III-valent dopants have shown to be most effective in stabilizing the ferroelectric, crystalline phase in atomic layer deposited, polycrystalline HfO₂ thin films. On the other hand, such dopants are commonly used for tetragonal and cubic phase stabilization in ceramic HfO₂. This difference in the impact has not been elucidated so far. The prospect is a suitable doping to produce ferroelectric HfO₂ ceramics with a technological impact. In this paper, we investigate the impact of Al, Y, and La doping, which have experimentally proven to stabilize the ferroelectric Pca21 phase in HfO₂, in a comprehensive first-principles study. Density functional theory calculations reveal the structure, formation energy, and total energy of various defects in HfO₂. Most relevant are substitutional electronically compensated defects without oxygen vacancy, substitutional mixed compensated defects paired with a vacancy, and ionically compensated defect complexes containing two substitutional dopants paired with a vacancy. The ferroelectric phase is strongly favored with La and Y in the substitutional defect. The mixed compensated defect favors the ferroelectric phase as well, but the strongly favored cubic phase limits the concentration range for ferroelectricity. We conclude that a reduction of oxygen vacancies should significantly enhance this range in Y doped HfO₂ thin films. With Al, the substitutional defect hardly favors the ferroelectric phase before the tetragonal phase becomes strongly favored with the increasing concentration. This could explain the observed field induced ferroelectricity in Al-doped HfO₂. Further Al defects are investigated, but do not favor the f-phase such that the current explanation remains incomplete for Al doping. According to the simulation, doping alone shows clear trends, but is insufficient to replace the monoclinic phase as the ground state. To explain this fact, some other mechanism is needed.

Neuron is the basic computing unit in brain-inspired neural networks. Although a multitude of excellent artificial neurons realized with conventional transistors have been proposed, they might not be energy and area efficient in large-scale networks. The recent discovery of ferroelectricity in hafnium oxide (HfO₂) and the related switching phenomena at the nanoscale might provide a solution. This study employs the newly reported accumulative polarization reversal in nanoscale HfO₂-based ferroelectric field-effect transistors (FeFETs) to implement two key neuronal dynamics: the integration of action potentials and the subsequent firing according to the biologically plausible all-or-nothing law. We show that by carefully shaping electrical excitations based on the particular nucleation-limited switching kinetics of the ferroelectric layer further neuronal behaviors can be emulated, such as firing activity tuning, arbitrary refractory period and the leaky effect. Finally, we discuss the advantages of an FeFET-based neuron, highlighting its transferability to advanced scaling technologies and the beneficial impact it may have in reducing the complexity of neuromorphic circuits.

The present research work mainly focuses on the fabrication and characterization of single and multilayer thin films based on Bismuth Vanadate (BVO) and Bismuth Titanate (BTO). The multi-target laser ablation technique was used to fabricate single layer thin films of BVO, BVN and BTO; and multilayers composed of BVO and BTO in different structures. The fabricated thin films exhibited dense microstructure and a sharp interface with the substrate. The lattice strain, surface roughness and grain size could be varied as functions of composition and individual layer thickness in different structure fabricated. The optical properties were studied by spectroscopic ellipsometry and optical transmission spectra. The various models that were used for ellipsometric data analysis gave an excellent fitting to the experimental data. The optical constants were determined through multilayer analyses of the films. The band gap of these films was studied by spectroscopic ellipsometry and optical transmission. The optical studies carried out on BVO-BTO bilayer indicated the presence of an interfacial layer in between the BVO and BTO layer, whose refractive index was different from that of the individual layers and is attributed to different nature of the interfacial layer. The ferroelectric nature of BVO films was confirmed by P-E hysteresis loop studies under different applied fields and at various probing frequencies. The same was corroborated via the C-V measurements of these BVO films which exhibited butterfly shaped C-V characteristics. Fatigue studies in these films indicated that the switchable polarization is essentially constant through 105 cycles, after which it starts increasing probably due to the ionic conduction in BVO thin films. The dielectric response of undoped and Nb doped BVO as well as BVBT ML thin films were studied over a wide range of temperatures. The BVO films exhibited remarkable dielectric dispersion at low frequencies especially in the high temperature regime. Further, the frequency and temperature dependence of the dielectric, impedance, modulus and conductivity spectra of these films were investigated in detail. The ac conductivity was found to obey well the double power law in case of ML, indicating the different contributions to the conductivity, the low frequency conductivity being due to the short range translational hopping and the high frequency conductivity is due to the localized or reorientational hopping motion. DC leakage conduction in BVO, BVN and BVBT ML thin films was studied over a wide range of temperatures and applied electric fields. The experimental data were analyzed in light of different models to investigate the dc conduction mechanism in these films which were broadly classified into electrode limited and bulk limited conduction processes. In the case of BVO thin films the dc leakage current exhibited an ohmic nature at low electric fields followed by an onset of the space charge limited conduction (>1). Further in case of BVN films, three distinct regions were observed in I-V characteristics signifying different types of conduction processes in these films. In case of BVBT ML thin films, bulk limited PF mechanism was found to determine the conduction behavior at moderate electric fields. At higher electric fields, a trap filled region was observed which was followed by SCL conduction at higher fields. Therefore the present observation indicates the presence of more than one bulk limited conduction process in BVBT ML thin films. BVO thin films exhibiting good structure and dense morphology were successfully prepared on p-type Si by chemical solution decomposition technique. The C-V characteristics were evaluated for Au/BVO/Si MFS structure which showed a typical high frequency feature of a conventional MFIS structure.

