In this study, the design and fabrication of a monolithic InP-based 1550-nm photonic-crystal surfaceemitting laser (PCSEL) is reported. The device is composed by an InGaAsP multi-quantum well (MQW) active layer and InP photonic crystal (PhC) formed by metal organic chemical vapour deposition (MOCVD). A theoretical study based mainly on the Fourier modal method using Stanford Stratified Structure Solver (S 4) and finite element analysis using COMSOL Multiphysics was carried out in order to optimize the emission at 1550 nm due to the two-dimensional band-edge resonance effect at the Γ point.The device design and modeling, materials testing (annealing and MOCVD regrowth), process optimization and the fabrication of light emitting diodes (LEDs) based on the same structure as the PCSELs (without the PhC) is reported. The fabricated devices show a low series resistance of 8.19 Ω and a turn-on voltage of 0.84 V. The average differential output power is 41 mW/A with an electroluminescent peak at 1511 nm. The full assembly of the final PCSEL devices is beyond the scope of the present thesis and corresponds to an ongoing project expected to be finalized within the coming year. However, detailed guidelines and fabrication instructions, including the manufacturing of an appropriate lithographic mask set, are provided. / Föreliggande examensarbete rapporterar designen och tillverkningsprocessen för en monolitisk InPbaserad 1550-nm så kallad Photonic-Crystal Surface-Emitting Laser (PCSEL). Komponenten bestå r av en aktiv kvantbrunnsstruktur i InGaAsP och ett fotoniskt-kristall (PhC)-lager i InP, bägge odlade med hjälp av metalorganisk gasfasepitaxi (MOCVD). En teoretisk studie baserad på Fourier-modalmetoden med användning av Stanford Stratified Structure Solver (S4) och finit elementanalys-metoden med med hjälp av av COMSOL Multiphysics utfördes för att optimera emissionen vid 1550 nm genom en tvådimensionell bandkantsresonanseffekt vid Γ punkten.Rapporten går igenom komponentdesign och modellering, materialtestning (värmebehandling och MOCVDåterväxt), processoptimering och tillverkning av lysdioder (LED) baserade på samma struktur som PCSELkomponenterna (men utan PhC-strukturering). De tillverkade lysdioderna uppvisar en låg serieresistans på 8.19 Ω och en framspänning på 0.84 V. Den genomsnittliga differentiella utgångseffekten är 41 mW/A med en luminescenstopp vid 1511 nm. Den slutliga tillverkningen av färdiga PCSEL-enheter ligger utanför ramen för detta examensarbete och motsvarar istället ett pågående projekt som förväntas bli slutfört inom det kommande året. Däremot ges detaljerade riktlinjer och tillverkningsinstruktioner, för vilket ett fotolitografiskt mask-set även tagits fram.

No description available.

<p> The mechanisms operating during the metal-assisted growth of III-V nanowires (NWs) by molecular beam epitaxy on (1 1 l)B substrates were investigated through a series of experiments aimed at determining the influence of growth conditions on the morphology and crystal structure. Using GaAs as the principal material system for these studies, it is shown that a good control of these two characteristics can be achieved via a tight control of the temperature, V /III flux ratio, and Ga flux. Low and intermediate growth temperatures of 400°C and 500°C resulted in a strongly tapered morphology, with stacking faults occurring at an average rate of 0.1 nm^(-1). NWs with uniform diameter and the occurrence of crystal defects reduced by more than an order of magnitude were achieved at 600°C, a V /III flux ratio of 2.3, and a Ga impingement rate on the surface of 0.07 nm/s, and suggest the axial growth is group V limited. Increasing the flux ratio favored uniform sidewall growth, thus making the process suitable for the fabrication of core-shell structures. Further observation of steps on the sidewall surface of strongly tapered NWs suggests that radial growth of the shell proceeds in a layer-by-layer fashion, with the edge progressing in a step-flow mode toward the tip. </p> <p> From the experimental considerations, an analytical description of the growth is proposed, based on a simple material conservation model. Direct impingement of growth species on the particle, coupled to their diffusion from the sidewall and the substrate surface, are considered in the derivation of expressions for the time evolution of both axial and radial growths. Factors that take into account the nonunity probability of inclusion of group III adatoms in the axially growing crystal are introduced. Moreover, a step-mediated growth is included to describe the axial evolution of the shell. </p> / Thesis / Doctor of Philosophy (PhD)

