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Electronic Transport in Highly Mismatched InAs Films on GaAsZhang, Yao 07 February 2014 (has links)
Electrical properties of Si- and Mg-doped InAs epitaxial layers grown by MOCVD were studied by performing magneto-transport measurements at different temperatures, from 300 K down to 1.2 K. The longitudinal magnetoresistance and Hall effect indicate a three-band system existing in n-type (p-type) InAs, which consists of the surface accumulation (inversion) layer, the bulk electron (hole) layer, and the nucleation layer. Therefore, a classical parabolic background in magnetoresistance due to multi-carrier occurs at low fields. With the magnetic field being further applied, a linear magnetoresistance caused by inhomogeneities is revealed. At liquid helium temperature, the Shubnikov-de Haas magneto-oscillations are also observed. These transport characterizations provide a means of analyzing the band structure at the InAs surface. In a set of n-type InAs epilayers with Si doped at different levels, the bulk electron density increases as the doping level increases. The increased ionized impurities lead to lower electron mobilities due to more Coulomb scatterings. For all the n-type InAs films, except the two active layers (surface and the bulk), the nucleation layer contributes to the film conductivity as well with an electron density of ~ 5 x 10¹⁷ cm⁻³ and a mobility of ~ 2000 cm²}/Vs. In a cooldown process, the electron density of each layer slightly and monotonically decreases whereas the mobility experiences a maximum from the competition between phonon scatterings and Coulomb scatterings. The phonon scattering overwhelms the Coulomb scatting at high temperatures, but declines as temperature decreases, thus the mobility increases. Around 100 K, the temperature-independent ionized impurity scattering becomes comparable with and starts exceeding the phonon scattering, as temperature further lowered, the screening effect of the Coulomb scattering is weakened because of the decreased carrier densities. As a result, the mobility starts dropping. The maximum mobility corresponds to a minimum resistance, which explains the non-trivial temperature dependence of the resistance in the cooldown history. For the p-type InAs film, the doping with Mg in the course of MOCVD growth allows us to obtain a large hole density and a low mobility at 300 K. At low temperatures, holes are frozen out, and a strong negative magnetoresistance with a dip at 0 field are observed, which is the antilocalization signal from accumulation electrons. This is a strong technique to probe the surface quantum states and derive the phase coherence length and the spin flip length of surface electrons. / Master of Science
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Stress evolution during growth on InAs on GaAs measured by an in-situ cantilever beam setupHu, Dongzhi 23 February 2007 (has links)
Der Einfluss der Verspannung während des Wachstums von InAs auf GaAs(001) mittels Molekularstrahlepitaxie wird in dieser Arbeit untersucht. Eine Biegebalkenapparatur wurde benutzt, um den Verlauf der Filmkraft während des Wachstums und dem nachfolgenden Anlassen bei Wachstumstemperaturen zu messen. Die Steigung in einer Darstellung von Filmkraft gegen Filmdicke ist gleich der Verspannung, die sich während des heteroepitaktischen Wachstums bildet. Während des Wachstums von InAs auf GaAs(001) unter As-reichen Bedingungen zeigt die Filmkraft zuerst eine lineare Steigung. Dieser lineare Verlauf entspricht dem Aufdampfen der Benetzungsschicht (WL). Nach Erreichen der kritischen Schichtdicke verläuft die Filmkraft mit geringerer Steigung, was auf einen Abbau der Verspannung durch das Auftreten von Quantenpunkten (QP) hindeutet. Werden die QP nachfolgend angelassen, nimmt die Filmkraft wieder ab was durch Reifung der QDs und durch Desorption von InAs hervorgerufen wird. Modelle wurden entwickelt um die Filmkraft-Kurven, die während des Anlassens gemessen wurden, anzupassen. Die QP reifen unter Standard-Ostwald-Bedingungen für Temperaturen unterhalb 470°C. Verschiedene Mechanismen