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Due to recent developments in environmental and medical fields, coating engineering is expected to develop new or adapt existing materials as well as processes and tools to achieve even more complex functionalities. Carbon-based materials are outstanding candidates to address some of these opportunities. Compared to other semiconductors such as silicon, carbon atoms form single (sp^3), double (sp^2), and triple bonds (sp^1), enabling the engineering of a wide range of adjustable properties. Hence, it comes as no surprise that amorphous carbon materials composed of sp3 and sp^2 bonded carbon atoms have been of great interest as a surface coating over the past decades. Specifically, tetrahedral amorphous carbon (ta-C), consisting of up to 80 % sp^3 hybridized carbon, has seen much recognition for its diamond-like mechanical properties. The here presented research focuses on adapting the so-called Laser-Arc based coating processes to enable the incorporation of nitrogen into ta-C films to form ta-C:N. The incorporation of nitrogen enhances the electrical conductivity of ta-C enabling applications in the field of electroanalysis. Ta-C:N is a viable electrode candidate due to electrochemical properties that are similar to those of boron-doped diamond (BDD) electrodes. In contrast to BDD, ta-C:N can be applied to substrates at room temperature, enabling cost-effective applications on polymeric carriers. To enable successful technology transfer in the aforementioned fields it is vital to fully understand the material properties and limitations of ta-C:N synthesized by Laser-Arc. Hence, this work aims to gain a clear understanding of the optical and electronic properties of ta-C:N thin films (up to 200 nm thick) deposited at different nitrogen flow rates by Laser-Arc. In addition, a ta-C:N-based optically transparent electrode (OTE) and 3-in-1 sensor are developed and characterized towards electrochemical functionality.

Les besoins de nouvelles technologies en télécommunications motivent la recherche de matériaux participant à la formation de composants optiques. Dans ce but, l’étude de la photostructuration de nouvelles formulations de verres possédant des propriétés optiques ajustables a été réalisée. Deux cas ont été étudiés : la modification du réseau vitreux ou l’introduction d’ions photosensibles au sein du verre. - Des verres oxysulfures de germanium et de gallium ont été élaborés sous forme de massif, et sous forme de couche mince. Leurs propriétés optiques sont intermédiaires à celles des composés purs Ge(Ga)O2 et Ge(Ga)S2. La photosensibilité des verres diminue avec l’augmentation de la valeur du rapport O/S des matériaux. - L’ajout d’ions argent au sein de verres phosphates de zinc a été étudié. Plusieurs techniques de réduction de l’ion argent dans ces verres ont été explorées comme l’irradiation par faisceau électronique, par rayonnement gamma ou par Laser. Dans le cas particulier d’une irradiation par laser femtoseconde de cadence de 8 Mhz et émettant à 1030 nm, il a été possible de créer des structures optiques de 85 nm environ, donc bien inférieur à la longueur d’onde utilisée pour l’écriture. Ces premiers résultats offrent une nouvelle alternative à la création dans le futur de structures photoniques composites. / The increment of the need of new technologies in photonics is a perfect vector for the research and development of new components for integrated optics. The photostructuration of new glassy materials with novel optical properties is proposed. Two approaches have been conducted : Modification of the glass matrix or addition of photosensitive ions. - Germanium and gallium oxysulfide glasses have been elaborated into bulk glasses as well as amorphous thin films. They exhibit optical properties in between their respective pure sulphide or oxide counterpart in the Ge(Ga)O2 - Ge(Ga)S2 system. The photosensitivity of the oxysulfide glasses lowers as the oxygen/sulphur ratio of the glasses is increased. - The photosensitivity of silver ions within silver phosphate glasses was studied as well. Several techniques were used in order to trigger the reduction of silver such as gamma ray or electron beam irradiation, or laser beam exposure. Under a femtosecond laser with a repetition rate of 8 Mhz, emitting at 1030 nm, it was possible to create optical objects, below the diffraction limit, of about 85 nm. Those results are a new alternative for the creation of photonic composite structures.

