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Wachstumsanalyse amorpher dicker Schichten und Schichtsysteme / Growth analysis of thick amorphous films and multilayersStreng, Christoph 18 May 2004 (has links)
No description available.
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Wachstumsanalyse amorpher dicker Schichten und Schichtsysteme / Growth analysis of thick amorphous films and multilayersStreng, Christoph 18 May 2004 (has links)
No description available.
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Hydrogen in V-Fe thin films and Fe/V-Fe multi-layered thin films / Wasserstoff in V-Fe dünnen Schichten und V-Fe/Fe mehrfachschchtenGemma, Ryota 04 May 2011 (has links)
No description available.
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Mechanische Spannungen und Mikrostruktur dünner TiNi- und Ti50Ni50-xCux-Formgedächtnisschichten / Mechanical stresses and microstructure of TiNi and Ti50Ni50-xCux shape memory thin filmsHarms, Henning 06 May 2003 (has links)
No description available.
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Structural and magnetic properties of ultrathin Fe3O4 films: cation- and lattice-site-selective studies by synchrotron radiation-based techniquesPohlmann, Tobias 19 August 2021 (has links)
This work investigates the growth dynamic of the reactive molecular beam epitaxy of Fe3O4 films, and its impact on the cation distribution as well as on the magnetic and structural properties at the surface and the interfaces. In order to study the structure and composition of Fe3O4 films during growth, time-resolved high-energy x-ray diffraction (tr-HEXRD) and time-resolved hard x-ray photoelectron spectroscopy (tr-HAXPES) measurements are used to monitor the deposition process of Fe3O4 ultrathin films on SrTiO3(001), MgO(001) and NiO/MgO(001). For Fe3O4\SrTiO3(001) is found that the film first grows in a disordered island structure, between thicknesses of 1.5nm to 3nm in FeO islands and finally in the inverse spinel structure of Fe3O4, displaying (111) nanofacets on the surface. The films on MgO(001) and NiO/MgO(001) show a similar result, with the exception that the films are not disordered in the early growth stage, but form islands which immediately exhibit a crystalline FeO phase up to a thickness of 1nm. After that, the films grown in the inverse spinel structure on both MgO(001) and NiO/MgO(001). Additionally, the tr-HAXPES measurements of Fe3O4/SrTiO3(001) demonstrate that the FeO phase is only stable during the deposition process, but turns into a Fe3O4 phase when the deposition is interrupted. This suggests that this FeO layer is a strictly dynamic property of the growth process, and might not be retained in the as-grown films. In order to characterize the as-grown films, a technique is introduced to extract the cation depth distribution of Fe3O4 films from magnetooptical depth profiles obtained by fitting x-ray resonant magnetic reflectivity (XRMR) curves. To this end, x-ray absorption (XAS) and x-ray magnetic circular dichroism (XMCD) spectra are recorded as well as XRMR curves to obtain magnetooptical depth profiles. To attribute these magnetooptical depth profiles to the depth distribution of the cations, multiplet calculations are fitted to the XMCD data. From these calculations, the cation contributions at the three resonant energies of the XMCD spectrum can be evaluated. Recording XRMR curves at those energies allows to resolve the magnetooptical depth profiles of the three iron cation species in Fe3O4. This technique is used to resolve the cation stoichiometry at the surface of Fe3O4/MgO(001) films and at the interfaces of Fe3O4/MgO(001) and Fe3O4/NiO. The first unit cell of the Fe3O4(001) surface shows an excess of Fe3+ cations, likely related to a subsurface cation-vacancy reconstruction of the Fe3O4(001) surface, but the magnetic order of the different cation species appears to be not disturbed in this reconstructed layer. Beyond this layer, the magnetic order of all three iron cation species in Fe3O4/MgO(001) is stable for the entire film with no interlayer or magnetic dead layer at the interface. For Fe3O4/NiO films, we unexpectedly observe a magnetooptical absorption at the Ni L3 edge in the NiO film corresponding to a ferromagnetic order throughout the entire NiO film, which is antiferromagnetic in the bulk. Additionally, the magnetooptical profiles indicate a single intermixed layer containing both Fe2+ and Ni2+ cations.
