This thesis aimed to investigate the relativistic magnetron (RM), which is a high-power microwave (HPM) source. Since the RM can generate high-intensity microwave radiation, it can be used as a pulsed electromagnetic weapon to target electronic systems in different objects, such as drones, missiles, or vehicles. Other applications include electromagnetic compatibility (EMC) testing. In this thesis, a novel design of an RM with a transparent cathode configuration was investigated. This RM, referred to as the FOI-magnetron, was developed with the goal of generating the more advantageous TE11 mode of microwaves. This thesis starts with an in-depth theoretical exploration of the physics surrounding the RM, followed by a proof-of-concept study, where we compare our simulation results against published data. We then investigate the FOI-magnetron to determine if the transparent cathode configuration is more favourable than a solid cathode configuration. Particle-in-cell (PIC) simulations in MAGIC3D were used to study the RM, and extensive parameter studies were conducted for the FOI-magnetron to optimise its performance. The simulations revealed that the FOI-magnetron suffered from leakage currents. Moreover, parameter studies of the FOI-magnetron with transparent cathode demonstrated favourable TE11-mode emission of microwaves with a peak output power reaching 590 MW after 15 ns, having a frequency of 2.56 GHz, and an efficiency of 37%. Comparisons between thetransparent and solid cathode for the FOI-magnetron showed a slightly lower output power and efficiency for the transparent cathode, with minimal difference in the rise time of microwaves. Additionally, the transparent cathode exhibits a higher overall impedance and leakage currents. On the other hand, a lower back-current density on the transparent cathode and emitter was shown, resulting in less damage to the material. In this study, we found that we could reduce leakage currents by extending the interaction region without impacting the performance of the FOI-magnetron. Also, the frequency was shown to change with either a shorter emitter or a longer interaction region, allowing for frequency control. Lastly, a modified design of an RM with a semitransparent cathode showed a promisingly high efficiency of 46% with an output power of 600 MW. This design utilised endcaps, which are useful for significantly reducing leakage currents

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The electrocatalytic nitrogen reduction reaction (NRR) is of considerable interest due to its potential for less energy intensive and environmentally friendly ammonia production which is critical for agricultural and clean energy applications. However, the selectivity of NRR compared to the hydrogen evolution reaction (HER) often poses challenges for various catalysts, including Earth-abundant transition metal oxynitrides like Ti, V, and Co. In this work, a comparative analysis of the selectivity of these three metal oxynitrides was conducted, each having different metal oxophilicities. A combination of electrochemical, surface characterizations and density functional theory (DFT) calculations were employed to directly assess NRR and HER activities under the same reaction conditions. Results show that cobalt oxynitrides exhibit NRR activity at pH 10, involving the electrochemical reduction of both lattice-bound nitrogen and dissolved N2, although more HER activity was observed. In contrast, vanadium oxynitride films displayed HER inactivity at pH 7 and 10 but demonstrated NRR activity at pH 7, while titanium oxynitrides were active at pH 3.2 but inactive under neutral and basic pH conditions. These comprehensive studies highlight substantial variations in HER and NRR selectivity based on transition metal oxophilicity/azaphilicity, indicating distinct mechanisms governing NRR and HER mechanisms.

The aim of this thesis is to develop a tribocatalytically active solid coating that exhibits strong wear resistance, while also inducing the formation of carbon-based tribofilms when used in a hydrocarbon environment. By using tribocatalytic MoN-Cu synthesized through combinatorial DC reactive magnetron co-sputtering, a gradient between MoN and Cu is deposited and used to determine an ideal Cu composition exhibiting high wear resistance and the formation of a carbon-based tribofilm. To determine the properties of the thin film, various characterization methods were used before and after wear tests from an Anton-Paar pin-on-disk tribometer in a decane or ethanol bath. XRD, SEM, and EDS determined the phase structures and compositions. Nanoindentations and optical profilometry found hardness, Young's modulus, and wear rates. Raman analysis saw carbon presence on the surface of the wear tracks, confirming the formation of carbon tribofilms. For the wear rates, it was found that each fuel had different reactions to the changing Cu at%. From the Raman data, carbon presence, wear rates, and Cu at% did not reveal a strong correlation between the three sets of information. Specifically for the ethanol tracks, the was a connection between a high carbon amount and lower wear rate. It was inconclusive if there was one Cu at% that afforded the most ideal conditions. The information found here has developed the knowledge of MoN-Cu as a solid protective coating, and for using combinatorial DC reactive magnetron co-sputtering as an aid for materials development.

