In this research, the contents are divided into two sections. In the first section, we investigated carrier transport behavior of organic optoelectronic devices by using space charge limited current(SCLC) method. Firstly, we fabricated a hole-only device (ITO/Spiro-MeOTAD/Al) for Sprio-MeOTAD and the current density¡V voltage(J-V) characteristics of the device was measured. The J-V characteristics of the device do not match with SCLCs very well at high voltage since the number of hole injection was not enough to achieve SCLCs condition. To enhance the injection of hole carrier into the organic layer, a MoO3 buffer layer was inserted between ITO electrode and organic layer. The current density in device with MoO3 buffer layer achieved 5 times enhancement, indicating that the concentration of hole in MoO3 device is increment. Hence, we succeeded in making the J-V characteristics of the hole-only device to match with SCLCs well at high voltage, and the hole mobility of Sprio-MeOTAD estimated by SCLCs was 1.44¡Ñ10-4cm2/Vs. Li salt was also doped into Sprio-MeOTAD as an n-type dopant. We found that Li salt could form hole-traps in Sprio-MeOTAD, which reduced hole carriers in Spiro-MeOTAD. The current density of the device was decreased, and the device could not achieve SCLCs condition at high voltage. In the second section, we use two novel iridium(Ir) complexes to fabricate blue-green emitting devices by solution process. First, we obtained optimum concentration of phosphorescent emitters by controlling of the dopants concentration. Then, we adjusted the thickness of the electron injection layer, hole injection layer, and emission layer to design more suitable device structure. Finally, we succeeded in fabricating blue-green light emitting devices. The maxima luminescence was 37.7cd/m2 and maxima current efficiency was 1.68 cd/A in the Ir complex based devices.

This thesis studied on the research of how conducting polymer polyaniline can be used in the buffer layer of organic solar cell. There are two methods used.¡]1¡^Using spin-coating to make film of polyaniline solution.¡]2¡^Polymerizing aniline on the substrate directly by electrochemical polymerization. The electrochemical method is separated into cyclic voltammetry and potentiostatic method respectively. The latter method which improved the disadvantage of infractable thick film and low electric conductivity of polyaniline for spin-coating is chosen as the preparation method for polyaniline films. We discuss of the photoelectric characteristics and surface morphologies of polyaniline film and to make a solar cell base on Poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester measured with AM 1.5G 100 mW/cm2 solar light simulation. This research combine above-mentioned results to use potentiostatic method to polymerize polyaniline on the PEDOT¡GPSS into a compound electrode and to replace currently popular ITO positive pole in a organic solar component. The structure is PEDOT¡GPSS/PANI/P3HT¡GPCBM/Al. By electroplating polyaniline, it can enhance the electric conductivity of the film of PEDOT¡GPSS from 1 S/cm to 154 S/cm, furthermore, to reach 1.06% of photoelectric conversion efficiency and creates a new possibility of preparing a flexible organic solar cell.

The aim of this thesis is to provide an in-depth investigation of zinc tin oxide, Zn1-xSnxOy or ZTO, grown by atomic layer deposition (ALD) as a buffer layer in Cu(In,Ga)Se2 (CIGS) solar cells. The thesis analyzes how changes in the ALD process influence the material properties of ZTO, and how these in turn affect the performance of CIGS solar cells. It is shown that ZTO grows uniformly and conformably on CIGS and that the interface between ZTO and CIGS is sharp with little or no interdiffusion between the layers. The band gap and conduction band energy level of ZTO are dependent both on the [Sn]/([Zn]+[Sn]) composition and on the deposition temperature. The influence by changes in composition is non-trivial, and the highest band gap and conduction band energy level are obtained at a [Sn]/([Zn]+[Sn]) composition of 0.2 at 120  °C. An increase in optical band gap is observed at decreasing deposition temperatures and is associated with quantum confinement effects caused by a decrease in crystallite size. The ability to change the conduction band energy level of ZTO enables the formation of suitable conduction band offsets between ZTO and CIGS with varying Ga-content. It is found that 15 nm thin ZTO buffer layers are sufficient to fabricate CIGS solar cells with conversion efficiencies up to 18.2 %. The JSC is in general 2 mA/cm2 higher, and the VOC 30 mV lower, for cells with the ZTO buffer layer as compared to cells with the traditional CdS buffer layer. In the end comparable efficiencies are obtained for the two different buffer layers. The gain in JSC for the ZTO buffer layer is associated with lower parasitic absorption in the UV-blue region of the solar spectrum and it is shown that the JSC can be increased further by making changes to the other layers in the traditional CdS/i-ZnO/ZnO:Al window layer structure. The ZTO is highly resistive, and it is found that the shunt preventing i-ZnO layer can be omitted, which further increases the JSC. Moreover, an additional increase in JSC is obtained by replacing the sputtered ZnO:Al front contact with In2O3 deposited by ALD. The large gain in JSC for the ZTO/In2O3 window layer stack compensates for the lower VOC related to the ZTO buffer layer, and it is demonstrated that the ZTO/In2O3 window layer structure yields 0.6 % (absolute) higher conversion efficiency than the CdS/i-ZnO/ZnO:Al window layer structure.

