Electron beam therapy planning and custom electron bolus design were identified as areas in which improvements in equipment and techniques could lead to significant improvements in treatment delivery and patient outcomes. The electron pencil beam algorithms used in conventional Treatment Planning Systems do not accurately model the dose distribution in irregularly shaped objects, near oblique surfaces or in inhomogeneous media. For this reason, at Christchurch Oncology Centre the TPS is not relied on for planning electron beam treatments. This project is an initial study of ways to improve the design of custom electron bolus, the planning of electron beam therapy, and other radiation therapy simulation tasks, by developing a system for the accurate assessment of dose distributions under irregular contours in clinically relevant situations. A shaped water phantom system and a diode array have been developed and tested. The design and construction of this water phantom dosimetry system are described, and its capabilities and limitations discussed. An EGS/BEAM Monte Carlo simulation system has been installed, and models of the Christchurch Oncology Centre linacs in 6MeV and 9MeV electron beam modes have been built and commissioned. A test was run comparing the EGS/BEAM Monte Carlo system and the CMS Xio conventional treatment planning system with the experimental measurement technique using the water phantom and the diode array. This test was successful as a proof of the concept of the experimental technique. At the conclusion of this project, the main limitation of the diode array system was the lack of data processing software. The array produces a large volume of raw data, but not enough processed data was produced during this project to match the spatial resolution of the computer models. An automated data processing system will be needed for clinical use of the array. It has been confirmed that Monte Carlo and pencil-beam algorithms predict significantly different dose distributions for an irregularly shaped object irradiated with megavoltage electron beams. The results from the diode array were consistent with the theoretical models. This project was an initial investigation. At the time of writing, the diode array and the water phantom systems were still at an early stage of development. The work reported here was performed to build, test and commission the equipment. Additional work will be needed to produce an instrument for clinical use. Research into electron beam therapy could be continued, or the equipment used to expand research into new areas.

This thesis reports on the findings of an investigation into the dosimetry resulting from the abutment of en face 6 MeV electron and 6 MV photon beams as applied to the clinical challenge of radiation therapy treatments to head and neck cancer sites. Particular concern is given to the use of multi-leaf collimator (MLC) technology for photon beam definition when abutted to extended source-to-surface (SSD) electron beams. We made dosimetric comparison between MLC and Cerrobend® shielding for use in an abutment situation. The effects of extending the SSD of the electron beam were also assessed. We checked the ability of a Pinnacle3 v7.6 treatment planning system (TPS) to correctly model the dosimetry resulting from this extended electron beam SSD. Volumetric simulations of composite dosimetry resulting in water were conducted in MATLAB® for variations of surface abutment gap, and photon beam shielding type and angle. Visualization Toolkit (VTK) script was developed to visualise the resulting dosimetry. The effect of extending the SSD of the electron beam increases the beam penumbra significantly, exacerbating the challenge of matching this field to a photon beam edge. Furthermore, the TPS was shown to inaccurately model the electron beam penumbra for the extended SSD conditions. The employment of MLC shielding provides for some advantages over Cerrobend® in terms of overall composite hotspot volumes and coldspot magnitudes, though introduces detrimental dosimetric inhomogeneities in the underlying volume. Distinctly, no combination of abutment gap and shielding variables resulted in dosimetry in the range of 90% to 110% at the depth of dmax for the beam energies considered here. We provided tabulated data across these variables to outline the trade-offs present, and aid clinical decisions regarding this challenging dosimetric

This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R&D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development process, as well as pattern transfer procedure after lithography. Specifically, this thesis investigates the following topics that are related to either electron beam resists, their development, or pattern transfer process after electron beam lithography: (1) The dry thermal development (contrary to conventional solvent development) of negative electron beam resists polystyrene (PS) to achieve reasonably high contrast and resolution. (2) The solvent development for polycarbonate electron beam resist, which is more desirable than the usual hot aqueous solution of NaOH developer, to achieve a low contrast that is ideal for grayscale lithography. (3) The fabrication of metal nanostructure by electron beam lithography and dry liftoff (contrary to the conventional liftoff using a strong solvent or aqueous solution), to achieved down to ~50 nm resolution. (4) The study a novel electron beam resist poly(sodium 4-styrenesulfonate) (sodium PSS) that is water soluble and water developable, to fabricate the feature size down to ~ 40 nm. And finally, (5) The fabrication of gold nanostructure on a thin membrane, which will be used as an object for novel x-ray imaging, where we developed the fabrication process for silicon nitride membrane, electroplating of gold, and pattern transfer after electron beam lithography using single layer resist and tri-layer resist stack.

