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Complex photonic structures in nature : from order to disorderOnelli, Olimpia Domitilla January 2018 (has links)
Structural colours arise from the interaction of visible light with nano-structured materials. The occurrence of such structures in nature has been known for over a century, but it is only in the last few decades that the study of natural photonic structures has fully matured due to the advances in imagining techniques and computational modelling. Even though a plethora of different colour-producing architectures in a variety of species has been investigated, a few significant questions are still open: how do these structures develop in living organisms? Does disorder play a functional role in biological photonics? If so, is it possible to say that the optical response of natural disordered photonics has been optimised under evolutionary pressure? And, finally, can we exploit the well-adapted photonic design principles that we observe in Nature to fabricate functional materials with optimised scattering response? In my thesis I try to answer the questions above: I microscopically investigate $\textit{in vivo}$ the growth of a cuticular multilayer, one of the most common colour-producing strategies in nature, in the green beetles $\textit{Gastrophysa viridula}$ showing how the interplay between different materials varies during the various life stages of the beetles; I further investigate two types of disordered photonic structures and their biological role, the random array of spherical air inclusions in the eggshells of the honeyguide $\textit{Prodotiscus regulus}$, a species under unique evolutionary pressure to produce blue eggs, and the anisotropic chitinous network of fibres in the white beetle $\textit{Cyphochilus}$, the whitest low-refractive index material; finally, inspired by these natural designs, I fabricate and study light transport in biocompatible highly-scattering materials.
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Estudo de titanatos nanoestruturados obtidos por tratamento hidrot?rmico de ?xido de tit?nio em meio alcalino / Studies on nanostructured titanates obtained by alkali hydrothermal treatment of titanium oxideMorgado J?nior, Edisson 24 August 2007 (has links)
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Previous issue date: 2007-08-24 / TiTanate NanoTubes (TTNT) were synthesized by hydrothermal alkali treatment of TiO2 anatase followed by repeated washings with distinct degrees of proton exchange. TTNT samples with different sodium contents were characterized, as synthesized and after heattreatment (200-800?C), by X-ray diffraction, scanning and transmission electron microscopy, electron diffraction, thermal analysis, nitrogen adsorption and spectroscopic techniques like FTIR and UV-Vis diffuse reflectance. It was demonstrated that TTNTs consist of trititanate structure with general formula NaxH2−xTi3O7?nH2O, retaining interlayer water in its multiwalled structure. The removal of sodium reduces the amount of water and contracts the interlayer space leading, combined with other factors, to increased specific surface area and mesopore volume. TTNTs are mesoporous materials with two main contributions: pores smaller than 10 nm due to the inner volume of nanotubes and larger pores within 5-60 nm attributed to the interparticles space. Chemical composition and crystal structure of TTNTs do not depend on the average crystal size of the precursor TiO2-anatase, but this parameter affects significantly the morphology and textural properties of the nanostructured product. Such dependence has been rationalized using a dissolution-recrystallization mechanism, which takes into account the dissolution rate of the starting anatase and its influence on the relative rates of growth and curving of intermediate nanosheets. The thermal stability of TTNT is defined by the sodium content and in a lower extent by the crystallinity of the starting anatase. It has been demonstrated that after losing interlayer water within the range 100-200?C, TTNT transforms, at least partially, into an intermediate hexatitanate NaxH2−xTi6O13 still retaining the nanotubular morphology. Further thermal transformation of the nanostructured tri- and hexatitanates occurs at higher or lower temperature and follows different routes depending on the sodium content in the structure. At high sodium load (water washed samples) they sinter and grow towards bigger crystals of Na2Ti3O7 and Na2Ti6O13 in the form of rods and ribbons. In contrast, protonated TTNTs evolve to nanotubes of TiO2(B), which easily convert to anatase nanorods above 400?C. Besides hydroxyls and Lewis acidity typical of titanium oxides, TTNTs show a small contribution of protonic acidity capable of coordinating with pyridine at 150?C, which is lost after calcination and conversion into anatase. The isoeletric point of TTNTs was measured within the range 2.5-4.0, indicating behavior of a weak acid. Despite displaying semiconductor characteristics exhibiting typical
absorption in the UV-Vis spectrum with estimated bandgap energy slightly higher than that of its TiO2 precursor, TTNTs showed very low performance in the photocatalytic degradation of cationic and anionic dyes. It was concluded that the basic reason resides in its layered titanate structure, which in comparison with the TiO2 form would be more prone to the so undesired electron-hole pair recombination, thus inhibiting the photooxidation reactions. After calcination of the protonated TTNT into anatase nanorods, the photocatalytic activity improved but not to the same level as that exhibited by its precursor anatase / Titanatos nanoestruturados, particularmente TiTanatos NanoTubulares (TTNT), foram sintetizados por tratamento hidrot?rmico alcalino de TiO2-anat?sio seguido de repetidas lavagens com diversos graus de troca prot?nica. Amostras de TTNT com diferentes teores de s?dio foram caracterizadas na forma de p? seco e ap?s calcina??o (200-800?C) por difra??o de raios-X, microscopia eletr?nica de varredura e transmiss?o, difra??o de el?trons, an?lise t?rmica, adsor??o de nitrog?nio e t?cnicas espectrosc?picas de infravermelho e de reflet?ncia
