Effekt von Kupferverunreinigungen auf das wichtige Hybridisierungsverhältnis vom amorphen Kohlenstoff wird vermessen. Darüber hinaus wurden alle Proben elektrisch mit makroskopischen Kontakten im Temperaturbeireich von 20 K bis 380 K analysiert. Mikroskopisch wurden einzelne leitfähige Ionenspuren mit Hilfe von atomarer Kraftmikroskopie betrachtet. Die statistische Verteilung der Spureigenschaften in Kohlenstofffilmen mit verschiedenen Kupferkonzentrationen werden verglichen, um die Spurbildung besser zu verstehen. Die normalisierten durchschnittlichen Spurleitfähigkeiten aus mikroskopischen und makroskopischen Messungen werden verglichen. Hierbei kann die Zuverlässigkeit der beiden experimentellen Methoden bewertet werden und mögliche Fehlerquellen ausfindig gemacht werden. Schließlich wird ein Konzept für eine Anwendung unterbrochener Ionenspuren gezeigt.

New Generation Lithographic (NGL) techniques have been recently investigated in order to overcome the limitations of the long-used UV lithography. Several techniques have been proposed during the last decades, but the continued improvement of UV lithography rendered them useful only for a limited number of applications. More recently, nanoimprint lithography (NIL), invented in the nineties, has been considered as the new NGL due to its extreme simplicity and high resolution. Thermal NIL consists in the deformation of a thermoplastic under pressure and temperature by a nanostructured mold, while UV-NIL consists in the polymerization by UV light of a monomer at room temperature and under a lower pressure than Thermal NIL. One of the main problems of this technique is mold-polymer separation after the process. This problem is especially important for UV-NIL, because the working treatments for Thermal NIL degrade with UV light. In order to assess this problem, thin diamond-like amorphous carbon films (DLC) have been proposed as an alternative to existing treatments for their low chemical reactivity and the possibility to incorporate other chemical elements to further reduce their surface energy. Amorphous carbon exists in different forms, depending on how it is grown. Its mechanical properties range from polymer or graphite-like to almost as resistant as diamond. Besides the excellent mechanical properties of DLC (high hardness, elasticity and wear resistance, and low dry friction), amorphous carbon has also been found useful in applications requiring inert and/or biocompatible surfaces. The project DPI2007-61349 of the Science and Innovation Department of Spain, named “Amorphous carbon molds for micro and nanoimprint of polymeric surfaces”, aims to study the effect of the incorporation of different elements in DLC films for the improvement of NIL molds. This thesis has focused on a series of objectives of this project: - Design and construction of a very high vacuum reactor for deposition processes and ionic etch - Incorporation of fluorine to amorphous carbon films and subseqüent characterization by different surface, mechanical and tribological techniques, as well as spectroscopy for the characterization of the plasma used for the process. - Set up and optimization of a deep ion etch technique with ion beam for the production of molds. - The use of different lithographic techniques oriented to the production in large scale of nanometric patterns. - The exploration of mold coating to increase its durability and antisticking properties in nanoimprint processes. The incorporation of fluorine in DLC films has demonstrated to be useful in the improvement of the properties of NIL molds, because it avoids the use of the current surface treatments, which in addition to being less durable, can react with polymers in presence of UV light. In this thesis, the influence of fluorine incorporation in the films has been studied. Fluorinated amorphous carbon films have been deposited by pulsed-DC plasma enhanced chemical vapor deposition, by progressively replacing methane by trifluoromethane. The experimental device used for deposition has been designed and built to allow a number of multiple processes in the same reactor. The results of the study demonstrate the feasibility of this technique, of easy industrial implementation, for the deposition of this type of coatings. The characterization of both the active species in the plasma and the groups incorporated into the deposited films has helped to understand the process of fluorine incorporation, as well as the change in the surface properties that it entails. / La dificultad de extender el uso de la litografía de luz ultravioleta (UV) a los cada vez más estrictos requisitos de resolución, llevaron desde hace ya un par de décadas, a plantearse la necesidad de buscar técnicas litográficas llamadas de “Nueva Generación” (NGL) que las superasen. Son diversas las técnicas se han ido proponiendo durante estos años, pero la mejora de la litografía UV las ha ido relegando fuera del ámbito industrial. Más recientemente, la litografía por nanoestampación (NIL), ha tomado fuerza como la nueva NGL por su extrema sencillez y por su demostrada elevada resolución. La NIL térmica (T-NIL) consiste en la deformación de un termoplástico bajo presión y temperatura por un molde con estructuras nanométricas, mientras que la NIL por UV (UV-NIL) consiste en la polimerización de un monómero a temperatura ambiente con menor presión ejercida por un molde transparente al UV. Uno de los principales problemas de esta técnica es la separación de molde y polímero, una vez finalizado el proceso. Como alternativa a los tratamientos existentes, se han propuesto los recubrimientos de carbono amorfo tipo diamante (DLC) por su baja reactividad química, elevada dureza y posibilidad de incorporación de otros elementos químicos a fin de reducir su energía superficial. El proyecto del Ministerio de Ciencia e Innovación DPI2007-61349, “Moldes de carbono amorfo para micro y nanograbado de superficies poliméricas”, en el cuál se ha enmarcado esta tesis, pretende estudiar los efectos de la incorporación de diferentes elementos en capas de DLC para la mejora de los moldes de NIL. La incorporación de flúor en capas de DLC ha demostrado recientemente ser útil en la mejora de las propiedades de los moldes de NIL, porque evita el uso de los actuales tratamientos superficiales (por ejemplo siloxanos), los cuales, además de ser menos duraderos, pueden reaccionar con los polímeros en presencia de luz UV. Así, en esta tesis se ha estudiado la influencia de la incorporación de flúor a capas de DLC en la composición y en las propiedades de superfície obtenidas.

