New Generation Lithographic (NGL) techniques have been recently investigated in order to overcome the limitations of the long-used UV lithography. Several techniques have been proposed during the last decades, but the continued improvement of UV lithography rendered them useful only for a limited number of applications. More recently, nanoimprint lithography (NIL), invented in the nineties, has been considered as the new NGL due to its extreme simplicity and high resolution. Thermal NIL consists in the deformation of a thermoplastic under pressure and temperature by a nanostructured mold, while UV-NIL consists in the polymerization by UV light of a monomer at room temperature and under a lower pressure than Thermal NIL. One of the main problems of this technique is mold-polymer separation after the process. This problem is especially important for UV-NIL, because the working treatments for Thermal NIL degrade with UV light. In order to assess this problem, thin diamond-like amorphous carbon films (DLC) have been proposed as an alternative to existing treatments for their low chemical reactivity and the possibility to incorporate other chemical elements to further reduce their surface energy. Amorphous carbon exists in different forms, depending on how it is grown. Its mechanical properties range from polymer or graphite-like to almost as resistant as diamond. Besides the excellent mechanical properties of DLC (high hardness, elasticity and wear resistance, and low dry friction), amorphous carbon has also been found useful in applications requiring inert and/or biocompatible surfaces. The project DPI2007-61349 of the Science and Innovation Department of Spain, named “Amorphous carbon molds for micro and nanoimprint of polymeric surfaces”, aims to study the effect of the incorporation of different elements in DLC films for the improvement of NIL molds. This thesis has focused on a series of objectives of this project: - Design and construction of a very high vacuum reactor for deposition processes and ionic etch - Incorporation of fluorine to amorphous carbon films and subseqüent characterization by different surface, mechanical and tribological techniques, as well as spectroscopy for the characterization of the plasma used for the process. - Set up and optimization of a deep ion etch technique with ion beam for the production of molds. - The use of different lithographic techniques oriented to the production in large scale of nanometric patterns. - The exploration of mold coating to increase its durability and antisticking properties in nanoimprint processes. The incorporation of fluorine in DLC films has demonstrated to be useful in the improvement of the properties of NIL molds, because it avoids the use of the current surface treatments, which in addition to being less durable, can react with polymers in presence of UV light. In this thesis, the influence of fluorine incorporation in the films has been studied. Fluorinated amorphous carbon films have been deposited by pulsed-DC plasma enhanced chemical vapor deposition, by progressively replacing methane by trifluoromethane. The experimental device used for deposition has been designed and built to allow a number of multiple processes in the same reactor. The results of the study demonstrate the feasibility of this technique, of easy industrial implementation, for the deposition of this type of coatings. The characterization of both the active species in the plasma and the groups incorporated into the deposited films has helped to understand the process of fluorine incorporation, as well as the change in the surface properties that it entails. / La dificultad de extender el uso de la litografía de luz ultravioleta (UV) a los cada vez más estrictos requisitos de resolución, llevaron desde hace ya un par de décadas, a plantearse la necesidad de buscar técnicas litográficas llamadas de “Nueva Generación” (NGL) que las superasen. Son diversas las técnicas se han ido proponiendo durante estos años, pero la mejora de la litografía UV las ha ido relegando fuera del ámbito industrial. Más recientemente, la litografía por nanoestampación (NIL), ha tomado fuerza como la nueva NGL por su extrema sencillez y por su demostrada elevada resolución. La NIL térmica (T-NIL) consiste en la deformación de un termoplástico bajo presión y temperatura por un molde con estructuras nanométricas, mientras que la NIL por UV (UV-NIL) consiste en la polimerización de un monómero a temperatura ambiente con menor presión ejercida por un molde transparente al UV. Uno de los principales problemas de esta técnica es la separación de molde y polímero, una vez finalizado el proceso. Como alternativa a los tratamientos existentes, se han propuesto los recubrimientos de carbono amorfo tipo diamante (DLC) por su baja reactividad química, elevada dureza y posibilidad de incorporación de otros elementos químicos a fin de reducir su energía superficial. El proyecto del Ministerio de Ciencia e Innovación DPI2007-61349, “Moldes de carbono amorfo para micro y nanograbado de superficies poliméricas”, en el cuál se ha enmarcado esta tesis, pretende estudiar los efectos de la incorporación de diferentes elementos en capas de DLC para la mejora de los moldes de NIL. La incorporación de flúor en capas de DLC ha demostrado recientemente ser útil en la mejora de las propiedades de los moldes de NIL, porque evita el uso de los actuales tratamientos superficiales (por ejemplo siloxanos), los cuales, además de ser menos duraderos, pueden reaccionar con los polímeros en presencia de luz UV. Así, en esta tesis se ha estudiado la influencia de la incorporación de flúor a capas de DLC en la composición y en las propiedades de superfície obtenidas.