<p>GaAs/GaP heterostructure nanowires (NWs) were grown on GaAs(111)B and Si(111) substrates by gold (Au) assisted vapor-liquid-solid (VLS) growth in a molecular beam epitaxy (MBE) system. NW morphology and crystal structure were characterized by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Early results indicated substantial differences in the length and crystal structure of the GaAs/GaP heterostructures. Efforts to remove these inhomogeneities required an improved Au VLS seed deposition method as well as a better understanding of VLS growth across GaAs/GaP hetero-interfaces.</p> <p>Experiments with GaAs/GaP heterostructures yielded the observation of changes in crystal phase in GaP, including the first reported occurrence of the 4H polytype. These observations revealed the presence of transient growth behavior during the formation of the GaAs to GaP hetero-interface that was unique to the VLS technique. Further characterization required the need to move from VLS seeds formed by annealing thin Au films to Au particles formed precisely by electron beam lithography (EBL). NW growth using EBL patterned Au seeds was discovered to be inhibited by the formation of a thin silicon oxide layer, formed at low temperatures by Au-enhanced silicon oxidation. Elimination of this layer immediately prior to growth resulted in successful patterned VLS growth.</p> <p>A systematic study of the transient GaP growth behavior was then conducted using patterned arrays to grow GaAs/GaP heterostructure NWs with frequent, periodic oscillations in the group V composition. These oscillations were measured by high angle annular dark field (HAADF) to determine the instantaneous growth rate of many NWs. A phenomenological model was fit to the data and transient growth rate behavior following a GaAs to GaP hetero-interface was understood on the basis of transient droplet compositions, which arise due to the large difference in As or P alloy concentrations required to reach the critical supersaturation.</p> / Doctor of Philosophy (PhD)

The techniques of optoperforation, spectral characterization of alloy disorder, and metal-enhanced fluorescence were applied to previously unconsidered or disregarded systems in order to demonstrate that such applications are both feasible and consequential. These applications were the subject of three disparate works and, as such, are independently discussed. Despite being ostensibly restricted to mammalian cells, optoperforation was demonstrated in intact plant cells by means of successful femtosecond-laser-mediated infiltration of a membrane impermeable dextran-conjugated dye into cells of vital Arabidopsis seedling stems. By monitoring the rate of dye uptake, and the reaction of both CFP-expressing vacuoles and nanocellulose substrates, the intensity and exposure time of the perforating laser were adjusted to values that both preserved cell vitality and permitted the laser-assisted uptake of the fluorophore. By using these calibrated laser parameters, dye was injected and later observed in targeted cells after 72 hours, all without deleteriously affecting the vital functions of those cells. In the context of alloy disorder, photoluminescence of excitonic transitions in two InAsxP1-x alloys were studied through temperature and magnetic field strength dependencies, as well as compositionally-dependent time-resolved behavior. The spectral shape, behavior of the linewidths at high magnetic fields, and the divergence of the peak positions from band gap behavior at low temperatures indicated that alloy disorder exists in the x=0.40 composition while showing no considerable presence in the x=0.13 composition. The time-resolved photoluminescence spectrum for both compositions feature a fast and slow decay, with the slow decay lifetime in x=0.40 being longer than that of x=0.13, which may be due to carrier migration between localized exciton states in x=0.40. In order to achieve broadband metal-enhanced fluorescence in upconverting NaYF4:Yb,Er nanocrystals, two nanocomposite architectures were proposed that retrofit metallic nanoshells to these lanthanide-doped nanocrystals. The typical monometallic construction was rejected in favor of architectures featuring Au-Ag bimetallic concentric surfaces, a decision supported by the considerable overlap of the calculated plasmon modes of the metallic structures with the emission and absorption spectrum of the nanocrystals. Furthermore, precursors of these nanocomposites were synthesized and photoluminescence measurements were carried out, ultimately verifying that these precursors produce the requisite upconversion emissions. / Ph. D.

