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This thesis describes investigations into the role of non-stoichiometry in the surface and bulk properties of SrTiO₃ single crystals. A family of (n×n) reconstructions, where n = 2, 3, 4, 5, 6 are produced by argon ion sputtering of the SrTiO₃ (111) single crystals and subsequent annealing in UHV or in an oxygen rich environment. The sputtering process introduces defects or oxygen vacancies in the surface region of the sample, whilst the annealing gives rise to surface reconstructions. The surface preparation conditions such as sputtering time, annealing temperature and environment are optimized to obtain various reconstructions in a controlled and reproducible manner. High resolution STM images of these reconstructions are also obtained and utilized in the investigation of the surface reactivity. Fullerene molecules are deposited on the reconstructed surfaces to elucidate the surface reactivity through template assisted growth. Fullerene molecules are first deposited with substrate surfaces held at room temperature. Being the most highly reduced among the (n×n) family, the 5×5 reconstruction significantly influenced the growth of fullerenes. Both C₆₀ and C₇₀ adsorb as individual molecules and produce clusters with magic numbers. The 4×4 and 6×6 reconstructed surfaces encourage the formation of close-packed structures upon the deposition at room temperature. When the surface covered with fullerenes is heated to a temperature of around 200 °C, epitaxial islands are observed. The 6×6 reconstructed surface appeared to be less reactive than the 4×4. Electrical transport, cathodoluminescence (CL) and electron spin resonance (ESR) experiments are also carried out to investigate the effect of oxygen vacancies on the bulk properties of UHV annealed SrTiO₃ single crystals. Thermal reduction leads to carrier doping of the material, which not only gives rise to electrical conduction but also induces room temperature luminescence. Both the electrical conductivity and CL intensity increases with annealing time. The work presented in this thesis provides insight into the defect driven properties in both the surface and bulk of SrTiO₃ single crystals, which could play an important role in the development of oxide-based electronic devices.

In dieser Dissertation wird die spektrale und örtliche Verteilung der Lumineszenz von Heterostrukturen in selbstorganisierten Nanodrähten (ND) mit Hilfe von Kathodolumineszenz-Spektroskopie (KL) im Rasterelektronenmikroskop untersucht. Diese Methode wird ergänzt durch Messungen der kontinuierlichen und zeitaufgelösten Mikro-Photolumineszenz. Drei verschiedene Strukturen werden behandelt: (i) GaAs-ND bestehend aus Segmenten der Wurtzit (WZ) bzw. Zinkblende (ZB) Kristallstrukturen, (ii) auf GaN-ND überwachsene GaN-Mikrokristalle und (iii) (In,Ga)N Einschlüsse in GaN-ND. Die gemischte Kristallstruktur der GaAs-ND führt zu komplexen Emissionsspektren. Dabei wird entweder ausschließlich Lumineszenz bei Energien unterhalb der ZB Bandlücke, oder aber zusätzlich bei höheren Energien, gemessen. Diese Differenz wird durch unterschiedliche Dicken der ZB und WZ Segmente erklärt. Messungen bei Raumtemperatur zeigen, dass die Bandlücke von WZ-GaAs mindestens 55 meV größer als die von ZB-GaAs ist. Die Lumineszenz-Spektren der GaN-Mikrokristalle enthalten verschiedene Emissionslinien, die auf Stapelfehler (SF) zurückzuführen sind. SF sind ZB Quantentöpfe verschiedener Dicke in einem WZ-Kristall und es wird gezeigt, dass ihre Emissionsenergie durch die spontane Polarisation bestimmt wird. Aus einer detaillierten statistischen Analyse der Emissionsenergien der verschiedenen SF-Typen werden Emissionsenergien von 3.42, 3.35 und 3.29 eV für die intrinsischen (I1 und I2) sowie für extrinsische SF ermittelt. Aus den entsprechenden Energiedifferenzen wird -0.022C/m² als experimenteller Wert für die spontane Polarisation von GaN bestimmt. Die Bedeutung sowohl der piezoelektrischen Polarisation als auch die der Lokalisierung von Ladungsträgern wird für (In,Ga)N-Einschlüsse in GaN-ND gezeigt. Hierbei spielt nicht nur die Lokalisierung von Exzitonen, sondern auch die individueller Elektronen und Löcher an unterschiedlichen Potentialminima eine Rolle. / In this thesis, the spectral and spatial luminescence distribution of heterostructures in self-induced nanowires (NWs) is investigated by cathodoluminescence spectroscopy in a scanning electron microscope. This method is complemented by data from both continuous and time-resolved micro-photoluminescence measurements. Three different structures are considered: (i) GaAs NWs containing segments of the wurtzite (WZ) and zincblende (ZB) polytypes, (ii) GaN microcrystals overgrown on GaN NWs, and (iii) (In,Ga)N insertions embedded in GaN NWs. The polytypism of GaAs NWs results in complex emission spectra. The observation of luminescence either exclusively at energies below the ZB band gap or also at higher energies is explained by differences in the distribution of ZB and WZ segment thicknesses. Measurements at room temperature suggest that the band gap of WZ GaAs is at least 55 meV larger than that of the ZB phase. The luminescence spectra of the GaN microcrystals contain distinct emission lines associated with stacking faults (SFs). SFs essentially constitute ZB quantum wells of varying thickness in a WZ matrix and it is shown that their emission energy is dominated by the spontaneous polarization. Through a detailed statistical analysis of the emission energies of the different SF types, emission energies of 3.42, 3.35 and 3.29 eV are determined for the intrinsic (I1 and I2) as well as the extrinsic SFs, respectively. From the corresponding energy differences, an experimental value of -0.022C/m² is derived for the spontaneous polarization of GaN. The importance of both carrier localization and the quantum confined Stark effect induced by the piezoelectric polarization is shown for the luminescence of (In,Ga)N insertions in GaN NWs. Not only localized excitons, but also electrons and holes individually localized at different potential minima contribute to the observed emission.

