L’intégration ultime de convertisseurs à découpage repose sur deux axes de recherche. Le premier axe est de développer les convertisseurs à capacités commutées. Cette approche est compatible avec une intégration totale sur silicium, mais limitée en terme de densité de puissance. Le second axe est l’utilisation de convertisseurs à inductances, qui pâtissent d’imposants composants passifs. Une augmentation de la fréquence permet de réduire les valeurs des composants passifs. Cependant une augmentation de la fréquence implique une augmentation des pertes par commutation, ce qui est contrebalancé par l’utilisation d’une technologie de fabrication plus avancée. Ces technologies plus avancées souffrent quant à elles de limitations au niveau de leur tension d’utilisation. Convertir une tension de 3,3V vers une tension de 1,2V apparait donc comme un objectif ambitieux, particulièrement dans le cas où les objectifs de taille minimale et de rendement supérieur à 90 % sont visés. Un assemblage 3D des composants actifs et passifs permet de minimiser la surface du système. Un fonctionnement à haute fréquence est aussi considéré, ce qui permet de réduire les valeurs requises pour les composants passifs. Dans le contexte de l’alimentation « on-chip », la technologie silicium est contrainte par les fonctions numériques. Une technologie 40 nm CMOS de type « bulk » est choisie comme cas d’étude pour une tension d’entrée de 3,3 V. Les transistors 3,3 V présentent une figure de mérite médiocre, les transistors 1,2 V sont donc choisis. Ce choix permet en outre de présenter une meilleure compatibilité avec une future intégration sur puce. Une structure cascode utilisant trois transistors en série est étudiée est confrontée à une structure standard à travers des simulations et mesures. Une fréquence de +100MHz est choisie. Une technologie de capacités en tranchées est sélectionnée, et fabriquée sur une puce séparée qui servira d’interposeur et recevra la puce active et les inductances. Les inductances doivent être aussi fabriquées de manière intégrée afin de limiter leur impact sur la surface du convertisseur. Ce travail fournit un objet contenant un convertisseur de type Buck à une phase, avec la puce active retournée (« flip-chip ») sur l’interposeur capacitif, sur lequel une inductance est rapportée. Le démonstrateur une phase est compatible pour une démonstration à phases couplées. Les configurations standard et cascode sont comparées expérimentalement aux fréquences de 100 MHz et 200 MHz. La conception de la puce active est l’élément central de ce travail, l’interposeur capacitif étant fabriqué par IPDiA et les inductances par Tyndall National Institute. L’assemblage des différents sous-éléments est réalisé via des procédés industriels. Un important ensemble de mesures ont été réalisées, montrant les performances du convertisseur DC-DC délivré, ainsi que ses limitations. Un rendement pic de 91,5 % à la fréquence de 100 MHz a été démontré. / Ultimate integration of power switch-mode converter relies on two research paths. One path experiments the development of switched-capacitor converters. This approach fits silicon integration but is still limited in term of power density. Inductive DC-DC architectures of converters suffer by the values and size of passive components. This limitation is addressed with an increase in frequency. Increase in switching losses in switches leads to consider advanced technological nodes. Consequently, the capability with respect to input voltage is then limited. Handling 3.3 V input voltage to deliver an output voltage in the range 0.6 V to 1.2 V appears a challenging specification for an inductive buck converter if the smallest footprint is targeted at +90 % efficiency. Smallest footprint is approached through a 3D assembly of passive components to the active silicon die. High switching frequency is also considered to shrink the values of passive components as much as possible. In the context of on-chip power supply, the silicon technology is dictated by the digital functions. Complementary Metal-Oxide- Semiconductor (CMOS) bulk C40 is selected as a study case for 3.3 V input voltage. 3.3 V Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) features poor figure of merits and 1.2 V standard core, regular devices are preferred. Moreover future integration as an on-chip power supply is more compatible. A three-MOSFET cascode arrangement is experimented and confronted experimentally to a standard buck arrangement in the same technology. The coupled-phase architecture enables to reduce the switching frequency to half the operating frequency of the passive devices. +100MHz is selected for operation of passive devices. CMOS bulk C40 offers Metal-Oxide-Metal (MOM) and MOS capacitors, in density too low to address the decoupling requirements. Capacitors have to be added externally to the silicon die but in a tight combination. Trench-cap technology is selected and capacitors are fabricated on a separate die that will act as an interposer to receive the silicon die as well as the inductors. The work delivers an object containing a one-phase buck converter with the silicon die flip-chipped on a capacitor interposer where a tiny inductor die is reported. The one-phase demonstrator is suitable for coupled-phase demonstration. Standard and cascode configurations are experimentally compared at 100 MHz and 200 MHz switching frequency. A design methodology is presented to cover a system-to-device approach. The active silicon die is the central design part as the capacitive interposer is fabricated by IPDiA and inductors are provided by Tyndall National Institute. The assembly of the converter sub-parts is achieved using an industrial process. The work details a large set of measurements to show the performances of the delivered DC/DC converters as well as its limitations. A 91.5% peak efficiency at 100MHz switching frequency has been demonstrated.