La pulvérisation cathodique magnétron est un procédé plasma très répandu dans l'industrie pour le dépôt de couches minces. Néanmoins, les exigences des nouvelles applications nécessitent de mieux comprendre, contrôler et maîtriser les processus fondamentaux gouvernant le transport de la matière pour optimiser le procédé. Ce travail de thèse porte sur l'étude du transport des atomes pulvérisés de tungstène (W) en décharge magnétron continu (DC direct current) et pulsée haute puissance (HiPIMS_high power impulse magnétron sputtering). La fluorescence induite par diode laser (TD-LIF) a été mise au point afin de mesurer les fonctions de distribution en vitesse des atomes W pulvérisés. Les mesures ont été calibrées par absorption laser et validées en corrélant avec les vitesses de dépôt. En procédé DC, l'étude de l’influence des paramètres de la décharge (puissance, tension, mélange gazeux Ar/He, distance par rapport à la cible, etc.) a mis en évidence l'évolution spatiale des régimes de transport balistique (atomes énergétiques), diffusif (atomes thermalisés), et mixte (balistique+diffusif). Pour l'étude du procédé HiPIMS, le plasma pulsé a nécessité de développer la TD-LIF résolue en temps (TR-TDLIF). Le degré de liberté supplémentaire qu'offre la dimension temporelle du plasma HiPIMS a permis de mieux comprendre le transport mixte qui représente le cas le plus compliqué. En effet, cela a permis de mesurer la cinétique du transport des atomes pulvérisés en ayant la possibilité de séparer les temps caractéristiques des différents processus / Magnetron sputter deposition is an established and widely used method for the growth of thin films. Nevertheless, the high level of expectations regarding new applications require a better understanding, controlling, mastering of basic processes governing atoms transport in the view of process optimization. This work consist in the study of transport of sputtered W atoms in direct current and high power impulse magnetron discharges (DC and HiPIMS). A tunable diode laser induced fluorescence technique (TD-LIF) has been developed, in order to measure W sputtered atom velocity distribution function. Measurements were calibrated using laser absorption and were corroborated by deposition rate. In DC, the study of the influence of discharge parameters (power, voltage, Ar/He gas mixture, and distance from target, etc.) highlighted spatial evolution of different regimes of transport: ballistic (energetic atoms), diffusive (thermalized atoms), and mixed (ballistic + diffusive). In HiPIMS, pulsed plasma required to develop a time resolved TD-LIF technique (TR-TDLIF). The additional degree of freedom, given by time dimension allowed for a better understanding of mixed transport which represents the most complicated situation. This technique allowed to measure the kinetic of sputtered W atoms while at the same time providing the possibility to separate characteristic time scales of different processes

This thesis reports on the development of low-temperature processes for transition metal carbide and MAX-phase thin film growth. Magnetron sputtering and evaporation, far from thermodynamical equilibrium, have been utilised to engineer the properties of the films by physical and chemical control. Deposition of W, W2C and β-WC1-x films with controlled microstructure, from nanocrystalline to epitaxial, is shown in the W-C system down to 100 oC. W films with upto 20 at% C exhibited an extreme solid-solution hardening effect, with a nanoindentation hardness maximum of 35 GPa. Furthermore, the design of epitaxial ternary carbide films is demonstrated in the Ti1-xVxCy system in the form of controlled unit-cell parameters, strain-free films with a perfect match to the substrate, and ternary epitaxial gradient films. Moreover, phase stabilisation and pseudomorphic growth can be tuned in (Nb,Mo)C and (Ti,W)C films. The results obtained can be used for example to optimise electrical contacts in SiC high-power semiconductor devices. A large part of this thesis focuses on the deposition of MAX-phases. These compounds constitute a family of thermally stable nanolaminates with composition Mn+1AXn, n=1, 2 or 3, where M is an early transition metal, A is generally a group 13-14 element, and X is C or N. They show a combination of typical ceramic and metallic properties and are also machinable by virtue of the unique deformation behaviour observed only in laminates. So far, the MAX-phases have almost exclusively been prepared by high-temperature sintering and studied in bulk form. However, this thesis establishes a patented seed layer approach for successful MAX-phase thin film depositions down to 750 oC. For the first time, single-phase and epitaxial films of Ti3SiC2, Ti3AlC2 and Ti2AlC have been grown. The method has also been used to synthesise a new MAX-phase, Ti4SiC3. In addition, two previously unreported intergrown MAX-type structures are presented, Ti5Si2C3 and Ti7Si2C5. Combined theoretical and experimental results show the possibility to deposit films with very low bulk resistivity and designed mechanical properties. Furthermore, the demonstration of MAX-phase and carbide multilayer films paves the way for macrostructure engineering, for example, in coatings for low-friction or wear applications.