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Magnetische Hybridschichten - Magnetische Eigenschaften lokal austauschgekoppelter NiFe/IrMn-SchichtenHamann, Christine 15 December 2010 (has links)
Durch die laterale Modifizierung der magnetischen Eigenschaften von austauschgekoppelten NiFe/IrMn-Schichten wurden weichmagnetische Schichten geschaffen, die sowohl neue statische als auch dynamische hybride Eigenschaften zeigen. Als laterale Strukturierungsmethoden wurden hierbei die lokale Oxidation sowie Ionenimplantation verwendet. Mit Hilfe dieser Verfahren ist es gelungen spezifische magnetische Domänenkonfigurationen mit Streifenstrukturen nominell antiparalleler Magnetisierungsausrichtung in die Schichten einzuprägen. In Abhängigkeit der Strukturorientierung sowie Streifenperiode konnte direkt das Ummagnetisierungsverhalten sowie die magnetische Resonanzfrequenz und Dämpfung der Schichten modifiziert werden. Die neuen dynamischen Eigenschaften wie z.B. eine hybride Resonanzfrequenz werden hierbei im Rahmen der Kopplung über dynamische Ladungen und die direkte Beeinflussung des effektiven Feldes des künstlich eingebrachten Domänenzustandes diskutiert. Die vorgestellten Ergebnisse belegen somit das große Potential der lateralen Magneto-Strukturierung zur Einstellung spezifischer statischer wie auch dynamischer Eigenschaften magnetisch dünner Schichten.
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Investigation of the growth process of thin iron oxide films: Analysis of X-ray Photoemission Spectra by Charge Transfer Multiplet calculationsSuendorf, Martin 19 December 2012 (has links)
Thin metallic films with magnetic properties like magnetite are an interesting material in current technological applications. In the presented work the iron oxide films are grown by molecular beam epitaxy on MgO(001) substrates at temperatures between room temperature and 600K. The film and surface structure are investigated by x-ray reflectometry (XRR), x-ray diffraction (XRD) and low energy electron diffraction (LEED). The chemical properties are investigated by x-ray photoelectron spectroscopy (XPS). Furthermore, charge transfer multiplet (CTM) calculations are performed as a means to gain additional information from photoemission spectra. It is shown that only for temperatures higher than 500K the oxide film forms a spinel structure. A previously unobserved (2x1) surface reconstruction in two orthogonal domains is found for various preparation conditions. The application of CTMs results in good quantitative and qualitative agreement to other methods for the determination of the film stoichiometry. In addition CTMs can well describe the segregation of Mg atoms into the oxide film either during film growth or during film annealing. It is found that initially Mg substitutes Fe on all possible lattice sites, only for prolonged treatment at high temperature do Mg atoms favour the octahedral lattice sites of divalent Fe.
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Atomistische Modellierung und Simulation des Filmwachstums bei GasphasenabscheidungenLorenz, Erik E. 27 November 2014 (has links)
Gasphasenabscheidungen werden zur Produktion dünner Schichten in der Mikro- und Nanoelektronik benutzt, um eine präzise Kontrolle der Schichtdicke im Sub-Nanometer-Bereich zu erreichen. Elektronische Eigenschaften der Schichten werden dabei von strukturellen Eigenschaften determiniert, deren Bestimmung mit hohem experimentellem Aufwand verbunden ist.
Die vorliegende Arbeit erweitert ein hochparalleles Modell zur atomistischen Simulation des Wachstums und der Struktur von Dünnschichten, welches Molekulardynamik (MD) und Kinetic Monte Carlo-Methoden (KMC) kombiniert, um die Beschreibung beliebiger Gasphasenabscheidungen. KMC-Methoden erlauben dabei die effiziente Betrachtung der Größenordnung ganzer Nano-Bauelemente, während MD für atomistische Genauigkeit sorgt.