Die vorliegende Arbeit behandelt die Charakterisierung von epitaktischem Graphen auf Siliziumkarbid (0001) mittels Raman-Spektroskopie. Nach der Einführung theoretischer sowie experimenteller Grundlagen werden das Wachstum von Graphen auf Siliziumkarbid (SiC) behandelt und die untersuchten Materialsysteme vorgestellt. Es wird gezeigt, dass das Raman-Spektrum von epitaktischem Graphen auf SiC (0001) neben den Phononenmoden des Graphens und des Substrats weitere Signale beinhaltet, welche der intrinsischen Grenzflächenschicht, dem Buffer-Layer, zwischen Graphen und SiC zugeordnet werden können. Das Raman-Spektrum dieser Grenzflächenschicht kann als Abbild der phononischen Zustandsdichte interpretiert werden. Fortführend werden verspannungsinduzierte Änderungen der Phononenenergien der G- und 2D-Linie im Raman-Spektrum von Graphen untersucht. Dabei werden starke Variationen des Verspannungszustands beobachtet, welche mit der Topographie der SiC-Oberfläche korreliert werden können und erlauben, Rückschlüsse auf Wachstumsmechanismen zu ziehen. Die Entwicklung einer neuen Messmethode, bei der das Raman-Spektrum von Graphen durch das SiC-Substrat aufgenommen wird, ermöglicht die detektierte Raman-Intensität um über eine Größenordnung zu erhöhen. Damit wird die Raman-spektroskopische Charakterisierung eines Graphen-Feldeffekttransistors mit top gate ermöglicht und ein umfassendes Bild des Einflusses der Ladungsträgerkonzentration und der Verspannung auf die Positionen der G- und 2D-Raman-Linien von quasifreistehendem Graphen auf SiC erarbeitet.

Die vorliegende Arbeit behandelt die Charakterisierung von epitaktischem Graphen auf Siliziumkarbid (0001) mittels Raman-Spektroskopie. Nach der Einführung theoretischer sowie experimenteller Grundlagen werden das Wachstum von Graphen auf Siliziumkarbid (SiC) behandelt und die untersuchten Materialsysteme vorgestellt. Es wird gezeigt, dass das Raman-Spektrum von epitaktischem Graphen auf SiC (0001) neben den Phononenmoden des Graphens und des Substrats weitere Signale beinhaltet, welche der intrinsischen Grenzflächenschicht, dem Buffer-Layer, zwischen Graphen und SiC zugeordnet werden können. Das Raman-Spektrum dieser Grenzflächenschicht kann als Abbild der phononischen Zustandsdichte interpretiert werden. Fortführend werden verspannungsinduzierte Änderungen der Phononenenergien der G- und 2D-Linie im Raman-Spektrum von Graphen untersucht. Dabei werden starke Variationen des Verspannungszustands beobachtet, welche mit der Topographie der SiC-Oberfläche korreliert werden können und erlauben, Rückschlüsse auf Wachstumsmechanismen zu ziehen. Die Entwicklung einer neuen Messmethode, bei der das Raman-Spektrum von Graphen durch das SiC-Substrat aufgenommen wird, ermöglicht die detektierte Raman-Intensität um über eine Größenordnung zu erhöhen. Damit wird die Raman-spektroskopische Charakterisierung eines Graphen-Feldeffekttransistors mit top gate ermöglicht und ein umfassendes Bild des Einflusses der Ladungsträgerkonzentration und der Verspannung auf die Positionen der G- und 2D-Raman-Linien von quasifreistehendem Graphen auf SiC erarbeitet.