This Thesis concerns the development of fullerene-like (FL) carbon nitride (CNx) thin films and the discovery of phosphorus-carbide (CPx) compounds. The work dedicated to CPx include first-principles theoretical simulations of the growth and properties of FL-CPx structures. I have employed DC magnetron sputtering methods to synthesize both CNx and CPx thin films. The deposition conditions for CPx films were chosen on the basis of the theoretical results as well as from the experience from the deposition of FL-CNx thin films. The characterization of the CPx films is divided into three main directions: structural characterization by transmission electron microscopyand scanning electron microscopy, analysis of the amount of elements and chemical bonds presentin the structure by X-ray photoelectron spectroscopy and Auger spectroscopy, and mechanicalproperty analysis by nanoindentation. The CPx films exhibit a short range orderedstructure with FL characteristics for substrate temperature of 300 °C and for a phosphorus content of 10-15 at.%, which isconsistent with the theoretical findings. These films also displayed the best mechanical properties in terms of hardness and resiliency, which are better than those of the corresponding FL-CNx films. For the FL-CNx thin film material, I find that the surface water adsorption is lower compared to commercial computer hard disk top coatings. Following that line the dangling bonds in FL-CNx coatings have been investigated  by electron spin resonance (ESR). The absence of ESR signal for FL-CNx indicates very low density of dangling bonds in the material, which explains the low water adsorption tendency. The potential for using highly elastic FL-CNx coatings in an automotive valve-train environment has also been investigated. CNx coatings of different nitrogen content were investigated using microscopy, wear testing, nanoindentation testing, and in an experimental cam-tappet testing rig. The FL-CNx coating with the higher value of hardness/elastic modulus showed greater durability in cam-tappet wear testing.

Ag is a widely used electrical contact material due to its excellent electrical properties. The problems with Ag are that it is soft and has poor tribological properties (high friction and wear in Ag/Ag sliding contacts). For smart grid applications, friction and wear became increasingly important issues to be improved, due to much higher sliding frequency in the harsh operation environment. The aim of this thesis is to explore several different concepts to improve the properties of Ag electrical contacts for smart grid applications. Bulk Ag-X (X=Al, Sn In) alloys were synthesized by melting of metals. An important result was that the presence of a hcp phase in the alloys significantly reduced friction coefficients and wear rates compared to Ag. This was explained by a sliding-induced reorientation of easy-shearing planes in the hexagonal structure. The Ag-In system showed the best combination of properties for potential use in future contact applications.  This thesis has also demonstrated the strength of a combinatorial approach as a high-throughput method to rapidly screen Ag-based alloy coatings. It was also used for a rapid identification of optimal deposition parameters for reactive sputtering of a complex AgFeO2 oxide with narrow synthesis window. A new and rapid process was developed to grow low frictional AgI coatings and a novel designed microstructure of nanoporous Ag filled with AgI (n-porous Ag/AgI) using a solution chemical method was also explored. The AgI coatings exhibited low friction coefficient and acceptable contact resistance. However, under very harsh conditions, their lifetime is too short. The initial tribotests showed high friction coefficient of the n-porous Ag/AgI coating, indicating an issue regarding its mechanical integrity. The use of graphene as a solid lubricant in sliding electrical contacts was investigated as well. The results show that graphene is an excellent solid lubricant in Ag-based contacts. Furthermore, the lubricating effect was found to be dependent on chemical composition of the counter surface. As an alternative lubricant, graphene oxide is cheaper and easier to produce. Preliminary tests with graphene oxide showed a similar frictional behavior as graphene suggesting a potential use of this material as lubricant in Ag contacts.