bestimmen den Reifungsprozess. Beim Anlassen bei höheren Temperaturen zeigt sich ein anderes Verhalten. Die Verspannung der QP baut sich auf Werte unterhalb der Verspannung ab, die durch das Aufbringen der Benetzungsschicht entstanden ist. Rasterkraftmikroskop-Aufnahmen zeigen, dass die QP zuerst reifen und sich dann nach ca. 450s bis 600s wieder auflösen. Im Unterschied zum Wachstum unter As-reichen Bedingungen führt das Wachstum unter In-reichen Bedingungen nicht zur Ausbildung von QP sondern verläuft im Lagenwachstumsmodus. Filmkraft-Kurven wurden ebenfalls unter diesen Bedingungen gemessen und zeigen, wie erwartet, eine deutliche Abweichungen von Kurven, die während des Stranski-Krastanov-Wachstums gemessen wurden. Eine erste vorläufige Analyse dieser Filmkraftkurven wird beschrieben. / The influence of stress on the growth of InAs on GaAs(001) by molecular beam epitaxy (MBE) is investigated in this thesis. An in-situ cantilever beam measurement (CBM) setup was used to measure the evolution of the film force during deposition and subsequent annealing at the growth temperature. The slope in a plot of film force versus film thickness is equal to the stress that builds up during heteroepitaxial growth. During the growth of InAs on GaAs(001) under As-rich conditions, the film force shows a linear slope up to a value of 2.3 N/m. This linear increase in film force corresponds to the deposition of the wetting layer. Beyond the critical thickness of 1.5-1.6 monolayers, the film force proceeds with a decreasing slope, indicating a strain release by the formation of quantum dots. When the samples are subsequently annealed, the film force decreases again due to the ripening of the quantum dots and the desorption of InAs. Models were developed to fit and explain the relaxation of the film force measured during the annealing of InAs quantum dots. At temperatures lower than 470°C, quantum dots undergo standard Ostwald ripening. Different mechanisms determine the ripening process. Fits of the models based on these mechanisms were made to the film force relaxation curves. Annealing of quantum dots at temperatures higher than 500°C shows a very different behavior. The film force accumulated during the quantum dot formation relaxes below the value which was built-up by the wetting layer growth. Atomic force microscopy images reveal that the quantum dots ripen first and then dissolve after 450s to 600s annealing. In contrast to the growth under As-rich conditions, the growth under In-rich conditions does not lead to the formation of quantum dots but proceeds rather in a layer-by-layer growth mode. The film force curves were also measured during this deposition mode. A preliminary analysis of the film force curves is presented.
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Fotodetectores de radiação infravermelha baseados em pontos quânticos de submonocamada / Infrared photodetectors based on submonolayer quantum dots.Zeidan, Ahmad Al 03 October 2017 (has links)
Nesse trabalho, foi investigado um novo tipo de fotodetector de radiação infravermelha baseado em pontos quânticos de submonocamada de InAs obtidos pela técnica de epitaxia por feixe molecular (MBE, Molecular Beam Epitaxy). Suas propriedades foram comparadas com as de fotodetectores de pontos quânticos de InAs convencionais obtidos pela mesma técnica de deposição, mas no modo de crescimento Stranski-Krastanov. Medidas de corrente de escuro, de ruído, de responsividade e de absorção mostraram que, dependendo da estrutura das amostras, os dispositivos com pontos quânticos de submonocamada podem ter um excelente desempenho. / In this work, we investigated a new type of infrared photodetector based on InAs sub-monolayer quantum dots grown by molecular beam epitaxy (MBE). Their properties were compared with those of photodetectors containing conventional InAs quantum dots obtained by the same deposition technique, but in the Stranski-Krastanov growth mode. Dark current, noise, responsivity and absorption measurements have shown that, depending on the structure of the samples, the devices with sub-monolayer quantum dots can perform very well.