Erste Ergebnisse zeigen, dass das Parsivald genannte Modell Abscheidungen in Simulationsräumen mit einer Breite von 0.1 µm x 0.1 µm effizient berechnet, aber auch bis zu 1 µm x 1 µm große Räume mit 1 Milliarden Atomen beschreiben kann. Somit lassen sich innerhalb weniger Tage Schichtabscheidungen mit einer Dicke von 100 Å simulieren. Die kristallinen und amorphen Schichten zeigen glatte Oberflächen, wobei auch mehrlagige Systeme auf die jeweilige Lagenrauheit untersucht werden. Die Struktur der Schicht wird hauptsächlich durch die verwendeten molekulardynamischen Kraftfelder bestimmt, wie Untersuchungen der physikalischen Gasphasenabscheidung von Gold, Kupfer, Silizium und einem Kupfer-Nickel-Multilagensystem zeigen. Stark strukturierte Substrate führen hingegen zu Artefakten in Form von Nanoporen und Hohlräumen aufgrund der verwendeten KMC-Methode. Zur Simulation von chemischen Gasphasenabscheidungen werden die Precursor-Reaktionen von Silan mit Sauerstoff sowie die Hydroxylierung von alpha-Al2O3 mit Wasser mit reaktiven Kraftfeldern (ReaxFF) berechnet, allerdings ist weitere Arbeit notwendig, um komplette Abscheidungen auf diese Weise zu simulieren.
Mit Parsivald wird somit die Erweiterung einer Software präsentiert, die Gasphasenabscheidungen auf großen Substraten effizient simulieren kann, dabei aber auf passende molekulardynamische Kraftfelder angewiesen ist.:Inhaltsverzeichnis
Abbildungsverzeichnis
Tabellenverzeichnis
Abkürzungsverzeichnis
Symbolverzeichnis
1 Einleitung
2 Grundlagen
2.1 Gasphasenabscheidungen
2.1.1 Physikalische Gasphasenabscheidung
2.1.2 Chemische Gasphasenabscheidung
2.1.3 Atomlagenabscheidung
2.1.4 Methoden zur Simulation von Gasphasenabscheidungen
2.2 Molekulardynamik
2.2.1 Formulierung der Molekulardynamik
2.2.2 Auswahl verfügbarer Molekulardynamik-Software
2.2.3 Molekulardynamische Kraftfelder
2.3 Kinetic Monte Carlo-Methoden
2.4 Datenstrukturen
2.4.1 Numerische Voraussetzungen an Gasphasenabscheidungen
2.4.2 Vergleich der Laufzeiten für verschiedene Datenstrukturen
2.4.3 Effiziente Datenstrukturen
2.4.4 Alpha-Form
3 Methoden und Modelle
3.1 Stand der Forschung
3.1.1 Anwendungen von KMC-Simulationen für die Gasphasenabscheidung
3.1.2 Anwendung von MD-Simulationen für die Gasphasenabscheidung
3.2 Parsivald-Modell
3.2.1 Zielsetzung für Parsivald
3.2.2 Beschreibung des Parsivald-Modells
3.2.3 Annahmen und Einschränkungen
3.2.4 Erweiterungen im Rahmen der Masterarbeit
3.2.5 Behandlung von fehlerhaften Ereignissen
3.3 Laufzeitanalyse von Parsivald-Simulationen
3.3.1 Ereignis-Laufzeit TE
3.3.2 Ereignis-Durchsatz RE
3.3.3 MD-Laufzeit TMD
3.3.4 Worker-Laufzeit Tworker
3.3.5 Serielle Laufzeit T1
3.3.6 Anzahl der parallelen Prozesse p
3.3.7 Workerdichte rhoworker
3.3.8 Parallele Laufzeit Tp
3.3.9 Speedup Sp
3.3.10 Parallele Effizienz Ep
3.3.11 Auswertung der Laufzeitparameter
3.3.12 Fazit
3.4 MD-Simulationen: Methoden und Auswertungen
3.4.1 Zeitskalen in MD-Simulationen
3.4.2 Relaxierungen
3.4.3 Strukturanalysen
3.4.4 Bestimmung der Dichte und Temperatur
3.4.5 Radiale Verteilungsfunktionen, Bindungslänge und Koordinationszahl
3.4.6 Oberfläche, Schichtdicke, Rauheit und Porösität
3.4.7 Reaktionen und Stabilität von Molekülen
4 Simulationen von Gasphasenabscheidungen
4.1 Gold-PVD
4.1.1 Voruntersuchungen
4.1.2 Thermodynamische Eigenschaften
4.1.3 Simulation von Gold-PVD
4.1.4 Skalierbarkeit mit der Simulationsgröße
4.1.5 Fazit
4.2 Kupfer-PVD
4.2.1 Voruntersuchungen