Many physical properties, for example structural or magnetic, of a material are directly dependent on elemental composition. Tailoring of properties through highly accurate composition control is possible in thin films. This work exemplifies such tailoring. A short review is given of the current status for research in the area of permanent magnets, focusing on rare earth element free alternatives, where FeNi in the L10 phase is a possible candidate. Epitaxial FeNi L10 thin films were successfully synthesized by magnetron sputtering deposition of monoatomic layers of Fe and Ni on HF-etched Si(001) substrates with Cu or Cu100-xNix/Cu buffers. The in-plane lattice parameter aCuNi of the Cu100-xNix buffer layer was tuned by the Ni content. Through matching of aFeNi to aCuNi, the strain state (c/a)FeNi was controlled, where c is the out-of-plane lattice parameter. The 001 reflection indicative of chemical order, as measured by resonant x-ray diffraction, was in most cases split in two peaks due to a composition modulation of Fe and Ni. This chemical disorder contributed to that the uniaxial magnetocrystalline anisotropy energy, KU≈0.35 MJ/m3, was smaller than predicted. In later experiments the composition modulation could partly be compensated for. Remaining discrepancies with respect to predicted KU values were attributed to additional disorder induced by surface roughness of the buffer layer. The interface sharpness between Fe and Ni was explored by producing epitaxial symmetric multilayers with individual layer thicknesses n = 4-48 monolayers (ML). For n ≤ 8 ML the films had pure fcc structure, with antiferromagnetic Fe layers. For n ≥ 8 ML the Fe layers relaxed to bcc structure. A combinatorial sputter chamber, which has the capability to deposit samples with composition and thickness gradients, was assembled. A model for simulation of composition and thickness across large substrates, for the conditions in this chamber, is presented. The model is verified by comparison to experimental data. Some challenges inherent in combinatorial sputtering are discussed, and two experimental studies employing the technique are presented as examples. These investigated magnetic and structural properties of Tb-Co films, with 7-95 at.% Tb, and of amorphous and crystalline ternary gradient Co-Fe-Zr films, respectively.

This thesis describes the development of a fast rate method for the deposition of high quality CdS and CdTe thin films. The technique uses Pulsed DC Magnetron Sputtering (PDCMS). Surprisingly, the technique produces highly stable process conditions. CREST is the first laboratory worldwide to show that pulsed DC power may be used to deposit CdS and CdTe thin films. This is a very promising process technology with potential for eventual industrial deployment. The major advantage is that the process produces high deposition rates suitable for use in solar module manufacturing. These rates are over an order of magnitude faster than those obtained by RF sputtering. In common with other applications it has also been found that the energetics of the pulsed DC process produce excellent thin film properties and the power supply configuration avoids the need for complex matching circuits. Conventional deposition methodologies for CdS, Chemical Bath Deposition (CBD) and CdTe thin films, Electrodeposition (ED), have been chosen as baselines to compare film properties with Pulsed DC Magnetron Sputtering (PDCMS). One of the issues encountered with the deposition of CdS thin films (window layers) was the presence of pinholes. A Plasma cleaning process of FTO-coated glass prior to the deposition of the CdS/CdTe solar cell has been developed. It strongly modifies and activates the TCO surface, and improves the density and compactness of the deposited CdS thin film. This, in turn, improves the optical and morphological properties of the deposited CdS thin films, resulting in a higher refractive index. The pinhole removal and the increased density allows the use of a much thinner CdS layer, and this reduces absorption of blue spectrum photons and thereby increases the photocurrent and the efficiency of the thin film CdTe cell. Replacing the conventional magnetic stirrer with an ultrasonic probe in the chemical bath (sonoCBD) was found to result in CdS films with higher optical density, higher refractive index, pinhole and void-free, more compact and uniform along the surface and through the thickness of the deposited material. PDCMS at 150 kHz, 500 W, 2.5 μs, 2 s, results in a highly stable process with no plasma arcing. It allows close control