Th. Ph. D.--History of art--New Haven (Conn.)--Yale University, 1983. / Bibliogr. p. 268-270.

Th. Etat--Art et archéologie--Paris 4, 1995. / Bibliogr. p. 375-384.

DEA--Histoire de l'art--Paris 1, 1997. / Bibliogr. p. 60-68.

Dans les technologies CMOS sur substrat FDSOI, la consommation de silicium dans les zones sources/drains des transistors par les étapes successives de gravure est un paramètre critique. La gravure plasma des espaceurs de Si3N4, qui a lieu après la gravure de la grille, doit permettre la fabrication d'espaceurs au profil droit déterminant la longueur effective du canal sous la grille tout en minimisant la consommation de la couche mince de silicium sous-jacente. De plus, l'état de surface du silicium généré par la gravure des espaceurs ne doit pas entraver la croissance de silicium par épitaxie nécessaire à la fabrication des zones sources/drains surélevées.L'étude des procédés actuels de gravure des espaceurs basés sur des chimies CHxFy/O2 nous apprend que le silicium est consommé par oxydation lors de l'atterrissage du plasma sur le silicium. De plus, l'analyse XPS montre que du carbone est implanté par les ions du plasma dans le substrat de silicium, et celui-ci empêche la recroissance de silicium par épitaxie. Nous sommes en mesure de réduire cette concentration de carbone sans pour autant augmenter la consommation de silicium par l'utilisation de post-traitements plasmas non-oxydants à base d'hydrogène.Fort de cette analyse mettant en avant les limitations des procédés actuels, nous avons développé et caractérisé des procédés de gravure des espaceurs de Si3N4 utilisant des plasmas CH3F/O2/He pulsés synchronisés. La modulation en impulsions courtes avec de faibles rapports cycliques diminue la dose d'ions énergétique reçue par le substrat, ce qui permet de réduire l'épaisseur de silicium oxydé ainsi que la concentration de carbone implanté. L'ajout dans le plasma d'un gaz contenant du silicium, le SiCl4 ou le SiF4, entraine également une réduction de la consommation de silicium grâce au dépôt d'une couche SiOxFy par les radicaux de la phase gazeuse. Le meilleur résultat est obtenu avec un plasma CH3F/O2/He pulsé à 1kHz et 10% de rapport cyclique auquel sont ajoutés 5 ou 10 sccm de SiF4 : la consommation de silicium est alors quasi nulle.Une méthode de gravure alternative basée sur l'implantation d'ions He+ et H+ suivie d'une gravure humide dans une solution HF a également été développée et évaluée pour la gravure des espaceurs de Si3N4. Ce procédé de gravure novateur ne génère aucune consommation de silicium et présente des résultats très prometteurs. / In CMOS technologies on FDSOI substrate, the silicon recess in transistor's source/drain regions caused by multiple etch steps is a critical parameter. The plasma etching of Si3N4 spacers, which occurs after the gate etch step, must allow the fabrication of straight spacer profiles which will define the effective channel length under the gate, while minimizing the consumption of the underlying silicon thin film. Moreover, the silicon surface state generated by the spacers etching must not prevent the epitaxial silicon growth used for the realization of raised source/drain regions.The study of current spacers etch processes based on CHxFy/O2 chemistries shows that silicon is consummated by oxidation when the plasma lands on the silicon surface. Furthermore, the XPS analysis shows that carbon is implanted in the silicon substrate by plasma ions, and that it inhibits the silicon epitaxial regrowth. We are able to reduce the implanted carbon concentration without any additional silicon recess by using non-oxidizing plasma post-treatments based on hydrogen.After identifying the limitations of current etch processes, we developed and characterized Si3N4 spacers etch processes using synchronously pulsed CH3F/O2/He plasmas. The modulation in short pulses with low duty cycles decreases the dose of high energy ions bombarding the substrate, which allows to reduce the oxidized silicon thickness as well as the concentration of implanted carbon. The addition in the plasma of a Si-containing gas, SiCl4 or SiF4, also leads to a reduction of the silicon consumption thanks to the deposition of a SiOxFy layer by radicals from the gas phase. The best result is obtained with a CH3F/O2/He plasmas pulsed at 1 kHz and 10% duty cycle with the addition of 5 or 10 sccm of SiF4 : the silicon recess is then almost zero.We also developed and evaluated an alternative etching technique, based on the implantation of He+ and H+ ions followed by a HF wet etch, for the etching of Si3N4 spacers. This innovative etch process does not generate any silicon recess and shows some promising results.