difusa no UV-Vis?vel. Demonstrou-se que tais materiais de paredes multilamelares s?o trititanatos de f?rmula geral NaxH2−xTi3O7?nH2O, retendo ?gua entre as lamelas. A remo??o de s?dio da estrutura reduz a quantidade de ?gua contraindo o espa?o interlamelar levando, combinado a outros fatores, ao aumento da ?rea e do volume de poros espec?ficos. Os TTNTs s?o materiais mesoporosos com duas contribui??es principais: poros menores que 10 nm devido ao volume interno dos nanotubos e poros entre 5 e 60 nm devido aos espa?os interpart?cula. A composi??o qu?mica e a estrutura cristalina do TTNT n?o dependem do tamanho de cristalito do TiO2-anat?sio precursor, todavia este par?metro afeta significativamente a morfologia e as caracter?sticas texturais do produto nanoestruturado. Tal depend?ncia foi racionalizada atrav?s de um mecanismo de dissolu??o-recristaliza??o que leva em conta a velocidade de dissolu??o do TiO2 de partida e sua influ?ncia sobre a taxa de crescimento de nanofolhas intermedi?rias em rela??o ? taxa de seu curvamento a nanotubos. A estabilidade t?rmica do TTNT ? definida pelo teor de s?dio e em pequena extens?o pelo tipo de anat?sio de partida. Foi demonstrado que o TTNT ap?s perder a ?gua intercalada entre 100 e 200?C se transforma pelo menos parcialmente num hexatitanato NaxH2−xTi6O13 intermedi?rio ainda nanotubular. A transforma??o t?rmica do tri- e hexatitanato nanoestruturados ocorre em maior ou menor temperatura e segue diferentes rotas dependendo do teor de s?dio. No caso de alto s?dio sinterizam e crescem at? grandes cristais de Na2Ti3O7 e Na2Ti6O13 na forma de bast?es e fitas acima de 600?C. No caso da amostra protonizada evoluem para nanotubos de TiO2(B) que facilmente se convertem em nanobast?es de anat?sio acima de 400?C. Al?m de hidroxilas e acidez de Lewis t?picos dos ?xidos de tit?nio, os TTNTs apresentam uma pequena contribui??o de acidez prot?nica capaz de se coordenar com a piridina a 150?C, e que ? perdida ap?s sua calcina??o e transforma??o ? anat?sio. O ponto isoel?trico do TTNT variou dentro da faixa 2,5- 4,0, indicando o comportamento de um ?cido fraco. Apesar de se revelar um semicondutor exibindo banda de absor??o t?pica no espectro de UV-vis?vel com energia de bandgap ligeiramente superior ao do respectivo TiO2-anat?sio precursor, os TTNTs apresentaram baixo desempenho fotocatal?tico na degrada??o de corantes cati?nico e ani?nico. Concluiu-se que a causa fundamental reside em sua estrutura de titanato lamelar que, em rela??o ? forma TiO2, apresentaria maior probabilidade de recombina??o do par el?tron-lacuna (e-/h+), inibindo as rea??es de fotoxida??o. A transforma??o do TTNT prot?nico ? nanobast?es de anat?sio melhorou a atividade fotocatal?tica, por?m ainda sem atingir o mesmo desempenho do TiO2-anat?sio precursor
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Atomic Layer Deposition onto Fibers / Atomlagenabscheidung auf FasernRoy, Amit Kumar 19 March 2012 (has links) (PDF)
The main goal of this dissertation was to show that the principle of atomic layer deposition (ALD) can be applied to “endless” fibers. A reactor of atomic layer deposition has been designed, especially for coating depositions onto meter long bundles of fibers. Aluminum oxide (alumina), titanium oxide (titania), double layers of alumina and titania, as well as aluminium phosphate have been deposited onto bundles of carbon fibers using the home-built reactor. Scanning electron microscopic (SEM) and transmission electron microscopic (TEM) images indicate that the coatings were uniform and conformal onto fiber surface. There was a good adhesion of the coatings to the fibers.
Alumina has been deposited using two separate aluminum sources (aluminum trichloride and trimethylaluminum), and water as a source of oxygen. In case of alumina deposition using aluminum trichloride and water, initial deposition temperature was 500 °C. In these conditions, a part of the fiber bundle has been damaged. Thus, the deposition temperature was decreased to 300 °C and the fibers were unaffected. In addition, during this process hydrochloric acid is formed as a byproduct which is a corrosive substance and affects the reactor and there was a chloride impurity in the coatings. Thus, aluminum trichloride precursor was replaced by trimethylalumium.
Alumina deposition onto carbon fibers using trimethylaluminum and water was carried out at a temperature of 77 °C. SEM images revealed that the fibers were unaffected and the coatings were uniform and conformal. Oxidation resistance of the carbon fibers was improved slightly after alumina deposition. Oxidation onset temperature of the uncoated fibers was about 630 °C. The resistance was linearly increased with the coating thickness (up to 660 °C) and getting saturated over a thickness of 120 nm. Titania coatings have been deposited using titanium tetrachloride and water. The physical appearances of the titania coatings were similar to the alumina coatings. The oxidation onset temperature of the titania coated carbon fibers was similar to the uncoated fibers but the rate of oxidation was decreased than the uncoated fibers. Two double layer coatings were deposited, alumina followed by titania (alumina/titania), and titania followed by alumina (titania/alumina). If the fibers were coated with the double layer of alumina/titania, they had almost same oxidation onset as alumina coated fibers but the rate of oxidation was decreased significantly compared to alumina coated fibers. This feature is independent of the thickness of the titania layers, at least in the regime investigated (50 nm alumina followed by 13 nm and 40 nm titania). On the other hand, the oxidation onset temperature of fibers coated with titania/alumina (20 nm titania /30 nm alumina) was approximately 750 °C. The fibers were burned completely when temperature was further increased to 900 °C and held another 60 minutes at 900 °C. This is significantly better than any other coating used in this dissertation.