De nouveaux alliages Zn-TR1-5 %mass.(TR = Ce, La et Mischmetal : Ce 75%/La25%) ont été synthétisés par fusion sous atmosphère contrôlée et coulés sous forme de plaques. Dans ces nouveaux matériaux, les terre rare sont localisées exclusivement dans des phases intermétalliques dispersées de manière homogène dans la matrice de zinc : Zn11Ce, Zn13La ou Zn11Ce1-xLax and Zn13CeyLa1-y. Le comportement électrochimique de ces nouveaux alliages a été étudié dans un milieu corrosif de référence simulant les conditions atmosphériques. En parallèle, les phases intermétalliques pures Zn11Ce and Zn13La ont été synthétisées et leur influence électrochimique a été évaluée par voltamétrie et couplage galvanique. Les résultats montrent que les deux phases intermétalliques sont des sites cathodiques préférentiels de la réduction du dioxygène et induisent une inhibition cathodique de la corrosion des alliages Zn-TR par rapport au zinc pur. Ce phénomène est plus marqué dans le cas des alliages au lanthane. Dans le cas spécifique des alliages au cérium, une inhibition anodique a également été observée et corrélée avec une modification chimique des produits de corrosion (composés majoritairement d'hydrozincite). En fait, une faible quantitéhomogène de cérium a pu être mise en évidence dans la couche de corrosion par spectrométrie dispersive en longueur d'onde. D'après les résultats d'expériences de précipitation contrôlée de sels de cérium et zinc en milieu carbonaté, la présence de cérium dans la couche de corrosion et son caractère protecteur pourraient être attribués à la formation d'un composé mixte double lamellaire zinc-cérium. L'addition de moins de 2%mass. de cérium ou lanthane permet d'améliorer la résistance à la corrosion du zinc. Cependant, lorsque la teneur en terre-rare augmente, l'effet de couplage galvanique devient plus important et rend les alliages moins résistants que le zinc pur / New Zn-RE1-5 wt.% alloys (RE=Ce, La and Mischmetal: Ce 75%/ La 25%) were synthesized by melting under controlled atmosphere and cast in plates. In these materials, rare earth metal are exclusively present in intermetallic phases homogeneously dispersed in the zinc matrix: Zn11Ce, Zn13La or Zn11Ce1-xLax and Zn13CeyLa1-y. The electrochemical behavior of these new alloys was investigated in a reference corrosivemedium. In parallel, the pure intermetallic phases Zn11Ce and Zn13La were synthesized and their electrochemical influence was studied by voltametry and galvanic coupling. Results show that both intermetallic phases act as preferential cathodic sites of dioxygen reduction and induce a cathodic inhibition of the corrosion of the Zn-RE alloys by comparison with pure zinc. This phenomenon is much more significant in the case of lanthanum containing alloys. In the specific case of cerium addition to zinc, an anodic inhibition was also observed and correlated with a chemical modification of the corrosion products (mainly made of hydrozincite). Actually, low quantities of cerium (less than 1 at.%) have been detected homogeneously in the corrosion layer by wave-length dispersive spectrometry. From results of controlled precipitation experiments of cerium and zinc salts performed in carbonated medium, the presence of cerium in the corrosionlayer and its protective character could be attributed to the formation of a mixed double lamellar zinc-cerium product. Therefore, addition to zinc of less than 2 wt.% of cerium or lanthanum allow to improve the corrosion resistance of zinc. However, by increasing the rare earth content in the alloys, the galvanic coupling phenomenon becomes more important and makes the alloys less resistant than pure zinc

Cette thèse porte principalement sur la caractérisation électrique et la modélisation physique d'éléments mémoires émergents de type OxRRAM (Oxide Resistive Random Access Memory) intégrant soit un oxyde de nickel, soit un oxyde de hafnium. Une fois la maturité technologique atteinte, ce concept de mémoire est susceptible de remplacer la technologie Flash qui fait encore figure de référence. Les principaux avantages de la technologie OxRRAM reposent sur une très bonne compatibilité avec les filières CMOS, un faible nombre d'étapes de fabrication, une grande densité d'intégration et des performances attractives en termes de fonctionnement. Le premier objectif de ce travail concerne le diélectrique employé dans les cellules. Il s'agit d'apporter des éléments factuels permettant d'orienter un choix technologique sur la méthode d'élaboration de l'oxyde de nickel (oxydation thermique ou pulvérisation cathodique réactive) puis d'évaluer les performances de cellules à base d'oyxde de hafnium. Le second objectif est d'approfondir la compréhension des