No description available.

Time-Resolved diffuse optics is a powerful and safe technique to quantify the optical properties (OP) for highly scattering media such as biological tissues. The OP values are correlated with the compositions of the measured objects, especially for the tissue chromophores such as hemoglobin. The OP are mainly the absorption and the reduced scattering coefficients that can be quantified for highly scattering media using Time-Resolved Diffuse Optical Spectroscopy (TR-DOS) systems. The OP can be retrieved using Time-Resolved Diffuse Optical Imaging (TR-DOI) systems to reconstruct the distribution of the OP in measured media. Therefore, TR-DOS and TR-DOI can be used for functional monitoring of brain and muscles, and to diagnose some diseases such as detection and localization for breast cancer and blood clot. In general, TR-DOI systems are non-invasive, reliable, and have a high temporal resolution. TR-DOI systems have been known for their complexity, bulkiness, and costly equipment such as light sources (picosecond pulsed laser) and detectors (single photon counters). Also, TR-DOI systems acquire a large amount of data and suffer from the computational cost of the image reconstruction process. These limitations hinder the usage of TR-DOI for widespread potential applications such as clinical measurements. The goals of this research project are to investigate approaches to eliminate two main limitations of TR-DOI systems. First, building TR-DOS systems using custom-designed free-running (FR) and time-gated (TG) SPAD detectors that are fabricated in low-cost standard CMOS technology instead of the costly photon counting and timing detectors. The FR-TR-DOS prototype has demonstrated comparable performance (for homogeneous objects measurements) with the reported TR-DOS prototypes that use commercial and expensive detectors. The TG-TR-DOS prototype has acquired raw data with a low level of noise and high dynamic range that enable this prototype to measure multilayered objects such as human heads. Second, building and evaluating TR-DOI prototype that uses a computationally efficient algorithm to reconstruct high quality 3D tomographic images by analyzing a small part of the acquired data. This work indicates the possibility to exploit the recent advances in the technologies of silicon detectors, and computation to build low-cost, compact, portable TR-DOI systems. These systems can expand the applications of TR-DOI and TR-DOS into several fields such as oncology, and neurology. / Thesis / Doctor of Philosophy (PhD)

Depuis l'invention du transistor MOS à effet de champ dans les années 60, l'exploitation de cette brique élémentaire a permis une évolution exponentielle du domaine de la microélectronique, avec une course effrénée vers la miniaturisation des dispositifs électroniques CMOS. Dans ce contexte, l'introduction des oxydes "high-κ" (notamment HfO2) a permis de franchir la barrière sub-nanométrique de l'EOT (Equivalent Oxide Thickness) pour l’oxyde de grille. Les travaux actuels concernent notamment la recherche de matériaux "high-κ" et de procédés qui permettraient d'avoir une interface abrupte, thermodynamiquement stable avec le silicium, pouvant conduire à des EOTs de l'ordre de 5Å. L’objectif de cette thèse, était d’explorer le potentiel de l’oxyde LaAlO3 amorphe déposé sur silicium par des techniques d’Épitaxie par Jets Moléculaires, en combinant des études sur les propriétés physico-chimiques et électriques de ce système. Le travail de thèse a d’abord consisté à définir des procédures d'élaboration sur Si de couches très minces (≈4nm), robustes et reproductibles, afin de fiabiliser les mesures électriques, puis à optimiser la qualité électrique des