Les biocapteurs sont utilisés quotidiennement pour déterminer la présence de molécules biologiques dans une matrice complexe, comme l’urine pour les tests de grossesses ou le sang pour les glucomètres. Les techniques courantes pour la détection des autres maladies nécessitent fréquemment le marquage de l’analyte avec une autre molécule, ce qui est à éviter pour fin de simplicité d’analyse. Ces travaux ont pour but la maximisation de la sensibilité d’une surface d’or ou d’argent nanotrouée, afin de permettre la détection de la liaison de molécules biologiques par résonance des plasmons de surface localisés (LSPR), en utilisant la spectroscopie de transmission. Un biocapteur portable, rapide et sans marquage pour quantifier des analytes d’intérêt médical ou environnemental pourrait être construit à partir de ces travaux. Dans l’objectif d’étudier de nombreuses configurations pour maximiser la sensibilité, le temps et le coût des méthodes de fabrication de nanostructures habituelles auraient limité le nombre de surfaces nanotrouées pouvant être étudiées. Un autre objectif du projet consiste donc au développement d’une technique de fabrication rapide de réseaux de nanotrous, et à moindres coûts, basée sur la lithographie de nanosphères (NSL) et sur la gravure au plasma à l’oxygène (RIE). La sensibilité à la variation d’indice de réfraction associée aux liaisons de molécules sur la surface du métal noble et la longueur d’onde d’excitation du plasmon de surface sont influencées par les caractéristiques des réseaux de nanotrous. Dans les travaux rapportés ici, la nature du métal utilisé, le diamètre ainsi que la périodicité des trous sont variés pour étudier leur influence sur les bandes LSPR du spectre en transmission pour maximiser cette sensibilité, visant la fabrication d’un biocapteur. Les surfaces d’argent, ayant un diamètre de nanotrous inférieur à 200 nm pour une périodicité de 450 nm et les nanotrous d’une périodicité de 650 nm démontre un potentiel de sensibilité supérieur. / Biosensors are used daily to determine the presence of biomolecules in a complex matrix, like urine for pregnancy test or blood with a glucometer. The usual biodetection methods require the addition of a tag on the analyte, which is to be avoided to design a simple analytical method. The objective of this work is to maximize the sensitivity of a gold or silver nanohole arrays to detect the biomolecules liaisons close to the metal surface by localized surface plasmon resonance (LSPR) in transmission spectroscopy. A portable and effective biosensor to quantify analytes could be built based on this work, without a tagging step. To achieve the objective of evaluating numerous configurations for maximal sensitivity, the time and cost of the usual nanostructures fabrication methods would have limited the number of nanohole arrays in metal surface that could have been studied in this project. This fact motivated another objective of this project, the development of a fast and low cost fabrication method for nanohole arrays using nanospheres lithography (NSL) followed by reactive ions etching (RIE). The plasmon sensitivity and wavelength excitation are influenced by the nanohole arrays characteristics. In the work presented here, the chemical composition of the metal surface, the diameter and the periodicity of the nanohole arrays are shown to the influence the LSPR bands. The transmission maximum and minimum position of some LSPR bands are sensitive to refractive index change, which can be exploited in a biosensor format to detect biomolecules. The optimization of these nanohole arrays characteristics allows the maximization of this sensitivity to build a biosensor. The best index refraction sensitive results were with silver surfaces, with nanohole diameters smaller than 200 nm for a periodicity of 450 nm and the nanoholes with a periodicity of 650 nm show a potential for an increased sensitivity.