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Time-resolved measurements of charge carrier dynamics and optical nonlinearities in narrow-bandgap semiconductorsOlson, Benjamin Varberg 01 May 2013 (has links)
All-optical time-resolved measurement techniques provide a powerful tool for investigating critical parameters that determine the performance of infrared photodetector and emitter semiconductor materials. Narrow-bandgap InAs/GaSb type-II superlattices (T2SLs) have shown great promise as a next generation source of these materials, due to superior intrinsic properties and versatility. Unfortunately, InAs/GaSb T2SLs are plagued by parasitic Shockley-Read-Hall recombination centers that shorten the carrier lifetime and limit device performance. Ultrafast pump-probe techniques and time-resolved differential transmission measurements are used here to demonstrate that Ga-free InAs/InAsSb T2SLs and InAsSb alloys do not have this same limitation and thus have significantly longer carrier lifetimes. Measurements at 77 K provided minority carrier lifetimes of 9 μs and 3 μs for an unintentionally doped mid-wave infrared (MWIR) InAs/InAsSb T2SL and InAsSb alloy, respectively; a two order of magnitude increase compared to the 90 ns minority carrier lifetime measured in a comparable MWIR InAs/GaSb T2SL. Through temperature-dependent lifetime measurements, the various carrier recombination processes are differentiated and the dominant mechanisms identified for each material. These results demonstrate that these Ga-free materials are viable options over InAs/GaSb T2SLs for potentially improved infrared photodetectors.
In addition to carrier lifetimes, the drift and diffusion of excited charge carriers through the superlattice growth layers (i.e. vertical transport) directly affects the performance of photodetectors and emitters. Unfortunately, there is a lack of information pertaining to vertical transport, primarily due to difficulties in making measurements on thin growth layers and the need for non-standard measurement techniques. However, all-optical ultrafast techniques are successfully used here to directly measure vertical diffusion in MWIR InAs/GaSb T2SLs. By optically generating excess carriers near one end of a MWIR T2SL and measuring the transit time to a thin, 2 lower-bandgap superlattice placed at the other end, the time-of-flight of vertically diffusing carriers is determined. Through investigation of both unintentionally doped and p-type superlattices at 77 K, the vertical hole and electron diffusion coefficients are determined to be 0.04±0.03 cm2/s and 4.7±0.5 cm2/s, corresponding to vertical mobilities of 6±5 cm2/Vs and 700±80 cm2/Vs, respectively. These measurements are, to my knowledge, the first direct measurements of vertical transport properties in narrow-bandgap superlattices.
Lastly, the widely tunable two-color ultrafast laser system used in this research allowed for the investigation of nonlinear optical properties in narrow-bandgap semiconductors. Time-resolved measurements taken at 77 K of the nondegenerate two-photon absorption spectrum of bulk n-type GaSb have provided new information about the nonresonant change in absorption and two-photon absorption coefficients in this material. Furthermore, as the nondegenerate spectrum was measured over a wide range of optical frequencies, a Kramers-Kronig transformation allowed the dispersion of the nondegenerate nonlinear refractive index to be calculated.
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Fotodetectores de radiação infravermelha baseados em pontos quânticos de submonocamada / Infrared photodetectors based on submonolayer quantum dots.Ahmad Al Zeidan 03 October 2017 (has links)
Nesse trabalho, foi investigado um novo tipo de fotodetector de radiação infravermelha baseado em pontos quânticos de submonocamada de InAs obtidos pela técnica de epitaxia por feixe molecular (MBE, Molecular Beam Epitaxy). Suas propriedades foram comparadas com as de fotodetectores de pontos quânticos de InAs convencionais obtidos pela mesma técnica de deposição, mas no modo de crescimento Stranski-Krastanov. Medidas de corrente de escuro, de ruído, de responsividade e de absorção mostraram que, dependendo da estrutura das amostras, os dispositivos com pontos quânticos de submonocamada podem ter um excelente desempenho. / In this work, we investigated a new type of infrared photodetector based on InAs sub-monolayer quantum dots grown by molecular beam epitaxy (MBE). Their properties were compared with those of photodetectors containing conventional InAs quantum dots obtained by the same deposition technique, but in the Stranski-Krastanov growth mode. Dark current, noise, responsivity and absorption measurements have shown that, depending on the structure of the samples, the devices with sub-monolayer quantum dots can perform very well.