ALD of titania and alumina in principle was known beforehand, this dissertation here applies this knowledge for the first time to endless fibers. Furthermore, this dissertation shows for the first time that one can deposit aluminum phosphate via ALD (planar surface as well as fibers). Aluminum phosphate might be special interest in the fiber coating because it is a rather soft material and thus might be used to obtain a weak coupling between fiber and matrix in composites. Aluminum phosphate was deposited using trimethylaluminum and triethylphosphate as precursors. Energy dispersive X-ray spectroscopy and solid state nuclear magnetic resonance spectra confirmed that the coating comprises aluminum phosphate (orthophosphate as well as other stoichiometries). Scanning electron microscopic images revealed that coatings are uniform and conformal. In cases of alumina and titania, it was observed that the coatings were delaminated from the ends of cut fibers and thus formed of clear steps. On the other hand, for aluminum phosphate coating it was observed that the border between coating and underlying fiber often being smeared out and thus formed an irregular line. It seems in case aluminum phosphate cohesion is weaker than adhesion, thus it might be act a weak interface between fiber and matrix. Alumina, titania, and double layer microtubes have been obtained after selective removal of the underlying carbon fibers. The carbon fibers were selectively removed via thermal oxidation in air at temperatures exceeding 550 °C. SEM and TEM images indicate that the inner side of the tube wall has the same morphology like the fibers. In addition, it was observed that the individual microtubes were separated from their neighbors and they had almost uniform wall thicknesses. The longest tubes had a length of 30 cm. / Das Hauptziel dieser Dissertation bestand darin nachzuweisen, dass die Atomlagenabscheidung (engl. atomic layer deposition (ALD)) auf „endlose“ Fasern angewendet werden kann. Es wurde ein Reaktor zur Atomlagenabscheidung gestaltet, der speziell für die Beschichtung meterlanger Faserbündel geeignet ist. Aluminiumoxid, Titanoxid, Doppelschichten aus Aluminiumoxid und Titanoxid sowie Aluminiumphosphat wurden mit Hilfe des selbstgebauten Reaktors auf Kohlefaserbündel abgeschieden. Rasterelektronenmikroskopische (REM) und transmissionselektronenmikroskopische (TEM) Aufnahmen zeigten, dass die Beschichtung auf den Fasern einheitlich und oberflächentreu war. Des Weiteren wurde eine gute Adhäsion zwischen Beschichtung und Fasern beobachtet. Das Prinzip der Beschichtung mit Titanoxid und Aluminiumoxid mit Hilfe der ALD war bereits vorher bekannt und im Rahmen dieser Dissertation jedoch erstmals auf "endlose" Fasern angewendet. Des Weiteren wird in dieser Dissertation erstmals gezeigt, dass es möglich ist, Aluminiumphosphat mittels ALD abzuscheiden (sowohl auf planaren Oberflächen als auch auf Fasern). Aluminiumphosphat könnte von besonderem Interesse in der Faserbeschichtung sein, da es ein relativ weiches Material ist und könnte daher als eine Art „schwacher“ Verbindung zwischen Faser und Matrix in Kompositen dienen. Die Oxidationsbeständigkeit von beschichten Kohlefasern wurde im Vergleich zu unbeschichteten Fasern bis zu einem gewissen Grad erhöht. Monoschichten von Aluminiumoxid und Titanoxid waren dafür wenig effektiv. Aluminiumphosphatbeschichtete Fasern waren deutlich besser geeignet als die beiden anderen. Eine Doppelschicht aus Titanoxid gefolgt von Aluminiumoxid verbesserte die Oxidationsbeständigkeit nochmals deutlich gegenüber allen anderen Beschichtungen, die in dieser Dissertation verwendet wurden. Mikroröhren aus Aluminiumoxid, Titanoxid und Doppelschichten wurden durch die selektive Entfernung der zugrunde liegenden Kohlefasern erhalten. Einzelne Mikroröhren waren von benachbarten Röhren getrennt und sie weisen eine nahezu einheitliche Wanddicke auf.
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Laponite-supported titania photocatalystsDaniel, Lisa Maree January 2007 (has links)
This thesis describes the synthesis and characterisation of titania photocatalysts for incorporation into a polyethylene film. Monodisperse, anatase-phase titania nanoparticles are prepared and the synthesis conditions necessary for attraction to a laponite clay support are determined. Methods of preventing agglomeration of the laponite system such as the use of a polyethylene oxide surfactant or chemical modification of the laponite plate edges with a dimethyloctyl methoxysilane are also explored. Finally, photocatalytic studies on the laponite-supported titania nanoparticles are performed, and the compatibility and photoactivity of these materials in the polyethylene film are examined.