The vibrant school of printmaking which emerged and flourished in New Zealand between 1900 and 1950 forms the subject of this thesis. It examines the attitudes of the printmakers, many of whom regarded the print as the most democratic of art forms and one that should reflect the realities of everyday life. Their subject matter, contemporary city scenes, people at work and leisure, local landscapes, Maori and indigenous flora and fauna, is analysed and revealed as anticipating by over a decade that of regionalist painters. They are also identified as the first New Zealand artists to draw attention to social and environmental issues. Trained under the British South Kensington art education system, New Zealand printmakers placed great importance on craftsmanship. Although some worked in a realist style others experimented with abstraction and surrealism, placing them among the forefront of New Zealand artists receptive to modern art. Expatriate New Zealand printmakers played significant roles in three major printmaking movements abroad, the Artists' International Alliance, Atelier 17 and the Claude Flight Linocut Movement. The thesis redresses the failure of existing histories of New Zealand art to recognise the existence of a major twentieth-century art movement. It identifies the main factors contributing to the low status of printmaking in New Zealand. Commercial artists rather than those with a fine arts background led the Quoin Club, which initiated a New Zealand school of printmaking in 1916; Gordon Tovey's overthrow of the South Kensington system in 1945 devalued the craftsmanship so important to printmakers; and the rise of modernism, which gave priority to formal values and abstraction, further exacerbated institutional indifference to the print. The adoption of Maori imagery by printmakers resulted in recent art historians retrospectively accusing them of cultural appropriation. Even the few printmakers who attained some recognition were criticised for their involvement in textile and bookplate design and book-illustration. Key artists discussed in the thesis include James Boswell, Stephen Champ, Frederick Coventry, Rona Dyer, Arnold Goodwin, Thomas Gulliver, Trevor Lloyd, Stewart Maclennan, Gilbert Meadows, John L. Moore, E. Mervyn Taylor, Arthur Thompson, Herbert Tornquist, Frank Weitzel, Hilda Wiseman, George Woods, John Buckland Wright and Adele Younghusband. Details of the approximately 3,000 prints created during this period are recorded in a database, and summarised in the Printmakers' Survey included in Volume Two. In addition reproductions of 156 prints are illustrated and documented; while a further 43 prints are reproduced within the text of Volume One.

A l’heure actuelle, la lithographie optique 193 nm arrive à ces limites de capacité en termes de résolution des motifs dans la fenêtre du procédé souhaitée pour les nœuds avancés. Des lithographies de nouvelle génération (NGL) sont à l’étude, comme la lithographie EUV (EUV). La complexité de mise en production de ces nouvelles lithographie entraine que la lithographie 193 nm continue à être exploitée pour les nœuds 28 nm et au-delà. Afin de suivre la miniaturisation le rôle des techniques alternatives comme le RET (en anglais Resolution Enhancement Technique) tels que l’OPC (Optical Proximity Correction) est devenu primordial et essentiel. Néanmoins, la complexité croissante de design et de la variabilité du procédé lithographique font qu’il est nécessaire de faire des compromis. Dans ce contexte de complexité croissante du procédé de fabrication, l’objectif de la thèse est de mettre en place une méthode de boucles de correction des facteurs de variabilité. Cela signifie une diminution de la variabilité des motifs complexes pour assurer une résolution suffisante dans la fenêtre de procédé. Ces motifs complexes sont très importants, car c’est eux qui peuvent diminuer la profondeur du champ commune (uDoF). Afin d'accomplir cette tâche, nous avons proposé et validé un enchainement qui pourra être plus tard implémenté en production. L’enchainement en question consiste en une méthodologie de détection basée sur la simulation des motifs les plus critiques étant impactés par les effets issus de la topographie du masque et du profil de la résine. En outre cette méthodologie consiste en une diminution et la compensation de ces effets, une fois que ces motifs les plus critiques sont détectés. Le résultat de l’enchaînement complété sont encourageants : une méthode qui détecte et diminue les variabilités du processus lithographique pour des nœuds de technologie de 28nm a été validée. En plus elle pourrait être adaptée pour les nœuds au-delà de 28 nm. / The currently used 193 nm optical lithography reaches its limits from resolution point of view. Itis despite of the fact that various techniques have been developed to push this limit as much aspossible. Indeed new generation lithography exists such as the EUV, but are not yet reliable to beapplied in mass production. Thus in orders to maintain a robust lithographic process for theseshrunk nodes, 28 nm and beyond, the optical lithography needs to be further explored. It ispossible through alternatives techniques: e.g. the RETs (Resolution Enhancement Techniques),such as OPC (Optical Proximity Correction) and the double patterning. In addition to theresolution limits, advanced technology nodes are dealing with increasing complexity of design andsteadily increasing process variability requiring more and more compromises.In the light of this increasing complexity, this dissertation work is addressed to mitigate thelithographic process variability by the implementation of a correction (mitigation) flow exploredmainly through the capability of computational lithography. Within this frame, our main objectiveis to participate to the challenge of assuring a good imaging quality for the process windowlimiting patterns with an acceptable gain in uDoF (usable Depth of Focus).In order to accomplish this task, we proposed and validated a flow that might be laterimplemented in the production. The proposed flow consists on simulation based detectionmethodology of the most critical patterns that are impacted by effects coming from the masktopography and the resist profile. Furthermore it consists of the mitigation and the compensationof these effects, once the critical patterns are detected. The obtained results on the completedflow are encouraging: a validated method that detects the critical patterns and then mitigates thelithographic process variability been developed successfully.