hétérostructures en ajustant les paramètres de dépôt à partir de corrélations entre résultats électriques et propriétés physico-chimiques (densité, stœchiométrie, environnement chimique…) et enfin à valider un procédé d'intégration du matériau dans la réalisation de MOSFET. La stabilité et la reproductibilité des mesures ont été atteintes grâce à une préparation de surface du substrat adaptée et grâce à l'introduction d'oxygène atomique pendant le dépôt de LaAlO3, permettant ainsi une homogénéisation des couches et une réduction des courants de fuite. Après optimisation des paramètres de dépôt, les meilleures structures présentent des EOTs de 8-9Å, une constante diélectrique de 16 et des courants de fuite de l'ordre de 10-2A/cm². Les caractérisations physico-chimiques fines des couches par XPS ont révélé des inhomogénéités de composition qui peuvent expliquer que le κ mesuré soit inférieur aux valeurs de LaAlO3 cristallin (20-25). Bien que les interfaces LAO/Si soient abruptes après le dépôt et que LaAlO3 soit thermodynamiquement stable vis-à-vis du silicium, le système LAO amorphe /Si s’est révélé instable pour des recuits post-dépôt effectués à des températures supérieures à 700°C. Un procédé de fabrication de MOSFETs aux dimensions relâchées a été défini pour tester les filières high-κ. Les premières étapes du procédé ont été validées pour LaAlO3. / Since MOS Field Effect Transistor invention in the 60's, the exploitation of this elementary piece of technology allowed an exponential evolution in the microelectronic field, with a frantic race towards miniaturization of CMOS electronic devices. In this context, the introduction of "high-κ" oxides (notably HfO2) allowed to cross the sub-nanometer barrier of EOT (Equivalent Oxide Thickness) for the gate oxide. Current work are notably related to "high-κ" research materials and processes that would allow an abrupt and thermodynamically stable interface with respect to silicon, that may lead to EOTs of about 5Å. The purpose of this thesis was to explore the potential of amorphous oxide LaAlO3 deposited on silicon by techniques of molecular beam epitaxy, combining studies of the physicochemical and electrical properties of this system. The thesis work has first consisted in defining procedures for the preparation of very thin (≈ 4 nm), robust and reproducible layers on Si in order to allow reliable electrical measurements then to optimize the electrical quality of the hetero-structures by adjusting deposition parameters from correlations between electrical results and physicochemical properties (density, stoichiometry, chemical environment...) and finally to validate a method for integrating the material in the realization of MOSFET. The stability and reproducibility of the measurements were achieved thanks to an adapted surface preparation of the substrate and by the introduction of atomic oxygen during the LaAlO3 deposition, thus allowing homogenization of layers and reducing leakage currents. After optimizing the deposition parameters, the best structures exhibit EOTs of 8-9 A, a dielectric constant of 16 and leakage currents in the range of 10-2 A/cm². Accurate physico-chemical characterizations of thin layers by XPS revealed composition inhomogeneities that can explain why the measured κ is less than values of crystalline LaAlO3 (20-25). Although the LAO/Si interfaces are steep after deposition and LaAlO3 is thermodynamically stable with respect to the silicon, amorphous system LAO/Si has proven unstable during post-deposition annealing carried out at temperatures above 700 ° C. A process for producing MOSFETs with released dimensions was defined to test high-κ field. The first stages of the process have been validated for LaAlO3.