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Nouvelles sources lasers à super réseau InAs/GaSb/InSb pour l'émission moyen infrarouge / New Mid-Infrared Laser source with super-lattice InAs/GaSb/InSb for mid-infrared emissionGassenq, Alban 20 July 2010 (has links)
Ce travail de thèse porte sur le développement et l'étude de diodes laser moyen infrarouge dont la zone active est constituée d'un super réseau (SR) à très courte période InAs/GaSb/InSb élaboré par épitaxie par jets moléculaires. La gamme de longueur d'onde d'émission visée est 3 - 3,5 µm qui est très intéressante pour des applications d'analyse de gaz par spectroscopie optique mais pour laquelle il n'y a encore aucun composant performant. Nous avons tout d'abord étudié les propriétés optoélectroniques du SR InAs/GaSb/InSb. La structure de bandes a été modélisée dans une approche k-p. L'interface sans atome commun InAs/GaSb est simulée arbitrairement par une monocouche de InAsxSb1-x dont la composition varie avec les conditions de croissance et donc avec l'interface réelle. Un bon accord est obtenu entre le gap effectif calculé et l'énergie des spectres de photoluminescence. Une attention particulière a été portée à l'impact de l'insertion contrôlée d'InSb dans le SR. Le raccordement de bandes du SR avec le guide d'onde, capital pour fabriquer un laser, a aussi été étudié. Un premier dessin de zone active a été proposé pour atteindre l'objectif. Par la suite, les performances intrinsèques des diodes lasers à SR ont été calculées par l'intermédiaire de la modélisation du gain du SR. L'effet laser avec une densité de courant de seuil proche de 0,5 kA/cm² est théoriquement possible. Les lasers à SR InAs/GaSb/InSb ont alors été étudiés expérimentalement. Nous avons fait varier de nombreux paramètres : composition et épaisseur du SR, du guide d'onde et des couches de confinement, procédé technologique? Les résultats expérimentaux ont montré des comportements proches des modélisations effectuées. L'effet laser à la température ambiante a été obtenu avec une densité de courant de seuil de l'effet laser de 2 kA/cm² à 3,2 µm et de 1,8 kA/cm² à 3,1 µm. Des perspectives d'optimisation des composants sont proposées en conclusion. / This work reports the development and study of infra-red laser diodes with InAs/GaSb/InSb short-period super lattice (SL) active region grown by molecular beam epitaxy. The target wavelength range of emission is 3 - 3.5 µm which is very interesting for gas application analysis by optical spectroscopy. There is no efficient component in this range. Firstly, we have studied the optoelectronic properties of the InAs/GaSb/InSb SL. The band structure was modelled with the k-p approach. The non-common atom InAs/GaSb interface is simulated by an arbitrary InAsxSb1-x monolayer whose composition depends with the growth conditions. A good agreement is obtained between the calculated effective gap and the energy of the photoluminescence spectra. A special attention was focus on the impact of InSb insertion in the SL. The SL band offset with the waveguide, capital to obtain high laser performance, was also studied. A first design of active zone was proposed to achieve the objective. Then, the intrinsic performances of SL lasers diode were calculated via modelling of the SL gain. Laser operation with a threshold current density close to 0.5kA/cm² is theorically possible. Lasers based on InAs/GaSb/InSb SL were then experimentally investigated. We studied several parameters: composition and thickness of SL, waveguide and cladding, technology process? The experimental results showed behaviours close to modelling. Laser operation was obtained at room temperature with a threshold current density of 2kA/cm² at 3.2µm and 1.8kA/cm² at 3.1µm. Prospects for device optimization are proposed in conclusion.