4.2.2 Thermodynamische Eigenschaften
4.2.3 Simulation von Kupfer-PVD
4.2.4 Untersuchung der maximalen Workerdichte
4.2.5 Fazit
4.3 Multilagen-PVD
4.3.1 Multilagen-Simulationen mit Parsivald
4.3.2 Vergleich mit Ergebnissen reiner MD-Simulationen
4.3.3 Vergleich der Parallelisierbarkeit
4.3.4 Fazit
4.4 Silizium-PVD
4.4.1 Voruntersuchungen
4.4.2 Simulationen von Silizium-PVD
4.4.3 Fazit
4.5 Aluminiumoxid-ALD
4.5.1 ReaxFF-Parametersätze
4.5.2 Voruntersuchungen
4.5.3 Fazit
5 Zusammenfassung und Ausblick
5.1 Zusammenfassung
5.2 Ausblick
A Physikalische Konstanten und Stoffeigenschaften
B Datenstrukturen
B.1 Übersicht über KMC-Operationen
B.2 Beschreibung grundlegender Datenstrukturen
B.3 Delaunay-Triangulationen
B.3.1 Ausgewählte Eigenschaften einer Delaunay-Triangulation
B.3.2 Algorithmen zur Konstruktion einer Delaunay-Triangulation
C Ergänzungen zur Laufzeitanalyse von Parsivald
C.1 Einfluss der Ereignis-Laufzeit auf die effiziente Raumgröße weff
C.2 Zusätzliche Einflüsse auf das Maximum der Prozesse pmax
C.3 Abschätzung der maximalen Workerdichte per Random Sequential Adsorption
D Ergänzungen zur Simulation von Gold-PVD
E Multilagen-PVD
E.1 Porenbildung bei Unterrelaxation
E.2 Simulationen mit Lagendicken von jeweils 5 nm
F Simulation der CVD-Precursormoleküle Silan und Sauerstoff
F.1 Stabilität der Precursormoleküle
F.2 Reaktion der Precursormoleküle
Literaturverzeichnis
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Structural and Thermoelectric Properties of Binary and Ternary Skutterudite Thin FilmsDaniel, Marcus 02 April 2015 (has links)
Increasing interest in an effciency enhancement of existing energy sources led to an extended research in the field of thermoelectrics. Especially skutterudites with their high power factor (electric conductivity times Seebeck coefficient squared) are suitable thermoelectric materials. However, a further improvement of their thermoelectric properties is necessary. The relatively high thermal conductivity can be decreased by introducing loosely bound guest ions, whereas atom substitution or nanostructuring (as thin films) could yield an increased power factor.
The present work proves the feasibility to deposit single phase skutterudite thin films by MBE technique. In this regard CoSby and FeSby film series were deposited with three different methods: i) codeposition at elevated temperatures, ii) codeposition at room temperature followed by post-annealing, and iii) modulated elemental reactant method. The structural and thermoelectric properties of these films were investigated by taking the thermal stability of the film and the substrate properties into account. Compared to the stoichiometric Sb content of skutterudites of 75 at.%, a small excess of Sb is necessary for achieving single phase skutterudite films. It was found, that the deposited single phase CoSb3 films reveal bipolar conduction (and therefore a low Seebeck coefficient), whereas FeSb3 films show p-type conduction and very promising power factors at room temperature.
The need of substrates with a low thermal conductivity and a suitable thermal expansion coefficient is also demonstrated. A high thermal conductivity influences the measurements of the Seebeck coefficient and the obtained values will be underestimated by thermal shortening of the film by the substrate. If the thermal expansion coefficient of film and substrate differ strongly from each other, crack formation at the film surface was observed.