Orientador: Lygia Arcury Eluf / Dissertação (mestrado) - Universidade Estadual, Instituto de Artes / Made available in DSpace on 2018-08-16T09:44:18Z (GMT). No. of bitstreams: 1 BosqueMartinez_MariadelCarmen_M.pdf: 15503052 bytes, checksum: 16ab27540ffa9b268bc20f397d8bc98a (MD5) Previous issue date: 2005 / Resumo: Esta dissertação se compõe da exposição de uma série de imagens realizadas de 2002 a 2004 que questionam a ocupação do lugar por uma atitude (poética) dada pelo desenho, gravura e pintura e de anotações e reflexões sobre o processo de realização dessas imagens. Naturalmente as paisagens deste período passam a dialogar com registros anteriores onde este assunto é evocado. A necessidade de compor um texto que expresse a reflexão sobre a prática artística me fez perceber que estas imagens refletem um processo longo de construção de um trabalho que se constitui no encontro com a paisagem e na minha intermediação. O interesse deste estudo está no entendimento desta intermediação, que atende a uma necessidade de observação do modelo e compreensão da atitude diante da paisagem (o lugar; a relação com o ponto-lugar em que se está: casa-ateliê, em viagens ou situações que signifiquem mudanças de lugar, deslocamentos) e como isso se manifesta e determina a constituição de uma linguagem específica que se torna objeto de meu trabalho. O depoimento sobre seu processo de construção se compõe de duas partes: a primeira trata de revelar as possíveis aproximações à paisagem, de construir um caminho que apresente uma personalidade e aquilo que a identifica e apressa seu olhar a um lugar pretendido; e a segunda é a transcrição de um diário de trabalho que expõe a maneira como as atrações despertadas pelo encontro, observação e lembranças desses lugares se manifestam pela apropriação e arranjo dos elementos de linguagem que formam uma imagem que exprime um estado de consciência / Abstract: The following essay is made up of a series of images taken place between 2002 and 2004, that question the occupation of the place by a poetic attitude expressed through the drawings, engravings, painting, as well as notes and reflections upon their making process. As a natural consequence, this period's landscapes start to dialogue with previous registers where this genre was present. The need to write a text that could express the reflection upon this artistic work helped me realize that those images reflected a long process of poetic construction, which is the result of the encounter between the landscape and my mediation. The interest of this essay lies in the understanding of that mediation, which fulfills the necessity not only to observe the model and to understand my attitude towards the landscape, but also how this process was developed and how it determines the creation of a specific language which becomes the object of my work. The statement of this process is compound of two parts: the first one aims to reveal possible approaches to the landscape, as well as to build a narrative that leads the reader to the artist's personality, and to what identifies it, and makes her choose an intended place. The second is the transcription of a diary that exposes how the observation and remembrances of those places reveal themselves through the appropriation and arrangement of the visual elements, building an image that expresses a state of consciousness / Mestrado / Mestre em Artes

Cette thèse est consacrée à l’étude des illustrations bibliques de Marc Chagall (1887-1985). Dès le commencement de son travail pour la Bible (publiée en 1956 par Tériade) dans les années 1920, il s’approprie le thème biblique comme sujet central de son art et se sert de ses compositions comme modèle iconographique permanent pour les autres œuvres bibliques. On analyse cette Bible ainsi que tous les autres livres bibliques illustrés par Chagall (Dessins pour la Bible (1960), The Story of the Exodus (1966), Psaumes de David (1979 et 1980) en vue de déceler leurs particularités et estimer leurs places dans l’ensemble de l’art religieux de l’artiste. En effet, le parcours de Chagall donne à voir un être toujours en mouvement entre son monde d’origine juive et le monde étranger. Ce va-et-vient crée en lui une dualité du monde intérieur et du monde extérieur, qui agit comme une dynamique dans ses créations. Les eaux-fortes pour la Bible représentent tout à fait cette dynamique. Or, ce caractère disparaît lorsque Chagall s’approprie le monde étranger comme le sien ; la dualité s’efface pour évoluer vers une unité et une synthèse des différentes cultures présentes chez lui. À mesure que ses œuvres prennent de l’ampleur, l’artiste s’efforce de les doter d’un message et d’un caractère plus universels. En développant sa philosophie de paix et d’amour universels, fondée sur son interprétation du message biblique, Chagall recherche à travers ses œuvres religieuses une grande synthèse dans laquelle il y a une dynamique et une continuité de l’Ancien au Nouveau Testament et du judaïsme au christianisme. / This study examines all of the Bible illustrations made by Marc Chagall. Once he started to work on the Bible by etching, the biblical theme became the major subject of his art, and these etchings have been largely used as a model for his other works. We analyse this Bible and all of the other biblical illustrated books of Chagall to find out their characteristics and their meanings in his entire religious art. In fact, we can notice in Chagall’s journey from his birth to his Bible illustrations that this artist has continually been moving between his own Jewish tradition and the outside world. These comings and goings make in him a duality and it becomes dynamic in his creations. His etchings for the Bible show especially this feature. They take root in Jewish tradition but also show various marks of different cultures known by the artist. Nevertheless, we can’t find this characteristic again in any of his other biblical illustrated books, because in appropriating the outside world as his own, the duality disappears and unites. As he works on stained-glass windows in churches, he develops a philosophical view of the universal peace and love based on his interpretation of the biblical message. Then he seeks this universality through all his religious works and biblical illustrations until his last days.