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Analyse des performances des photodiodes à superréseaux InAs/GaSb pour le moyen infrarouge / Performances analysis of InAs/GaSb superlattice photodetectors for midwave infrared domainDelmas, Marie 04 December 2015 (has links)
Dans le domaine de la photodétection infrarouge (IR) haute performance refroidie, le photodétecteur à superréseaux (SR) InAs/GaSb est une filière émergente qui peut compléter les technologies déjà établies. Grâce à des années de recherche, l'Institut d'Electronique du Sud (IES) de l'Université de Montpellier a développé une expertise sur la croissance du matériau SR InAs/GaSb par épitaxie par jets moléculaires et sur la fabrication technologique des photodiodes pin dont les performances sont à l'état de l'art mondial dans le moyen IR (3-5µm). Au cours de cette thèse, nous avons étudié deux périodes différentes de SR comme zone active de photodiodes pin ayant une longueur d'onde de coupure à 5 µm à 80K : une riche en InAs (InAs-rich) et l'autre riche en GaSb (GaSb-rich). Ces structures SR présentent des caractéristiques électriques et électro-optiques très différentes. Notamment, les densités de courant de la structure InAs-rich sont très bonnes, de l'ordre de 10-8A/cm2 à 80K, alors que celles de la structure GaSb-rich sont deux décades plus élevées. L'objectif de cette thèse était donc d'analyser les performances de ces photodiodes. Pour cela, nous avons développé une méthode de simulation avec l'outil TCAD SILVACO. Appliquée tout d'abord aux structures InAs-rich, nous avons mis en évidence que ces diodes sont limitées à basse température (typiquement < 120K) par le courant de génération-recombinaison et/ou par le courant tunnel assisté par pièges. La durée de vie extraite de la simulation suit une variation en T-1/2, démontrant que les mécanismes limitant les photodiodes est la génération-recombinaison SRH. Appliquée aux structures GaSb-rich, l'approche SILVACO ne peut expliquer les résultats en courant. Nous démontrons que ces résultats sont fortement liés à la présence du champ électrique dans la zone d'absorption du composant. Cela génère à faible polarisation, un fort courant tunnel, au travers des états Wannier-Stark localisés, qui pénalise fortement le courant d'obscurité et cela malgré des améliorations obtenues au niveau du matériau. Pour finir, nous établissons des règles de dimensionnement de structures à barrière et nous proposons une structure à SR pour le lointain infrarouge. / Among the high performance cooled infrared (IR) photodetector systems, the InAs/GaSb superlattice (SL) is an emerging material which may complement the currently technologies already established. Over the last 10 years, the Institut d'Electronique du Sud (IES) of the University of Montpellier has developed skills in both the growth of SL materials by molecular beam epitaxy and the process fabrication of pin photodiodes. The photodiode fabricated by the IES group are at the state of the art in the mid IR (3 – 5 μm). During this thesis, we studied two structures with different SL periods for the pin active zone showing the same cut-off wavelength of 5 μm at 80K: the structure called InAs-rich structure presents InAs layer thicker than the GaSb layer in each SL period while this configuration is reversed in the case of the GaSb-rich structure. These SL structures have very different electrical and electro-optical characteristics. In particular, the current densities of the InAs-rich structure are very good, about 10-8 A/cm2 at 80K - two orders of magnitude greater than that of GaSb-rich. The aim of this thesis work was therefore to analyze the performance of these photodiodes. For this purpose, we developed a simulation method with the SILVACO TCAD tool. Using this tool, we found that the InAs-rich diodes are limited at low temperatures (typically under 120K) by generation recombination and/or by assisted tunneling currents. The lifetimes extracted from the simulation follows the T-1/2 law, which demonstrates that the limiting mechanism is SRH recombination. However, we found that we could not study the current densities of the GaSb-rich structure using the same procedure. We demonstrate that these results are strongly related to the presence of the electric field in the absorption zone of the device. This electric field generates, at low biases, a strong tunneling current through localized Wannier-Stark states, which strongly limits the overall current despite material improvements. Finally, we define the design conditions to achieve an optimized SL barrier structure and propose a design for SL structures targeting the long wavelength domain.
