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Gate Control Theory and its Application in a Physical Intervention to Reduce Children's Pain during Immunization InjectionsMennuti-Washburn, Jean Eleanor 06 August 2007 (has links)
Vaccinations provide protection against deadly diseases and children are scheduled to receive many immunization injections before the age of six. However, painful procedures, such as immunizations cause negative short- and long-term consequences for children. The Gate Control Theory of Pain suggests that physical interventions may be helpful, but they have not yet been validated as an effective intervention to manage children’s acute pain. This randomized trial examined the effectiveness of the ShotBlocker®, a physical intervention designed to decrease children’s injection pain, in a sample of 89 4- to 12- year-old children receiving immunizations at a pediatric practice. An ANOVA revealed no significant effect of treatment group (Typical Care Control, Placebo, and ShotBlocker®) on any measure of child distress. Clinical and theoretical implications are discussed.
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Adaptive Analog VLSI Signal Processing and Neural NetworksDugger, Jeffery Don 26 November 2003 (has links)
Research presented in this thesis provides
a substantial leap from the study of interesting
device physics to fully adaptive analog networks
and lays a solid foundation for future development
of large-scale, compact, low-power adaptive parallel
analog computation systems.
The investigation described here started with
observation of this potential learning capability
and led to the first derivation and characterization of
the floating-gate pFET correlation learning rule.
Starting with two synapses sharing the same error signal,
we progressed from phase correlation experiments
through correlation experiments involving harmonically related sinusoids,
culminating in learning the Fourier series coefficients
of a square wave cite{kn:Dugger2000}.
Extending these earlier two-input node experiments to the general case
of correlated inputs required dealing with
weight decay naturally exhibited by the learning rule.
We introduced a source-follower floating-gate synapse
as an improvement over our earlier source-degenerated floating-gate synapse
in terms of relative weight decay cite{kn:Dugger2004}.
A larger network of source-follower floating-gate synapses was fabricated
and an FPGA-controlled testboard was designed and built.
This more sophisticated system provides an excellent
framework for exploring applications to multi-input, multi-node
adaptive filtering applications.
Adaptive channel equalization provided
a practical test-case illustrating the use
of these adaptive systems in solving real-world problems.
The same system could easily be applied to noise and echo cancellation
in communication systems and system identification tasks in
optimal control problems.
We envision the commercialization of these adaptive analog VLSI
systems as practical products within a couple of years.
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Fabrication and Simulation of the Bottom Gate Thin Film Transistor with Smart Body TieLin, Shih-tsong 31 July 2006 (has links)
In this thesis, a bottom gate TFT with smart body tie device is realized, For a PDSOI devices, which usually uses large layout areas of body ties, and it has self-heating effect resulting from the buried oxide between the silicon film and substrate, which has a lower thermal conductivity.
In order to suppress the short channel effect and reduce leakage current, we dug out in advance the PN junction to formed the ultra thin film body, besides, in order to reduce Miller's capacitance effect we formed enough thickness of spacer at both sides of the bottom gate and let the source and the drain region do not too closer nearly.
According to the simulation results of ISE TCAD, the TFT with smart body tie device can alleviate self-heating effect and can achieve kink-free at output characteristic curve due to hot carriers by impact ionization and enhance the breakdown voltage of the device. Although the drive current of the TFT device lower than conventional TFT due to the parasitic resistance in the body region, the output characteristic curve is smooth in the saturation zone; the device suppress the short channel effect and improve the performance of the device due to most areas of PN junction are dug out.
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Zirconium-doped tantalum oxide high-k gate dielectric filmsTewg, Jun-Yen 17 February 2005 (has links)
A new high-k dielectric material, i.e., zirconium-doped tantalum oxide (Zr-doped TaOx), in the form of a sputter-deposited thin film with a thickness range of 5-100 nm, has been studied. Important applications of this new dielectric material include the gate dielectric layer for the next generation metal-oxide-semiconductor field effect transistor (MOSFET). Due to the aggressive device scaling in ultra-large-scale integrated circuitry (ULSI), the ultra-thin conventional gate oxide (SiO2) is unacceptable for many practical reasons. By replacing the SiO2 layer with a high dielectric constant material (high-k), many of the problems can be solved. In this study, a novel high-k dielectric thin film, i.e., TaOx doped with Zr, was deposited and studied. The films electrical, chemical, and structural properties were investigated experimentally. The Zr dopant concentration and the thermal treatment condition were studied with respect to gas composition, pressure, temperature, and annealing time. Interface layer formation and properties were studied with or without an inserted thin tantalum nitride (TaNx) layer. The gate electrode material influence on the dielectric properties was also investigated. Four types of gate materials, i.e., aluminum (Al), molybdenum (Mo), molybdenum nitride (MoN), and tungsten nitride (WN), were used in this study. The films were analyzed with ESCA, XRD, SIMS, and TEM. Films were made into MOS capacitors and characterized using I-V and C-V curves. Many promising results were obtained using this kind of high-k film. It is potentially applicable to future MOS devices.