Orientador: Francisco das Chagas Marques / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-12T20:56:17Z (GMT). No. of bitstreams: 1 Silva_DouglasSoaresda_M.pdf: 1607458 bytes, checksum: 64efea4eea6490352c0cec9182778a67 (MD5) Previous issue date: 2009 / Resumo: Nesta tese estamos propondo o uso de carbono amorfo como um possível candidato para uso como camada antirrefletora em células solares de silício cristalino. O carbono amorfo pode ser preparado com alta banda proibida e tem propriedades importantes como alta dureza, baixo coeficiente de atrito, preparado à temperatura ambiente, etc. Além disso, o carbono amorfo é um material abundante na natureza e seu uso em eletrônica poderia reduzir o consumo de materiais tóxicos, contribuindo para reduzir danos ao meio ambiente. Foram exploradas as propriedades óticas dos filmes de carbono e carbono de silício produzidos por diferentes métodos de deposição (RF Glow Discharge, RF Sputtering e FCVA_Filtered Cathodic Vacuum Arc) visando a aplicação como camadas antirrefletoras em células solares. O estudo de propriedades óticas dos filmes, como a banda proibida, índice de refração, coeficiente de absorção e reflexão integrada foram determinantes para as conclusões deste trabalho. Para isto foram importantes a fabricação de células solares e o estudo dos principais parâmetros fotovoltaicos: eficiência, corrente de curto circuito, tensão de circuito aberto e fator de preenchimento. As células solares de silício monocristalino foram desenvolvidas a partir da técnica amplamente difundida e conhecida através da difusão térmica de dopantes de fósforo, as chamadas homojunções pn. Diferentes estruturas antirrefletoras à base de carbono foram estudadas e comparadas. Assim, investigamos o uso de carbono tipo diamante (diamond-like carbon DLC), carbono tipo polimérico (polimeric-like carbon ¿ PLC), carbono tetraédrico (ta-C), carbeto de silício (a-CxS ix-1:H). Para efeito de comparação com camadas antirrefletoras convencionais, adotamos o dióxido de estanho (SnO2) depositado pela técnica de spray químico. Os resultados mostraram que filmes de carbono amorfo funcionam como camada antirefletora em células solares, embora não tenha sido possível encontrar em um único material todas as condições ideais para uma camada antirrefletora em silício cristalino. O carbeto de silício se mostrou bastante promissor como um composto à base de carbono e o próprio silício, sendo utilizado na fabricação do dispositivo e abundante na natureza. / Abstract: In this thesis we propose the use of amorphous carbon as a possible candidate for use as antireflective layer in crystalline silicon solar cells. The amorphous carbon can be prepared with high band gap and important properties such as high hardness, low coefficient of friction, prepared at room temperature, etc. Moreover, the amorphous carbon material is abundant in nature and its use in electronics could reduce the consumption of toxic materials, helping to reduce damage to the environment. We explored the optical properties of carbon films and carbon silicon produced by different methods of deposition (RF Glow Discharge, RF Sputtering and FCVA_Filtered Cathodic Vacuum Arc) to the application as antireflective coatings in solar cells. The study of optical properties of films, such as forbidden band, index of refraction, absorption coefficient and integrated reflection were crucial to the conclusions of this work. For that, it was important the manufacture of solar cells and the study of key photovoltaic parameters: efficiency, short-circuit current, open circuit voltage and fill factor. The single crystal silicon solar cells were developed from the widely known technique of thermal diffusion of phosphorus doping, the pn homojunctions. Different antireflective structures based on carbon were studied and compared. Thus, we investigated the use of carbon type diamond (diamond-like carbon DLC), carbon type polymer (polimeric-like carbon - PLC), tetrahedral carbon (ta-C), silicon carbide (a-CxSix-1: H). For purposes of comparison with conventional antireflective layers, we adopted the tin dioxide (SnO2) deposited by chemical spray technique. The results showed that films of amorphous carbon layer acts as antireflective coatings in solar cells, although it was not possible to find a single material in all ideal conditions for an antireflective layer in crystalline silicon. The silicon carbide wasvery promising as a compound based on carbon and the silicon, been used in the manufacture of the device and abundant in nature. / Mestrado / Mestre em Física