Cette étude porte sur l’intégration hybride de transistors à un électron (single-electron transistor, SET) dans un noeud technologique CMOS. Les SETs présentent de forts potentiels, en particulier en termes d’économies d’énergies, mais ne peuvent complètement remplacer le CMOS dans les circuits électriques. Cependant, la combinaison des composants SETs et MOS permet de pallier à ce problème, ouvrant la voie à des circuits à très faible puissance dissipée, et à haute densité d’intégration. Cette thèse se propose d’employer pour la réalisation de SETs dans le back-end-of-line (BEOL), c'est-à-dire dans l’oxyde encapsulant les CMOS, le procédé de fabrication nanodamascène, mis au point par C. Dubuc. / This study deals with the hybrid integration of Single Electron Transistors (SET) on a CMOS technology node. SET devices present high potentiels, particularly in terms of energy efficiency, but can't completely replace CMOS in electrical circuits. However, SETs and CMOS devices combination can solve this issue, opening the way toward very low operating power circuits, and high integration density. This thesis proposes itself to use for Back-End-Of-Line (BEOL) SETs realization, meaning in the oxide encapsulating CMOS, the nanodamascene fabrication process devised by C. Dubuc.

Silicon based 3D fin structure is believed to be the potential future of current semiconductor technology. However, there are significant challenges still exist in realizing a manufacturable fin based process. In this work, we have studied the effects of hydrogen anneal on the structural and electrical characteristics of silicon fin based devices: tri-gate, finFET to name a few. H₂ anneal is shown to play a major role in structural integrity and manufacturability of 3D fin structure which is the most critical feature for these types of devices. Both the temperature and the pressure of H₂ anneal can result in significant alteration of fin height and shape as well as electrical characteristics. Optimum H₂ anneal is required in order to improve carrier mobility and device reliability as shown in this work. A new hard-mask based process was developed to retain H₂ anneal related benefit while eliminating detrimental effects such as reduction of device drive current due to fin height reduction. We have also demonstrated a novel 1T-1C pseudo Static Random Access Memory (1T-1C pseudo SRAM) memory cell using low cost conventional tri-gate process by utilizing selective H₂ anneal and other clever process techniques. TCAD-based simulation was also provided to show its competitive advantage over other types of static and dynamic memories in 45nm and beyond technologies. A high gain bipolar based on silicon fin process flow was proposed for the first time that can be used in BiCMOS technology suitable for low cost mixed signal and RF products. TCAD-based simulation results proved the concept with gain as high 100 for a NPN device using single additional mask. Overall, this work has shown that several novel process techniques and selective use of optimum H₂ anneal can lead to various high performance and low cost devices and memory cells those are much better than the devices using current conventional 3D fin based process techniques. / text

Depuis l'invention du transistor MOS à effet de champ dans les années 60, l'exploitation de cette brique élémentaire a permis une évolution exponentielle du domaine de la microélectronique, avec une course effrénée vers la miniaturisation des dispositifs électroniques CMOS. Dans ce contexte, l'introduction des oxydes "high-κ" (notamment HfO2) a permis de franchir la barrière sub-nanométrique de l'EOT (Equivalent Oxide Thickness) pour l'oxyde de grille. Les travaux actuels concernent notamment la recherche de matériaux "high-κ" et de procédés qui permettraient d'avoir une interface abrupte, thermodynamiquement stable avec le silicium, pouvant conduire à des EOTs de l'ordre de 5Å. L'objectif de cette thèse, était d'explorer le potentiel de l'oxyde LaAlO3 amorphe déposé sur silicium par des techniques d'Épitaxie par Jets Moléculaires, en combinant des études sur les propriétés physico-chimiques et électriques de ce système. Le travail de thèse a d'abord consisté à définir des procédures d'élaboration sur Si de couches très minces (≈4nm), robustes et reproductibles, afin de fiabiliser les mesures électriques, puis à optimiser la qualité électrique des hétérostructures en ajustant les paramètres de dépôt à partir de corrélations entre résultats électriques et propriétés physico-chimiques (densité, stœchiométrie, environnement chimique...) et enfin à valider un procédé d'intégration du matériau dans la réalisation de MOSFET. La stabilité et la reproductibilité des mesures ont été atteintes grâce à une préparation de surface du substrat adaptée et grâce à l'introduction d'oxygène atomique pendant le dépôt de LaAlO3, permettant ainsi une homogénéisation des couches et une réduction des courants de fuite. Après optimisation des paramètres de dépôt, les meilleures structures présentent des EOTs de 8-9Å, une constante diélectrique de 16 et des courants de fuite de l'ordre de 10-2A/cm². Les caractérisations physico-chimiques fines des couches par XPS ont révélé des inhomogénéités de composition qui peuvent expliquer que le κ mesuré soit inférieur aux valeurs de LaAlO3 cristallin (20-25). Bien que les interfaces LAO/Si soient abruptes après le dépôt et que LaAlO3 soit thermodynamiquement stable vis-à-vis du silicium, le système LAO amorphe /Si s'est révélé instable pour des recuits post-dépôt effectués à des températures supérieures à 700°C. Un procédé de fabrication de MOSFETs aux dimensions relâchées a été défini pour tester les filières high-κ. Les premières étapes du procédé ont été validées pour LaAlO3.