Diffractive zone-plate lenses are widely used as optics in high-resolution x-ray microscopes. The achievable resolution in such microscopes is presently not limited by the x-ray wavelength but by limitations in zone-plate nanofabrication. Thus, for the advance of high-resolution x-ray microscopy, progress in zone-plate nanofabrication methods are needed.   This Thesis describes the development of new nanofabrication processes for improved x-ray zone-plate optics. Cold development of the electron-beam resist ZEP7000 is applied to improve the resolution of soft x-ray Ni zone plates. The influence of developer temperature on resist contrast, resolution, and pattern quality is investigated. With an optimized process, Ni zone plates with outermost zone widths down to 13 nm are demonstrated. To enhance the diffraction efficiency of Ni zone plates, the concept of Ni-Ge zone plates is introduced. The applicability of Ni-Ge zone plates is first demonstrated in a proof-of-principle experiment, and then extended to cold-developed Ni zone plates with outermost zone widths down to 13 nm. For 15-nm Ni-Ge zone plates a diffraction efficiency of 4.3% at a wavelength of 2.88 nm is achieved, which is about twice the efficiency of state-of-the-art 15-nm Ni zone plates. To further increase both resolution and diffraction efficiency of soft x-ray zone plates, a novel fabrication process for W zone plates is developed. High resolution is provided by salty development of the inorganic electron-beam resist HSQ, and cryogenic RIE in a SF6 plasma is investigated for high-aspect-ratio W structuring. We demonstrate W zone plates with 12-nm outermost zone width and a W height of 90 nm, resulting in a 30% increase in theoretical diffraction efficiency compared to 13-nm efficiency-enhanced Ni-Ge zone plates. In addition to soft x-ray zone plates, some lenses for hard x-ray free-electron-laser applications were also fabricated during this Thesis work. Fabrication processes for the materials W, diamond, and Pt were developed. We demonstrate Pt and W-diamond zone plates with 100-nm outermost zone width and respective diffraction efficiencies of 8.2% and 14.5% at a photon energy of 8 keV. / QC 20111114

En microélectronique, l'augmentation de la densité des composants est la solution principale pour améliorer la performance des circuits. Ainsi, la taille des structures définies par la lithographie diminue à chaque changement de nœud technologique. A partir du nœud 14 nm, la lithographie optique est confrontée à la limite de résolution pour les niveaux métalliques. Pour surmonter cet obstacle, les niveaux métalliques sont conçus en deux étapes successives de patterning regroupant chacune une étape de lithographie et une étape de gravure. Cette technique, nommée double patterning, requiert une métrologie adaptée car l'alignement entre les deux étapes et les dimensions critiques sont alors directement liées. La méthode de mesure développée dans cette thèse repose sur la scattérométrie et la mesure de l'alignement par diffraction. Un code de simulation a permis d'optimiser la conception des mires de mesure. De plus, la méthode de mesure adoptée a pu être validée expérimentalement. / In microelectronics, the increase of component density is the main solution to improve circuit performance. The size of the patterns defined by lithography is reduced at each change of technology node. From the 14 nm node, optical lithography is facing the resolution limit for metal levels. In order to overcome this hurdle, metal levels are designed in two successive steps of patterning, which is composed of lithography followed by etching. This double patterning technique requires an appropriate metrology since overlay between the two steps and critical dimensions are directly linked. The developed method is based on scatterometry and overlay measurement by diffraction. Using a simulation code, the measurement targets have been designed optimally. Then the adopted method has been validated experimentally.