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Impact Of Body Center Potential On The Electrostatics Of Undoped Body Multi Gate Transistors : A Modeling PerspectiveRay, Biswajit 06 1900 (has links)
Undoped body multi gate (MG) Metal Oxide Semiconductor Field Effect Transistors (MOSFET) are appearing as replacements for single gate bulk MOSFET in forthcoming sub-45nm technology nodes. It is therefore extremely necessary to develop compact models for MG transistors in order to use them in nano-scale integrated circuit design and simulation. There is however a sharp distinction between the electrostatics of traditional bulk transistors and undoped body devices. In bulk transistor, where the substrate is sufficiently doped, the inversion charges are located close to the surface and hence the surface potential solely controls the electrostatic integrity of the device. However, in undoped body devices, gate electric field penetrates the body center, and inversion charge exists throughout the body. In contrast to the bulk transistors, depending on device geometry, the potential of the body center of undoped body devices could be higher than the surface in weak inversion regime and the current flows through the center-part of the device instead of surface. Several crucial parameters (e.g. Sub-threshold slope) sometimes become more dependable on the potential of body center rather than the surface. Hence the body-center potential should also be modeled correctly along with the surface-potential for accurate calculation of inversion charge, threshold voltage and other related parameters of undoped body multi-gate transistors. Although several potential models for MG transistors have been proposed to capture the short channel behavior in the subthreshold regime but most of them are based on the crucial approximation of coverting the 2D Poisson’s equation into Laplace equation. This approximation holds good only at surface but breaks down at body center and in the moderate inversion regime. As a result all the previous models fail to capture the potential of body center Correctly and remain valid only in weak-inversion regime.
In this work we have developed semiclassical compact models for potential distribution for double gate (DG) and cylindrical Gate-All-Around (GAA) transistors. The models are based on the analytical solution of 2D Poisson’s equation in the channel region and valid for both: a) weak and strong inversion regimes, b) long channel and short channel transistors, and, c) body surface and center. Using the proposed model, for the first time, it is demonstrated that the body potential versus gate voltage characteristics for the devices having equal channel lengths but different body thicknesses pass through a single common point (termed as crossover point). Using the concept of “crossover point” the effect of body thickness on the threshold voltage of undoped body multi-gate transistors is explained. Based on the proposed body potential model, a new compact model for the subthreshold swing is formulated. Some other parameters e.g. inversion charge, threshold voltage roll-off etc are also studied to demonstrate the impact of body center potential on the electrostatics of multi gate transistor. All the models are validated against professional numerical device simulator.
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A Verilog 8051 soft core for FPGA applicationsRangoonwala, Sakina. Kougianos, Elias, January 2009 (has links)
Thesis (M.S.)--University of North Texas, August, 2009. / Title from title page display. Includes bibliographical references.
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Efficient elliptic curve processor architectures for field programmable logicOrlando, Gerardo. January 2002 (has links)
Thesis (Ph. D.)--Worcester Polytechnic Institute. / Keywords: computer arithmetic; elliptic curves; cryptography. Includes bibliographical references (p. 299-305).
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Electrical and physical analysis of ultra-thin in-situ steam generated (ISSG) SiO₂ and nitride/oxide stacks for ULSI application /Luo, Tien-ying, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 120-134). Available also in a digital version from Dissertation Abstracts.
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Source level debugging of circuits synthesized from high level language descriptions /Hemmert, Karl S., January 2004 (has links) (PDF)
Thesis (Ph. D.)--Brigham Young University. Dept. of Electrical and Computer Engineering, 2004. / Includes bibliographical references (p. 143-149).
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Voltage and temperature dependent gate capacitance and current model for high-K gate dielectric stackFan, Yang-yu. January 2002 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
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