Recently, high-κ materials have become the focus of research and been extensively utilized as the gate dielectric layer in aggressive scaled complementary metal-oxide-semiconductor (CMOS) technology. Hafnium dioxide (HfO2) is the most promising high-κ material because of its excellent chemical, thermal, mechanical and dielectric properties and also possesses good thermodynamic stability and better band offsets with silicon. Hence, HfO2 has already been used as gate dielectric in modern CMOS devices. For future technologies, it is very difficult to scale the silicon transistor gate length, so it is a necessary requirement of replacing the channel material from silicon to some high mobility material. Two-dimensional layered materials such as graphene and molybdenum disulfide (MoS2) are potential candidates to replace silicon. Due to its planar structure and atomically thin nature, they suit well with the conventional MOSFET technology and are very stable mechanically as well as chemically. HfO2 plays a vital role as a gate dielectric, not only in silicon CMOS technology but also in future nano-electronic devices such as graphene/MoS2 based devices, since high-κ media is expected to screen the charged impurities located in the vicinity of channel material, which results in enhancement of carrier mobility. So, for sustenance and enhancement of new technology, extensive study of the functional materials and its processing is required. In the present work, optimization of HfO2 thin films for gate dielectric applications in Nano-electronic devices using electron beam evaporation is discussed. HfO2 thin films have been optimized in two different thickness regimes, (i) about 35 nm physical thicknesses for back gate oxide graphene/MoS2 transistors and (ii) about 5 nm physical thickness to get Equivalent Oxide Thickness (EOT) less than 1 nm for top gate applications. Optical, chemical, compositional, structural and electrical characterizations of these films have been done using Ellipsometry, X-ray Photoelectron Spectroscopy (XPS), Rutherford Back Scattering (RBS), X-ray Diffraction (XRD), Capacitance-Voltage and Current-Voltage characterization techniques. The amount of O2 flow rate, during evaporation is optimized for 35 nm thick HfO2 films, to achieve the best optical, chemical and electrical properties. It has been observed that with increasing oxygen flow rate, thickness of the films increased and refractive index decreased due to increase in porosity resulting from the scattering of the evaporant. The films deposited at low O2 flow rates (1 and 3 SCCM) show better optical and compositional properties. The effects of post deposition annealing (PDA) and post metallization annealing (PMA) in forming gas ambient (FGA) on the optical and electrical properties of the films have been analyzed. The film deposited at 3 SCCM O2 flow rate shows the best properties as measured on MOS capacitors. A high density film (ρ=8.2 gram/cm3, 85% of bulk density) with high dielectric constant of κ=19 and leakage current density of J=2.0×10-6 A/cm2 at -1 MV/cm has been achieved at optimized deposition conditions. Bilayer graphene on HfO2/Si substrate has been successfully identified and also transistor has been fabricated with HfO2 (35 nm) as a back gate. High transconductance compared to other back gated devices such as SiO2/Si and Al2O3/Si and high mobility have been achieved. The performance of back gated bilayer graphene transistors on HfO2 films deposited at two O2 flow rates of 3 SCCM and 20 SCCM has been evaluated. It is found that the device on the film deposited at 3 SCCM O2 flow rate shows better properties. This suggests that an optimum oxygen pressure is necessary to get good quality films for high performance devices. MoS2 layers on the optimized HfO2/Si substrate have been successfully identified and transistor has been fabricated with HfO2 (32 nm) as a back gate. The device is switching at lower voltages compared to SiO2 back gated devices with high ION/IOFF ratio (>106). The effect of film thickness on optical, structural, compositional and electrical properties for top gate applications has been studied. Also the effect of gate electrode material and its processing on electrical properties of MOS capacitors have been studied. EOT of 1.2 nm with leakage current density of 1×10-4 A/cm2 at -1V has been achieved.