Semi conductors are of technological importance and attracted many of the re-searchers. ZnO belongs to the family of II-VI semiconductors and has material properties well suitable to UV light emitters, varistors, Schottky diodes, gas sensors, spintronics, ferroelectric devices and thin film transistors. It has been considered as a competitor to GaN, which belongs to the family of III-V semiconductors. This is due to the fact that ZnO of high quality can be deposited at lower growth temperatures than GaN, leading to the possibility of transparent junctions on less expensive substrates such as glass. This will lead to low-cost UV lasers with important applications in high-density data storage systems etc. One of the most popular growth techniques of ZnO is physical sputtering. As compared to sol-gel and chemical-vapor deposition, the magnetron sputtering is a preferred method because of its simplicity and low operating temperatures. Hence, detailed investigations were carried out on undoped and doped ZnO thin films primarily deposited by magnetron sputtering. The obtained results in the present work are presented in the form of a thesis. Chapter 1: A brief discussion on the crystal structure of ZnO material and its possible applications in the different areas such as Schottky diodes, spintronics, ferroelectric devices and thin film transistors are presented. Chapter 2: This chapter deals with various deposition techniques used in the present study. It includes the magnetron sputtering, thermal oxidation, pulsed-laser ablation and sol-gel technique. The experimental set up details and the deposition procedures are described in detail i.e., the deposition principle and the parameters that will affect the film properties. A brief note on the structural characterization equipments namely, X-ray diffraction, scanning electron microscopy, atomic force microscopy, transmission electron microscopy and the optical characterization equipments namely, transmission spectroscopy is presented. The transport properties of the films were studied which include Dielectric studies, impedance studies, device characterization and are discussed. Chapter 3: The optimization of ZnO thin films for Schottky diode formation and The characterization of various Schottky diodes is presented in this chapter. P-type conductivity in ZnO was implemented by the variation of partial pressure of oxygen during the sputtering and are discussed. A method to achieve low series resistance hetero-junction was achieved using thermal oxidation method and the detailed transport properties were studied. The optical investigation carried out on the ZnO thin films under various growth conditions are also presented. Chapter 4: This chapter deals with the processing, structural, electrical, optical and magnetic properties of Mn doped ZnO thin films grown by pulsed laser ablation. Structural investigations have shown that the Mn incorporation increases the c-axis length due to the relatively larger ionic size of the Mn ions. Studies conducted both at low and high concentration region of Zn1¡xMnxO thin films showed that the films are anti-ferromagnetic in nature. The transport measurements revealed that the electrical conductivity is dominated by the presence of shallow traps. Optical investigations suggested the absence of midgap absorption and confirm the uniform distribution of Mn in wurtzite structure. Chapter 5: Carrier induced ferromagnetism in Co doped ZnO thin films were studied and the results are presented in this chapter. High density targets were prepared by solid state reaction process and the thin films were deposited by pulsed laser ablation technique. Two compositions were studied and it was found that with increase in substrate temperature, c-axis length decreases. Optical studies suggested a strong mid gap absorption around 2eV and could be attributed to the d-d transitions of tetrahedral coordinated Co2+. The presence of ferromagnetism in these films makes them potential candidates for spintronics applications. Chapter 6: It has been reported in literature that o®-centered polarization will drive ferroelectric phase transition. Motivated by such results, substitution of Lithium in ZnO was studied in detail. The structural and electrical properties were investigated over a wide range of composition (0-25%). The ferroelectric studies were carried out both in metal-insulator-metal (MIM) and metal-insulator-semiconductor (MIS) configuration and are presented in this chapter. The appearance of Ferro electricity in these films makes them potential candidates for ferroelectric memory devices. Chapter 7: This chapter describes the studies conducted on Mg doped ZnO Thin films grown by multi-magnetron sputtering. The hexagonal phases of the films were evaluated. All the films exhibited c-axis preferred orientation towards (002) orientation. Micro structural evolutions of the films were carried out through scanning electron microscopy and atomic force microscopy. Ferroelectric properties were investigated in both metal-insulator-metal (MIM) and metal-insulator-semiconductor (MIS) configurations. It was observed that the Mg concentration increases the band gap and the details on optical investigations are also presented in this chapter. Chapter 8: ZnO based thin film transistors have been fabricated and characterized using ZnO as active channel layer and Mg doped ZnO as dielectric layer. Excellent leakage properties of the gate dielectric were studied and presented in this chapter. These studies demonstrated that Mg doped ZnO thin films are suitable candidates for gate dielectric applications. Conclusions: This section presents the conclusions derived out of the present work. It also includes a few suggestions on future work on this material.