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Facile and Process Compatible Growth of High-k Gate Dielectric Materials (TiO2, ZrO2 and HfO2) on Si and the Investigation of these Oxides and their Interfaces by Deep Level Transient SpectroscopyKumar, Arvind January 2016 (has links) (PDF)
The continuous downscaling has enforced the device size and oxide thickness to few nanometers. After serving for several decades as an excellent gate oxide layer in complementary metal oxide semiconductor (CMOS) devices, the thickness of SiO2 layer has reached to its theoretical limits. Ultra-thin films of SiO2 can result in severe leakage currents due to direct tunneling as well as maintaining the homogeneity of the layers becomes an additional challenge. The use of a high- (HK) layer can solve these twin concerns of the semiconductor industry, which can also enhance the capacitance due to superior dielectric permittivity and reduce the leakage current by being thicker than the silicon dioxide. This thesis is concerned about the development of solution route fabricated high-k (TiO2, ZrO2 and HfO2) gate dielectrics and the investigation of high-/silicon interfaces by highly sensitive DLTS technique in MOS structures. The solution processing reduce the industrial fabrication cost and the DLTS method has the advantage to accurately measure the interface related defects parameters; such as interface trap density (Dit), capture cross-section (), activation energy (ET) and also distinguish between bulk and interface traps.
In this thesis, HK films have been deposited by solution route, the material and electrical properties of the film and the HK/Si interface have been extensively evaluated.
IN CHAPTER 1, we have summarized the history and evolution of transistor and it provides the background for the work presented in this thesis.
IN CHAPTER 2, we have described the experimental method /technique used for the fabrication and characterization. The advantages and working principals of spin-coating and DLTS techniques are summarized.
IN CHAPTER 3, we have presented the preparation and optimization of TiO2 based HK layer. Structural, surface morphology, optical electrical and dielectric properties are discussed in details. A high- 34 value is achieved for the 36 nm TiO2 films.
IN CHAPTER 4, we presented the technologically relevant Si/TiO2 interface study by DLTS technique. The DLTS analysis reveals a small capture cross-section of the interface with acceptable interface state density.
IN CHAPTER 5, we have focused on the fabrication of amorphous ZrO2 films on p-Si substrate. The advantage of amorphous dielectric layer is summarized as first dielectric reported SiO2 is used in its amorphous phase. The moderate-15 with low leakage current density is achieved.
IN CHAPTER 6, the HfO2 films are prepared using hafnium isopropoxide and a high value of dielectric constant 23 is optimized with low leakage current density. The current conduction mechanisms are discussed in details.
IN CHAPTER 7, we have probed the oxygen vacancy related sub-band-gap states in HfO2 by DLTS technique.
IN CHAPTER 8, we have presented the summary of the dissertation and the prospect research directions are suggested.
In summary, we have studied the group IVB transition metal elemental oxides (TMEO); TiO2, ZrO2 and HfO2 thin films in the MOS structure, as a possible replacement of SiO2 gate dielectric. For the TMEO films deposition a low-cost and simple method spin-coating was utilized. The film thicknesses are in the range of 35 – 39 nm, which was measured by ellipsometry and confirmed with the cross-sectional SEM. A rough surface of gate dielectric layer can trap the charge carrier and may cause the Fermi level pinning, which can cause the threshold voltage instabilities. Hence, surface roughness of oxide layer play an important role in CMOS device operation. We have achieved quite good flat surfaces (RMS surface roughness’s are 0.2 – 2.43 nm) for the films deposited in this work. The TiO2 based MOS gate stack shows an optimized high dielectric constant ( 34) with low leakage current density (3.710-7 A.cm-2 at 1 V). A moderate dielectric constant ( 15) with low leakage current density (4.710-9 A.cm-2 at 1 V) has been observed for the amorphous ZrO2 thin films. While, HfO2 based MOS gate stack shows reasonably high dielectric constant ( 23) with low leakage current density (1.410-8 A.cm-2 at 1 V). We have investigated the dominating current conduction mechanism and found that the current is mainly governed by space charge limited conduction (SCLC) mechanism for the high bias voltages, while low and intermediate bias voltages show the (Poole – Frenkel) PF and (Fowler – Nordheim) FN tunneling, respectively. For the HfO2 MOS device band alignment is drawn from the UPS and J-V measurements. The band gap and electron affinity of HfO2 films are estimated 5.9 eV and 3 eV, respectively, which gives a reasonable conduction band offset (1.05 eV) with respect to Si.
A TMEO film suffers from a large number of intrinsic defects, which are mostly oxygen vacancies. These defects can create deep levels below the conduction band of high- dielectric material, which can act like a hole and electron traps. In addition to that, interface between Si and high- is an additional concern. These defect states in the band gap of high- or at the Si/ high- interface might lead to the threshold voltage shifts, lower carrier mobility in transistor channel, Fermi level pinning and various other reliability issues. Hence, we also studied bulk and interfacial defects present in the high- films on Si and their interface with Si by a very sensitive DLTS technique. The capture cross-sections are measured by insufficient filling DLTS (IF – DLTS). The defects present at the interface are Si dandling bond and defect in the bulk are mostly oxygen vacancies related defects present in various charge states. The interface states (Dit) are in the range of 2×1011 to 9×1011 eV-1cm-2, which are higher than the Al/SiO2/Si MOS devices (Dit in Al/SiO2/Si is the benchmark and in the order of 1010 eV-1cm-2). Still this is an acceptable value for Si/high-k (non-native oxide) MOS devices and consistent with other deposition methods. The capture cross-sections are found to be quite low in the order of 10-18 to 10-19 cm2, which indicate a minor impact on the device operation. The small value of capture cross-sections are attributed to the involvement of tunneling, to and from the bulk traps to the interface.