Process variability is a major challenge for the design of nano scale MOSFETs due to fundamental physical limits as well as process control limitations. As the size of the devices is scales down to improve performance, the circuit becomes more sensitive to the process variations. Thus, it is necessary to have a device model that can predict the variations of device characteristics. Statistical modeling method is a potential solution for this problem. The novelty of the work is that we connect BSIM parameters directly to the underlying process parameters. This is very useful for fabs to optimize and control the specific processes to achieve certain circuit metric. This methodology and framework is extendable to any future technologies, because we used a device independent, but process depended frame work In the first part of this thesis, presents the design of nominal MOS devices with 28 nm physical gate length. The device is optimized to meet the specification of low standby power technology specification of International Technology Roadmap for Semiconductors ITRS(2012). Design of experiments are conducted and the following parameters gate length, oxide thickness, halo concentration, anneal temperature and title angle of halo doping are identified as the critical process parameters. The device performance factors saturation current, sub threshold current, output impendence and transconductance are examined under process variabilty. In the subsequent sections of the thesis, BSIM parameter extraction of MOS devices using the software ICCAP is presented. The variability of the spice parameters due to process variation is extracted. Using the extracted data a new BSIM interpolated model for a variability aware circuit design is proposed assume a single process parameter is varying. The model validation is done and error in ICCAP extraction method for process variability is less than 10% for all process variation condition in 3σ range. In the next section, proposes LUT model and interpolated method for a variability aware circuit design for single parameter variation. The error in LUT method for process variability reports less than 3% for all process variation condition in 3σ range. The error in perdition of drain current and intrinsic gain for LUT model files are very close to the result of device simulation. The focus of the work was to established effective method to interlink process and SPICE parameters under variability. This required generating a large number of BSIM parameter ducks. Since there could be some inaccuracy in large set of BSIM parameters, we used LUT as a golden standard. We used LUT modeling as a benchmark for validation of our BSIM3 model In the final section of thesis, impact of multi parameter variation of the processes in device performance is modelled using RSM method; the model is verified using ANOVA method. Models are found to be sufficient and stable. The reported error is less than 1% in all cases. Monte Carlo simulation confirms stability and repeatability of the model. The model for random variabilty of process parameters are formulated using BSIM and compared with the LUT model. The model was tested using a benchmark circuit. The maximum error in Monte Carlo simulation is found to be less than 3% for output current and less than 8% for output impedance.