Furthermore, the realization of controlled doping by substitution as well as the incorporation of guest ions was successfully shown. Hence, this work is a good starting point for designing skutterudite based thin film structures. Two successful examples for such structures are given: i) a thickness series, where a strong decrease of the resistivity was observed for films with a thickness lower than 10nm, and ii) a FexCo1-xSb3 gradient film, for which the gradient was maintained even at an annealing temperature of 400°C.:Contents
1 Introduction
2 Nanostructured thermoelectric materials
2.1 Thermoelectric materials and ZT
2.2 Recent developments in improving ZT in thin films
3 Thermoelectric transport theory
3.1 Electronic transport coefficients
3.2 Lattice thermal conductivity
4 Skutterudites as promising thermoelectric material
4.1 CoSb3
4.1.1 Structural properties of skutterudites
4.1.2 Band structure of CoSb3 and density of states
4.1.3 Thermoelectric properties of CoSb3
4.1.4 Synthesis of CoSb3 thin films
4.2 FeSb3
4.2.1 Structural and thermoelectric properties of FeSb3 thin films
4.2.2 Synthesis of FeSb3 thin films
5 Experimental methods
5.1 Basic methods for structural characterization
5.2 Electric characterization: Resistivity and Hall measurements using van der Pauw geometry
5.3 Thermoelectric characterization (Seebeck coefficient)
5.4 Thermal characterization methods
6 Deposition of skutterudite thin films
6.1 Deposition chamber and deposition parameters
6.2 Deposition methods
6.3 Composition control of skutterudite films
7 Control of structural properties by the used deposition method
7.1 Structural properties of CoSb3 thin films
7.1.1 Crystallization characteristics of CoSb3 films
7.1.2 Comparison of films deposited with different deposition methods
7.1.3 Influence of different deposition parameters on the film properties
7.2 Structural properties of FeSb3 thin films
7.2.1 Crystallization behaviour
7.2.2 Structural properties of post-annealed Fe-Sb films prepared by
codeposition
7.2.3 Influence of the heating rate on the film properties
8 CoSb3 and FeSb3 composition series
8.1 CoSby composition series
8.1.1 Films deposited at elevated temperatures
8.1.2 Annealed films
8.2 FeSby composition series
9 Influence of various substrates on the film properties
9.1 Substrate influence on the film morphology
9.2 Substrate influence on thermoelectric properties and measurements
10 FexCo1-xSb3 - controlled doping by substitution of Co with Fe
10.1 Properties of codeposited FexCo1-xSb3 films
10.2 Properties of FexCo1-xSb3 films deposited via MERM
11 Filled CoSb3 thin films
12 Examples for nanostructured thin film approaches
12.1 CoSb3 thickness series
12.2 FexCo1-xSb3 gradient films
13 Summary and Outlook
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Stretchable MagnetoelectronicsMelzer, Michael 19 November 2015 (has links)
In this work, stretchable magnetic sensorics is successfully established by combining metallic thin films revealing a giant magnetoresistance effect with elastomeric materials. Stretchability of the magnetic nanomembranes is achieved by specific morphologic features (e.g. wrinkles), which accommodate the applied tensile deformation while maintaining the electrical and magnetic integrity of the sensor device. The entire development, from the demonstration of the world-wide first elastically stretchable magnetic sensor to the realization of a technology platform for robust, ready-to-use elastic magnetoelectronics with fully strain invariant properties, is described. The prepared soft giant magnetoresistive devices exhibit the same sensing performance as on conventional rigid supports, but can be stretched uniaxially or biaxially reaching strains of up to 270% and endure over 1,000 stretching cycles without fatigue. The comprehensive magnetoelectrical characterization upon tensile deformation is correlated with in-depth structural investigations of the sensor morphology transitions during stretching.