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Etude des propriétés électroniques des boîtes quantiques InAs/InP par spectroscopie de défauts profonds (DLTS) pour des applications optoélectroniques / Study of the electronic properties of InAs/InP quantum dots by the deep levels transient spectroscopy (DLTS) for optoelectronic applicationsZouaoui, Mouna 19 September 2013 (has links)
Ce travail porte sur une étude des propriétés électroniques des boîtes quantiques InAs/InP, qui est un système très prometteur pour les télécommunications. Ces nanoparticules sont étudiées pour différentes tailles, densité et dopage. Dans le premier chapitre, nous décrivons l’intérêt du système InAs/InP pour les applications optoélectroniques. Nous présentons la technique de croissance et quelques exemples d’applications de ces boîtes quantiques. Nous donnons une description générale complète des processus d’émission susceptible d’exister dans ces structures. Dans le deuxième chapitre, nous présentons les méthodologies de caractérisation électrique mises en jeu, en insistant sur la complémentarité de deux techniques d’analyse : la spectroscopie transitoire des défauts profonds et la mesure C(V). Dans le troisième chapitre, nous étudions ces boîtes quantiques avec la technique C(V) pour aboutir à une analyse qualitative et quantitative des profils N(W) des échantillons. Une étude de ce profil en fonction de la température nous permet de déterminer les types d’émission qui dominent dans nos structures. L’effet du fort dopage de la couche matrice, ainsi que la densité de boîtes est discuté. Dans le quatrième chapitre, une étude DLTS menée sur l’ensemble des échantillons disponibles montre plusieurs défauts reliés au contrôle de la croissance et de la qualité des interfaces. En outre, une étude plus approfondie nous permet d’extraire la réponse électrique des boîtes quantiques ainsi que leurs états électroniques s et p existants. / This work deals with a study of the electronic properties of InAs / InP quantum dots, which is a very promising material system for telecommunications. These nanoparticles are studied for different sizes, density and doping. In the first chapter, we describe the interest of the InAs / InP system for optoelectronic applications. As a result we present the growth technique and some examples of applications of these quantum dots. In addition, we present a description of the emission process may exist in these structures. In the second chapter, we present the electrical characterization methodologies: the Deep Level Transient Spectroscopy (DLTS) and the C (V) measurement. In the third chapter, we study the quantum dots to achieve a qualitative and quantitative analysis of profiles N (W) samples. A study of the profile as a function of temperature gives an overview of the types of emission that dominate in our structures. The effect of heavy doping of the matrix layer and of density of dots is discussed. In the fourth chapter, a DLTS study of all samples shows several defects related to growth and interface quality. In addition, further study allows us to extract the s and p electronical state response of quantum dot.
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Scanning near-field infrared microspectroscopy on semiconductor structuresJacob, Rainer 29 June 2011 (has links) (PDF)
Near-field optical microscopy has attracted remarkable attention, as it is the only technique that allows the investigation of local optical properties with a resolution far below the diffraction limit. Especially, the scattering-type near-field optical microscopy allows the nondestructive examination of surfaces without restrictions to the applicable wavelengths. However, its usability is limited by the availability of appropriate light sources. In the context of this work, this limit was overcome by the development of a scattering-type near-field microscope that uses a widely tunable free-electron laser as primary light source.
In the theoretical part, it is shown that an optical near-field contrast can be expected when materials with different dielectric functions are combined. It is derived that these differences yield different scattering cross-sections for the coupled system of the probe and the sample. Those cross-sections define the strength of the near-field signal that can be measured for different materials. Hence, an optical contrast can be expected, when different scattering cross-sections are probed. This principle also applies to vertically stacked or even buried materials, as shown in this thesis experimentally for two sample systems.
In the first example, the different dielectric functions were obtained by locally changing the carrier concentration in silicon by the implantation of boron. It is shown that the concentration of free charge-carriers can be deduced from the near-field contrast between implanted and pure silicon. For this purpose, two different experimental approaches were used, a non-interferometric one by using variable wavelengths and an interferometric one with a fixed wavelength. As those techniques yield complementary information, they can be used to quantitatively determine the effective carrier concentration. Both approaches yield consistent results for the carrier concentration, which excellently agrees with predictions from literature.
While the structures of the first system were in the micrometer regime, the capability to probe buried nanostructures is demonstrated at a sample of indium arsenide quantum dots. Those dots are covered by a thick layer of gallium arsenide. For the first time ever, it is shown experimentally that transitions between electron states in single quantum dots can be investigated by near-field microscopy. By monitoring the near-field response of these quantum dots while scanning the wavelength of the incident light beam, it was possible to obtain characteristic near-field signatures of single dots. Near-field contrasts up to 30 % could be measured for resonant excitation of electrons in the conduction band of the indium arsenide dots. / Die optische Nahfeldmikroskopie hat viel Beachtung auf sich gezogen, da sie die einzige Technologie ist, welche die Untersuchung lokaler optischer Eigenschaften mit Auflösungen unterhalb der Beugungsgrenze ermöglicht. Speziell die streuende Nahfeldmikroskopie erlaubt die zerstörungsfreie Untersuchung von Oberflächen ohne Einschränkung der verwendbaren Wellenlängen. Die Nutzung ist jedoch durch das Vorhandensein entsprechender Lichtquellen beschränkt. Im Rahmen dieser Arbeit wurde diese Beschränkung durch Entwicklung eines streuenden Nahfeldmikroskops überwunden, das einen weit stimmbaren Freie-Elektronen-Laser als primäre Lichtquelle benutzt.