Die Ferroelektrische Lithografie ist ein im letzten Jahrzehnt entwickeltes Verfahren zur gezielten Steuerung des Aufbaus von Nanostrukturen auf ferroelektrischen Oberflächen. Hierbei wird ausgenutzt, dass die unterschiedlich orientierte Spontanpolarisation des Materials in den einzelnen Domänen zu einer charakteristischen Variation der Oberflächenchemie führt. Die vorliegende Dissertation behandelt die Umsetzung dieses Ansatzes zur gezielten und steuerbaren Deposition von Nanostrukturen aus Edelmetallen oder organischen Molekülen. Diese Deposition erfolgte mittels einer nasschemischen Prozessierung unter UV-Beleuchtung auf magnesiumdotierten, einkristallinen Lithiumniobat-Substraten. Als typisches Ergebnis zeigte sich sowohl für in Wasser gelöste Silber-, Gold- und Platinsalze als auch für wässrige Lösungen des organischen Fluoreszenzfarbstoffs Rhodamin 6G eine bevorzugte Abscheidung des Materials an den 180°-Domänenwänden auf der Substratoberfläche. Dabei beginnt die Abscheidung in Form einzelner Nanopartikel innerhalb eines 150−500 nm breiten Streifens parallel zur Domänenwand. Bei fortgesetzter Beleuchtung erfolgt ein weiteres Wachstum der Kristallite bis zur ihrer gegenseitigen Berührung. Damit ermöglicht dieser Abscheideprozess den Aufbau organischer oder metallisch polykristalliner Nanodrähte mit Abmessungen um 100 nm in Breite und Höhe. Die Länge ist lediglich durch die Probenabmessungen begrenzt. Die so erzeugten Strukturen wurden im Rahmen der experimentellen Arbeiten topografisch, elektrisch und optisch charakterisiert. Am Beispiel einzeln kontaktierter Platindrähte konnte dabei deren annähernd ohmsches Leitfähigkeitsverhalten nachgewiesen werden. Zudem reagiert der Widerstand eines solchen Platin-Nanodrahtes sehr sensitiv auf Änderungen des umgebenden Gasmediums, was die Eignung solcher Strukturen für die Integration in künftige Sensorbauelemente unterstreicht. Weitergehende Untersuchungen beschäftigten sich mit der Klärung der Ursachen dieser sogenannten Domänenwanddekoration. Hierzu wurde die Lage der abgeschiedenen Strukturen mit dem zu Grunde liegenden Domänenmuster verglichen. Bis auf wenige Ausnahmen wurde dabei eine auf die Domänengrenze zentrierte, symmetrische Bedeckung nachgewiesen. Als Erklärungsansatz wird die Trennung der photoinduzierten Elektron-Loch-Paare durch das elektrostatische Feld der Polarisations- und Abschirmladungen diskutiert. Diese führt zur Ladungsträgerakkumulation und erhöhten chemischen Reaktivität an den Domänengrenzen. / Ferroelectric lithography is a method for a controlled assembly of nanostructures on ferroelectric surfaces, which has has been established throughout the last decade. It exploits the characteristic variations in surface chemistry arising from the different orientations of the spontaneous polarisation within the separate domains. The scope of this thesis is the application of that approach for the directed and controlled deposition of nanostructures consisting of noble metals or organic molecules. For this deposition, a wet chemical processing under UV illumination was carried out on magnesium doped lithium niobate single crystals. As a typical result, the decoration of 180° domain walls was observed for aqueous solutions of silver, gold and platinum salts as well as for the dissolved organic fluorescent dye Rhodamine 6G. The deposition starts within a stripe of 150−500 nm in width parallel to the domain wall. Under continuing illumination, the crystallites grow further until they finally touch each other. Using this technique, organic or metallic polycrystalline nanowires with dimensions in the range of 100nm in width and height can be assembled. Their length is only limited by the sample size. These nanostructures were characterised in respect of their topographical, electrical and optical properties. In the case of contacted single platinum wires an electrical conduction was measured, which showed approximately ohmic behaviour. It was also shown that the resistance of such a platinum nanowire is very sensitive to changes in the surrounding gas medium. This emphasises the suitability of such structures for integration in future sensor devices. Further experiments were carried out to investigate the physical background of the observed domain wall decoration. For this, the positions of the deposited structures were compared with the underlying domain structure. Apart from few exceptions, a symmetric deposition centered at the domain wall was observed. As a starting point for explanation, the separation of electron-hole-pairs by the electrostatic field from polarisation and screening charges is discussed. This process leads to charge carrier accumulation at the domain boundaries, thus enhancing the local chemical reactivity.