[pt] Neste trabalho são apresentados os efeitos nas propriedades mecânicas, estruturais e tribológicas da incorporação de flúor em filmes de carbono amorfo hidrogenados depositados por Deposição na Fase Vapor Assistido por Plasma . A estabilidade térmica de filmes de carbono amorfo fluorados também foi estudada. Os filmes foram depositados a partir de uma mistura dos gases C2H2 e CF4 com uma tensão de autopolarização de - 350V. A mistura de gases da deposição foi variada de uma concentração de 0% até 90% de CF4. A estabilidade térmica foi verificada em filmes depositados com 50% de C2H2 e 50% de CF4 na atmosfera precursora. Os filmes foram submetidos a temperaturas variando de 200oC a 600oC por 30 minutos. As propriedades mecânicas, estruturais e tribológicas dos filmes foram estudados com o uso de técnicas nucleares (retroespalhamento de Rutherford e Detecção por recuo elástico), espectroscopia Raman, espectroscopia de fotoelétrons induzida por raios-X, perfilometria (tensão interna), nanoindentação (dureza), de microscopia de força atômica e de ângulo de contato. Os resultados obtidos mostraram que a incorporação de flúor produzem filmes com as propriedades indo em direção às propriedades do Teflon. Os filmes ricos em flúor são menos densos, mais macios, mais hidrofóbicos e tem um menor coeficiente de atrito do que filmes de carbono amorfo hidrogenados. O tratamento térmico realizado mostrou que os filmes são estáveis a temperaturas de até 300oC. A partir desta temperatura os filmes sofreram perda de flúor e mudanças nas suas propriedades indicando a formação de uma estrutura mais grafítica. / [en] This work presents the effects on the mechanical, structural and tribological properties of the incorporation of fluorine in amorphous carbon films deposited by PECVD (Plasma Enhanced Chemical Vapor Deposition). The thermal stability of fluorinated amorphous carbon films was also studied. The films were deposited using mixtures of C2H2 and CF4 gases with a self-bias voltage of - 350V. The concentration of CF4 in the gases mixture was varied from 0% to 90%. The thermal stability was investigated in films deposited with 50% C2H2 and 50% CF4 as precursor atmosphere. These films were annealed in the temperatures range of 200oC to 600oC during 30 minutes for each sample. The mechanical, structural and tribological properties were studied using nuclear techniques (Rutherford Backscattering and Elastic Recoil Detection Analysis), Raman and X-ray photoelectron spectroscopy, profilometry (for internal stress) and nanoidentation (for hardness), atomic force microscopy and contact angle measurements. The results showed that fluorine incorporation produces films with properties resembling the Teflon's properties. The films rich in fluorine appear to have lower density, more hydrophobicity and lower friction coeficient than amorphous carbon films. They are also softer than them. The thermal annealing shows that films were thermally stable within temperatures up to 300oC. Above this temperature the films tend to loose fluorine and their properties change revealing a more graphitic structure.

[pt] Filmes de carbono amorfo hidrogenados, (a - C: H) e nitrogenados,) ( a - C: H(N) - depositados pela técnica Plasma Enhanced Chemical Vapor Deposition (PECVD) em atmosferas de metano e metano-nitrogênio foram submetidos a tratamento em plasmas de N2. A influência de vários parâmetros foi investigada: a pressão da câmara, tensão de autopolarização e tempo de exposição. A taxa de erosão determinada por perfilometria. A taxa aumenta com a tensão e tende a saturar-se para altas pressões. A incorporação de nitrogênio foi medida por reação nuclear. O resultado indica um decréscimo no conteúdo de N com o aumento da tensão de autopolarização e pode ser explicado pelo aumento da erosão química e física. As ligações químicas foram analisadas por XPS e dois ambiente podem ser identificados: um com átomos de N rodeado por átomos de C e o outro com átomos N ligado ao H. A modificação da rugosidade da superfície e coeficiente de atrito foi caracterizada por Microscopia de Força Atômica (AFM). A rugosidade da superfície é independente do valores de autopolarização, quando o coeficiente de atrito decresce com o aumento da tensão de autopolarização. / [en] Amorphous Hydrogenated carbon films (a - C: H) and nitrogenated films ) (a - C: H(N) - deposited by plasma enhanced chemical vapor deposition in 4 CH and CH4-N2 atmospheres were submitted to nitrogen r.f.- plasma treatment. The influence of several parameters was investigated: the chamber pressure, the self-bias voltage and the exposure time. The erosion rate was determined by profilometry. It increases as the self-bias increases and tends to saturate for higher pressures. The nitrogen incorporated in the films was measured by nuclear reation analysis. The results indicate a decrease in the N content a the self-bias increase that can be atributted toen increase of the sputtering yield. The chemical bonds were probed by XPS and two chemical environments can be identified, one with N atoms surrounded by C atoms and the other one with N atoms binding to H. Surface roughness and friction coefficient modifications were followed by atomic force and lateral force microscopies. The surface roughness is independent on the value of the self-bias voltage, while the friction coefficient slightly decreases.