La lithographie électronique multifaisceaux (ou multi e-beam) en cours de développement est pressentie comme une alternative à la photolithographie 193 nm à immersion (193i nm) pour la production des circuits intégrés des noeuds technologiques avancés (14 nm et au-delà). Elle se présente également comme un concurrent potentiel à la photolithographie sous rayonnement EUV (13,5 nm) qui, elle aussi, est en cours de développement. Cependant, le développement de cette technologie doit faire face à plusieurs obstacles. Parmi eux, on a la contamination des optiques électroniques induite par le redépôt des molécules dégazées de la résine au cours de l‟exposition. Ces dépôts conduisent à la croissance d‟une couche carbonée en surface et à l‟intérieur des trous de ces optiques. Cette couche de contamination a tendance à diminuer la transmission des optiques et, par conséquent, diminuer les performances lithographiques de l‟outil (débit, uniformité des CD, rugosité, etc.). Il est donc indispensable de comprendre les mécanismes qui gouvernent le dégazage et la croissance de la couche de contamination afin d‟être en mesure de prédire son rôle sur les dérives des procédés et de l‟équipement. Tel a été l‟axe conducteur de ces travaux de thèse. Dans un premier temps, nous avons réalisé l‟état de l‟art des travaux déjà effectués dans le cas de la technique de lithographie EUV. Ensuite, nous avons conçu et fabriqué un banc de tests et développé, en parallèle, les méthodologies permettant de réaliser les études de dégazage des résines et de contamination induite sur des dispositifs simulateurs d‟optiques électroniques, appelés « mimics ». Puis, dans les conditions opératoires similaires à la plateforme Matrix développée par MAPPER Lithography, nous avons évalué le dégazage des résines de différentes formulations et mesuré la contamination induite par chacune de ces formulations sur les mimics à l‟aide du banc de tests développé. Enfin, nous avons proposé un modèle analytique permettant de prédire la croissance du film de contamination à l‟intérieur des trous du mimic en fonction des paramètres d‟exposition. / The development of multiple e-beam lithography equipment is foreseen as an alternative to the 193i nm immersion photolithography for the advanced technological node (less than 14 nm). This next generation lithography is a potential challenger to the EUV (13.5 nm) lithography which is also under development. However, this technology faces important challenges in controlling the contamination of the electron optics due to the adsorption of molecules outgassed from resist under exposure and the subsequent formation of a carbonaceous film on optics surface. This contamination layer can lead to the transmission loss of the optics and, consequently, degrade the tool lithographic performances (throughput, CD uniformity, Line Width Roughness, etc.). It is thus important to understand the resist outgassing and induced contamination mechanisms in order to predict their effect on the process drifts. That was the driver axis of these thesis works. Firstly, we performed the state of the art related to the works already published in the EUV lithography case. Secondly, we designed and built-up an experimental setup and developed, in parallel, the methods allowing to study the mechanisms of resist outgassing and induced contamination on electron optics simulators, called “mimic”. Thirdly, we assessed the outgassing of several resist formulations in the same operating conditions as in the Matrix platform developed by MAPPER Lithography. We also measured the induced contamination layer on the mimics for each resist formulation using the developed experimental setup. And finally, we proposed an analytical model that allows to predict the contamination film growth inside mimic holes during exposure.

Made available in DSpace on 2014-06-11T19:32:24Z (GMT). No. of bitstreams: 0 Previous issue date: 2009-02-27Bitstream added on 2014-06-13T20:43:29Z : No. of bitstreams: 1 ribeiro_ea_dr_assis.pdf: 2491911 bytes, checksum: 0aabf1551cbf9326812aef61b892f12d (MD5) / Esta tese procura refletir sobre a coleção Las Mujeres Españolas, Portuguesas y Americanas, publicação composta por três volumes de textos abordando espaços territoriais na Espanha, América e Portugal e por litografias – comercializadas em separado –, produzida no decorrer da década de 1870 na Espanha, e que fez uso da simbologia feminina para representar tais espaços. Essa obra constitui-se, ao mesmo tempo, em fonte e objeto desta pesquisa. Neste estudo, parte-se da hipótese de que essa coleção possui um sentido político e configura-se em produção material que constrói uma representação simbólica das características nacionais espanholas, elaborando um discurso sobre si, perceptível no conjunto de sua concepção, produção e composição. Foi produzida na segunda metade dos oitocentos, sob a raiz do movimento romântico e moldada pela estética costumbrista – gênero que se destacou por descrever tipos sociais, hábitos, costumes e tradições. Sobre a temática feminina, partiu-se do pressuposto de que imagens idealizadas de mulheres foram utilizadas para tocar os imaginários sociais pelo que representavam – amor, submissão, honra, fecundidade, educação, abnegação – e também como símbolos dos novos tipos sociais que surgiam em cena nos espaços nacionais que se configuravam perante as transformações européias. O hispanismo, discurso ideológico pautado nas experiências comuns e espírito espanhol, permeou toda a coleção, e este trabalho sustenta a hipótese de que não só referendou, mas construiu e