In conclusion, the low cost solution processed high- thin films obtained are of high quality and find their importance as a potential dielectric layer. DLTS study will be helpful to reveal various interesting facts observed in high- such as resistive switching, magnetism and leakage current problems mediated by oxygen vacancy related defects
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Design and performance of sulfur-resistant palladium-supported catalysts for methane oxidation using conventional and nanotechnological tools of preparationMelaet, Gérôme 16 December 2011 (has links)
Ce travail se concentre sur le développement de systèmes catalytiques capable d’oxyder complètement le méthane à basse température. Le sujet principal concerne la conception d'une nouvelle génération de catalyseurs à base de palladium qui sont résistants aux composés soufrés et à l'eau.<p>Notre objectif a été atteint grâce à l'utilisation d'un support oxyde mixte produit par sol-gel. En effet, nos catalyseurs de palladium supporté sur un oxyde de silicium dopé au titane se sont révélés être résistants à l’empoisonnement au soufre et présentent des performances élevées pour la conversion du méthane.<p>En variant les quantités de TiO2, il a été montré que les performances atteignent un maximum pour une composition en masse de 10% TiO2. Les analyses structurelles et de surface ont montré que nos supports mixtes contiennent des liens Ti-O-Si. Nous pensons que ces liens sont responsables de l’activité accrue du catalyseur.<p>Par ailleurs, les catalyseurs contenant du titane présentent une tolérance supérieure vis-à-vis du SO2 lorsque celui-ci est ajouté aux réactifs ou que le catalyseur est exposé à une atmosphère de SO2 pur à 350°C pendant 15 heures. Nous avons mis en évidence par XPS que les sites Ti-O-Si sont également responsables de cette tolérance aux composés soufrés. Ceci est accompli par l'insertion du SO2 dans le support qui forme des liens soit Ti-O-SOx•••Si soit Si-O-SOx•••Ti. L’analyse XPS a également montré que sur le long terme, l’exposition au SO2 conduit à la formation d’une couche de PdSO4 de 18 à 20 Å. Étonnamment, les catalyseurs sont capables de récupérer entièrement leur activité initiale après ce traitement. Cette régénération se produit grâce à un mécanisme concerté avec le méthane permettant la décomposition totale du PdSO4. Par ailleurs, des études en présence d'eau ont montré que ces propriétés restent inchangées.<p>L'état du palladium a également été étudié et nous a permis de prouver qu’une activation/stabilisation du catalyseur est nécessaire. Celle-ci est réalisée en présence des réactifs par de légères modifications chimiques du support et de la phase de palladium. En effet, l'augmentation de l'activité du catalyseur a été corrélée avec une augmentation des quantités de Ti3+ et Pd0. La présence de palladium métallique dans le catalyseur semble être l'élément clé dans l'activation des liaisons C-H.<p>Enfin, nous avons étudié l'influence de la taille/la dispersion des particules de palladium sur la vitesse de réaction. L'utilisation de synthèses en phase liquide nous a permis de produire des solutions colloïdales de particules de palladium avec des tailles contrôlées. Cette étude a révélé que la combustion du méthane est une réaction sensible à la structure. Néanmoins, un meilleur contrôle de la forme des nanoparticules devrait être réalisé pour déterminer les facteurs structurels influençant la réaction./ The present work focuses on the development of highly efficient catalytic systems able to completely oxidize methane at low temperature in order to comply with modern environmental legislation. The main subject concerns the design of a new generation of palladium-based catalysts that are sulfur and water resistant. <p>Our goal was achieved through the use of a mixed oxide support produced by sol-gel. In fact, palladium-supported on titanium-doped silica catalysts have proven to be sulfur tolerant and exhibit high performances for the methane conversion. <p>Varying the amounts of TiO2 showed that the performance reached an optimum for a 10 wt.% TiO2 loading. According to the structural and surface analyses, the mixed oxides contained Ti-O-Si linkages, believed to be responsible for the better activity as compared to PdO supported on pure oxides. <p>Moreover, the titania-containing catalysts exhibited a superior tolerance towards SO2 when either adding it to the reactants or feeding it as a pure pretreatment atmosphere at 350°C (15 hour on stream). We evidenced using XPS that the Ti-O-Si sites are also responsible for the higher sulfur tolerance of the catalysts by the insertion of SO2 in the support forming either Ti-O-SOx•••Si or Si-O-SOx•••Ti. XPS analyses also evidenced that the long-term SO2-treatment leads to the formation of PdSO4 with a thickness of 18 to 20 Å. However, the catalysts can entirely recover their initial activity after this treatment. This regeneration was proven to be occurring through a concerted mechanism with methane leading to the total decomposition of PdSO4. Moreover, studies in presence of water showed that these properties remained unchanged.<p>The state of the palladium was also investigated and allowed us to evidence that an activation/stabilization of the catalyst is necessary. This is achieved in presence of the reactants by slight and subtle changes in both the support and the palladium phase. The increase of the catalyst activity was correlated with an increase of Ti3+ and Pd0 fractions. The presence of metallic palladium in the catalyst seems to be the key element in the activation of the C-H bonds. <p>Finally, we have studied the influence of the size/dispersion of the palladium particles on the reaction rate. The use of wet-chemistry synthesis allowed us to produce colloidal solutions of palladium with controlled particles sizes. This study revealed that the methane combustion is a structure sensitive or demanding reaction. Nevertheless, a better control of the shape of the nanoparticles should be achieved to determine the structural factor influencing the reaction.<p> / Doctorat en Sciences / info:eu-repo/semantics/nonPublished
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Synthèse de couches optiques par co-dépôt pour les miroirs de LIGOLalande, Émile 04 1900 (has links)
En 2015, le Laser Interferometer Gravitational-Wave Observatory (LIGO) a observé pour la
première fois des ondes gravitationnelles générées par la fusion de deux trous noirs. Cette
observation résulte de 40 ans d’efforts afin de réduire au minimum les sources de bruit qui
affectent l’interféromètre. À ce jour, la sensibilité de LIGO, dans son domaine de fréquence
le plus sensible, est limitée par la granularité de la lumière d’une part et, d’autre part,
par un phénomène de fluctuations thermiques résultat de la dissipation mécanique dans
les couches minces qui constituent ses miroirs, en particulier dans le matériau ayant un
haut indice de réfraction : l’oxyde de tantale. Une amélioration de la sensibilité permettrait
d’observer davantage d’événement, d’autres phénomènes gravitationnels, ainsi que des détails
importants permettant de mieux les comprendre.