With their unique mechanical properties, the elastic magnetoresistive sensor elements readily conform to ubiquitous objects of arbitrary shapes including the human skin. This feature leads electronic skin systems beyond imitating the characteristics of its natural archetype and extends their cognition to static and dynamic magnetic fields that by no means can be perceived by human beings naturally. Various application fields of stretchable magnetoelectronics are proposed and realized throughout this work. The developed sensor platform can equip soft electronic systems with navigation, orientation, motion tracking and touchless control capabilities. A variety of novel technologies, like smart textiles, soft robotics and actuators, active medical implants and soft consumer electronics will benefit from these new magnetic functionalities.:Outline
List of abbreviations 7
1. INTRODUCTION
1.1 Motivation and scope of this work 8
1.1.1 A brief review on stretchable electronics 8
1.1.2 Stretchable magnetic sensorics 10
1.2 Technological approach 11
1.3 State-of-the-art 12
2. THEORETICAL BACKGROUND
2.1 Magnetic coupling phenomena in layered structures 14
2.1.1 Magnetic interlayer exchange coupling 14
2.1.2 Exchange bias 15
2.1.3 Orange peel coupling 16
2.2 Giant magnetoresistance 17
2.2.1 Electronic transport through ferromagnets 17
2.2.2 The GMR effect 19
2.2.3 GMR multilayers 20
2.2.4 Spin valves 21
2.3 Theory of elasticity 22
2.3.1 Elastomeric materials 22
2.3.2 Stress and strain 23
2.3.3 Rubber elasticity 25
2.3.4 The Poisson effect 26
2.3.5 Viscoelasticity 27
2.3.6 Bending strain in a stiff film on a flexible support 27
2.4 Approaches to stretchable electronic systems 28
2.4.1 Microcrack formation 28
2.4.2 Meanders and compliant patterns 29
2.4.3 Surface wrinkling 30
2.4.4 Rigid islands 32
3. METHODS & MATERIALS
3.1 Sample fabrication 34
3.1.1 Polydimethylsiloxane (PDMS) 34
3.1.2 PDMS film preparation 35
3.1.3 Lithographic structuring on the PDMS surface. 36
3.1.4 Magnetic thin film deposition 38
3.1.5 GMR layer stacks 40
3.1.6 Mechanically induced pre-strain 43
3.1.7 Methods and materials for the direct transfer of GMR sensors 45
3.1.8 Materials used for imperceptible GMR sensors 47
3.2 Characterization 48
3.2.1 GMR characterization setup with in situ stretching capability 48
3.2.2 Sample mounting 50
3.2.3 Electrical contacting of stretchable sensor devices 51
3.2.4 Customized demonstrator electronics 52
3.2.5 Microscopic investigation techniques 53
4. RESULTS & DISCUSSION
4.1 GMR multilayer structures on PDMS 54
4.1.1 Pre-characterization 54
4.1.2 Thermally induced wrinkling 55
4.1.3 Self-healing effect 57
4.1.4 Demonstrator: Magnetic detection on a curved surface 60
4.1.5 Sensitivity enhancement 61
4.1.6 GMR sensors in circumferential geometry 64
4.1.7 Stretchability test 67
4.2 Stretchable spin valves 69
4.2.1 Random wrinkles and periodic fracture 70
4.2.2 GMR characterization 73
4.2.3 Stretching of spin valves 74
4.2.4 Microcrack formation mechanism 76
4.3 Direct transfer printing of GMR sensorics 81
4.3.1 The direct transfer printing process 82
4.3.2 Direct transfer of GMR microsensor arrays 84
4.3.3 Direct transfer of compliant meander shaped GMR sensors 86
4.4 Imperceptible magnetoelectronics 89
4.4.1 GMR multilayers on ultra-thin PET membranes 89
4.4.2 Imperceptible GMR sensor skin 92
4.4.3 Demonstrator: Fingertip magnetic proximity sensor 93
4.4.4 Ultra-stretchable GMR sensors 94
4.4.5 Biaxial stretchability 99
4.4.6 Demonstrator: Dynamic detection of diaphragm inflation 101
5. CONCLUSIONS & OUTLOOK
5.1 Achievements 102
5.2 Outlook 104
5.2.1 Further development steps 104
5.2.2 Prospective applications. 105
5.3 Technological impact: flexible Bi Hall sensorics 106
5.3.1 Application potential 106
5.3.2 Thin and flexible Hall probes 107
5.3.3 Continuative works and improvements 108
5.4 Activities on technology transfer and public relations 108
Appendix
References 110
Selbständigkeitserklärung 119
Acknowledgements 120
Curriculum Vitae 121
Scientific publications, contributions, patents, grants & prizes 122
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