Crystal growth and characterization of few multifunctional materials with perovskite (ABX3) structure are discussed in this thesis. Efforts were made to modify the magnetic and electric behaviour of these materials by selective tuning of A, B and X components. Structural, magnetic and dielectric characterization are detailed in various chapters for doped (A and B site) rare-earth manganites and organometallic compounds with different (Chloride or formate) anions. The relevant aspects of crystal structure and its relationship with ordered ground states are discussed in the introductory chapter. A detailed review of prominent theories pertaining to magnetic and ferroelectric ordering in the literature is provided. Growth of various inorganic compounds by solid-state reaction and floating zone method as well as use of solvothermal techniques for growing organometallic compounds are discussed. Material preparation, optimization of crystal growth processes and results of characterization are addressed in various chapters. The effect of Yttrium doping on structural, magnetic and dielectric properties of rare-earth manganites (RMnO3 where R = Nd, Pr) has been investigated. Neutron diffraction studies (Pr compounds) confirm A-type antiferromagnetic structure and fall in transition temperature as the Yttrium doping level increases. Diffraction experiments in conjunction with dc magnetization and ac susceptibility studies reveal magnetic frustration in excess Yttrium dopedcompounds. When mutliglass properties of 50% B-site doped Nd2NiMnO6 were investigated, evidence of re-entrant cluster glass phase was seen probably due to presence of anti-site disorder. The relaxor-like dielectric behaviour arises from crossover of relaxation time in grain and grain boundary regions. Multiferroic behaviour of the organometallic compound (C2H5NH3)2CuCl4 as well as the ferroelectric transition were investigated in detail. The role of Hydrogen bond ordering in driving structural transitions is elucidated by low temperature dielectric and Raman studies in (C2H5NH3)2CdCl4. It was found possible to tune the magnetic and ferroelectric properties in metal formate compounds (general formula AB(HCOO)3) by selectively choosing organic cations [(CH3)2NH2+; C(NH3)3+] and transition metal ion [B = Mn, Co and Cu]. The nature of magnetic ordering and transition temperature could be altered by the transition metal ion. The effect of reorientation of organic cations which leads to ferroelectric nature is discussed using dielectric and pyroelectric data. Significant results are summarized in the chapter outlining general conclusions. Future prospects of work based on these observations are also provided. The conclusions are corroborated by detailed analysis of experimental data.

Charged domain walls (CDWs) in proper ferroelectrics are a novel route towards the creation of advancing functional electronics. At CDWs the spontaneous polarization obeying the ferroelectric order alters abruptly within inter-atomic distances. Upon screening, the resulting charge accumulation may result in the manifestation of novel fascinating electrical properties. Here, we will focus on electrical conduction. A major advantage of these ferroelectric DWs is the ability to control its motion upon electrical fields. Hence, electrical conduction can be manipulated, which can enrich the possibilities of current electronic devices e.g. in the field of reconfigurability, fast random access memories or any kind of adaptive electronic circuitry. In this dissertation thesis, I want to shed more light onto this new type of interfacial electronic conduction on inclined DWs mainly in lithium niobate/LiNbO3 (LNO). The expectation was: the stronger the DW inclination towards the polar axis of the ferroelectric order and, hence, the larger the bound polarization charge, the larger the conductivity to be displayed. The DW conductance and the correlation with polarization charge was investigated with a multitude of experimental methods as scanning probe microscopy, linear and nonlinear optical microscopy as well as electron microscopy. We were able to observe a clear correlation of the local DW inclination angle with the DW conductivity by comparing the three-dimensional DW data and the local DW conductance. We investigated the conduction mechanisms on CDWs by temperature-dependent two-terminal current-voltage sweeps and were able to deduce the transport to be given by small electron polaron hopping, which are formed after injection into the CDWs. The thermal activated transport is in very good agreement with time-resolved polaron luminescence spectroscopy. The applicability of this effect for non-volatile memories was investigated in metal-ferroelectric-metal stacks with CMOS compatible single-crystalline films. These films showed unprecedented endurance, retention, precise set voltage, and small