A novel CVD copper process is described using two new copper CVD precursors, KI3 and KI5, for the fabrication of IC or TSV (Through Silicon Via) copper interconnects. The highly conformal CVD copper can provide seed layers for subsequent copper electroplating or can be used to directly fabricate the interconnect in one step. These new precursors are thermally stable yet chemically reactive under CVD conditions, growing copper films of exceptionally high purity at high growth rates. Their thermal stability can allow for elevated evaporation temperatures to generate the high precursor vapor pressures needed for deep penetration into high aspect ratio TSV vias. Using formic acid vapor as a reducing gas with KI5, copper films of > 99.99 atomic % purity were grown at 250°C on titanium nitride at a growth rate of > 1500 Å/min. Using tantalum nitride coated TSV type wafers, ~ 1700 Å of highly conformal copper was grown at 225°C into 32 μm × 5 μm trenches with good adhesion. With ruthenium barriers we were able to grow copper at 125°C at a rate of 20 Å/min to give a continuous ~ 300 Å copper film. In this respect, rapid low temperature CVD copper growth offers an alternative to the long cycle times associated with copper ALD which can contribute to copper agglomeration occurring. © 2008 Elsevier B.V.

The synthesis and characterization of bis(ketoiminato)magnesium(II) complexes of composition [Mg(OCR2CH2CHR1NCH2CH2X)2] (X = NMe2: 3a, R1 = R2 = Me; 3b, R1 = Me, R2 = Ph. X = OMe: 3c, R1 = R2 = Me) are reported. Complexes 3a–c are accessible by the reaction of C(O)R2CH2CHR1N(H)CH2CH2X (X = NMe2: 1a, R1 = R2 = Me; 1b, R1 = Me, R2 = Ph. X = OMe: 1c, R1 = R2 = Me) with MgnBu2. The structure of 3b in the solid state was determined by a single crystal X-ray diffraction study, confirming that the Mg(II) ion is hexa-coordinated by two ketoiminato ligands, while each of the latter coordinates with its two N- and one O-donor atom in an octahedral MgN6O2 coordination environment in the OC-6-33 stereo-isomeric form. The thermal behavior of 3a–c was studied by TG and DSC under an atmosphere of Ar and O2 respectively. The respective Me-substituted complexes 3a,c decompose at lower temperatures (3a, 166 °C; 3c, 233 °C) than the phenyl derivative 3b (243 °C). PXRD studies indicate the formation of MgO. Additionally, TG-MS studies were exemplarily carried out for 3a, indicating the release of the ketoiminato ligands. Vapor pressure measurements were conducted at 80 °C, whereby 3a,c possess with 5.6 mbar (3a) and 2.0 mbar (3c) significantly higher volatilities than 3b (0.07 mbar). Complexes 3a–c were used as MOCVD precursors for the deposition of thin MgO films on silicon substrates. It was found that only with 3a,c thin, dense and rather granulated MgO layers of thicknesses between 28–147 nm were produced. The as-deposited MgO layers were characterized by SEM, EDX, and XPS measurements and the thicknesses of the as-deposited layers were measured by Ellipsometry and SEM cross-section images. Apart from magnesium and oxygen a carbon content between 3–4 mol% was determined.

The synthesis of complexes [M(OCHMeCH2NMeCH2)2] (5, M = Mg; 7, M = Zn) is described. Treatment of MeHNCH2CH2NMeH (1) with 2-methyloxirane (2) gave diol (HOCHMeCH2NMeCH2)2 (3), which upon reaction with equimolar amounts of MR2 (4, M = Mg, R = Bu; 6, M = Zn, R = Et) gave 5 and 7. The thermal behavior and vapor pressure of 5 and 7 were investigated to show whether they are suited as CVD (= chemical vapor deposition) and/or spin-coating precursors for MgO or ZnO layer formation. Thermogravimetric (TG) studies revealed that 5 and 7 decompose between 80–530 °C forming MgO and ZnO as evidenced by PXRD studies. In addition, TG-MS-coupled experiments were carried out with 7 proving that decomposition occurs by M–O, C–O, C–N and C–C bond cleavages, as evidenced from the detection of fragments such as CH4N+, C2H4N+, C2H5N+, CH2O+, C2H2O+ and C2H3O+. The vapor pressure of 7 was measured at 10.4 mbar at 160 °C, while 5 is non-volatile. The layers obtained by CVD are dense and conformal with a somewhat granulated surface morphology as evidenced by SEM studies. In addition, spin–coating experiments using 5 and 7 as precursors were applied. The corresponding MO layer thicknesses are between 7–140 nm (CVD) or 80 nm and 65 nm (5, 7; spin-coating). EDX and XPS measurements confirm the formation of MgO and ZnO films, however, containing 12–24 mol% (CVD) or 5–9 mol% (spin-coating) carbon. GIXRD studies verify the crystalline character of the deposited layers obtained by CVD and the spin-coating processes.