L'objectif de ce travail de thèse est d'étudier expérimentalement le transport d'électrons chauds dépendant du spin à travers une jonction métal ferromagnétique / semi-conducteur. En pratique, un faisceau d'électrons polarisés de spin, émis par une photocathode GaAs en condition de pompage optique, est injecté dans la jonction. L'énergie d'injection peut être réglée entre 5 et 3000 eV. Le courant transmis au-dessus de la barrière métal / semi-conducteur montre une asymétrie de spin due à l'effet de filtre à spin de la couche magnétique. Pour la détection directe du courant électrique transmis dans un dispositif métal / semi-conducteur, on a besoin d'une structure ayant un fort caractère redresseur avec une résistance dynamique de jonction très élevée (typiquement quelques MΩ). Ces propriétés sont obtenus par l'introduction d'une couche mince (de quelques nanomètres) interfaciale d'oxyde entre le métal et le semi-conducteur (structure de type MIS). Nous montrons que la transmission d'électrons chands et les effets de filtre à spin à travers les structures MIS dépendent fortement la couche d'oxyde. Afin de surmonter les difficultés relatives à la détection électrique de la transmission d'électrons dans les jonctions MIS, nous avons développé une méthode de détection optique basée sur la mesure de la cathodoluminescence émise par la recombinaison d'électrons transmis dans le collecteur semi-conducteur. Pour ce faire, nous avons conçu la structure Fe / GaAs / InGaAs / GaAs, qui comprend les puits quantiques InGaAs, dans lesquels les électrons transmis à travers la jonction se recombinent avec les trous. L'intensité de la lumière de recombinaison est détectée en face arrière du substrat GaAs. Nous démontrons que cette technique permet en effet la détection optique de la transmission d'électrons et de l'effet de filtre à spin dans les structures métal ferromagnétique / semi-conducteur. Les limites et les perspectives de la spectroscopie de cathodoluminescence sont discutées.