leakage currents as expected for single crystalline material. The conductance was tuned and switched according to DW switching time and voltage. The formation of CDWs has proven to be extremely stable over at least two months. The conductivity was further investigated via microwave impedance microscopy, which revealed a DW conductivity of about 100 to 1000 S/m at microwave frequencies of about 1 GHz.:1 INTRODUCTION 1 I THEORETICAL BASICS 5 2 FUNDAMENTALS 7 2.1 Ferroelectricity 7 2.1.1 Spontaneous polarization 8 2.1.2 Domains and domain walls 9 2.1.3 Charged domain walls 13 2.1.4 Conductive domain walls 16 2.2 Visualization of ferroelectric domains and domain walls 21 2.2.1 Light microscopy 22 2.2.2 Second-harmonic generation microscopy 22 2.2.3 Cherenkov second-harmonic generation microscopy 25 2.2.4 Optical coherence tomography 28 2.2.5 Piezo-response force microscopy 30 2.2.6 Ferroelectric lithography 31 2.2.7 Further methods 34 2.3 Lithium niobate and tantalate 37 2.3.1 General Properties 37 2.3.2 Stoichiometry 38 2.3.3 Optical properties 40 2.3.4 Intrinsic and extrinsic defects 43 2.3.5 Polarons 47 2.3.6 Ionic conductivity 51 3 METHODS 53 3.1 Sample Preparation 53 3.1.1 Poling stage 53 3.1.2 Thermal treatment 56 3.1.3 Ion slicing of LNO crystals 57 3.2 Atomic force microscopy 59 3.2.1 Non-contact and contact mode AFM microscopy 59 3.2.2 Piezo-response force microscopy (PFM) 60 3.2.3 Conductive atomic force microscopy (cAFM) 62 3.2.4 Scanning microwave impedance microscopy (sMIM) 63 3.2.5 AFM probes 66 3.3 Laser scanning microscope 67 3.4 Time-resolved luminescence spectroscopy 71 3.5 Energy-resolved photoelectron emission spectromicroscopy 72 II EXPERIMENTS 75 4 RESULTS 77 4.1 Three-dimensional profiling of domain walls 78 4.1.1 Randomly poled LNO and LTO domains 78 4.1.2 Periodically Poled Lithium Niobate 81 4.1.3 AFM-written Domains 83 4.1.4 Thermally treated LNO 84 4.1.5 Laser-written domains 86 4.2 Polarization charge textures 90 4.2.1 Random domains in Mg:LNO and Mg:LTO 90 4.2.2 Thermally-treated LNO 92 4.3 Quasi-phase matching SHG 92 4.4 Photoelectron microspectroscopy 97 4.5 Activated polaron transport 101 4.6 High voltage treated LNO 113 4.7 Conductive domain walls in exfoliated thin-film LNO 115 4.7.1 Conductance maps 116 4.7.2 Resistive switching by conductive domain walls 120 4.8 Microwave impedance microscopy 134 4.8.1 Finite-element method simulation 134 4.8.2 Scanning microwave impedance microscopy 136 5 conclusion & outlook 143 III EPILOGUE 147 a APPENDIX 149 a.1 Laser ablation dynamics on LNO surfaces 149 a.2 XPS across a conductive DW in LNO 150 a.3 XRD of thin-film exfoliated LNO 151 a.4 Domain writing in exfoliated thin-film LNO 152 a.5 Retention in conductance at DWs in thin-film exfoliated LNO 155 a.6 sMIM on DWs in thin-film exfoliated LNO 157 a.7 Domain inversion evolution under a tip by phase-field modeling 159 a.8 Current transients in exfoliated LNO 161 a.9 Surface acoustic wave excitation damping at DWs 162 a.10 Influence of UV illumination on domains in Mg:LNO 162 Acronyms 165 Symbols 169 List of figures 172 List of tables 176 Bibliography 177 Publications 225 Erklärung 233 / Geladene Domänenwände (DW) in reinen Ferroelektrika stellen eine neue Möglichkeit zur Erzeugung zukünftiger, funktionalisierter Elektroniken dar. An geladenen DW ändert sich die Polarisation sehr abrupt - innerhalb nur weniger Atomabstände. Sofern die dadurch hervorgerufene Ladungsträgeranreicherung elektrisch abgeschirmt werden kann, könnte dies zu faszinierenden elektrischen Eigenschaften führen. Wir möchten uns hierbei jedoch auf die elektrische Leitfähigkeit beschränken. Ein großer Vorteil für die Anwendung leitfähiger DW ist deren kontrollierte Bewegung unter Einwirkung elektrischer Felder. Dies ermöglicht die Manipulation das Ladungstransports, welches zum Beispiel im Bereich der Rekonfigurierbarkeit, schneller Speicherbauelemente und jeder Art von adaptiven elektronischen Schaltungen Anwendung finden kann. In dieser Dissertationsschrift möchte ich diesen neuen Typus grenzflächiger elektronischen Ladungstransports an geladenen DW hauptsächlich am Beispiel von Lithiumniobat/-LiNbO3 (LNO) untersuchen. Die Annahme lautete hierbei: umso stärker die DW zur ferroelektrischen Achse geneigt ist, also desto stärker die gebundene Polarisationsladung und folglich die elektrische DW-Leitfähigkeit. Die elektrische DW-Leitfähigkeit und die Korrelation mit der Polarisationsladung wurde mit verschiedenen experimentellen Methoden wie Rasterkraftmikroskopie, linearer und nichtlinearer optischer Mikroskopie als auch Elektronenmikroskopie untersucht. Es konnte eine klare Korrelation durch Vergleich der dreidimensionalen DW-Aufzeichnungsdaten mit der lokalen Leitfähigkeit gezeigt werden. Wir haben weiterhin den Leitfähigkeitsmechanismus an geladenen DW mittels temperaturabhängiger Strom-Spannungskennlinien untersucht und konnten