Thermal nanoimprint lithography (T-NIL) is a cheap and fast technique to produce nanopatterns in polymeric materials. It creates these patterns by pressing a stamp down into a polymer film that has been heated above its glass transition temperature. These nanopatterned polymer films can be used in a wide variety of scientific fields, not the least the organic semiconductor industry. There the nanopatterned films have, among else, been used to improve the efficiency of organic light-emitting diodes (OLEDs). The light-emitting electrochemical cell (LEC), which is similar in structure to an OLED, also uses polymer films in their device structure but the light emitting layer also contains an electrolyte. However, it has not been shown if nanopatterns can improve LECs as well or if it is even possible to make an imprint in their polymer films that are mixed with an electrolyte. This thesis shows that T-NIL can be used to imprint nanopatterns in films made of poly(ethylene oxide) and the conjugated polymer Super Yellow. The best nanopatterns were produced by setting the imprint parameters to  85 °C, 10 bar, 1800 s for poly(ethylene oxide) and 115 °C, 20 bar, 1800 s for Super Yellow. Imprints were also performed on polystyrene but no nanopatterns could be produced. This was most likely because the stamp could not handle the high temperature that is required to make a nanopattern in polystyrene. The best imprint parameters of Super Yellow were then used to produce a pattern in a film made of Super Yellow mixed with the salt tetrahexylammonium tetrafluoroborate (THABF4) in order to be able to produce one imprinted and one reference LEC. The imprinted LEC had a luminosity of 139 cd/m2, an improvement of 20% compared to the reference’s 115 cd/m2 when operated under identical conditions.  The forward direction and the angular dependent electroluminescence spectrum of the imprinted LEC clearly showed an effect not observed in the reference. These findings show that the polymer films used in a LEC can be imprinted with a nanopattern by using T-NIL. The imprinted films can be used to create functional LECs that show different behavior and a higher luminosity compared to a non-imprinted reference. If these results can be repeated it might be the starting point of a brighter future.

Advances in the biomedical field require functional materials and processes that can lead to devices that are biocompatible, and biodegradable while maintaining high performance and mechanical conformability. In this context, a current shift in focus is towards natural polymers as not only the structural but also functional components of such devices. This poses material-specific functionalization and fabrication related questions in the design and fabrication of such systems. Silk protein biopolymers from the silkworm show tremendous promise in this regard due to intrinsic properties: mechanical performance, optical transparency, biocompatibility, biodegradability, processability, and the ability to entrap and stabilize biomolecules. The unique ensemble of properties indicates opportunities to employ this material into numerous biomedical applications. However, specific processing, functionalization, and fabrication techniques are required to make a successful transition from the silk cocoon to silk-based devices. This research is focused on these challenges to form silk-based functional material and devices for application in areas of therapeutics, bio-optics, and bioelectronics. To make silk proteins mechanically conformable to biological tissues, the first exploration is directed towards the realization of precisely micro-patterned silk proteins in flexible formats. The optical properties of silk proteins are investigated by showing the angle-dependent iridescent behavior of micropatterned proteins, and developing soft micro-optical devices for light concentration and focusing. The optical characteristics and fabrication process reported in the work can lead to the future application of silk proteins in flexible optics and electronics. The microfabrication process of silk proteins is further extended to form shape-defined silk protein microparticles. Here, the specificity of shape and the ability to form monodisperse shapes can be used as shape encoded efficient cargo and contrast agents. Also, these particles can efficiently entrap and stabilize biomolecules for drug delivery and bioimaging applications. Next, a smart confluence of silk sericin and a synthetic functional polymer PEDOT:PSS is shown. The composite materials obtained have synergistic effects from both polymers. Silk proteins impart biodegradability and patternability, while the intrinsically conductive PEDOT:PSS imparts electrical conductivity and electrochemical activity. Conductive micro architectures on rigid as well as flexible formats are shown via a green, water-based fabrication process. The applications of the composite are successfully demonstrated by realizing biosensing and energy storage devices on rigid or flexible forms. The versatility of the approach will lead to the development of a variety of applications such as in bio-optics, bioelectronics, and in the fundamental study of cellular bio electrogenic environments. Finally, to expand the applicability of reported functional polymers and composites beyond the microscale, a method for silk nano-patterning via electron beam lithography is explored. The technique enables one-step fabrication of user defined structures at the submicron and nano-scales. By virtue of acrylate chemistry, a very low energetic beam and dosage are required to form silk nano-architectures. Also, the process can form both positive and negative features depending on the dosage. The fabrication platform can also form nano scale patterns of the conductive composite. The conductive measurements confirm the formation of conductive nanowires and the ability of silk sericin to entrap PEDOT:PSS particles in nanoscale features.