Ce mémoire présente les résultats de nos recherches afin de diminuer le bruit causé
par la dissipation mécanique interne dans les couches à haut indice de réfraction. Pour
ce faire, des couches d’oxyde de tantale ont été dopées soit au zirconium ou à la fois au
zirconium et au titane, par co-dépôt. Des couches avec différentes quantités de dopant
ont été synthétisées par pulvérisation cathodique magnétron sur des substrats de silice
semblables à ceux de LIGO. Par la suite, la dissipation mécanique, l’épaisseur, la rugosité, la
composition, la densité surfacique, et la microstructure ont été caractérisées par suspension
nodale, ellipsométrie résolue spectralement, spectrométrie de rétrodiffusion de Rutherford
et la spectroscopie Raman. Il appert que le zirconium permet d’augmenter la température
de recuit avant la cristallisation, ce qui permet de diminuer plus amplement la dissipation
mécanique interne, mais ne change pas la dissipation à une température de recuit donnée.
Il a aussi été déterminé que la concentration de titane permettait de diminuer l’angle de
perte, peu importe la concentration de zirconium. Une combinaison des deux dopages
et un recuit à haute température permet ainsi de recuire par un facteur d’environ 1.5 la
dissipation mécanique interne. La différence de coefficient d’expansion thermique durant
les recuits à haute température induit cependant des problèmes de craquement des couches,
partiellement résolus par l’application d’une couche de recouvrement en silice. / In 2015, the Laser Interferometer Gravitational-Wave Observatory (LIGO) observed for the
first time gravitational waves generated by the merger of two black holes. This observation
was the resut of 40 years of efforts to minimize the noise source which affect the the interferometer. To this date, the sensitivity of LIGO, in its most sensitive frequency domain,
is limited by the granularity of the light on one hand, on the other, by a phenomenon of
thermal fluctuations resulting from the mechanical dissipation in the thin film of the miroir,
in particular in the high refractive index material: tantala. An improvement of the sensitivity would allow the measurement of more events, other gravitational phenomena and some
details that would result in a better understanding.
This master’s thesis presents results of our research to reduce the noise caused by
internal mechanical dissipation in high refractive index layers. To do so, tantala layers were
doped with either zirconium and titanium by co-deposition. Layers with different amounts
of dopant were synthesized by magnetron sputtering on fused silica substrate similar to
those of LIGO. Subsequently, mechanical dissipation, thickness, roughness, composition,
areal density and microstructure were characterized by gentle nodal suspension, spectrally
resolved ellipsometry, Rutherford backscattering spectroscopy, and Raman spectroscopy. It
appears that zirconium allows the annealing temperature to be increased before crystallization which further decreases internal mechanical dissipation, but does not change dissipation
at a given annealing temperature. It was also determined that the concentration of titanium
reduced the loss angle regardless of the zirconium concentration. A combination of the two
dopant and high annealing temperatures thus enables the internal mechanical dissipation
to be lower by a factor of 1.5.The difference in thermal expansion coefficient during high
temperature annealing, however, induces layer cracking problems, partially resolved by the
application of a silica cap.
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Atomic Layer Deposition onto FibersRoy, Amit Kumar 14 March 2012 (has links)
The main goal of this dissertation was to show that the principle of atomic layer deposition (ALD) can be applied to “endless” fibers. A reactor of atomic layer deposition has been designed, especially for coating depositions onto meter long bundles of fibers. Aluminum oxide (alumina), titanium oxide (titania), double layers of alumina and titania, as well as aluminium phosphate have been deposited onto bundles of carbon fibers using the home-built reactor. Scanning electron microscopic (SEM) and transmission electron microscopic (TEM) images indicate that the coatings were uniform and conformal onto fiber surface. There was a good adhesion of the coatings to the fibers.