Abstract In gravure offset printing, ink is transferred with the help of an offset material from a patterned gravure plate to a substrate. This thesis is concerned with the study and further development of this printing process for electronics; on alumina, glass and polymers. The work has been divided into five parts. In the first section, the printing process is described. The second section describes the composition of the inks for gravure offset printing and the resulting ink properties. It also presents the ink transfer mechanism; the model that explains how the ink is transferred between an offset material and a substrate. The third chapter details the printing process explained by a solvent absorption mechanism. The forth chapter describes the firing/curing of printed samples and their properties. The last chapter describes applications of the method. The inks used to produce conductors on ceramics (ceramic inks) and conductors on polymers (polymer inks) contain silver particles, and were under development for gravure offset printing. The major achieved properties were the high ink pickup to the offset blanket and high transfer percentage to the substrate. 100% ink transfer from blanket to substrate for ceramic inks and almost 100% ink transfer for polymer inks was obtained. The printing of ceramic inks was able to produce 8 μm of relatively thick, 300 μm wide lines with < 10 mΩ/sq. resistance. The minimum line width for conducting lines was 35 μm, with one printing. Multi printing was applied producing as many as 10 times wet-on-wet multiprinted lines with 100 % ink transfer from blanket to substrate resulting in a square resistance of 1mΩ/sq. Polymer inks were able produce a square resistance of 20 mΩ/sq. for 300 μm wide lines after curing at 140 °C for about 15 min, and the minimum width was down to 70 μm. In the optimised manufacturing process, the delay time on the blanket was reduced to 3 s. In addition to ultra-fine-line manufacturing of conductors, the method enables the manufacture of special structures e.g. laser-solder contact pads with 28/28 μm lines/spaces resolution. With industrial printing equipment it is possible to produce 100 m2/h with the demonstrated printing properties.

Abstract The thesis is concerned with the development of gravure-offset-printing and low temperature co-fired ceramic (LTCC) technologies for the miniaturisation of electronic devices and components. The development work has been verified by several applications. Several aspects of gravure-offset-printing have to be optimised in order to make it suitable for fine-line printing and these have been addressed in the study with a focus on the printing inks and plates. Gravure-offset-printing inks were developed from commercial thick-film pastes. The effects of different ink characteristics on some properties of conductor lines, such as line width and resistivity, were studied. The dependence of the conductor lines on the quality of the engravings in the printing plates was also studied. The narrowest line widths obtained were about 30 μm with an accuracy of ±5 μm. Various LTCC compositions and processing steps involved in the production of integrated electronic devices, and the properties of several fabricated devices are discussed. The devices include inductors, band-pass filters and resistors for the 1–2 GHz frequency range. Miniaturisation has been the main focus of attention. For example, the integration of high-permittivity tapes in addition to low-permittivity tapes has made the miniaturisation of filter structures possible. Compatibility between these tapes during firing was found to be good. LTCC technology was further developed by adapting a modified LTCC-on-metal (LTCC-M) approach. A traditional way of guiding heat away from a component is to place a heat-sink under the component and utilise thermal vias and solder balls. In this study high- and low-permittivity tapes were attached directly on a heat-sink. Different heat-sink options were evaluated and the best performance was achieved with an AlN heat-sink which was deposited by screen-printing a Au layer on it. High-power chips were attached directly on the heat-sink through cavities in the LTCC tapes. This approach also restricted the shrinkage of the LTCC tapes. The fabricated test structures and components proved the viability of the approach although the compatibility between the pastes and tapes was not optimal.