Dans cette thèse, nous avons fabriqué des cellules solaires à jonction radiale en nanofils de silicium avec du silicium microcristallin hydrogéné (µc-Si:H) comme absorbeur, par dépôt chimique en phase vapeur assisté par plasma à basse température (PECVD). Pour contrôler la densité de nanofils sur les substrats, nous avons utilisé des nanoparticules (NP) de dioxyde d'étain (SnO₂) d'un diamètre moyen de 55 nm, disponibles dans le commerce, comme précurseur du catalyseur Sn pour la croissance des nanofils de silicium. La distribution des nanoparticules de SnO₂ sur le substrat a été contrôlée par centrifugation et dilution du colloïde de SnO₂, en combinaison avec la fonctionnalisation du substrat. Par la suite, le SnO₂ est réduit en Sn métallique après le traitement par plasma de H₂, suivi de la croissance, par la technique vapeur-liquide-solide (VLS) assistée par plasma, de nanofils de Si sur lesquels sont déposées les couches P, I et N constituant les cellules solaires à jonction radiale. Nous avons atteint un taux de croissance élevé des nanofils de Si, jusqu'à 70%, avec une très large gamme de densité, de 10⁶ à 10⁹ /cm². Comme approche supplémentaire de contrôle de la densité des nanofils, nous avons utilisé du Sn évaporé comme précurseur du catalyseur Sn. Nous avons étudié l'effet de l'épaisseur de Sn évaporé, l'effet de la durée du traitement au plasma de H₂ et l'effet du débit de gaz H₂ dans le dans le mélange de précurseurs, sur la densité des nanofils. L'ellipsométrie spectroscopique in-situ (SE) a été utilisée pour contrôler la croissance des nanofils et le dépôt des couches de µc-Si:H sur les SiNWs. En combinant les résultats de in-situ SE et de microscopie électronique à balayage, une relation entre l'intensité du signal de SE pendant la croissance et la longueur et la densité des nanofils a été démontrée, ce qui permet d'estimer ces paramètres en cours de croissance. Nous avons réalisé une étude systématique des matériaux (couches intrinsèques et dopées de type n ou p de µc-Si:H, couches dopées d'oxyde de silicium microcristallin hydrogéné, µcSiOx:H) et des cellules solaires obtenues dans deux réacteurs à plasma appelés "PLASFIL" et "ARCAM". Les épaisseurs de revêtement sur substrat lisse et sur les nanofils ont été déterminées et nous avons obtenu une relation linéaire entre les deux, ce qui permet de concevoir un revêtement conforme sur les nanofils pour chaque couche avec une épaisseur optimale. Les paramètres des nanofils et des matériaux, affectant la performance des cellules solaires à jonction radiale, ont été systématiquement étudiés, les principaux étant la longueur et la densité des nanofils, l'épaisseur de la couche intrinsèque de µc-Si:H, l'utilisation de µc-SiOx:H et le réflecteur arrière en Ag. Enfin, avec les cellules solaires à jonction radiale en nanofils de silicium optimisées utilisant le µc-Si:H comme absorbeur, nous avons atteint un rendement de conversion de l'énergie de 4,13 % avec Voc = 0,41 V, Jsc = 14,4 mA/cm² et FF = 69,7%. Cette performance est supérieure de plus de 40 % à l'efficacité record de 2,9 % publiée précédemment. / In this thesis, we have fabricated silicon nanowire (SiNW) radial junction solar cells with hydrogenated microcrystalline silicon (μc-Si:H) as the absorber via low-temperature plasma-enhanced chemical vapor deposition (PECVD). To control the density of NW on the substrates, we have used commercially available tin dioxide (SnO₂) nanoparticles (NPs) with an average diameter of 55 nm as the precursor of Sn catalyst for the growth of SiNWs. The distribution of SnO₂ NPs on the substrate has been controlled by centrifugation and the dilution of the SnO₂ colloid, combined with the functionalization of the substrate. Subsequently, SnO₂ is reduced to