No description available.

published_or_final_version / Electrical and Electronic Engineering / Doctoral / Doctor of Philosophy

No description available.

In this thesis the in-plane pattern distortion resulting from the use of Evanescent Near Field Optical Lithography (ENFOL) masks was investigated. ENFOL is a high resolution low-cost technique of lithography that is able to pattern features beyond the diffraction limit of light. Due to its use of the evanescent near field, ENFOL requires the use of conformable masks for intimate contact. Such masks can stretch and skew as they come into contact with silicon substrates and therefore distort the high resolution features patterned on them. It was desired to measure this distortion to ascertain the patterning performance of ENFOL masks and possibly correct for any uniform distortion found. To this end a sophisticated measuring process was successfully demonstrated. This involved the use of a Raith 150 Electron Beam Lithography (EBL) system with precision laser interferometer stage and metrology software module for automated measurements. Custom software was written for the Raith to enable it to take additional measurements to compensate for electron beam drift. Processing algorithms were then employed to using the measurements to compensate for beam drift and correcting for shift and rotation systematic errors. The performance of the in-plane distortion measuring process was found to have a precision of 60nm. With the ability to measure distortion, ENFOL masks were used to pattern substrates and distortion was found to be large, on the order of 1µm. This is much larger than desired for sub 100nm patterning as is expected of ENFOL. The distortions were non-uniform patterns of localised displacements. This, the observation of Newton's rings beneath a test mask and the observation of a single particle distortion across measurements of the same mask across different loadings in the EBL pointed to particulate contamination causing the distortion. In order to prove beyond doubt that particulate contamination was the cause of the spurious distortions, mechanical modelling using the Finite Element Method (FEM) of analysis was employed. The results from this matched the distortions observed experimentally, particles 20-40µm modelling the observed distortion.

Thesis (Ph. D.)--Indiana University, 1987. / Vita. Includes bibliographical references (leaves 128-139).

Thesis (M.A.)--University of Montana, 2007. / Title from title screen. Description based on contents viewed Aug. 16, 2007. Includes bibliographical references (p. 46-50).

In my thesis project, I aim to explore the ways in which we can perform parts of our identity by hiding the body through the use of performative disguises. These characters transgress the boundaries between societal norms and abject interactions. In these costumes, I hope to find whether or not the multiple facets of our identities can be distilled into one character--whether the self can be shifted into another character for a constructive narrative.

The purpose of this thesis is to indicate the use of the mask by Eugene O'Neill. It is probably possible to say that the mask has been used or implied in all of O'Neill's works, but this thesis will be confined to discussion of the works in which the mask or the implication of the mask is specifically evident.

No description available.

During the advancement of COVID-19, safety protocols (including facial masks) were incorporated into public settings. The Centers for Disease Control and Prevention (CDC), due to safety regulations, recommend wearing face masks when in close contact with other people in public environments, such as in a classroom, where social distancing is difficult. Understanding these CDC recommendations is still critical when looking for effective and safe alternative forms of masking for particular industries. Many industries smoothly transitioned to daily use of traditional cloth masks, but other industries (such as education) serving clients with high communicational needs and communication-centered services sought masking alternatives. This study examines related research to explore the question of whether wearing masks may have any impacts on student engagement, particularly with regards to Early Childhood Education (ECE) or in the Education of Students with Exceptionalities (ESE). Research found that masks have a significant impact on factors of engagement (i.e., physical, behavioral, intellectual, social, emotional; The Glossary of Education Reform, 2016) and suggests transparent masks paired with Remote Microphones as a viable alternative to traditional masking. Future recommendations are provided in hopes of impacting the use of face masks with young students for both safety and for engagement. Future research should focus on ECE or ESE classrooms using observable language and literacy acquisition skills and visual cues related to the Categories of Engagement defined by The Glossary of Education Reform (2016).