of film thickness using time only. The CdS films exhibited a high level of texture in the <001> direction. The grain size was typically ~50 nm. Pinholes and voids could be avoided by reducing the working gas pressure using gas flows ii below 20 sccm. The deposition rate was measured to be 1.33 nm/s on a rotating substrate holder. The equivalent deposition rate for a static substrate is 8.66 nm/s, which is high and much faster than can be achieved using a chemical bath deposition or RF magnetron sputtering. The transmission of CdS can be improved by engineering the band gap of the CdS layer. It has been shown that by adding oxygen to the working gas pressure in an RF sputtering deposition process it is possible to deposit an oxygenated CdS (CdS:O) layer with an improved band gap. In this thesis, oxygenated CdS films for CdTe TF-PV applications have been successfully deposited by using pulsed DC magnetron sputtering. The process is highly stable using a pulse frequency of 150 kHz and a 2.5 μs pulse reverse time. No plasma arcing was detected. A range of CdS:O films were deposited by using O2 flows from 1 sccm to 10 sccm during the deposition process. The deposition rates achieved using pulsed DC magnetron sputtering with only 500 W of power to the magnetron target were in the range ~1.49 nm/s ~2.44 nm/s, depending on the oxygen flow rate used. The properties of CdS thin films deposited by pulsed DC magnetron sputtering and chemical bath deposition have been studied and compared. The pulsed DC magnetron sputtering process produced CdS thin films with the preferred hexagonal <001> oriented crystalline structure with a columnar grain growth, while sonoCBD deposited films were polycrystalline with a cubic structure and small grainy crystallites throughout the thickness of the films. Examination of the PDCMS deposited CdS films confirmed the increased grain size, increased density, and higher crystallinity compared to the sonoCBD CdS films. The deposition rate for CdS obtained using pulsed DC magnetron sputtering was 2.86 nm/s using only 500 W power on a six inch circular target compared to the much slower (0.027 nm/s) for the sonoChemical bath deposited layers. CdTe thin films were grown on CdS films prepared by sonoCBD and Pulsed DC magnetron sputtering. The results showed that the deposition technique used for the CdS layer affected the growth and properties of the CdTe film and also determined the deposition rate of CdTe, being 3 times faster on the sputtered CdS. PDCMS CdTe layers were deposited at ambient temperature, 500 W, 2.9 μs, 10 s, 150 kHz, with a thickness of approximately 2 μm on CdS/TEC10 coated glass. The layers appear iii uniform and smooth with a grain size less than 100 nm, highly compact with the morphology dominated by columnar grain growth. Stress analysis was performed on the CdTe layers deposited at room temperature using different gas flows. Magnetron sputtered thin films deposited under low gas pressure are often subject to compressive stress due to the high mobility of the atoms during the deposition process. A possible way to reduce the stress in the film is the post-deposition annealing treatment. As the lattice parameter increased; the stress in the film is relieved. Also, a changing the deposition substrate temperature had an effect on the microstructure of CdTe thin films. Increasing the deposition temperature increased the grain size, up to ~600 nm. CdTe thin films with low stress have been deposited on CdS/TEC10 coated glass by setting the deposition substrate temperature at ~200°C and using high argon flows ~ 70 sccm Ar. Finally, broadband multilayer ARCs using alternate high and low refractive index dielectric thin films have been developed to improve the light transmission into solar cell devices by reducing the reflection of the glass in the extended wavelength range utilised by thin-film CdTe devices. A four-layer multilayer stack has been designed and tested, which operates across the wavelength range used by thin-film CdTe PV devices (400 850 nm). Optical modelling predicts that the MAR coating reduces the WAR (400-850 nm) from the glass surface from 4.22% down to 1.22%. The application of the MAR coating on a thin-film CdTe solar cell increased the efficiency from 10.55% to 10.93% or by 0.38% in absolute terms. This is a useful 3.6% relative increase in efficiency. The increased light transmission leads to improvement of the short-circuit current density produced by the cell by 0.65 mA/cm2. The MAR sputtering process developed in this work is capable of scaling to an industrial level.