There is growing interest in using additive manufacturing for various alloy systems and industrial applications. However, existing process development and part qualification techniques, both involve extensive experimentation-based procedures which are expensive and time-consuming. Recent developments in understanding the process control show promise toward the efforts to address these challenges. The current research uses the process mapping approach to achieve control of melt pool geometry and microstructure in different alloy systems, in addition to location specific control of microstructure in an additively manufactured part. Specifically, results demonstrate three levels of microstructure control, starting with the prior beta grain size control in Ti-6Al-4V, followed by cell (solidification structure) spacing control in AlSi10Mg, and ending with texture control in Inconel 718. Additionally, a prediction framework has been presented, that can be used to enable a preliminary understanding of melt pool geometry for different materials and process conditions with minimal experimentation. Overall, the work presented in this thesis has the potential to reduce the process development and part qualification time, enabling the wider adoption and use of additive manufacturing in industry.

Aus der Einleitung: "Das selektive Elektronenstrahlschmelzen (engl. Electron Beam Melting (EBM®)) ist ein pulverbettbasiertes additives Fertigungsverfahren, mit dessen Hilfe metallische Bauteile schichtweise hergestellt werden können. Der schematische Aufbau einer entsprechenden Anlage ist in Abbildung 4 dargestellt. Dabei erfolgt die Strahlerzeugung im Bereich 1 (die Kathode besteht entweder aus Wolfram oder bei den neuesten Systemen aus einkristallinem LaB6). Die Strahlablenkung durch ein elektromagnetisches Linsensystem erfolgt im Bereich 2. Der Bereich 3 ist die eigentliche Baukammer, in der sich unter anderem die Vorratsbehälter für das Pulver, das Rakelsystem sowie die Komponenten des Bauraums (Käfig mit Hitzeschild, Bauplattform mit Startplatte) befinden. ..."

Les technologies de fabrication additive(FA) basées sur la technique de fusion laser sur lit de poudres, telles que les procédés de fusion sélective laser (Selective Laser Melting ‘SLM’) et de fusion par faisceau d'électrons (Electron Beam Melting ‘EBM’), ne cessent de se développer afin de produire des pièces fonctionnelles principalement dans les domaines aérospatial et médical. Le procédé de fabrication additive offre de nombreux avantages, tels que la liberté de conception, la réduction des étapes de fabrication, la réduction de la matière utilisée, et la réduction de l'empreinte carbone lors de la fabrication d'un composant. Néanmoins, les pièces obtenues nécessitent une opération d’usinage de finition afin de satisfaire les tolérances dimensionnelles et l’état de surface. / Additive Manufacturing (AM) techniques based on powder bed fusion like Selective Laser Melting(SLM) and Electron Beam Melting processes(EBM) are being developed to make fully functional parts mainly in aerospace and medical sectors. There are several advantages of using AM processes like design freedom, reduced process steps, minimal material usage and reduced carbon footprint while producing a component. Nevertheless, the parts are built with near net shape and then finish machined to meet the demands of surface quality and dimensional tolerance.

Amostras de Teflón&#174 FEP e Mylar C foram submetidas a um bombardeio eletrônico por longos períodos a fim de se verificar a existência de uma possível corrente de condução na fase final de um carregamento por feixe eletrônico. Em vez disso, descobriu-se que a energia associada ao segundo ponto de cruzamento da curva de emissão eletrônica do material bombardeado varia lentamente com o tempo de exposição à irradiação. Por outro lado foram descobertos também fortes indícios de que o centróide de carga sofre um deslocamento enquanto a amostra está sendo irradiada. A componente da corrente através da amostra, associada a qualquer um desses efeitos se superpõe à corrente de condução (se existir) e acaba tornando inviável a sua observação, enquanto um ou ambos os efeitos persistirem. Na realidade não é só a energia do segundo ponto de cruzamento que varia; toda a curva de emissão característica do material, que é fundamental para se entender os processos e carga e descarga de amostras, sofre modificação com a irradiação prolongada. Além disto, dois novos métodos para se carregar uma amostra de polímero estão sendo propostos. Um deles permite carregar uma amostra positivamente, por etapas, a tensões mais elevadas que o método convencional. O outro possibilita carregar negativamente uma amostra, lançando mão do mecanismo de auto-regulação para interrupção do processo de carga, o que só havia sido feito até o momento para um carregamento positivo. Um novo método para se descarregar uma amostra usando o próprio feixe eletrônico também é apresentado. / Teflon&#174 FEP and Mylar C samples were submitted to an electron beam during long periods of time in order to examine the possible existence of conduction current in the final stages of the charging process. It was found that the energy associated with the second crossover point in the electronic emission curve of the irradiated material varied slightly with the time of irradiation. On the other hand, strong evidence emerged that the charge centroid is shifted while the sample is being irradiated. The component of the current through the sample which is associated with any of these effects is superimposed to the conduction current (if present), hampering the identification of a conduction current. In fact, it is not only the energy of the second crossover point that varies, for the whole emission curve is modified upon prolonged irradiation. This emission curve is fundamental for understanding the charging and discharging processes in the samples. In addition, two new methods for charging a sample are being proposed. The first allows one to charge the sample positively to surface potentials that are higher than those obtained in the conventional method. The other method permits the sample to be charged negatively using the auto-regulation mechanism for interrupting the charging process; this had previously been done only for charging samples positively. A new method for discharging a sample using the electron beam is also presented.