mécanismes physiques responsables du changement de résistance des dispositifs mémoire par une approche de modélisation physique des phénomènes opérant lors des phases d'écriture et d'effacement, sujet encore largement débattu dans la communauté scientifique. Le troisième objectif de cette thèse est d'évaluer, par le biais de caractérisations électriques, les phénomènes parasites intervenant dans les éléments mémoires de type 1R (élément résistif sans dispositif d'adressage) et, en particulier, la décharge capacitive apparaissant lors de leur programmation (opérations d'écriture). / This work is focused on the electrical characterization and physical modeling of emerging OxRRAM memories (Oxide Resistive Random Access Memory) integrating nickel or hafnium oxide. After reaching maturity, this memory concept is likely to replace the Flash technology which is still a standard in the CMOS industry. The main advantages of resistive memories technology is their good compatibility with CMOS processes, a small number of manufacturing steps, a high integration density and their attractive performances in terms of memory operation. The first objective of this thesis is to provide enough informations allowing to orientate the elaboration process of the active nickel oxide layer (thermal oxidation, reactive sputtering) then to compare the performances of the fabricated cells with devices featuring a hafnium oxide layer. The second objective is to understand the physical mechanisms responsible of the device resistance change. A physical model is proposed allowing to apprehend SET and RESET phenomenon in memory devices, subject which is still widely debated in the scientific community. The third objective of this thesis is to evaluate electrical parasitic phenomenon observed in 1R-type memory elements (resistive element without addressing device), in particular the parasitic capacitance appearing during cell programming (writing operation).

A multi-analytical approach based on in-situ and ex-situ local probing techniques was employed to investigate localized corrosion mechanisms of some aluminum alloys in chloride containing solutions, focusing on the influence of intermetallic particles (IMPs) in the alloys. In the EN AW-3003 alloy, SEM-EDS analysis revealed constituent and dispersoid IMPs. There are two types of constituent IMPs, with size ranging from 0.5 to several μm, and composition typically Al6(Fe,Mn) or Al12(Mn,Fe)3Si, respectively,having a Mn/Fe ratio of about 1:1. Fine dispersoids of 0.5 μm or less in size normally have the composition Al12Mn3Si1-2. Scanning Kelvin probe force microscopy (SKPFM measurements showed that the constituent IMPs have a higher Volta potential compared to the matrix, and the Volta potential difference increased with particle size, probably related to the composition of the IMPs. The SKPFM results also showed a Volta potential minimum in the boundary region adjacent to some larger IMPs. The open-circuit potential and electrochemical impedance spectroscopy measurements indicated local electrochemical activities occurring on the surface, and active-like dissolution in the acidic solutions, but a passive-like behavior in the near-neutral solutions. Infrared reflection-absorption spectroscopy measurements after exposure and thermodynamic calculations suggested the formation of mixtures of aluminum oxyhydroxide and acetate on the surface in acetic acid solutions. The formation and fraction of dominant species of the corrosion products depend on the pH of the solution, and aluminum chloride compounds may form at very low pH. Moreover, an integrated in-situ atomic force microscopy (AFM) and scanningelectrochemical microscopy (SECM) set-up was used to investigate the localized activities on the surface. With a dual mode probe, acting as both AFM tip and SECM microelectrode, concurrent topography and electrochemical current images were obtained on the same area of the surface. Numerical simulations of the SECM suggested a micrometer lateral resolution under favorable conditions and the ability to resolve μmsized active sites with a separation distance of about 3 μm or larger. The simulations were verified by SECM mapping of the aluminum alloys in the chloride solutions. The AFM/SECM measurements revealed enhanced cathodic activity on some larger IMPs and local anodic dissolution around larger IMPs. In-situ AFM monitoring confirmed preferential dissolution in the boundary region adjacent to some of these IMPs. The results elucidate the micro-galvanic effect and size effect of the IMPs during the initiation of localized corrosion of the Al alloys. Furthermore, differences in corrosion properties between EN AW-3003 and a newly developed Al–Mn–Si–Zr alloy were studied with a similar approach. Compared to EN AW-3003, the new alloy had a smaller number of particles with a large Volta potential difference relative to the matrix. In slightly corrosive solutions extensive localized dissolution and deposition of corrosion products occurred on EN AW-3003, whereas only a small number of corroding sites and “tunnel-like” pits occurred on the Al–Mn–Si–Zr alloy. The lower corrosion activity and the smaller tunnel-like pits resulted in lower material loss of the Al–Mn–Si–Zr alloy, which is beneficial for applications using a thin material. / QC 20100702