metallic Sn after the H₂ plasma treatment, followed by the plasma-assisted vapor-liquid-solid (VLS) growth of SiNWs upon which the P, I and N layers constituting the radial junction solar cells are deposited. We have achieved a high yield growth of SiNWs up to 70% with a very wide range of NW density, from 10⁶ to 10⁹ /cm². As an additional approach of controlling the density of SiNWs we have used evaporated Sn as the precursor of Sn catalyst. We have studied the effect of the thickness of evaporated Sn, the effect of duration of H₂ plasma treatment and the effect of H₂ gas flow rate in the plasma, on the density of SiNWs.In-situ spectroscopic ellipsometry (SE) was used for monitoring the growth of SiNWs and the deposition of the layers of μc-Si:H on SiNWs. Combining in-situ SE and SEM results, a relationship between the intensity of SE signal and the length and the density of SiNWs during the growth was demonstrated, which allows to estimate the density and the length of SiNWs during the growth. We have carried out a systematic study of materials (intrinsic, p-type,n-type µc-Si:H and µcSiOx:H doped layers) and solar cells obtained in two plasma reactors named “PLASFIL” and “ARCAM”. The thicknesses of coating on the flat substrate and on the SiNWs have been determined with a linear relation which helps to design a conformal coating on SiNWs for each layer with an optimal thickness. The parameters of the SiNWs and the materials, affecting the performance of radial junction solar cells, have been systematically studied, the main ones being the length and the density of SiNWs, the thickness of intrinsic layer of μc-Si:H on SiNWs, the use of the hydrogenated microcrystalline silicon oxide (μc-SiOx:H) and the back reflector Ag. Finally, with the optimized silicon nanowire radial junction solar cells using the μc-Si:H as the absorber we have achieved an energy conversion efficiency of 4.13 % with Voc = 0.41 V, Jsc = 14.4 mA/cm² and FF = 69.7%. This performance is more than 40 % better than the previous published record efficiency of 2.9 %.

Ce manuscrit présente l'étude de la fabrication de couches minces de silicium basée sur des différents types de dépôt chimique en phase vapeur assisté par plasma (PECVD) pour des applications dans le photovoltaïque. Tout d'abord, nous avons combiné une chimie du plasma halogéné en utilisant un mélange de SiF4/H2 et la technique plasmas distributés matriciellement à résonance cyclotronique électronique (MDECR) PECVD pour le dépôt de μc-Si:H à grande vitesse. Nous trouvons que les conditions d'énergie ionique modérée sont bénéfiques pour obtenir une diminution significative de la densité des nano-vides, et ainis nous pouvons obtenir un matériaux de meilleure qualité avec une meilleure stabilité. Une méthode de dépôt en deux étapes a été introduite comme moyen alternatif d'éliminer la formation d'une couche d'incubation amorphe pendant la croissance du film. Ensuite, nous avons exploré la technique d'excitation Tailored Voltage Waveform (TVW) pour les processus plasma radiofréquence capacitivement couplé (RF-CCP). Grâce à l'utilisation de TVW, il est possible d'étudier indépendamment l'influence de l'énergie ionique sur le dépôt de matériaux à une pression de processus relativement élevée. Basé sur ce point, nous avons étudié le dépôt de μc-Si:H et a-Si:H à partir des plasma de SiF4/H2/Ar et de SiH4/H2, respectivement. A partir d'une analyse des propriétés structurelles et électroniques, nous constatons que la variation de l'énergie ionique peut directement traduite dans la qualité du matériaux. Les résultats se sont appliqués aux dispositifs photovoltaïques et ont établi des liens complets entre les paramètres de plasma contrôlables par TVW et les propriétés de matériaux déposé, et