A indústria têxtil está entre uma das principais atividades do Brasil, sendo relevante em número de empregos, quantidade e diversidade de produtos e principalmente pelo volume de água utilizado nos processos industriais e na geração de efluentes. Esses efluentes são misturas complexas que se caracterizam pela presença de corantes, surfactantes, metais, sequestrantes, sais entre outras substâncias químicas com potencial tóxico a biota aquática. Considerando a escassez de tratamentos adequados a esses efluentes, novas tecnologias são essenciais em que se destacam os processos de oxidação avançada como a radiação ionizante por feixe de elétrons. Esse estudo contempla o preparo de um efluente têxtil padrão em laboratório de química têxtil e seu tratamento por feixe de elétrons proveniente de acelerador de elétrons a fim de diminuir a toxicidade e coloração intensa decorrente do corante C.I. Blue 222. O tratamento promoveu diminuição de toxicidade aguda aos organismos expostos, com eficiência de 34,55% para o micro-crustáceo Daphnia similis e de 47,83% para o rotífero Brachionus plicatilis na dose de 2,5 kGy. No ensaio com a bactéria Vibrio fischeri foi obtido o melhor resultado após o tratamento com dose de 5 kGy e eficiência de 57,29%. A redução da cor foi superior a 90% a partir da dose de 2,5 kGy. Neste trabalho também foram realizados ensaios preliminares de toxicidade aguda quanto à sensibilidade dos organismos D. similis e V. fischeri à exposição de alguns dos produtos utilizados no processo de alvejamento e tingimento, além de duas simulações de reuso de água em novos processos têxteis a partir do efluente tratado com feixe de elétrons. / The textile industry is among the main activities Brazil, being relevant in number of jobs, quantity and diversity of products and mainly by the volume of water used in industrial processes and effluent generation. These effluents are complex mixtures which are characterized by the presence of dyes, surfactants, metal sequestering agents, salts and other potentially toxic chemicals for the aquatic biota. Considering the lack of adequate waste management to these treatments, new technologies are essential in highlighting the advanced oxidation processes such as ionizing radiation electron beam. This study includes the preparation of a standard textile effluent chemical laboratory and its treatment by electron beam from electron accelerator in order to reduce the toxicity and intense staining resulting from CI. Blue 222 dye. The treatment caused a reduction in toxicity to exposed organisms with 34.55% efficiency for the Daphnia similis micro-crustacean and 47.83% for Brachionus plicatilis rotifer at a dose of 2.5 kGy. The Vibrio fischeri bacteria obtained better results after treatment with a dose of 5 kGy showing 57.29% efficiency. Color reduction was greater than 90% at a dose of 2.5 kGy. This experiment has also carried out some preliminary tests on the sensitivity of the D. similis and V. fischeri organisms to exposure of some of the products used in this bleaching and dyeing and two water reuse simulations in new textile processing after the treating the effluent with electron beam.