hierbei einen Hopping-Transport kleiner Elektronenpolaronen nachweisen, welche nach Elektroneninjektion in die geladene DW generiert werden. Der thermisch aktivierte Ladungsträgertransport ist in guter Übereinstimmung mit zeitaufgelöster Polaron-Lumineszenzspektroskopie. Die Anwendbarkeit dieses Effektes für nicht-volatile Speicherbauelemente wurde an Metall-Ferroelektrika-Metall Schichtstrukturen mit CMOS-kompatiblen einkristalliner Filmen untersucht. Die Filme zeigen bisher nichtgesehene Durchhalte- und Speichervermögen, genau definierte Schaltspannung sowie sehr geringe Leckageströme wie dies für einkristalline Materialsysteme erwartet wird. Die Leitfähigkeit konnte mittels entsprechender Wahl der elektrischen Schaltzeiten und -spannungen zielgerichtet manipuliert und geschalten werden. Es konnte darüber hinaus gezeigt werden, dass die hergestellten geladenen DW über eine Zeitspanne von mindestens zwei Monaten stabil sind und hierbei leitfähig bleiben. Die Leitfähigkeit der DW wurde weiterhin mittels Mikrowellenimpedanzmikroskopie untersucht. Dabei konnten DW-Leitfähigkeiten von 100 bis 1000 S/m für Mikrowellenfrequenzen von etwa 1GHz ermittelt werden.:1 INTRODUCTION 1 I THEORETICAL BASICS 5 2 FUNDAMENTALS 7 2.1 Ferroelectricity 7 2.1.1 Spontaneous polarization 8 2.1.2 Domains and domain walls 9 2.1.3 Charged domain walls 13 2.1.4 Conductive domain walls 16 2.2 Visualization of ferroelectric domains and domain walls 21 2.2.1 Light microscopy 22 2.2.2 Second-harmonic generation microscopy 22 2.2.3 Cherenkov second-harmonic generation microscopy 25 2.2.4 Optical coherence tomography 28 2.2.5 Piezo-response force microscopy 30 2.2.6 Ferroelectric lithography 31 2.2.7 Further methods 34 2.3 Lithium niobate and tantalate 37 2.3.1 General Properties 37 2.3.2 Stoichiometry 38 2.3.3 Optical properties 40 2.3.4 Intrinsic and extrinsic defects 43 2.3.5 Polarons 47 2.3.6 Ionic conductivity 51 3 METHODS 53 3.1 Sample Preparation 53 3.1.1 Poling stage 53 3.1.2 Thermal treatment 56 3.1.3 Ion slicing of LNO crystals 57 3.2 Atomic force microscopy 59 3.2.1 Non-contact and contact mode AFM microscopy 59 3.2.2 Piezo-response force microscopy (PFM) 60 3.2.3 Conductive atomic force microscopy (cAFM) 62 3.2.4 Scanning microwave impedance microscopy (sMIM) 63 3.2.5 AFM probes 66 3.3 Laser scanning microscope 67 3.4 Time-resolved luminescence spectroscopy 71 3.5 Energy-resolved photoelectron emission spectromicroscopy 72 II EXPERIMENTS 75 4 RESULTS 77 4.1 Three-dimensional profiling of domain walls 78 4.1.1 Randomly poled LNO and LTO domains 78 4.1.2 Periodically Poled Lithium Niobate 81 4.1.3 AFM-written Domains 83 4.1.4 Thermally treated LNO 84 4.1.5 Laser-written domains 86 4.2 Polarization charge textures 90 4.2.1 Random domains in Mg:LNO and Mg:LTO 90 4.2.2 Thermally-treated LNO 92 4.3 Quasi-phase matching SHG 92 4.4 Photoelectron microspectroscopy 97 4.5 Activated polaron transport 101 4.6 High voltage treated LNO 113 4.7 Conductive domain walls in exfoliated thin-film LNO 115 4.7.1 Conductance maps 116 4.7.2 Resistive switching by conductive domain walls 120 4.8 Microwave impedance microscopy 134 4.8.1 Finite-element method simulation 134 4.8.2 Scanning microwave impedance microscopy 136 5 conclusion & outlook 143 III EPILOGUE 147 a APPENDIX 149 a.1 Laser ablation dynamics on LNO surfaces 149 a.2 XPS across a conductive DW in LNO 150 a.3 XRD of thin-film exfoliated LNO 151 a.4 Domain writing in exfoliated thin-film LNO 152 a.5 Retention in conductance at DWs in thin-film exfoliated LNO 155 a.6 sMIM on DWs in thin-film exfoliated LNO 157 a.7 Domain inversion evolution under a tip by phase-field modeling 159 a.8 Current transients in exfoliated LNO 161 a.9 Surface acoustic wave excitation damping at DWs 162 a.10 Influence of UV illumination on domains in Mg:LNO 162 Acronyms 165 Symbols 169 List of figures 172 List of tables 176 Bibliography 177 Publications 225 Erklärung 233

Die Ferroelektrische Lithografie ist ein im letzten Jahrzehnt entwickeltes Verfahren zur gezielten Steuerung des Aufbaus von Nanostrukturen auf ferroelektrischen Oberflächen. Hierbei wird ausgenutzt, dass die unterschiedlich orientierte Spontanpolarisation des Materials in den einzelnen Domänen zu einer charakteristischen Variation der Oberflächenchemie führt. Die vorliegende Dissertation behandelt die Umsetzung dieses Ansatzes zur gezielten und steuerbaren Deposition von Nanostrukturen aus Edelmetallen oder organischen Molekülen. Diese Deposition erfolgte mittels einer nasschemischen Prozessierung unter UV-Beleuchtung auf magnesiumdotierten, einkristallinen Lithiumniobat-Substraten. Als typisches Ergebnis zeigte sich sowohl für in Wasser gelöste Silber-, Gold- und Platinsalze als auch für wässrige Lösungen des organischen Fluoreszenzfarbstoffs Rhodamin 6G eine bevorzugte Abscheidung des Materials an den 180°-Domänenwänden auf der Substratoberfläche. Dabei