finalement, les performances du dispositif photovoltaïque correspondant. Enfin, nous avons trouvé que dans le cas du dépôt de couches minces de silicium à partir du plasma de SiF4/H2/Ar à l'aide de sawtooth TVW, on peut réaliser un processus de dépôt sur une électrode, sans aucun dépôt ou gravure. contre-électrode. Ceci est dû à deux effets: la nature multi-précurseur du processus de surface résultant et la réponse de plasma spatiale asymétrique par l'effet d'asymétrie de pente de la sawtooth TVW. La découverte de tels procédés “electrode-selective” encourage la perspective que l'on puisse choisir un ensemble de conditions de traitement pour obtenir une grande variété de dépôts désirés sur une électrode, tout en laissant l'autre vierge. / This thesis describes the study of silicon thin film materials deposition and the resulting photovoltaic devices fabrication using different types of plasma-enhanced chemical vapour deposition (PECVD) techniques.In the first part, we combine a SiF4/H2 plasma chemistry with the matrix-distributed electron cyclotron resonance (MDECR) PECVD to obtain high growth rate microcrystalline silicon (µc-Si:H). Due to the special design of MDECR system, careful investigation of the impact energy of impinging ions to material deposition can be accessible. We find that moderate ion energy conditions is beneficial to achieve a significant drop in the density of nano-voids, thus a higher quality material with better stability can be obtained. A two-step deposition method is introduced as an alternative way to eliminate the existence of amorphous incubation layer during film growth.The second part of work is dedicate to the exploration of the Tailored Voltage Waveforms (TVWs) excitation technique for capacitively coupled plasmas (CCP) processes. As an advantage over the conventional sinusoidal excitations, TVWs technique provide an elegant solution for the ion flux-energy decoupling in CCP discharges through the electrical asymmetry effect, which makes the independent study of the impact of ion energy for material deposition at relatively high process pressure possible. Based on this insight, we have studied the deposition of µc-Si:H and amorphous silicon (a-Si:H) from the SiF4/H2/Ar and SiH4/H2 plasma chemistry, respectively. From the structural and electronic properties analysis, we find that the variation of ion energy can be directly translated into the material quality. We have further applied these results to photovoltaic applications and established bottom-up links from the controllable plasma parameters via TVWs to the deposited material properties, and eventually to the resulting device quality.In the last part, as a further application of TVWs, an “electrode-selective” effect has been discovered in the CCP processes. In the case of silicon thin film deposition from the SiF4/H2/Ar plasma chemistry, one can achieve a deposition process on one electrode, while at the same time either no deposition or an etching process on the counter electrode. This is due to two effects: the multi-precursor nature of the resulting surface process and the asymmetric plasma response through the utilization of TVWs. Moreover, such deposition/etching balance can be directly controlled through H2 flow rate. From a temporal asymmetry point of view, we have further studied the impact of process pressure and reactor geometry to the asymmetric plasma response for both the single-gas and multi-gas plasmas using the sawtooth waveforms. The product of pressure and inter-electrode distance P·di is deduced to be a crucial parameter in determine the plasma heating mode, so that a more flexible control over the discharge asymmetry as well as the relating “electrode-selective” surface process can be expected.