This dissertation focuses on projects where optical techniques were employed to characterize novel materials, developing concepts toward next generation of devices. The materials that I studied included InAsP, InMnSb and InMnAs, and BT-BCN. I have employed several advanced time resolved and magneto-optical techniques to explore unexplored properties of these structures. The first class of the materials were the ternary alloys InAsP. The electron g-factor of InAsP can be tuned, even allowing for g=0, making InAsP an ideal candidate for quantum communication devices. Furthermore, InAsP shows promises for opto-electronics and spintronics, where the development of devices requires extensive knowledge of carrier and spin dynamics. Thus, I have performed time and polarization resolved pump-probe spectroscopy on InAsP with various compositions. The carrier and spin relaxation time in these structures were observed and demonstrated tunability to the excitation wavelengths, composition and temperature. The sensitivity to these parameters provide several avenues to control carrier and spin dynamics in InAsP alloys. The second project focused on the ferromagnetic narrow gap semiconductors InMnAs and InMnSb. The incorporation of Mn can lead to ferromagnetic behavior of InMnAs and InMnSb, and enhance the g-factors, making them ideal candidates for spintronics devices. When grown using Molecular Beam Epitaxy (MBE), the Curie temperature (textit{$T_c$}) of these structures is textless 100 K, however structures grown using Metalorganic Vapor phase Epitaxy (MOVPE) have textit{$T_c$} textgreater 300 K. Magnetic circular dichroism was performed on MOVPE grown InMnAs and InMnSb. Comparison of the experimental results with the theoretical calculations provides a direct method to map the band structure, including the temperature dependence of the spin-orbit split-off band to conduction band transition and g-factors, as well as the estimated sp-d electron/hole coupling parameters. My final project was on the lead-free ferroelectric BT-BCN. Ferroelectric materials are being investigated for high speed, density, nonvolatile and energy efficient memory devices; however, commercial ferroelectric memories typically contain lead, and use a destructive reading method. Reflectometry measurements were used in order to determine the refractive index of BT-BCN with varying thicknesses, which can provide a means to nondestructively read ferroelectric memory through optical methods. / Ph. D.

Le rendement consommation/fréquence des futures générations de circuits intégrés sur silicium n’est pas satisfaisant à cause de la faible mobilité électronique de ce semi-conducteur et des relativement grandes tensions d’alimentation VDD requises. Ce travail se propose d’explorer numériquement les potentialités des transistors à effet de champ (FET) à base de matériaux III-V à faible bande interdite et à haute mobilité pour un fonctionnement en haute fréquence et une ultra basse consommation. Tout d’abord, l’étude consiste à analyser théoriquement le fonctionnement d’une capacité MOS III-V en résolvant de façon auto-cohérente les équations de Poisson et Schrödinger (PS). On peut ainsi comprendre comment et pourquoi les effets extrinsèques comme les états de pièges à l’interface high-k/III-V dégradent les caractéristiques intrinsèques. Pour une géométrie 2D, les performances des dispositifs sont estimées pour des applications logiques et analogiques à l’aide d’un modèle de transport quasi-balistique.Nous avons ensuite étudié plus en détails les performances des MOSFET III-V en régimes statiques et dynamiques sous faible VDD, à l’aide du simulateur particulaire MONACO de type Monte Carlo. Les caractéristiques de quatre topologies de MOSFET ont été quantitativement étudiées, en termes de transport quasi-balistique, de courants statiques aux états passants et bloqués, de rendement fréquence/consommation et de bruit. Nous en tirons des conclusions sur l’optimisation de ces dispositifs. Enfin, l'étude comparative avec un FET à base de Si démontre clairement le potentiel des MOSFET III-V pour les applications à haute fréquence, à faible puissance de consommation et à faible bruit. / The optimal frequency performance/power-consumption trade-off is very difficult to achieve using CMOS technology because of low Si carrier mobility and relatively large supply voltage (VDD) required for circuit operation. The main objective of this work is to theoretically explore, in terms of operation frequency and power consumption, the potentialities of nano-MOSFET based on III-V materials with low energy bandgap and high electron mobility.First, this work analyzes theoretically the operation of a III-V MOS capacitor using self-consistent solution of Poisson - Schrödinger system equation. We can thus understand how and why the interface trap state densities at high-k/III-V interfaces degrade the intrinsic characteristics. For a 2D geometry, the performance of devices is estimated for digital and analog applications using a model of quasi-ballistic transport.Then, we estimated the performance of III-V MOSFET in static and dynamic regimes under low VDD, using MONACO a Monte Carlo simulator. The characteristics of four designs of III-V MOSFET have been studied quantitatively in terms of quasi-ballistic transport, DC current in ON and OFF states, frequency/consumption efficiency and optimum matching conditions of noise. We provide the guideline on the design optimization of the devices.Finally, the comparative study with Si-based devices clearly demonstrates the potentiality of III-V nano-MOSFET architectures for high-frequency and low-noise application under low operating power and even for low voltage logic.