No description available.

Cette thèse porte sur l’optimisation d’un procédé de croissance, reproductible et contrôlé, d’une monocouche de graphène sur la face –Si du carbure de silicium (SiC (0001)) par sublimation sous faible pression d’argon (10 mbars). Au vue de la littérature, cette croissance à faible pression reste un challenge. Différentes techniques complémentaires telles que la spectroscopie Raman, la microscopie à force atomique, la microscopie à effet tunnel et des mesures d’effet Hall ont été menées afin de valider la croissance de la monocouche et d’en étudier sa morphologie de surface ainsi que ses propriétés structurales et électroniques. L’ensemble des résultats obtenus démontre le contrôle de la croissance d’une monocouche de graphène homogène, continue et de grande taille (6x6mm²). Plus de 50 échantillons monocouches ont été synthétisés pendant la thèse démontrant ainsi un procédé reproductible dans un bâti de croissance prototype de la société montpelliéraine Annealsys. Un mécanisme de croissance en bord de marche et la présence de marches et de terrasses a pu être mis en évidence alors que la littérature rapporte des difficultés à optimiser des procédés de croissance à basse pression d’argon. L’effet de la vitesse de montée en température a également été étudié dans le but de contrôler la morphologie du SiC de façon à pouvoir évaluer l’impact de la largeur des marches sur les propriétés électroniques du graphène. La largeur des marches obtenue (10 µm) permettront des mesures originales de transport, localisées sur une marche.Le procédé robuste et reproductible développé a permis différentes études approfondies sur ce graphène épitaxié. Sur la face-Si du SiC croît d’abord une couche tampon liée de manière covalente au SiC. Une deuxième couche tampon croît sous la première qui devient alors du graphène. Le peu de résultats présents dans la littérature nous a conduit à étudier cette couche d’interface entre le graphène et le SiC. A partir d’un nombre important de mesures par spectroscopie Raman, la signature de cette couche tampon a pu être obtenue. Un spectre Raman inhomogène de celle-ci a été mis en évidence. Pour aller plus loin, nous avons mis en œuvre deux techniques d’exfoliation du graphène pour avoir accès à la couche tampon sur SiC. Les signatures Raman des couches tampon couvertes ou non de graphène ont été analysées et comparées. Deux résultats majeurs sont à souligner : (i) l’aire du signal Raman de la couche tampon augmente après le retrait du graphène et (ii) deux pics fins sont observés seulement sur le spectre du graphène épitaxié. Ces résultats démontrent l’existence d’un couplage entre le graphène et la couche tampon.La dernière partie de ce travail de thèse concerne les propriétés électriques de ces monocouches de graphène sur SiC. Contrairement au classique dopage n du graphène épitaxié sur SiC (0001), un dopage résiduel de type p a été mesuré et attribué à un effet de l’environnement. Les impuretés chargées présentes à la surface des échantillons pourraient être à l’origine de flaques d’électrons et de trous (puddles) réparties à la surface des échantillons et responsables de leur dopage inhomogène. Ces fluctuations de potentiel ont été estimées en ajustant les données expérimentales à partir d‘un modèle mettant en jeu deux types de porteurs. De plus, nous avons pu mettre en évidence un changement de dopage d’un type p à n sous vide et sous illumination UV. La désorption d’absorbants chargés pourrait expliquer ce changement. Ces résultats démontrent une possible modulation des propriétés électriques de nos échantillons par un facteur externe tel que l’exposition aux UV. / This manuscript presents a work aiming to optimize a reproducible and controlled growth process of a monolayer graphene on Si-face of SiC (SiC (0001)) by sublimation under low argon pressure, i.e. 10 mbar. This low pressure process is challenging regarding the results in the literature. Various complementary techniques as optical microscopy, Raman spectroscopy, atomic force microscope, scanning tunneling microscope, and Hall Effect measurements have been performed on the samples in order to validate the monolayer graphene growth and investigate their surface morphology, their structural and electronic properties. All the results obtained from these measurements confirm the control of homogeneous, continuous and large-size (6×6 mm²) monolayer graphene from our optimized growth process. More than 50 monolayers graphene were produced during this thesis, validating a reproducible process in a prototype furnace developed by Annealsys, local company in Montpellier. The step-flow growth mode which encourages the formation of step-terrace surface structures is obtained under this unclassical growth condition contrary as established in the literature. Moreover, we have investigated the effect of the temperature ramp on the SiC morphology to evaluate the impact of the width of the terraces on electronic properties of graphene. Samples with terraces larger than 10 µm have been obtained allowing original transport measurements localized on only one terrace.Thanks to the reproducibility of our optimized growth process, further characterization studies on epitaxial graphene were investigated. The first carbon layer grown on SiC (0001) is a buffer layer covalently linked to SiC. Then a second buffer layer grows under the first one that becomes graphene. This well-known buffer layer at graphene / SiC (0001) interface has been investigated in this thesis to complete the poor literature on this topic. Statistically buffer Raman signatures have been obtained and compared to the literature demonstrating an inhomogeneous buffer layer. Furthermore, we have developed two graphene transfer techniques aiming to exfoliate graphene layer and leave behind only the buffer layer on the sample surface. The Raman signatures of buffer layer in these two cases (with or without graphene coverage) have been compared. We believe the evidenced evolution could be related to the coupling between graphene and buffer layer. Two major results illustrate this coupling: (i) the Raman signature of buffer layer increases in integrated intensity after the graphene transfer and (ii) two fines peaks are observed only in epitaxial graphene spectra and not in uncovered buffer layer spectra.The last part of this work concerns the electrical properties of monolayer graphene on SiC (0001). Contrary to the typical n-type doping of epitaxial graphene, the low p-type residual Hall concentration observed in our samples has been related to the atmospheric effect. More precisely, the charged impurities deposited on the sample surface could lead to the formation of electron-hole puddles, resulting in an inhomogeneous doping. The potential fluctuation has been estimated by fitting the experimental data using a model of two types of charges. Moreover, we have shown that the doping type change from p-type to n-type under vacuum condition or under UV illumination. This could be explained by desorption of the charged absorbents during the pumping or UV illumination. These results demonstrate the possibility of tuning the electrical properties of our samples by external factor such as UV light.