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<p>This study focuses on developing a new online recursive numerical algorithm for a coupled nonlinear inverse heat conduction-microstructure problem. This algorithm is essential in identifying, designing and controlling many industrial applications such as the quenching process for heat treating of materials, chemical vapor deposition and industrial baking. In order to develop the above algorithm, a systematic four stage research plan has been conducted. </P> <p> The first and second stages were devoted to thoroughly reviewing the existing inverse heat conduction techniques. Unlike most inverse heat conduction solution methods that are batch form techniques, the online input estimation algorithm can be used for controlling the process in real time. Therefore, in the first stage, the effect of different parameters of the online input estimation algorithm on the estimate bias has been investigated. These parameters are the stabilizing parameter, the measurement errors standard deviation, the temporal step size, the spatial step size, the location of the thermocouple as well as the initial assumption of the state error covariance and error covariance of the input estimate. Furthermore, three different discretization schemes; namely: explicit, implicit and Crank-Nicholson have been employed in the input estimation algorithm to evaluate their effect on the algorithm performance. </p> <p> The effect of changing the stabilizing parameter has been investigated using three different forms of boundary conditions covering most practical boundary heat flux conditions. These cases are: square, triangular and mixed function heat fluxes. The most important finding of this investigation is that a robust range of the stabilizing parameter has been found which achieves the desired trade-off between the filter tracking ability and its sensitivity to measurement errors. For the three considered cases, it has been found that there is a common optimal value of the stabilizing parameter at which the estimate bias is minimal. This finding is important for practical applications since this parameter is usually unknown. Therefore, this study provides a needed guidance for assuming this parameter. </p> <p> In stage three of this study, a new, more efficient direct numerical algorithm has been developed to predict the thermal and microstructure fields during quenching of steel rods. The present algorithm solves the full nonlinear heat conduction equation using a central finite-difference scheme coupled with a fourth-order Runge-Kutta nonlinear solver. Numerical results obtained using the present algorithm have been validated using experimental data and numerical results available in the literature. In addition to its accurate predictions, the present algorithm does not require iterations; hence, it is computationally more efficient than previous numerical algorithms. </p> <p> The work performed in stage four of this research focused on developing and applying an inverse algorithm to estimate the surface temperatures and surface heat flux of a steel cylinder during the quenching process. The conventional online input estimation algorithm has been modified and used for the first time to handle this coupled nonlinear problem. The nonlinearity of the problem has been treated explicitly which resulted in a non-iterative algorithm suitable for real-time control of the quenching process. The obtained results have been validated using experimental data and numerical results obtained by solving the direct problem using the direct solver developed in stage three of this work. These results showed that the algorithm is efficiently reconstructing the shape of the convective surface heat flux. </P> / Thesis / Doctor of Philosophy (PhD)

Over the past 20 years’ researchers have tried to utilize the remarkable properties of single-walled carbon nanotubes (SWCNTs) to create new high-tech materials and devices, such as strong light-weight composites, efficient electrical wires and super-fast transistors. But the mass production of these materials and devices are still hampered by the poor uniformity of the produced SWCNTs. These are hollow cylindrical tubes of carbon where the atomic structure of the tube wall consists of just a single atomic layer of carbon atoms arranged in a hexagonal grid. For a SWCNT the orientation of the hexagonal grid making up the tube wall is what determines its properties, this orientation is known as the chirality of a SWCNT. As an example, tubes with certain chiralities will be electrically conductive while others having different chiralities will be semiconducting. Today’s large scale methods for producing SWCNTs, commonly known as growth of SWCNTs, gives products with a large spread of different chiralities. A mixture of chiralities will give products with a mixture of different properties. This is one of the major problems holding back the use of SWCNTs in future materials and devices. The ultimate goal is to achieve growth where the resulting product is uniform, meaning that all of the SWCNTs have the same chirality, a process termed chirality-specific growth. To achieve chirality-specific growth of SWCNTs requires us to obtain a better fundamental understanding about how they grow, both from an experimental and a theoretical point of view. This work focuses on theoretical studies of SWCNT properties and how they relate to the growth process, thereby giving us vital new information about how SWCNTs grow and taking us ever closer to achieving the ultimate goal of chirality-specific growth. In this thesis, an introduction to the field is given and the current state of the art experiments focusing on chirality-specific growth of SWCNTs are presented. A brief review of the current theoretical works and computer simulations related to growth of SWCNTs is also presented. The results presented in this thesis are obtained using first principle density functional theory. The first study shows a correlation between the stability of SWCNT-fragments and the observed products from experiments. Calculations confirm that in 84% of the investigated cases the chirality of experimental products matches the chirality of the most stable SWCNT-fragments (within 0.2 eV). Further theoretical calculations also reveal a previously unknown link between the stability of SWCNT-fragments and their length. The calculations show that at specific SWCNT-fragment lengths the most stable chirality changes. Thus, introducing the concept of a switching length for SWCNT stability. How these new results link to the existing understanding of SWCNT growth is discussed at the end of the thesis.

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