Rapid prototyping is a relativity new technology and is based on layered manufacturing which has similarities to the method an ordinary desktop paper printer works. This research is to obtain a better understanding on how to use computer graphics software, in this particular case Autodesk Maya, to create a model. The goal is to understand how to create a suitable mesh of a 3D model for use with a 3D printer and produce a printed model that is equivalent to the CAD software 3D model. This specific topic has not been scientifically documented which has resulted in an actual 3D model.

La détection sensible et sélective des métaux lourds, en particulier les métaux detransition, est d’une grande importance pour la santé publique ainsi que pour la surveillancede l’environnement. Les méthodes actuelles de référence, de par leur non portabilité, limitentla possibilité de disposer de mesures à haute résolution spatiale et temporelle. Lesmicrocapteurs optiques offrent un moyen attrayant et pratique pour surmonter ces limitationsde coût global et de temps d’analyse, en permettant la mesure en temps réel sur site.Pour démontrer ce potentiel, ces travaux de thèse sont orientés sur la détermination duchrome hexavalent Cr(VI) en solution à l’aide d’une réaction colorimétrique avec le 1,5-diphénylcarbazide (DPC), permettant de créer un complexe présentant un maximumd’absorption dans le domaine du visible. Ces travaux s’inscrivent dans la volonté dedévelopper un véritable laboratoire sur puce, intégrant la fonction fluidique parélectromouillage sur diélectrique pour créer la réaction colorimétrique, ainsi que la fonctionde mesure par intégration d’un capteur optique dédié à la mesure d’absorption dans desmicrovolumes (< μL). Pour la mesure d'absorption sur de si faibles volumes, l'utilisation demicrorésonateurs vise à augmenter de façon importante le chemin optique effectif et ainsi lasensibilité du capteur.Nous décrivons nos travaux sur la conception, la fabrication de la plateformemicrofluidique digitale ainsi que du résonateur optique en anneaux à des dimensionssubmicroniques par photolithographie par projection. Les matériaux polymères sontprivilégiés pour une intégration totale bas coût à terme, ainsi qu’un substrat verre, dont lespropriétés sont particulièrement adaptées aux applications optiques dans le domaine duvisible. / The selective and sensitive detection of heavy metals, such as transition metals, is ofparamount importance for health and safety an environmental monitoring. Current referencemethods, due to their lack of portability, are limiting factors to obtain high-resolution spatialand temporal data. Optical sensors offer an attractive and convenient way to overcome theselimitations of cost and time per analysis by offering real time, on-site measurementcapabilities.In order to demonstrate this potential, this thesis is focused on the detection and quantificationof hexavalent chromium Cr(VI) in water samples by a colorimetric reaction based on areaction with the 1,5-diphenylcarbazide (DPC), that produces a complex possessing anabsorption maximum in the visible range. This works endorse the goal of creating a true labon-chip, integrating both the fluidic function based on ElectroWetting on Dielectric (EWOD)to create the colorimetric reaction, and the sensing function based on the integration of anoptical sensor able to measure absorption variations in micro-volumes (< μL). In order toobtain sufficient sensitivity on such small volumes, optical microring resonators are used inthis work, due to their ability to enhance the effective optical path length by constructiveinterferences.This thesis describes the conception and fabrication of the EWOD microfluidic platform, aswell as the conception, simulation and fabrication of submicronic microring resonators usingstepper lithography. Polymer materials and glass substrates are selected, due to their greatoptical properties in the visible range, their compatibility with the EWOD platform, and theirintegrability at a reasonable cost.