Une des solutions envisagée pour éviter la réactivité entre la cathode de LSCF et l'électrolyte de YSZ est l'intercalation d'une couche barrière de CGO. Une étude de la réactivité interfaciale par DRX et ToF-SIMS entre CGO, déposée par atomisation électrostatique, et YSZ a montré qu'un traitement thermique au-dessus de 1100 C sous air induit une détérioration de la couche de CGO par la formation d'une solution solide. Le vieillissement du système LSCF/CGO/YSZ a été étudié en fonction de l'épaisseur de la couche de CGO de 0,11 à 2 µm, par spectroscopie d'impédance complexe, à 700 °C sous air à l'abandon. Les mesures ont montré que l'épaisseur de cette couche est un facteur influençant les propriétés électriques des différents systèmes. L'introduction d'une couche mince de CGO, déposée par pulvérisation cathodique, a conduit à une diminution de la résistance série du système ainsi qu'une diminution de la dégradation de l'électrode LSCF. La dégradation de l'électrode de LSCF est liée à la ségrégation du Sr au niveau de l'interface LSCF/YSZ. / One of the considered solutions to avoid the reactivity between LSCF cathode and YSZ electrolyte is the intercalation of a CGO buffer layer. A study of the interfacial reactivity by XRD and by ToF-SIMS between CGO, by ESD, and YSZ has shown that an heat treatment above 1100 °C in air leads to the chemical degradation of the CGO layer leads to the formation of a solid solution. An ageing investigation of LSCF/CGO/YSZ half cell was performed for different CGO layer thicknesses coated by DC magnetron sputtering from 0.11 to 2 µm, by electrochemical impedance spectroscopy at 700 °C in air at OCV. EIS measurements have shown that the thickness of this coating has a strong effect on the electrical properties of these systems. The introduction of a thin CGO buffer layer has lead to the decrease of the initial value of the series resistance and to the reduction of the LSCF electrode degradation. This degradation electrode is due to the diffusion of Sr at the LSCF/YSZ interface as shown by microanalyses X.