disseminou esse ideário. Por fim, defendeu-se que tanto a linguagem textual como a iconográfica localizaram e salientaram elementos formadores das sociedades espanholas, revelando origens, tradição, peculiaridades e singularidades desses povos – sob o signo feminino – que remetiam à problemática do caráter nacional espanhol. / This proposition tries to disclose on the collection Las Mujeres Españolas, Portuguesas y Americanas, a publication composed by three tomes of texts which discuss the territorial spaces in Spain, America and Portugal and by lithographs - separately sold -, produced in Spain during the 1870 decade, using the feminine symbology to represent those spaces. This work consists of, at the same time, origin and object of this research. This treatise starts with the hypothesis that this collection has a political meaning and happens to have a material production which builds a symbolical representation of the Spanish national characteristics, elaborating a “self-speech” about itself, perceptible on the entirety of its conception, production and composition. It was introduced on the second half of the XVIII century, under the roots of the Romanticism and molded by the costumbrista esthetics – gender that distinguished itself by describing the social models, habits, uses and traditions. From the feminine themes, the treatise starts from the pretext that the use of idealized images of women were used to reach the social imaginary of what they represented – love, submission, honor, fecundity, education, self-denial – and also as symbols of the new social types that emerged in the national spaces that appeared in the face of the European transformations. The hispanism, ideological speech based on the common experiences and on the Spanish spirits, pierced all the collection, and this treatise supports the hypothesis that it not only countersigned, but built and spread this ideas. And, last but not least, defended that both textual language and iconography placed and emphasized the elements which built the Spanish societies, revealing origins, tradition, peculiarities and singularities of this people – under the feminine sign- that alluded to the a set of problems of the Spanish national character.

Ce travail présente l’étude d'une méthode de recherche utilisable en milieu industriel dessources de contamination chimique des pompes à vide équipant les lithographes EUV. Cetravail porte sur la problématique d’une éventuelle contamination carbonée introduite par lesystème de pompage et, notamment, par la turbine et le stator.A partir d’une caractérisation détaillée par chromatographie et spectroscopie dephotoémission de la contamination résiduelle issue du procédé de production, une procédured’analyse par spectrométrie de masse en phase gazeuse (RGA) utilisable en milieu industriel aété mise en oeuvre. En particulier, la possibilité de varier la température de l’échantillonpendant la mesure permet de caractériser la contamination carbonée résiduelle en étudiant lesprocédés physico-chimiques qui en sont à l’origine.Après avoir démontré l’efficacité du nettoyage final à éliminer les résidus des huiles de coupet avoir identifié la contamination organique résiduelle comme résidu du seul procédé denettoyage industriel, une copie « in vitro » de ce nettoyage a été développée : cela a permis demieux le caractériser en étudiant l’impact de plusieurs paramètres.L’influence de la concentration de lessive et de la procédure de séchage sur la contaminationcarbonée résiduelle a ainsi été étudiée. Une analyse de la contamination en phase gazeuse(RGA et TD-GCMS) ainsi qu’une caractérisation XPS de la surface des échantillons ont étéfaites. L’analyse de l’ensemble de ces résultats a permis d’établir un lien direct entre laconcentration de lessive utilisée et la contamination organique résiduelle. De plus,l’importance d’un séchage à haute température a été démontrée en mettant en évidence laprésence de plusieurs facteurs qui contribuent à la contamination résiduelle. / This work presents the study of a research method of the contamination sources of EUVLturbo molecular pumps, suitable for the industrial environment. This study deals with theproblem of a possible carbon contamination due to the pumping system and in particular tothe rotor and the stator.After a detailed characterisation of the production process residual contamination by TDGCMS/FID and XPS, a RGA procedure suitable for industrial environment has beendeveloped. The possibility to change the sample temperature during the measure lets tocharacterise the residual carbon contamination by investigating its primal physic-chemicalphenomena.The identification of the whole production process residual contamination demonstrates theefficacy of the industrial cleaning step to clean lubricants residuals. In order to bettercharacterise the cleaning step residual contamination, we developed an “in vitro” copy of theindustrial cleaning step.Thanks to the temperature variable RGA analysis of the residual contamination, we couldpoint out several contributions to carbon contamination and we could connect thesecontributions to different cleaning parameters.Detergent concentration as well as different drying procedure impact on residual carboncontamination has been studied. RGA and TD-GCMS/FID analysis as well as XPS surfacecharacterization have been performed. These analyses show a direct connection between thedetergent concentration used in the cleaning step and the residual carbon contamination.Furthermore, the importance of a high temperature drying step has been demonstrated.