A polianilina é dos polímeros condutores mais estudados e com diversas aplicações, dentre elas o uso no recobrimento de aços para proteção à corrosão. Este trabalho objetivou encontrar as condições de eletrossíntese de polianilinas em meio aquoso neutro e a avaliação de proteção à corrosão, tendo como substrato o aço inox 304. As polianilinas eletrossintetizadas foram uma forma pura (PAni) e outra modificada com a adição de melamina (PAni/MM). Dentre as justificativas deste trabalho está a necessidade de aprofundar os escassos estudos em eletrossínteses em meio aquoso neutro. Neste trabalho, são apresentados as condições de eletrossíntese das polianilinas, a caracterização preliminar das polianilinas por UV-visível, FTIR e MEV, ensaios de polarização potenciodinâmica e impedância eletroquímica do aço inox 304 sem e com filmes das polianilinas para avaliar a resistência à corrosão em meio aquoso de NaCl 0,5 mol/L. O trabalho mostrou que a eletrossíntese das polianilinas em meio aquoso neutro é viável. Além disso, foi verificada a seguinte ordem do potencial de corrosão, do menor para o maior: aço inox 304 puro, aço inox 304 com PAni e aço inox 304 com PAni/MM. / Polyaniline is one of the most studied conducting polymers and with various applications, including use on steels for corrosion protection. This work aimed to find the conditions for electrosynthesis of polyanilines in neutral aqueous media and to evaluated the corrosion protection of 304 stainless steel. The electrosynthesizeds polyanilines were one pure form (PAni) and one with the addition of melamine (PAni/MM). One of the justifications of this work is the need to deepen the scarce studies in electrosynthesis in neutral aqueous media. In this work, we will see the conditions for electrosynthesis of polyanilines, the UV-visible, FTIR and SEM polyanilines preliminary characterization, the potentiodynamic polarization experiments and impedance spectroscopy of 304 stainless steel without and with films from polyanilines for evaluate the corrosion resistance in NaCl 0,5 mol/L aqueous media. This work showed that electrosynthesis of polyanilines is feasible in neutral aqueous media. In addition, it was verified the following order of corrosion potencial, from lowest to highest: pure 304 stainless steel, 304 stainless steel with PAni and 304 stainless with PAni/MM.

Made available in DSpace on 2014-12-17T14:06:57Z (GMT). No. of bitstreams: 1 RomuloRMS.pdf: 3055902 bytes, checksum: 75eaf485a85529179129dd468ccfc772 (MD5) Previous issue date: 2007-12-18 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / The ionic plasma nitriding is one of the most important plasma assisted treatment technique for surface modification, but it presents some inherent problems mainly in nitriding pieces with complex geometries. In the last four years has appeared a plasma nitriding technique, named ASPN (Active Screen Plasma Nitriding) in which the samples and the workload are surrounded by a metal screen on which the cathodic potential is applied. This new technique makes possible to obtain a perfect uniform nitrided layer apart from the shape of the samples. The present work is based on the development of a new nitriding plasma technique named CCPN (Cathodic Cage Plasma Nitriding) Patent PI 0603213-3 derived from ASPN, but utilizes the hollow cathode effect to increase the nitriding process efficiency. That technique has shown great improvement on the treatment of several types of steels under different process conditions, producing thicker and harder layers when compared with both, ASPN and ionic plasma nitriding, besides eliminating problems associated with the later technique. The best obtained results are due to the hollow cathode effect on the cage holes. Moreover, characteristic problems of ionic plasma nitriding are eliminated due to the fact that the luminescent discharge acts on the cage wall instead of on the samples surface, which remains under a floating potential. In this work the enhancement of the cathodic cage nitriding layers proprieties, under several conditions for some types of steels was