Alumina has been deposited using two separate aluminum sources (aluminum trichloride and trimethylaluminum), and water as a source of oxygen. In case of alumina deposition using aluminum trichloride and water, initial deposition temperature was 500 °C. In these conditions, a part of the fiber bundle has been damaged. Thus, the deposition temperature was decreased to 300 °C and the fibers were unaffected. In addition, during this process hydrochloric acid is formed as a byproduct which is a corrosive substance and affects the reactor and there was a chloride impurity in the coatings. Thus, aluminum trichloride precursor was replaced by trimethylalumium.
Alumina deposition onto carbon fibers using trimethylaluminum and water was carried out at a temperature of 77 °C. SEM images revealed that the fibers were unaffected and the coatings were uniform and conformal. Oxidation resistance of the carbon fibers was improved slightly after alumina deposition. Oxidation onset temperature of the uncoated fibers was about 630 °C. The resistance was linearly increased with the coating thickness (up to 660 °C) and getting saturated over a thickness of 120 nm. Titania coatings have been deposited using titanium tetrachloride and water. The physical appearances of the titania coatings were similar to the alumina coatings. The oxidation onset temperature of the titania coated carbon fibers was similar to the uncoated fibers but the rate of oxidation was decreased than the uncoated fibers. Two double layer coatings were deposited, alumina followed by titania (alumina/titania), and titania followed by alumina (titania/alumina). If the fibers were coated with the double layer of alumina/titania, they had almost same oxidation onset as alumina coated fibers but the rate of oxidation was decreased significantly compared to alumina coated fibers. This feature is independent of the thickness of the titania layers, at least in the regime investigated (50 nm alumina followed by 13 nm and 40 nm titania). On the other hand, the oxidation onset temperature of fibers coated with titania/alumina (20 nm titania /30 nm alumina) was approximately 750 °C. The fibers were burned completely when temperature was further increased to 900 °C and held another 60 minutes at 900 °C. This is significantly better than any other coating used in this dissertation.
ALD of titania and alumina in principle was known beforehand, this dissertation here applies this knowledge for the first time to endless fibers. Furthermore, this dissertation shows for the first time that one can deposit aluminum phosphate via ALD (planar surface as well as fibers). Aluminum phosphate might be special interest in the fiber coating because it is a rather soft material and thus might be used to obtain a weak coupling between fiber and matrix in composites. Aluminum phosphate was deposited using trimethylaluminum and triethylphosphate as precursors. Energy dispersive X-ray spectroscopy and solid state nuclear magnetic resonance spectra confirmed that the coating comprises aluminum phosphate (orthophosphate as well as other stoichiometries). Scanning electron microscopic images revealed that coatings are uniform and conformal. In cases of alumina and titania, it was observed that the coatings were delaminated from the ends of cut fibers and thus formed of clear steps. On the other hand, for aluminum phosphate coating it was observed that the border between coating and underlying fiber often being smeared out and thus formed an irregular line. It seems in case aluminum phosphate cohesion is weaker than adhesion, thus it might be act a weak interface between fiber and matrix. Alumina, titania, and double layer microtubes have been obtained after selective removal of the underlying carbon fibers. The carbon fibers were selectively removed via thermal oxidation in air at temperatures exceeding 550 °C. SEM and TEM images indicate that the inner side of the tube wall has the same morphology like the fibers. In addition, it was observed that the individual microtubes were separated from their neighbors and they had almost uniform wall thicknesses. The longest tubes had a length of 30 cm.:Bibliographische Beschreibung und Referat 2
Abstract 4
List of abbreviations 10
1. General introduction and outline of this dissertation 12
1.1 References 20
2. Atomic layer deposition: Process and reactor 25
2.1 Introduction 25
2.2 Principle of atomic layer deposition 26
2.3 Materials and methods 29
2.3.1 Precursors 29
2.3.2 Precursors transportation 31
2.3.3 Carrier and purge gas 32
2.3.4 ALD reactors 32
2.4 Flow-Type ALD reactor for fiber coating 33
2.5 Conclusion 35
2.6 References 35
3. Single layer oxide coatings 38
3.1 State of the art 38
3.2 Alumina coating using non-flammable precursors 39
3.2.1 Introduction 39
3.2.Result and discussion 39
3.3 Alumina coating using organometallic precursor 46
3.2.1 Introduction 46
3.2.2 Results and discussion 46
3.4 Titania coating using titanium tetrachloride and water 59
3.4.1 Introduction 59
3.4.2 Results and discussion 59
3.5 Experimental Part 67
3.5.1 General experiments 67
3.5.2 Alumina coating using aluminum chloride and water 69