Made available in DSpace on 2015-05-14T12:14:15Z (GMT). No. of bitstreams: 1 arquivototal.pdf: 9771925 bytes, checksum: 18e09223967768516f9115888a6485b4 (MD5) Previous issue date: 2013-02-01 / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior - CAPES / The ability to manipulate the adsorption process is very desirable. The possibility of understanding and eventually modifying the underlying mechanism is an intriguing task in fundamental physics as well as useful for applications. Indeed, the ability to control the adsorption processes is motivated by the control of thin film growth, by exploring ways to transfer patterns to a surfaces in development of microelectronics, as well as by constructing nanometer-scaled structures which are very important in the development of quantum devices. A first theoretical proposal (De Silans et al. 2006) has been done on controlling the adsorption of cold alkali atoms in dielectric surfaces using laser light. In 2007, Balykin and co-workers (Afanasiev et al. 2007) demonstrated laser-induced adsorption of hot atoms on a surface. They reported that sending a powerful near resonant laser to the interface between a dielectric surface and an alkali vapour leads to the formation of a metallic thin film, and demonstrated the possibility of using such a technique for sub-micrometer lithography. The aim of this work is to systematically study the process of laser induced hot atomic cesium vapor adsorption so as to understand the underlying mechanism as well as to control the process. We monitor the rate of a thin film growth during an induced adsorption process onto a characterized crystalline surface (sapphire) for a prescribed set of experimental conditions in order to be able to decipher, at the atomic level, the rules governing the evolution of the growth (physisorption or chemisorption), and to explore ways to tailor the film shape (lithography). To probe the film growth, we detect the transmission of a He:Ne laser, thus monitoring the time evolutionof the film's thickness. In this way we obtain the growth rate as a function of experimental parameters (vapour density, laser frequency and power and surface temperature). The data obtained we used to model the physical processes involved in the light-induced adsorption. / A compreensão do mecanismo de adsorção tem sua importância tanto do ponto de vista fundamental, no que concerne a identificação das interações átomo e superfície, como também tem um forte apelo tecnológico. Controlar o processo de adsorção é motivado, por exemplo, pelo controle do crescimento de filmes finos, explorando maneiras de transferir padrões espaciais para uma superfície particularmente visando á litografia, com aplicações evidentes em microeletrônica. Com essa motivação geral estudamos nessa tese processos de interação de átomos com superfícies dielétricas na presença de lasers ressonantes. Uma primeira proposta de um mecanismo para controlar, via laser, o processo de adsorção de átomos alcalinos frios em uma superfície dielétrica foi apresentado em (De Silans et al. 2006). Em 2007, Balykin e colaboradores (Afanasiev et al. 2007) observaram o processo de adsorção de átomos alcalinos de um vapor térmico sobre uma superfície dielétrica. Eles relataram que incidindo um laser quase ressonante na interface dielétrico vapor alcalino formava-se um filme fino metálico e demonstram também a possibilidade de usar tal técnica para litografia sub-micrométrica. O objetivo desse trabalho é estudar sistematicamente o processo de adsorção induzida por laser de vapor atômico de césio térmico em uma superfície dielétrica, para compreender o mecanismo do processo que abre a possibilidade do controle desse processo de litografia. Desta forma, nós monitoramos a taxa de crescimento do filme em uma superfície de safira para um conjunto de condições experimentais com a finalidade de ser capaz de decifrar, no nível atômico, as regras que governam o crescimento do filme, e explorar maneiras de manipular o perfil do filme. Para sondar o crescimento do filme, nós monitoramos a transmissão de um laser não ressonante. Desta maneira, obtemos a taxa de crescimento do filme em função dos parâmetros experimentais (densidade do vapor, frequência e potência do laser e a temperatura da superfície). Os dados obtidos foram usados para modelar o processo físico envolvido, que nos permite descrever de forma bastante completa, as etapas desse processo de adsorção induzida por laser. Além desse estudo sistemático da adsorção induzida por laser, fizemos durante o desenvolvimento desse trabalho uma série de estudos de técnicas para a estabilização de laser semicondutores em uma transição atômica.