At present, focus of the SiC crystal growth development is on improving the crystalline quality without polytype inclusions, micropipes and the occurrence of extended defects. The purity of the grown material, as well as intentional doping must be well controlled and the processes understood. High-quality substrates will significantly improve device performance and yield. One of the aims of the thesis is further understanding of polytype inclusion formation as well as impurity control in SiC bulk crystals grown using PVT method also termed seeded sublimation method. Carbonization of the source was identified as a major reason behind the polytype inclusion occurrence during the growth. The aim of this work was further understanding of sublimation growth process of 4H-SiC bulk crystals in vacuum, in absence of an inert gas. For comparison growth in argon atmosphere (at 5 mbar) was performed. The effect of the ambient on the impurity incorporation was studied for different growth temperatures. For better control of the process in vacuum, tantalum as a carbon getter was utilized. The focus of the SiC part of the thesis was put on further understanding of the PVT epitaxy with an emphasis on the high growth rate and purity of grown layers. High resistivity 4H-SiC samples grown by sublimation with high growth rate were studied. The measurements show resistivity values up to high 104 cm. By correlation between the growth conditions and SIMS results, a model was applied in which it is proposed that an isolated carbon vacancy donor-like level is a possible candidate responsible for compensation of the shallow acceptors in p-type 4H-SiC. A relation between cathodoluminescence (CL) and DLTS data is taken into account to support the model. To meet the requirements for high voltage blocking devices such as high voltage Schottky diodes and MOSFETs, 4H-SiC epitaxial layers have to exhibit low doping concentration in order to block reverse voltages up to few keV and at the same time have a low on-state resistance (Ron). High Ron leads to enhanced power consumption in the operation mode of the devices. In growth of thick layers for high voltage blocking devices, the conditions to achieve good on-state characteristics become more challenging due to the low doping and pronounced thicknesses needed, preferably in short growth periods. In case of high-speed epitaxy such as the sublimation, the need to apply higher growth temperature to yield the high growth rate, results in an increased concentration of background impurities in the layers as well as an influence on the intrinsic defects. On-state resistance Ron estimated from current density-voltage characteristics of Schottky diodes on thick sublimation layers exhibits variations from tens of mΩ.cm2 to tens of Ω.cm2 for different doping levels. In order to understand the occurrence of high on-state resistance, Schottky barrier heights were first estimated for both forward and reverse bias with the application of thermionic emission theory and were in agreement with literature reported values. Decrease in mobility with increasing temperature was observed and its dependencies of T–1.3 and T–2.0 for moderately doped and low doped samples, respectively, were estimated. From deep level measurements by Minority Carrier Transient Spectroscopy (MCTS), an influence of shallow boron related levels and D-center on the on-state resistance was observed, being more pronounced in low doped samples. Similar tendency was observed in depth profiling of Ron. This suggests a major role of boron in a compensation mechanism. In the second part of the thesis growth and characterization of GaN is presented. Excellent electron transport properties with high electron saturate drift velocity make GaN an excellent candidate for electronic devices. Especially, AlGaN/GaN based high electron mobility transistors (HEMT) have received an increased attention in last years due to their attractive properties. The presence of strong spontaneous and piezoelectric polarization due to the lattice mismatch between AlGaN and GaN is responsible for high free electrons concentrations present in the vicinity of the interface. Due to the spatial separation of electrons and ionized donors or surface states, 2DEG electron gas formed near the interface of the heterostructure exhibits high sheet carrier density and high mobility of electrons. Al0.23Ga0.77N/GaN based HEMT structures with an AlN exclusion layer on 100 mm semiinsulating 4H-SiC substrates have been grown by hot-wall MOCVD. The electrical properties of the two-dimensional electron gas (2DEG) such as electron mobility, sheet carrier density and sheet resistance were obtained from Hall measurements, capacitance-voltage and contact-less eddy-current techniques. The effect of different scattering mechanisms on the mobility have been taken into account and compared to the experimental data. Hall measurements were performed in the range of 80 to 600 K. Hall electron mobility is equal to 17140 cm2(Vs)-1 at 80 K, 2310 cm2(Vs)-1 at room temperature, and as high as 800 cm2(Vs)-1 at 450 K, while the sheet carrier density is 1.04x1013 cm-2 at room temperature and does not vary very much with temperature. Estimation of different electron scattering mechanisms reveals that at temperatures higher than room temperature, experimental mobility data is mainly limited by optical phonon scattering. At relevant high power device temperature (450 K) there is still an increase of mobility due to the AlN exclusion layer. We have studied the behaviour of Ga-face GaN epilayers after in-situ thermal treatment in different gas mixtures in a hot-wall MOCVD reactor. Influence of N2, N2+NH3 and N2+NH3+H2 ambient on the morphology was investigated in this work. The most stable thermal treatment conditions were obtained in the case of N2+NH3 gas ambients. We have also studied the effect of the increased molar ratio of hydrogen in order to establish proper etching conditions for hot-wall MOCVD growth.

Dans la perspective de la réalisation de luminophores pour écrans cathodiques, une étude de la luminescence de l'europium dans des réseaux-hôtes soufres caracterisés par une large bande interdite a été réalisée. La première partie porte sur l'élaboration des sulfures MS et la détermination des facteurs influençant leurs rendements de photoluminescence et de cathodoluminescence. La seconde est consacrée a l'étude des systèmes MS-Al2S3 et MS-SiS2. De nouveaux thioaluminates ont ete isoles; les donnees cristallographiques sur les thiosilicates ont été complétées. La dernière partie rassemble les résultats d' une étude comparative de la luminescence de Eu2+ dans les thioaluminates, thiogallates et thiosilicates alcalino-terreux: distribution spectrale, rendements, extinction thermique...

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