Construiu-se um acelerador de elétrons de baixa energia (Máximo de 20 KeV). Como fonte de elétrons utilizou-se um canhão de elétrons de cinescópio preto e branco, ou seja, com um único emissor termiônico. A energia do feixe eletrônico pode ser continuamente variada desde 0 a 20 KeV. A corrente eletrônica pode ser variada desde um valor mínimo de 10-12A a 3&#956A, permanecendo constante no tempo uma vez fixado o seu valor. Através da focalização ou desfocalização da imagem do feixe de elétrons, é possível variar-se a área irradiada desde um diâmetro mínimo de 1 milímetro a um máximo de 6 cm. A pressão final atingida nas câmaras de vácuo foi da ordem de 10-7Torr. Durante o funcionamento do canhão de elétrons, o cátodo do mesmo é danificado devido ao bombardeamento de íons em sua superfície. Para examinarmos o grau de danificação causado por este bombardeamento iônico, basta focalizarmos e examinarmos a imagem de feixe eletrônico sobre uma tela luminescente. Deve-se ressaltar que todo o acelerador de elétrons foi construído a partir de materiais e componentes totalmente nacionais. O acelerador de elétrons foi aplicado para estudar efeitos de irradiação de elétrons em Teflon usando-se o método do Split Faraday Cup. Foram medidas correntes transitórias de carga e descarga e determinaram-se o alcance médio dos elétrons e o valor da condutividade induzida pela radiação. / We have constructed a low energy electron accelerator (maximum energy 20 KeV). A black and white kinescope electron gun, with a single thermionic emitter was used as an electron source. The energy of electron beam can be changed continuously from 0 to 20 KeV. The intensity of the current can be changed from a minimum of 10-12A to a maximum of 3&#956A, and can be maintained constant in time after its value has been fixed. The irradiated area can be changed from a diameter of 1 millimeter to a maximum of 6 centimeter, by focalizing or defocalizing the image of electron beam. The final pressure reached in vacuum chambers was 10-7Torr. During operation the surface of cathode of electron gun is damaged by ion bombardment. The degree of damage can be checked if the cathode image is focalized and examined on a luminescent screen. The accelerator was used to study electron irradiation effects in Teflon, employing the method of the Split Faraday Cup. Transient charging and discharging currents were measured. The average range of electrons of the electrons and induced conductivity were determined.

O objetivo deste trabalho é explorar a contribuição da radiação ionizante por feixe de elétrons na incorporação de fibras de piaçava (proveniente de resíduos de fábricas de vassouras) no copolímero de etileno e álcool vinílico (EVOH) para a obtenção de um material compósito EVOH-Piaçava para aplicações no segmento de embalagens. O interesse por esta fibra deve-se tanto a suas propriedades intrínsecas quanto a sua morfologia, além do fato de ser biodegradável. Os compósitos de EVOH reforçado com 5 % ou 10 %, em massa, de fibras de piaçava, em pó, com granulometria igual ou menor que 125 μm, não tratadas ou tratadas com 1 % de silano, foram obtidos por extrusão, utilizando-se uma extrusora dupla rosca. Foram confeccionados filmes dos materiais compósitos obtidos e da resina EVOH utilizando-se o processo de extrusão plana, para a viabilização dos ensaios de caracterização mecânica e de barreira a oxigênio dos materiais obtidos. As amostras de EVOH e dos compósitos foram submetidas à radiação ionizante em um acelerador de elétrons, às doses de radiação de 0 a 500 kGy. Os resultados das análises de MEV e difração de raios-X dos compósitos sugerem uma boa adesão fibra-matriz, o que pode ser confirmado também pela sua maior resistência à tração no ponto de ruptura quando comparada àquela do EVOH puro. Os resultados mostraram que a incorporação de fibras de piaçava pode promover melhor barreira ao oxigênio em comparação com o EVOH puro, em condições de umidade relativa alta. Observou-se que, após a irradiação, o filme de EVOH apresentou melhor barreira ao oxigênio em condição de umidade relativa alta quando comparado ao EVOH não irradiado nesta mesma condição, indicando o tratamento por radiação como efetivo para melhoria de barreira a oxigênio nas condições estudadas. / The aim of this work is to explore the contribution of ionizing radiation in the incorporation of piassava fibers (derived from wastes from broom factories) in the ethylene vinyl alcohol copolymer (EVOH), to obtain a composite material, \"EVOH-Piassava\", for packaging applications. The interest in this fiber is due to its inherent properties and morphology as well as being biodegradable. The EVOH composite reinforced with 5% or 10%, by weight of piassava fiber powder with a particle size equal to or less than 125 μm, untreated or treated with 1% silane, were obtained by extrusion, using a twin screw extruder. For carrying out the tensile tests and oxygen barrier of the materials obtained, films were produced from composite materials and EVOH resin was obtained using the process of flat extrusion. Samples of EVOH and the composites were irradiated using an electron accelerator, at doses from 0 to 500 kGy. The results of SEM analysis and X-ray diffraction of composites suggest a good fiber-matrix adhesion, which can be also confirmed by its higher tensile strength at break, compared to that of neat EVOH. The results showed that the incorporation of piassava fibers can promote better oxygen barrier compared to the neat EVOH, in conditions of high humidity. It was observed that, after irradiation, the EVOH film showed better oxygen barrier in high humidity condition, when compared to the non-irradiated EVOH under the same condition, indicating radiation as an effective treatment to improve oxygen barrier in the studied conditions.