3.5.3 Alumina coating using trimethylalumium and water 69
3.5.4 Titania coating 72
3.6 Conclusions 72
3.7 References 74
4. Coating thickness and morphology 78
4.1 Introduction 78
4.2 Results and discussion 80
4.2.1 Purge time 15 s 81
4.2.2 Purge time 30 s 85
4.2.3 Purge time 45 s to 100 s 85
4.3 Experimental part 88
4.4 Conclusions 89
4.5 References 89
5. Alumina and titania double layer coatings 91
5.1 Introduction 91
5.2 Results and discussion 92
5.3 Experimental part 102
5.4 Conclusions 103
5.5 References 103
6. Atomic layer deposition of aluminum phosphate 105
6.1 Introduction 105
6.2 Results and discussion 106
6.3 Experimental part 113
6.4 Conclusions 114
6.5 References 115
7. Alumina microtubes 117
7.1 Introduction 117
7.2 Results and discussion 118
7.2.1 Fibers before coating deposition 118
7.2.2 Coatings on the carbon fibers 118
7.2.3 Microtubes 121
7.3 Experimental part 127
7.4 Conclusions 128
7.5 References 128
8. Conclusions 131
Acknowledgements 136
Curriculum Vitae 138
Selbständigkeitserklärung 142 / Das Hauptziel dieser Dissertation bestand darin nachzuweisen, dass die Atomlagenabscheidung (engl. atomic layer deposition (ALD)) auf „endlose“ Fasern angewendet werden kann. Es wurde ein Reaktor zur Atomlagenabscheidung gestaltet, der speziell für die Beschichtung meterlanger Faserbündel geeignet ist. Aluminiumoxid, Titanoxid, Doppelschichten aus Aluminiumoxid und Titanoxid sowie Aluminiumphosphat wurden mit Hilfe des selbstgebauten Reaktors auf Kohlefaserbündel abgeschieden. Rasterelektronenmikroskopische (REM) und transmissionselektronenmikroskopische (TEM) Aufnahmen zeigten, dass die Beschichtung auf den Fasern einheitlich und oberflächentreu war. Des Weiteren wurde eine gute Adhäsion zwischen Beschichtung und Fasern beobachtet. Das Prinzip der Beschichtung mit Titanoxid und Aluminiumoxid mit Hilfe der ALD war bereits vorher bekannt und im Rahmen dieser Dissertation jedoch erstmals auf "endlose" Fasern angewendet. Des Weiteren wird in dieser Dissertation erstmals gezeigt, dass es möglich ist, Aluminiumphosphat mittels ALD abzuscheiden (sowohl auf planaren Oberflächen als auch auf Fasern). Aluminiumphosphat könnte von besonderem Interesse in der Faserbeschichtung sein, da es ein relativ weiches Material ist und könnte daher als eine Art „schwacher“ Verbindung zwischen Faser und Matrix in Kompositen dienen. Die Oxidationsbeständigkeit von beschichten Kohlefasern wurde im Vergleich zu unbeschichteten Fasern bis zu einem gewissen Grad erhöht. Monoschichten von Aluminiumoxid und Titanoxid waren dafür wenig effektiv. Aluminiumphosphatbeschichtete Fasern waren deutlich besser geeignet als die beiden anderen. Eine Doppelschicht aus Titanoxid gefolgt von Aluminiumoxid verbesserte die Oxidationsbeständigkeit nochmals deutlich gegenüber allen anderen Beschichtungen, die in dieser Dissertation verwendet wurden. Mikroröhren aus Aluminiumoxid, Titanoxid und Doppelschichten wurden durch die selektive Entfernung der zugrunde liegenden Kohlefasern erhalten. Einzelne Mikroröhren waren von benachbarten Röhren getrennt und sie weisen eine nahezu einheitliche Wanddicke auf.:Bibliographische Beschreibung und Referat 2
Abstract 4
List of abbreviations 10
1. General introduction and outline of this dissertation 12
1.1 References 20
2. Atomic layer deposition: Process and reactor 25
2.1 Introduction 25
2.2 Principle of atomic layer deposition 26
2.3 Materials and methods 29
2.3.1 Precursors 29
2.3.2 Precursors transportation 31
2.3.3 Carrier and purge gas 32
2.3.4 ALD reactors 32
2.4 Flow-Type ALD reactor for fiber coating 33
2.5 Conclusion 35
2.6 References 35
3. Single layer oxide coatings 38
3.1 State of the art 38
3.2 Alumina coating using non-flammable precursors 39
3.2.1 Introduction 39
3.2.Result and discussion 39
3.3 Alumina coating using organometallic precursor 46
3.2.1 Introduction 46
3.2.2 Results and discussion 46
3.4 Titania coating using titanium tetrachloride and water 59
3.4.1 Introduction 59
3.4.2 Results and discussion 59
3.5 Experimental Part 67
3.5.1 General experiments 67
3.5.2 Alumina coating using aluminum chloride and water 69
3.5.3 Alumina coating using trimethylalumium and water 69
3.5.4 Titania coating 72
3.6 Conclusions 72
3.7 References 74
4. Coating thickness and morphology 78
4.1 Introduction 78
4.2 Results and discussion 80
4.2.1 Purge time 15 s 81
4.2.2 Purge time 30 s 85
4.2.3 Purge time 45 s to 100 s 85
4.3 Experimental part 88
4.4 Conclusions 89
4.5 References 89
5. Alumina and titania double layer coatings 91
5.1 Introduction 91
5.2 Results and discussion 92
5.3 Experimental part 102
5.4 Conclusions 103
5.5 References 103
6. Atomic layer deposition of aluminum phosphate 105
6.1 Introduction 105
6.2 Results and discussion 106
6.3 Experimental part 113
6.4 Conclusions 114
6.5 References 115
7. Alumina microtubes 117
7.1 Introduction 117
7.2 Results and discussion 118
7.2.1 Fibers before coating deposition 118
7.2.2 Coatings on the carbon fibers 118
7.2.3 Microtubes 121
7.3 Experimental part 127
7.4 Conclusions 128
7.5 References 128
8. Conclusions 131
Acknowledgements 136
Curriculum Vitae 138
Selbständigkeitserklärung 142
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