investigated, besides the mechanism for nitrides deposition on glass substrate, concluding that the CCPN is both a diffusion and a deposition process at the same time / A nitreta??o i?nica ? um dos processos de revestimento superficial dos mais importantes, mas apresenta alguns problemas inerentes, principalmente, na nitreta??o de pe?as com geometria complexa. Nos ?ltimos quatro anos surgiu uma nova t?cnica de nitreta??o a plasma, denominada de ASPN (Active Screen Plasma Nitriding), na qual as amostras s?o envolvidas por uma tela polarizada catodicamente e com ela ? poss?vel obter uma camada nitretada, perfeitamente uniforme, independente da forma da amostra. O nosso trabalho baseia-se no desenvolvimento, no ?mbito do LabPlasma, de uma nova t?cnica de nitreta??o em plasma, denominada nitreta??o em gaiola cat?dica (NGC) dep?sito de patente PI 0603213-3 derivada da ASPN, mas que utiliza o efeito de c?todo oco para aumentar a efici?ncia do processo de nitreta??o. Esta t?cnica apresentou bastante efic?cia na nitreta??o de v?rios tipos de a?os, nas mais variadas condi??es de tratamento, proporcionando a obten??o de camadas mais espessas e de maior dureza, quando comparada com a ASPN e com a nitreta??o i?nica convencional, al?m de eliminar problemas de irregularidades associados ? t?cnica convencional. Sua maior efici?ncia deve-se ? utiliza??o do efeito de c?todo oco estabelecido nas paredes dos furos da gaiola, enquanto que a elimina??o dos problemas inerentes ? t?cnica convencional, deve-se ao fato do plasma atuar na gaiola e n?o nas amostras, as quais permanecem em potencial flutuante. Neste trabalho, foram avaliadas as condi??es de otimiza??o da nitreta??o, realizada com esta t?cnica, para diferentes tipos de a?os, al?m de investigarmos os mecanismos que atuam, quando da deposi??o de nitretos em substratos de vidro, observando que a NGC ? um processo misto de difus?o e deposi??o

Made available in DSpace on 2014-12-17T14:07:01Z (GMT). No. of bitstreams: 1 NataliaFD_DISSERT.pdf: 4136751 bytes, checksum: 47b384d6442f251d58542735c23ae300 (MD5) Previous issue date: 2012-02-27 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission Spectroscopy (OES) to investigate the influence of the active species in plasma. It was observed that increasing the H2 gas flow into the plasma the luminescent intensities associated to the species changed. In this case, the luminescence of N2 (391,4nm) species was not proportional to the increasing of the H2 gas into the reactor. Other parameters investigated were diameter and number of holes in the cage. The analysis by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are composed by TiN and they may have variations in the nitrogen amount into the crystal and in the crystallite size. The optical microscopy images provided information about the homogeneity of the films. The atomic force microscopy (AFM) results revealed some microstructural characteristics and surface roughness. The thickness was measured by ellipsometry. The optical properties such as transmittance and reflectance (they were measured by spectrophotometry) are very sensitive to changes in the crystal lattice of the material, chemical composition and film thicknesses. Therefore, such properties are appropriate tools for verification of this process control. In general, films obtained at 0 sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the films more stoichiometric and becomes it more crystalline. It was observed that with higher number of holes in the lid of the cage, close to the region between the lid and the sample and the smaller diameter of the hole, the deposited film is thicker, which is justified by the most probability of plasma species reach effectively the sample and it promotes the growth of the film / Filmes finos de nitreto de tit?nio foram crescidos sobre vidro utilizando a t?cnica de deposi??o por descarga em gaiola cat?dica a fim de averiguar a influ?ncia das vari?veis de processo nas propriedades ?pticas e estruturais do filme. Como atmosfera do plasma foi utilizada a mistura de gases Ar, N2 e H2, fixando o fluxo de Ar e N2 em 4 e 3 sccm, respectivamente, e usando fluxos de 0, 1 e 2 sccm de H2. O processo de deposi??o foi monitorado por Espectroscopia de Emiss?o ?ptica (OES) para investiga??o das esp?cies ativas no plasma. Observou-se que com o aumento fluxo de H2 as intensidades das esp?cies luminescentes no plasma sofrem altera??es e que a esp?cie N2 (391,4 nm) n?o teve um crescimento proporcional ao fluxo de H2. Outros par?metros investigados foram o di?metro e o n?mero de furos da gaiola. As an?lises de difra??o de raios X com ?ngulo de incid?ncia rasante (GIXRD) comprovaram que os filmes obtidos s?o compostos por TiN, podendo