Cette thèse est consacrée à l’étude de la dynamique et du transport des phonons via la résolution de l’équation de transport de Boltzmann (ETB) pour les Phonons. Un ‘solveur’ Monte Carlo dédié à la résolution de l’ETB des phonons dans l’espace réciproque, prenant en compte tous les processus d’interactions Normaux et Umklapp à trois-phonons, est proposé. Une prise en compte rigoureuse des lois de conservation de l’énergie et de la quantité de mouvement est entreprise. Des relations de dispersion réalistes, intégrant tous les modes de polarisations, sont considérées. Le calcul des taux d’interactions à trois-phonons de tous les processus Normaux et Umklapp est effectué en utilisant l’approche théorique due à Ridley qui ne nécessite qu’un unique paramètre semi-ajustable pour chaque mode de polarisation, nommément : le coefficient de couplage anharmonique représenté par les constantes de Grüneisen. Les taux d’interactions ainsi calculés ne servent pas uniquement à la résolution de l’ETB des phonons, mais ont permis aussi une analyse complète des canaux de relaxation des phonons longitudinaux optiques de centre de zone. Cette analyse a montré que le canal de Vallée-Bogani est négligeable dans le GaAs, et que vraisemblablement les temps de vie des phonons LO de centre de zone dans l’InAs et le GaSb rapportés dans la littérature sont fortement sous-estimés. Pour la première fois à notre connaissance, un couplage de deux solveurs Monte Carlo indépendants l’un dédié aux porteurs de charges (Thèse E. Tea) et l’autre dédié aux phonons, est effectué. Cela permet d’étudier l’effet des phonons chauds sur le transport des porteurs de charges. Cette étude a montré que l’approximation de temps de relaxation surestime souvent l’effet bottleneck des phonons. Le ‘solveur’ Monte Carlo est étendu pour résoudre l’ETB des phonons dans l’espace réel (en plus de l’espace réciproque), cela a permet d’étudier le transport des phonons et ainsi de la chaleur. La théorie généralisée de Ridley est toujours utilisée avec des particules de simulations qui interagissent les unes avec les autres directement. Les règles de conservation de l’énergie et de la quantité de mouvement sont rigoureusement respectées. L’effet des processus Umklapp sur la quantité de mouvement totale des phonons est fidèlement traduit; tout comme l’effet des interactions sur les directions des phonons, grâce à une procédure prenant en compte les directions vectorielles respectives lors d’une interaction, au lieu, de la distribution aléatoire usuellement utilisée. Les résultats préliminaires montrent la limite de l’équation analytique de conduction de la chaleur. / This work is dedicated to the study of phonon transport and dynamics via the solution of Boltzmann Transport Equation (BTE) for phonons. The Monte Carlo stochastic method is used to solve the phonon BTE. A solution scheme taking into account all the different individual types of Normal and Umklapp processes which respect energy and momentum conservation rules is presented. The use of the common relaxation time approximation is thus avoided. A generalized Ridley theoretical scheme is used instead to calculate three-phonon scattering rates, with the Grüneisen constant as the only adjustable parameter. A method for deriving adequate adjustable anharmonic coupling coefficients is presented. Polarization branches with real nonlinear dispersion relations for transverse or longitudinal optical and acoustic phonons are considered. Zone-center longitudinal optical (LO) phonon lifetimes are extracted from the MC simulations for GaAs, InP, InAs, and GaSb. Decay channels contributions to zone-center LO phonon lifetimes are investigated using the calculated scattering rates. Vallée-Bogani’s channel is found to have a negligible contribution in all studied materials, notably GaAs. A comparison of phonons behavior between the different materials indicates that the previously reported LO phonon lifetimes in InAs and GaSb were quite underestimated in the literature. For the first time, to our knowledge, a coupling of two independent Monte Carlo solvers, one for charge carriers [PhD manuscript, E. TEA], and one for phonons, is undertaken. Hot phonon effect on charge carrier dynamics is studied. It is shown that the relaxation time approximation overestimates the phonon bottleneck effect. The phonon MC solver is extended to solve the phonon’s BTE in real space simultaneously with the reciprocal space, to study phonon and heat transport. Ridley’s generalized theoretical scheme is utilized again with simulation particles interacting directly together. Energy and momentum conservation laws are rigorously implemented. Umklapp processes effect on the total phonon momentum is thoroughly reproduced, as for the anharmonic interactions effect on resulting phonon directions. This is thanks to a procedure taking in consideration the respective vector directions during an interaction, instead of the randomization procedure usually used in literature. Our preliminary results show the limit of the analytic macroscopic heat conduction equation.