Les plasmas radio-fréquences à couplage inductif en gaz halogénés simples (cl2/hbr/o2) sont fortement utilisés dans l'industrie des semi-conducteurs. Cependant, notre connaissance des processus réactionnels de ces plasmas est encore très partielle. De nombreux travaux de simulations (fluides, particulaires...), visant à améliorer celle-ci, ont été produits ces dernières décennies. Toutefois, trop peu de résultats expérimentaux sont disponibles dans la littérature afin de valider ou améliorer ces simulations. L'objectif de cette thèse est alors de produire un ensemble complet de résultats experimentaux. Nous nous focalisons essentiellement sur le cas des plasmas de cl2 et de o2 purs. Dans cette thèse, nous étendons les résultats expérimentaux déjà présents dans la littérature : densités de charges et de neutres, températures translationnelles. En particulier, les tendances en fonction de la pression, essentielles pour la simulation, sont soigneusement étudiées. Les vibrations moléculaires sont également étudiées à l'aide d'un montage innovant de spectroscopie d'absorption. Nous montrons que les simulations sont encore loin de représenter fidèlement les processus réactionnels des plasmas étudiés. Nous tentons de fournir à cet effet quelques pistes d'améliorations. Ce travail est la base nécessaire à l'amélioration continue des plasmas industriels utilisés pour la gravure de semi-conducteurs. / Radio-frequency inductively-coupled plasmas in simple halogen gases (cl2/hbr/o2) are widely used in the semi-conductor industry. However, our knowledge of these plasmas is still incomplete. To improve it, numerous simulation studies have been performed in the last decades. Unfortunately, experimental results to compare these studies are still scarce. The objectives of this thesis is to provide a comprehensive set of experimental results. We focused on the plasmas of pure o2 and cl2. In this thesis, we extend the already available experimental results : neutral nd charges densities, translational temperatures. In particular, the tendancies of these parameters as a function of the pressure are carefully studied. Molecular vibrations are studied as well using a new kind of absorption spectroscopy setup. We show that the recent simulations are still far from representing the reactional processes in the studied plasmas. We then try to provide some ideas of improvement. This work is the needed start to improve etching plasma industrial processes.

Les objets d’étude de cette thèse sont les livres imprimés, le roman libertin français du XVIIIème siècle et les gravures qui accompagnent ces textes. Nous explorons concrètement la dualité de la gravure libertine, établie entre l’aspect explicite de ses thèmes et la condensation tacite d’une idée. Cette étude part, dans le premier chapitre, d’une synthèse historique générale de l’utilisation de l’image depuis l’Antiquité jusqu’au XVIIIème siècle, en explorant aussi bien les usages du passé classique dans la manufacture de la gravure libertine, que son changement dans le temps et ses caractéristiques historico-culturelles particulières. Le deuxième chapitre approfondit ce même univers, mais en se centrant sur les rôles de genre attribués aux corps représentés sur les gravures, la notion de sexualité imprimée en elles et l’effet rhétorique et intimiste que les textes et les images établissent entre l’auteur et le lecteur. Dans le troisième chapitre, nous abordons la lecture des gravures allégoriques. Elles se trouvent dans les frontispices du roman libertin et représentent leur aspect le plus important. En effet, c’est en eux que se trouvent les empreintes permettant d’établir des continuités dans leur dimension esthétique, représentées par l’appropriation d’éléments stylistiques et thématiques de l’Antiquité Classique et la « condensation », caractéristique essentielle des images de ce type de gravures. Finalement, dans le quatrième chapitre, nous étudions la relation entre la gravure et l’Art, représenté particulièrement par la Peinture. Dans cette optique, et à partir d’un schéma d’analyse prédéterminé, divisé en sujets spécifiques, nous nous concentrons sur les singularités qui permettent d’établir ce qui était considéré, ou non, comme étant de l’Art au XVIIIème siècle. / The objects of study of this thesis are printed books, the French libertine novel of the 18th century and the illustrations that go with these texts. We explore concretely the duality of libertine illustration, created between the explicit aspect of its topics and the tacit condensation of an idea. This study starts, in the first chapter, with a general historical synthesis of the use of picture since Antiquity until the 18th century, and explores the uses of a classical past in the manufacture of libertine illustrations, as well as its change in time and its specific historic-cultural characteristics. The second chapter goes deeper into this same universe but focuses on the gender roles given to bodies represented on illustrations, on the notion of sexuality printed in them and on the rhetoric and intimate effect that texts and pictures set up between the author and the reader. In the third chapter, we look at the reading of allegoric illustrations. These are found in the frontispieces of libertine novel and represent their most important aspect. Indeed, these frontispieces contain the traces that establish continuities in their esthetical dimension, represented by the appropriation of stylistic and thematic elements of Classical Antiquity and “condensation”, an essential characteristic of the pictures on this type of illustrations. Finally, in the fourth chapter, we study the relation between illustration and Arts, particularly represented through Painting. In this perspective, and from a predetermined analysis scheme divided into specific topics, we focus on the singularities that permit establishing what was considered, or not, as Arts in the 18th century.