Depuis la première observation du phénomène de Diffusion Raman Exaltée de Surface (DRES) en 1974 de nombreuses méthodes ont été développées pour contrôler l'arrangement de nanostructures métalliques sur une surface dans le but d'augmenter le signal de diffusion Raman. La valeur du facteur d'amplification de la DRES résulte principalement de l’accroissement localisé du champ électromagnétique pour des surfaces métalliques nanostructurées. Des études antérieures ont révélé que l'espacement nanométrique entre les nanoparticules constituait des zones de forte exaltation appelées «points chauds». Nous avons développé et breveté une méthode de lithographique assistée par AFM permettant la fabrication de surfaces métalliques. Il a été démontré que cette méthode fournissait une approche relativement simple pour réaliser d’une part des surfaces reproductibles à géométrie contrôlée à l’échelle nanométrique, et d’autre part des surfaces modèles pour étudier l'influence de la géométrie des motifs sur l'effet DRES. Afin d'étudier la relation entre les propriétés optiques et la géométrie de nos systèmes la résonance plasmon localisée de surface (LSPR) et le facteur d'exaltation du champ électrique local ont été simulés par éléments finis. Les zones de forte exaltations ont été localisées sur les nanostructures par microscopie par photoémission d'électrons (PEEM) et l'effet DRES a été démontré en effectuant des mesures Raman avec plusieurs molécules cibles. Les corrélations effectuées entre les résultats de PEEM, les calculs du champ local et les facteurs d’exaltation Raman seront présentées en lien avec les paramètres géométriques des motifs de nanostructures. / Since the first observation of Surface Enhanced Raman Scattering (SERS) in 1974 a variety of methods have been developed to physically control the arrangement of metallic nanostructures onto a surface in order to enhance Raman signals. The magnitude of the SERS enhancement factor is mainly driven by the enhanced local electromagnetic field in nanostructured metal surfaces. Gaps between adjacent nanoparticles give rise to strong enhancement effects, often referred as ‘hot spots’. One way to produce highly efficient SERS substrates is to develop a reproducible system of interacting metal nanostructures capable of high field enhancement.We patented a force-assisted Atomic Force Microscopy lithographic method allowing the fabrication of a metallic substrate. It will be shown that this method also provides a relatively simple approach to realize reproducible patterns with controlled geometry that can be used to study the influence of specific pattern geometry on SERS phenomenon.In order to investigate the relationship between optical properties and pattern geometries, localized surface plasmon resonance (LSPR) and local electric field enhancement are simulated.Whereas electric field enhancement regions (hot spot) have been observed on the top of the nanostructures with PhotoEmission Electron Microscopy (PEEM), SERS effect has been demonstrated by performing Raman measurements using several probe molecules. Correlations between PEEM measurements, Raman exaltation and local field calculations are presented in relation with the geometrical parameters of the nanostructured patterns.