Semiconductor quantum dots (QDs) are fascinating systems for potential applications in quantum information processing and communication, since they can emit single photons and polarisation entangled photons pairs on demand. The asymmetry and inhomogeneity of real QDs has driven the development of a universal and fine post-growth tuning technique. In parallel, new growth methods are desired to create QDs with high emission efficiency and to control combinations of closely-spaced QDs, so-called "QD molecules" (QDMs). These systems are crucial for the realisation of a scalable information processing device after a tuning of their interaction energies. In this work, GaAs/AlGaAs QDs with low surface densities, high optical quality and widely tuneable emission wavelength are demonstrated, by infilling nanoholes fabricated by droplet etching epitaxy with different GaAs amounts. A tuning over a spectral range exceeding 10 meV is obtained by inducing strain in the dot layer. These results allow a fine tuning of the QD emission to the rubidium absorption lines, increasing the yield of single photons that can be used as hybrid semiconductor-atomic-interface. By embedding InGaAs/GaAs QDs into diode-like nanomembranes integrated onto piezoelectric actuators, the first device allowing the QD emission properties to be engineered by large electroelastic fields is presented. The two external fields reshape the QD electronic properties and allow the universal recovery of the QD symmetry and the generation of entangled photons, featuring the highest degree of entanglement reported to date for QD-based photon sources. A method for controlling the lateral QDM formation over randomly distributed nanoholes, created by droplet etching epitaxy, is demonstrated by depositing a thin GaAs buffer over the nanoholes. The effect on the nanohole occupancy of the growth parameters, such as InAs amount, substrate temperature and arsenic overpressure, is investigated as well. The QD pairs show good optical quality and selective etching post-growth is used for a better characterisation of the system. For the first time, the active tuning of the hole tunnelling rates in vertically aligned InGaAs/GaAs QDM is demonstrated, by the simultaneous application of electric and strain fields, optimising the device concept developed for the single QDs. This result is relevant for the creation and control of entangled states in optically active QDs. The modification of the electronic properties of QDMs, obtained by the combination of the two external fields, may enable controlled quantum operations.

Les substrats Silicium-sur-Isolant (SOI) représentent la meilleure solution pour obtenir des dispositifs microélectroniques ayant de hautes performances. Des méthodes de caractérisation électrique sont nécessaires pour contrôler la qualité SOI avant la réalisation complète de transistors. La configuration classique utilisée pour les mesures du SOI est le pseudo-MOFSET. Dans cette thèse, nous nous concentrons sur l'amélioration des techniques autour du Ψ-MOFSET, pour la caractérisation des plaques SOI et III-V. Le protocole expérimental de mesures statiques ID-VG a été amélioré par l'utilisation d'un contact par le vide en face arrière, permettant ainsi d'augmenter la stabilité des mesures. De plus, il a été prouvé que ce contact est essentiel pour obtenir des valeurs correctes de capacité avec les méthodes split-CV et quasi-statique. L'extraction des valeurs de Dit avec split-CV a été explorée, et un model physique nous a permis de démontrer que ceci n'est pas possible pour des échantillons SOI typiquement utilisés, à cause de la constante de temps reliée à la formation du canal. Cette limitation a été résolue un effectuant des mesures de capacité quasi-statique (QSCV). La signature des Dit a été mise en évidence expérimentalement et expliquée physiquement. Dans le cas d'échantillons passivés, les mesures QSCV sont plus sensibles à l'interface silicium-BOX. Pour les échantillons non passivés, un grand pic dû à des défauts d'interface apparait pour des valeurs d'énergie bien identifiées et correspondant aux défauts à l'interface film de silicium-oxyde natif. Nous présentons des mesures de bruit à basses fréquences, ainsi qu'un model physique démontrant que le signal émerge de régions localisées autour des contacts source et drain. / Silicon-on-insulator (SOI) substrates represent the best solution to achieve high performance devices. Electrical characterization methods are required to monitor the material quality before full transistor fabrication. The classical configuration used for SOI measurements is the pseudo-MOSFET. In this thesis, we focused on the enrichment of techniques in Ψ-MOSFET for the characterization of bare SOI and III-V wafers. The experimental setup for static ID-VG was improved using a vacuum contact for the back gate, increasing the measurement stability. Furthermore, this contact proved to be critical for achieving correct capacitance values with split-CV and quasi-static techniques (QSCV). We addressed the possibility to extract Dit values from split-CV and we demonstrated by modeling that it is impossible in typical sized SOI samples because of the time constant associated to the channel formation. The limitation was solved performing QSCV measurements. Dit signature was experimentally evidenced and physically described. Several SOI structures (thick and ultra-thin silicon films and BOX) were characterized. In case of passivated samples, the QSCV is mostly sensitive to the silicon film-BOX interface. In non-passivated wafers, a large defect related peak appears at constant energy value, independently of the film thickness; it is associated to the native oxide present on the silicon surface. For low-frequency noise measurements, a physical model proved that the signal arises from localized regions surrounding the source and drain contacts.