Les cellules photovoltaïques en couches minces de silicium cristallin sont des candidates prometteuses pour les développements futurs de l’industrie photovoltaïque, au travers des réductions de coûts attendues et des applications dans les modules souples. Pour devenir compétitive, la filière des couches minces de silicium monocristallin doit se différencier des filières classiques. Elle est donc généralement basée sur l’épitaxie de couches de haute qualité puis sur le transfert de ces couches vers un support mécanique pour terminer la fabrication de la cellule et réutiliser le premier substrat de croissance. Le but de cette thèse est de trouver les associations technologiques qui permettent de réaliser des cellules photovoltaïques en couches minces et ultra-minces de silicium monocristallin à haut-rendement. Les travaux présentés s’articulent selon deux axes principaux : le développement et la maîtrise de procédés technologiques pour la fabrication de cellules solaires en couches minces et l’optimisation des architectures de cellules minces haut-rendement.Dans ce cadre de travail, les développements des techniques de fabrication ont d’abord concerné la mise au point de procédés de transfert de couches minces : une technologie basse température de soudage laser et un soudage par recuit rapide haute température. Afin d’augmenter le rendement de conversion, nous avons développé des structurations de surface utilisant les concepts de la nano-photonique pour améliorer le pouvoir absorbant des couches minces. Avec une lithographie interférentielle à 266 nm et des gravures sèches par RIE et humides par TMAH (Tetramethylammonium Hydroxide), nous pouvons réaliser des cristaux photoniques performants sur des couches épitaxiées de silicium. Finalement, nous avons pu concevoir des architectures optimisées de cellules solaires minces à homo-jonction de silicium et à hétéro-jonction silicium amorphe / silicium cristallin plus performantes électriquement, grâce aux outils de simulation électro-optique. Notre approche théorique nous a aussi conduits à expliciter les phénomènes électriques propres aux couches minces, et à démontrer tout le potentiel des cellules photovoltaïques minces en silicium monocristallin. / Thin-film crystalline silicon solar cells are promising candidates for future developments in the photovoltaic industry, through expected costs reductions and applications in flexible modules. To be competitive, thin-film monocrystalline silicon solar cell technology must differentiate itself from conventional ones. It is generally based on the epitaxy of high-quality layers and then on the transfer of these layers onto a mechanical support to complete the manufacture of the cell and reuse the growth substrate. The aim of this thesis is to find the technological associations that make it possible to realize high-efficiency photovoltaic cells from thin and ultra-thin layers of monocrystalline silicon. The work presented focuses on two main axes: the development and control of technological processes for the fabrication of thin-film solar cells and the optimization of high-performance thin-cell architectures.In this framework, the development of manufacturing techniques began with the development of thin-film transfer processes: low temperature laser welding technology and high temperature fast annealing welding technology. In order to increase conversion efficiency, we have developed surface patterns using the nano-photonics concepts to improve the absorbency of thin films. With an interferential lithography at 266 nm and dry etching by RIE and wet etching by TMAH (Tetramethylammonium Hydroxide), we can produce high-performance photonic crystals on epitaxial layers of silicon. Finally, we were able to design optimized architectures of thin solar cells with homo-junction of silicon and hetero-junction amorphous silicon / crystalline silicon more efficient electrically, thanks to electro-optical simulation tools. Our theoretical approach has also led us to explain the electrical phenomena specific to thin films, and to demonstrate the full potential of thin photovoltaic cells made of monocrystalline silicon.