beginnt die Abscheidung in Form einzelner Nanopartikel innerhalb eines 150−500 nm breiten Streifens parallel zur Domänenwand. Bei fortgesetzter Beleuchtung erfolgt ein weiteres Wachstum der Kristallite bis zur ihrer gegenseitigen Berührung. Damit ermöglicht dieser Abscheideprozess den Aufbau organischer oder metallisch polykristalliner Nanodrähte mit Abmessungen um 100 nm in Breite und Höhe. Die Länge ist lediglich durch die Probenabmessungen begrenzt. Die so erzeugten Strukturen wurden im Rahmen der experimentellen Arbeiten topografisch, elektrisch und optisch charakterisiert. Am Beispiel einzeln kontaktierter Platindrähte konnte dabei deren annähernd ohmsches Leitfähigkeitsverhalten nachgewiesen werden. Zudem reagiert der Widerstand eines solchen Platin-Nanodrahtes sehr sensitiv auf Änderungen des umgebenden Gasmediums, was die Eignung solcher Strukturen für die Integration in künftige Sensorbauelemente unterstreicht. Weitergehende Untersuchungen beschäftigten sich mit der Klärung der Ursachen dieser sogenannten Domänenwanddekoration. Hierzu wurde die Lage der abgeschiedenen Strukturen mit dem zu Grunde liegenden Domänenmuster verglichen. Bis auf wenige Ausnahmen wurde dabei eine auf die Domänengrenze zentrierte, symmetrische Bedeckung nachgewiesen. Als Erklärungsansatz wird die Trennung der photoinduzierten Elektron-Loch-Paare durch das elektrostatische Feld der Polarisations- und Abschirmladungen diskutiert. Diese führt zur Ladungsträgerakkumulation und erhöhten chemischen Reaktivität an den Domänengrenzen.:Inhaltsverzeichnis 5 1 Einführung 9 2 Grundlagen 15 2.1 Ferroelektrizität 15 2.1.1 Allgemeine Eigenschaften 15 2.1.2 Domänen und Abschirmung 18 2.2 Lithiumniobat 21 2.2.1 Allgemeine Eigenschaften 21 2.2.2 Einfluss der Stöchiometrie 23 2.2.3 Hysterese, Domänen und Domänenstrukturierungsverfahren 28 2.2.4 Abbildung von Domänenstrukturen 40 2.3 Domänenspezifische Abscheidung und Ferroelektrische Lithografie 48 2.3.1 Elektrostatik 49 2.3.2 Oberflächenchemie und Ferroelektrische Lithografie 54 2.4 Rasterkraftmikroskopie 65 2.4.1 Piezoresponse-Kraftmikroskopie (PFM) 69 2.4.2 Kelvin-Sonden-Kraftmikroskopie (KPFM) 78 3 Experimentelle Techniken und Messaufbauten 83 3.1 Rasterkraftmikroskope 83 3.1.1 Topometrix Explorer 83 3.1.2 Aist-NT Smart SPM 1000 84 3.2 Optische Mikroskope 86 3.2.1 Jenaval 86 3.2.2 Axiovert 135 87 3.3 Probenmaterial 89 3.4 Photochemische Abscheidung 92 4 Experimentelle Ergebnisse 99 4.1 UV-unterstützte Polung 99 4.2 Photochemische Edelmetallabscheidung 102 4.2.1 Grundlegende Eigenschaften 102 4.2.2 Abhängigkeit von Stöchiometrie und Dotierung des LiNbO3 105 4.2.3 Einfluss von Konzentration und Belichtungszeit 105 4.2.4 Positionsvergleich mit Domänengrenze 114 4.3 Elektrische Charakterisierung von Platindrähten 116 4.3.1 Grundlegende Eigenschaften 116 4.3.2 Nanomechanisches Auftrennen 118 4.3.3 Sensitivität auf Umgebungsmedium 122 4.4 Photochemische Molekülabscheidung 126 4.4.1 Domänenwanddekoration mit Rhodamin 6G 126 4.4.2 Rhodamin 6G auf frisch gepolten Proben 129 4.4.3 Beta-Amyloid-Proteine 137 5 Diskussion 143 5.1 Domänenwanddekoration auf LiNbO3 143 5.1.1 Zusammenfassung der experimentellen Befunde 143 5.1.2 Schlussfolgerungen aus der elektrostatischen Feldverteilung 144 5.1.3 Photochemische Reaktionen bei der Abscheidung 151 5.1.4 Lokale Strommessung an Domänenwänden 153 5.2 Transiente Phänomene auf frisch gepolten Proben 158 5.2.1 UV-induzierte Domänenmodifikation ohne externes Feld 158 5.2.2 Weitere Effekte bei Rhodamin 6G 159 5.3 Beta-Amyloid 161 6 Zusammenfassung und Ausblick 163 6.1 Zusammenfassung 163 6.2 Ausblick 166 Anhang 169 A.1 Elektrostatische Feldverteilung in periodisch gepoltem LiNbO3 169 A.1.1 Unendlich dünne Domänenwände 170 A.1.2 Endliche Domänenwandbreite 172 A.2 Elektrostatisches Potential außerhalb von periodisch gepoltem LiNbO3 175 Literaturverzeichnis 177 Abbildungsverzeichnis 195 Tabellenverzeichnis 199 Abkürzungsverzeichnis 201 Liste der Veröffentlichungen 203 Danksagung 205 Erklärung 207 / Ferroelectric lithography is a method for a controlled assembly of nanostructures on ferroelectric surfaces, which has has been established throughout the last decade. It exploits the characteristic variations in surface chemistry arising from the different orientations of the spontaneous polarisation within the separate domains. The scope of this thesis is the application of that approach for the directed and controlled deposition of nanostructures consisting of noble metals or organic molecules. For this deposition, a wet chemical processing under UV illumination was carried out on magnesium doped lithium niobate single crystals. As a typical result, the decoration of 180° domain walls was observed for aqueous solutions of silver, gold and platinum salts as well as for the dissolved organic fluorescent dye Rhodamine 6G. The deposition starts within a stripe of 150−500 nm in width