Im theoretischen Teil wird gezeigt, dass ein optischer Kontrast erwartet werden kann, wenn Materialien mit unterschiedlichen Dielektrizitätskonstanten kombiniert werden. Es wird hergeleitet, dass diese Unterschiede in unterschiedlichen Streuquerschnitten für das gekoppelte System aus Messkopf und Probe resultieren. Diese Streuquerschnitte definieren die Stärke des Nahfeldsignals, welches auf unterschiedlichen Materialien gemessen werden kann. Ein optischer Kontrast kann also erwartet werden, wenn unterschiedliche Streuquerschnitte untersucht werden. Dass dieses Prinzip auch auf übereinander geschichtete oder sogar verborgene Strukturen angewendet werden kann, wird in dieser Doktorarbeit an zwei Probensystemen experimentell gezeigt.
Im ersten Beispiel wurden die unterschiedlichen Dielektrizitätskonstanten durch örtliches Ändern der Ladungsträgerdichte in Silizium durch Bor-Implantation erreicht. Es wird gezeigt, dass die Dichte der freien Ladungsträger an Hand des optischen Kontrastes zwischen implantiertem und reinem Silizium ermittelt werden kann. Zu diesem Zweck wurden zwei unterschiedliche Ansätze verwendet, ein nicht-interferometrischer mittels variabler Wellenlängen und ein interferometrischer mit einer konstanten Wellenlänge. Weil diese Techniken gegensätzliche Informationen liefern, können sie genutzt werden, um die effektive Ladungsträgerdichte quantitativ zu bestimmen. Beide Ansätze lieferten konsistente Resultate für die Trägerdichte, welche sehr gut mit den Vorhersagen der Literatur übereinstimmt.
Während die Strukturen im ersten Beispiel im Mikrometer-Bereich lagen, wird die Möglichkeit, verborgene Nanostrukturen zu untersuchen, an Hand einer Probe mit Indiumarsenid Quantenpunkten demonstriert. Diese sind von einer dicken Schicht Galliumarsenid bedeckt. Zum ersten Mal wird experimentell gezeigt, dass Übergänge zwischen Elektronenzuständen in einzelnen Quantenpunkten mit Nahfeldmikroskopie untersucht werden können. Durch die Messung der Nahfeld-Antwort der Quantenpunkte unter Änderung der Wellenlänge des eingestrahlten Lichtes war es möglich, charakteristische Nahfeld-Signaturen der einzelnen Quantenpunkte zu erhalten. Nahfeld-Kontraste bis zu 30 Prozent konnten für die resonante Anregung der Elektronen im Leitungsband der Indiumarsenid Punkte beobachtet werden.