Devices with ZnCdS/ZnS heterojunction partner layer have shown better blue photon response due to higher band gap of these compounds as compared to devices with CdS heterojunction partner layer. CdS heterojunction partner layer has shown high photovoltaic conversion efficiencies with CIGS absorber layer while efficiencies are lower with CuIn1-xGaxS2 (CIGS2). A negative conduction band offset has been observed for CdS/CIGS2 as compared to near flat conduction band alignment in case of CdS/CIGS devices, which results in higher interface dominated recombination. Moreover, it has been predicted that optimum band offsets for higher efficiency solar cells may be achieved for cells with alternative heterojunction partner such as ZnS. With varying ratio of Zn/ (Zn+Cd) in ZnxCd1-xS a range of bandgap energies can be obtained and thus an optimum band offset can be engineered. For reducing interface dominated recombination better lattice match between absorber and heterojunction partners is desirable. Although CdS has better lattice match with CuIn1-xGaxS2 absorber layer, same is not true for CuIn1-xGaxS2 absorber layers. Utilizing ZnxCd1-xS as heterojunction partner provides a range of lattice constant (between aZnS= ~5.4 Ǻ and aCdS= ~5.7 Ǻ) depending on Zn/(Zn+Cd). Therefore better lattice match can be obtained between heterojunction partner and absorber layer. Better lattice match will lead to lower interface dominated recombination, hence higher open circuit voltages. In the present study chemical bath deposition parameters are near optimized for high efficiency CIGS2 Solar cells. Effect of various chemical bath deposition parameters on device performance was studied and attempts were made to optimize the deposition parameters in order to improve the device performance.In/(In+Ga) ratio in absorber layer is varied to obtain good lattice match and optimum band alignment. Solar cells with conversion efficiencies comparable to conventional CdS/CIGS2 has been obtained with ZnxCd1-xS /CIGS2. High short current as well as higher open circuit voltages were obtained with ZnxCd1-xS as alternative heterojunction partner for CIGS2 solar cells as compared to SLG/Mo/CIGS2/ CdS / i-ZnO/ZnO:Al.

CdS is conventionally used as a buffer layer in Cu(In,Ga)Se2, CIGS, solar cells. The aim of this thesis is to substitute CdS with cadmium-free, more transparent and environmentally benign alternative buffer layers and to analyze how the material properties of alternative layers affect the solar cell performance. The alternative buffer layers have been deposited using Atomic Layer Deposition, ALD. A theoretical explanation for the success of CdS is that its conduction band, Ec, forms a small positive offset with that of CIGS. In one of the studies in this thesis the theory is tested experimentally by changing both the Ec position of the CIGS and of Zn(O,S) buffer layers through changing their gallium and sulfur contents respectively. Surprisingly, the top performing solar cells for all gallium contents have Zn(O,S) buffer layers with the same sulfur content and properties in spite of predicted unfavorable Ec offsets. An explanation is proposed based on observed non-homogenous composition in the buffer layer. This thesis also shows that the solar cell performance is strongly related to the resistivity of alternative buffer layers made of (Zn,Mg)O. A tentative explanation is that a high resistivity reduces the influence of shunt paths at the buffer layer/absorber interface. For devices in operation however, it seems beneficial to induce persistent photoconductivity, by light soaking, which can reduce the effective Ec barrier at the interface and thereby improve the fill factor of the solar cells. Zn-Sn-O is introduced as a new buffer layer in this thesis. The initial studies show that solar cells with Zn-Sn-O buffer layers have comparable performance to the CdS reference devices. While an intrinsic ZnO layer is required for a high reproducibility and performance of solar cells with CdS buffer layers it is shown in this thesis that it can be thinned if Zn(O,S) or omitted if (Zn,Mg)O buffer layers are used instead. As a result, a top conversion efficiency of 18.1 % was achieved with an (Zn,Mg)O buffer layer, a record for a cadmium and sulfur free CIGS solar cell. / Felaktigt tryckt som Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology 717