parallel to the domain wall. Under continuing illumination, the crystallites grow further until they finally touch each other. Using this technique, organic or metallic polycrystalline nanowires with dimensions in the range of 100nm in width and height can be assembled. Their length is only limited by the sample size. These nanostructures were characterised in respect of their topographical, electrical and optical properties. In the case of contacted single platinum wires an electrical conduction was measured, which showed approximately ohmic behaviour. It was also shown that the resistance of such a platinum nanowire is very sensitive to changes in the surrounding gas medium. This emphasises the suitability of such structures for integration in future sensor devices. Further experiments were carried out to investigate the physical background of the observed domain wall decoration. For this, the positions of the deposited structures were compared with the underlying domain structure. Apart from few exceptions, a symmetric deposition centered at the domain wall was observed. As a starting point for explanation, the separation of electron-hole-pairs by the electrostatic field from polarisation and screening charges is discussed. This process leads to charge carrier accumulation at the domain boundaries, thus enhancing the local chemical reactivity.:Inhaltsverzeichnis 5 1 Einführung 9 2 Grundlagen 15 2.1 Ferroelektrizität 15 2.1.1 Allgemeine Eigenschaften 15 2.1.2 Domänen und Abschirmung 18 2.2 Lithiumniobat 21 2.2.1 Allgemeine Eigenschaften 21 2.2.2 Einfluss der Stöchiometrie 23 2.2.3 Hysterese, Domänen und Domänenstrukturierungsverfahren 28 2.2.4 Abbildung von Domänenstrukturen 40 2.3 Domänenspezifische Abscheidung und Ferroelektrische Lithografie 48 2.3.1 Elektrostatik 49 2.3.2 Oberflächenchemie und Ferroelektrische Lithografie 54 2.4 Rasterkraftmikroskopie 65 2.4.1 Piezoresponse-Kraftmikroskopie (PFM) 69 2.4.2 Kelvin-Sonden-Kraftmikroskopie (KPFM) 78 3 Experimentelle Techniken und Messaufbauten 83 3.1 Rasterkraftmikroskope 83 3.1.1 Topometrix Explorer 83 3.1.2 Aist-NT Smart SPM 1000 84 3.2 Optische Mikroskope 86 3.2.1 Jenaval 86 3.2.2 Axiovert 135 87 3.3 Probenmaterial 89 3.4 Photochemische Abscheidung 92 4 Experimentelle Ergebnisse 99 4.1 UV-unterstützte Polung 99 4.2 Photochemische Edelmetallabscheidung 102 4.2.1 Grundlegende Eigenschaften 102 4.2.2 Abhängigkeit von Stöchiometrie und Dotierung des LiNbO3 105 4.2.3 Einfluss von Konzentration und Belichtungszeit 105 4.2.4 Positionsvergleich mit Domänengrenze 114 4.3 Elektrische Charakterisierung von Platindrähten 116 4.3.1 Grundlegende Eigenschaften 116 4.3.2 Nanomechanisches Auftrennen 118 4.3.3 Sensitivität auf Umgebungsmedium 122 4.4 Photochemische Molekülabscheidung 126 4.4.1 Domänenwanddekoration mit Rhodamin 6G 126 4.4.2 Rhodamin 6G auf frisch gepolten Proben 129 4.4.3 Beta-Amyloid-Proteine 137 5 Diskussion 143 5.1 Domänenwanddekoration auf LiNbO3 143 5.1.1 Zusammenfassung der experimentellen Befunde 143 5.1.2 Schlussfolgerungen aus der elektrostatischen Feldverteilung 144 5.1.3 Photochemische Reaktionen bei der Abscheidung 151 5.1.4 Lokale Strommessung an Domänenwänden 153 5.2 Transiente Phänomene auf frisch gepolten Proben 158 5.2.1 UV-induzierte Domänenmodifikation ohne externes Feld 158 5.2.2 Weitere Effekte bei Rhodamin 6G 159 5.3 Beta-Amyloid 161 6 Zusammenfassung und Ausblick 163 6.1 Zusammenfassung 163 6.2 Ausblick 166 Anhang 169 A.1 Elektrostatische Feldverteilung in periodisch gepoltem LiNbO3 169 A.1.1 Unendlich dünne Domänenwände 170 A.1.2 Endliche Domänenwandbreite 172 A.2 Elektrostatisches Potential außerhalb von periodisch gepoltem LiNbO3 175 Literaturverzeichnis 177 Abbildungsverzeichnis 195 Tabellenverzeichnis 199 Abkürzungsverzeichnis 201 Liste der Veröffentlichungen 203 Danksagung 205 Erklärung 207

Over the last two decades, great progress has been made in the understanding of multiferroic materials, ones where multiple long-range orders simultaneously exist. However, much of the research has focused on bulk systems. If these materials are to be incorporated into devices, they would not be in bulk form, but would be miniaturized, such as in nanoparticle form. Accordingly, a better understanding of multiferroic nanoparticles is necessary. This manuscript examines the multiferroic phase diagram of multiferroic nanoparticles related to system size and surface-induced magnetic anisotropy. There is a particular focus on bismuth ferrite, the room-temperature antiferromagnetic-ferroelectric multiferroic. Theoretical results will be presented which show that at certain sizes, a bistability develops in the cycloidal wavevector. This implies bistability in the ferroelectric and magnetic moments of the nanoparticles. This novel magnetoelectric bistability may be of use in the creation of an electrically-written, magnetically-read memory element. / Graduate