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Croissance, structure atomique et propriétés électroniques de couches minces de Bismuth sur InAs(100) et sur InAs(111) / Growth, atomic structure and electronic properties of thin films Bi on InAs(100) and on InAs(111).Djukic, Uros 11 December 2015 (has links)
L'émergence d'une une nouvelle classe de matériaux, des isolants topologiques, a stimulé un vaste champ de recherche. Bismuth, un élément du groupe V du tableau périodique, est un des ingrédients clé d'une famille d'isolants topologiques. Pour des applications dans la technologie des composants électroniques, il est essentiel de maîtriser la préparation des matériaux en couches minces. Dans ce travail de thèse, nous avons étudié la croissance et la structure électronique de bismuth sur les surfaces (100) et (111) de semi-conducteur III-V InAs.Déposition de Bi sur la surface InAs(100) résulte en une auto-organisation de Bi qui forme des lignes de taille atomique. On montre que le bismuth interagit extrêmement faiblement avec la surface car la structure d'origine de la surface propre de l'InA(100) reste intacte. L'étude de la bande valence montre la présence d'états résonants fortement dépendants de l'énergie de photons et de la polarisation de la lumière, en cohérence avec la structure quasi unidimensionnelle de la surface.La spécificité de la surface InAs(111) est qu'elle a deux terminaisons différentes: par In, (face A) et par As, (face B). Les deux faces présentent des reconstructions différentes. Par la photoémission des niveaux de coeur nous avons montré une différence de réactivité chimique entre les faces A et B. La croissance de Bi sur la face A résulte en un monocristal de haute qualité pour les films à partir de 10 monocouches. Par contre, lors du dépôt de premières couches, la face B montre une croissance en îlots et un bon monocristal est obtenu seulement pour des films d'au moins de 50 monocouches.Pour la même face, A ou B, nous avons observé des différences de croissance plus subtiles entre les surfaces préparées soit par le bombardement ionique et des recuits soit par l'épitaxie par jets moléculaires.La photoémission résolue en angle a permit de caractériser la dispersion des bandes dans les films de Bi. La dispersion est tout à fait comparable au cristal massif de Bi. La dernière étape consistait à étudier la structure électronique d'un monocristal de Sb déposé sur le film de Bi.Les surfaces propres de InAs(111)A et InAs(111)B présentent une courbure de bande qui résulte en formation d'une couche d'accumulation d'électrons. En déposant le Bi sur ces surfaces, la couche d'accumulation est préservée, elle est même amplifié, car Bi agit comme le donneur dans l'InAs.La couche d'accumulation se traduit par un confinement quantique des électrons, mesurable par la photoémission résolue en angle.Mots clés :Structure électronique de surface, ARPES, semimétal, courbure de bande, Gaz-2D, Bismuth, Sb, InAs(111)A, InAs(111)B, puits quantique, surface Fermi, couches minces. / A new class of material is coming up, Topological Insulators, have opened a wide field of research. Bismuth, an element of group V of periodic table, is one of the key ingredient of this Topological Insulators family. With the aim of improving technological applications, especially the electronic compounds, it is of most importance to control the preparation of thin films materials. Within this Phd work, we studied the growth and Bismuth electronic structure on (100) and (111) semiconductor III-V InAs surfaces.Bi deposition on InAs(100) surface result of a Bi self-assembly which forms lines at atomic scale. We show Bi interact extremely weakly with the surface because the beginning structure of clean InAs(100) surface stay unharmed. The study of valence band sheds light on the existence of resonant states strongly photon energy dependent and also depend on the light polarization, consistent with almost one dimensional structure surface.InAs(111) surface specific feature is that it has both surface ending different : In ending, (face A) and As ending, (face B). The both faces pointed out distinguishable reconstructions. By the core-level photoemission we identified a chemical reactivity difference taking place between A and B faces. Bi growth on A-face tend to be a high quality monocrystal for those films from a thickness of 10 monolayers. On the other hand, during the deposition of first layers, the B-face show an island growth and a good monocrystal is obtained only available for films with 50 monolayers at least.For the same face, A or B, we have seen some growth discrepancies more subtle between prepared surfaces either by ionic bombardment and annealing (IBA) either by molecular beam epitaxy (MBE).The angular resolved photoemission allowed to identify the band dispersion inside of this Bi films. The dispersion is absolutely relative to the bulk Bi crystal. The final step involved the study of Sb monocrystal electronic structure deposited onto Bi film.Clean InAs(111)A and InAs(111)B surfaces indicate a band bending which result in the accumulation electron charge formation. With depositing Bi onto these surfaces, the accumulation layer would be kept, it is also increased, given that Bi acts as a donor-like in InAs. The accumulation layer is characterized by an electron quantum confinement, measurable by angle resolved photoemission.Keywords:Electronic structure surface, ARPES, semimetal, band bending effect, 2DEG, Bismuth, Sb, InAs(111)A, InAs(111)B, quatum wells, Fermi surface, thin films.
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