Este estudo tem como principal objetivo pensar sobre como a construção das visualidades, materializadas nos rótulos de Cachaça litográficos do Paraná, refletem e refratam os acontecimentos históricos, as práticas culturais, as relações de trabalho, as transições tecnológicas e as constituições de estereótipos de gênero, ocorridos durante as décadas de 1930 a 1950. A estrutura do trabalho abrange três momentos: o primeiro relaciona-se ao mapeamento e ao inventário, e posterior catalogação do acervo da Casa da Memória; o segundo, ligado aos trabalhadores e às oficinas litográficas do Paraná, foi realizado a partir de pesquisas bibliográficas e entrevistas com envolvidos no processo litográfico; e o último, constitui-se da análise dos rótulos, orientadas a partir de uma abordagem teórica inspirada em Raymond Williams, Stuart Hall e Jesús Martín-Barbero. Como ferramenta de análise utiliza-se uma proposta semiótica de base peirceana. Os rótulos foram classificados em quatro temáticas: representações de gênero, natureza (paisagens rurais e animais), tecnologia e os tipográficos. Todos foram fichados e, a partir desse material, foram desenvolvidos os textos das análises. Alguns resultados obtidos foram: a inalteração das visualidades dos rótulos, apontando que as imagens compartilhadas pela sociedade têm um processo de transformação que nem sempre coincide com a transformação tecnológica; o processo de transição tecnológica alterou a divisão dos trabalhos nas oficinas; a influência dos meios de comunicação de massa (cinema, rádio e periódicos) nas representações elaboradas pelos litógrafos; e a capacidade dos rótulos em indicar interações, modificações e circulações das tecnologias na sociedade. / This study aims to think about the construction of the visualities, materialized in lithographic Cachaça labels, reflect and refract the historical events, cultural practices, labor relations, technological transitions, the normative gender stereotypes constitutions occurred during the 1930s to 1950s. The structure of the study is divided in three stages: one related to mapping, inventory and subsequent cataloging the material collected; the second on the workers and lithographic workshops of Paraná conducted from bibliographical research and interviews with involved in the lithographic process, and the latter, consists of the analysis of the labels, oriented from a theoretical approach inspired by Raymond Williams, Stuart Hall and Jesús Martín-Barbero. As an analysis tool is used a semiotic proposal of Peirce ́s background. The labels are divided into four themes: gender representations (female and male), nature (rural landscapes and animals), technology and typographic. All are blacklisted and, from this material, the texts of analysis are developed. Some results were: no changes of the visualities labels, pointing out that the images shared by society have a transformation process that does not always coincide with technological change; the technological transition process does not modify the division of work in the workshops; the influence of the mass media (cinema, radio and periodicals); and the ability of the labels to indicate interactions, modifications and circulations of technology in society.

Este estudo tem como principal objetivo pensar sobre como a construção das visualidades, materializadas nos rótulos de Cachaça litográficos do Paraná, refletem e refratam os acontecimentos históricos, as práticas culturais, as relações de trabalho, as transições tecnológicas e as constituições de estereótipos de gênero, ocorridos durante as décadas de 1930 a 1950. A estrutura do trabalho abrange três momentos: o primeiro relaciona-se ao mapeamento e ao inventário, e posterior catalogação do acervo da Casa da Memória; o segundo, ligado aos trabalhadores e às oficinas litográficas do Paraná, foi realizado a partir de pesquisas bibliográficas e entrevistas com envolvidos no processo litográfico; e o último, constitui-se da análise dos rótulos, orientadas a partir de uma abordagem teórica inspirada em Raymond Williams, Stuart Hall e Jesús Martín-Barbero. Como ferramenta de análise utiliza-se uma proposta semiótica de base peirceana. Os rótulos foram classificados em quatro temáticas: representações de gênero, natureza (paisagens rurais e animais), tecnologia e os tipográficos. Todos foram fichados e, a partir desse material, foram desenvolvidos os textos das análises. Alguns resultados obtidos foram: a inalteração das visualidades dos rótulos, apontando que as imagens compartilhadas pela sociedade têm um processo de transformação que nem sempre coincide com a transformação tecnológica; o processo de transição tecnológica alterou a divisão dos trabalhos nas oficinas; a influência dos meios de comunicação de massa (cinema, rádio e periódicos) nas representações elaboradas pelos litógrafos; e a capacidade dos rótulos em indicar interações, modificações e circulações das tecnologias na sociedade. / This study aims to think about the construction of the visualities, materialized in lithographic Cachaça labels, reflect and refract the historical events, cultural practices, labor relations, technological transitions, the normative gender stereotypes constitutions occurred during the 1930s to 1950s. The structure of the study is divided in three stages: one related to mapping, inventory and subsequent cataloging the material collected; the second on the workers and lithographic workshops of Paraná conducted from bibliographical research and interviews with involved in the lithographic process, and the latter, consists of the analysis of the labels, oriented from a theoretical approach inspired by Raymond Williams, Stuart Hall and Jesús Martín-Barbero. As an analysis tool is used a semiotic proposal of Peirce ́s background. The labels are divided into four themes: gender representations (female and male), nature (rural landscapes and animals), technology and typographic. All are blacklisted and, from this material, the texts of analysis are developed. Some results were: no changes of the visualities labels, pointing out that the images shared by society have a transformation process that does not always coincide with technological change; the technological transition process does not modify the division of work in the workshops; the influence of the mass media (cinema, radio and periodicals); and the ability of the labels to indicate interactions, modifications and circulations of technology in society.