To investigate quantum confinement effects on silicon (Si) light source electroluminescence (EL) properties like quantum efficiency, external power efficiency and spectral emission, thin Si finger junctions with nanometre-scale dimensions were designed and manufactured in a fully customized silicon-on-insulator (SOI) semiconductor production technology. Since commonly available photolithography is unusable to consistently define and align nanometre-scale line-widths accurately and electron-beam lithography (EBL) by itself is too time-expensive to expose complete wafers, the wafer manufacturing process employed a selective combination of photolithography and EBL. The SOI wafers were manufactured in the clean-rooms of both the Carl and Emily Fuchs Institute for Microelectronics (CEFIM) at the University of Pretoria (UP) and the Georgia Institute of Technology’s Microelectronic Research Centre (MiRC), which made a JEOL JBX-9300FS electron-beam pattern generator (EPG) available. As far as is known this was the first project in South Africa (and possibly at the MiRC) that employed EBL to define functional nanometre-scale semiconductor devices. Since no standard process recipe could be employed, the complete design and manufacturing process was based on self-obtained equipment characterization data and material properties. The manufacturing process was unprecedented in both the CEFIM and MiRC clean-rooms. The manufacture of nanometre-scale Si finger junctions not only approached the manufacturing limits of the employed processing machinery, but also had to overcome undesirable physical effects that in larger-scale semiconductor manufacture usually are negligible. The device design, mask layout and manufacturing process therefore had to incorporate various material, equipment limitation and physical phenomena like impurity redistribution occurring during the physical manufacturing process. Although the complicated manufacturing process allowed many unexpected problems to occur, it was expected that at least the simple junction breakdown devices be functional and capable of delivering data regarding quantum confinement effects. Although due to design and processing oversights only 29 out of 505 measured SOI light sources were useful light emitters, the design and manufacture of the SOI light sources was successful in the sense that enough SOI light sources were available to conduct useful optical characterization measurements. In spite of the fact that the functional light sources did not achieve the desired horizontal (width) confinement, measured optical spectra of certain devices indicate that vertical (thickness) confinement had been achieved. All spectrometer-measured thickness-confined SOI light sources displayed a pronounced optical power for 600 nm < λ < 1 μm. The SOI light source with the highest optical power output emitted about 8 times more optical power around λ = 850 nm than a 0.35 μm bulk-CMOS avalanche light-source operating at the same current. Possible explanations for this effect are given. It was shown that the buried oxide (BOX) layer in a SOI process could be used to reflect about 25 % of the light that would usually be lost to downward radiation back up, thereby increasing the external power efficiency of SOI light sources. This document elaborates on the technical objectives, approach, chip and process design, physical wafer manufacture, production process control and measurement of the nanometre-scale SOI light sources. Copyright / Dissertation (MEng)--University of Pretoria, 2010. / Electrical, Electronic and Computer Engineering / unrestricted

La miniaturisation des systèmes d'imagerie présente aujourd'hui un fort potentiel dans plusieurs domaines, dont le développement de nouveaux dispositifs biomédicaux. Les exigences associées concernant l'imagerie demandent un effort substantiel dans le développement de composants optiques de haute qualité. Un meilleur contrôle de la propagation de la lumière ou de ses caractéristiques dans de tels systèmes est également important. Les composants doivent donc, par exemple, contenir les aberrations optiques pouvant affecter la résolution, la mise en œuvre de composants optiques dont le profil de phase continu est bien contrôlé est une voie intéressante. Ces composants devraient, de plus, être réalisés à partir de matériaux robustes en vue de leur assemblage au sein de dispositifs miniatures. Ce manuscrit de thèse de doctorat porte donc sur la conception et la fabrication parallèle de tels micro-composants optiques réfractifs réalisés en verre. Dans ce but, deux technologies ont été étudiées et optimisées, la lithographie à niveaux de gris et un procédé de soufflage de verre. En exemple, des microaxicons en verre ont été fabriqués et la génération de faisceaux de Bessel démontrée. Ce type de faisceau est caractérisé par une longue distance de propagation non-diffractive le long de l'axe optique, suivie d'une forme de faisceaux creux, qui les rend très utiles dans de nombreux domaines. Ces travaux de thèse ont été soutenus par le projet SMYLE (Small Systems for a Better Life) et le conseil Régional de Franche-Comté. / Miniaturization of imaging systems shows nowadays a strong potential for many applications, in particular, e. g., for novel biomedical devices. Related imaging specifications require a substantial effort onto the development of high quality microoptical components. better control of light propagation and features in such system sis also of particular interest. Components should then e.g. contain optical aberrations in order to reach high resolutions. In purpose of searching higher diffraction efficiencies or resolutions, optical components with well-controlled continuous phase profiles are sought. In addition, they also should be made of robust materials to handle their further assembly into miniaturized devices. Consequently, the manuscript focuses on the design and the parallel fabrication of such microoptical components made of glass. To that end, two technologies have been studied and optimized, namely gray-scale lithography and glass-blowing processes. As an example, glass-based microaxicons have been fabricated and Bessel beams generation has been demonstrated. This type of beam exhibits a long non-diffractive propagation distance along the optical axis followed by a dark hollow shape which makes them useful in many different applications. This work has been supported by the SMYLE (Smart Systems for a Better Life) European project and the Ranche-Comté Regional Council.