ter varia??es quanto a quantidade de nitrog?nio na rede e o tamanho de cristalito; a microscopia ?ptica forneceu dados sobre a homogeneidade, a partir da microscopia de for?a at?mica (AFM) observou-se algumas caracter?sticas microestruturais do filme e a rugosidade. A espessura foi quantificada atrav?s das an?lises de elipsometria. As propriedades ?pticas como reflet?ncia e transmit?ncia (medidas por espectrofotometria) s?o bastante sens?veis a altera??es na rede cristalina do material, composi??o qu?mica e espessura, sendo, portanto, uma boa ferramenta para verifica??o do controle do processo. De maneira geral, os filmes obtidos com fluxo de 0 sccm de H2 possuem uma maior transmit?ncia atribu?da ao menor cristalinidade decorrente da maior quantidade de nitrog?nio na rede cristalina do TiN. Os filmes obtidos nos fluxos de 1 e 2 sccm de H2 obtiveram um aspecto dourado e o difratograma apresentou picos caracter?sticos do TiN com maior intensidade e menor largura a meia altura, sugerindo que com a presen?a de hidrog?nio na atmosfera do plasma os filmes s?o mais estequiom?tricos e com maior cristalinidade. Quanto ? configura??o da gaiola observou-se que com maior quantidade de furos na tampa, maior a proximidade da tampa com a amostra e menor o di?metro do furo, maior ? a espessura do filme, o que ? justificado pela maior probabilidade das esp?cies do plasma atingirem efetivamente o substrato e promoverem o crescimento do filme

Made available in DSpace on 2014-12-17T14:07:06Z (GMT). No. of bitstreams: 1 PolianaRFS_DISSERT.pdf: 3998823 bytes, checksum: e0480a4a5d6b04450e748434898535a9 (MD5) Previous issue date: 2013-03-01 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / The technique of plasma nitriding by the cathode cage mainly stands out for its ability to produce uniform layers, even on parts with complex geometries. In this study, it was investigated the efficiency of this technique for obtaining duplex surface, when used, simultaneously, to nitriding treatment and thin film deposition at temperatures below 500?C. For this, were used samples of AISI 41 0 Martensitic Stainless Steel and performed plasma treatment, combining nitriding and deposition of thin films of Ti and/or TiN in a plasma atmosphere containing N2-H2. It was used a cathodic cage of titanium pure grade II, cylindrical with 70 mm diameter and 34 mm height. Samples were treated at temperature 420?C for 2 and 12 hours in different working pressures. Optical Microscopy (OM), Scanning Electron Microscopy (SEM) with micro-analysis by Energy Dispersive Spectroscopy (EDS), X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM) and analysis of Vickers Microhardness were used to investigate coating properties such as homogeneity and surface topography, chemical composition, layer thickness, crystalline phase, roughness and surface microhardness. The results showed there is a direct proportionality between the presence of H2 in plasma atmosphere and the quantity of titanium in surface chemical composition. It was also observed that the plasma treatment at lowpressure is more effective in formation of TiN thin film / A t?cnica de nitreta??o a plasma por gaiola cat?dica vem se destacando, principalmente, pela sua capacidade de produzir camadas uniformes mesmo em pe?as com geometria complexa. Neste trabalho, investigou-se a efici?ncia desta t?cnica para obten??o de superf?cie duplex, quando utilizada, simultaneamente, para tratamento de nitreta??o e deposi??o de filmes finos em temperaturas inferiores a 500?C. Para tal, foram utilizadas amostras do a?o inoxid?vel martens?tico AISI 410 e realizados tratamentos a plasma, combinando a nitreta??o e deposi??o de filmes finos de Ti e/ou TiN, em uma atmosfera contendo N2-H2. Foi utilizada uma gaiola cat?dica de tit?nio puro grau II em forma cil?ndrica, com 70 mm de di?metro e 34 mm de altura. As amostras foram tratadas numa temperatura de 420?C, com dura??o de 2 e 12 horas e em diferentes press?es de trabalho. Microscopia ?ptica (MO), Microscopia Eletr?nica de Varredura (MEV) com microan?lise por Espectroscopia de Energia Dispersiva (EDS), Difra??o de Raios-X (DRX), Microscopia de For?a At?mica (MFA) e ensaio de Microdureza Vickers foram empregados para investigar as propriedades do revestimento, tais como homogeneidade e topografia superficial, composi??o qu?mica, espessura da camada, fases cristalinas, rugosidade e microdureza superficial. Os resultados mostraram existir uma proporcionalidade direta entre a presen?a de H2 na atmosfera do plasma e a quantidade do elemento qu?mico tit?nio na composi??o qu?mica superficial. Observou-se, tamb?m, que o tratamento a plasma em baixa press?o ? mais eficaz na forma??o do filme fino de nitreto de tit?nio