The research conducted for this thesis seeks to understand issues associated with integrating a direct spread spectrum system (DSSS) transceiver on to a single chip. Various types of sequences, such as Kasami sequences and Gold sequences, are available for use in typical spread spectrum systems. For this thesis, complex spreading sequences (CSS) are used for improved cross-correlation and autocorrelation properties that can be achieved by using such a sequence. While CSS and DSSS are well represented in the existing body of knowledge, and discrete bulky hardware solutions exist – an effort to jointly integrate CSS and DSSS on-chip was identified to be lacking. For this thesis, spread spectrum architecture was implemented focussing on sub-systems that are specific to CSS. This will be the main contribution for this thesis, but the contribution is further appended by various RF design challenges: highspeed requirements make RF circuits sensitive to the effects of parasitics, including parasitic inductance, passive component modelling, as well as signal integrity issues. The integration is first considered more ideally, using mathematical sub-systems, and then later implemented practically using complementary metal-oxide semiconductor (CMOS) technology. The integration involves mixed-signal and radio frequency (RF) design techniques – and final integration involves several specialized analogue sub-systems, such as a class F power amplifier (PA), a low-noise amplifier (LNA), and LC voltage-controlled oscillators (VCOs). The research also considers various issues related to on-chip inductors, and also considers an active inductor implementation as an option for the VCO. With such an inductor a better quality factor is achievable. While some conventional sub-system design techniques are deployed, several modifications are made to adapt a given sub-system to the design requirements for this thesis. The contribution of the research lies in the circuit level modifications done at sub-system level aimed towards eventual integration. For multiple-access communication systems, where a number of independent users are required to share a common channel, the transceiver proposed in this thesis, can contribute towards improved data rate or bit error rate. The design is completed for fabrication in a standard 0.35-μm CMOS process with minimal external components. With an active chip area of about 5 mm2, the simulated transmitter consumes about 250 mW&the receiver consumes about 200 mW. AFRIKAANS : Die navorsing wat vir hierdie tesis onderneem is, beoog om kundigheid op te bou aangaande die kwessies wat met die integrasie van ‘n direkte spreispektrumstelsel (DSSS) sender-ontvanger op ‘n enkele skyfie verband hou. Verskeie tipes sekwensies, soos byvoorbeeld Kasami- en Gold-sekwensies, is vir gebruik in tipiese spreispektrumstelsels beskikbaar. Vir hierdie tesis is komplekse spreisekwensies (KSS) gebruik vir verbeterde kruis- en outokorrelasie-eienskappe wat bereik kan word deur so ‘n sekwensie te gebruik. Alhoewel DSSS en KSS reeds welbekend is, en diskrete hardeware oplossings reeds bestaan, is die vraag na gesamentlike geïntegreerde DSSS en KSS op een vlokkie geïdentifiseer. Vir hierdie tesis is spreispektrumargitektuur aangewend met die klem op KSS substelsels. Dit is dan ook die belangrikste bydrae van hierdie tesis, maar die bydrae gaan verder gepaard met verskeie RF-ontwerpuitdagings: hoëspoed-vereistes maak RF-stroombane sensitief vir die uitwerking van parasitiese komponente, met inbegrip van parasitiese induktansie, passiewe komponentmodellering en ook seinintegriteitskwessies. Die integrasie word eerstens meer idealisties oorweeg deur wiskundige substelsels te gebruik en dan later prakties te implementeer deur komplementêre metaaloksied-halfgeleiertegnologie (CMOS) te gebruik. Die integrasie behels gemengdesein- en radiofrekwensie(RF)-ontwerptegnieke – en finale integrasie behels verskeie gespesialiseerde analoë substelsels soos ‘n klas F-kragversterker (KV), ‘n laeruis-versterker (LRV), en LC-spanningbeheerde ossileerders (SBO’s). Die navorsing oorweeg ook verskeie kwessies in verband met op-skyfie induktors en oorweeg ook ‘n aktiewe induktorimplementering as ‘n opsie vir die SBO. Met sodanige induktor is ‘n beter kwaliteitsfaktor haalbaar. Hoewel enkele konvensionele substelsel-ontwerptegnieke aangewend word, word daar verskeie wysigings aangebring om ‘n gegewe substelsel by die ontwerpvereistes vir hierdie tesis aan te pas. Die bydrae van die navorsing is hoofsaaklik die stroombaanmodifikasies wat gedoen is op substelselvlak om integrasie te vergemaklik. Vir veelvoudige-toegang kommunikasiestelsels waar ‘n aantal onafhanklike gebruikers dieselfde seinkanaal moet deel, kan die sender-ontvanger voorgestel in hierdie tesis meewerk om die datatempo en fouttempo te verbeter. Die ontwerp is voltooi vir vervaardiging in ‘n standaard 0.35-μm CMOS-proses met minimale eksterne komponente. Met ‘n aktiewe skyfie-oppervlakte van ongeveer 5 mm2, verbruik die gesimuleerde sender ongeveer 250 mW en die ontvanger verbruik ongeveer 200 mW. / Thesis (PHD)--University of Pretoria, 2011. / Electrical, Electronic and Computer Engineering / unrestricted